Full-automatic online vacuum plasma machine

Abstract

The utility model relates to the technical field of vacuum plasma, and discloses a full-automatic online vacuum plasma machine which comprises a plasma main machine structure, a plasma lower cavity is installed on a top platform of the plasma main machine structure, a temperature measuring mechanism is arranged at the top of the plasma lower cavity, a transmission mechanism is arranged on the rear side of the temperature measuring mechanism, and the transmission mechanism is connected with the plasma main machine structure. A detection mechanism is installed on the right side of the lower plasma cavity, a lifting air cylinder is installed on the inner top of the lower plasma cavity, and the output end of the lifting air cylinder is fixedly connected with a guide fixing mechanism. According to the utility model, the problem of external rail transfer is solved by adopting the novel structure to transfer rails in the equipment, the external rail transfer can increase the space and cost of the equipment, the space of internal double-rail transfer can be reduced by two fifths compared with that of external rail transfer, and meanwhile, the problem of simultaneous feeding of two pieces can be solved; and the problems of online vacuum plasma cleaning capability and direct uniformity of each layer are solved, and the feeding efficiency is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of vacuum plasma, in particular to a full-automatic online vacuum plasma machine. Background Art

[0002] Currently, SMT processes such as PCB, FPC, FPCB, HDI, IC substrate, RPCB, mini LED, Msap, etc. require bonding strength testing, and plasma can effectively improve the dyne value of products and modify the surfaces of different materials, such as copper foil, gold surface, cover film CVL, electromagnetic film EMI, high-frequency material LPI, etc. After the dyne value of the product surface changes after plasma, bonding, dispensing, soldering, printing and other processes can be carried out, which can effectively improve the bonding between the product and the auxiliary materials.

[0003] The current mainstream plasma is atmospheric plasma at normal pressure, which is not up to the increasingly stringent quality requirements. Vacuum plasma is mainly offline or single-layer structure principle. This fully automatic multi-piece online vacuum plasma is to solve such bottlenecks. The fully automatic multi-piece vacuum online plasma needs to be able to take multiple pieces of products into the plasma chamber at one time. In view of the above problems, technicians in this field have proposed a fully automatic online vacuum plasma machine to solve the above problems. Utility Model Content

[0004] In order to make up for the above shortcomings, the utility model provides a fully automatic online vacuum plasma machine, aiming to improve the problem that the vacuum plasma machine in the prior art cannot meet the requirement of placing two pieces of products into the discharge cavity at one time to replace the completed products with the unfinished products.

[0005] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a fully automatic online vacuum plasma machine, comprising a plasma mainframe structure, a plasma lower cavity is installed on the top platform of the plasma mainframe structure, a temperature measuring mechanism is arranged on the top of the plasma lower cavity, a transmission mechanism is arranged on the rear side of the temperature measuring mechanism, a detection mechanism is installed on the right side of the plasma lower cavity, a lifting cylinder is installed on the inner top of the plasma lower cavity, a guiding fixing mechanism is fixedly connected to the output end of the lifting cylinder, an upper cavity fixing mechanism is fixedly connected to the bottom of the guiding fixing mechanism, an upper cavity fixing mechanism is fixedly connected to the plasma upper cavity, an inlet and outlet double track 1 and an inlet and outlet double track 2 with the same structure are arranged on the left and right sides of the top platform of the plasma mainframe structure, and an FFU filtering system is installed on the top of the plasma mainframe structure.

[0006] Furthermore, cavity tracks are installed around the top of the plasma lower cavity, a carrier guide rail is fixedly connected to the top of the plasma lower cavity, and a code reading mechanism is arranged on the left side of the top wall inside the plasma mainframe structure.

[0007] Furthermore, an in-and-out double track three and an in-and-out double track four are respectively arranged on the front and rear of the left side of the temperature measuring mechanism, a double track transverse movement mechanism is arranged on the left and right sides of the top of the plasma main engine structure, an in-and-out double track five and an in-and-out double track six are respectively arranged on the front and rear of the right side of the temperature measuring mechanism, the in-and-out double track three and the in-and-out double track four are both connected to the left double track transverse movement mechanism, and the in-and-out double track five and the in-and-out double track six are both connected to the right double track transverse movement mechanism.

[0008] Furthermore, a pushing mechanism 1 and a pushing mechanism 2 are respectively installed on the left and right sides of the front side of the transmission mechanism, the front and rear sides of the bottom of the pushing mechanism 1 are fixedly connected with a baffle mechanism 1, and the front and rear sides of the bottom of the pushing mechanism 2 are fixedly connected with a baffle mechanism 2.

[0009] Furthermore, a first positioning rod and a second positioning rod are respectively arranged on the left and right sides of the top front side of the plasma upper cavity, and a mounting block is arranged between the first positioning rod and the second positioning rod.

[0010] Furthermore, a vacuum pump is arranged on the rear side of the plasma host structure, a water chiller is arranged on one side of the vacuum pump, an operating keyboard and mouse are arranged on the front side of the plasma host structure, and an industrial computer is installed above the operating keyboard and mouse on the front side of the plasma host structure.

[0011] Furthermore, solenoid valve 1 and solenoid valve 2 are provided at the bottom of the plasma lower chamber, and solenoid valve 1 and solenoid valve 2 are connected by a pipeline. One end of solenoid valve 1 is fixedly connected to the output end of the vacuum pump through the pipeline, and the output end of solenoid valve 1 is fixedly connected with connecting pipe 1 and connecting pipe 2, and connecting pipe 2 and connecting pipe 1 are respectively fixed on the left and right sides of the interior of the plasma lower chamber.

[0012] Furthermore, a second fixing block and a first fixing block are fixedly connected to the left and right sides of the top of the plasma lower cavity respectively, and the outsides of the second fixing block and the first fixing block are fixedly connected to limit blocks, and the limit blocks are fixedly connected to the top of the plasma lower cavity.

[0013] The utility model has the following beneficial effects:

[0014] 1. In the utility model, a new structure is adopted to change the track inside the equipment to solve the problem of external track change. The external track change will increase the space of the equipment and increase the cost of the equipment. The internal double-track track change can reduce the space by two-fifths compared with the external track change. At the same time, it can also solve the problem of feeding two sheets at the same time, and also solve the cleaning ability of online vacuum plasma and the direct uniformity of each layer, and solve the problem of low feeding efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 A three-dimensional diagram of the fully automatic online vacuum plasma machine proposed in the utility model;

[0016] Figure 2 This is a schematic diagram of the plasma lower chamber structure of the fully automatic online vacuum plasma machine proposed in the utility model;

[0017] Figure 3 This is a schematic diagram of the double-track lateral movement mechanism structure of the fully automatic online vacuum plasma machine proposed in the utility model;

[0018] Figure 4 This is a schematic diagram of the second structure of the solenoid valve of the fully automatic online vacuum plasma machine proposed by the utility model.

[0019] Legend:

[0020] 1000, plasma host structure; 1001, vacuum pump; 1002, ice machine; 1003, FFU filtration system; 1004, operation keyboard and mouse; 1005, industrial computer; 2001, plasma lower cavity; 2002, cavity track; 2003, carrier guide rail; 2004, temperature measurement mechanism; 2005, detection mechanism; 2101, plasma upper cavity; 2102, upper cavity fixing mechanism; 2103, lifting cylinder; 2104, guiding and fixing mechanism; 2105, code reading mechanism; 2201, in and out double track one; 2202, in and out double track two; 2203, push Delivery mechanism one; 2204, baffle mechanism one; 2205, pushing mechanism two; 2206, baffle mechanism two; 2210, double-track transverse movement mechanism; 2211, in and out double-track three; 2212, in and out double-track four; 2213, transmission mechanism; 2214, in and out double-track five; 2215, in and out double-track six; 3001, fixed block one; 3002, fixed block two; 3003, connecting pipe one; 3004, connecting pipe two; 3005, solenoid valve one; 3006, solenoid valve two; 3007, limit block; 3101, positioning rod one; 3102, positioning rod two; 3103, mounting block. DETAILED DESCRIPTION

[0021] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0022] Reference Figure 1-Figure 3 The utility model provides an embodiment: a fully automatic online vacuum plasma machine, comprising a plasma mainframe structure 1000, a plasma lower cavity 2001 is installed on the top platform of the plasma mainframe structure 1000, a temperature measuring mechanism 2004 is arranged on the top of the plasma lower cavity 2001, a transmission mechanism 2213 is arranged on the rear side of the temperature measuring mechanism 2004, a detection mechanism 2005 is installed on the right side of the plasma lower cavity 2001, a lifting cylinder 2103 is installed on the inner top of the plasma lower cavity 2001, an output end of the lifting cylinder 2103 is fixedly connected with a guiding fixing mechanism 2104, a bottom of the guiding fixing mechanism 2104 is fixedly connected with an upper cavity fixing mechanism 2102, a bottom of the upper cavity fixing mechanism 2102 is fixedly connected with a plasma upper cavity 2101, and a plasma mainframe The left and right sides of the top platform of the structure 1000 are provided with an inlet and outlet double track 1 2201 and an inlet and outlet double track 2 2202 of the same structure, the top of the plasma host structure 1000 is installed with an FFU filtration system 1003, the top of the plasma lower cavity 2001 is installed with cavity tracks 2002 all around, the top of the plasma lower cavity 2001 is fixedly connected with a carrier guide rail 2003, a code reading mechanism 2105 is provided on the left side of the top wall of the plasma host structure 1000, a vacuum pump 1001 is provided on the rear side of the plasma host structure 1000, a chiller 1002 is provided on one side of the vacuum pump 1001, an operating keyboard and mouse 1004 is provided on the front side of the plasma host structure 1000, and an industrial computer 1005 is installed above the operating keyboard and mouse 1004 on the front side of the plasma host structure 1000.

[0023] Specifically, the plasma host structure 1000 can be used to protect the plasma lower cavity 2001, and the temperature in the cavity can be monitored by the temperature measuring mechanism 2004, so that the temperature can be adjusted at any time. The lifting cylinder 2103 can push the guiding fixing mechanism 2104 to move, thereby causing the upper cavity fixing mechanism 2102 to move downward, thereby pushing the plasma upper cavity 2101 and the plasma lower cavity 2001 closer to each other, and realizing the closure between the two, so that the vacuum pump 1001 and the ice machine 1002 are turned on, so that the vacuum pump 1001 draws the vacuum in the cavity to the set value. The transmission mechanism 2213 plays a driving role so that the pushing mechanism 1 2203 and the pushing mechanism 2 2205 can move, and the products can be transported through the in-and-out double track 1 2201 and the in-and-out double track 2 2202, so that the products can enter and exit the lower cavity, thereby improving the automation level of the equipment, eliminating the need for manual delivery and taking, and the carrier is driven to move by the carrier guide rail 2003 to achieve the feeding operation, and the camera installed on the code reading mechanism 2105 is convenient for reading the product code, and the equipment can be controlled by operating the keyboard and mouse 1004 and the industrial computer 1005, which is convenient for workers to operate.

[0024] Reference Figure 2 and Figure 3 The left front and rear sides of the temperature measuring mechanism 2004 are respectively provided with an in-and-out double track three 2211 and an in-and-out double track four 2212, the left and right sides of the top of the plasma mainframe structure 1000 are respectively provided with a double track transverse movement mechanism 2210, the right front and rear sides of the temperature measuring mechanism 2004 are respectively provided with an in-and-out double track five 2214 and an in-and-out double track six 2215, the in-and-out double track three 2211 and the in-and-out double track four 2212 are respectively connected to the left double track transverse movement mechanism 2210, the in-and-out double track five 2214 and the in-and-out double track six 2215 are both connected to the right double track transverse movement mechanism 2210, the front left and right sides of the transmission mechanism 2213 are respectively installed with a pushing mechanism one 2203 and a pushing mechanism two 2205, the front and rear sides of the bottom of the pushing mechanism one 2203 are fixedly connected with a baffle mechanism one 2204, and the front and rear sides of the bottom of the pushing mechanism two 2205 are fixedly connected with a baffle mechanism two 2206.

[0025] Specifically, through the sensors inside the in-and-out double track three 2211 and the in-and-out double track four 2212, the carrier can stop moving when it contacts the in-and-out double track three 2211, and the material blocking baffle drops. Through the operation of the double-track transverse movement mechanism 2210, the in-and-out double track three 2211 moves to the third station, and the in-and-out double track four 2212 integrated with the in-and-out double track three 2211 moves to the second station, so that the connected single-row carrier is fed into the in-and-out double track four 2212, and the carrier stops after sensing the in-place sensor, and the baffle drops, and the double-track transverse movement mechanism 2210 moves back to its position. At this time, after both product carriers are in place, the baffle mechanism one 2204 and the baffle mechanism two 2206 are opened, so that the transmission mechanism 2213 moves, and the carrier products in the cavity are pushed out, and the products on the feeding double track are pushed into the cavity, thereby realizing the feeding operation.

[0026] Reference Figure 2 and Figure 4 A positioning rod 1 3101 and a positioning rod 2 3102 are respectively arranged on the left and right sides of the top front side of the plasma upper chamber 2101, and a mounting block 3103 is arranged between the positioning rod 1 3101 and the positioning rod 2 3102. A solenoid valve 1 3005 and a solenoid valve 2 3006 are arranged at the bottom of the plasma lower chamber 2001. The solenoid valve 1 3005 and the solenoid valve 2 3006 are connected by a pipeline. One end of the solenoid valve 1 3005 is fixedly connected to the output end of the vacuum pump 1001 through the pipeline. The solenoid valve 1 3005 is fixedly connected to the output end of the vacuum pump 1001 through the pipeline. The output end of 005 is fixedly connected with connecting tube 1 3003 and connecting tube 2 3004, connecting tube 2 3004 and connecting tube 1 3003 are respectively fixed on the left and right sides of the interior of the plasma lower chamber 2001, and the left and right sides of the top of the plasma lower chamber 2001 are respectively fixedly connected with fixing block 2 3002 and fixing block 1 3001, and the outsides of fixing block 2 3002 and fixing block 1 3001 are fixedly connected with limiting block 3007, and limiting block 3007 is fixedly connected to the top of the plasma lower chamber 2001.

[0027] Specifically, by turning on the vacuum pump 1001 and the ice water machine 1002, the vacuum pump 1001 draws the vacuum in the cavity to the set value, so that the process gas can enter the pipeline, and through the control of the solenoid valve 1 3005 and the solenoid valve 2 3006, the gas can be ejected from the connecting pipe 1 3003 and the connecting pipe 2 3004 respectively, and after the plasma power supply is discharged, an electric field is formed between the electrode plates in the upper and lower cavities to ionize the process gas to form plasma, and the product surface in the cavity is cleaned to achieve the purpose of improving the dyne surface modification.

[0028] Working principle: The feeding width of the track is adjusted according to the width of the carrier. When a single-row carrier is feeding, the carrier enters the in-and-out double-track three 2211, and the carrier stops after contacting the in-position sensor inside the in-and-out double-track three 2211. At the same time, the material baffle plate drops, and the code reading mechanism 2105 is triggered to read the product code. After the reading is completed, the double-track transverse mechanism 2210 is operated to move the in-and-out double-track three 2211 to the third station, and the in-and-out double-track three 2211 is integrated with the in-and-out double-track three 2211. The outgoing double track 4 2212 moves to the second station, so that the connected single-row carrier is fed into the in-and-out double track 4 2212. When the carrier senses the in-position sensor, it stops, and the baffle drops at the same time. The double track transverse mechanism 2210 moves back to its original position. At this time, after both product carriers are in place, the baffle mechanism 1 2204 and the baffle mechanism 2 2206 open, so that the transmission mechanism 2213 moves, pushes out the carrier products in the cavity, and pushes the products on the in-feed double track into the cavity. Then the baffle mechanism 1 2204 and the baffle mechanism 2 2206 return to their original positions, and the transmission mechanism 2213 returns to its original position, so that the lifting cylinder 2103 lowers the plasma upper cavity 2101 to the lower limit, thereby closing the upper and lower cavities. The vacuum pump 1001 and the ice machine 1002 are turned on, so that the vacuum pump 1001 draws the vacuum in the cavity to the set value, and then the process gas solenoid valve 1 3005 and the solenoid valve 2 3006 are opened to feed the set process gas, and the plasma power supply is turned on to start discharging. The electric field is formed between the electrode plates in the upper and lower cavities to ionize the process gas to form plasma, and the surface of the product in the cavity is cleaned to achieve the purpose of improving the surface modification of dyne. The carrier products that have been completed and exited the cavity to the double track for material discharging are also the same as the feeding method. One product is discharged first, and then the double track is changed by the double track transverse mechanism 2210 to discharge another product.

[0029] Finally, it should be noted that the above is only a preferred embodiment of the present invention and is not intended to limit the present invention. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art can still modify the technical solutions described in the aforementioned embodiments or make equivalent substitutions for some of the technical features therein. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A fully automatic online vacuum plasma machine, comprising a plasma host structure (1000), characterized in that: A plasma lower chamber (2001) is installed on the top platform of the plasma mainframe structure (1000); a temperature measuring mechanism (2004) is arranged on the top of the plasma lower chamber (2001); a transmission mechanism (2213) is arranged on the rear side of the temperature measuring mechanism (2004); a detection mechanism (2005) is installed on the right side of the plasma lower chamber (2001); a lifting cylinder (2103) is installed on the inner top of the plasma lower chamber (2001); and the output end of the lifting cylinder (2103) is fixedly connected to the output end of the lifting cylinder (2103). A guiding and fixing mechanism (2104) is connected, the bottom of the guiding and fixing mechanism (2104) is fixedly connected to an upper cavity fixing mechanism (2102), the bottom of the upper cavity fixing mechanism (2102) is fixedly connected to a plasma upper cavity (2101), and the left and right sides of the top platform of the plasma mainframe structure (1000) are both provided with an inlet and outlet double track 1 (2201) and an inlet and outlet double track 2 (2202) with the same structure, and an FFU filtering system (1003) is installed on the top of the plasma mainframe structure (1000).

2. The fully automatic online vacuum plasma machine according to claim 1, characterized in that: Cavity rails (2002) are installed around the top of the plasma lower cavity (2001), a carrier guide rail (2003) is fixedly connected to the top of the plasma lower cavity (2001), and a code reading mechanism (2105) is arranged on the left side of the top wall of the plasma mainframe structure (1000).

3. The fully automatic online vacuum plasma machine according to claim 1, characterized in that: The left front and rear sides of the temperature measuring mechanism (2004) are respectively provided with an in-and-out double track three (2211) and an in-and-out double track four (2212); the left and right sides of the top of the plasma mainframe structure (1000) are both provided with a double track transverse movement mechanism (2210); the right front and rear sides of the temperature measuring mechanism (2004) are respectively provided with an in-and-out double track five (2214) and an in-and-out double track six (2215); the in-and-out double track three (2211) and the in-and-out double track four (2212) are both connected to the left double track transverse movement mechanism (2210); the in-and-out double track five (2214) and the in-and-out double track six (2215) are both connected to the right double track transverse movement mechanism (2210).

4. The fully automatic online vacuum plasma machine according to claim 1, characterized in that: A pushing mechanism 1 (2203) and a pushing mechanism 2 (2205) are respectively installed on the left and right sides of the front side of the transmission mechanism (2213); the front and rear sides of the bottom of the pushing mechanism 1 (2203) are fixedly connected with a baffle mechanism 1 (2204); the front and rear sides of the bottom of the pushing mechanism 2 (2205) are fixedly connected with a baffle mechanism 2 (2206).

5. The fully automatic online vacuum plasma machine according to claim 1, characterized in that: A positioning rod 1 (3101) and a positioning rod 2 (3102) are respectively arranged on the left and right sides of the top front side of the plasma upper cavity (2101), and a mounting block (3103) is arranged between the positioning rod 1 (3101) and the positioning rod 2 (3102).

6. The fully automatic online vacuum plasma machine according to claim 1, characterized in that: A vacuum pump (1001) is arranged on the rear side of the plasma host structure (1000), a water chiller (1002) is arranged on one side of the vacuum pump (1001), an operating keyboard and mouse (1004) is arranged on the front side of the plasma host structure (1000), and an industrial computer (1005) is installed above the operating keyboard and mouse (1004) on the front side of the plasma host structure (1000).

7. The fully automatic online vacuum plasma machine according to claim 1, characterized in that: The bottom of the plasma lower chamber (2001) is provided with an electromagnetic valve 1 (3005) and an electromagnetic valve 2 (3006), the electromagnetic valve 1 (3005) and the electromagnetic valve 2 (3006) are connected via a pipeline, one end of the electromagnetic valve 1 (3005) is fixedly connected to the output end of the vacuum pump (1001) via a pipeline, the output end of the electromagnetic valve 1 (3005) is fixedly connected with a connecting pipe 1 (3003) and a connecting pipe 2 (3004), and the connecting pipe 2 (3004) and the connecting pipe 1 (3003) are respectively fixed on the left and right sides of the interior of the plasma lower chamber (2001).

8. The fully automatic online vacuum plasma machine according to claim 1, characterized in that: The left and right sides of the top of the plasma lower cavity (2001) are respectively fixedly connected with a second fixed block (3002) and a first fixed block (3001); the outsides of the second fixed block (3002) and the first fixed block (3001) are both fixedly connected with a limiting block (3007); and the limiting block (3007) is fixedly connected to the top of the plasma lower cavity (2001).

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