Vacuumizing system of single crystal furnace

Abstract

The utility model relates to the technical field of vacuum systems, and provides a vacuumizing system of a single crystal furnace, which comprises at least one group of single crystal furnaces and pump stations, and each group of single crystal furnaces is correspondingly provided with one pump station; the pump station comprises a first vacuumizing device, a second vacuumizing device and a first control valve group; the performance index of the second vacuumizing device is superior to that of the first vacuumizing device; the first control valve group is suitable for controlling the on-off state between the first vacuumizing device and any single crystal furnace and is also suitable for controlling the on-off state between the second vacuumizing device and any single crystal furnace. According to the arrangement, one group of single crystal furnaces share one pump station, so that the arrangement number of the vacuum pumps is reduced, the occupied space is reduced, and the cost is reduced. And one of the first vacuumizing device and the second vacuumizing device is selected as required according to different working conditions, so that the waste problem caused by high configuration and low use is avoided.

Description

Technical Field

[0001] The utility model relates to the technical field of vacuum systems, and particularly relates to a vacuum pumping system for a single crystal furnace. Background Art

[0002] Single crystal furnaces are widely used in fields such as semiconductors, solar cells, optical materials, rotating machinery, and superalloys. Single crystal furnaces can produce long, straight, and large amounts of single crystal materials, which have excellent physical and chemical properties and perform well in many applications. Single crystals grow in a vacuum environment, which can effectively promote the gasification of impurities, reduce the influence of impurities on the quality of single crystals, and reduce the influence of quartz crucibles on the quality of single crystals. Moreover, the cost of high-purity argon is relatively high. Compared with growing single crystals in an argon atmosphere, growing single crystals in a vacuum environment can effectively reduce the cost of single crystals.

[0003] When growing single crystals in a vacuum environment, a vacuum pump needs to be equipped for the single crystal furnace. In the prior art, generally one vacuum pump is equipped for each single crystal furnace, that is, each single crystal furnace has an independent set of vacuum system, resulting in a large number of vacuum pumps, large occupied space, and high cost. Moreover, single crystal furnaces have different working conditions in actual use, such as pressure maintaining and crystal pulling, evacuation and leak detection, etc. Different working conditions have different requirements for the vacuum degree inside the single crystal furnace. To meet the requirements of a higher vacuum degree, the configuration and power of the vacuum pump used are relatively high. When the working condition has a lower requirement for the vacuum degree, using a vacuum pump with a high configuration and power means high configuration with low utilization, resulting in waste problems.

[0004] Therefore, how to solve the problems of large occupied space, high cost, and high configuration with low utilization caused by configuring a set of vacuum pumping system for each single crystal furnace in the prior art has become an important technical problem to be solved by those skilled in the art. Summary of the Utility Model

[0005] The utility model provides a vacuum pumping system for a single crystal furnace to solve the defects of large occupied space, high cost, and high configuration with low utilization caused by configuring a set of vacuum pumping system for each single crystal furnace in the prior art.

[0006] The utility model provides a vacuum pumping system for a single crystal furnace, including a single crystal furnace and a pumping station. At least one group of single crystal furnaces is provided, and one pumping station is correspondingly provided for each group of single crystal furnaces;

[0007] The pumping station includes a first vacuum pumping device, a second vacuum pumping device, and a first control valve group;

[0008] The performance index of the second vacuum pumping device is superior to that of the first vacuum pumping device;

[0009] The first control valve group has a first air outlet, a second air outlet and a plurality of air inlets. Each of a group of single crystal furnaces is correspondingly connected to one of the air inlets. The first air outlet is connected to the air extraction port of the first vacuum pumping device, and the second air outlet is connected to the air extraction port of the second vacuum pumping device. The first control valve group is adapted to control the on-off state between the first air outlet and any one of the air inlets, and is also adapted to control the on-off state between the second air outlet and any one of the air inlets.

[0010] According to a vacuum pumping system of a single crystal furnace provided by the present invention, the first vacuum pumping device includes a first vacuum pump, and the air extraction port of the first vacuum pump is connected to the first air outlet;

[0011] The second vacuum pumping device includes a second vacuum pump and a third vacuum pump. The air extraction port of the third vacuum pump is connected to the second air outlet, and the air extraction port of the second vacuum pump is connected to the exhaust port of the third vacuum pump.

[0012] According to a vacuum pumping system of a single crystal furnace provided by the present invention, the second vacuum pumping device further includes:

[0013] A vacuum box body is arranged between the second vacuum pump and the third vacuum pump. The air extraction port of the second vacuum pump and the exhaust port of the third vacuum pump are both connected to the vacuum box body.

[0014] According to a vacuum pumping system of a single crystal furnace provided by the present invention, the air extraction port of the first vacuum pump is further connected to the exhaust port of the second vacuum pump.

[0015] According to a vacuum pumping system of a single crystal furnace provided by the present invention, it further includes a filtering device. The filtering device is adapted to filter gas. Each of a group of single crystal furnaces is correspondingly provided with one filtering device, and the filtering device is arranged between the single crystal furnace and the air inlet of the first control valve group.

[0016] According to a vacuum pumping system of a single crystal furnace provided by the present invention, at least two first vacuum pumping devices are provided, and the air extraction ports of each of the first vacuum pumping devices are all connected to the first air outlet of the first control valve group.

[0017] According to a vacuum pumping system of a single crystal furnace provided by the present invention, at least two second vacuum pumps are provided, and the air extraction ports of each of the second vacuum pumps are all connected to the vacuum box body;

[0018] At least two third vacuum pumps are provided. The air extraction ports of each of the third vacuum pumps are all connected to the second air outlet, and the exhaust ports of each of the third vacuum pumps are all connected to the vacuum box body.

[0019] According to a vacuum pumping system for a single crystal furnace provided by the present utility model, at least two groups of the single crystal furnaces are provided, and one pumping station and one first control valve group are correspondingly provided for each group of the single crystal furnaces;

[0020] The vacuum pumping system of the single crystal furnace further includes a second control valve group. A second control valve group is provided between two adjacent ones of the pumping stations. The second control valve group has a first interface, a second interface, a third interface and a fourth interface. The first interface and the second interface are respectively connected to the first air outlets of the first control valve groups of two adjacent pumping stations, and the third interface and the fourth interface are respectively connected to the second air outlets of the first control valve groups of two adjacent pumping stations. The second control valve group is adapted to control the on-off state between the first interface and the second interface, and is adapted to control the on-off state between the third interface and the fourth interface.

[0021] According to a vacuum pumping system for a single crystal furnace provided by the present utility model, the first vacuum pump is a Roots vacuum pump, the second vacuum pump and the third vacuum pump are both screw pumps, and the pumping speed of the third vacuum pump is greater than that of the second vacuum pump.

[0022] According to a vacuum pumping system for a single crystal furnace provided by the present utility model, a control device is further included. The first vacuum pump, the second vacuum pump, the third vacuum pump and the first control valve group are all electrically connected to the control device.

[0023] The vacuum pumping system of the single crystal furnace provided by the present utility model includes a single crystal furnace and a pumping station. There is at least one group of single crystal furnaces, and one pumping station is correspondingly provided for each group of single crystal furnaces. The pumping station includes a first vacuum pumping device, a second vacuum pumping device, and a first control valve group. The performance index of the second vacuum pumping device is superior to that of the first vacuum pumping device. That is to say, compared with the first vacuum pumping device, the second vacuum pumping device is a high - configuration device. Both the first vacuum pumping device and the second vacuum pumping device are connected to a group of single crystal furnaces through the first control valve group. The first control valve group has a first air outlet, a second air outlet, and a plurality of air inlets. Each of the single crystal furnaces in a group is correspondingly connected to one air inlet. The first air outlet is connected to the air extraction port of the first vacuum pumping device, and the second air outlet is connected to the air extraction port of the second vacuum pumping device. The first control valve group can control the on - off state between the first air outlet and any one of the air inlets, and can also control the on - off state between the second air outlet and any one of the air inlets. That is to say, through the first control valve group, the on - off state between the first vacuum pumping device and any one of the single crystal furnaces can be controlled, and the on - off state between the second vacuum pumping device and any one of the single crystal furnaces can also be controlled. With such a setting, a group of single crystal furnaces share a pumping station. Through the same pumping station, any one of the single crystal furnaces in a group can be vacuum - pumped, realizing the sharing of the pumping station, reducing the number of vacuum pumps set, reducing the occupied space, and lowering the cost. Moreover, according to different working conditions, one of the first vacuum pumping device and the second vacuum pumping device can be selected as needed to vacuum - pump the single crystal furnace, which can avoid the waste problem caused by high - configuration devices being used with low requirements. Therefore, the problems of large occupied space, high cost, and high - configuration devices being used with low requirements caused by configuring a set of vacuum pumping systems for each single crystal furnace in the prior art are solved. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] In order to more clearly illustrate the technical solutions in the present utility model or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the following - described drawings are some embodiments of the present utility model. For those of ordinary skill in the art, other drawings can also be obtained based on these drawings without creative efforts.

[0025] Figure 1 It is a structural schematic diagram of the vacuum pumping system of the single crystal furnace provided by the present utility model when there is one group of single crystal furnaces and one pumping station.

[0026] Figure 2 It is a structural schematic diagram of the vacuum pumping system of the single crystal furnace provided by the present utility model when there are multiple groups of single crystal furnaces and multiple pumping stations.

[0027] Reference numerals:

[0028] 1. Single crystal furnace; 2. Pump station; 3. First control valve group; 4. First vacuum pump; 5. Second vacuum pump; 6. Third vacuum pump; 7. Vacuum chamber; 8. Filter device; 9. Second control valve group. Detailed implementation manner

[0029] To make the objectives, technical solutions and advantages of the present utility model clearer, the technical solutions in the present utility model will be clearly and completely described below with reference to the accompanying drawings in the present utility model. Obviously, the described embodiments are some, but not all, of the embodiments of the present utility model. All other embodiments obtained by those of ordinary skill in the art based on the embodiments in the present utility model without making creative efforts shall fall within the protection scope of the present utility model.

[0030] The following Figures 1 to 2 describes the vacuum pumping system of the single crystal furnace of the present utility model.

[0031] As Figures 1 to 2 shown, the vacuum pumping system of the single crystal furnace provided by the embodiment of the present utility model includes a single crystal furnace 1 and a pump station 2.

[0032] Specifically, at least one group of single crystal furnaces 1 is provided, and one pump station 2 is correspondingly provided for each group of single crystal furnaces 1. One group of single crystal furnaces 1 includes a plurality of single crystal furnaces 1, that is to say, a plurality of single crystal furnaces 1 correspond to one pump station 2.

[0033] The pump station 2 includes a first vacuum pumping device, a second vacuum pumping device and a first control valve group 3.

[0034] The performance indexes of the second vacuum pumping device are better than those of the first vacuum pumping device. The performance indexes include ultimate pressure, pumping speed and pumping volume. That is to say, the ultimate pressure of the second vacuum pumping device is lower than that of the first vacuum pumping device, and the pumping speed and pumping volume of the second vacuum pumping device are both greater than those of the first vacuum pumping device. It can be understood that, compared with the first vacuum pumping device, the second vacuum pumping device is a high - configuration device.

[0035] Both the first vacuum pumping device and the second vacuum pumping device are connected to one group of single crystal furnaces 1 through the first control valve group 3.

[0036] The first control valve group 3 has a first air outlet, a second air outlet and a plurality of air inlets. Each one in one group of single crystal furnaces 1 is correspondingly connected to one air inlet. The first air outlet is connected to the air suction port of the first vacuum pumping device, and the second air outlet is connected to the air suction port of the second vacuum pumping device.

[0037] The first control valve group 3 can control the on - off state between the first air outlet and any one of the air inlets, and can also control the on - off state between the second air outlet and any one of the air inlets.

[0038] That is to say, through the first control valve group 3, the on-off state between the first vacuum pumping device and any single crystal furnace 1 can be controlled, and the on-off state between the second vacuum pumping device and any single crystal furnace 1 can also be controlled.

[0039] With such a setting, a group of single crystal furnaces 1 share a single pump station 2. Through the same pump station 2, any one of the single crystal furnaces 1 in a group can be evacuated, realizing the sharing of the pump station 2, reducing the number of vacuum pumps installed, occupying less space, and lowering the cost. Moreover, according to different working conditions, one of the first vacuum pumping device and the second vacuum pumping device can be selected as needed to evacuate the single crystal furnace 1, which can avoid the waste problem caused by over-specification and under-utilization. Therefore, the problems of large space occupation, high cost, and over-specification and under-utilization existing in the prior art when a set of vacuum pumping systems are configured for each single crystal furnace are solved.

[0040] In addition, when a group of single crystal furnaces 1 share a single pump station 2, the vacuum pumps can be centrally managed and maintained, facilitating the development of centralized control.

[0041] It should be noted that for the single crystal furnace 1, the pressure of the single crystal furnace 1 is required to be 6 torr in the pressure-maintaining crystal pulling working condition, and the pressure of the single crystal furnace 1 is required to be 15 mtorr in the evacuation and leak detection working condition. The vacuum degree of the single crystal furnace 1 is relatively low in the pressure-maintaining crystal pulling working condition, and the vacuum degree of the single crystal furnace 1 is relatively high in the evacuation and leak detection working condition.

[0042] In a specific embodiment, the first control valve group 3 includes a first main pipeline, a second main pipeline, a first branch pipeline, a second branch pipeline, and a first control valve. There are multiple first branch pipelines, and the number of first branch pipelines is the same as the number of single crystal furnaces 1 in a group. The second ends of the multiple first branch pipelines are simultaneously connected to the first end of the first main pipeline, and the second end of the first main pipeline serves as the above-mentioned first air outlet. A first control valve is provided on each first branch pipeline, and the first control valve is used to control the on-off state of the corresponding first branch pipeline. A first control valve is also provided on the first main pipeline to control the on-off state of the first main pipeline. There are multiple second branch pipelines, and the number of second branch pipelines is the same as the number of single crystal furnaces 1 in a group. The second ends of the multiple second branch pipelines are simultaneously connected to the first end of the second main pipeline, and the second end of the second main pipeline serves as the above-mentioned second air outlet. A first control valve is provided on each second branch pipeline, and the first control valve is used to control the on-off state of the corresponding second branch pipeline. A first control valve is also provided on the second main pipeline to control the on-off state of the second main pipeline. The first ends of the respective first branch pipelines are connected to the first ends of the respective second branch pipelines in a one-to-one correspondence, serving as the above-mentioned air inlet. That is to say, each single crystal furnace 1 is simultaneously connected to a first branch pipeline and a second branch pipeline. By controlling each first control valve, the connection status of each single crystal furnace 1 in a group of the first control valve group 3 with the first vacuum pumping device and the second vacuum pumping device can be controlled.

[0043] In an embodiment of the present utility model, the first vacuum pumping device includes a first vacuum pump 4. The first vacuum pump 4 has an air extraction port and an exhaust port. The air extraction port of the first vacuum pump 4 is connected to the first air outlet of the first control valve group 3, and the exhaust port of the first vacuum pump 4 is connected to the atmosphere or to an exhaust gas treatment device.

[0044] When the first control valve group 3 controls its air inlet to be connected to the first air outlet, the first vacuum pump 4 operates, and the single crystal furnace 1 can be evacuated.

[0045] In this embodiment, the second vacuum pumping device includes a second vacuum pump 5 and a third vacuum pump 6. Both the second vacuum pump 5 and the third vacuum pump 6 have an air extraction port and an exhaust port. The air extraction port of the third vacuum pump 6 is connected to the second air outlet of the first control valve group 3, the air extraction port of the second vacuum pump 5 is connected to the exhaust port of the third vacuum pump 6, and the exhaust port of the second vacuum pump 5 is connected to the atmosphere or to an exhaust gas treatment device.

[0046] When the first control valve group 3 controls its air inlet to be connected to the second air outlet, the first vacuum pump 4 and the second vacuum pump 5 operate, and the single crystal furnace 1 can be evacuated.

[0047] In a further embodiment, the second vacuum pumping device further includes a vacuum chamber 7, which is disposed between the second vacuum pump 5 and the third vacuum pump 6. The air suction port of the second vacuum pump 5 and the exhaust port of the third vacuum pump 6 are both connected to the vacuum chamber 7.

[0048] With such a setting, when performing a vacuum pumping operation using the second vacuum pumping device, the second vacuum pump 5 can be first operated to pump the vacuum chamber 7. When the vacuum degree in the vacuum chamber 7 reaches a certain value, the third vacuum pump 6 is then controlled to operate to pump the single crystal furnace 1. The setting of the vacuum chamber 7 and the second vacuum pump 5 significantly reduces the pressure at the exhaust port of the third vacuum pump 6, reduces the load of the third vacuum pump 6, is beneficial to improving the vacuum pumping efficiency of the third vacuum pump 6, shortening the time required for evacuation and leak detection, and improving the crystal pulling efficiency.

[0049] It should be noted that a group of single crystal furnaces 1 has multiple single crystal furnaces 1. The single crystal furnaces 1 in a group can simultaneously perform a pressure maintaining crystal pulling operation, or can simultaneously perform an evacuation and leak detection operation, or one or several single crystal furnaces 1 in a group can perform a pressure maintaining crystal pulling operation, and the remaining single crystal furnaces 1 can perform an evacuation and leak detection operation.

[0050] When it is necessary to evacuate and detect leaks in one of the single crystal furnaces 1, this single crystal furnace 1 is called the target single crystal furnace. When starting the operation of the second vacuum pump 5, it can be ensured that the air inlet and the second air outlet corresponding to the target single crystal furnace on the first control valve group 3 are cut off. When the second vacuum pump 5 operates, it only pumps the vacuum chamber 7 and has no influence on the target single crystal furnace. When the vacuum degree in the vacuum chamber 7 reaches a certain value, the air inlet and the second air outlet corresponding to the target single crystal furnace on the first control valve group 3 are connected, and the pressure in the vacuum chamber 7 is balanced with the pressure in the target single crystal furnace, so that the vacuum degree in the target single crystal furnace can be quickly reduced. Then, the third vacuum pump 6 and the second vacuum pump 5 are simultaneously operated for a vacuum pumping operation.

[0051] After the vacuum pumping system of the single crystal furnace starts to operate, the second vacuum pump 5 can be operated intermittently to keep the vacuum degree in the vacuum chamber 7 at a certain value. In this way, when it is necessary to evacuate and detect leaks in the single crystal furnace 1, the time for the second vacuum pump 5 to pump the vacuum chamber 7 can be reduced, the time required for evacuation and leak detection can be further shortened, and the crystal pulling efficiency can be improved.

[0052] In some embodiments, the air suction port of the first vacuum pump 4 is also connected to the exhaust port of the second vacuum pump 5. A control valve is provided between the air suction port of the first vacuum pump 4 and the exhaust port of the second vacuum pump 5. When the control valve is opened and the first vacuum pump 4 operates, it can also pump the vacuum chamber 7 together with the second vacuum pump 5.

[0053] In the embodiment of the present utility model, the vacuum pumping system of the single crystal furnace further includes a filtering device 8, and the filtering device 8 can filter gases.

[0054] Each of a group of single crystal furnaces 1 is correspondingly provided with a filtering device 8, and the filtering device 8 is arranged between the single crystal furnace 1 and the air inlet of the first control valve group 3.

[0055] When performing a vacuum pumping operation on each single crystal furnace 1, the gases in each single crystal furnace 1 will enter the first control valve group 3 through the filtering device 8. The filtering device 8 filters out impurities in the gases, preventing the impurities from entering the first control valve group 3, reducing the damage to the first control valve group 3, and prolonging the service life of the first control valve group 3.

[0056] In this embodiment, at least two first vacuum pumps 4 are provided, and the first vacuum pumps 4 are arranged in parallel. That is to say, the air extraction ports of the first vacuum pumps 4 are all connected to the first air outlet of the first control valve group 3, and the exhaust ports of the first vacuum pumps 4 are all connected to the atmosphere or to the waste gas treatment device.

[0057] When the first control valve group 3 controls its first air outlet to be connected to any one of the air inlets, any one of the first vacuum pumps 4 can complete the vacuum pumping operation when running. The first vacuum pumps 4 can run simultaneously, or only one of the first vacuum pumps 4 can run alone.

[0058] The above-mentioned first vacuum pumps 4 backup each other. When one of the first vacuum pumps 4 fails, the vacuum pumping operation can still be completed by using the remaining first vacuum pumps 4. A control valve is arranged at the air extraction port of each first vacuum pump 4, and the control valve at the air extraction port of the failed first vacuum pump 4 is closed, so that the failed first vacuum pump 4 can be repaired without affecting the continuous operation of the vacuum pumping system of the single crystal furnace, and avoiding the shutdown of the vacuum pumping system of the single crystal furnace due to a failure.

[0059] In a specific embodiment, two first vacuum pumps 4 are provided. A single vacuum pump that can meet the performance index requirements can be selected as one of the first vacuum pumps 4, and this pump can operate continuously to improve the stability of the vacuum degree of the single crystal furnace 1. Two or more vacuum pumps connected in series that can meet the performance index requirements are selected as the other first vacuum pump 4. The first vacuum pump 4 formed by two or more in series is only used for emergency, which can further reduce costs.

[0060] In this embodiment, at least two second vacuum pumps 5 are provided, and the second vacuum pumps 5 are arranged in parallel. That is to say, the air extraction ports of the second vacuum pumps 5 are all connected to the vacuum chamber 7, and the exhaust ports of the second vacuum pumps 5 are all connected to the atmosphere or to the waste gas treatment device.

[0061] When any second vacuum pump 5 operates, the evacuation operation of the vacuum chamber 7 can be completed. Each of the second vacuum pumps 5 can operate simultaneously or only one of the second vacuum pumps 5 can operate independently.

[0062] The above-mentioned second vacuum pumps 5 backup each other. When one of the second vacuum pumps 5 fails, the evacuation operation can still be completed by using the remaining second vacuum pumps 5. Control valves are provided at the air extraction ports of each second vacuum pump 5. By closing the control valve at the air extraction port of the failed second vacuum pump 5, the failed second vacuum pump 5 can be repaired without affecting the continuous operation of the evacuation system of the single crystal furnace, and avoiding the shutdown of the evacuation system of the single crystal furnace due to failure.

[0063] In a specific embodiment, two second vacuum pumps 5 are provided. A single vacuum pump that can meet the performance index requirements can be selected as one of the second vacuum pumps 5, and two or more vacuum pumps connected in series that can meet the performance index requirements can be selected as the other second vacuum pump 5. The second vacuum pump 5 formed by two or more in series is only used for emergency, which can further reduce costs.

[0064] Correspondingly, at least two third vacuum pumps 6 are provided, and the third vacuum pumps 6 are connected in parallel. That is to say, the air extraction ports of the third vacuum pumps 6 are all connected to the second air outlet, and the exhaust ports of the third vacuum pumps 6 are all connected to the vacuum chamber 7.

[0065] When any third vacuum pump 6 operates, the evacuation operation can be completed. Each of the third vacuum pumps 6 can operate simultaneously or only one of the third vacuum pumps 6 can operate independently.

[0066] The above-mentioned third vacuum pumps 6 backup each other. When one of the third vacuum pumps 6 fails, the evacuation operation can still be completed by using the remaining third vacuum pumps 6. Control valves are provided at both the air extraction port and the exhaust port of each third vacuum pump 6. By closing the control valve at the air extraction port and the exhaust port of the failed third vacuum pump 6, the failed third vacuum pump 6 can be repaired without affecting the continuous operation of the evacuation system of the single crystal furnace, and avoiding the shutdown of the evacuation system of the single crystal furnace due to failure.

[0067] In a specific embodiment, two third vacuum pumps 6 are provided. A single vacuum pump that can meet the performance index requirements can be selected as one of the third vacuum pumps 6, and two or more vacuum pumps connected in series that can meet the performance index requirements can be selected as the other third vacuum pump 6. The third vacuum pump 6 formed by two or more in series is only used for emergency, which can further reduce costs.

[0068] In the embodiment of the present utility model, at least two groups of single crystal furnaces 1 are provided, and each group of single crystal furnaces 1 is correspondingly provided with a pumping station 2 and a first control valve group 3.

[0069] At this time, the vacuum pumping system of the single crystal furnace further includes a second control valve group 9, and a second control valve group 9 is arranged between two adjacent ones of the pumping stations 2. That is to say, two adjacent ones of the pumping stations 2 are connected through the second control valve group 9.

[0070] The second control valve group 9 has a first interface, a second interface, a third interface and a fourth interface. The first interface and the second interface are respectively connected to the first air outlets of the first control valve groups 3 of two adjacent pumping stations 2, and the third interface and the fourth interface are respectively connected to the second air outlets of the first control valve groups 3 of two adjacent pumping stations 2.

[0071] The second control valve group 9 can control the on-off state between the first interface and the second interface, and can also control the on-off state between the third interface and the fourth interface.

[0072] Specifically, taking the vacuum pumping system of the single crystal furnace including two groups of single crystal furnaces 1, two pumping stations 2 and two first control valve groups 3 as an example, at this time, one second control valve group 9 needs to be set. Generally, the two pumping stations 2 correspond to the two groups of single crystal furnaces 1 one by one. The two pumping stations 2 are respectively a first pumping station 2 and a second pumping station 2. The first pumping station 2 is used to perform vacuum pumping operation on one group of single crystal furnaces 1, and the second pumping station 2 is used to perform vacuum pumping operation on the other group of single crystal furnaces 1. When one of the pumping stations 2 fails, the other pumping station 2 can be used to perform vacuum pumping operation on the two groups of single crystal furnaces 1.

[0073] With such a setting, each of the pumping stations 2 serves as a backup for each other. When one or several of the pumping stations 2 fail, the remaining pumping stations 2 can be used to perform vacuum pumping operation, without affecting the operation of the vacuum pumping system of the single crystal furnace.

[0074] There are many single crystal furnaces 1 in some large bases in the crystal pulling base. For example, in a 40GW large base, there are approximately 2,800 single crystal furnaces 1. The single crystal furnaces 1 in the crystal pulling base can be grouped, and each group of single crystal furnaces 1 is correspondingly provided with a pumping station 2 and a first control valve group 3, so as to realize hierarchical and zonal design and control of the single crystal material production site, which is convenient for management.

[0075] In a specific embodiment, the second control valve group 9 includes a first pipeline, a second pipeline and a second control valve. The two ends of the first pipeline are respectively used as a first interface and a second interface, and a second control valve is arranged on the first pipeline, and the second control valve is used to control the on-off state of the first pipeline. The two ends of the second pipeline are respectively used as a third interface and a fourth interface, and a second control valve is arranged on the second pipeline, and the second control valve is used to control the on-off state of the second pipeline. By controlling each second control valve, the connection state between two adjacent pumping stations 2 and the first control valve group 3 can be controlled.

[0076] In the embodiment of the present invention, the vacuum pumping system of the single crystal furnace further includes a control device. The first vacuum pump 4, the second vacuum pump 5, the third vacuum pump 6 and the first control valve group 3 are all electrically connected to the control device. The control device can control the actions of the first vacuum pump 4, the second vacuum pump 5, the third vacuum pump 6 and the first control valve group 3, which is beneficial to realize automatic control and reduce manual operation.

[0077] In this embodiment, the first vacuum pump 4 can be, but is not limited to, a Roots vacuum pump. The second vacuum pump 5 and the third vacuum pump 6 can be, but is not limited to, screw pumps. The pumping rate of the third vacuum pump 6 is greater than that of the second vacuum pump 5.

[0078] In summary, the vacuum pumping system of the single crystal furnace provided by the embodiment of the present invention integrates the pumping stations 2, reduces the materials around the furnace area of the crystal pulling base, saves the installation space and is more convenient for maintenance. The number of vacuum pumps used is reduced, and the cost is greatly saved. It can realize hierarchical and zonal control for two different working conditions, and solve the current situation of high configuration with low utilization. The first vacuum pump 4, the second vacuum pump 5 and the third vacuum pump 6 are all equipped with standby pumps, and even the pumping stations 2 are backed up with each other, which can ensure that the vacuum pumping system of the single crystal furnace can still operate normally when individual components fail, and avoid the pain point problem of the vacuum pumping system of the single crystal furnace being shut down and replaced due to failures. Integrating the pumping stations 2 is more suitable for the trend and requirements of centralized control or AI control of large bases with multiple furnace platforms in the current crystal pulling industry, and realizes centralized control and centralized management.

[0079] On the other hand, the present invention also provides a vacuum pumping method for a single crystal furnace based on the vacuum pumping system of the single crystal furnace provided in any of the above embodiments. The vacuum pumping method for the single crystal furnace described below can be mutually referred to with the vacuum pumping system of the single crystal furnace described above.

[0080] When the single crystal furnace 1 is in the pressure-maintaining crystal pulling working condition, the target vacuum degree of the single crystal furnace 1 is the first vacuum degree; when the single crystal furnace 1 is in the evacuation and leak detection working condition, the target vacuum degree of the single crystal furnace 1 is the second vacuum degree, and the second vacuum degree is greater than the first vacuum degree.

[0081] In the vacuum pumping method of the single crystal furnace provided by the embodiment of the present utility model, when it is necessary to make the target vacuum degree of the target single crystal furnace be the first vacuum degree, one of the intake ports of the first control valve group 3 corresponding to the target single crystal furnace is communicated with the first outlet port, and is cut off from the second outlet port, and the first vacuum pump 4 is operated.

[0082] When it is necessary to make the target vacuum degree of the target single crystal furnace be the second vacuum degree, it is ensured that one of the intake ports of the first control valve group 3 corresponding to the target single crystal furnace is cut off from the second outlet port, and the second vacuum pump 5 is operated until the vacuum degree in the vacuum chamber 7 is the third vacuum degree, and the third vacuum degree is less than the second vacuum degree.

[0083] Then, one of the intake ports of the first control valve group 3 corresponding to the target single crystal furnace is communicated with the second outlet port, and is cut off from the first outlet port, and the third vacuum pump 6 is operated until the vacuum degree in the target single crystal furnace is the second vacuum degree. At this time, the third vacuum pump 6 can be stopped, and the second vacuum pump 5 is operated intermittently to ensure the vacuum degree in the vacuum chamber 7.

[0084] The derivation process of the beneficial effects of the vacuum pumping method of the single crystal furnace in the embodiment of the present utility model is substantially similar to the derivation process of the beneficial effects of the above-mentioned vacuum pumping system of the single crystal furnace, so it will not be elaborated here.

[0085] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present utility model, and are not intended to limit them; although the present utility model has been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand that: they can still modify the technical solutions described in the foregoing embodiments, or perform equivalent replacements for some of the technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the spirit and scope of the technical solutions of the embodiments of the present utility model.

Claims

1. A vacuum pumping system for a single crystal furnace, characterized in that: It comprises a single crystal furnace (1) and a pump station (2), wherein the single crystal furnace (1) is provided with at least one group, and each group of the single crystal furnace (1) is provided with a corresponding pump station (2); The pump station (2) comprises a first vacuum pumping device, a second vacuum pumping device and a first control valve group (3); The performance index of the second vacuum pumping device is better than the performance index of the first vacuum pumping device; The first control valve group (3) has a first gas outlet, a second gas outlet and a plurality of gas inlets, each of a group of the single crystal furnaces (1) is connected to a corresponding gas inlet, the first gas outlet is connected to the gas outlet of the first vacuum pumping device, the second gas outlet is connected to the gas outlet of the second vacuum pumping device, and the first control valve group (3) is suitable for controlling the on-off state between the first gas outlet and any one of the gas inlets, and is suitable for controlling the on-off state between the second gas outlet and any one of the gas inlets.

2. The vacuum pumping system of the single crystal furnace according to claim 1, characterized in that: The first vacuum extraction device comprises a first vacuum pump (4), and the air extraction port of the first vacuum pump (4) is connected to the first air outlet; The second vacuum pumping device comprises a second vacuum pump (5) and a third vacuum pump (6), the suction port of the third vacuum pump (6) being connected to the second air outlet, and the suction port of the second vacuum pump (5) being connected to the exhaust port of the third vacuum pump (6).

3. The vacuum pumping system of the single crystal furnace according to claim 2, characterized in that: The second vacuum pumping device also includes: The vacuum box (7) is arranged between the second vacuum pump (5) and the third vacuum pump (6); the suction port of the second vacuum pump (5) and the exhaust port of the third vacuum pump (6) are both connected to the vacuum box (7).

4. The vacuum pumping system of the single crystal furnace according to claim 3, characterized in that: The suction port of the first vacuum pump (4) is also connected to the exhaust port of the second vacuum pump (5).

5. The vacuum pumping system for a single crystal furnace according to claim 1, characterized in that: It also includes a filtering device (8), which is suitable for filtering gas. Each of the single crystal furnaces (1) is provided with a corresponding filtering device (8), and the filtering device (8) is arranged between the single crystal furnace (1) and the air inlet of the first control valve group (3).

6. The vacuum pumping system of the single crystal furnace according to claim 1, characterized in that: At least two first vacuum pumping devices are provided, and the air suction port of each first vacuum pumping device is connected to the first air outlet of the first control valve group (3).

7. The vacuum pumping system of the single crystal furnace according to claim 3, characterized in that: At least two second vacuum pumps (5) are provided, and the air suction port of each second vacuum pump (5) is connected to the vacuum box (7); At least two third vacuum pumps (6) are provided, the suction port of each third vacuum pump (6) is connected to the second air outlet, and the exhaust port of each third vacuum pump (6) is connected to the vacuum box (7).

8. The vacuum pumping system of the single crystal furnace according to claim 1, characterized in that: The single crystal furnace (1) is provided with at least two groups, and each group of the single crystal furnace (1) is provided with a corresponding pump station (2) and a first control valve group (3); The vacuum pumping system of the single crystal furnace further comprises a second control valve group (9), wherein a second control valve group (9) is arranged between two adjacent ones of the pump stations (2), wherein the second control valve group (9) comprises a first interface, a second interface, a third interface and a fourth interface, wherein the first interface and the second interface are respectively connected to the first gas outlets of the first control valve groups (3) of the two adjacent pump stations (2), wherein the third interface and the fourth interface are respectively connected to the second gas outlets of the first control valve groups (3) of the two adjacent pump stations (2), wherein the second control valve group (9) is suitable for controlling the on-off state between the first interface and the second interface, and is suitable for controlling the on-off state between the third interface and the fourth interface.

9. The vacuum pumping system for a single crystal furnace according to claim 2, characterized in that: The first vacuum pump (4) is a Roots vacuum pump, the second vacuum pump (5) and the third vacuum pump (6) are both screw pumps, and the pumping rate of the third vacuum pump (6) is greater than the pumping rate of the second vacuum pump (5).

10. The vacuum pumping system of a single crystal furnace according to claim 3, characterized in that: It also comprises a control device, and the first vacuum pump (4), the second vacuum pump (5), the third vacuum pump (6) and the first control valve group (3) are all electrically connected to the control device.

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