Throwing device of silicon ring cleaning acid etching tank
By designing the silicon ring cleaning acid etching tank throwing device, the casting assembly and rod assembly are used to solve the problems of uneven and incomplete cleaning of the silicon ring, the full contact and reaction between the silicon ring and the drug liquid is achieved, and the cleaning efficiency and reaction effect are improved.
Patent Information
- Application Number
- CN202421370657.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-06-17
- Publication Date
- 2025-05-09
- Estimated Expiration
- 2034-06-17
AI Technical Summary
During the wet cleaning of semiconductor silicon rings, the prior art causes uneven and incomplete cleaning of the silicon ring surface, and cannot be fully in contact with the cleaning solution.
A silicon ring cleaning acid etching tank throwing device is designed, including a tank body, a smelting tool, a drive assembly and a rod assembly. The casting assembly causes the silicon ring to reciprocate up and down in the groove body, increasing the contact area and time with the medicine liquid; the holder assembly lifts the silicon ring when the casting movement is moved downward to achieve disengagement from the fixture.
Through the design of the casting assembly, the contact between the silicon ring and the liquid is more sufficient, which improves the cleaning efficiency and reaction sufficientness; the use of the rod assembly avoids hindering the fixture, further improving the reaction effect.
Smart Images
Figure CN222842686U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of semiconductors, in particular to a silicon ring cleaning acid etching tank polishing device. Background Art
[0002] In the wet cleaning of semiconductor silicon rings, corrosive chemical liquids are often used to clean the surface of the silicon ring to remove various impurity particles generated during the production process. In order to enhance the cleaning effect, immersion, spraying, and throwing are usually used.
[0003] During the cleaning process, a jig is used to load the silicon ring. The jig contains multiple supporting and limiting devices in contact with the silicon ring. The cleaning jig and the silicon ring are tossed up and down in the solution. The contact part cannot fully contact with the cleaning solution, resulting in uneven and incomplete cleaning. In order to solve the above problems, improve the uneven and incomplete cleaning of existing semiconductor silicon rings in wet cleaning, and ensure sufficient contact between the silicon ring and the solution, we proposed a silicon ring cleaning acid etching tank tossing device. Utility Model Content
[0004] In view of the deficiencies in the prior art, the utility model provides a silicon ring cleaning acid etching tank polishing device to solve the above-mentioned problems.
[0005] In order to achieve the above-mentioned purpose, the utility model provides the following technical solutions: a silicon ring cleaning acid etching tank throwing device, comprising a tank body and a jig, wherein the jig is arranged inside the tank body, and a plurality of silicon rings to be cleaned are placed equidistantly inside the jig, and water inlet pipes are fixedly installed on both sides of the top of the tank body, and the other ends of the water inlet pipes extend to the inside of the tank body and are fixedly connected to the spray pipe, and further comprising:
[0006] A throwing assembly, which is arranged inside the tank and is used to carry the jig and the product to perform up and down reciprocating motion;
[0007] A support rod assembly is arranged at the bottom of the inner wall surface of the trough body, and is used to lift the silicon ring during the downward throwing movement to achieve the separation of the silicon ring from the fixture.
[0008] Preferably, the jig includes a jig plate, a limit bar and a limit groove. There are two groups of jig plates. A plurality of limit bars that are inclined are slidably installed between the two groups of jig plates. Slide grooves for adjusting the positions of the limit bars are provided at positions on both sides of the jig plate corresponding to the limit bars. A plurality of limit grooves are equidistantly provided on one side of the limit bar. The silicon ring is placed in sequence between the two groups of limit bars.
[0009] Preferably, the throwing assembly includes a throwing connecting rod, a throwing connecting block and a throwing frame, the throwing connecting rod is fixedly mounted on the outer wall surface of the trough body, the throwing connecting rod is L-shaped as a whole, the ends of the throwing connecting rod are fixedly mounted with throwing connecting blocks, and the other ends of the throwing connecting blocks are fixedly mounted on the side of the throwing frame.
[0010] Preferably, a driving structure is also provided on one side of the trough body, and the driving structure includes a driving motor, a cam, a driving connecting rod and a guide member. A driving motor is fixedly installed on one side of the trough body, and a cam is fixedly connected to the output end of the driving motor. A driving connecting rod for connecting drive is hingedly installed on the cam, and the driving connecting rod is fixedly installed on one side of the guide member, and the throwing connecting rod is slidably installed inside the guide member.
[0011] Preferably, a slot corresponding to the support rod assembly is provided at the bottom of the throwing frame at a position corresponding to the support rod assembly.
[0012] Preferably, the support rod assembly includes a bottom support rod, a support rod limiting plate and a trough body connecting plate. There are several groups of trough body connecting plates, all of which are fixedly installed on the bottom of the inner wall of the trough body. A cross plate is fixedly installed on the top of the trough body connecting plate. Support rod limiting plates are fixedly installed on both sides of the top of the cross plate. The bottom support rod is clamped and installed between the two groups of support rod limiting plates.
[0013] Preferably, the entire trough body is welded from corrosion-resistant plates, the bottom of the trough body is inclined, and a number of quick drainage holes for draining liquid are equidistantly provided at the bottom of the trough body, and quick exhaust cylinders for opening and closing the quick drainage holes are fixedly installed at the positions of the quick drainage holes at the bottom of the trough body.
[0014] Compared with the prior art, the utility model provides a silicon ring cleaning acid etching tank polishing device, which has the following beneficial effects:
[0015] 1. The silicon ring cleaning acid etching tank throwing device, the setting of the throwing component enables the silicon ring to reciprocate up and down in the tank body, effectively increasing the contact area and contact time between the silicon ring and the chemical solution, thereby improving the reaction efficiency and ensuring the full degree of reaction of the silicon ring.
[0016] 2. The silicon ring cleaning acid etching tank polishing device can conveniently adjust the distance and angle between the limit bars by sliding the limit bars installed on the jig plate to meet the reaction requirements of silicon rings of different sizes and shapes, thereby improving the versatility and flexibility of the device.
[0017] 3. The silicon ring cleaning acid etching tank throwing device can lift the silicon ring during the downward throwing movement of the support rod assembly, so as to separate the silicon ring from the fixture, thereby avoiding the problem that the silicon ring cannot fully contact with the fixture during the reaction process, and further improving the reaction effect. BRIEF DESCRIPTION OF THE DRAWINGS
[0018] Figure 1 It is a schematic diagram of the overall structure of the utility model;
[0019] Figure 2 This is a schematic diagram of the structure of the metallurgical tool of the utility model;
[0020] Figure 3 This is a schematic diagram of the structure of the throwing assembly of the utility model;
[0021] Figure 4 It is a cross-sectional schematic diagram of the overall structure of the utility model;
[0022] Figure 5 This is a schematic diagram of the structure of the support rod assembly of the utility model;
[0023] Figure 6 This is a schematic diagram of the structure of the quick drainage hole of the utility model;
[0024] Figure 7 This is a schematic diagram of the side sectional structure of the utility model;
[0025] Figure 8 This is a schematic diagram of the drive structure of the utility model.
[0026] In the figure: 1. trough body; 2. jig; 3. silicon ring; 4. water inlet pipe; 5. spray pipe; 6. jig plate; 7. limit strip; 8. limit slot; 9. throwing connecting rod; 10. throwing connecting block; 11. throwing frame; 12. slot; 13. bottom support rod; 14. support rod limit plate; 15. trough body connecting plate; 16. quick drain hole; 17. quick exhaust cylinder; 18. drive motor; 19. cam; 20. drive connecting rod; 21. guide. DETAILED DESCRIPTION
[0027] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.
[0028] See also Figure 1-7A silicon ring cleaning acid etching tank throwing device comprises a tank body 1 and a jig 2, wherein the jig 2 is arranged inside the tank body 1, and a plurality of silicon rings 3 to be cleaned are placed equidistantly inside the jig 2, and water inlet pipes 4 are fixedly installed on both sides of the top of the tank body 1, and the other ends of the water inlet pipes 4 extend to the inside of the tank body 1 and are fixedly connected to the spray pipe 5, and further comprises:
[0029] A throwing assembly, which is arranged inside the tank body 1 and is used to carry the jig 2 and the product to perform up and down reciprocating motion;
[0030] The support rod assembly is arranged at the bottom of the inner wall of the tank body 1, and is used to lift the silicon ring during the downward throwing movement to achieve the separation of the silicon ring from the fixture.
[0031] Furthermore, the jig 2 includes a jig plate 6, a limit bar 7 and a limit groove 8. There are two groups of jig plates 6. A plurality of limit bars 7 which are inclined are slidably installed between the two groups of jig plates 6. Slide grooves for adjusting the positions of the limit bars 7 are provided at positions on both sides of the jig plate 6 corresponding to the limit bars 7. A plurality of limit grooves 8 are equidistantly provided on one side of the limit bars 7. The silicon rings 3 are placed in sequence between the two groups of limit bars 7. By sliding the limit bars 7 installed on the jig plate 6, the distance and angle between the limit bars 7 can be conveniently adjusted to meet the reaction requirements of silicon rings 3 of different sizes and shapes, thereby improving the versatility and flexibility of the device.
[0032] Furthermore, the throwing assembly includes a throwing connecting rod 9, a throwing connecting block 10 and a throwing frame 11. The throwing connecting rod 9 is fixedly installed on the outer wall surface of the tank body 1. The throwing connecting rod 9 is L-shaped as a whole. The ends of the throwing connecting rod 9 are fixedly installed with throwing connecting blocks 10, and the other ends of the throwing connecting blocks 10 are fixedly installed on the sides of the throwing frame 11. The setting of the throwing assembly enables the silicon ring 3 to reciprocate up and down in the tank body 1, effectively increasing the contact area and contact time between the silicon ring 3 and the drug solution, thereby improving the reaction efficiency and ensuring the full degree of reaction of the silicon ring 3.
[0033] Furthermore, a driving structure is also provided on one side of the trough body 1, and the driving structure includes a driving motor 18, a cam 19, a driving connecting rod 20 and a guide member 21. The driving motor 18 is fixedly installed on one side of the trough body 1, and the output end of the driving motor 18 is fixedly connected to the cam 19. The driving connecting rod 20 for connecting drive is hingedly installed on the cam 19. The driving connecting rod 20 is fixedly installed on one side of the guide member 21, and the throwing connecting rod 9 is slidably installed inside the guide member 21.
[0034] Furthermore, a slot 12 corresponding to the support rod assembly is provided at the bottom of the throwing frame 11 .
[0035] Furthermore, the support rod assembly includes a bottom support rod 13, a support rod limiting plate 14 and a trough body connecting plate 15. There are several groups of trough body connecting plates 15, all of which are fixedly installed on the bottom of the inner wall of the trough body 1. A cross plate is fixedly installed on the top of the trough body connecting plate 15. Support rod limiting plates 14 are fixedly installed on both sides of the top of the cross plate. The bottom support rod 13 is clamped and installed between the two groups of support rod limiting plates 14. The support rod assembly can lift the silicon ring 3 during the downward throwing movement, thereby realizing the separation of the silicon ring 3 from the smelting tool 2, avoiding the problem that the silicon ring 3 cannot fully contact the smelting tool 2 during the reaction process, and further improving the reaction effect.
[0036] Furthermore, the trough body 1 is welded together from corrosion-resistant plates, the bottom of the trough body 1 is inclined, and a number of quick drainage holes 16 for drainage are equidistantly provided at the bottom of the trough body 1, and quick exhaust cylinders 17 for opening and closing the quick drainage holes 16 are fixedly installed at the positions of the quick drainage holes 16 at the bottom of the trough body 1. The trough body 1 is welded together from corrosion-resistant plates, has good corrosion resistance, and can meet the requirements of reaction processing. At the same time, the inclined bottom setting and the design of the quick drainage holes 16 facilitate the discharge and collection of the drug solution, are more convenient for use in the next processing, and effectively improve the production efficiency.
[0037] When in use, first inject liquid medicine into the inside of the trough body 1, and then adjust the position of the limit strip 7 inside the slide groove according to the size of the silicon ring. After the adjustment is appropriate, the silicon ring 3 can be placed in the inside of the jig 2 according to the limit groove 8 opened on the side of the limit strip 7. After ensuring that the silicon ring 3 is placed stably, the jig 2 loaded with the silicon ring 3 can be placed in the inside of the throwing frame 11 by the manipulator. At this time, the liquid medicine contacts the silicon ring 3, thereby reacting. Then, by starting the drive motor 18, the drive motor 18 drives it to The cam 19, which is fixedly connected at the end, rotates, and the driving connecting rod 20 is hingedly connected to the cam 19. When the cam 19 rotates, the driving connecting rod 20 is driven to shake with it, so that the guide member 21 is driven to shake together through the driving connecting rod 20, and the throwing connecting rod 9 is driven to toss up and down inside the guide member 21, and the jig 2 and the silicon ring 3 are driven to reciprocate up and down inside the throwing frame 11 synchronously. When the throwing frame 11 descends, the silicon ring 3 will first pass through the slot 12 at the bottom of the throwing frame 11, and then contact with the bottom. The top of the upper support rod 13 is in contact with the jig 2, while the jig 2 does not come into contact with the bottom support rod 13. Then, as the jig 2 continues to move downward, the silicon ring 3 stops moving downward due to the support of the bottom support rod 13 and separates from the jig 2, which exposes the part of the silicon ring 3 that was previously in contact with the jig 2 and begins to react with the liquid medicine. After the throwing frame 11 reaches the lowest point, it starts to rise, the silicon ring 3 separates from the bottom support rod 13, contacts the jig 2 again, and rises with the throwing assembly. After multiple throwings, the quick exhaust cylinder 17 descends. The liquid medicine is quickly discharged through the quick drainage hole 16 at the bottom of the tank body 1. After the liquid medicine is discharged, the spray pipe 5 is immediately started to spray pure water to clean the silicon ring 3 to reduce the residual liquid medicine on the surface of the silicon ring 3 and prevent its surface from being oxidized. The device can ensure full contact between the silicon ring and the liquid medicine when in use through the mutual cooperation between the above structures, which is convenient for the use of the silicon ring during acid etching processing. After processing, the surface of the silicon ring is quickly rinsed, which can effectively avoid the liquid medicine from remaining on the surface of the silicon ring and prevent the surface of the silicon ring from being oxidized, which is more convenient and practical.
[0038] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.
Claims
1. A silicon ring cleaning acid etching tank throwing device, comprising a tank body (1) and a jig (2), wherein the jig (2) is arranged inside the tank body (1), and a plurality of silicon rings (3) to be cleaned are placed equidistantly inside the jig (2), and water inlet pipes (4) are fixedly installed on both sides of the top of the tank body (1), and the other ends of the water inlet pipes (4) extend into the interior of the tank body (1) and are fixedly connected to a spray pipe (5), characterized in that: Also includes: A throwing assembly, the throwing assembly being arranged inside the tank body (1), the throwing assembly being used to carry the jig (2) and the product to perform up and down reciprocating motion; A support rod assembly is arranged at the bottom of the inner wall surface of the tank body (1), and is used to support the silicon ring (3) during the downward throwing movement, so as to separate the silicon ring (3) from the jig (2).
2. A silicon ring cleaning acid etching tank polishing device according to claim 1, characterized in that: The jig (2) comprises a jig plate (6), a limiting strip (7) and a limiting groove (8). There are two groups of jig plates (6). A plurality of limiting strips (7) are slidably mounted between the two groups of jig plates (6). Slide grooves for adjusting the position of the limiting strips (7) are provided at positions corresponding to the limiting strips (7) on both sides of the jig plate (6). A plurality of limiting grooves (8) are equidistantly provided on one side of the limiting strips (7). The silicon ring (3) is sequentially placed between the two groups of limiting strips (7).
3. The silicon ring cleaning acid etching tank polishing device according to claim 1, characterized in that: The throwing assembly comprises a throwing connecting rod (9), a throwing connecting block (10) and a throwing frame (11); the throwing connecting rod (9) is fixedly mounted on the outer wall surface of the tank body (1); the throwing connecting rod (9) is L-shaped as a whole; the ends of the throwing connecting rod (9) are fixedly mounted with the throwing connecting blocks (10); and the other ends of the throwing connecting blocks (10) are fixedly mounted on the side of the throwing frame (11).
4. A silicon ring cleaning acid etching tank polishing device according to claim 3, characterized in that: A driving structure is also provided on one side of the trough body (1), the driving structure comprising a driving motor (18), a cam (19), a driving connecting rod (20) and a guide member (21); a driving motor (18) is fixedly mounted on one side of the trough body (1); an output end of the driving motor (18) is fixedly connected to the cam (19); a driving connecting rod (20) for connecting and driving is hingedly mounted on the cam (19); the driving connecting rod (20) is fixedly mounted on one side of the guide member (21); and the throwing connecting rod (9) is slidably mounted inside the guide member (21).
5. The silicon ring cleaning acid etching tank polishing device according to claim 3, characterized in that: A slot (12) corresponding to the support rod assembly is provided at the bottom of the throwing frame (11) at a position corresponding to the support rod assembly.
6. The silicon ring cleaning acid etching tank polishing device according to claim 1, characterized in that: The support rod assembly comprises a bottom support rod (13), a support rod limiting piece (14) and a trough body connecting piece (15). The trough body connecting piece (15) comprises a plurality of groups, all of which are fixedly mounted on the bottom of the inner wall surface of the trough body (1). A transverse plate is fixedly mounted on the top of each of the trough body connecting pieces (15). Support rod limiting pieces (14) are fixedly mounted on both sides of the top of each of the transverse plates. The bottom support rod (13) is clamped and mounted between two groups of support rod limiting pieces (14).
7. The silicon ring cleaning acid etching tank polishing device according to claim 1, characterized in that: The trough body (1) is formed by welding corrosion-resistant plates as a whole. The bottom of the trough body (1) is inclined, and a plurality of quick discharge holes (16) for discharging liquid are equidistantly provided at the bottom of the trough body (1). Quick discharge cylinders (17) for opening and closing the quick discharge holes (16) are fixedly installed at positions of the bottom of the trough body (1) corresponding to the quick discharge holes (16).