Water and gas distribution device and semiconductor processing equipment

Abstract

The utility model relates to the technical field of semiconductor processing, in particular to a water and gas distribution device and semiconductor processing equipment. The water-gas distribution device comprises a barrel, and a first positioning ring, a second positioning ring, a third positioning ring and a fourth positioning ring which are sequentially arranged in the barrel in the axial direction, a first end cover and a second end cover are arranged at the two ends of the barrel respectively, and a gap is formed between the rotating shaft and the second end cover; the inner rings of the first positioning ring, the second positioning ring, the third positioning ring and the fourth positioning ring are hermetically connected with the rotating shaft, and the outer rings are hermetically connected with the barrel; a first runner, a second runner and a third runner are sequentially formed among the first positioning ring, the second positioning ring, the third positioning ring and the fourth positioning ring; the rotating shaft is provided with a first via hole communicating with the first flow channel, a second via hole communicating with the second flow channel, a third via hole communicating with the third flow channel and a fourth via hole communicating with the gap. The problems that in the prior art, water pipes and air pipes are complex in wiring and difficult to install and maintain are solved.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor processing, in particular to a water gas distribution device and semiconductor processing equipment. Background Art

[0002] Ion beam etching and deposition equipment are key components and equipment used in MRAM, MEMS, optoelectronic IC, AR, VR and other fields. Among them, ion beam etching equipment is an irreplaceable core equipment required for a key process in the current 8nm and below semiconductor process.

[0003] During the wafer production process, the stability of the wafer surface temperature has an important impact on the quality of the chip. Keeping the wafer at a low temperature will prevent the wafer temperature from being too high and damaging the electronic components on the wafer. In order to ensure stability during wafer production, it is usually necessary to supply water and air to the substrate carrier where the wafer is placed to achieve a cooling effect to prevent the wafer from overheating.

[0004] However, currently, when supplying water and air to the substrate carrier, it is necessary to set up several water pipes and air pipes in the vacuum chamber for processing wafers and connect them to the substrate carrier, which makes the wiring complicated, especially since the space in the vacuum chamber is limited and installation and maintenance are difficult. Utility Model Content

[0005] The technical problem to be solved by the embodiments of the utility model is to provide a water-gas distribution device and semiconductor processing equipment to solve the problems of complex routing of water pipes and gas pipes and difficult installation and maintenance in the prior art.

[0006] The utility model discloses a water vapor distribution device, comprising: a cylinder, a rotating shaft, and a first positioning ring, a second positioning ring, a third positioning ring and a fourth positioning ring arranged in sequence in the cylinder and along the axial direction of the cylinder, a first end cover and a second end cover are respectively arranged at two axial ends of the cylinder, the rotating shaft passes through the first end cover and extends into the cylinder, a gap is provided between one end of the rotating shaft extending into the cylinder and the second end cover, and the inner rings of the first positioning ring, the second positioning ring, the third positioning ring and the fourth positioning ring are sealed and connected to the rotating shaft, and the outer rings of the first positioning ring, the second positioning ring, the third positioning ring and the fourth positioning ring are sealed and connected to the inner ring of the cylinder; the first positioning ring and the second A first flow channel is formed between the positioning rings, a second flow channel is formed between the second positioning ring and the third positioning ring, and a third flow channel is formed between the third positioning ring and the fourth positioning ring; a first interface connected to the first flow channel, a second interface connected to the second flow channel, and a third interface connected to the third flow channel are provided on the cylinder body, and a fourth interface connected to the gap is provided on the second end cover; a first through hole connected to the first flow channel, a second through hole connected to the second flow channel, a third through hole connected to the third flow channel, and a fourth through hole connected to the gap are provided on the rotating shaft, wherein the first interface and the second interface are used for water flow, and the third interface and the fourth interface are used for ventilation.

[0007] Optionally, an annular gasket is provided between the first end cover and the first positioning ring, and an annular protrusion is provided on the rotating shaft, and the annular protrusion abuts against the annular gasket.

[0008] Optionally, the first positioning ring includes a first ring body, and a first inner ring groove and a first outer ring groove arranged opposite to each other on the first ring body, a plurality of first abutting blocks abutting against the second positioning ring are arranged at intervals on the side of the first ring body facing the second positioning ring, the first inner ring groove is provided with a first inner sealing ring, the first outer ring groove is provided with a first outer sealing ring, the first inner sealing ring is used to seal the gap between the rotating shaft and the first positioning ring, and the first outer sealing ring is used to seal the gap between the cylinder body and the first positioning ring.

[0009] Optionally, the second positioning ring includes a second ring body, and a second inner ring groove and a second outer ring groove relatively arranged on the second ring body, a plurality of second abutment blocks are spaced apart on opposite sides of the axial direction of the second ring body, the first abutment block abuts against the second positioning ring through the second abutment block on one side, and abuts against the third positioning ring through the second abutment block on the other side; the second inner ring groove is provided with a second inner sealing ring, the second outer ring groove is provided with a second outer sealing ring, the second inner sealing ring is used to seal the gap between the rotating shaft and the second positioning ring, and the second outer sealing ring is used to seal the gap between the cylinder body and the second positioning ring.

[0010] Optionally, the third positioning ring includes a third ring body, and a third inner ring groove and a third outer ring groove relatively arranged on the third ring body, the third inner ring groove is spaced apart in two, and a plurality of third abutment blocks are spaced apart on opposite sides of the axial direction of the third ring body, the third abutment block on one side abuts against the second abutment block, and the third abutment block on the other side abuts against the fourth positioning ring; the third inner ring groove is provided with a third inner sealing ring, and the third outer ring groove is provided with a third outer sealing ring, the third inner sealing ring is used to seal the gap between the rotating shaft and the third positioning ring, and the third outer sealing ring is used to seal the gap between the cylinder body and the third positioning ring.

[0011] Optionally, the fourth positioning ring includes a fourth ring body, and a fourth inner ring groove and a fourth outer ring groove relatively arranged on the fourth ring body, a plurality of fourth abutment blocks abutting against the third abutment blocks are spaced apart on the side of the fourth ring body facing the third positioning ring, the side of the fourth ring body facing away from the third positioning ring abuts against the second end cover, the fourth inner ring groove is provided with a fourth inner sealing ring, the fourth outer ring groove is provided with a fourth outer sealing ring, the fourth inner sealing ring is used to seal the gap between the rotating shaft and the fourth positioning ring, and the fourth outer sealing ring is used to seal the gap between the cylinder body and the first positioning ring.

[0012] Optionally, the first interface includes a first seat body and a first socket connected to each other, the first seat body is detachably connected to the cylinder, and a first sealing ring is arranged between the first seat body and the cylinder; the second interface includes a second seat body and a second socket connected to each other, the second seat body is detachably connected to the cylinder, and a second sealing ring is arranged between the second seat body and the cylinder; the third interface includes a third seat body and a third socket connected to each other, the third seat body is detachably connected to the cylinder, and a third sealing ring is arranged between the third seat body and the cylinder; the fourth interface includes a fourth seat body and a fourth socket connected to each other, the fourth seat body is detachably connected to the second end cover, and a fourth sealing ring is arranged between the fourth seat body and the second end cover.

[0013] Optionally, the first positioning ring, the second positioning ring, the third positioning ring and the fourth positioning ring are made of polyetheretherketone.

[0014] Optionally, the inner wall of the cylinder is provided with a first annular groove corresponding to the first flow channel, a second annular groove corresponding to the second flow channel, and a third annular groove corresponding to the third flow channel; the first via hole includes a first extension section extending axially, and a first conductive section connecting the first flow channel and the first extension section; the second via hole includes a second extension section extending axially, and a second conductive section connecting the second flow channel and the second extension section; the third via hole includes a third extension section extending axially, and a third conductive section connecting the third flow channel and the third extension section; the fourth via hole is arranged to pass through the axial direction of the rotating shaft.

[0015] The utility model also discloses a semiconductor processing equipment, comprising the water gas distribution device as described in any one of the above.

[0016] Compared with the prior art, the beneficial effect of the water vapor distribution device and semiconductor processing equipment provided by the embodiment of the utility model is that: by respectively arranging the first end cover and the second end cover at both ends of the cylinder, the first positioning ring, the second positioning ring, the third positioning ring and the fourth positioning ring arranged in sequence in the cylinder can be positioned to ensure the stability of the current position. At the same time, by sealingly connecting the inner rings of the first positioning ring, the second positioning ring, the third positioning ring and the fourth positioning ring with the rotating shaft, and sealingly connecting the outer ring with the inner ring of the cylinder, it is beneficial to ensure that the first flow channel, the second flow channel and the third flow channel formed are independent of each other. In this way, when the first through hole on the rotating shaft is connected to the first flow channel and the second through hole is connected to the second flow channel, if the first through hole and the second through hole are connected at the substrate carrier, a circulation path can be formed between the first flow channel, the first through hole, the second through hole and the second flow channel. At this time, one of the first interface and the second interface is used for water inlet and the other is used for water outlet, so that a continuous cooling operation can be formed on the substrate carrier. Similarly, when the third via on the shaft is connected to the third flow channel, and the fourth via is connected to the gap, if the third via and the fourth via are connected at the substrate carrier, a circulation path can be formed between the third flow channel, the third via, the fourth via and the gap. At this time, one of the third interface and the fourth interface is used for air intake and the other is used for air outlet, which can be used to fill the vacuum environment between the substrate carrier and the wafer, and improve the heat conduction efficiency as a heat conduction medium to assist in cooling the wafer. Using the above method, when in use, it is only necessary to dock the corresponding pipelines with the first interface, the second interface, the third interface and the fourth interface respectively, so that the water vapor can be transferred through the shaft, without worrying about the entanglement of the pipelines, complicated wiring and other problems, thereby better solving the problems of complicated wiring of water pipes and air pipes and difficult installation and maintenance in the prior art. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] The technical solution of the utility model will be further described in detail below with reference to the accompanying drawings and embodiments, in which:

[0018] Figure 1 It is a structural schematic diagram of a water vapor distribution device provided by an embodiment of the utility model;

[0019] Figure 2 It is a cross-sectional schematic diagram of a water vapor distribution device provided by an embodiment of the utility model;

[0020] Figure 3 This is a schematic structural diagram of a rotating shaft provided by an embodiment of the utility model from a first viewing angle;

[0021] Figure 4 It is a structural schematic diagram of a second viewing angle of a rotating shaft provided by an embodiment of the utility model;

[0022] Figure 5 It is a schematic diagram of the structure in which the rotating shaft provided by the embodiment of the utility model cooperates with the first positioning ring, the second positioning ring, the third positioning ring and the fourth positioning ring respectively;

[0023] Figure 6 yes Figure 5 A schematic cross-sectional view of the structure shown;

[0024] Figure 7 It is a three-dimensional cross-sectional view of a cylinder provided by an embodiment of the utility model.

[0025] The reference numerals in the figures are:

[0026] 100, water vapor distribution device; 110, cylinder; 111, first flow channel; 112, second flow channel; 113, third flow channel; 114, first interface; 1142, first seat; 1144, first socket; 1146, first sealing ring; 115, second interface; 1152, second seat; 1154, second socket; 1156, second sealing ring; 116, third interface; 1162, third seat; 1164, third socket; 1166, third sealing ring; 117 , first annular groove; 118, second annular groove; 119, third annular groove; 120, rotating shaft; 122, first via hole; 1222, first extension section; 1224, first conductive section; 124, second via hole; 1242, second extension section; 1244, second conductive section; 126, third via hole; 1262, third extension section; 1264, third conductive section; 128, fourth via hole; 129, annular protrusion; 130, first positioning ring; 131, first ring body; 132, first an inner groove; 134, a first outer groove; 136, a first abutment block; 137, a first inner sealing ring; 138, a first outer sealing ring; 140, a second positioning ring; 141, a second ring body; 142, a second inner groove; 144, a second outer groove; 146, a second abutment block; 147, a second inner sealing ring; 148, a second outer sealing ring; 150, a third positioning ring; 151, a third ring body; 152, a third inner groove; 154, a third outer groove; 156, a third abutment block; 1 57. The third inner sealing ring; 158. The third outer sealing ring; 160. The fourth positioning ring; 161. The fourth ring body; 162. The fourth inner ring groove; 164. The fourth outer ring groove; 166. The fourth supporting block; 167. The fourth inner sealing ring; 168. The fourth outer sealing ring; 170. The first end cover; 180. The second end cover; 182. The fourth interface; 1822. The fourth seat body; 1824. The fourth socket; 1826. The fourth sealing ring; 184. The end cover sealing ring; 190. The annular gasket. DETAILED DESCRIPTION

[0027] It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of the present application can be combined with each other. Now, in conjunction with the accompanying drawings, a preferred embodiment of the present utility model is described in detail.

[0028] like Figures 1 to 4As shown, the embodiment of the utility model provides a water vapor distribution device 100, including: a cylinder 110, a rotating shaft 120, and a first positioning ring 130, a second positioning ring 140, a third positioning ring 150 and a fourth positioning ring 160 which are sequentially arranged in the cylinder 110 and along the axial direction of the cylinder 110, and a first end cover 170 and a second end cover 180 are respectively arranged at two axial ends of the cylinder 110, the rotating shaft 120 passes through the first end cover 170 and extends into the cylinder 110, and there is a gap between the end of the rotating shaft 120 extending into the cylinder 110 and the second end cover 180, and the inner rings of the first positioning ring 130, the second positioning ring 140, the third positioning ring 150 and the fourth positioning ring 160 are sealed and connected to the rotating shaft 120, and the outer rings of the first positioning ring 130, the second positioning ring 140, the third positioning ring 150 and the fourth positioning ring 160 are sealed and connected to the inner ring of the cylinder 110; the first positioning ring 130 and the second end cover 180 are sealed and connected to the outer rings of the first positioning ring 130, the second positioning ring 140, the third positioning ring 150 and the fourth positioning ring 160; A first flow channel 111 is formed between the two positioning rings 140, a second flow channel 112 is formed between the second positioning ring 140 and the third positioning ring 150, and a third flow channel 113 is formed between the third positioning ring 150 and the fourth positioning ring 160; a first interface 114 communicating with the first flow channel 111, a second interface 115 communicating with the second flow channel 112, and a third interface 116 communicating with the third flow channel 113 are provided on the cylinder 110, and a fourth interface 182 communicating with the gap is provided on the second end cover 180; a first through hole 122 communicating with the first flow channel 111, a second through hole 124 communicating with the second flow channel 112, a third through hole 126 communicating with the third flow channel 113, and a fourth through hole 128 communicating with the gap are provided on the rotating shaft 120, wherein the first interface 114 and the second interface 115 are used for water passage, and the third interface 116 and the fourth interface 182 are used for ventilation.

[0029] Specifically, in actual applications, the rotating shaft 120 is used to connect with the substrate stage to rotate synchronously with the substrate stage. By respectively providing a first end cap 170 and a second end cap 180 at both ends of the cylinder 110, the first positioning ring 130, the second positioning ring 140, the third positioning ring 150 and the fourth positioning ring 160 sequentially provided in the cylinder 110 can be positioned to ensure the stability of the current position. At the same time, by sealingly connecting the inner rings of the first positioning ring 130, the second positioning ring 140, the third positioning ring 150 and the fourth positioning ring 160 to the rotating shaft 120, and sealingly connecting the outer rings to the inner ring of the cylinder 110, it is helpful to ensure that the first flow channel 111, the second flow channel 112 and the third flow channel 113 formed are independent of each other. In this way, when the first through hole 122 on the rotating shaft 120 is connected to the first flow channel 111, and the second through hole 124 is connected to the second flow channel 112, if the first through hole 122 and the second through hole 124 are connected at the substrate carrier, a circulation passage can be formed between the first flow channel 111, the first through hole 122, the second through hole 124 and the second flow channel 112. At this time, one of the first interface 114 and the second interface 115 is used for water inlet and the other is used for water outlet, so that a continuous cooling operation can be formed on the substrate carrier. Similarly, when the third via hole 126 on the rotating shaft 120 is connected to the third flow channel 113, and the fourth via hole 128 is connected to the gap, if the third via hole 126 and the fourth via hole 128 are connected at the substrate carrier, a circulation path can be formed between the third flow channel 113, the third via hole 126, the fourth via hole 128 and the gap. At this time, one of the third interface 116 and the fourth interface 182 is used for air intake and the other is used for air outlet, which can be used to fill the vacuum environment between the substrate carrier and the wafer, and improve the heat conduction efficiency as a heat conduction medium to play a role in assisting the cooling of the wafer. Using the above method, when in use, it is only necessary to dock the corresponding pipelines with the first interface 114, the second interface 115, the third interface 116 and the fourth interface 182 respectively, and the water vapor can be transferred through the rotating shaft 120 without worrying about the entanglement of the pipelines and the complicated routing, thereby better solving the problems of complicated routing of water pipes and air pipes and difficult installation and maintenance in the prior art.

[0030] like Figure 2 As shown, an annular gasket 190 is disposed between the first end cover 170 and the first positioning ring 130 , and an annular protrusion 129 is disposed on the rotating shaft 120 , and the annular protrusion 129 abuts against the annular gasket 190 .

[0031] Specifically, the annular pad 190 cooperates with the annular protrusion 129 to limit the rotation shaft 120, thereby ensuring the stability of the above-mentioned gap. In use, the rotation shaft 120 is placed vertically. Under the weight of the rotation shaft 120, the rotation shaft 120 always maintains a stable relative relationship with the cylinder 110 to ensure the reliability of the water path and the gas path when the rotation shaft 120 rotates. In addition, the annular pad 190 can be made of copper, which can reduce the wear of the rotation shaft 120 when the rotation shaft 120 rotates, thereby increasing the service life of the rotation shaft 120.

[0032] like Figure 2 , Figure 5 and Figure 6 As shown, the first positioning ring 130 includes a first ring body 131, and a first inner ring groove 132 and a first outer ring groove 134 arranged opposite to each other on the first ring body 131, a plurality of first abutting blocks 136 abutting against the second positioning ring 140 are arranged at intervals on one side of the first ring body 131 facing the second positioning ring 140, the first inner ring groove 132 is provided with a first inner sealing ring 137, and the first outer ring groove 134 is provided with a first outer sealing ring 138, the first inner sealing ring 137 is used to seal the gap between the rotating shaft 120 and the first positioning ring 130, and the first outer sealing ring 138 is used to seal the gap between the cylinder body 110 and the first positioning ring 130.

[0033] Specifically, the first positioning ring 130 not only plays a role in positioning the first flow channel 111 in the axial direction, but also plays a role in limiting the rotation shaft 120 in the radial direction, thereby ensuring the reliability of the rotation shaft 120. At the same time, the first positioning ring 130 plays a role in supporting the first inner sealing ring 137 and the first outer sealing ring 138 through the first ring body 131. When the rotation shaft 120 is inserted into the first ring body 131, the first inner sealing ring 137 abuts between the first inner ring groove 132 and the rotation shaft 120 to play a sealing role. Similarly, the first ring body 131 is located in the annular space formed by the rotation shaft 120 and the cylinder 110. At this time, the first outer sealing ring 138 abuts between the first outer ring groove 134 and the cylinder 110 to play a sealing role. In addition, by disposing a plurality of first abutting blocks 136 that abut against the second positioning ring 140 at intervals on the side of the first ring body 131 facing the second positioning ring 140, it is beneficial to ensure the sealing of the first flow channel 111 itself, while also ensuring the fluidity of the first flow channel 111 on the cylinder 110 side and the rotating shaft 120 side, thereby ensuring the normal flow of the fluid in the first flow channel 111.

[0034] like Figure 2 , Figure 5 and Figure 6As shown, the second positioning ring 140 includes a second ring body 141, and a second inner ring groove 142 and a second outer ring groove 144 arranged opposite to each other on the second ring body 141, and a plurality of second abutting blocks 146 are arranged at intervals on opposite sides of the second ring body 141 axially, the first abutting block 136 abuts against the second positioning ring 140 through the second abutting block 146 on one side, and abuts against the third positioning ring 150 through the second abutting block 146 on the other side; the second inner ring groove 142 is provided with a second inner sealing ring 147, and the second outer ring groove 144 is provided with a second outer sealing ring 148, the second inner sealing ring 147 is used to seal the gap between the rotating shaft 120 and the second positioning ring 140, and the second outer sealing ring 148 is used to seal the gap between the cylinder 110 and the second positioning ring 140.

[0035] Specifically, the second positioning ring 140 not only plays a role in positioning the first flow channel 111 and the second flow channel 112 in the axial direction, but also plays a role in limiting the rotation shaft 120 in the radial direction, thereby ensuring the reliability of the rotation shaft 120. At the same time, the second positioning ring 140 plays a role in supporting the second inner sealing ring 147 and the second outer sealing ring 148 through the second ring body 141. When the rotation shaft 120 is inserted into the second ring body 141, the second inner sealing ring 147 abuts between the second inner ring groove 142 and the rotation shaft 120 to play a sealing role. Similarly, the second ring body 141 is located in the annular space formed by the rotation shaft 120 and the cylinder 110. At this time, the second outer sealing ring 148 abuts between the second outer ring groove 144 and the cylinder 110 to play a sealing role. In addition, the first abutting block 136 on the side of the first ring body 131 facing the second positioning ring 140 abuts against the second positioning ring 140 through the second abutting block 146, which is conducive to ensuring the sealing of the first flow channel 111 itself, and can also ensure the fluidity of the fluid on the cylinder 110 side and the rotating shaft 120 side of the first flow channel 111, and ensure the normal flow of the fluid in the first flow channel 111. It should be noted that in order to ensure the stable abutment between the relative first abutting block 136 and the second abutting block 146, it is necessary to ensure that the spacing between adjacent first abutting blocks 136 is less than the length of the second abutting block 146, avoid the phenomenon of misalignment, and can also widen the boundary of the first flow channel 111. In addition, the second abutting block 146 on the other side abuts against the third positioning ring 150, which is conducive to ensuring the sealing of the second flow channel 112 itself, and can also ensure the fluidity of the fluid on the cylinder 110 side and the rotating shaft 120 side of the second flow channel 112, and ensure the normal flow of the fluid in the second flow channel 112.

[0036] like Figure 2 , Figure 5 and Figure 6As shown, the third positioning ring 150 includes a third ring body 151, and a third inner ring groove 152 and a third outer ring groove 154 which are relatively arranged on the third ring body 151, the third inner ring groove 152 is arranged in two at intervals, and a plurality of third abutting blocks 156 are arranged at intervals on two opposite axial sides of the third ring body 151, the third abutting block 156 on one side abuts against the second abutting block 146, and the third abutting block 156 on the other side abuts against the fourth positioning ring 160; the third inner ring groove 152 is provided with a third inner sealing ring 157, and the third outer ring groove 154 is provided with a third outer sealing ring 158, the third inner sealing ring 157 is used to seal the gap between the rotating shaft 120 and the third positioning ring 150, and the third outer sealing ring 158 is used to seal the gap between the cylinder body 110 and the third positioning ring 150.

[0037] Specifically, the third positioning ring 150 not only plays a role in positioning the second flow channel 112 and the third flow channel 113 in the axial direction, but also plays a role in limiting the rotation shaft 120 in the radial direction, thereby ensuring the reliability of the rotation shaft 120. At the same time, the third positioning ring 150 plays a role in supporting the third inner sealing ring 157 and the third outer sealing ring 158 through the third ring body 151. When the rotation shaft 120 is inserted into the third ring body 151, the third inner sealing ring 157 abuts between the third inner ring groove 152 and the rotation shaft 120 to play a sealing role. Similarly, the third ring body 151 is located in the annular space formed by the rotation shaft 120 and the cylinder 110. At this time, the third outer sealing ring 158 abuts between the third outer ring groove 154 and the cylinder 110 to play a sealing role. In addition, the second abutting block 146 on the side of the second ring body 141 facing the third positioning ring 150 abuts against the third positioning ring 150 through the third abutting block 156, which is conducive to ensuring the sealing of the second flow channel 112 itself, and can also ensure the fluidity of the fluid on the cylinder 110 side and the rotating shaft 120 side of the second flow channel 112, and ensure the normal flow of the fluid in the second flow channel 112. It should be noted that in order to ensure the stable abutment between the relative second abutting block 146 and the third abutting block 156, it is necessary to ensure that the spacing between the adjacent second abutting blocks 146 is less than the length of the third abutting block 156, avoid the phenomenon of misalignment, and can also widen the boundary of the second flow channel 112. In addition, the third abutting block 156 on the other side abuts against the fourth positioning ring 160, which is conducive to ensuring the sealing of the third flow channel 113 itself, and can also ensure the fluidity of the fluid on the cylinder 110 side and the rotating shaft 120 side of the third flow channel 113, and ensure the normal flow of the fluid in the third flow channel 113.

[0038] It should also be noted that the third inner ring groove 152 at the third ring body 151 is set to be two at intervals, and two third inner sealing rings 157 can be set between the third ring body 151 and the rotating shaft 120 to play a double sealing role, especially for the critical positions of the water path and the air path. The above-mentioned setting form is conducive to ensuring the reliability of the seal and avoiding the phenomenon of water and gas mixing.

[0039] like Figure 2 , Figure 5 and Figure 6 As shown, the fourth positioning ring 160 includes a fourth ring body 161, and a fourth inner ring groove 162 and a fourth outer ring groove 164 arranged opposite to each other on the fourth ring body 161, a plurality of fourth abutting blocks 166 abutting against the third abutting blocks 156 are arranged at intervals on the side of the fourth ring body 161 facing the third positioning ring 150, and the side of the fourth ring body 161 facing away from the third positioning ring 150 abuts against the second end cover 180, the fourth inner ring groove 162 is provided with a fourth inner sealing ring 167, and the fourth outer ring groove 164 is provided with a fourth outer sealing ring 168, the fourth inner sealing ring 167 is used to seal the gap between the rotating shaft 120 and the fourth positioning ring 160, and the fourth outer sealing ring 168 is used to seal the gap between the cylinder 110 and the first positioning ring 130.

[0040] Specifically, the fourth positioning ring 160 not only plays a role in positioning the third flow channel 113 in the axial direction, but also plays a role in limiting the rotation shaft 120 in the radial direction, thereby ensuring the reliability of the rotation shaft 120. At the same time, the fourth positioning ring 160 plays a role in supporting the fourth inner sealing ring 167 and the fourth outer sealing ring 168 through the fourth ring body 161. When the rotation shaft 120 is inserted into the fourth ring body 161, the fourth inner sealing ring 167 abuts between the fourth inner ring groove 162 and the rotation shaft 120 to play a sealing role. Similarly, the fourth ring body 161 is located in the annular space formed by the rotation shaft 120 and the cylinder 110. At this time, the fourth outer sealing ring 168 abuts between the fourth outer ring groove 164 and the cylinder 110 to play a sealing role. In addition, the third abutting block 156 abuts against the fourth positioning ring 160 through the fourth abutting block 166 on the side of the third ring body 151 facing the fourth positioning ring 160, which is conducive to ensuring the sealing of the third flow channel 113 itself, and can also ensure the fluidity of the fluid on the cylinder 110 side and the rotating shaft 120 side of the third flow channel 113, and ensure the normal flow of the fluid in the third flow channel 113. It should be noted that in order to ensure the stable abutment between the relative third abutting block 156 and the fourth abutting block 166, it is necessary to ensure that the spacing between adjacent third abutting blocks 156 is less than the length of the fourth abutting block 166, avoid the phenomenon of misalignment, and widen the boundary of the third flow channel 113. The other side of the fourth positioning ring 160 abuts against the second end cover 180 to form a limit to avoid axial displacement.

[0041] like Figure 1 and Figure 2 As shown, the first interface 114 includes a first seat body 1142 and a first socket 1144 connected to each other, the first seat body 1142 is detachably connected to the cylinder 110, and a first sealing ring 1146 is provided between the first seat body 1142 and the cylinder 110; the second interface 115 includes a second seat body 1152 and a second socket 1154 connected to each other, the second seat body 1152 is detachably connected to the cylinder 110, and a second sealing ring 1156 is provided between the second seat body 1152 and the cylinder 110; The third interface 116 includes a third seat body 1162 and a third socket 1164 that are interconnected, the third seat body 1162 is detachably connected to the cylinder body 110, and a third sealing ring 1166 is arranged between the third seat body 1162 and the cylinder body 110; the fourth interface 182 includes a fourth seat body 1822 and a fourth socket 1824 that are interconnected, the fourth seat body 1822 is detachably connected to the second end cover 180, and a fourth sealing ring 1826 is arranged between the fourth seat body 1822 and the second end cover 180.

[0042] Specifically, the first interface 114 is convenient for connecting the first seat body 1142 to the cylinder body 110 through a fastener through the interconnected first seat body 1142 and the first socket 1144. In order to avoid leakage due to a gap at the connection, a first sealing ring 1146 can be provided between the first seat body 1142 and the cylinder body 110 to ensure the sealing of the connection. Similarly, the second interface 115 is convenient for connecting the second seat body 1152 to the cylinder body 110 through a fastener through the interconnected second seat body 1152 and the second socket 1154. In order to avoid leakage due to a gap at the connection, a second sealing ring 1156 can be provided between the second seat body 1152 and the cylinder body 110 to ensure the sealing of the connection. The third interface 116 is convenient for connecting the third seat body 1162 to the cylinder body 110 through a fastener through the interconnected third seat body 1162 and the third socket 1164. In order to avoid leakage due to a gap at the connection, a third sealing ring 1166 can be provided between the third seat body 1162 and the cylinder body 110 to ensure the sealing of the connection. The fourth interface 182 is convenient for connecting the fourth seat body 1822 to the second end cover 180 through a fastener through the interconnected fourth seat body 1822 and the fourth socket 1824. In order to avoid leakage due to a gap at the connection, a fourth sealing ring 1826 can be provided between the fourth seat body 1822 and the second end cover 180 to ensure the sealing of the connection.

[0043] In an optional embodiment of the present application, the first positioning ring 130 , the second positioning ring 140 , the third positioning ring 150 and the fourth positioning ring 160 are made of polyetheretherketone.

[0044] By adopting the above form, the first positioning ring 130, the second positioning ring 140, the third positioning ring 150 and the fourth positioning ring 160 have the advantages of good toughness and rigidity, self-lubricating wear resistance and high temperature resistance. When they are in contact with the rotating shaft 120, they serve as directional components of the main shaft, which can reduce mutual friction, ensure sealing effect and improve service life.

[0045] like Figure 3 , Figure 4 and Figure 7 As shown, the inner wall of the cylinder 110 is provided with a first annular groove 117 corresponding to the first flow channel 111, a second annular groove 118 corresponding to the second flow channel 112, and a third annular groove 119 corresponding to the third flow channel 113; the first through hole 122 includes a first extension section 1222 extending along the axial direction, and a first conducting section 1224 connecting the first flow channel 111 and the first extension section 1222; the second through hole 124 includes a second extension section 1242 extending along the axial direction, and a second conducting section 1244 connecting the second flow channel 112 and the second extension section 1242; the third through hole 126 includes a third extension section 1262 extending along the axial direction, and a third conducting section 1264 connecting the third flow channel 113 and the third extension section 1262; the fourth through hole 128 is arranged to pass through the axial direction of the rotating shaft 120.

[0046] Specifically, the first interface 114 is connected to the first annular groove 117, the second interface 115 is connected to the second annular groove 118, and the third interface 116 is connected to the third annular groove 119 to ensure the required connection relationship. At the same time, by the different lengths of the first extension section 1222, the second extension section 1242 and the third extension section 1262 on the rotating shaft 120, the first conduction section 1224 can correspond to the first flow channel 111, the second conduction section 1244 can correspond to the second flow channel 112, and the third conduction section 1264 can correspond to the third flow channel 113. In this way, during the rotation of the rotating shaft 120, the required passage relationship will not be affected to ensure the stability of water vapor distribution. In addition, since the fourth interface 182 is set at the second end cover 180, it is only necessary to set the fourth through hole 128 along the axial direction of the rotating shaft 120, so that it can be connected with the gap between the end of the rotating shaft 120 extending into the cylinder 110 and the second end cover 180 to form the required passage.

[0047] The utility model also discloses a semiconductor processing device, including the water gas distribution device 100 in the above-mentioned embodiment. The above-mentioned semiconductor processing device can be an ion beam etching device or an ion beam coating device, etc. The semiconductor processing device includes the same structure and beneficial effects as the water gas distribution device 100 in the above-mentioned embodiment. The structure and beneficial effects of the water gas distribution device 100 have been described in detail in the above-mentioned embodiment, and will not be repeated here.

[0048] It should be understood that the above embodiments are only used to illustrate the technical solutions of the present utility model rather than to limit it. For those skilled in the art, the technical solutions described in the above embodiments can be modified, or some of the technical features therein can be replaced by equivalents; and all these modifications and replacements should fall within the scope of protection of the claims attached to the present utility model.

Claims

1. A water vapor distribution device, characterized in that: include: A cylinder, a rotating shaft, and a first positioning ring, a second positioning ring, a third positioning ring and a fourth positioning ring arranged in sequence in the cylinder and along the axial direction of the cylinder, a first end cover and a second end cover are respectively arranged at both ends of the axial direction of the cylinder, the rotating shaft passes through the first end cover and extends into the cylinder, a gap is formed between the end of the rotating shaft extending into the cylinder and the second end cover, and the inner rings of the first positioning ring, the second positioning ring, the third positioning ring and the fourth positioning ring are sealed and connected to the rotating shaft, and the outer rings of the first positioning ring, the second positioning ring, the third positioning ring and the fourth positioning ring are sealed and connected to the inner ring of the cylinder; a first flow channel, a second flow channel is formed between the second positioning ring and the third positioning ring, and a third flow channel is formed between the third positioning ring and the fourth positioning ring; a first interface connected to the first flow channel, a second interface connected to the second flow channel, and a third interface connected to the third flow channel are provided on the cylinder body, and a fourth interface connected to the gap is provided on the second end cover; a first through hole connected to the first flow channel, a second through hole connected to the second flow channel, a third through hole connected to the third flow channel, and a fourth through hole connected to the gap are provided on the rotating shaft, wherein the first interface and the second interface are used for water flow, and the third interface and the fourth interface are used for ventilation.

2. The water vapor distribution device according to claim 1, characterized in that: An annular gasket is arranged between the first end cover and the first positioning ring, and an annular protrusion is arranged on the rotating shaft, and the annular protrusion abuts against the annular gasket.

3. The water vapor distribution device according to claim 2, characterized in that: The first positioning ring includes a first ring body, and a first inner ring groove and a first outer ring groove arranged opposite to each other on the first ring body, a plurality of first abutting blocks abutting against the second positioning ring are arranged at intervals on the side of the first ring body facing the second positioning ring, a first inner ring groove is provided with a first inner sealing ring, and a first outer ring groove is provided with a first outer sealing ring, the first inner sealing ring is used to seal the gap between the rotating shaft and the first positioning ring, and the first outer sealing ring is used to seal the gap between the cylinder body and the first positioning ring.

4. The water vapor distribution device according to claim 3, characterized in that: The second positioning ring includes a second ring body, and a second inner ring groove and a second outer ring groove relatively arranged on the second ring body, a plurality of second abutment blocks are spaced apart on opposite sides of the axial direction of the second ring body, the first abutment block abuts against the second positioning ring through the second abutment block on one side, and abuts against the third positioning ring through the second abutment block on the other side; the second inner ring groove is provided with a second inner sealing ring, the second outer ring groove is provided with a second outer sealing ring, the second inner sealing ring is used to seal the gap between the rotating shaft and the second positioning ring, and the second outer sealing ring is used to seal the gap between the cylinder body and the second positioning ring.

5. The water vapor distribution device according to claim 4, characterized in that: The third positioning ring includes a third ring body, and a third inner ring groove and a third outer ring groove relatively arranged on the third ring body, the third inner ring groove is set to be two at intervals, and a plurality of third abutment blocks are respectively arranged at intervals on two opposite axial sides of the third ring body, the third abutment block on one side abuts against the second abutment block, and the third abutment block on the other side abuts against the fourth positioning ring; the third inner ring groove is provided with a third inner sealing ring, and the third outer ring groove is provided with a third outer sealing ring, the third inner sealing ring is used to seal the gap between the rotating shaft and the third positioning ring, and the third outer sealing ring is used to seal the gap between the cylinder body and the third positioning ring.

6. The water vapor distribution device according to claim 5, characterized in that: The fourth positioning ring includes a fourth ring body, and a fourth inner ring groove and a fourth outer ring groove arranged opposite to each other on the fourth ring body, a plurality of fourth abutting blocks abutting against the third abutting blocks are arranged at intervals on the side of the fourth ring body facing the third positioning ring, and the side of the fourth ring body facing away from the third positioning ring abuts against the second end cover, the fourth inner ring groove is provided with a fourth inner sealing ring, and the fourth outer ring groove is provided with a fourth outer sealing ring, the fourth inner sealing ring is used to seal the gap between the rotating shaft and the fourth positioning ring, and the fourth outer sealing ring is used to seal the gap between the cylinder body and the first positioning ring.

7. The water vapor distribution device according to any one of claims 1 to 6, characterized in that: The first interface includes a first seat body and a first socket connected to each other, the first seat body is detachably connected to the cylinder, and a first sealing ring is arranged between the first seat body and the cylinder; the second interface includes a second seat body and a second socket connected to each other, the second seat body is detachably connected to the cylinder, and a second sealing ring is arranged between the second seat body and the cylinder; the third interface includes a third seat body and a third socket connected to each other, the third seat body is detachably connected to the cylinder, and a third sealing ring is arranged between the third seat body and the cylinder; the fourth interface includes a fourth seat body and a fourth socket connected to each other, the fourth seat body is detachably connected to the second end cover, and a fourth sealing ring is arranged between the fourth seat body and the second end cover.

8. The water vapor distribution device according to any one of claims 1 to 6, characterized in that: The first positioning ring, the second positioning ring, the third positioning ring and the fourth positioning ring are made of polyetheretherketone.

9. The water vapor distribution device according to any one of claims 1 to 6, characterized in that: The inner wall of the cylinder is provided with a first annular groove corresponding to the first flow channel, a second annular groove corresponding to the second flow channel, and a third annular groove corresponding to the third flow channel; the first via hole includes a first extension section extending along the axial direction, and a first conductive section connecting the first flow channel and the first extension section; the second via hole includes a second extension section extending along the axial direction, and a second conductive section connecting the second flow channel and the second extension section; the third via hole includes a third extension section extending along the axial direction, and a third conductive section connecting the third flow channel and the third extension section; the fourth via hole is arranged to pass through the axial direction of the rotating shaft.

10. A semiconductor processing equipment, characterized in that: The invention comprises the water vapor distribution device according to any one of claims 1 to 9.

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