Background-free sample bearing piece of X-ray powder diffractometer

Abstract

The utility model relates to the technical field of sample bearing sheets, and discloses a background-free sample bearing sheet of an X-ray powder diffractometer, which comprises a bearing sheet, a limiting part is arranged on the bearing sheet, a background-free silicon wafer is arranged on the limiting part, the background-free silicon wafer is a monocrystalline silicon wafer, and a placing groove for placing the monocrystalline silicon wafer is arranged on the bearing sheet. A background-free silicon wafer (monocrystalline silicon wafer) is placed in a placing groove of a bearing sheet, a powder sample is scattered on the surface of the background-free monocrystalline silicon wafer, and the rear end of the bearing sheet is inserted into an XRD test board. The background-free monocrystalline silicon wafer adopts a monocrystalline silicon (511) crystal face as a test face, and the crystal face reduces diffraction peaks in a diffraction window, so that a background-free effect is achieved.

Description

Technical Field

[0001] The utility model relates to the technical field of sample carrier sheets, in particular to a background-free sample carrier sheet for an X-ray powder diffractometer. Background Art

[0002] Polycrystalline X-ray powder diffractometer, abbreviated as XRD, is a device specially used to detect polycrystalline samples. This device can detect powder and bulk samples. For powder samples, a carrier sheet with grooves made of glass, quartz or plastic is generally used to carry the sample. The powder sample is filled into the groove of the carrier sheet and smoothed before testing.

[0003] Conventional sample carriers generally require a large amount of sample, and the sample must fill the entire sample slot. However, in actual situations, many samples cannot reach the required sample amount, especially some samples that are difficult to purify and prepare. Therefore, in order to test these trace samples, sample carriers with smaller slots have been developed.

[0004] However, this small groove sample carrier has the following disadvantages:

[0005] Since the test sample cannot cover a large area of ​​the surface of the carrier, the X-rays will irradiate the carrier, resulting in severe background diffraction in the diffraction pattern.

[0006] The use of a micro-area test mode can prevent X-rays from irradiating the carrier film, but this method shields a large amount of X-rays, resulting in a serious decrease in diffraction intensity. Utility Model Content

[0007] The utility model aims to provide a background-free sample carrier sheet for an X-ray powder diffractometer to solve the problems raised in the prior art.

[0008] In order to achieve the above-mentioned purpose of the utility model, the technical solution adopted by the utility model is: a background-free sample carrier for an X-ray powder diffractometer, comprising a carrier, a limiting portion is provided on the carrier, and a background-free silicon wafer is provided on the limiting portion.

[0009] Preferably, the carrier sheet is an aluminum plate.

[0010] Preferably, one end of the carrier sheet is thinned.

[0011] Preferably, the thinning treatment is performed by providing a notch at the bottom of one end of the carrier sheet, providing a notch at the top, or both.

[0012] Preferably, the background-free silicon wafer is a single crystal silicon wafer, and a crystal plane angle of the single crystal silicon wafer is greater than 60°.

[0013] Preferably, the limiting portion includes a placement groove provided on the carrier sheet, and the inner concave structure of the placement groove is matched with the outer shape of the silicon wafer without background.

[0014] Preferably, a plurality of mounting grooves are provided at the notch of the placement groove to facilitate the installation of a fixing member to fix the background-free silicon wafer.

[0015] Preferably, a through hole is provided at the bottom of the placement groove for facilitating the pushing and removal of the background-free silicon wafer, and a push rod is provided in the through hole.

[0016] Preferably, elastic material is provided on the top rod.

[0017] The beneficial effects of the utility model are concentrated in that: a background-free silicon wafer (single crystal silicon wafer) is placed in a placement groove of a carrier, a powder sample is sprinkled on the surface of the background-free single crystal silicon wafer, and the rear end of the carrier is inserted into an XRD test table. The background-free single crystal silicon wafer uses a single crystal silicon (511) crystal plane as a test surface, and the crystal plane reduces the diffraction peak in the diffraction window, thereby achieving a background-free effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is the conventional technology of the utility model;

[0019] Figure 2 It is the prior art of the utility model;

[0020] Figure 3 It is a three-dimensional diagram of the utility model;

[0021] Figure 4 It is a top view of the carrier sheet of the utility model;

[0022] Figure 5 It is a side view of the carrier sheet of the utility model;

[0023] Figure 6 This is a test effect diagram of the utility model;

[0024] Among them, 1. carrier sheet; 2. limiting part; 3. background-free silicon wafer; 4. notch; 5. placement groove; 6. mounting groove; 7. through hole; 8. ejector pin. DETAILED DESCRIPTION

[0025] In order to make the objectives, technical solutions and advantages of the present application clearer, the technical solutions in the embodiments of the present application will be described in more detail below in conjunction with the drawings in the preferred embodiments of the present application.

[0026] In the description of this application, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, or it can be an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0027] In the description of the present application, it should be understood that the terms "upper", "lower", "front", "back", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating orientations or positional relationships, are orientations or positional relationships based on the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0028] In addition, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, for example, a process, method, system, product, or display comprising a series of steps or elements is not necessarily limited to those steps or elements explicitly listed, but may include other steps or elements not explicitly listed or inherent to such process, method, product, or display.

[0029] Embodiment 1

[0030] See also Figure 1-Figure 5 , a background-free sample carrier for X-ray powder diffractometer. With the advantage of no background, it is used to test trace or X-ray transparent samples, which can effectively replace imported products and reduce costs.

[0031] In this embodiment, a carrier sheet 1 is included, and a limiting portion 2 is provided on the carrier sheet 1, and a background-free silicon wafer 3 is provided on the limiting portion 2. The background-free silicon wafer 3 is placed on the limiting portion 2, and then the entire carrier sheet 1 is inserted into the detection part of the XRD test bench for testing.

[0032] As a more specific implementation of this embodiment, the carrier sheet 1 is preferably an aluminum plate with a light and thin design. Among them, the carrier sheet 1 can be divided into a front end and a rear end, one end of the carrier sheet 1 is thinned, and the rear end is preferably thinned, which is conducive to the insertion of the XRD test bench. The rear end thickness of the carrier sheet 1 can be 1.5-2.5mm, which is suitable for clamping test benches of different models. The front end thickness can be 2.5-4.5mm to adapt to background-free silicon wafers 3 of different thicknesses. In this embodiment, the rear end thickness is preferably 1.8mm, and the front end thickness is preferably 3mm. The front end thickness can be appropriately increased to place a thicker background-free silicon wafer 3. The thicker background-free silicon wafer 3 has better strength and is not easy to be damaged. X-rays are less likely to penetrate the background-free silicon wafer 3, thereby achieving a better background-free effect.

[0033] As a more specific implementation of this embodiment, the thinning treatment method is to set a notch 4 at the bottom of one end of the carrier sheet 1, set a notch 4 at the top, or both. In this embodiment, the notch 4 is preferably set at the bottom to ensure the flatness of the top surface of the carrier sheet 1.

[0034] As a more specific implementation of this embodiment, the background-free silicon wafer 3 is a single crystal silicon wafer, and the crystal plane angle of the single crystal silicon wafer is greater than 60°. The background-free silicon wafer 3 can use a single crystal silicon (511) crystal plane as the test surface. This high-angle crystal plane single crystal silicon wafer will not produce diffraction peaks within the diffraction window of 0-120°, thereby achieving a background-free effect. Specific test results can be found in Figure 6 .

[0035] As a more specific implementation of this embodiment, the limiting portion 2 includes a placement groove 5 provided on the carrier sheet 1, and the concave structure of the placement groove 5 is adapted to the shape of the single crystal silicon wafer. The concave structure and groove depth of the placement groove 5 depend on the thickness of the background-free silicon wafer 3. The background-free silicon wafer 3 of this embodiment is preferably a square sheet, and the concave structure is also preferably a directional structure. The groove depth of the placement groove 5 can also be 2.5-4.5 mm.

[0036] In some embodiments, the limiting portion 2 may also be a convex block, the top of which is open and hollow, thereby forming a concave structure similar to the placement groove 5. A notch 4 may be provided around the concave structure to facilitate installation and removal of the background-free silicon wafer 3.

[0037] As a more specific implementation of this embodiment, the notch of the placement groove 5 is provided with a plurality of mounting grooves 6 for facilitating the installation of fixing parts to fix the single crystal silicon wafer. The mounting grooves 6 can be preferably arranged at the four corners of the silicon wafer 3 without background, so that the fixing force points are more stable.

[0038] In some other embodiments, the bottom of the groove 5 may be provided with a through hole 7 for pushing and removing the single crystal silicon wafer, and a push rod 8 is provided in the through hole 7 to facilitate the removal of the background-free silicon wafer 3. The push rod 8 is provided with elastic material to reduce the risk of the background-free silicon wafer 3 being fragile.

[0039] Usage method: Place the background-free silicon wafer 3 into the placement groove 5 of the carrier sheet 1, sprinkle the powder sample on the surface of the background-free silicon wafer 3, and then insert the rear end of the carrier sheet 1 into the XRD test bench for testing.

[0040] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. The patent protection scope of the present invention shall be based on the claims. All equivalent structural changes made using the description and drawings of the present invention shall be included in the protection scope of the present invention.

Claims

1. A background-free sample carrier for an X-ray powder diffractometer, characterized in that: It comprises a carrier sheet, the carrier sheet is provided with a limiting portion, and the limiting portion is provided with a background-free silicon sheet; The limiting part includes a placement groove provided on the carrier sheet, and the inner concave structure of the placement groove is matched with the outer shape of the silicon sheet without background.

2. The background-free sample carrier for X-ray powder diffractometer according to claim 1, characterized in that: The carrier sheet is an aluminum plate.

3. The background-free sample carrier for X-ray powder diffractometer according to claim 1, characterized in that: One end of the carrier sheet is thinned.

4. The background-free sample carrier for X-ray powder diffractometer according to claim 3, characterized in that: The thinning treatment method is any one of setting a notch at the bottom of one end of the carrier sheet, setting a notch at the top, or both.

5. The background-free sample carrier for X-ray powder diffractometer according to claim 1, characterized in that: The background-free silicon wafer is a single crystal silicon wafer, and a crystal plane angle of the single crystal silicon wafer is greater than 60°.

6. The background-free sample carrier for X-ray powder diffractometer according to claim 1, characterized in that: The notch of the placement groove is provided with a plurality of mounting grooves for facilitating the installation of a fixing member to fix the silicon wafer without background.

7. The background-free sample carrier for X-ray powder diffractometer according to claim 1, characterized in that: The bottom of the placement groove is provided with a through hole for pushing and removing the silicon wafer without background, and a push rod is arranged in the through hole.

8. The background-free sample carrier for X-ray powder diffractometer according to claim 7, characterized in that: The top rod is provided with elastic material.

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