Positioning jig and semiconductor reaction equipment
By designing positioning fixtures in semiconductor reaction equipment, using the coordination of positioning substrate and base, precise positioning and fine-tuning of the pipeline is achieved, poor heat dissipation and wear and fracture problems caused by eccentric installation of the pipeline are solved, and the installation accuracy and service life are improved.
Patent Information
- Application Number
- CN202420650801.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-04-01
- Publication Date
- 2025-05-06
- Estimated Expiration
- 2034-04-01
AI Technical Summary
In semiconductor reaction equipment, the eccentric installation of the pipeline can easily lead to poor heat dissipation of the inner wall of the reaction chamber and wear and breakage of the pipeline, which may cause gas leakage.
A positioning fixture is designed, including a positioning substrate and a base. Through the coordination of the positioning block and the positioning hole, the precise positioning of the pipe is achieved, and the fine adjustment of the pipe is achieved through the setting of the adjustment hole and the adjustment rod.
Improve the installation accuracy of the pipeline, prevent the installation deviation of the pipeline, reduce the risk of friction damage, avoid gas leakage, and extend the service life of the pipeline.
Smart Images
Figure CN222838823U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of semiconductor equipment, in particular to a positioning fixture and semiconductor reaction equipment. Background Art
[0002] With the rapid development of the semiconductor industry, etching technology can be divided into two categories: wet etching and dry etching. Among them, dry etching is a technology that uses plasma to etch thin films. In dry etching, a variety of gases are required for etching, such as inert, corrosive, oxidizing, C, and F gases. Usually, a pipeline is used to pass the gas into the reaction chamber for reaction, and the gas after the high-temperature reaction is discharged. When installing the pipeline in the reaction equipment, the center position of the pipeline needs to be accurately located. If the pipeline is installed eccentrically and close to the cavity, it is easy to cause the inner wall of the cavity to be affected by the high temperature, resulting in poor heat dissipation of the cavity and wear and rupture of the pipeline due to vibration, which may cause the risk of gas leakage. Utility Model Content
[0003] The utility model aims to provide a positioning fixture and semiconductor reaction equipment, which can effectively limit the position of the pipeline, ensure the installation accuracy of the pipeline, and prevent the pipeline from being broken by friction.
[0004] The embodiment of the utility model is achieved as follows:
[0005] In a first aspect, the utility model provides a positioning fixture, comprising:
[0006] A positioning substrate, wherein a positioning block is provided on the positioning substrate, and a first mounting hole is penetrated through the positioning substrate;
[0007] A base, wherein the base is provided with a positioning hole for plugging and cooperating with the positioning block, and the base is also provided with a second mounting hole coaxial with the first mounting hole;
[0008] The first mounting hole and the second mounting hole are used for pipelines to pass through; the second mounting hole is used to communicate with the reaction chamber.
[0009] In an optional embodiment, there is a gap between the positioning block and the positioning hole.
[0010] In an optional embodiment, a first adjustment hole is provided on the base along a first direction, the first adjustment hole is connected to the positioning hole, and the first direction is perpendicular to the axial direction of the positioning hole.
[0011] In an optional embodiment, a second adjustment hole is provided on the base along a second direction, the first direction and the second direction are perpendicular to each other; the first direction and the axial direction of the positioning hole are perpendicular to each other; and the second adjustment hole is connected to the positioning hole.
[0012] In an optional embodiment, an adjusting rod is further included, and the adjusting rod is inserted into the first adjusting hole and / or the second adjusting hole respectively, so as to adjust the position of the positioning block in the positioning hole.
[0013] In an optional embodiment, the cross-section of the base is rectangular, and the base includes four side walls, wherein two opposite side walls are respectively provided with the first adjustment holes, and the other two opposite side walls are provided with the second adjustment holes.
[0014] In an optional embodiment, the cross-sectional areas of the first mounting hole and the second mounting hole are equal.
[0015] In an optional embodiment, the cross-sectional areas of the first mounting hole and the second mounting hole are respectively larger than the cross-sectional area of the pipeline.
[0016] In a second aspect, the utility model provides a semiconductor reaction device, comprising a pipeline, a reaction chamber and a positioning fixture as described in any one of the aforementioned embodiments, wherein the base is connected to the reaction chamber; the pipeline passes through the base and extends into the reaction chamber.
[0017] In an optional embodiment, there is a gap between the pipe and the base.
[0018] The beneficial effects of the embodiments of the utility model include:
[0019] The positioning fixture provided in the embodiment of the utility model has a first mounting hole and a second mounting hole for mounting a pipeline; the second mounting hole is used to communicate with the reaction chamber. The positioning block on the positioning substrate is inserted into the positioning hole on the base, which can effectively limit the pipeline in the first mounting hole, improve the installation accuracy of the pipeline, prevent the pipeline installation from deviating, and reduce the risk of pipeline wear and damage. The structure is simple, easy to operate, has high positioning accuracy, and is highly practical.
[0020] The semiconductor reaction equipment provided by the embodiment of the utility model includes the above-mentioned positioning fixture, which can effectively limit the pipeline, improve the installation accuracy of the pipeline, prevent the pipeline installation from deviating, and reduce the risk of pipeline wear and damage. BRIEF DESCRIPTION OF THE DRAWINGS
[0021] In order to more clearly illustrate the technical solutions of the embodiments of the utility model, the drawings required for use in the embodiments will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the utility model and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without paying creative work.
[0022] Figure 1 A schematic diagram of the structure of the positioning fixture and the pipeline provided in the embodiment of the utility model;
[0023] Figure 2 A schematic diagram of the disassembled structure of the positioning fixture and the pipeline provided in an embodiment of the utility model.
[0024] Icon: 110 - positioning substrate; 111 - positioning block; 113 - first mounting hole; 120 - base; 121 - positioning hole; 123 - second mounting hole; 124 - first adjustment hole; 125 - second adjustment hole; 130 - adjustment rod; 200 - pipe. DETAILED DESCRIPTION
[0025] In order to make the purpose, technical scheme and advantages of the embodiments of the utility model clearer, the technical scheme in the embodiments of the utility model will be clearly and completely described below in conjunction with the drawings in the embodiments of the utility model. Obviously, the described embodiments are part of the embodiments of the utility model, not all of the embodiments. Generally, the components of the embodiments of the utility model described and shown in the drawings here can be arranged and designed in various different configurations.
[0026] Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the present invention to be protected, but merely represents selected embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.
[0027] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, further definition and explanation thereof is not required in subsequent drawings.
[0028] In the description of the present utility model, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inside", "outside", etc. indicate the orientation or position relationship based on the orientation or position relationship shown in the accompanying drawings, or the orientation or position relationship in which the utility model product is usually placed when in use, which is only for the convenience of describing the utility model and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present utility model. In addition, the terms "first", "second", "third", etc. are only used to distinguish the description, and cannot be understood as indicating or implying relative importance.
[0029] In addition, the terms "horizontal", "vertical" and the like do not mean that the components are required to be absolutely horizontal or suspended, but can be slightly tilted. For example, "horizontal" only means that its direction is more horizontal than "vertical", and does not mean that the structure must be completely horizontal, but can be slightly tilted.
[0030] In the description of the present invention, it is also necessary to explain that, unless otherwise clearly specified and limited, the terms "set", "install", "connect", and "connect" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.
[0031] With the rapid development of the semiconductor industry, etching technology can be divided into two categories: wet etching and dry etching. Among them, dry etching is a technology that uses plasma to etch thin films. In dry etching, a variety of gases are required for etching, such as inert, corrosive, oxidizing, C, and F gases. Usually, a pipeline is used to pass the gas into the reaction chamber for reaction, and the gas after the high-temperature reaction is discharged. When installing the pipeline in the reaction equipment, the center position of the pipeline needs to be accurately located. If the pipeline is installed eccentrically and close to the cavity, it is easy to cause the inner wall of the cavity to be affected by the high temperature, resulting in poor heat dissipation of the cavity and wear and rupture of the pipeline due to vibration, which may cause the risk of gas leakage.
[0032] In order to overcome at least one defect in the prior art, the utility model proposes a positioning fixture, which can effectively limit the position of the pipeline, ensure the installation accuracy of the pipeline, and prevent the pipeline from being broken by friction.
[0033] Please refer to Figure 1 and Figure 2The present embodiment provides a positioning fixture, including a positioning substrate 110 and a base 120. The positioning substrate 110 is provided with a positioning block 111, and the positioning substrate 110 is penetrated with a first mounting hole 113. The base 120 is provided with a positioning hole 121 for plugging and matching with the positioning block 111, and the positioning block 111 is inserted into the positioning hole 121. The base 120 is also provided with a second mounting hole 123 coaxial with the first mounting hole 113; the first mounting hole 113 and the second mounting hole 123 are used for the pipeline 200 to pass through; the second mounting hole 123 is used to communicate with the reaction chamber. The positioning block 111 on the positioning substrate 110 is inserted into the positioning hole 121 on the base 120, which can effectively limit the pipeline 200 in the first mounting hole 113, improve the installation accuracy of the pipeline 200, prevent the pipeline 200 from being deviated during installation, and reduce the risk of friction damage to the pipeline 200. The positioning fixture has a simple structure, convenient operation, high positioning accuracy, and strong practicality.
[0034] In this embodiment, four positioning blocks 111 are provided on the positioning substrate 110, and four positioning holes 121 are provided on the base 120. The four positioning blocks 111 are simultaneously inserted into the four positioning holes 121, which can play a better role in center positioning of the pipeline 200. It is easy to understand that the first mounting hole 113 is located at the center of the four positioning blocks 111, and the second mounting hole 123 is located at the center of the four positioning holes 121, which is conducive to improving the installation accuracy of the pipeline 200.
[0035] Optionally, the positioning hole 121 passes through the base 120 and can serve as a heat dissipation channel to improve the heat dissipation effect of the base 120 .
[0036] Optionally, the cross-sectional areas of the first mounting hole 113 and the second mounting hole 123 are equal. And the cross-sectional areas of the first mounting hole 113 and the second mounting hole 123 are respectively larger than the cross-sectional area of the pipeline 200. In this way, after the pipeline 200 is installed, friction with the hole walls of the first mounting hole 113 and the second mounting hole 123 is avoided, the risk of friction damage and rupture of the pipeline 200 is reduced, the service life of the pipeline 200 is extended, and gas leakage in the pipeline 200 is avoided.
[0037] Optionally, the cross-sectional area of the positioning block 111 is smaller than the cross-sectional area of the positioning hole 121. After the positioning block 111 is installed in the positioning hole 121, there is a certain gap between the positioning block 111 and the hole wall of the positioning hole 121, which is convenient for fine-tuning the position of the positioning block 111. A first adjustment hole 124 is provided on the base 120 along the first direction, and the first adjustment hole 124 is connected to the positioning hole 121, and the first direction is perpendicular to the axial direction of the positioning hole 121. The adjusting rod 130 can be inserted into the first adjustment hole 124 and abut against the positioning block 111. The position of the positioning block 111 in the positioning hole 121 can be precisely adjusted by the depth of the adjusting rod 130 inserted into the first adjustment hole 124, so as to achieve precise adjustment of the positioning block 111 in the first direction.
[0038] Optionally, a second adjustment hole 125 is provided on the base 120 along the second direction, the first direction and the second direction are perpendicular, the first direction is perpendicular to the axial direction of the positioning hole 121, and the second adjustment hole 125 is connected to the positioning hole 121. The adjustment rod 130 can be inserted into the second adjustment hole 125 and abut against the positioning block 111. The depth of the adjustment rod 130 inserted into the second adjustment hole 125 can accurately adjust the position of the positioning block 111 in the positioning hole 121, thereby realizing accurate adjustment of the positioning block 111 in the second direction.
[0039] It can be understood that the adjustment rod 130 can be a screw, and the first adjustment hole 124 and the second adjustment hole 125 can be threaded holes, and the screw and the threaded holes are adapted to each other. By rotating the screw, the position of the screw in the threaded hole can be adjusted, and the end of the screw extending into the threaded hole is abutted against the positioning block 111, and the position of the positioning block 111 in the positioning hole 121 can be adjusted, thereby achieving fine adjustment of the positioning block 111 in the first direction and the second direction, and improving the installation accuracy of the pipeline 200. If the axial direction of the positioning hole 121 is the Z direction, the first direction and the second direction are the X and Y directions respectively.
[0040] It should be noted that when fine-tuning the positioning block 111, the adjusting rod 130 can be first placed in the first adjusting hole 124, and after adjusting the position in the first direction, the adjusting rod 130 can be placed in the second adjusting hole 125 to fine-tune the position of the positioning block 111 in the second direction. Alternatively, the adjusting rod 130 can be first placed in the second adjusting hole 125 to adjust the position in the second direction, and then the adjusting rod 130 can be placed in the first adjusting hole 124 to adjust the position in the first direction. Alternatively, multiple adjusting rods 130 can be placed in the first adjusting hole 124 and the second adjusting hole 125 respectively, and the position of the positioning block 111 in the first and second directions can be adjusted at the same time, so as to determine the installation accuracy of the positioning substrate 110, ensure the accuracy of the pipe 200 in the first mounting hole 113 and the second mounting hole 123, and prevent the friction and wear problems caused by the eccentric installation of the pipe 200.
[0041] Optionally, the cross section of the base 120 is rectangular, and the base 120 includes four side walls, wherein two opposite side walls are respectively provided with first adjustment holes 124, and the other two opposite side walls are provided with second adjustment holes 125. Of course, according to actual conditions, the cross sections of the base 120 and the positioning substrate 110 may be rectangular, circular, elliptical or polygonal, etc., and the first adjustment hole 124 and the second adjustment hole 125 may be arranged along the circumference of the base 120, as long as the position of the positioning block 111 in the positioning hole 121 can be adjusted, and no specific limitation is made here.
[0042] The semiconductor reaction equipment provided by the embodiment of the utility model comprises a pipe 200, a reaction chamber and the above-mentioned positioning fixture, and the base 120 is connected to the reaction chamber. The pipe 200 passes through the base 120 and extends into the reaction chamber. Optionally, there is a gap between the pipe 200 and the base 120. That is, the pipe 200 does not contact the hole walls of the first mounting hole 113 and the second mounting hole 123 respectively.
[0043] The base 120 can be used as a base or top cover of the reaction chamber, and the base 120 and the reaction chamber are connected to form a closed cavity. Taking the base 120 as the top cover of the reaction chamber as an example, the base 120 is connected to the top of the reaction chamber, the pipeline 200 passes through the first mounting hole 113 and the second mounting hole 123 from top to bottom, and the positioning block 111 is inserted into the positioning hole 121 of the base 120. The adjustment rod 130 is placed in the first adjustment hole 124 and the second adjustment hole 125 to achieve fine adjustment of the pipeline 200 in the first direction and the second direction, ensuring that the pipeline 200 is in the center of the first mounting hole 113 and the second mounting hole 123, and does not contact the hole wall. In this way, it can be ensured that after the pipeline 200 is inserted into the reaction chamber, it is located in the center of the reaction chamber, and will not fit or wear against the inner wall of the reaction chamber, reducing the risk of wear and tear and preventing gas leakage.
[0044] Optionally, after the pipeline 200 is installed and fixed, the positioning substrate 110 can be removed or retained. The positioning substrate 110 is mainly used to perform center positioning of the pipeline 200 when installing the pipeline 200, ensuring that the pipeline 200 is located at the center of the second mounting hole 123 of the base 120, preventing the pipeline 200 from fitting and wearing with the base 120 and the pipeline 200 and the reaction chamber, reducing the risk of wear of the pipeline 200, preventing leakage of the pipeline 200, and extending the service life of the pipeline 200.
[0045] In summary, the positioning fixture and semiconductor reaction equipment provided by the embodiments of the present invention have the following beneficial effects, including:
[0046] The positioning fixture provided by the embodiment of the utility model has a first mounting hole 113 and a second mounting hole 123 for mounting the pipeline 200; the second mounting hole 123 is used to communicate with the reaction chamber. The positioning block 111 on the positioning substrate 110 is inserted into the positioning hole 121 on the base 120, which can effectively limit the pipeline 200 in the first mounting hole 113, and the setting of the first adjustment hole 124, the second adjustment hole 125 and the adjustment rod 130 can achieve fine adjustment of the pipeline 200, improve the installation accuracy of the pipeline 200, prevent the installation deviation of the pipeline 200, reduce the risk of friction damage between the pipeline 200 and the base 120, and between the pipeline 200 and the reaction chamber, and avoid gas leakage. The structure is simple, easy to operate, has high positioning accuracy, and is highly practical.
[0047] The semiconductor reaction equipment provided by the embodiment of the utility model includes the above-mentioned positioning fixture, which can effectively limit the pipeline 200, improve the installation accuracy of the pipeline 200, prevent the pipeline 200 from being installed off-center, and reduce the risk of friction damage to the pipeline 200.
[0048] The above description is only an optional embodiment of the utility model and is not intended to limit the utility model. For those skilled in the art, the utility model can have various modifications and changes. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the utility model shall be included in the protection scope of the utility model.
Claims
1. A positioning fixture, characterized in that: include: A positioning substrate, wherein a positioning block is convexly provided on the positioning substrate, and a first mounting hole is penetrated through the positioning substrate; A base, wherein the base is provided with a positioning hole for plugging and cooperating with the positioning block, and the base is also provided with a second mounting hole coaxial with the first mounting hole, and the second mounting hole is used to communicate with the reaction chamber; The first mounting hole and the second mounting hole are respectively used for pipelines to pass through.
2. The positioning fixture according to claim 1, characterized in that: There is a gap between the positioning block and the positioning hole.
3. The positioning fixture according to claim 1, characterized in that: The base is provided with a first adjustment hole along a first direction, the first adjustment hole is communicated with the positioning hole, and the first direction is perpendicular to the axial direction of the positioning hole.
4. The positioning fixture according to claim 3, characterized in that: A second adjustment hole is provided on the base along a second direction, the first direction is perpendicular to the second direction; the first direction is perpendicular to the axial direction of the positioning hole; and the second adjustment hole is connected to the positioning hole.
5. The positioning fixture according to claim 4, characterized in that: It also includes an adjusting rod, which is inserted into the first adjusting hole and / or the second adjusting hole respectively and is used to adjust the position of the positioning block in the positioning hole.
6. The positioning fixture according to claim 4, characterized in that: The cross section of the base is rectangular, and the base includes four side walls, two opposite side walls are respectively provided with first adjustment holes, and the other two opposite side walls are provided with the second adjustment holes.
7. The positioning fixture according to claim 1, characterized in that: The cross-sectional areas of the first mounting hole and the second mounting hole are equal.
8. The positioning fixture according to any one of claims 1 to 7, characterized in that: The cross-sectional areas of the first mounting hole and the second mounting hole are respectively larger than the cross-sectional area of the pipeline.
9. A semiconductor reaction device, characterized in that: It comprises a pipeline, a reaction chamber and a positioning fixture as described in any one of claims 1 to 8, wherein the base is connected to the reaction chamber; the pipeline passes through the base and extends into the reaction chamber.
10. The semiconductor reaction equipment according to claim 9, characterized in that: There is a gap between the pipe and the base.