Polishing device

Abstract

The utility model discloses a polishing device which is characterized in that the polishing device comprises a polishing assembly, a first driving assembly and a jig assembly used for containing a substrate slice, the polishing assembly comprises a polishing wheel and a plurality of polishing pads, the polishing wheel is located above the jig assembly, and a plurality of liquid gathering grooves are formed in the side face of the periphery of the polishing wheel; the multiple liquid gathering grooves are arranged around the axis of the polishing wheel at intervals, bosses are formed between the adjacent liquid gathering grooves, the polishing pads are installed on the corresponding bosses, and the first driving assembly is connected with the polishing wheel so as to drive the polishing wheel to rotate. The liquid gathering groove is provided with a liquid gathering part and liquid guiding parts, the two ends of the liquid gathering part are each connected with one liquid guiding part, and a first included angle is formed between the two liquid guiding parts so that liquid can be guided to the liquid gathering part. The special liquid collecting grooves are formed in the side face of the periphery of the polishing wheel, so that polishing liquid is guided to the liquid collecting part in the center area from the edge of the polishing wheel, and edge accumulation of the polishing liquid caused by factors such as centrifugal force is avoided.

Description

Technical Field

[0001] The utility model relates to the technical field of polishing, in particular to a polishing device. Background Art

[0002] In the traditional substrate polishing process, the uneven distribution of polishing liquid will lead to inconsistent polishing rate, reduced surface quality and possible local over-polishing or under-polishing, which seriously affects the performance and yield of products such as semiconductor devices or optical components. Since liquids naturally tend to flow to lower places, it is difficult to maintain uniform distribution in the polishing area, especially on the surface of large-sized or complex-shaped workpieces, resulting in uneven distribution of polishing liquid and affecting polishing quality. Utility Model Content

[0003] The technical problem to be solved by the utility model is that in the existing polishing process, the polishing liquid naturally tends to flow to a lower place and is difficult to maintain uniform distribution in the polishing area, especially on the surface of a workpiece with a large size or a complex shape, resulting in uneven distribution of the polishing liquid, which affects the polishing quality.

[0004] In order to solve the above technical problems, the utility model provides a polishing device, comprising a polishing assembly, a first driving assembly and a fixture assembly for placing the substrate sheet, the polishing assembly comprising a polishing wheel and a plurality of polishing pads, the polishing wheel is located above the fixture assembly, a plurality of liquid collecting grooves are provided on the outer peripheral side of the polishing wheel, the plurality of liquid collecting grooves are arranged at intervals around the axis of the polishing wheel, and bosses are formed between adjacent liquid collecting grooves, the polishing pads are mounted on the corresponding bosses, and the first driving assembly is connected to the polishing wheel to drive the polishing wheel to rotate;

[0005] The liquid collecting tank comprises a liquid collecting portion and a liquid guiding portion. Two ends of the liquid collecting portion are respectively connected to a liquid guiding portion, and a first angle is formed between the two liquid guiding portions to guide the liquid to the liquid collecting portion.

[0006] In some embodiments, the first angle is an obtuse angle.

[0007] In some embodiments, the collecting tank is V-shaped.

[0008] In some embodiments, a projection of the axis of the liquid guiding portion in the first direction forms a second angle with the axis of the polishing wheel, and the angle of the second angle is 10-20°.

[0009] In some embodiments, the first driving assembly includes a first rocker arm, a second rocker arm, a mounting seat, a rotating shaft and a driving structure, one end of the rotating shaft is connected to one end of the first rocker arm, the other end of the rotating shaft passes through the mounting seat and is connected to the other end of the second rocker arm, the two ends of the polishing wheel are respectively connected to the other end of the first rocker arm and the other end of the second rocker arm, the driving structure is installed on the first rocker arm, and the driving structure is connected to the polishing wheel.

[0010] In some embodiments, the driving structure includes a first driving member, a first driving wheel, a first driven wheel and a first synchronous belt. The first driving member is installed on the first rocker arm, the output shaft of the first driving member is connected to the first driving wheel, the first driven wheel and the first driving wheel are synchronously linked through the first synchronous belt, and the first driven wheel is connected to the polishing wheel.

[0011] In some embodiments, a second driving assembly is further included, wherein the second driving assembly is connected to the rotating shaft to drive the rotating shaft to drive the polishing assembly to rotate in a direction away from the fixture assembly or in a direction close to the fixture assembly.

[0012] In some embodiments, the second drive assembly includes a second drive member, a second driving wheel, a second driven wheel and a second synchronous belt. The second drive member is installed on a mounting seat, the output shaft of the second drive member is connected to the second driving wheel, the second driven wheel and the second driving wheel are synchronously linked through a second synchronous belt, and the second driven wheel is connected to the rotating shaft to drive the rotating shaft to rotate.

[0013] In some embodiments, the jig assembly includes a jig, a third driving member, a base, and a vacuum suction member, the jig has a suction port, the vacuum suction member is connected to the suction port, the third driving member is installed on the base, and the output shaft of the third driving member is connected to the jig to drive the jig to rotate.

[0014] In some embodiments, the fixture assembly further includes a fourth driving member, wherein the fourth driving member is connected to the base to drive the base to reciprocate along the second direction.

[0015] Compared with the prior art, the polishing device of the utility model has the following beneficial effects:

[0016] The outer peripheral side of the polishing wheel of the utility model embodiment is provided with multiple special liquid collecting grooves, and the liquid collecting groove is composed of a liquid collecting part and a liquid guiding part, wherein a first angle is formed between the two liquid guiding parts, so that the polishing liquid is guided from the edge of the polishing wheel to the liquid collecting part in the central area. The liquid collecting part is used to collect the polishing liquid, thereby avoiding edge accumulation of the polishing liquid due to factors such as centrifugal force, so that the polishing liquid can be more concentrated and evenly covered on the surface of the substrate during the polishing process, thereby solving the problem of uneven distribution of the polishing liquid in traditional polishing. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a structural schematic diagram of a polishing device provided by an embodiment of the utility model;

[0018] Figure 2 It is a structural schematic diagram of a polishing assembly, a first driving assembly and a second driving assembly provided by an embodiment of the utility model at a first angle;

[0019] Figure 3 It is a structural schematic diagram of a polishing assembly, a first driving assembly and a second driving assembly provided by an embodiment of the utility model at a second angle;

[0020] Figure 4 It is a structural schematic diagram of a polishing assembly provided in an embodiment of the utility model;

[0021] Figure 5 It is a side view of a polishing assembly provided by an embodiment of the utility model at a first angle;

[0022] Figure 6 It is a structural schematic diagram of a fixture assembly provided by an embodiment of the utility model;

[0023] In the figure, 1, substrate sheet; 2, polishing assembly; 21, polishing wheel; 211, liquid collecting tank; 2111, liquid collecting part; 2112, liquid guiding part; 212, boss; 22, polishing pad; 3, first driving assembly; 31, first rocker arm; 32, second rocker arm; 33, mounting seat; 34, rotating shaft; 35, driving structure; 351, first driving member; 352, first driving wheel; 353, first driven wheel; 354, first synchronous belt; 4, fixture assembly; 41, fixture; 42, third driving member; 43, base; 44, fourth driving member; 5, second driving assembly; 51, second driving member; 52, second driving wheel; 53, second driven wheel; 54, second synchronous belt; R1, first angle; R2, second angle. DETAILED DESCRIPTION

[0024] The following is a further detailed description of the specific implementation of the present invention in conjunction with the accompanying drawings and examples. The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

[0025] like Figure 1 As shown, the utility model provides a polishing device, including a polishing assembly 2, a first driving assembly 3 and a fixture assembly 4 for placing a substrate sheet 1, the polishing assembly 2 includes a polishing wheel 21 and a plurality of polishing pads 22, the polishing wheel 21 is located above the fixture assembly 4, a plurality of liquid collecting grooves 211 are provided on the outer peripheral side of the polishing wheel 21, the plurality of liquid collecting grooves 211 are arranged at intervals around the axis of the polishing wheel 21, and a boss 212 is formed between adjacent liquid collecting grooves 211, the polishing pad 22 is installed on the corresponding boss 212, the first driving assembly 3 is connected to the polishing wheel 21 to drive the polishing wheel 21 to rotate; the liquid collecting groove 211 has a liquid collecting portion 2111 and a liquid guiding portion 2112, the two ends of the liquid collecting portion 2111 are respectively connected to a liquid guiding portion 2112, and a first angle R1 is formed between the two liquid guiding portions 2112 to guide the liquid to the liquid collecting portion 2111.

[0026] Based on the above structure, a plurality of special liquid collecting grooves 211 are provided on the outer side of the polishing wheel 21, and the liquid collecting groove 211 is composed of a liquid collecting portion 2111 and a liquid guiding portion 2112, wherein a first angle R1 is formed between the two liquid guiding portions 2112, so that the polishing liquid is guided from the edge of the polishing wheel 21 to the liquid collecting portion 2111 in the central area, and the liquid collecting portion 2111 is used to collect the polishing liquid, thereby avoiding edge accumulation of the polishing liquid due to centrifugal force and other factors, so that the polishing liquid can be more concentrated and evenly covered on the surface of the substrate 1 during the polishing process, thereby solving the problem of uneven distribution of the polishing liquid in traditional polishing.

[0027] In some embodiments, the first angle R1 is an obtuse angle, so as to provide a wider and smoother transition zone for the liquid flow, help reduce the resistance of the liquid flow, promote the liquid to smoothly converge from the liquid guide portion 2112 to the liquid collection portion 2111, and avoid the liquid retention or turbulence phenomenon that may be caused by too small an angle at the corner. In addition, the obtuse angle can increase the effective collection area of ​​the liquid collection portion 2111, so that more polishing liquid can be concentrated in a shorter time to quickly form a stable polishing liquid collection area, thereby ensuring that sufficient and uniform liquid supply is continuously provided to the polishing interface during the polishing process.

[0028] In some embodiments, the liquid collecting groove 211 is V-shaped, which promotes the polishing liquid to concentrate at the bottom of the liquid collecting groove 211 (i.e., the liquid collecting portion 2111). When the polishing liquid flows along the liquid guiding portion 2112, the V-shaped structure can more effectively utilize the surface tension, accelerate the liquid convergence process to the central area, and ensure the liquid gathering efficiency; at the same time, it reduces the flow resistance and the generation of eddy currents to maintain the stability of the polishing liquid flow and avoid local liquid accumulation or uneven polishing caused by poor flow.

[0029] In some embodiments, the projection of the axis of the liquid guide portion 2112 in the first direction forms a second angle R2 with the axis of the polishing wheel 21, and the angle of the second angle R2 is 10-20 degrees. Based on the above angle, when the polishing wheel 21 rotates, it can cause the polishing liquid to produce a slight lateral deviation or vortex effect in the process of flowing to the liquid collecting portion 2111, which helps the liquid to spread more evenly on the polishing pad 22, reduce the occurrence of local liquid accumulation or dry areas, and reduce the polishing rate difference caused by uneven liquid distribution, thereby improving the overall polishing efficiency and the uniformity of surface treatment.

[0030] It should be noted that the first direction of this embodiment is a direction looking directly at the corresponding liquid collecting tank 211 .

[0031] In some embodiments, the first driving component 3 includes a first rocker arm 31, a second rocker arm 32, a mounting seat 33, a rotating shaft 34 and a driving structure 35. The mounting seat 33 plays a role of fixing and supporting. One end of the rotating shaft 34 is connected to one end of the first rocker arm 31, and the other end of the rotating shaft 34 passes through the mounting seat 33 and is connected to the other end of the second rocker arm 32. The two ends of the polishing wheel 21 are respectively connected to the other end of the first rocker arm 31 and the other end of the second rocker arm 32, forming a swingable linkage structure to drive the polishing wheel 21 to swing up and down; the driving structure 35 is installed on the first rocker arm 31, and the driving structure 35 is connected to the polishing wheel 21.

[0032] In some embodiments, the driving structure 35 includes a first driving member 351, a first driving wheel 352, a first driven wheel 353 and a first synchronous belt 354. The first driving member 351 is installed on the first swing rod 31. The output shaft of the first driving member 351 is connected to the first driving wheel 352. The first driving wheel 352 is used to receive the rotational power from the first driving member 351. The first driven wheel 353 and the first driving wheel 352 are synchronously linked through the first synchronous belt 354. The first driven wheel 353 is connected to the polishing wheel 21, so that the driven wheel receives the power transmitted by the driving wheel and further transmits it to the polishing wheel 21. The first driving member 351 of this embodiment is a motor.

[0033] In some embodiments, a second driving assembly 5 is further included. The second driving assembly 5 is connected to the rotating shaft 34 to drive the rotating shaft 34 to drive the polishing assembly 2 to rotate in a direction away from the fixture assembly 4 or in a direction close to the fixture assembly 4 .

[0034] By connecting the second drive assembly 5 with the rotating shaft 34, this embodiment can adjust the rotation angle of the rotating shaft 34 as needed, thereby driving the entire polishing assembly 2 to move away from the fixture assembly 4 or toward the fixture assembly 4. This method can change the contact pressure and distance between the polishing wheel 21 and the substrate sheet 1, thereby affecting the polishing effect.

[0035] In some embodiments, the second driving assembly 5 includes a second driving member 51, a second driving wheel 52, a second driven wheel 53 and a second synchronous belt 54. The second driving member 51 is mounted on the mounting seat 33. The output shaft of the second driving member 51 is connected to the second driving wheel 52. The second driven wheel 53 and the second driving wheel 52 are synchronously linked through the second synchronous belt 54. The second driven wheel 53 is connected to the rotating shaft 34 to drive the rotating shaft 34 to rotate. The second driving member 51 of this embodiment is a downward pressure motor.

[0036] The second driving wheel 52 and the second driven wheel 53 of this embodiment are engaged with each other through the second synchronous belt 54 to form a closed transmission system, ensuring that power is transmitted from the second driving wheel 52 to the second driven wheel 53, thereby driving the rotating shaft 34. Through the second driving member 51, this embodiment can accurately control the rotation speed and direction of the rotating shaft 34, thereby controlling the movement of the polishing assembly 2, so that the polishing wheel 21 can move away from or close to the fixture assembly 4 to adjust the polishing pressure or meet the needs of different polishing stages.

[0037] In some embodiments, the jig assembly 4 includes a jig 41, a third driving member 42, a base 43, and a vacuum adsorption member. The jig 41 has an adsorption port, and the vacuum adsorption member is connected to the adsorption port to ensure that the substrate sheet 1 is firmly adsorbed to prevent movement or falling off during the polishing process; the third driving member 42 is installed on the base 43, and the output shaft of the third driving member 42 is connected to the jig 41 to drive the jig 41 to rotate, so as to ensure that all parts of the substrate sheet 1 can evenly contact the polishing wheel 21, thereby improving the uniformity and overall quality of polishing. The third driving member 42 of this embodiment is a rotating motor.

[0038] In some embodiments, the fixture assembly 4 further includes a fourth driving member 44, which is connected to the base 43 to drive the base 43 to reciprocate along the second direction, so as to continuously change the contact point between the substrate sheet 1 and the polishing pad 22 during the polishing process, reduce the problem of local overheating or over-polishing, and make the polishing effect of the entire substrate sheet 1 surface more uniform, while also improving the material removal rate and shortening the polishing cycle. The fourth driving member 44 of this embodiment is a linear motor, and the second direction is the length direction of the linear motor.

[0039] The specific working process is as follows:

[0040] The substrate sheet 1 is mounted on the fixture 41, and its vacuum suction part provides vacuum suction to fix the substrate sheet 1; the first driving member 351 rotates, driving the polishing wheel 21 to rotate through the first active wheel 352, the first synchronous belt 354 and the first driven wheel 353; the second driving member 51 rotates, driving the first rocker arm 31 through the second active wheel 52, the second synchronous belt 54 and the second driven wheel 53, pressing down the polishing wheel 21 until the polishing pad 22 contacts the substrate sheet 1; the third driving member 42 and the fourth driving member 44 move, driving the substrate sheet 1 to rotate and reciprocate, and the polishing operation begins.

[0041] In summary, an embodiment of the utility model provides a polishing device, wherein a plurality of special liquid collecting grooves 211 are provided on the outer peripheral side of the polishing wheel 21, and the liquid collecting groove 211 is composed of a liquid collecting portion 2111 and a liquid guiding portion 2112, wherein a first angle R1 is formed between the two liquid guiding portions 2112, so that the polishing liquid is guided from the edge of the polishing wheel 21 to the liquid collecting portion 2111 in the central area, and the liquid collecting portion 2111 is used to collect the polishing liquid, thereby avoiding edge accumulation of the polishing liquid due to centrifugal force and other factors, so that the polishing liquid can be more concentrated and evenly covered on the surface of the substrate sheet 1 during the polishing process, thereby solving the problem of uneven distribution of the polishing liquid in traditional polishing.

[0042] The above is only a preferred embodiment of the present invention. It should be pointed out that for ordinary technicians in this technical field, several improvements and substitutions can be made without departing from the technical principle of the present invention. These improvements and substitutions should also be regarded as the protection scope of the present invention.

Claims

1. A polishing device, characterized in that: The invention comprises a polishing assembly, a first driving assembly and a fixture assembly for placing a substrate sheet, wherein the polishing assembly comprises a polishing wheel and a plurality of polishing pads, wherein the polishing wheel is located above the fixture assembly, and a plurality of liquid collecting grooves are provided on the outer peripheral side surface of the polishing wheel, wherein the plurality of liquid collecting grooves are arranged at intervals around the axis of the polishing wheel, and bosses are formed between adjacent liquid collecting grooves, wherein the polishing pads are mounted on the corresponding bosses, and the first driving assembly is connected to the polishing wheel to drive the polishing wheel to rotate; The liquid collecting tank comprises a liquid collecting portion and a liquid guiding portion. Two ends of the liquid collecting portion are respectively connected to a liquid guiding portion, and a first angle is formed between the two liquid guiding portions to guide the liquid to the liquid collecting portion.

2. The polishing device according to claim 1, characterized in that: The first angle is an obtuse angle.

3. The polishing device according to claim 1, characterized in that: The liquid collecting tank is V-shaped.

4. The polishing device according to claim 1, characterized in that: The projection of the axis of the liquid guiding portion in the first direction forms a second angle with the axis of the polishing wheel, and the angle of the second angle is 10-20°.

5. The polishing device according to claim 1, characterized in that: The first driving assembly includes a first rocker arm, a second rocker arm, a mounting seat, a rotating shaft and a driving structure, one end of the rotating shaft is connected to one end of the first rocker arm, the other end of the rotating shaft passes through the mounting seat and is connected to the other end of the second rocker arm, the two ends of the polishing wheel are respectively connected to the other end of the first rocker arm and the other end of the second rocker arm, the driving structure is installed on the first rocker arm, and the driving structure is connected to the polishing wheel.

6. The polishing device according to claim 5, characterized in that: The driving structure includes a first driving member, a first driving wheel, a first driven wheel and a first synchronous belt. The first driving member is installed on the first rocker arm. The output shaft of the first driving member is connected to the first driving wheel. The first driven wheel and the first driving wheel are synchronously linked through the first synchronous belt. The first driven wheel is connected to the polishing wheel.

7. The polishing device according to claim 5, characterized in that: It also includes a second driving assembly, which is connected to the rotating shaft to drive the rotating shaft to drive the polishing assembly to rotate in a direction away from the fixture assembly or in a direction close to the fixture assembly.

8. The polishing device according to claim 7, characterized in that: The second driving assembly includes a second driving member, a second driving wheel, a second driven wheel and a second synchronous belt. The second driving member is installed on a mounting seat. The output shaft of the second driving member is connected to the second driving wheel. The second driven wheel and the second driving wheel are synchronously linked through a second synchronous belt. The second driven wheel is connected to the rotating shaft to drive the rotating shaft to rotate.

9. The polishing device according to claim 1, characterized in that: The jig assembly includes a jig, a third driving member, a base and a vacuum adsorption member. The jig has an adsorption port, the vacuum adsorption member is connected to the adsorption port, the third driving member is installed on the base, and the output shaft of the third driving member is connected to the jig to drive the jig to rotate.

10. The polishing device according to claim 9, characterized in that: The fixture assembly also includes a fourth driving member, which is connected to the base to drive the base to reciprocate along the second direction.

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