Silicon particle production device

Abstract

The utility model provides a silicon particle production device which comprises a tundish used for storing silicon liquid and provided with a liquid inlet, a liquid outlet and a liquid outlet pipe connected with the liquid outlet. The granulation chamber is located below the tundish, and the granulation chamber is provided with a feeding port located in the top of the granulation chamber and connected with the liquid outlet pipe and a discharging port located in the bottom of the granulation chamber; the granulating mechanism comprises a rotating disc which is arranged in the granulating chamber and is positioned below the liquid outlet pipe, and a driving assembly for driving the rotating disc to rotate; the cooling system is used for cooling the interior of the granulation chamber; silicon particles can be rapidly obtained, and the automation degree of industrial silicon preparation is improved; meanwhile, a finishing and crushing procedure in the traditional industrial silicon preparation is omitted, the production process flow is reduced, the working environment of staff is improved, equipment such as an ingot mould is omitted correspondingly, and the equipment operation cost is reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of industrial silicon production, in particular to a silicon particle production device. Background Art

[0002] In the existing production of industrial silicon particles, the submerged arc furnace method (electric arc furnace method) is mainly adopted. The specific steps of the submerged arc furnace method are as follows: after the crushed silica and the reducing agent are mixed in a certain proportion, they are subjected to high-temperature smelting and reduction into silicon liquid in an electric arc furnace, and then the silicon liquid is discharged through the silicon outlet and cast into a silicon ingot. The silicon ingot is cooled and demolded, and finally, processes such as finishing crushing, grading, packaging, weighing, and warehousing are carried out on the demolded silicon ingot.

[0003] On the one hand, currently, the main methods for crushing silicon ingots are manual crushing method, thermal quenching crushing method, mechanical crushing method, etc. Among them, the crushing hammers used in the manual crushing method are expensive, the manual crushing efficiency is not high, the operation intensity is large, and the crushed silicon particles are prone to generate crushed silicon powder, which is very easy to cause harm to the employees' bodies. At the same time, the general operating environment cannot effectively guarantee the purity of the silicon particles, and the output also cannot meet the growing needs. The use of the thermal quenching crushing method and the mechanical crushing method will increase the manufacturing cost of industrial silicon and reduce the market competitiveness of the product. It can be seen that the existing production methods / devices of silicon particles cannot meet the requirements for producing industrial silicon. On the other hand, the high-temperature silicon liquid is naturally cooled in the ingot mold, and a large amount of heat energy generated during the cooling process cannot be recycled, which not only easily causes safety accidents but also results in waste of resources, not meeting the requirements for industrial silicon production under the background of the "dual-carbon era". Summary of the Utility Model

[0004] The purpose of the utility model is to provide a silicon particle production device to solve the technical problem that in the existing production methods / devices of silicon particles, it is necessary to manually / mechanically crush the silicon ingot and generate crushed silicon powder.

[0005] To achieve the above-mentioned utility model purpose, the utility model adopts the following technical scheme: A silicon particle production device, comprising:

[0006] A tundish for storing silicon liquid, the tundish having a liquid inlet, a liquid outlet, and a liquid outlet pipe connected to the liquid outlet;

[0007] A granulation chamber located below the tundish, the granulation chamber having a feed inlet at its top connected to the liquid outlet pipe and a discharge outlet at its bottom;

[0008] A granulation mechanism, including a turntable disposed in the granulation chamber and below the liquid outlet pipe, and a driving component for driving the turntable to rotate;

[0009] A cooling system for cooling the inside of the granulation chamber.

[0010] As a further improved technical solution of the present utility model, the cooling system includes an air inlet provided at the bottom of the granulation chamber, an air outlet provided at the top of the granulation chamber, a gas supply assembly connected to the air inlet and used to supply inert gas to the granulation chamber, and a fluid driving assembly for driving the inert gas to enter the granulation chamber from the air inlet and / or flow out of the granulation chamber from the air outlet.

[0011] As a further improved technical solution of the present utility model, the bottom includes a bottom wall and an air distribution plate extending obliquely upward from the edge of the bottom wall in a direction away from the bottom wall, the air inlet is provided on the air distribution plate, and the inclination angle α of the air distribution plate is 10° to 30°.

[0012] As a further improved technical solution of the present utility model, at least two groups of the air inlets are provided at the bottom, and at least two groups of the air inlets are respectively provided on opposite sides of the center of the bottom.

[0013] As a further improved technical solution of the present utility model, the air inlets and the air outlets are in one-to-one correspondence; the silicon particle production device further includes a heat exchange system connected between the air inlets and the corresponding air outlets, and the heat exchange system includes a heat exchanger, an air outlet pipe connecting the heat exchanger and the air outlet, and a return air pipe connecting the heat exchanger and the air inlet.

[0014] As a further improved technical solution of the present utility model, the silicon particle production device further includes a waste heat recovery system for recovering the heat in the heat exchanger.

[0015] As a further improved technical solution of the present utility model, the waste heat recovery system includes a steam pipe for receiving the heat in the heat exchanger and a steam collector connected to one end of the steam pipe far from the heat exchanger.

[0016] As a further improved technical solution of the present utility model, the silicon particle production device further includes a filter provided on the air outlet pipe.

[0017] As a further improved technical solution of the present utility model, the fluid driving assembly includes a fan provided in the air outlet pipe and / or the return air pipe.

[0018] As a further improved technical solution of the present utility model, the silicon particle production device further includes a stopper control flow mechanism for controlling the liquid discharge; the stopper control flow mechanism includes a stopper matched with the liquid outlet, and the surface layer of the stopper has a SiC coating.

[0019] As a further improved technical solution of the present utility model, the granulation chamber includes a side wall connecting the top and the bottom, and the cooling system further includes a cooling interlayer provided at the side wall for circulating a cooling medium.

[0020] As a further improved technical solution of the present utility model, the liquid inlet and the liquid outlet are arranged offset in the horizontal direction.

[0021] As a further improved technical solution of the present utility model, the driving assembly includes a driving motor arranged outside the granulation chamber and a rotating shaft passing through the bottom of the granulation chamber and connecting the driving motor and the turntable.

[0022] As a further improved technical solution of the present utility model, the silicon particle production device further includes a silicon particle collection mechanism connected to the discharge port, and the silicon particle collection mechanism is a storage tank or a discharging device.

[0023] The beneficial effects of the present utility model are as follows: In the silicon particle production device of the present utility model, high-temperature silicon liquid directly falls onto the turntable in the granulation chamber and rotates centrifugally to form liquid droplets, and the liquid droplets are cooled under the action of the cooling system to directly form silicon particles, realizing the direct granulation of high-temperature silicon liquid, solving the process defect that in the existing industrial silicon particle preparation, artificial or mechanical crushing of silicon ingots has poor effect and will generate crushed silicon powder, and being able to quickly obtain silicon particles, improving the automation degree of industrial silicon preparation; at the same time, eliminating the finishing and crushing process in the traditional industrial silicon particle preparation, reducing the production process flow, improving the working environment of employees, correspondingly omitting equipment such as ingot molds, reducing the equipment operation cost, and increasing the economic benefit of the enterprise. Description of the Drawings

[0024] Figure 1 is a schematic structural diagram of a silicon particle production device in a specific embodiment of the present utility model;

[0025] Figure 2 is a flow chart of preparing silicon particles by using the silicon particle production device of the present utility model. Detailed Embodiments

[0026] The following will describe the present utility model in detail in conjunction with the embodiments shown in the drawings. Please refer to Figures 1-2 as shown, which is a preferred embodiment of the present utility model. It should be noted, however, that these embodiments are not limitations on the present utility model, and any equivalent transformation or substitution in terms of function, method, or structure made by those of ordinary skill in the art according to these embodiments shall fall within the protection scope of the present utility model.

[0027] The words describing positions and directions in the present utility model, such as "top", "bottom", "horizontal direction", etc., are all referenced when the silicon particle production device is in use. Furthermore, the "connection" described in the text can be a direct connection or an indirect connection through another structure. Among them, "direct connection" means that there is no other structure between the two. At the same time, the drawings in the present utility model all adopt very simplified forms and non-precise scales, only for conveniently and clearly assisting in explaining each embodiment in the present utility model.

[0028] Please refer Figure 1 As shown, the present utility model provides a silicon particle production device 100, which includes a tundish 1 for storing high-temperature silicon liquid, a granulation chamber 2 connected to the tundish 1, a granulation mechanism 3 for centrifugally granulating the high-temperature silicon liquid in the granulation chamber 2, a cooling system 4 for cooling the granulation chamber 2, and a silicon particle collection mechanism 5 connected to the granulation chamber 2. The silicon liquid falling from the tundish 1 into the granulation chamber 2 forms droplets under the drive of the centrifugal rotation of the granulation mechanism 3. The droplets fly in the granulation chamber 2 and are cooled under the action of the cooling system 4 to form silicon particles, which enter the silicon particle collection mechanism for users to collect and screen.

[0029] The silicon particle production device 100 in the present utility model directly realizes the direct granulation of high-temperature silicon liquid by adopting the centrifugal granulation process, solves the process defects in the existing industrial silicon particle preparation that manual / machine crushing of silicon ingots has poor effect and will produce crushed silicon powder, and can quickly obtain silicon particles, improving the automation degree of industrial silicon preparation; at the same time, it eliminates the finishing and crushing processes in the traditional industrial silicon particle preparation, reduces the production process flow, improves the working environment of employees, correspondingly omits equipment such as ingot molds, reduces the equipment operation cost, increases the economic benefits of the enterprise, and reduces the introduction of iron impurities, improving the quality of the final product.

[0030] Furthermore, from the inside to the outside, the tundish 1 is composed of four layers of materials to form a heat preservation cavity for heat-preserving the silicon liquid located in the heat preservation cavity, ensuring that the temperature of the silicon liquid in the tundish 1 is always above the solidification point of the silicon liquid, keeping the silicon liquid in the tundish 1 always in a liquid state, which is beneficial to subsequent centrifugal granulation.

[0031] In a specific embodiment, the materials forming the tundish 1 are SiC coating, quartz ceramic layer, high-aluminum casting layer, and high-strength heat preservation board from the inside to the outside. Specifically, the high-strength heat preservation board can be a high-temperature resistant high-strength heat preservation and insulation board made of nano-ceramic microspheres. Of course, it is not limited thereto.

[0032] Further, the tundish 1 has a liquid inlet 11, a liquid outlet 12, and a liquid outlet pipe 13 connected to the liquid outlet 12. Specifically, the tundish 1 includes an upper wall and a lower wall opposite to the upper wall. The liquid inlet 11 is provided on the upper wall, and the liquid outlet 12 is provided on the lower wall. After silica is smelted and reduced to silicon liquid, the silicon liquid is poured into the tundish 1 from the liquid inlet 11.

[0033] Further, the silicon granule production device 100 further includes a stopper flow control mechanism for controlling the liquid discharge. The size of the liquid outlet 12 is controlled by the stopper flow control mechanism, so as to control the flow rate of the silicon liquid, and thus control the centrifugal granulation effect of the silicon liquid in the granulation chamber 2.

[0034] The above-mentioned centrifugal granulation effect includes but is not limited to: the size of the formed silicon granules, the speed of forming silicon granules, the uniformity of the size of the formed silicon granules, etc. It can be known that the flow rate of the silicon liquid can be adjusted by regulating the stopper flow control mechanism according to the specific required centrifugal granulation effect.

[0035] Specifically, the stopper flow control mechanism includes a stopper 6 that cooperates with the liquid outlet 12 and a driving member (not shown) for controlling the lifting of the stopper 6. The lower end of the stopper 6 has an inverted conical section. When the conical section is located at the liquid outlet 12, an annular gap for the silicon liquid to flow out is formed between the conical section and the liquid outlet 12. By controlling the lifting of the stopper 6, the size of the annular gap can be adjusted, thereby adjusting the flow rate of the silicon liquid. It can be known that the higher the stopper 6 rises, the larger the corresponding annular gap, and the greater the flow rate of the silicon liquid; the lower the stopper 6 descends, the smaller the corresponding annular gap, and the smaller the flow rate of the silicon liquid; when the stopper 6 descends to the top of the conical section is located inside the liquid outlet 12, the stopper 6 completely seals the liquid outlet 12, and at this time, the silicon liquid cannot flow out from the liquid outlet 12.

[0036] It can be known that when pouring the silicon liquid into the tundish 1 from the liquid inlet 11, the stopper 6 completely seals the liquid outlet 12.

[0037] Further, the surface layer of the stopper 6 has a SiC coating, so that the stopper 6 has high-temperature resistance performance and improves the stability of the silicon granule production device 100.

[0038] Further, the liquid inlet 11 and the liquid outlet 12 are arranged in a horizontal offset manner, which can avoid the stopper 6 affecting the operation of pouring the silicon liquid into the tundish 1 from the liquid inlet 11.

[0039] Specifically, the granulation chamber 2 includes a top, a bottom, and a side wall 25 connecting the top and the top. The top, the bottom, and the side wall 25 jointly enclose a granulation cavity.

[0040] In a specific embodiment, the granulation chamber 2 is located below the tundish 1, so that the silicon liquid in the tundish 1 can automatically flow into the granulation chamber 2 through the liquid outlet pipe 13 under the action of its own gravity. Of course, this is not the only limitation.

[0041] The top of the granulation chamber 2 has a feed inlet 211 connected to the liquid outlet pipe 13. The liquid outlet pipe 13 is inserted into the feed inlet 211 and is hermetically connected to the feed inlet 211. The granulation mechanism 3 includes a turntable 31 disposed in the granulation chamber 2 and below the liquid outlet pipe 13, and a driving assembly for driving the turntable 31 to rotate. The driving assembly drives the turntable 31 to rotate at a preset speed, and the silicon liquid flowing from the liquid outlet pipe 13 to the turntable 31 forms liquid droplets under the driving of the rotational centrifugal force of the turntable 31, thereby facilitating the subsequent cooling of the liquid droplets to form silicon particles.

[0042] It can be known that the rotational speed of the turntable 31 can be controlled by the driving assembly to achieve the centrifugal granulation effect of specific requirements.

[0043] Specifically, when one end of the liquid outlet pipe 13 connected to the granulation chamber 2 is located in the feed inlet 211, the above-mentioned turntable 31 can also be understood as being located below the feed inlet 211.

[0044] In a specific embodiment, the rotation axis of the turntable 31 is located on the central axis of the granulation chamber 2 to improve the uniformity of the size of the formed silicon particles. Of course, this is not the only limitation.

[0045] Specifically, the surface of the turntable 31 has a SiC coating with a thickness of 1 mm to 3 mm. So that the turntable 31 has better high-temperature resistance and improves the stability of the silicon particle production device 100.

[0046] Furthermore, the driving assembly includes a driving motor 32 disposed outside the granulation chamber 2 and a rotating shaft 33 passing through the bottom of the granulation chamber 2 and connecting the driving motor 32 and the turntable 31. It can avoid the influence of the high-temperature environment in the granulation chamber 2 on the driving motor 32, thereby improving the stability of the silicon particle production device 100.

[0047] Specifically, the driving motor 32 is disposed on the lower side of the granulation chamber 2, and the rotating shaft 33 passes through the bottom of the granulation chamber 2 and is connected to the bottom of the turntable 31. At the same time, the rotational connection between the rotating shaft 33 and the bottom is in a heat-insulating and sealed state.

[0048] Further, the cooling system 4 includes a cooling interlayer 41 provided at the side wall 25 for circulating a cooling medium. The cooling medium circulating in the cooling interlayer 41 cools the granulation chamber, thereby cooling the centrifugally formed droplets into silicon particles.

[0049] In a specific embodiment, the cooling medium is water. Of course, this is not the only limitation.

[0050] Further, the cooling system 4 further includes an air inlet provided at the bottom of the granulation chamber 2, an air outlet provided at the top of the granulation chamber 2, a gas supply assembly 7 connected to the air inlet and used to supply an inert gas into the granulation chamber 2, and a fluid driving assembly for driving the inert gas to enter the granulation chamber 2 from the air inlet and / or flow out of the granulation chamber 2 from the air outlet. On the one hand, during the centrifugal granulation of the silicon liquid, the inert gas can fully exchange heat with the droplets. At the same time, the inert gas flows from bottom to top, which can slow down the downward dripping speed of the droplets, thereby further improving the cooling effect of the droplets and enabling the droplets to be fully cooled to form silicon particles. On the other hand, the inert gas can also protect the droplets / silicon particles and prevent the introduction of impurities to contaminate the silicon particles.

[0051] In a specific embodiment, the inert gas is argon or nitrogen. Of course, this is not the only limitation.

[0052] Further, the bottom includes a bottom wall 23 and a wind distribution plate 24 extending upward and obliquely away from the edge of the bottom wall 23. The air inlet is provided on the wind distribution plate 24, and the upper edge of the wind distribution plate 24 is connected to the bottom end of the side wall 25. That is, the inert gas entering the granulation chamber 2 from the air inlet enters the granulation chamber 2 obliquely, which can increase the airflow path of the inert gas in the granulation chamber 2, thereby further improving the cooling effect of the inert gas on the droplets and enabling the droplets to be fully cooled to form silicon particles.

[0053] Specifically, the inclination angle α of the wind distribution plate 24 is 10° to 30°.

[0054] Combined Figure 1 As shown, in this embodiment, the cross-section of the bottom is trapezoidal in reverse. Of course, this is not the only limitation. In other embodiments, the cross-section of the bottom can also be set to be arc-shaped convex downward.

[0055] Further, at least two sets of the air inlets are provided at the bottom, and at least two sets of the air inlets are arranged on opposite sides of the center of the bottom, that is, at least two sets of the air inlets are arranged on opposite sides of the bottom wall 23. Thus, the action range of the air supply assembly 7 can be increased, and the cooling effect of the inert gas on the droplets can be further improved, so that the droplets can be sufficiently cooled to form silicon particles. At the same time, other components on the bottom except the air inlets, such as the silicon particle collection mechanism 5, the rotating shaft 33, etc., are arranged on the bottom wall 23, so the arrangement of the air inlets will not affect the arrangement of other components on the bottom.

[0056] In a specific embodiment, in the embodiment where at least two sets of the air inlets are provided at the bottom, the cooling system 4 includes the air supply assemblies 7 corresponding to the air inlets one by one. Of course, this is not a limitation.

[0057] Further, the top includes a top wall 21 and an inclined plate 22 extending downward and obliquely away from the edge of the top wall 21. The lower edge of the inclined plate 22 is connected to the upper end of the side wall 25. The air outlet is arranged on the inclined plate 22, and the feed inlet 211 is arranged on the top wall 21.

[0058] Further, the air inlets correspond to the air outlets one by one. The silicon particle production device 100 further includes a heat exchange system 8 connected between the air inlets and the corresponding air outlets. The heat exchange system 8 includes a heat exchanger 81, an outlet pipe 82 connecting the heat exchanger 81 and the air outlet, and a return pipe 83 connecting the heat exchanger 81 and the air inlet. The high-temperature inert gas after exchanging heat with the droplets in the granulation chamber 2 enters the heat exchanger 81 through the outlet pipe 82 and is cooled to obtain the cooled inert gas. The cooled inert gas re-enters the granulation chamber 2 through the return pipe 83 to cool the droplets in the granulation chamber 2. Thus, the inert gas can be recycled to reduce costs.

[0059] It can be known that after the heat exchange system 8 is provided, during the centrifugal granulation process, the air supply assembly 7 does not need to supply gas to the granulation chamber 2 all the time. Only when there is loss and leakage during the circulation of the inert gas through the heat exchange system 8, it is necessary to start the air supply assembly 7 to supplement the inert gas to the granulation chamber 2.

[0060] Combined with Figure 1As shown, in a specific embodiment, the fluid driving assembly includes a blower 42 disposed on the return air pipe 83. The blower 42 disposed in the return air pipe 83 is configured to suck the low-temperature inert gas after heat exchange and blow it from the air inlet into the granulation chamber 2. This facilitates the arrangement of the fluid driving assembly and enables the inert gas in the granulation chamber 2 to flow upward to form an air flow cycle. Of course, this is not limiting. In other embodiments, a blower for sucking the high-temperature inert gas in the granulation chamber 2 and blowing it into the heat exchanger 81 may be provided only in the outlet pipe 82, or blowers may be provided in both the outlet pipe 82 and the return air pipe 83. Alternatively, the fluid driving assembly may also be configured as an acoustic pump that uses the pressure difference generated by sound waves to achieve inert gas circulation, or a heat exchanger that promotes inert gas circulation through heat convection, or a circulation air duct that can achieve inert gas circulation, etc.

[0061] Further, the silicon particle production device 100 further includes a filter 14 disposed on the outlet pipe 82 to reduce the filaments, flocs, fine powders, etc. remaining in the inert gas entering the heat exchanger 81.

[0062] It is known that the above-mentioned filaments, flocs, and fine powders include, but are not limited to, the filaments and flocs formed by the high-temperature silicon liquid rotating centrifugally on the turntable and cooling, and the fine powders formed by the droplets colliding with the inert gas or the side wall 25.

[0063] Further, the silicon particle production device 100 further includes a waste heat recovery system 9 for recovering the heat in the heat exchanger 81, which can recover and reuse the heat in the high-temperature silicon liquid, such as supplying heat externally or generating electricity, and reducing carbon emissions.

[0064] In a specific embodiment, the waste heat recovery system 9 includes a steam pipe 91 for receiving the heat in the heat exchanger 81 and a steam collector 92 connected to one end of the steam pipe 91 away from the heat exchanger 81. The steam pipe 91 is at least partially disposed in the heat exchanger 81. Thus, the steam pipe 91 can receive the heat transferred after the high-temperature inert gas exchanges heat with the heat exchanger 81 in the heat exchanger 81 and turn into steam to be recovered in the steam collector 92 for subsequent reuse.

[0065] Further, the bottom of the granulation chamber 2 has a discharge port. Specifically, the discharge port is provided on the bottom wall 23 of the granulation chamber 2. The silicon particle collection mechanism 5 is installed at the discharge port, and the silicon particles formed after the droplets are cooled by the cooling system 4 enter the silicon particle collection mechanism 5 from the discharge port for subsequent collection and screening.

[0066] Furthermore, the bottom wall 23 of the granulation chamber 2 has a plurality of discharge ports, and at least two of the discharge ports are located on opposite sides of the center of the bottom wall 23. Correspondingly, the silicon particle production device 100 includes a silicon particle collection mechanism 5 corresponding to each discharge port one by one to improve the efficiency of silicon particle collection.

[0067] In a specific embodiment, the silicon particle collection mechanism 5 is a storage tank connected to the discharge port, and a switching valve 26 for controlling the opening and closing of the discharge port is provided at the discharge port. When the switching valve 26 is in the open state of opening the discharge port, the silicon particles formed after the droplets are cooled by the cooling system 4 enter the storage tank through the discharge port for storage. Specifically, the storage tank is detachably connected to the discharge port. After the storage tank is full, the switching valve 26 is controlled to close the discharge port, and the user can remove the storage tank to collect the silicon particles in the storage tank. Of course, this is not limited thereto. In other embodiments, the silicon particle collection mechanism 5 can also be set as a discharge device hermetically connected to the discharge port, and the collected silicon particles are directly discharged onto a belt conveyor through the discharge device.

[0068] Specifically, the usage method of the silicon particle production device 100 in the present invention is as follows:

[0069] Pour silicon liquid into the tundish 1. At this time, control the stopper 6 in the stopper flow control mechanism to seal the liquid outlet 12 of the tundish 1;

[0070] Start the drive assembly in the granulation mechanism 3 to drive the turntable 31 to rotate at a preset speed, and at the same time start the gas supply assembly 7 in the cooling system 4;

[0071] After the granulation mechanism 3 and the gas supply assembly 7 are operating stably, control the gas supply assembly 7 to stop supplying gas, start the stopper flow control mechanism to control the stopper 6 to open the liquid outlet 12 to a preset flow rate of the silicon liquid, and at the same time start the fluid drive assembly, the heat exchanger 81, and the circulating cooling medium in the cooling sandwich 41 of the cooling system 4. After the silicon liquid falls onto the turntable 31, it is centrifuged into droplets, and then the droplets exchange heat with the inert gas and the cooling sandwich 41 to become silicon particles and enter the silicon particle collection mechanism 5 through the discharge port. At this time, the high-temperature inert gas after exchanging heat with the droplets in the granulation chamber 2 is exchanged through the heat exchanger 81. On the one hand, the cooled inert gas re-enters the granulation chamber 2 to cool the droplets, and on the other hand, the heat of the high-temperature inert gas is recovered in the steam collector 92 through the heat exchanger 81 for subsequent reuse.

[0072] Combined with Figure 2As shown, it is a flowchart for preparing silicon particles by using the silicon particle production device 100 in the present utility model. Specifically: First, silica and a reducing agent are smelted together to form silicon liquid, which can be formed by electric furnace smelting, oxygen-enriched refining, etc.; then the silicon liquid is introduced into the above-mentioned silicon particle production device 100 to form silicon particles through a centrifugal granulation process, and the heat of the silicon liquid is recovered synchronously; finally, the silicon particles are collected and screened, etc.

[0073] Compared with the prior art, in the silicon particle production device 100 of the present utility model, the high-temperature silicon liquid falls from the tundish 1 onto the turntable 31 in the granulation chamber 2. The silicon liquid falling onto the turntable 31 forms droplets under the drive of the centrifugal rotation of the turntable 31, and the droplets are cooled by the cooling system 4 to directly form silicon particles. The direct granulation of high-temperature silicon liquid is realized by directly adopting the centrifugal granulation process, solving the process defects that in the preparation of existing industrial silicon particles, manual or mechanical crushing of silicon ingots has poor effect and will generate crushed silicon powder. Moreover, silicon particles can be obtained quickly, improving the automation degree of industrial silicon particle preparation; at the same time, the finishing and crushing processes in traditional industrial silicon preparation are omitted, reducing the production process flow, improving the working environment of employees, correspondingly omitting equipment such as ingot molds, reducing the equipment operation cost, and increasing the economic benefits of the enterprise.

[0074] It should be understood that although this specification is described according to embodiments, not every embodiment only contains an independent technical solution. This narrative way of the specification is only for clarity. Those skilled in the art should regard the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

[0075] The series of detailed descriptions listed above are only specific descriptions of the feasible embodiments of the present utility model, and they are not used to limit the protection scope of the present utility model. Any equivalent embodiments or changes made without departing from the technical spirit of the present utility model should be included in the protection scope of the present utility model.

Claims

1. A silicon particle production device, characterized in that: include: A tundish for storing silicon liquid, the tundish having a liquid inlet, a liquid outlet, and a liquid outlet pipe connected to the liquid outlet; A granulation chamber is located below the tundish, and the granulation chamber has a feed inlet located at the top thereof and connected to the liquid outlet pipe, and a discharge outlet located at the bottom thereof; The granulation mechanism comprises a rotating disk arranged in the granulation chamber and below the liquid outlet pipe, and a driving assembly driving the rotating disk to rotate; A cooling system is used to cool the granulating chamber.

2. The silicon particle production device according to claim 1, characterized in that: The cooling system includes an air inlet arranged at the bottom of the granulating chamber, an air outlet arranged at the top of the granulating chamber, an air supply component connected to the air inlet and used to provide inert gas into the granulating chamber, and a fluid driving component that drives the inert gas to enter the granulating chamber from the air inlet and / or flow out of the granulating chamber from the air outlet.

3. The silicon particle production device according to claim 2, characterized in that: The bottom includes a bottom wall, and an air distribution plate extending from an edge of the bottom wall in a direction away from the bottom wall and obliquely upward. The air inlet is arranged on the air distribution plate, and an inclination angle α of the air distribution plate is 10° to 30°.

4. The silicon particle production device according to claim 2, characterized in that: The bottom is provided with at least two groups of air inlets, and the at least two groups of air inlets are respectively arranged on two opposite sides of the center of the bottom.

5. The silicon particle production device according to any one of claims 2 to 4, characterized in that: The air inlet corresponds to the air outlet one by one; the silicon particle production device also includes a heat exchange system connected between the air inlet and the corresponding air outlet, and the heat exchange system includes a heat exchanger, an outlet pipe connecting the heat exchanger and the air outlet, and a return pipe connecting the heat exchanger and the air inlet.

6. The silicon particle production device according to claim 5, characterized in that: The silicon particle production device further includes a waste heat recovery system for recovering heat in the heat exchanger.

7. The silicon particle production device according to claim 6, characterized in that: The waste heat recovery system includes a steam pipe for receiving heat from the heat exchanger and a steam collector connected to an end of the steam pipe away from the heat exchanger.

8. The silicon particle production device according to claim 5, characterized in that: The silicon particle production device further comprises a filter arranged on the air outlet pipe.

9. The silicon particle production device according to claim 5, characterized in that: The fluid drive assembly includes a fan arranged in the air outlet pipe and / or the air return pipe.

10. The silicon particle production device according to claim 1, characterized in that: The silicon particle production device also includes a stopper rod flow control mechanism for controlling liquid discharge; the stopper rod flow control mechanism includes a stopper rod matched with the liquid outlet, and the surface layer of the stopper rod has a SiC coating.

11. The silicon particle production device according to claim 1, characterized in that: The granulating chamber comprises a side wall connecting the top and the bottom, and the cooling system further comprises a cooling interlayer arranged at the side wall for circulating a cooling medium.

12. The silicon particle production device according to claim 1, characterized in that: The liquid inlet and the liquid outlet are staggered in the horizontal direction.

13. The silicon particle production device according to claim 1, characterized in that: The driving assembly includes a driving motor disposed outside the granulating chamber, and a rotating shaft passing through the bottom of the granulating chamber and connecting the driving motor and the rotating disk.

14. The silicon particle production device according to claim 1, characterized in that: The silicon particle production device further comprises a silicon particle collecting mechanism connected to the discharge port, and the silicon particle collecting mechanism is a storage tank or a discharge device.

Images