Silicon material cleaning device

Abstract

The utility model relates to the technical field of polycrystalline silicon production, in particular to a silicon material cleaning device which comprises a reaction kettle body provided with a feeding port, a liquid inlet pipe and an air inlet, a kettle body feeding flange is arranged on the outer edge of the feeding port, and a kettle body lower flange is arranged on the outer edge of the air inlet; the feeding cover is connected to the kettle body feeding flange; the air inlet cover is connected to the lower flange of the kettle body, and an air inlet pipe is arranged on the air inlet cover; the reaction plate is positioned at the joint of the gas inlet cover and the lower flange of the kettle body and is used for bearing a polycrystalline silicon material to be cleaned; wherein the liquid inlet pipe is located at the top of the reaction kettle body, the feeding port is located at the side edge of the top of the reaction kettle body, and the air inlet is located at the bottom of the reaction kettle body. The polycrystalline silicon material cleaning device is simple in structure and convenient to disassemble and assemble, the gas holding effect of the device is enhanced, and the cleaning effect of polycrystalline silicon materials is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of polysilicon production, in particular to a silicon material cleaning device. Background Art

[0002] Polysilicon is an electronic material that uses silicon as raw material and is purified to a certain purity through a series of physical and chemical reactions. It is an extremely important intermediate product in the silicon product industry chain, and is the main raw material for manufacturing silicon polished wafers, solar cells and high-purity silicon products. It is the most basic functional material for the semiconductor, electronic information industry, and solar photovoltaic cell industry.

[0003] The cleaning process of polysilicon material is carried out in a reactor. A reactor is a pressure vessel that completes a series of physical and chemical reaction processes in a closed space. In the prior art, the sealing and gas holding device of the reaction plate in the reactor has the disadvantages of complex structure, difficult disassembly and maintenance, and restricted gas holding effect. Therefore, there is room for improvement. Utility Model Content

[0004] In view of the above-mentioned shortcomings of the prior art, the purpose of the utility model is to provide a silicon material cleaning device for solving the technical problems that the sealing and gas encapsulation devices of the reaction plates in the prior art reactors have complex structures, are difficult to disassemble and maintain, and restrict the gas encapsulation effect.

[0005] In order to achieve the above-mentioned purpose and other related purposes, the utility model provides a silicon material cleaning device, comprising:

[0006] The reaction kettle body is provided with a feeding port, a liquid inlet pipe and an air inlet, the outer edge of the feeding port is provided with a kettle body feeding flange, and the outer edge of the air inlet is provided with a kettle body lower flange;

[0007] A feeding cover connected to the feeding flange of the kettle body;

[0008] An air inlet cover is connected to the lower flange of the kettle body, and an air inlet pipe is arranged on the air inlet cover; and

[0009] A reaction plate, located at the connection between the air inlet cover and the lower flange of the kettle body, to carry the polysilicon material to be cleaned;

[0010] The liquid inlet pipe is located at the top of the reactor body, the feed port is located at the top side of the reactor body, and the air inlet is located at the bottom of the reactor body.

[0011] In one embodiment of the utility model, a fixing groove is provided on the air inlet cover, and the fixing groove is provided along the contour of the contact surface between the air inlet cover and the lower flange of the kettle body.

[0012] In one embodiment of the utility model, a sealing groove is provided on the air inlet cover, the sealing groove is provided along the contour of the contact surface between the air inlet cover and the lower flange of the kettle body, and the sealing groove is located radially outside the fixing groove.

[0013] In one embodiment of the present invention, the silicon material cleaning device further comprises a filter screen, wherein the filter screen is connected to the air inlet cover, and the filter screen is attached to a side of the reaction plate in contact with the polysilicon material.

[0014] In one embodiment of the utility model, a filter clamping strip is arranged around the filter screen, and the filter clamping strip is clamped in the fixing groove.

[0015] In one embodiment of the present invention, the silicon material cleaning device further comprises a sealing member, wherein the sealing member is located at the connection between the lower flange of the kettle body and the air inlet cover, and the sealing member is arranged along the contour of the lower flange of the kettle body.

[0016] In one embodiment of the present utility model, the sealing member includes a sealing head and a sealing tail, the sealing head is connected to one side of the sealing tail, and the sealing head is clamped in the sealing groove.

[0017] In one embodiment of the present invention, a plurality of ventilation holes are formed through the reaction plate, and the plurality of ventilation holes are evenly distributed on the surface of the reaction plate.

[0018] In one embodiment of the present invention, a plurality of protrusions are provided on the reaction plate, the protrusions are located on a side of the reaction plate in contact with the polysilicon material, and a distance between adjacent protrusions is smaller than a geometric dimension of the polysilicon material.

[0019] In one embodiment of the present invention, the silicon material cleaning device further comprises a plurality of connecting members, and the plurality of connecting members are evenly arranged along the circumference of the air inlet cover and the lower flange of the kettle body.

[0020] As described above, the utility model is a silicon material cleaning device, which has the following beneficial effects: the utility model has the advantages of simple structure, convenient disassembly and assembly, good cleaning effect, etc. By changing the sealing structure, the double-layer seal in the prior art is changed to a single-layer seal, which reduces the complexity of the structure. At the same time, the utility model also arranges a protrusion on the reaction plate, so that the airflow can enter from the bottom to drive the silicon material to surge and clean, thereby enhancing the air holding effect and improving the cleaning effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 Shown is a structural schematic diagram of a silicon material cleaning device provided by the utility model.

[0022] Figure 2It is a cross-sectional schematic diagram of a reaction plate in one embodiment of the present invention.

[0023] Figure 3 It is a cross-sectional schematic diagram of an air intake cover in one embodiment of the utility model.

[0024] Figure 4 It is shown in one embodiment of the present utility model Figure 1 Schematic diagram of the structure of local A in the figure.

[0025] Component number description

[0026] 100, reactor body; 110, feed port; 111, reactor body feed flange; 120, air inlet; 121, reactor body lower flange; 130, liquid inlet pipe;

[0027] 200, feeding cover;

[0028] 300, air intake cover; 310, air intake pipe; 320, fixing groove; 330, sealing groove;

[0029] 400, reaction plate; 401, vent hole; 402, protrusion;

[0030] 500, filter; 510, filter card strip;

[0031] 600, sealing element; 610, sealing head; 620, sealing tail;

[0032] 700. Connectors. DETAILED DESCRIPTION

[0033] The following describes the implementation of the present invention through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification. The present invention can also be implemented or applied through other different specific implementations, and the details in this specification can also be modified or changed in various ways based on different viewpoints and applications without departing from the spirit of the present invention. It should be noted that the following embodiments and the features in the embodiments can be combined with each other without conflict. It should also be understood that the terms used in the embodiments of the present invention are intended to describe specific implementation schemes, rather than to limit the scope of protection of the present invention. The test methods for which specific conditions are not specified in the following examples are usually carried out under conventional conditions or under the conditions recommended by the manufacturers.

[0034] See also Figures 1 to 4It should be noted that the structures, proportions, sizes, etc. illustrated in the drawings in this specification are only used to match the contents disclosed in the specification for people familiar with this technology to understand and read, and are not used to limit the limiting conditions for the implementation of the utility model, so they have no substantial technical significance. Any structural modification, change in proportion relationship or adjustment of size, without affecting the effects and purposes that can be achieved by the utility model, should still fall within the scope of the technical content disclosed by the utility model. At the same time, the terms such as "upper", "lower", "left", "right", "middle" and "one" quoted in this specification are only for the convenience of description, and are not used to limit the scope of the implementation of the utility model. The change or adjustment of their relative relationship should also be regarded as the scope of the implementation of the utility model without substantially changing the technical content.

[0035] The utility model provides a cleaning device for silicon material, which relates to the technical field of polysilicon production, and can be specifically applied to cleaning polysilicon material. The utility model changes the double-layer seal in the prior art into a single-layer seal by changing the seal structure, thereby reducing the complexity of the structure. At the same time, the utility model also sets a protrusion on the reaction plate, so that the airflow can enter from the bottom to drive the silicon material to surge and clean, thereby enhancing the air holding effect. The following is a detailed description through specific embodiments.

[0036] See also Figure 1 , Figure 1The schematic diagram of the structure of a silicon material cleaning device provided by the utility model is shown. In one embodiment of the utility model, the silicon material cleaning device may include a reactor body 100, a feeding cover 200, an air inlet cover 300 and a reaction plate 400. Among them, the reactor body 100 is a hollow reaction container, and the interior thereof is a space for cleaning polysilicon material. A feeding port 110 and an air inlet 120 are provided on the side wall of the reactor body 100. Specifically, the feeding port 110 may be provided on the top side of the reactor body 100, and may be used to place the polysilicon material to be cleaned. A reactor body feeding flange 111 is provided on the outer edge of the feeding port 110. The air inlet 120 may be provided at the bottom of the reactor body 100. A reactor body lower flange 121 is provided on the outer edge of the air inlet 120. A liquid inlet pipe 130 is provided on the top of the reactor body 100. The liquid inlet pipe 130 can be used to pass a solution into the reactor body 100, for example, an acid solution or pure water for cleaning can be passed in. The feeding cover 200 can be connected to the feeding port 110. Specifically, the shape of the feeding cover 200 is adapted to the shape of the reactor body feeding flange 111, and the feeding cover 200 can be sealed and connected to the reactor body feeding flange 111. The air intake cover 300 can be connected to the lower flange 121 of the reactor body. Specifically, the shape of the air intake cover 300 is adapted to the shape of the lower flange 121 of the reactor body, and the air intake cover 300 can be sealed and connected to the lower flange 121 of the reactor body. An air intake pipe 310 is provided on the air intake cover 300, and the air intake pipe 310 can be used to pass compressed air. The reaction plate 400 can be located at the connection between the air intake cover 300 and the lower flange 121 of the reactor body. The reaction plate 400 can be used to support the polysilicon material to be cleaned.

[0037] See also Figure 2 , Figure 2It is a cross-sectional schematic diagram of a reaction plate 400 in an embodiment of the utility model. In an embodiment of the utility model, the shape of the reaction plate 400 needs to be compatible with the shape of the air inlet cover 300. The reaction plate 400, the feeding cover 200 and the reactor body 100 can form a first cavity, and the reaction plate 400 and the air inlet cover 300 can form a second cavity. A plurality of vents 401 are evenly provided on the reaction plate 400. The vents 401 can be used to introduce the gas at the bottom of the reaction plate 400 into the top of the reaction plate 400, that is, to introduce the compressed air in the second cavity into the first cavity. A plurality of protrusions 402 are provided on the side of the reaction plate 400 that contacts the polycrystalline silicon material. The protrusions 402 can play a role in supporting the polycrystalline silicon material, thereby preventing the polycrystalline silicon material from being attached to the surface of the reaction plate 400 and affecting the cleaning effect. The plurality of protrusions 402 can be distributed in an array on the surface of the reaction plate 400. The distance between adjacent protrusions 402 needs to be smaller than the geometric dimensions of the polycrystalline silicon material. The protrusion 402 may be a hemisphere, a cylinder or a cuboid, etc., preferably a hemisphere. The diameter of the protrusion 402 may be in the range of 5 mm to 10 mm. In this embodiment, the compressed air first enters the second cavity through the air inlet pipe 310, and then enters the first cavity after passing through the vent hole 401. Due to the supporting effect of the protrusion 402, a secondary circulation space of gas is formed between the reaction plate 400 and the polysilicon material, so that the polysilicon material surges up and down under the action of the air flow, achieving a deep cleaning effect.

[0038] See also Figure 3 , Figure 3 The cross-sectional schematic diagram of the air intake cover 300 in one embodiment of the utility model is shown. In one embodiment of the utility model, the air intake cover 300 is provided with a fixing groove 320 and a sealing groove 330. The fixing groove 320 and the sealing groove 330 are both located on the side of the air intake cover 300 facing the lower flange 121 of the kettle body, and the fixing groove 320 and the sealing groove 330 are both opened along the contour of the contact surface between the air intake cover 300 and the lower flange 121 of the kettle body. In this embodiment, the sealing groove 330 is located on the radial outer side of the fixing groove 320.

[0039] See also Figure 4 , Figure 4 It is shown in one embodiment of the present utility model Figure 1Schematic diagram of the structure of part A in the figure. In one embodiment of the utility model, the cleaning device for silicon material also includes a filter 500, a seal 600 and a connector 700. Among them, the filter 500 can be connected to the air inlet cover 300, and the filter 500 is attached to the side of the reaction plate 400 that contacts the polysilicon material. A filter clamping strip 510 is arranged around the filter 500. The shape of the filter clamping strip 510 is adapted to the shape of the fixing groove 320, so that the filter clamping strip 510 can be clamped in the fixing groove 320 to fix the filter 500. The seal 600 can be located at the connection between the air inlet cover 300 and the lower flange 121 of the kettle body. The seal 600 may include a sealing head 610 and a sealing tail 620. The cross section of the sealing head 610 is circular, the cross section of the sealing tail 620 is long strip, the sealing tail 620 is connected to one side of the sealing tail 620, thereby forming a P-shaped cross section, and the sealing head 610 is located at the outer ring of the sealing tail 620. In this embodiment, the sealing head 610 can be snapped into the sealing groove 330. The connector 700 can connect the air inlet cover 300 and the lower flange 121 of the kettle body. Specifically, a plurality of connectors 700 are evenly arranged along the circumference of the air inlet cover 300 and the lower flange 121 of the kettle body to form a seal. Figure 4 As shown, the seal 600 is in direct contact with the lower flange 121 of the kettle body. From bottom to top, the reaction plate 400, the filter screen 500 and the seal 600 are sequentially nested in the connection between the seal 600 and the lower flange 121 of the kettle body.

[0040] See also Figures 1 to 4 In one embodiment of the utility model, when cleaning the polysilicon material, first, install the air inlet cover 300, the reaction plate 400, the filter screen 500, the seal 600 and the connector 700 to the corresponding positions. Then, the polysilicon material to be cleaned is evenly placed on the reaction plate 400 through the feeding port 110, and the feeding cover 200 is sealed and connected to the feeding flange 111 of the kettle body. Then, a predetermined amount of acidic solution is introduced into the reactor body 100 through the liquid inlet pipe 130. At the same time, compressed air is introduced into the reactor body 100 through the air inlet pipe 310, so that the polysilicon material surges up and down in the solution, and is fully mixed and reacted with the acidic solution, so as to achieve the purpose of deep cleaning. Finally, the acidic solution is discharged and pure water is introduced for cleaning. Repeat the above steps for multiple cycles of cleaning to achieve the effect of cleaning and impurity removal. It should be noted that during the cleaning process, compressed air needs to be continuously introduced into the reactor body 100 through the air inlet pipe 310 to improve the cleaning effect and the efficiency of water and acid removal. The pressure of the compressed air can be set in the range of 0.1 to 0.5 MPa. For example, the reactor body 100 can be set to a constant 0.3 MPa. In order to maintain a constant pressure in the reactor body 100, a constant pressure valve can be set at the top of the reactor body 100.

[0041] In summary, the utility model proposes a cleaning device for silicon material, which has the advantages of simple structure, convenient disassembly and assembly, and good cleaning effect. The utility model adopts a P-type sealing ring with a small cross-sectional area, which can evenly reduce the number of installed connectors while achieving a sealing effect, thereby reducing the work intensity. At the same time, the utility model nests the reaction plate at the connection between the air inlet cover and the lower flange of the kettle body, reducing the number of seals used and reducing the risk of leakage. In addition, the utility model evenly arranges multiple protrusions on the upper end of the reaction plate, so that the filter screen will not be firmly attached to the upper end of the reaction plate after evenly carrying the polysilicon material. After the compressed air passes through the vent hole, there is a secondary circulation space here, which enhances the air holding effect, so that the upper silicon material can surge up and down under the action of the air flow, thereby achieving the purpose of improving the cleaning effect. Therefore, the utility model effectively overcomes the various shortcomings of the prior art and has a high industrial utilization value.

[0042] The above embodiments are merely illustrative of the principles and effects of the present invention, and are not intended to limit the present invention. Anyone familiar with the technology may modify or alter the above embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or alterations made by a person of ordinary skill in the art without departing from the spirit and technical concept disclosed in the present invention shall still be covered by the claims of the present invention.

[0043] Therefore, many modifications may be made to adapt a particular environment or material to the essential scope and spirit of the present invention. The present invention is not intended to be limited to the specific terms used in the following claims and / or the specific embodiments disclosed as the best mode for carrying out the present invention, but the present invention will include any and all embodiments and equivalents falling within the scope of the appended claims. Therefore, the scope of the present invention will be determined only by the appended claims.

Claims

1. A silicon material cleaning device, characterized in that: include: The reaction kettle body is provided with a feeding port, a liquid inlet pipe and an air inlet, the outer edge of the feeding port is provided with a kettle body feeding flange, and the outer edge of the air inlet is provided with a kettle body lower flange; A feeding cover connected to the feeding flange of the kettle body; An air inlet cover is connected to the lower flange of the kettle body, and an air inlet pipe is arranged on the air inlet cover; as well as A reaction plate, located at the connection between the air inlet cover and the lower flange of the kettle body, to carry the polysilicon material to be cleaned, wherein a plurality of protrusions are arranged on the reaction plate, the protrusions are located on the side where the reaction plate contacts the polysilicon material, and the spacing between adjacent protrusions is smaller than the geometric size of the polysilicon material; A filter screen is connected to the air inlet cover, and the filter screen is attached to a side of the reaction plate in contact with the polysilicon material; The liquid inlet pipe is located at the top of the reactor body, the feed port is located at the top side of the reactor body, and the air inlet is located at the bottom of the reactor body.

2. The silicon material cleaning device according to claim 1, characterized in that: The air inlet cover is provided with a fixing groove, and the fixing groove is provided along the contour of the contact surface between the air inlet cover and the lower flange of the kettle body.

3. The silicon material cleaning device according to claim 2, characterized in that: The air inlet cover is provided with a sealing groove, which is provided along the contour of the contact surface between the air inlet cover and the lower flange of the kettle body, and is located radially outside the fixing groove.

4. The silicon material cleaning device according to claim 2, characterized in that: A filter clamping strip is arranged around the filter screen, and the filter clamping strip is clamped in the fixing groove.

5. The silicon material cleaning device according to claim 3, characterized in that: The silicon material cleaning device further comprises a sealing member, wherein the sealing member is located at the connection between the lower flange of the kettle body and the air inlet cover, and the sealing member is arranged along the contour of the lower flange of the kettle body.

6. The silicon material cleaning device according to claim 5, characterized in that: The sealing member comprises a sealing head and a sealing tail. The sealing head is connected to one side of the sealing tail, and the sealing head is clamped in the sealing groove.

7. The silicon material cleaning device according to claim 1, characterized in that: The reaction plate is provided with a plurality of ventilation holes, and the plurality of ventilation holes are evenly distributed on the surface of the reaction plate.

8. The silicon material cleaning device according to claim 1, characterized in that: The silicon material cleaning device further comprises a plurality of connecting pieces, and the plurality of connecting pieces are evenly arranged along the circumference of the air inlet cover and the lower flange of the kettle body.

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