Alkali polishing additive metering device

Abstract

The utility model discloses a component device of alkali polishing additive, including mixing tank, filter, storage tank and a plurality of component tank, the lower end of mixing tank is equipped with the first discharge port, the upper end of filter is equipped with the first feed port, the first discharge port is matched with the first feed port, the storage tank is equipped with the first feed port, and the component tank is equipped with the second discharge port. A second discharging port is formed in the lower end of the filter, a second feeding port is formed in the upper end of the storage tank, the second discharging port is matched with the second feeding port, a third discharging port is formed in the storage tank, a plurality of first component pipes are arranged on the third discharging port, a third feeding port is formed in the upper end of the component tank, and a plurality of second component pipes are arranged on the third feeding port. And the third feeding openings correspond to the first component pipes one to one, and a material distributing mechanism is arranged in the storage tank. The dosing device for the alkali polishing additive provided by the utility model can equivalently divide the alkali polishing additive, can also automatically complete the dosing and taking of the alkali polishing additive according to the specific dosing and dosing, and is higher in efficiency and more stable.

Description

Technical Field

[0001] The utility model belongs to the field of preparation, and in particular relates to a dosing device for an alkali polishing additive. Background Art

[0002] In the process of photovoltaic cell manufacturing, etching is required after double-sided texturing and single-sided diffusion. The front side of the single-sided diffusion texturing surface is left, and the other side and the thin side must be polished to remove the velvet surface and diffusion layer, so that a good PN junction is left on the front side, the insulating side, and a flat polished surface is left on the back side, which reduces the surface recombination rate and creates a foundation for coating, laser windowing, and screen aluminum back field to form a good back passivation. The role of additives in alkaline polishing: The additives contain hydrophilic substances, which form a good contact with the diffusion surface with silicon dioxide, blocking or slowing down the front reaction, and helping to degas on the back side. At the same time, the reaction rate of alkali and silicon is greater than that of silicon dioxide. That is to say, the role of additives in alkaline polishing is to slow down or block the front reaction and accelerate the back reaction to achieve a polishing effect.

[0003] However, after the alkaline polishing additive is mixed and prepared, it is necessary to take out the amount thereof when using it, which is usually done manually using a syringe, which has low work efficiency and wastes a lot of time. Summary of the invention

[0004] In order to solve the deficiencies in the prior art, the utility model provides a dosing device for an alkali polishing additive.

[0005] In order to achieve the above purpose, the utility model provides the following technical solutions:

[0006] A dosing device for alkali polishing additives comprises a mixing tank, a filter, a storage tank and a plurality of dosing tanks, wherein the lower end of the mixing tank is provided with a first discharge port, the upper end of the filter is provided with a first feed port, the first discharge port matches the first feed port, the lower end of the filter is provided with a second discharge port, the upper end of the storage tank is provided with a second feed port, the second discharge port matches the second feed port, the storage tank is provided with a third discharge port, the third discharge port is provided with a plurality of first dosing pipes, the upper end of the dosing tank is provided with a third feed port, the third feed port corresponds one-to-one with the first dosing pipes, the first dosing pipes are provided with a first control valve, and a dosing mechanism is provided in the storage tank.

[0007] Further, the material distribution mechanism includes a first limiting cylinder, which is arranged at the upper end of the storage tank, a first installation seam is provided on one side of the first limiting cylinder, a first sensor is provided at the upper end of the first limiting cylinder, the first sensor matches the first installation seam, and a first floating block is provided in the first limiting cylinder, which matches the first sensor.

[0008] Furthermore, the material distribution mechanism includes a plurality of second limiting cylinders, the second limiting cylinders are arranged at the upper end of the storage tank, a second installation seam is provided on one side of the second limiting cylinder, a second sensor is provided on the second limiting cylinder, the second sensor matches the second installation seam, a second floating block is provided in the second limiting cylinder, and the second floating block matches the second sensor.

[0009] Furthermore, a plurality of first sleeves are provided at the upper end of the storage tank, the first limiting sleeve and the second limiting sleeve are matched with the first sleeve, the first sleeve is provided with a first threaded hole, the first threaded hole is provided with a first bolt, and the first limiting sleeve and the second limiting sleeve are provided with a first scale.

[0010] Furthermore, the component device of the alkali polishing additive includes a first liquid pump and a second control valve, the second control valve is arranged at the first discharge port, and the first liquid pump is arranged between the first discharge port and the first feed port.

[0011] The utility model discloses a dosing device for alkali polishing additives. Compared with the prior art, its beneficial effect lies in that it can equally distribute the alkali polishing additives in equal amounts, and can also automatically complete the dosing of the alkali polishing additives according to specific dosing amounts, which is more efficient and more stable. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1 It is a structural schematic diagram of a preferred embodiment provided by the utility model.

[0013] Figure 2 It is a structural schematic diagram of a storage tank of a preferred embodiment provided by the utility model.

[0014] Figure 3 It is a structural schematic diagram of the first limiting cylinder of the preferred embodiment provided by the utility model.

[0015] Figure 4 It is a structural schematic diagram of the second limiting cylinder of the preferred embodiment provided by the utility model.

[0016] Figure 5 It is a structural schematic diagram of a part A of a preferred embodiment provided by the utility model.

[0017] The figure marks include: 110, mixing tank; 111, first discharge port; 120, second control valve; 130, first liquid pump; 140, filter; 141, first feed port; 142, second discharge port; 150, component tank; 151, third feed port; 200, storage tank; 220, second feed port; 230, third discharge port; 231, first component pipe; 232, first control valve; 240, first limiting cylinder; 241, first mounting seam; 242, first sensor; 243, first floating block; 250, second limiting cylinder; 251, second mounting seam; 252, second sensor; 253, second floating block; 260, first sleeve; 261, first threaded hole; 262, first bolt; 270, first shield. DETAILED DESCRIPTION

[0018] The utility model discloses a dosing device for an alkali polishing additive. The specific implementation manner of the utility model is further described below in conjunction with a preferred embodiment.

[0019] See attached figure Figure 1-5 , Figure 1 It is a structural schematic diagram of a preferred embodiment provided by the utility model. Figure 2 2 is a schematic structural diagram of a storage tank 200 according to a preferred embodiment of the present invention. Figure 3 2 is a schematic structural diagram of a first limiting cylinder 240 of a preferred embodiment provided by the utility model. Figure 4 2 is a schematic structural diagram of a second limiting cylinder 250 of a preferred embodiment provided by the utility model. Figure 5 It is a structural schematic diagram of a part A of a preferred embodiment provided by the utility model.

[0020] Preferred embodiments.

[0021] The present embodiment provides a dosing device for alkali polishing additives, including a mixing tank 110, a filter 140, a storage tank 200 and a plurality of dosing tanks 150, wherein the lower end of the mixing tank 110 is provided with a first discharge port 111, the upper end of the filter 140 is provided with a first feed port 141, the first discharge port 111 matches the first feed port 141, the lower end of the filter 140 is provided with a second discharge port 142, the upper end of the storage tank 200 is provided with a second feed port 220, the second discharge port 142 matches the second feed port 220, the storage tank 200 is provided with a third discharge port 230, the third discharge port 230 is provided with a plurality of first dosing pipes 231, the upper end of the dosing tank 150 is provided with a third feed port 151, the third feed port 151 corresponds one-to-one to the first dosing pipe 231, the first dosing pipe 231 is provided with a first control valve 232, and a dosing mechanism is provided in the storage tank 200.

[0022] Furthermore, the material dispensing mechanism includes a first limiting cylinder 240, which is arranged at the upper end of the storage tank 200, and a first installation seam 241 is provided on one side of the first limiting cylinder 240, and a first sensor 242 is provided at the upper end of the first limiting cylinder 240, and the first sensor 242 matches the first installation seam 241, and a first floating block 243 is provided in the first limiting cylinder 240, and the first floating block 243 matches the first sensor 242.

[0023] Furthermore, the material dispensing mechanism includes a plurality of second limiting cylinders 250, the second limiting cylinders 250 are arranged at the upper end of the storage tank 200, a second mounting seam 251 is provided on one side of the second limiting cylinder 250, a second sensor 252 is provided on the second limiting cylinder 250, the second sensor 252 matches the second mounting seam 251, a second floating block 253 is provided in the second limiting cylinder 250, and the second floating block 253 matches the second sensor 252.

[0024] Furthermore, a plurality of first sleeves 260 are provided at the upper end of the storage tank 200, the first limiting cylinder 240 and the second limiting cylinder 250 are matched with the first sleeve 260, the first sleeve 260 is provided with a first threaded hole 261, the first threaded hole 261 is provided with a first bolt 262, and the first limiting cylinder 240 and the second limiting cylinder 250 are provided with a first scale.

[0025] Furthermore, the component device of the alkali polishing additive includes a first liquid pump 130 and a second control valve 120 , the second control valve 120 is arranged at the first discharge port 111 , and the first liquid pump 130 is arranged between the first discharge port 111 and the first feed port 141 .

[0026] Working principle: After the mixing tank 110 prepares the alkali polishing additive, the second control valve 120 is opened, and the first liquid pump 130 draws the alkali polishing additive into the filter 140. After being filtered by the filter 140, the alkali polishing additive enters the storage tank 200. When the liquid level of the alkali polishing additive continues to rise until the first float 243 contacts the first sensor 242, and the first sensor 242 senses the first float 243, the second control valve 120 is closed and the first liquid pump 130 stops. Then open one of the first control valves 232 until the second floats 253 contact the corresponding second sensors 252 one by one, and then open the other control valves one by one, so as to ensure that the alkali polishing additive can be delivered to the component tank 150 according to the amount. Among them, through the first scale, the positions of the first limiting cylinder 240, the second limiting cylinder 250 and the first sensor 242, the second sensor 252 can be adjusted, and then the amount of alkali polishing additive to be collected in each of the component tanks 150 can be adjusted, which can be evenly divided or specifically distributed according to the amount. In addition, a first protective cover 270 is provided at the upper end of the mixing tank 110, which can prevent dust and the like from entering the storage tank 200 through the first limiting cylinder 240 and the second limiting cylinder 250, avoid contamination of the alkali polishing additive, and also ensure the pressure balance in the first limiting cylinder 240 and the second limiting cylinder 250.

[0027] It is worth mentioning that the technical features such as the mixing tank 110 and the filter 140 involved in the utility model patent application should be regarded as the prior art. The specific structure, working principle and possible control method and spatial layout method of these technical features can be selected by conventional methods in the field, and should not be regarded as the utility model points of the utility model patent. This utility model patent will not be further elaborated.

[0028] For those skilled in the art, it is still possible to modify the technical solutions described in the aforementioned embodiments, or to make equivalent substitutions for some of the technical features therein. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present utility model should be included in the protection scope of the present utility model.

Claims

1. A dosing device for an alkali polishing additive, characterized in that: The invention comprises a mixing tank (110), a filter (140), a storage tank (200) and a plurality of component tanks (150), wherein the lower end of the mixing tank (110) is provided with a first discharge port (111), the upper end of the filter (140) is provided with a first feed port (141), the first discharge port (111) matches the first feed port (141), the lower end of the filter (140) is provided with a second discharge port (142), the upper end of the storage tank (200) is provided with a second feed port (220), the second The discharge port (142) matches the second feed port (220), the storage tank (200) is provided with a third discharge port (230), the third discharge port (230) is provided with a plurality of first component pipes (231), the upper end of the component tank (150) is provided with a third feed port (151), the third feed port (151) corresponds one-to-one with the first component pipes (231), the first component pipes (231) are provided with a first control valve (232), and a material distribution mechanism is provided in the storage tank (200).

2. The dosing device of the alkali polishing additive according to claim 1, characterized in that: The material dispensing mechanism comprises a first limiting cylinder (240), the first limiting cylinder (240) being arranged at the upper end of the storage tank (200), a first installation seam (241) being arranged on one side of the first limiting cylinder (240), a first sensor (242) being arranged at the upper end of the first limiting cylinder (240), the first sensor (242) being matched with the first installation seam (241), a first floating block (243) being arranged inside the first limiting cylinder (240), the first floating block (243) being matched with the first sensor (242).

3. The dosing device of the alkali polishing additive according to claim 2, characterized in that: The material dispensing mechanism comprises a plurality of second limiting cylinders (250), wherein the second limiting cylinders (250) are arranged at the upper end of the storage tank (200), a second installation seam (251) is arranged on one side of the second limiting cylinder (250), a second sensor (252) is arranged on the second limiting cylinder (250), the second sensor (252) matches the second installation seam (251), and a second floating block (253) is arranged in the second limiting cylinder (250), the second floating block (253) matches the second sensor (252).

4. The dosing device of the alkali polishing additive according to claim 3, characterized in that: A plurality of first sleeves (260) are provided at the upper end of the storage tank (200), the first limiting sleeve (240) and the second limiting sleeve (250) are matched with the first sleeve (260), the first sleeve (260) is provided with a first threaded hole (261), the first threaded hole (261) is provided with a first bolt (262), and the first limiting sleeve (240) and the second limiting sleeve (250) are provided with a first scale.

5. The dosing device of the alkali polishing additive according to claim 4, characterized in that: The component device of the alkali polishing additive comprises a first liquid pump (130) and a second control valve (120), wherein the second control valve (120) is arranged at the first discharge port (111), and the first liquid pump (130) is arranged between the first discharge port (111) and the first feed port (141).

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