Open-close type shielding component and thin film deposition machine table
By designing open-close shielding members and sensing unit systems on the thin film deposition machine, the problems of particle pollution and difficulty in confirming the status of the shielding plate during the cleaning process are solved, and more efficient cleaning and equipment protection are achieved.
Patent Information
- Application Number
- CN202122361667.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2021-09-28
- Publication Date
- 2025-05-02
- Estimated Expiration
- 2031-09-28
AI Technical Summary
During the cleaning process of the thin film deposition machine, particles are prone to contaminate the carrier disk, resulting in the need to isolate the carrier disk and pollutants. The prior art is difficult to effectively confirm the opening and shielding status of the shielding plate, which may lead to pollution or damage.
An open-closed shielding member is designed, and the two shielding plates are driven to swing in opposite directions through the drive device, so that they can be switched between the opening and the shielding state. The first and second sensing units are used to sense the rotation angle or position of the outer tube body and the shaft body to confirm the operating state of the shielding plate.
It effectively avoids particles contamination of the carrier disk during cleaning, ensures that the shielding plate operates in the correct state, avoids pollution and damage, and improves the cleaning efficiency of the film deposition machine and the reliability of the equipment.
Smart Images

Figure CN222821638U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to a thin film deposition machine with an openable shielding component, which mainly senses the rotation angle of the outer tube and / or the shaft of the shaft sealing device through a sensing unit to confirm whether the shielding plate is correctly operated in the shielding state and the opening state. Background Art
[0002] Chemical vapor deposition (CVD), physical vapor deposition (PVD) and atomic layer deposition (ALD) are all commonly used thin film deposition equipment and are widely used in the manufacturing processes of integrated circuits, light emitting diodes and displays.
[0003] The deposition equipment mainly includes a chamber and a wafer carrier, wherein the wafer carrier is located in the chamber and is used to carry at least one wafer. Taking physical vapor deposition as an example, a target material needs to be set in the chamber, wherein the target material faces the wafer on the wafer carrier. When performing physical vapor deposition, an inert gas and / or a reactive gas can be delivered into the chamber to apply bias voltage to the target material and the wafer carrier respectively, and the wafer carried by the wafer carrier is heated.
[0004] The inert gas in the chamber is ionized by the high voltage electric field, and the ionized inert gas is attracted by the bias voltage on the target and bombards the target. The target atoms or molecules sputtered from the target are attracted by the bias voltage on the wafer carrier and deposited on the surface of the heated wafer to form a thin film on the surface of the wafer.
[0005] After a period of use, a deposited film will form on the inner surface of the chamber, so the chamber needs to be cleaned periodically to prevent the deposited film from falling off during the process and contaminating the wafer. In addition, oxides or other contaminants may form on the surface of the target, so the target also needs to be cleaned periodically. Generally speaking, a burn-in process is usually performed to bombard the target in the chamber with plasma ions to remove oxides or other contaminants on the surface of the target.
[0006] When cleaning the chamber and the target, it is necessary to remove the wafer carrier and the wafer in the chamber, or isolate the wafer carrier to avoid contamination of the wafer carrier and the wafer during the cleaning process. Utility Model Content
[0007] Generally speaking, after a period of use, a thin film deposition machine usually needs to be cleaned to remove the oxides or nitrides on the thin film deposited in the chamber and the target material. The particles generated during the cleaning process will contaminate the carrier plate, so it is necessary to isolate the carrier plate and the contaminants. The utility model proposes an openable shielding component and a thin film deposition machine with an openable shielding component, which mainly drives two shielding plates to swing in opposite directions through a driving device, so that the two shielding plates operate in an open state and a shielding state.
[0008] When cleaning the reaction chamber, the driving device drives the two shielding plates to swing closer to each other, so that the two shielding plates are close to each other and shield the carrier in the accommodating space to prevent the plasma used in the cleaning process or the contamination generated from contacting the carrier and / or the substrate it carries. When performing a deposition process, the driving device drives the two shielding plates to swing away from each other to perform thin film deposition on the substrate in the reaction chamber.
[0009] One purpose of the utility model is to provide a thin film deposition machine with an openable shielding member, which mainly includes a reaction chamber, a carrier plate and an openable shielding member. The openable shielding member includes a driving device, two shielding plates, two first sensing units and two first sensing units, wherein the driving device connects and drives the two shielding plates to swing in opposite directions, so that the two shielding plates operate in an open state and a shielding state.
[0010] The driving device includes two driving motors and a shaft sealing device, wherein the two driving motors respectively drive the two shielding plates to rotate through the outer tube body and the shaft body of the shaft sealing device. The two first sensing units are adjacent to the outer tube body, and are respectively used to sense the outer tube body rotating to a first position (or a first angle) and a second position (or a second angle). The two second sensing units are adjacent to the shaft body, and are respectively used to sense the shaft body rotating to a third position (or a third angle) and a fourth position (or a fourth angle). When the outer tube body rotates to the first position and the shaft body rotates to the third position, the two shielding plates operate in the open state. When the outer tube body rotates to the second position and the shaft body rotates to the fourth position, the two shielding plates operate in the shielding state.
[0011] By using the first sensing unit and the second sensing unit, it is possible to confirm whether the outer tube and the shaft are rotated to the default position, and to confirm whether the two shielding plates are in the open state and the shielding state. This can prevent the burn-in process from being performed when the two shielding plates are not actually in the shielding state, thereby contaminating the reaction chamber. It can also prevent the two shielding plates from being driven to move when they are not actually in the open state, thereby causing damage to the shielding plates and the carrier.
[0012] In order to achieve the above-mentioned purpose, the utility model proposes a thin film deposition machine, comprising: a reaction chamber, comprising a accommodating space; a carrier plate, located in the accommodating space and used to carry at least one substrate; and an openable and closable shielding member, comprising: a first shielding plate, located in the accommodating space; a second shielding plate, located in the accommodating space; a driving device, comprising: at least one driving motor; a shaft sealing device, comprising an outer tube body and a shaft body, the shaft body is located in the outer tube body, wherein the driving motor is connected to the first shielding plate through the outer tube body, and is connected to the second shielding plate through the shaft body, and the driving motor drives the first shielding plate and the second shielding plate through the outer tube body and the shaft body respectively The two shielding plates swing in opposite directions so that the first shielding plate and the second shielding plate switch between an open state and a shielding state, wherein the first shielding plate in the shielding state is close to the second shielding plate and blocks the carrier plate, and a spacing space is formed between the first shielding plate and the second shielding plate in the open state; and two first sensing units are adjacent to the outer tube body, with a spacing between the two first sensing units, and are respectively used to sense the outer tube body rotating to a first position and a second position, wherein when the outer tube body rotates to the first position, the first shielding plate operates in the open state, and when the outer tube body rotates to the second position, the first shielding plate operates in the shielding state.
[0013] The utility model proposes an opening and closing shielding component, which is suitable for a thin film deposition machine, including: a first shielding plate; a second shielding plate; a driving device, including: at least one driving motor; a shaft sealing device, including an outer tube body and a shaft body, the shaft body is located in the outer tube body, wherein the driving motor is connected to the first shielding plate through the outer tube body, and is connected to the second shielding plate through the shaft body, and the driving motor drives the first shielding plate and the second shielding plate to swing in opposite directions through the outer tube body and the shaft body respectively, so that the first shielding plate and the second shielding plate switch between an open state and a shielding state, wherein the first shielding plate in the shielding state is close to the second shielding plate, and a spacing space is formed between the first shielding plate and the second shielding plate in the open state; and two first sensing units, which are adjacent to the outer tube body, have a spacing between the two first sensing units, and are respectively used to sense the outer tube body rotating to a first position and a second position, wherein when the outer tube body rotates to the first position, the first shielding plate operates in the open state, and when the outer tube body rotates to the second position, the first shielding plate operates in the shielding state.
[0014] The thin film deposition machine and the opening and closing shielding component include two second sensing units adjacent to the shaft, with a distance between the two second sensing units, and are respectively used to sense the shaft rotating to a third position and a fourth position, wherein when the shaft rotates to the third position, the second shielding plate operates in an open state, and when the shaft rotates to the fourth position, the second shielding plate operates in a shielding state.
[0015] The thin film deposition machine and the opening and closing shielding component include a first protruding unit and a second protruding unit, the first protruding unit is connected to the outer tube body, and the second protruding unit is connected to the shaft body, wherein the first protruding unit rotates with the outer tube body and is sensed by the first sensing unit, and the second protruding unit rotates with the shaft body and is sensed by the second sensing unit.
[0016] The thin film deposition machine and the opening and closing shielding component, wherein the driving motor includes a first driving motor and a second driving motor, the first driving motor is connected through an outer tube body and drives the first shielding plate, and the second driving motor is connected through a shaft body and drives the second shielding plate.
[0017] The thin film deposition machine and the openable shielding component include two sensing areas connected to the reaction chamber, and two shielding plate position sensing units are respectively arranged in the two sensing areas to respectively sense the first shielding plate and the second shielding plate entering the sensing area.
[0018] The thin film deposition machine and the openable shielding component, wherein the first driving motor is connected through a transmission unit and drives the outer tube body to rotate.
[0019] The beneficial effect of the utility model is to provide a novel opening and closing shielding component and a thin film deposition machine, which can sense the rotation angle or position of the shaft sealing device through a sensing unit to confirm whether the shielding plate is operating in a shielding state or an open state. BRIEF DESCRIPTION OF THE DRAWINGS
[0020] Figure 1 It is a side cross-sectional schematic diagram of an embodiment of the thin film deposition machine with an openable and closable shielding member of the present invention operating in a shielding state.
[0021] Figure 2 It is a three-dimensional schematic diagram of an embodiment of an openable and closable shielding component of a thin film deposition machine of the utility model operating in an open state.
[0022] Figure 3 It is a three-dimensional schematic diagram of an embodiment of an openable and closable shielding component of a thin film deposition machine of the utility model operating in a shielding state.
[0023] Figure 4 It is a three-dimensional cross-sectional schematic diagram of an embodiment of a driving device for an openable and closable shielding member of the utility model.
[0024] Figure 5 It is a top view of an embodiment of a driving device for an openable and closable shielding member of the utility model.
[0025] Figure 6 It is a three-dimensional schematic diagram of an embodiment of a driving device for an openable and closable shielding member of the utility model.
[0026] Figure 7 It is a three-dimensional schematic diagram of an embodiment of the linkage mechanism of the opening and closing shielding component of the utility model.
[0027] Explanation of reference numerals: 10-thin film deposition machine; 100-opening and closing shielding member; 110-reaction chamber; 111-blocking member; 112-opening; 113-sensing area; 115-carrying plate; 12-accommodating space; 120-sensing space; 121-cleaning space; 131-first sensing unit; 133-second sensing unit; 135-first protruding unit; 137-second protruding unit; 141-first connecting arm; 143-second connecting arm; 15-shielding member; 151-first Shielding plate; 152-partition space; 153-second shielding plate; 161-target material; 163-substrate; 17-driving device; 170-driving motor; 171-first driving motor; 173-second driving motor; 175-shaft sealing device; 1751-outer tube body; 1752-space; 1753-shaft body; 1755-transmission unit; 18-linking mechanism; 181-driving gear; 183-first driven gear; 185-second driven gear; 19-shielding plate position sensing unit. DETAILED DESCRIPTION
[0028] See also Figure 1 , is a side cross-sectional schematic diagram of an embodiment of the thin film deposition machine with an open-close shielding member of the present invention operating in a shielding state. As shown in the figure, the thin film deposition machine 10 mainly includes a reaction chamber 110, a carrier plate 115 and an open-close shielding member 100, wherein the reaction chamber 110 includes a receiving space 12 for receiving the carrier plate 115 and part of the open-close shielding member 100.
[0029] The carrier plate 115 is located in the accommodation space 12 of the reaction chamber 110 and is used to carry at least one substrate 163. Taking the thin film deposition machine 10 as a physical vapor deposition chamber as an example, a target 161 is disposed in the reaction chamber 110, wherein the target 161 faces the substrate 163 and the carrier plate 115. For example, the target 161 can be disposed on the upper surface of the reaction chamber 110 and faces the carrier plate 115 and / or the substrate 163 located in the accommodation space 12.
[0030] Please refer to Figure 2 and Figure 3 The retractable shielding member 100 includes a first shielding plate 151, a second shielding plate 153 and a driving device 17, wherein the first shielding plate 151 and the second shielding plate 153 are located in the accommodating space 12. The driving device 17 connects the first shielding plate 151 and the second shielding plate 153, and drives the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, for example, the first shielding plate 151 and the second shielding plate 153 swing synchronously with the driving device 17 as the axis.
[0031] In an embodiment of the present invention, the driving device 17 connects a first connecting arm 141 and a second connecting arm 143 , and respectively connects and drives the first shielding plate 151 and the second shielding plate 153 to swing or rotate in opposite directions through the first connecting arm 141 and the second connecting arm 143 .
[0032] The first shielding plate 151 and the second shielding plate 153 may be plates, wherein the areas and shapes of the first shielding plate 151 and the second shielding plate 153 may be similar, for example, the first shielding plate 151 and the second shielding plate 153 may be semicircular plates. When the driving device 17 drives the first shielding plate 151 and the second shielding plate 153 to close, the first shielding plate 151 and the second shielding plate 153 will be close to each other to form a circular shielding member 15, and the shielding member 15 will shield the carrier plate 115 and / or the substrate 163.
[0033] The first shielding plate 151 and the second shielding plate 153 described in the embodiment of the utility model are operated in a shielding state or the first shielding plate 151 and the second shielding plate 153 are connected, which can be defined as the first shielding plate 151 and the second shielding plate 153 approaching each other until the distance therebetween is less than a threshold value, for example, less than 1 mm, so as to prevent the first shielding plate 151 and the second shielding plate 153 from generating particles during the contact process and contaminating the accommodating space 12 and / or the carrier plate 115 of the reaction chamber 110.
[0034] The first shielding plate 151 and the second shielding plate 153 are similar in area and shape, and the semicircular plate body is only an embodiment of the present invention, and is not a limitation of the scope of the present invention. In actual application, the first shielding plate 151 and the second shielding plate 153 can be plates with different areas and shapes, and can also be square, oval or any geometric shape. For example, the area of the first shielding plate 151 can be larger than the area of the second shielding plate 153.
[0035] In one embodiment of the present invention, Figure 4 As shown, the driving device 17 includes a first driving motor 171, a second driving motor 173 and a shaft sealing device 175, wherein the shaft sealing device 175 includes an outer tube 1751 and a shaft 1753. The outer tube 1751 includes a space 1752 for accommodating the shaft 1753, wherein the outer tube 1751 and the shaft 1753 are coaxially arranged, and the outer tube 1751 and the shaft 1753 can rotate relative to each other. The first driving motor 171 is connected to the first connecting arm 141 through the outer tube 1751, and is connected to and drives the first shielding plate 151 to swing through the first connecting arm 141. The second driving motor 173 is connected to the second connecting arm 143 through the shaft 1753, and is connected to and drives the second shielding plate 153 to swing through the second connecting arm 143.
[0036] The shaft seal device 175 may be a common shaft seal, which is mainly used to isolate the containing space 12 of the reaction chamber 110 from the external space to maintain the vacuum of the containing space 12. In another embodiment of the utility model, the shaft seal device 175 may be a magnetic fluid shaft seal, and includes a plurality of bearings, at least one permanent magnet, at least one pole piece and at least one magnetic fluid.
[0037] In one embodiment of the present invention, Figure 4 As shown, the first driving motor 171 drives the outer tube 1751 to rotate through a transmission unit 1755, for example, the transmission unit 1755 can be a transmission belt. Generally speaking, the rotation angle or position of the outer tube 1751 can be known by the rotation angle of the first driving motor 171, but in the process of the first driving motor 171 driving the outer tube 1751 to rotate, the transmission unit 1755 may slide relative to the first driving motor 171 and the outer tube 1751. In this way, it is impossible to correctly judge whether the outer tube 1751 rotates to the default angle or position based on the rotation angle of the first driving motor 171, and of course it is impossible to judge whether the first shielding plate 151 connected and driven by the outer tube 1751 is correctly operated in the shielding state or the open state.
[0038] To this end, the retractable shielding member 100 of the present invention further includes two first sensing units 131, wherein the two first sensing units 131 are adjacent to the outer tube 1751 of the shaft sealing device 175. There is a distance between the two first sensing units 131, for example, the two first sensing units 131 form an angle with the axis of the outer tube 1751, and are used to sense whether the outer tube 1751 is rotated to a first position (or a first angle) and a second position (or a second angle).
[0039] Specifically, when the outer tube 1751 rotates to the first position, it drives the first shielding plate 151 to rotate to the open state, and when the outer tube 1751 rotates to the second position, it drives the first shielding plate 151 to rotate to the shielding state. Since the outer tube 1751 and the first shielding plate 151 basically do not rotate relative to each other, the two first sensing units 131 can sense that the outer tube 1751 rotates to the first position or the second position, and confirm whether the first shielding plate 151 is indeed operated in the open state or the shielding state.
[0040] In an embodiment of the present invention, please refer to Figure 5 and Figure 6A first protruding unit 135 may be disposed on the outer tube 1751, wherein the first protruding unit 135 protrudes toward the radially outer side of the outer tube 1751. For example, the first protruding unit 135 may be a long strip and fixed to the outer tube 1751 by screws or welding. When the outer tube 1751 rotates, the first protruding unit 135 is driven to rotate, so that the first protruding unit 135 interferes with the first sensing unit 131.
[0041] The first sensing unit 131 includes a transmitter and a receiver, wherein the receiver continuously receives the signal emitted by the transmitter. When the first protruding unit 135 is displaced or rotated to between the transmitter and the receiver of one of the first sensing units 131, the receiver will be blocked from receiving the signal, so as to determine that the outer tube 1751 is rotated to the first position. Similarly, when another first sensing unit 131 senses the first protruding unit 135, it is determined that the outer tube 1751 is rotated to the second position.
[0042] In another embodiment of the utility model, the retractable shielding member 100 may further be provided with two second sensing units 133, wherein the two second sensing units 133 are adjacent to the shaft body 1753 of the shaft sealing device 175. There is a distance between the two second sensing units 133, and they are used to sense the shaft body 1753 rotating to a third position (or a third angle) and a fourth position (or a fourth angle), respectively.
[0043] Specifically, when the shaft 1753 rotates to the third position, the second shielding plate 153 is driven to rotate to the open state, and when the shaft 1753 rotates to the fourth position, the second shielding plate 153 is driven to rotate to the shielding state. Since the shaft 1753 and the second shielding plate 153 basically do not rotate relative to each other, the two second sensing units 133 can sense that the shaft 1753 rotates to the third position or the fourth position, and confirm whether the second shielding plate 153 is indeed rotated to the open state or the shielding state.
[0044] In one embodiment of the present invention, a second protruding unit 137 may be disposed on the shaft 1753, wherein the second protruding unit 137 protrudes along the radial direction of the shaft 1753 and interferes with the second sensing unit 133. When the second protruding unit 137 is displaced or rotated to between the transmitter and the receiver of one of the second sensing units 133, the receiver will be blocked from receiving the signal and the shaft 1753 is judged to be rotated to the third position. Similarly, when another second sensing unit 133 senses the second protruding unit 137, it is judged that the shaft 1753 is rotated to the fourth position.
[0045] In another embodiment of the present invention, the thin film deposition machine 10 may also be provided with only two sensing units (such as the second sensing unit 133), wherein the two sensing units are adjacent to the shaft 1753, and there is a distance between the two sensing units. The two sensing units are used to sense the shaft 1753 rotating to a first position and a second position, respectively, wherein when the shaft 1753 rotates to the first position, the second shielding plate 153 operates in an open state, and when the shaft 1753 rotates to the second position, the second shielding plate 153 operates in a shielding state. In addition, a protruding unit (such as the second protruding unit) may also be provided on the shaft 1753, and the protruding unit on the shaft 1753 is sensed through the sensing unit.
[0046] In the above embodiments of the present invention, the first driving motor 171 and the second driving motor 173 are mainly used as the illustrative embodiments, wherein the first driving motor 171 and the second driving motor 173 drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions through the outer tube 1751 and the shaft 1753 respectively.
[0047] In another embodiment of the present invention, Figure 7 As shown, a single driving motor 170 can be used to connect through a linkage mechanism 18 and drive the outer tube body 1751 and the shaft body 1753 to rotate in opposite directions, and the first shielding plate 151 and the second shielding plate 153 can be driven to swing in opposite directions through the outer tube body 1751 and the shaft body 1753, and switch between the open state and the shielding state.
[0048] Specifically, the linkage mechanism 18 includes a driving gear 181, a first driven gear 183 and a second driven gear 185, wherein the driving gear 181 meshes with the first driven gear 183 and the second driven gear 185. The first driven gear 183 is connected to the first shielding plate 151 through the outer tube 1751 and the first connecting arm 141, and the second driven gear 185 is connected to the second shielding plate 153 through the shaft 1753 and the second connecting arm 143. When the driving gear 181 rotates, the first driven gear 183 and the second driven gear 185 rotate in opposite directions, and drive the outer tube 1751 and the shaft 1753 to rotate in opposite directions, so as to drive the first shielding plate 151 and the second shielding plate 153 to swing synchronously in opposite directions.
[0049] When the outer tube 1751 and the shaft 1753 are driven by a single driving motor 170, the first sensing unit 131 can also be used to sense whether the outer tube 1751 has actually rotated to the first position and the second position, and the second sensing unit 133 can be used to sense whether the shaft 1753 has actually rotated to the third position and the fourth position.
[0050] Specifically, the thin film deposition machine 10 and / or the openable shielding member 100 of the present invention can be operated in two states, namely, an open state and a shielding state. Figure 2 As shown, the driving device 17 can drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 are separated from each other and operate in an open state. A spacing space 152 is formed between the first shielding plate 151 and the second shielding plate 153 in the open state, so that the first shielding plate 151 and the second shielding plate 153 do not exist between the target 161 and the carrier plate 115 and the substrate 163.
[0051] Then, the carrier plate 115 and the substrate 163 may be driven to approach the target 161 , and the gas in the accommodating space 12 , such as an inert gas, may impact the target 161 to deposit a thin film on the surface of the substrate 163 .
[0052] In one embodiment of the present invention, Figure 1 As shown, a blocking member 111 may be provided in the accommodation space 12 of the reaction chamber 110, wherein one end of the blocking member 111 is connected to the reaction chamber 110, and the other end of the blocking member 111 forms an opening 112. When the carrier plate 115 approaches the target material 161, it will enter or contact the opening 112 formed by the blocking member 111. The reaction chamber 110, the carrier plate 115 and the blocking member 111 will separate a reaction space in the accommodation space 12, and a thin film will be deposited on the surface of the substrate 163 in the reaction space, which can prevent the formation of a deposited film on the surface of the reaction chamber 110 and the carrier plate 115 outside the reaction space.
[0053] In addition, if Figure 3 As shown, the driving device 17 can drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 are close to each other and operate in a shielding state. The closed first shielding plate 151 and the second shielding plate 153 can form a shielding member 15, wherein the shielding member 15 is located between the target 161 and the carrier plate 115, and is used to isolate the target 161 and the carrier plate 115.
[0054] The shielding member 15 can separate a clean space 121 in the accommodating space 12, wherein the clean space 121 partially overlaps or is close to the reaction space. A burn-in process can be performed in the clean space 121 to clean the target 161 and the reaction chamber 110 and / or the blocking member 111 in the clean space 121, and remove oxides, nitrides or other contaminants on the surface of the target 161, and deposited films on the surface of the reaction chamber 110 and / or the blocking member 111.
[0055] During the cleaning process of the thin film deposition machine 10 , the carrier plate 115 and / or the substrate 163 are shielded or isolated by the shielding member 15 to prevent substances generated during the cleaning process from contaminating or depositing on the surface of the carrier plate 115 and / or the substrate 163 .
[0056] Specifically, the utility model comprises the first shielding plate 151 and the second shielding plate 153 to form the shielding member 15 , and the first connecting arm 141 and the second connecting arm 143 respectively bear the weight of the first shielding plate 151 and the second shielding plate 153 , thereby reducing the burden of the first connecting arm 141 and the second connecting arm 143 .
[0057] In addition, dividing the shielding member 15 into two mutually connectable and separable first shielding plate 151 and second shielding plate 153 is more conducive to reducing the storage space required for the first shielding plate 151 and the second shielding plate 153 in the open state, and can simplify or adjust the structure of the reaction chamber 110.
[0058] In one embodiment of the present invention, the first shielding plate 151 and the second shielding plate 153 can be operated in an open state and a shielding state in the accommodation space 12 of the reaction chamber 110, without the need to additionally provide one or more storage chambers to store the shielding plates in the open state. For example, the volume of the reaction chamber 110 and / or the accommodation space 12 can be slightly larger than the original volume, so that the first shielding plate 151 and the second shielding plate 153 can be opened or closed in the accommodation space 12 of the reaction chamber 110.
[0059] In addition, a plurality of shielding plate position sensing units 19 may be further disposed on the reaction chamber 110, wherein the shielding plate position sensing units 19 face the accommodating space 12 and are used to sense the positions of the first shielding plate 151 and the second shielding plate 153 to determine whether the first shielding plate 151 and the second shielding plate 153 are in an open state. For example, the shielding plate position sensing units 19 may be light sensing units.
[0060] In one embodiment of the present invention, the reaction chamber 110 can be connected to two sensing areas 113, wherein the sensing spaces 120 of the two sensing areas 113 are fluidly connected to the accommodating space 12 of the reaction chamber 110, and a shielding plate position sensing unit 19 is respectively disposed on the two sensing areas 113. When the first shielding plate 151 and the second shielding plate 153 are in an open state, parts of the first shielding plate 151 and the second shielding plate 153 will enter the two sensing areas 113 respectively, wherein the shielding plate position sensing unit 19 on the sensing area 113 can be used to sense that the first shielding plate 151 and the second shielding plate 153 enter the sensing area 113, and confirm that the first shielding plate 151 and the second shielding plate 153 are operated in the open state.
[0061] Through the arrangement of the first sensing unit 131, the second sensing unit 133 and the shielding plate position sensing unit 19 described in the present invention, it is possible to determine whether the first shielding plate 151 and the second shielding plate 153 are actually operated in the open state or the shielding state, so as to avoid the pre-firing process being performed when the first shielding plate 151 and the second shielding plate 153 are not actually operated in the shielding state, thereby contaminating the reaction chamber 110, or when the first shielding plate 151 and the second shielding plate 153 are not actually operated in the open state, the carrier plate 115 is driven to move toward the direction of the target material 161 and the stopper 111, thereby colliding with the first shielding plate 151 and the second shielding plate 153.
[0062] Advantages of this utility model:
[0063] A novel openable and closable shielding component and a thin film deposition machine are provided, which can sense the rotation angle or position of a shaft sealing device through a sensing unit to confirm whether the shielding plate is operating in a shielding state or an open state.
[0064] The above is only a preferred embodiment of the present invention and is not intended to limit the scope of the present invention. All equivalent changes and modifications to the shape, structure, features and spirit described in the patent application scope of the present invention should be included in the patent application scope of the present invention.
Claims
1. A thin film deposition machine, characterized in that: include: A reaction chamber, comprising a containing space; A carrier plate, located in the accommodating space and used for carrying at least one substrate; and An opening and closing shielding member comprises: A first shielding plate is located in the accommodating space; A second shielding plate is located in the accommodating space; A driving device, comprising: a drive motor; A shaft sealing device comprises an outer tube and a shaft, wherein the shaft is located inside the outer tube and the outer tube and the shaft are coaxially arranged; and a linkage mechanism, the driving motor is connected through the linkage mechanism and drives the outer tube and the shaft to rotate in opposite directions; wherein the linkage mechanism comprises a driving gear, a first driven gear and a second driven gear, the driving gear meshes with the first driven gear and the second driven gear, the first driven gear is connected to the first shielding plate through the outer tube, and the second driven gear is connected to the second shielding plate through the shaft, the driving gear is driven by the driving motor to rotate, so that the first driven gear and the second driven gear rotate in opposite directions, thereby driving the outer tube and the shaft to rotate in opposite directions; wherein the driving motor is connected to the first shielding plate through the linkage mechanism and the outer tube body, and is connected to the second shielding plate through the linkage mechanism and the shaft body, and the driving motor drives the first shielding plate and the second shielding plate to swing in opposite directions through the outer tube body and the shaft body respectively, so that the first shielding plate and the second shielding plate switch between an open state and a shielding state, wherein the first shielding plate in the shielding state is close to the second shielding plate and shields the carrier plate, and a separation space is formed between the first shielding plate and the second shielding plate in the open state; and Two sensing units are adjacent to the shaft, with a distance between the two sensing units, and are respectively used to sense the shaft rotating to a first position and a second position, wherein when the shaft rotates to the first position, the second shielding plate operates in the open state, and when the shaft rotates to the second position, the second shielding plate operates in the shielding state.
2. The thin film deposition machine according to claim 1, characterized in that: A protruding unit is connected to the shaft body. The protruding unit rotates along with the shaft body, and the sensing unit senses the protruding unit.
3. The thin film deposition machine according to claim 1, characterized in that: The invention comprises two sensing areas connected to the reaction chamber, and two shielding plate position sensing units are respectively arranged in the two sensing areas to respectively sense the first shielding plate and the second shielding plate entering the sensing areas.
4. An openable shielding member, suitable for a thin film deposition machine, characterized in that: include: a first shielding plate; a second shielding plate; A driving device, comprising: a drive motor; A shaft sealing device comprises an outer tube and a shaft, wherein the shaft is located inside the outer tube and the outer tube and the shaft are coaxially arranged; and a linkage mechanism, the driving motor is connected through the linkage mechanism and drives the outer tube and the shaft to rotate in opposite directions; wherein the linkage mechanism comprises a driving gear, a first driven gear and a second driven gear, the driving gear meshes with the first driven gear and the second driven gear, the first driven gear is connected to the first shielding plate through the outer tube, and the second driven gear is connected to the second shielding plate through the shaft, the driving gear is driven by the driving motor to rotate, so that the first driven gear and the second driven gear rotate in opposite directions, thereby driving the outer tube and the shaft to rotate in opposite directions; wherein the driving motor is connected to the first shielding plate through the outer tube body and is connected to the second shielding plate through the shaft body, and the driving motor drives the first shielding plate and the second shielding plate to swing in opposite directions through the outer tube body and the shaft body respectively, so that the first shielding plate and the second shielding plate switch between an open state and a shielding state, wherein the first shielding plate in the shielding state is close to the second shielding plate, and a separation space is formed between the first shielding plate and the second shielding plate in the open state; and Two sensing units are adjacent to the shaft, with a distance between the two sensing units, and are respectively used to sense the shaft rotating to a first position and a second position, wherein when the shaft rotates to the first position, the second shielding plate operates in the open state, and when the shaft rotates to the second position, the second shielding plate operates in the shielding state.
5. The retractable shielding member according to claim 4, characterized in that: A protruding unit is connected to the shaft body. The protruding unit rotates along with the shaft body, and the sensing unit senses the protruding unit.