Cleaning device of single crystal original silicon wafer subfissure detector

Abstract

The utility model relates to the technical field of hidden crack detection machines, in particular to a cleaning device of a single crystal original silicon wafer hidden crack detection machine, which comprises a detection table, a support is fixedly connected to the surface of the detection table, a visual camera is fixedly connected to the surface of the support, and a clamp is detachably mounted on the upper surface of the detection table. The surface of the detection table is fixedly connected with a steam generator, the exhaust end of the steam generator is fixed and communicated with a spray pipe, the surface of the support is provided with a cleaning structure, the cleaning structure comprises an electric push rod, the electric push rod is fixedly connected with the support, and the output end of the electric push rod is fixedly connected with a connecting plate. According to the visual inspection camera, through the arrangement of the cleaning structure, after the water absorption strip is in contact with the visual camera, water drops attached to the surface of the visual camera can be wiped and adsorbed, so that the situation that the water drops hinder normal inspection of a single crystal original silicon wafer by the visual camera is prevented, and the practicability of the visual inspection camera is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of crack detection machines, in particular to a cleaning device for a single-crystal original silicon wafer crack detection machine. Background Art

[0002] A single-crystal original silicon wafer refers to a single-crystal silicon wafer prepared by a specific process and is usually used in the semiconductor industry. Single-crystal silicon is a silicon material with high purity and good crystal structure integrity, having excellent electrical and thermal properties. When producing single-crystal original silicon wafers, a crack detection machine is needed to detect whether there are crack defects in the single-crystal original silicon wafers.

[0003] In the prior art, there is a patent document with the publication number of CN215640935U. This patent document discloses a silicon wafer crack detection device, including a base and a vision detection camera; a detection port is provided at the top of the base, and a slot for horizontally inserting the silicon wafer is provided on the inner wall of the detection port. A lighting lamp is installed below the slot, and air jet mechanisms are provided on both sides of the base; after inserting the silicon wafer into the detection port, the air jet mechanisms can be used to spray high-pressure steam on the surface of the silicon wafer. On the one hand, it can remove impurities on the surface of the silicon wafer to avoid misjudgment caused by impurities. On the other hand, white lines will appear at the crack of the silicon wafer when encountering steam, which is convenient for the vision detection camera to take pictures for detection; the lighting lamp below the silicon wafer can make the white lines at the crack appear more clearly, improving the reliability of detection.

[0004] The above and prior arts have the following defects: when using steam to assist in detecting cracks on the surface of a single-crystal original silicon wafer, the steam is likely to condense into water droplets on the surface of the vision detection camera, thereby preventing the vision detection camera from continuously detecting the single-crystal original silicon wafer and reducing the practicality of the vision detection camera.

[0005] Therefore, a cleaning device for a single-crystal original silicon wafer crack detection machine is proposed. Summary of the Utility Model

[0006] The purpose of the utility model is to solve the defect that steam is likely to condense into water droplets on the surface of the vision detection camera, thereby preventing the vision detection camera from continuously detecting the single-crystal original silicon wafer, and to propose a cleaning device for a single-crystal original silicon wafer crack detection machine.

[0007] To achieve the above object, the utility model adopts the following technical solution: A cleaning device for a single-crystal original silicon wafer crack detection machine, including a detection table, a bracket is fixedly connected to the surface of the detection table, a vision camera is fixedly connected to the surface of the bracket, a fixture is detachably installed on the upper surface of the detection table, a steam generator is fixedly connected to the surface of the detection table, an exhaust end of the steam generator is fixedly connected and communicated with a spray pipe, and a cleaning structure is arranged on the surface of the bracket. The cleaning structure includes an electric push rod, the electric push rod is fixedly connected to the bracket, an output end of the electric push rod is fixedly connected to a connecting plate, a sliding rod is slidably connected in the connecting plate, an upper end of the sliding rod is fixedly connected to a clamping plate, a strip-shaped plate is slidably connected to an inner wall of the clamping plate, and a water-absorbing strip is fixedly connected to the surface of the strip-shaped plate.

[0008] The effects achieved by the above components are as follows: By setting the cleaning structure, when the water-absorbing strip contacts the vision camera, it will wipe and adsorb the water droplets attached to the surface of the vision camera, thereby preventing the situation that the water droplets interfere with the normal detection of the single-crystal original silicon wafer by the vision camera, and improving the practicability of the vision detection camera.

[0009] Preferably, a bolt is threadedly connected in the clamping plate, and the bolt penetrates through the clamping plate.

[0010] The effects achieved by the above components are as follows: Rotate the bolt. When the bolt abuts against the surface of the strip-shaped plate, the bolt plays a role in restricting the position of the strip-shaped plate and thus restricting the position of the water-absorbing strip.

[0011] Preferably, a baffle is fixedly connected to the position of the clamping plate relative to the bolt.

[0012] The effects achieved by the above components are as follows: The baffle plays a role in restricting the moving distance of the bolt and preventing the bolt from detaching from contact with the clamping plate.

[0013] Preferably, a positioning block is fixedly connected to the surface of the strip-shaped plate, and the positioning block abuts against the surface of the clamping plate.

[0014] The effects achieved by the above components are as follows: The movement of the strip-shaped plate will drive the movement of the positioning block. After the positioning block contacts the clamping plate, it can restrict the position of the strip-shaped plate, so that the water-absorbing strip is aligned with the vision camera.

[0015] Preferably, a waterproof electric heating plate is fixedly connected in the strip-shaped plate, and the waterproof electric heating plate is fixedly connected to the water-absorbing strip.

[0016] The effects achieved by the above components are as follows: Turn on the waterproof electric heating plate, and the waterproof electric heating plate will heat the water-absorbing strip to dry the water-absorbing strip.

[0017] Preferably, a spring is sleeved on the surface of the sliding rod, and two ends of the spring are respectively fixedly connected to the sliding rod and the connecting plate.

[0018] The effects achieved by the above components are as follows: The spring will cause the sliding rod to slide upward by its own elastic force, and the sliding of the sliding rod will drive the clamping plate to slide, so as to ensure that the water absorption strip is in full contact with the vision camera.

[0019] Preferably, the sliding rod has a regular hexagonal prism structure.

[0020] The effects achieved by the above components are as follows: The sliding rod with a regular hexagonal prism structure can limit the movement path of the clamping plate, and thus limit the movement path of the water absorption strip.

[0021] Preferably, an extension plate is fixedly connected to the upper surface of the connecting plate, two limiting plates are fixedly connected to the surface of the clamping plate, and the limiting plates are slidably connected to the extension plate.

[0022] The effects achieved by the above components are as follows: The movement of the connecting plate will drive the extension plate to slide along the surface of the limiting plate, and the limiting plate can limit the movement path of the extension plate, so as to prevent the connecting plate from falling.

[0023] Compared with the prior art, the advantages and positive effects of the present utility model are as follows

[0024] In the present utility model, by setting a cleaning structure, after the water absorption strip contacts the vision camera, it will wipe and adsorb the water droplets attached to the surface of the vision camera, thereby preventing the water droplets from interfering with the normal detection of the single crystal raw silicon wafer by the vision camera, and improving the practicability of the vision detection camera. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 It is a schematic diagram of the overall structure of the present utility model.

[0026] Figure 2 It is a schematic diagram of the structure at the bracket of the present utility model;

[0027] Figure 3 It is a schematic diagram of the structure of the cleaning structure of the present utility model;

[0028] Figure 4 It is a schematic diagram of the partial structure of the cleaning structure of the present utility model.

[0029] Legend Explanation: 1. Detection table; 2. Bracket; 3. Vision camera; 4. Fixture; 5. Nozzle; 6. Steam generator; 7. Cleaning structure; 701. Electric push rod; 702. Connecting plate; 703. Sliding rod; 704. Clamping plate; 705. Strip-shaped plate; 706. Water absorption strip; 707. Bolt; 708. Baffle; 709. Positioning block; 710. Waterproof electric heating plate; 711. Spring; 712. Limiting plate; 713. Extension plate. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0030] To better understand the above objects, features, and advantages of the present utility model, the present utility model will be further described below in conjunction with the accompanying drawings and embodiments. It should be noted that, without conflict, the embodiments of the present application and the features in the embodiments can be combined with each other.

[0031] In the following description, many specific details are set forth to facilitate a thorough understanding of the present utility model. However, the present utility model can also be implemented in other ways different from those described herein. Therefore, the present utility model is not limited by the specific embodiments disclosed in the following specification.

[0032] As Figures 1-4 shown, the present utility model provides a cleaning device for a single-crystal original silicon wafer crack detection machine, including a detection table 1. A bracket 2 is fixedly connected to the surface of the detection table 1. A vision camera 3 is fixedly connected to the surface of the bracket 2. A fixture 4 is detachably installed on the upper surface of the detection table 1. A steam generator 6 is fixedly connected to the surface of the detection table 1. The exhaust end of the steam generator 6 is fixedly connected and communicated with a spray pipe 5. A cleaning structure 7 is provided on the surface of the bracket 2. The cleaning structure 7 includes an electric push rod 701. The electric push rod 701 is fixedly connected to the bracket 2. The output end of the electric push rod 701 is fixedly connected to a connecting plate 702. A sliding rod 703 is slidably connected in the connecting plate 702. The upper end of the sliding rod 703 is fixedly connected to a clamping plate 704. A strip-shaped plate 705 is slidably connected to the inner wall of the clamping plate 704. A water-absorbing strip 706 is fixedly connected to the surface of the strip-shaped plate 705. A bolt 707 is threadedly connected in the clamping plate 704. The bolt 707 penetrates through the clamping plate 704. By rotating the bolt 707, when the bolt 707 abuts against the surface of the strip-shaped plate 705, the bolt 707 serves to limit the position of the strip-shaped plate 705, thereby limiting the position of the water-absorbing strip 706. A baffle 708 is fixedly connected to the position of the clamping plate 704 relative to the bolt 707. The baffle 708 serves to limit the moving distance of the bolt 707 and prevent the bolt 707 from disengaging from contact with the clamping plate 704.

[0033] As Figures 2-4As shown, a positioning block 709 is fixedly connected to the surface of the strip-shaped plate 705. The positioning block 709 abuts against the surface of the clamping plate 704. When the strip-shaped plate 705 moves, it will drive the positioning block 709 to move. After the positioning block 709 contacts the clamping plate 704, the position of the strip-shaped plate 705 can be restricted, so that the water-absorbing strip 706 is aligned with the vision camera 3. A waterproof electric heating plate 710 is fixedly connected inside the strip-shaped plate 705. The waterproof electric heating plate 710 is fixedly connected to the water-absorbing strip 706. When the waterproof electric heating plate 710 is turned on, the waterproof electric heating plate 710 will heat the water-absorbing strip 706 to dry the water-absorbing strip 706. A spring 711 is sleeved on the surface of the sliding rod 703. The two ends of the spring 711 are respectively fixedly connected to the sliding rod 703 and the connecting plate 702. The spring 711 will make the sliding rod 703 slide upward by virtue of its own elastic force. The sliding of the sliding rod 703 will drive the clamping plate 704 to slide, so as to ensure that the water-absorbing strip 706 is in full contact with the vision camera 3. The sliding rod 703 has a regular hexagonal prism structure. The sliding rod 703 with a regular hexagonal prism structure can restrict the moving path of the clamping plate 704, so as to restrict the moving path of the water-absorbing strip 706. An extension plate 713 is fixedly connected to the upper surface of the connecting plate 702. Two limiting plates 712 are fixedly connected to the surface of the clamping plate 704. The limiting plates 712 are slidably connected to the extension plate 713. When the connecting plate 702 moves, it will drive the extension plate 713 to slide along the surface of the limiting plate 712. The limiting plate 712 plays a role in restricting the moving path of the extension plate 713, so as to prevent the connecting plate 702 from falling.

[0034] The overall working principle is as follows: When it is necessary to detect a single-crystal raw silicon wafer, the single-crystal raw silicon wafer is placed in the fixture 4. During the detection process, the steam discharged from the steam generator 6 is sprayed on the single-crystal raw silicon wafer by the nozzle 5, and at the same time, the single-crystal raw silicon wafer is detected by the vision camera 3. After the detection is completed, the single-crystal raw silicon wafer is taken out of the fixture 4. During this process, the electric push rod 701 is turned on. The extension of the output end of the electric push rod 701 will drive the connecting plate 702 to move. The movement of the connecting plate 702 will drive the sliding rod 703 to move. The movement of the sliding rod 703 will drive the clamping plate 704 to move. The strip-shaped plate 705 will drive the water-absorbing strip 706 to move by means of the movement of the clamping plate 704. When the water-absorbing strip 706 contacts the vision camera 3, it will wipe and adsorb the water droplets attached to the surface of the vision camera 3, thereby preventing the water droplets from interfering with the normal detection of the single-crystal raw silicon wafer by the vision camera 3. At the same time, the spring 711 will use its own elastic force to slide the sliding rod 703 upward. The sliding of the sliding rod 703 will drive the clamping plate 704 to slide, so as to ensure that the water-absorbing strip 706 is in full contact with the vision camera 3. The sliding rod 703 with a regular hexagonal prism structure can limit the movement path of the clamping plate 704, thereby restricting the movement path of the water-absorbing strip 706. The movement of the connecting plate 702 will drive the extension plate 713 to slide along the surface of the limiting plate 712. The limiting plate 712 can limit the movement path of the extension plate 713, thereby preventing the connecting plate 702 from falling. After the wiping is completed, the output end of the electric push rod 701 is controlled to contract. When the water-absorbing strip 706 is separated from the vision camera 3, the waterproof electric heating plate 710 is turned on. The waterproof electric heating plate 710 will heat the water-absorbing strip 706 to dry the water-absorbing strip 706. When it is necessary to replace the water-absorbing strip 706, the bolt 707 is rotated. The bolt 707 will move downward by means of the thread. At this time, the baffle 708 can limit the moving distance of the bolt 707 to prevent the bolt 707 from being separated from the clamping plate 704. Then, the strip-shaped plate 705 is pulled out of the clamping plate 704, and then the strip-shaped plate 705 with a new water-absorbing strip 706 is slid into the clamping plate 704. The movement of the strip-shaped plate 705 will drive the positioning block 709 to move. After the positioning block 709 contacts the clamping plate 704, it can limit the position of the strip-shaped plate 705, so that the water-absorbing strip 706 is aligned with the vision camera 3. Then, the bolt 707 is rotated in the reverse direction. When the bolt 707 abuts against the surface of the strip-shaped plate 705, the bolt 707 can limit the position of the strip-shaped plate 705, thereby restricting the position of the water-absorbing strip 706. After that, the water-absorbing strip 706 can be used to continue wiping the vision camera 3.

[0035] The above are only the preferred embodiments of the present utility model, and are not intended to limit the present utility model in other forms. Any person skilled in the art may use the technical content disclosed above to make changes or modifications into equivalent embodiments with equivalent changes and apply them to other fields. However, as long as it does not depart from the technical solution content of the present utility model, any simple modification, equivalent change and modification made to the above embodiments based on the technical essence of the present utility model still fall within the protection scope of the technical solution of the present utility model.

Claims

1. A cleaning device for a single crystal silicon wafer crack detection machine, comprising a detection table (1), characterized in that: The surface of the detection platform (1) is fixedly connected to a bracket (2), the surface of the bracket (2) is fixedly connected to a visual camera (3), the upper surface of the detection platform (1) is detachably mounted with a fixture (4), the surface of the detection platform (1) is fixedly connected to a steam generator (6), the exhaust end of the steam generator (6) is fixed and connected to a nozzle (5), the surface of the bracket (2) is provided with a cleaning structure (7), the cleaning structure (7) comprises an electric push rod (701), the electric push rod (701) is fixedly connected to the bracket (2), the output end of the electric push rod (701) is fixedly connected to a connecting plate (702), a sliding rod (703) is slidably connected inside the connecting plate (702), the upper end of the sliding rod (703) is fixedly connected to a clamp (704), the inner wall of the clamp (704) is slidably connected to a strip plate (705), and the surface of the strip plate (705) is fixedly connected to a water absorption strip (706).

2. The cleaning device of the single crystal silicon wafer hidden crack detection machine according to claim 1 is characterized in that: The clamping plate (704) is internally threadedly connected with a bolt (707), and the bolt (707) passes through the clamping plate (704).

3. The cleaning device of the single crystal silicon wafer hidden crack detection machine according to claim 2 is characterized in that: The clamping plate (704) is fixedly connected to a baffle (708) at a position relative to the bolt (707).

4. The cleaning device of the single crystal silicon wafer hidden crack detection machine according to claim 1, characterized in that: A positioning block (709) is fixedly connected to the surface of the strip plate (705), and the positioning block (709) abuts against the surface of the clamping plate (704).

5. The cleaning device of the single crystal silicon wafer hidden crack detection machine according to claim 1, characterized in that: A waterproof electric heating plate (710) is fixedly connected inside the strip plate (705), and the waterproof electric heating plate (710) is fixedly connected to the water absorption strip (706).

6. The cleaning device of the single crystal silicon wafer hidden crack detection machine according to claim 1, characterized in that: A spring (711) is sleeved on the surface of the sliding rod (703), and two ends of the spring (711) are fixedly connected to the sliding rod (703) and the connecting plate (702) respectively.

7. The cleaning device of the single crystal silicon wafer hidden crack detection machine according to claim 1, characterized in that: The sliding rod (703) is in the form of a regular hexagonal prism structure.

8. The cleaning device of the single crystal silicon wafer hidden crack detection machine according to claim 1, characterized in that: An extension plate (713) is fixedly connected to the upper surface of the connection plate (702), and two limit plates (712) are fixedly connected to the surface of the clamping plate (704), and the limit plates (712) are slidably connected to the extension plate (713).

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