Positioning device

Abstract

The utility model relates to a positioning device. The positioning device comprises a base, a first deviation rectifying mechanism and a second deviation rectifying mechanism. The first deviation rectifying mechanism and the second deviation rectifying mechanism are arranged on the base, the first deviation rectifying mechanism is used for adjusting the position state of a first workpiece in at least two directions, and the second deviation rectifying mechanism is used for adjusting the position state of a second workpiece. And the first workpiece and the second workpiece are relatively located in a set position state. According to the positioning device, the position precision of the two workpieces is higher, and the machining precision of products can be improved.

Description

Technical Field

[0001] The utility model relates to the technical field of product assembly and processing, and more specifically, to a positioning device. Background Art

[0002] In the production of photovoltaic panels, silicon wafers and pressing screens need to be set in a relatively fixed position to facilitate the subsequent welding process.

[0003] In the prior art, the position state of the silicon wafer is usually corrected first, and then the silicon wafer is transferred to the silicon wafer grabbing station, and then the position state of the press is corrected to adjust it to the set position of the silicon wafer. However, the silicon wafer is prone to deflection during the process of being transferred to the grabbing station, resulting in a decrease in the relative position accuracy between it and the press. Utility Model Content

[0004] One purpose of the utility model is to provide a positioning device to improve the relative position accuracy of a silicon wafer and a pressing net at a grabbing station.

[0005] According to one aspect of the utility model, a positioning device is provided, comprising:

[0006] A base, a first deviation-correcting mechanism, and a second deviation-correcting mechanism;

[0007] The first correcting mechanism and the second correcting mechanism are respectively arranged on the base, the first correcting mechanism is used to adjust the position state of the first workpiece in at least two directions, and the second correcting mechanism is used to adjust the position state of the second workpiece so that the first workpiece and the second workpiece are in a set position state relative to each other.

[0008] Optionally, the first workpiece has a first position and a second position relative to the base, and the first deviation correcting mechanism includes a first correcting mechanism and a second correcting mechanism;

[0009] When the first workpiece is located at the first position, the first correcting mechanism can make the first workpiece be in the first position state, and when the first workpiece is located at the second position, the second correcting mechanism can make the first workpiece be in the second position state;

[0010] When the first workpiece is in the second position state, the second workpiece can be in the set position state with the first workpiece.

[0011] Optionally, the positioning device further includes a first conveying mechanism, which is disposed on the base and is capable of moving the first workpiece to the first position and the second position.

[0012] Optionally, the positioning device further comprises a limiting mechanism, and the limiting mechanism is arranged on the second deviation correcting mechanism;

[0013] When the first workpiece is located at the first position, the first correcting mechanism can move the first workpiece along the first direction to the first position state;

[0014] When the first workpiece is located at the second position, the second correcting mechanism can move the first workpiece at least along the second direction to the second position state, and the limiting mechanism can limit the first workpiece in the third direction;

[0015] The third direction is the direction of the first workpiece from the first position to the second position, the first direction is perpendicular to the third direction and is in the same horizontal plane as the third direction, and the second direction is opposite to the first direction.

[0016] Optionally, the first correction mechanism includes a first mounting seat, a first driving member, a first positioning plate and a first connecting plate;

[0017] The first driving member is fixed on the first mounting seat, the first positioning plate is connected to the output end of the first driving member through the first connecting plate, and the first mounting seat is fixed on the base so that the first positioning plate is located on the first side of the first workpiece;

[0018] The first driving member can move the first workpiece along the first direction to the first position state through the first positioning plate.

[0019] Optionally, the second correction mechanism includes a second mounting seat, a second driving member, a third driving member and a second positioning plate;

[0020] The second driving member is fixed on the second mounting seat, the third driving member is arranged on the second driving member, the second positioning plate is arranged on the third driving member, and the second mounting seat is fixed on the base, so that the second positioning plate is located at the second side of the first workpiece;

[0021] The second driving member can move the first workpiece along the second direction through the second positioning plate, and the third driving member can deflect the first workpiece to the second position state through the second positioning plate.

[0022] Optionally, the second deviation-correcting mechanism includes a fourth driving member and a movable bracket;

[0023] The fourth driving member is fixed on the base, and an output end thereof is connected to the movable bracket, so that the movable bracket can reciprocate along the third direction relative to the base, and the limiting mechanism is arranged on the movable bracket.

[0024] Optionally, the second workpiece can be located on the movable support;

[0025] The second deviation-correcting mechanism further includes a fifth driving member disposed on the movable bracket and a push plate connected to an output end of the fifth driving member;

[0026] The fifth driving member can move the second workpiece along the second direction through the push plate, so that the second workpiece and the first workpiece can be in the set position state relative to each other.

[0027] Optionally, the second deviation-correcting mechanism further includes a limit detection mechanism disposed on the movable bracket;

[0028] The limit detection mechanism includes a first detection component and a second detection component, the first detection component is used to detect the relative position state of the second workpiece with respect to the first workpiece in the third direction, and the second detection component is used to detect the relative position state of the second workpiece with respect to the first workpiece in the second direction.

[0029] Optionally, the first detection assembly includes a mounting plate, a detection switch, a heat insulation and shock absorbing plate, and a limit plate;

[0030] The limit plate is arranged on the movable bracket, the detection switch is assembled on the limit plate through the mounting plate, and the heat insulation and shock absorbing plate is located between the limit plate and the mounting plate;

[0031] The limiting plate is used to limit the second workpiece in the third direction, and the detection switch is used to detect the position state of the second workpiece.

[0032] One technical effect of the utility model is that, by arranging the first deviation correcting mechanism and the second deviation correcting mechanism on the base, the utility model enables the first deviation correcting mechanism and the second deviation correcting mechanism to respectively correct the position states of the first workpiece and the second workpiece at the same workstation, so that the first workpiece and the second workpiece are in a set position state relative to each other, thereby improving the relative position accuracy of the first workpiece and the second workpiece at the same workstation.

[0033] Other features and advantages of the present invention will become apparent from the following detailed description of exemplary embodiments of the present invention with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] The accompanying drawings, which constitute a part of the specification, illustrate embodiments of the present utility model and, together with the description, are used to explain the principles of the present utility model.

[0035] Figure 1 This is one of the schematic diagrams of a positioning device provided in this application.

[0036] Figure 2 This is the second schematic diagram of a positioning device provided by the present application (without the second workpiece).

[0037] Figure 3 It is a schematic diagram of a first correction mechanism provided by the present application.

[0038] Figure 4 It is a schematic diagram of a second correction mechanism provided by the present application.

[0039] Figure 5 It is a schematic diagram of a limiting mechanism provided in this application.

[0040] Figure 6 It is a schematic diagram of a second deviation correction mechanism provided in this application.

[0041] Figure 7 yes Figure 6 A top view of a second deflection-correcting mechanism is provided.

[0042] Figure 8 yes Figure 7 A partial enlarged view of point A in the middle.

[0043] Description of reference numerals:

[0044] 100, first correction mechanism; 101, first mounting seat; 102, first driving member; 103, first connecting plate; 104, first positioning plate;

[0045] 200, second deviation-correcting mechanism; 201, sliding guide rail; 202, movable bracket; 203, second detection assembly; 204, detection switch; 205, mounting plate; 206, heat-insulating and shock-absorbing plate; 207, limit plate; 208, fifth driving member; 209, fourth driving member; 210, push plate;

[0046] 300, a first conveying mechanism;

[0047] 400, limiting mechanism; 401, third mounting seat; 402, sixth driving member; 403, connecting bracket; 404, adjusting plate; 405, third positioning plate;

[0048] 500, second workpiece;

[0049] 600, base;

[0050] 700, first workpiece; 701, first position; 702, second position;

[0051] 800, second alignment mechanism; 801, second mounting seat; 802, second driving member; 803, third driving member; 804, second positioning plate. DETAILED DESCRIPTION

[0052] Various exemplary embodiments of the present invention will now be described in detail with reference to the accompanying drawings. It should be noted that unless otherwise specifically stated, the relative arrangements of components and steps, numerical expressions and numerical values ​​set forth in these embodiments do not limit the scope of the present invention.

[0053] The following description of at least one exemplary embodiment is merely illustrative in nature and is in no way intended to limit the present invention, its application, or uses.

[0054] Techniques and equipment known to ordinary technicians in the relevant art may not be discussed in detail, but where appropriate, the techniques and equipment should be considered part of the specification.

[0055] In all examples shown and discussed herein, any specific values ​​should be interpreted as merely exemplary and not limiting. Therefore, other examples of the exemplary embodiments may have different values.

[0056] It should be noted that like reference numerals and letters refer to similar items in the following figures, and therefore, once an item is defined in one figure, it need not be further discussed in subsequent figures.

[0057] like Figures 1 to 8 As shown, according to one aspect of the utility model, a positioning device is provided, including: a base 600, a first correcting mechanism and a second correcting mechanism 200; the first correcting mechanism and the second correcting mechanism 200 are respectively arranged on the base 600, the first correcting mechanism is used to correct the position state of the first workpiece 700 in at least two directions, and the second correcting mechanism 200 is used to correct the position state of the second workpiece 500, so that the first workpiece 700 and the second workpiece 500 are in a set position state relative to each other.

[0058] Specifically, in this embodiment, the positioning device includes a first correcting mechanism and a second correcting mechanism 200 arranged on a base 600, so that the first correcting mechanism and the second correcting mechanism 200 can respectively correct the first workpiece 700 and the second workpiece 500 at the same workstation, so that the first workpiece 700 can be in a set position state relative to the second workpiece 500, thereby improving the position accuracy between the first workpiece 700 and the second workpiece 500.

[0059] In the above embodiment, the adjustment of the position state of the first workpiece 700 or the second workpiece 500 refers to adjusting the first workpiece 700 or the second workpiece 500 by moving or deflecting it so that it can be in the position state required for processing at the same workstation, thereby avoiding problems such as deflection of the first workpiece 700 or the second workpiece 500 when transported separately, improving the position accuracy of the two, and improving the production efficiency of subsequent processes.

[0060] In one embodiment, the first workpiece 700 and the second workpiece 500 are respectively a silicon wafer and a pressing net for producing solar panels. During the processing, the silicon wafer and the pressing net need to be adjusted to a relatively fixed position state, that is, a relatively set position state usually means that the silicon wafer and the pressing net need to be parallel to each other, and a certain position gap is left between them, so as to facilitate the subsequent process of serial welding with welding rods after the silicon wafer and the pressing net are grasped at the same time, thereby avoiding the problem of silicon wafer being easily skewed when the position of the silicon wafer is adjusted first and then transported to the set position of the pressing net.

[0061] Furthermore, the first deflection correction mechanism can adjust the position state of the first workpiece 700 in at least two directions, which may mean that the first deflection correction mechanism can change the displacement or deflection angle of the first workpiece 700. For example, the first deflection correction mechanism can move the first workpiece 700 from one position to another position, so that the distance between the first workpiece 700 and the second workpiece 500 is reduced or increased, so that they are at a set distance; or the first deflection correction mechanism can rotate the first workpiece 700 from one direction to another direction, so that the first workpiece 700 and the second workpiece 500 are in a set state of being parallel or oriented in the same direction.

[0062] The first correction mechanism adjusts the position of the first workpiece 700 in at least two directions, so that the relative position accuracy of the first workpiece 700 and the second workpiece 500 is higher. In actual production, the first correction mechanism and the second correction mechanism 200 can adjust the position of the first workpiece 700 and the second workpiece 500 respectively according to actual production requirements, and the present invention does not limit this.

[0063] Alternatively, if Figure 1 As shown, the first workpiece 700 has a first position 701 and a second position 702 relative to the base 600, and the first correcting mechanism includes a first correcting mechanism 100 and a second correcting mechanism 800; when the first workpiece 700 is located at the first position 701, the first correcting mechanism 100 can make the first workpiece 700 be in the first position state, and when the first workpiece 700 is located at the second position 702, the second correcting mechanism 800 can make the first workpiece 700 be in the second position state; when the first workpiece 700 is in the second position state, the second workpiece 500 can be in a set position state with the first workpiece 700.

[0064] Specifically, in this embodiment, the first workpiece 700 has a first position 701 and a second position 702 relative to the base 600, so that when the position of the first workpiece 700 is adjusted, a pre-position state can be pre-adjusted at the first position 701, and then a fine position state can be adjusted at the second position 702, which not only improves the adjustment efficiency of the position state, but also improves the position accuracy of the first workpiece 700 relative to the second workpiece 500.

[0065] In one embodiment, the first workpiece 700 and the second workpiece 500 are a silicon wafer and a press net, respectively. When the silicon wafer is at the first position 701, the first correction mechanism 100 can first correct the position of the silicon wafer in one direction to the first position state, and adjust it to the same degree as the final position state. When the silicon wafer moves to the second position 702, the silicon wafer is corrected in another direction to the second position state. At the same time, in the process of the silicon wafer moving to the second position 702, the second correction mechanism 200 can adjust the position state of the press net to achieve a relative position with the first workpiece 700 in a set position state.

[0066] In the above embodiment, by adjusting the position of the silicon wafer at two positions, on the one hand, the efficiency of adjusting the position of the silicon wafer is improved, and it is avoided that the silicon wafer needs to stay at the same position for a long time due to deviation correction, thereby improving production efficiency. Among them, when the silicon wafer is adjusted to the second position state at the second position 702, it can be the final required position state, or it can be the position state in the process, which can be specifically designed according to the relative position relationship required by the silicon wafer and the press. The position adjustment of the press can be adjusted when the silicon wafer is at the first position 701, or it can be adjusted when the silicon wafer is at the second position 702, further improving the adjustment efficiency.

[0067] Alternatively, if Figure 1 As shown, the positioning device further includes a first conveying mechanism 300 , which is disposed on a base 600 and is capable of moving a first workpiece 700 to a first position 701 and a second position 702 .

[0068] Specifically, in the present application, the first conveying mechanism 300 is used to convey the first workpiece 700, so that the first workpiece 700 can be at the first position 701 or the second position 702, so that the first deviation correction can adjust its position multiple times without affecting the conveyance of the silicon wafer. The first conveying mechanism 300 can be implemented by conveying equipment such as a belt, and the present invention does not limit this.

[0069] Alternatively, if Figure 1 , Figure 2 and Figure 5As shown, the positioning device also includes a limiting mechanism 400, which is arranged on the second correcting mechanism 200; when the first workpiece 700 is located at the first position 701, the first correcting mechanism 100 can move the first workpiece 700 along the first direction to the first position state; when the first workpiece 700 is located at the second position 702, the second correcting mechanism 800 can move the first workpiece 700 at least along the second direction to the second position state, and the limiting mechanism 400 can limit the first workpiece 700 in the third direction; wherein the third direction is the direction of the first workpiece 700 from the first position 701 to the second position 702, the first direction is perpendicular to the third direction and is in the same horizontal plane with it, and the second direction is opposite to the first direction.

[0070] Specifically, in this embodiment, the conveying direction of the first workpiece 700 is set to the third direction. When the first workpiece 700 is located at the first position 701, the first alignment mechanism 100 moves it along the first direction to pre-adjust the position state of the first workpiece 700. When it is located at the second position 702, the second alignment mechanism 800 can at least move it in the opposite direction of the first direction to fine-adjust the position state of the first workpiece 700. Through pre-adjustment and fine-adjustment, the first workpiece 700 is able to achieve position correction in the Y direction.

[0071] The first correction mechanism 100 and the second correction mechanism 800 are adjusted to respectively correct the position of the silicon wafer in the first direction and the second direction. The first direction and the second direction are Figure 1 and Figure 2 The setting of the limiting mechanism 400 can realize the position correction of the first workpiece 700 in the third direction, that is, the X direction in the figure, so that when the first workpiece 700 is at the second position 702, the position correction of the first workpiece 700 in the X and Y directions is realized through the joint adjustment of the second correcting mechanism 800 and the limiting mechanism 400, so that the position state of the first workpiece 700 is more accurate, so as to realize the relative set position state with the second workpiece 500, and further improve the accuracy of the positioning device for the two workpieces.

[0072] In one embodiment, the first workpiece 700 and the second workpiece 500 are a silicon wafer and a pressed mesh, respectively. Figure 1As shown, the silicon wafer is pushed by the first correcting mechanism 100 and the second correcting mechanism 800 at the first position 701 and the second position 702, respectively, so that it can achieve a set position state along the Y direction, for example, a position state parallel to the second workpiece 500 in the Y direction. The limiting mechanism 400 can limit and adjust the position of the silicon wafer in the third direction (X direction) when it is located at the second position 702, so that the silicon wafer can have a certain gap with the pressing screen in the X direction, which is convenient for the implementation of subsequent processes.

[0073] Alternatively, if Figure 1 and Figure 3 As shown, the first alignment mechanism 100 includes a first mounting seat 101, a first driving member 102, a first positioning plate 104 and a first connecting plate 103; the first driving member 102 is fixed on the first mounting seat 101, the first positioning plate 104 is connected to the output end of the first driving member 102 through the first connecting plate 103, and the first mounting seat 101 is fixed on the base 600, so that the first positioning plate 104 is located on the first side of the first workpiece 700; the first driving member 102 can move the first workpiece 700 along the first direction to the first position state through the first positioning plate 104.

[0074] Specifically, in this embodiment, the first alignment mechanism 100 is mainly used to move the first workpiece 700 in the first direction through the first driving member 102 and the first positioning plate 104. Figure 1 As shown, the first mounting seat 101 is fixed on the base 600 to ensure that the first positioning plate 104 can be located at the first side relative to the first workpiece 700, and the first driving member 102 drives the first connecting plate 103 to move in the first direction, so that it can drive the first positioning plate 104 to act on the first side of the first workpiece 700. The shape of the first positioning plate 104 can be designed according to actual needs, so that it can push the first workpiece 700 to move in the first direction to achieve position correction in the first direction.

[0075] The first connecting plate 103 is arranged so that the height of the first positioning plate 104 can match the height of the first workpiece 700. The first driving member 102 can be realized by a driving member such as a linear cylinder. The output end of the cylinder is its telescopic end, and the first connecting plate 103 is connected to the telescopic end of the cylinder to realize the driving of the first positioning plate 104.

[0076] Alternatively, if Figure 1 , Figure 2 and Figure 4As shown, the second alignment mechanism 800 includes a second mounting seat 801, a second driving member 802, a third driving member 803 and a second positioning plate 804; the second driving member 802 is fixed on the second mounting seat 801, the third driving member 803 is arranged on the second driving member 802, the second positioning plate 804 is arranged on the third driving member 803, and the second mounting seat 801 is fixed on the base 600, so that the second positioning plate 804 is located at the second side of the first workpiece 700; the second driving member 802 can move the first workpiece 700 along the second direction through the second positioning plate 804, and the third driving member 803 can deflect the first workpiece 700 to the second position state through the second positioning plate 804.

[0077] Specifically, in this embodiment, the second correcting mechanism 800 is used to correct the position of the silicon wafer at the second position 702. It enables the second positioning plate 804 to move along the second direction through the second driving member 802, that is, to cooperate with the first correcting mechanism 100 in the first direction to perform correction actions, thereby realizing the positioning of the first workpiece 700 in the Y direction.

[0078] Furthermore, the third driving member 803 is provided so that the angle of the first workpiece 700 can be corrected through the second positioning plate 804. Through the driving of the third driving member 803, the second positioning plate 804 can rotate in the opposite direction of the deflection of the first workpiece 700, thereby correcting the first workpiece 700 so that it can be closer to the desired position state in the second position state, further improving the position accuracy of the first workpiece 700 and the second workpiece 500. The second driving member 802 and the third driving member 803 can both be implemented by servo electric cylinders.

[0079] Alternatively, if Figure 1 , Figure 2 and Figure 6 As shown, the second correcting mechanism 200 includes a fourth driving member 209 and a movable bracket 202; the fourth driving member 209 is fixed on the base 600, and its output end is connected to the movable bracket 202, so that the movable bracket 202 can reciprocate along the third direction relative to the base 600, and the limiting mechanism 400 is arranged on the movable bracket 202.

[0080] Specifically, in this embodiment, the fourth driving member 209 can drive the limiting mechanism 400 to reciprocate in the third direction through the movable bracket 202, and the second workpiece 500 can be arranged on the movable bracket 202, so that during the reciprocating movement of the fourth driving member 209, the limiting mechanism 400 can limit the first workpiece 700 along the third direction, so as to adjust the position state of the first workpiece 700 and the second workpiece 500 in the third direction. The fourth driving member 209 can be an electric cylinder.

[0081] In practical applications, a sliding guide rail 201 may be provided on the base 600 so that the fourth driving member 209 can move on the sliding guide rail 201 when driving the movable bracket 202 to reciprocate along the third direction, thereby improving the sliding efficiency.

[0082] Alternatively, if Figure 2 and Figure 5 As shown, the limiting mechanism 400 includes a third mounting seat 401, a sixth driving member 402, a connecting bracket 403, two adjustment plates 404 and two third positioning plates 405. The connecting bracket 403 is connected to the output end of the sixth driving member 402. The two third positioning plates 405 are respectively fixed at the two ends of the connecting bracket 403 through two adjustment plates 404. The sixth driving member 402 can move the third positioning plates 405 along the fourth direction through the connecting bracket 403. The fourth direction (Z direction) is perpendicular to the horizontal plane.

[0083] Specifically, in this embodiment, the third mounting seat 401 is fixed on the movable bracket 202 , so that in actual application, the fourth driving member 209 can drive the third positioning plate 405 on the third mounting seat 401 to limit the first workpiece 700 through the movable bracket 202 .

[0084] The setting of the sixth driving member 402 allows the connecting bracket 403 to drive the third positioning plates 405 at both ends to be adjusted in the height direction, so that when the first workpiece 700 is damaged or broken, the third positioning plates 405 can be driven by the sixth driving member 402 to descend to a point where the first workpiece 700 can be transferred to other positions through the cup, thereby avoiding the risk of quality problems in the final processed product after the first workpiece 700 and the second workpiece 500 need to be grasped at the same workstation, thereby improving production efficiency and product quality.

[0085] Alternatively, if Figure 2 , Figure 6 and Figure 7 As shown, the second workpiece 500 can be located on the movable bracket 202; the second correcting mechanism 200 also includes a fifth driving member 208 arranged on the movable bracket 202 and a push plate 210 connected to the output end of the fifth driving member 208; the fifth driving member 208 can move the second workpiece 500 along the second direction through the push plate 210, so that the second workpiece 500 can be in a set position state relative to the first workpiece 700.

[0086] Specifically, in this embodiment, when the second workpiece 500 is transported to the set position on the movable bracket 202, it can be in the set position state with the first workpiece 700, so that the external device can work together on the two. When the second workpiece 500 is transported to the movable bracket 202, the fifth driving member 208 is set so that it can drive the push plate 210 to correct its position in the second direction, so as to achieve positioning with the first workpiece 700.

[0087] In one embodiment, when the second workpiece 500 is a screen press, its position correction station and the silicon wafer correction are set in the same device, which reduces the low position accuracy caused by vibration when the second correction mechanism 200 is installed on the screen press reflow profile and improves the integration of the equipment.

[0088] Alternatively, if Figure 6 and Figure 7 As shown, the second correcting mechanism 200 also includes a limit detection mechanism arranged on the movable bracket 202; the limit detection mechanism includes a first detection component and a second detection component 203, the first detection component is used to detect the relative position state of the second workpiece 500 and the first workpiece 700 in the third direction, and the second detection component 203 is used to detect the relative position state of the second workpiece 500 and the first workpiece 700 in the second direction.

[0089] Specifically, in this embodiment, the first detection component and the second detection component 203 are respectively used to detect whether the second workpiece 500 is in place in the second direction and the third direction, so that the second workpiece 500 can be in a set position state with the first workpiece 700, further improving the position accuracy of the two.

[0090] In one embodiment, the first workpiece 700 and the second workpiece 500 are a silicon wafer and a press net, which is transported to the movable support 202 by a second transmission mechanism (not shown in the figure), and is usually transported to a set position of the movable support 202 in the opposite direction of the conveying direction of the silicon wafer. The first detection component detection and the second detection component 203 can detect whether the press net is in a set position relative to the silicon wafer, so as to facilitate the position adjustment of the two.

[0091] Alternatively, if Figures 6 to 8 As shown, the first detection component includes a mounting plate 205, a detection switch 204, a heat-insulating and shock-absorbing plate 206 and a limit plate 207; the limit plate 207 is arranged on the movable bracket 202, the detection switch 204 is assembled on the limit plate 207 through the mounting plate 205, and the heat-insulating and shock-absorbing plate 206 is located between the limit plate 207 and the mounting plate 205; the limit plate 207 is used to limit the second workpiece 500 in the third direction, and the detection switch 204 is used to detect the position state of the second workpiece 500.

[0092] Specifically, in this embodiment, the first detection component can detect the position state of the second workpiece 500 in the third direction through the detection switch 204 to improve the positioning efficiency of the device. In addition, the detection switch 204 is assembled on the limit plate 207 through the mounting plate 205, so that its detection distance can be adjusted according to actual needs to be suitable for different product positioning. The setting of the heat insulation and shock absorbing plate 206 can prevent heat from being transferred to the detection switch 204, causing the detection switch 204 to be damaged due to high temperature, thereby improving the reliability of the device. Among them, the detection switch 204 can adopt a cylindrical proximity switch.

[0093] In addition, the second detection component 203 can realize the limit and in-place detection of the second workpiece 500 in the second direction by setting a limit structure and a proximity switch on the opposite side of the fifth driving member 208, thereby further improving the position accuracy of the two.

[0094] In one embodiment, if Figure 1 As shown, the first workpiece 700 and the second workpiece 500 are a silicon wafer and a pressing net respectively, and the positioning of the two can be achieved by using a positioning device provided by the present application, and the positioning process is as follows:

[0095] When the first conveying mechanism 300 conveys the silicon wafer to the first position 701 , the first alignment mechanism 100 moves the first positioning plate 104 toward the first direction through the first driving member 102 to push the silicon wafer to move to a set position in the first direction, so that the silicon wafer is in the first position state.

[0096] After the above actions are completed, the first conveying mechanism 300 continues to convey the silicon wafer to the second position 702 along the third direction. At this time, the fourth driving member 209 drives the limiting mechanism 400 fixed on the movable bracket 202 to move along the third direction to the preset position. At this time, the third positioning plate 405 will push the silicon wafer to move to the preset position in the third direction, and the fourth driving member 209 will retreat to a specific distance to achieve the set spacing between the silicon wafer and the pressing net in the X direction.

[0097] At the same time, the second conveying mechanism (not shown in the figure) conveys the pressing net to the limiting plate 207 on the movable bracket 202 to limit the pressing net in the X direction. After the pressing net is in place in the X direction, the detection switch 204 is triggered. After the triggering, the fifth driving member 208 moves the pressing net to a specific position along the second direction through the push plate 210. At this time, the second detection component 203 detects the trigger, completes the clamping and positioning of the pressing net, and completes its positioning in the X direction.

[0098] After the above actions are completed, the second correction mechanism 800 moves the second positioning plate 804 toward the second direction through the second driving member 802 to push the silicon wafer to move to the set position in the second direction. At the same time, the third driving member 803 can drive the second positioning plate 804 to achieve 360° rotation to adjust the angle of the silicon wafer appropriately, so that the silicon wafer can be in the second position state, and the position correction of the silicon wafer in the Y direction is achieved.

[0099] Through the correction, limiting, detection and other methods of the above-mentioned mechanisms, the silicon wafer and the pressing net are finally in a set position state relative to each other on the positioning device. At this time, the mechanical gripper can grab the silicon wafer and the pressing net at the same time, and move both of them to the workstation of the next process according to the above-mentioned set position state. Due to the high position accuracy of the two, the subsequent production efficiency is further improved.

[0100] It should be noted that the action sequence of the above-mentioned mechanisms is only a reference for an embodiment and is not limited to the above-mentioned sequence. In actual production, the actions can be performed according to actual needs.

[0101] The above embodiments focus on the differences between the various embodiments. As long as the different optimization features between the various embodiments are not contradictory, they can be combined to form a better embodiment. Considering the simplicity of the text, they will not be repeated here.

[0102] Although some specific embodiments of the present invention have been described in detail by way of examples, it should be understood by those skilled in the art that the above examples are for illustration only and are not intended to limit the scope of the present invention. It should be understood by those skilled in the art that the above embodiments may be modified without departing from the scope and spirit of the present invention. The scope of the present invention is defined by the appended claims.

Claims

1. A positioning device, characterized in that: include: A base (600), a first deviation-correcting mechanism, and a second deviation-correcting mechanism (200); The first deflection correcting mechanism and the second deflection correcting mechanism (200) are respectively arranged on the base (600), the first deflection correcting mechanism is used to adjust the position state of the first workpiece (700) in at least two directions, and the second deflection correcting mechanism (200) is used to adjust the position state of the second workpiece (500) so that the first workpiece (700) and the second workpiece (500) are in a set position state relative to each other.

2. The positioning device according to claim 1, characterized in that: The first workpiece (700) has a first position (701) and a second position (702) relative to the base (600), and the first deviation-correcting mechanism comprises a first correcting mechanism (100) and a second correcting mechanism (800); When the first workpiece (700) is located at the first position (701), the first correcting mechanism (100) can place the first workpiece (700) in a first position state, and when the first workpiece (700) is located at the second position (702), the second correcting mechanism (800) can place the first workpiece (700) in a second position state; When the first workpiece (700) is in the second position state, the second workpiece (500) can be in the set position state with the first workpiece (700) relative to each other.

3. The positioning device according to claim 2, characterized in that: The positioning device further comprises a first conveying mechanism (300), wherein the first conveying mechanism (300) is arranged on the base (600) and is capable of moving the first workpiece (700) to the first position (701) and the second position (702).

4. The positioning device according to claim 2, characterized in that: The positioning device further comprises a limiting mechanism (400), wherein the limiting mechanism (400) is arranged on the second deviation correcting mechanism (200); When the first workpiece (700) is located at the first position (701), the first correcting mechanism (100) can move the first workpiece (700) along a first direction to the first position state; When the first workpiece (700) is located at the second position (702), the second correcting mechanism (800) can move the first workpiece (700) at least along the second direction to the second position state, and the limiting mechanism (400) can limit the first workpiece (700) in the third direction; The third direction is the direction of the first workpiece (700) from the first position (701) to the second position (702), the first direction is perpendicular to the third direction and is in the same horizontal plane as the third direction, and the second direction is opposite to the first direction.

5. The positioning device according to claim 4, characterized in that: The first correction mechanism (100) comprises a first mounting seat (101), a first driving member (102), a first positioning plate (104) and a first connecting plate (103); The first driving member (102) is fixed on the first mounting seat (101), the first positioning plate (104) is connected to the output end of the first driving member (102) through the first connecting plate (103), and the first mounting seat (101) is fixed on the base (600), so that the first positioning plate (104) is located on the first side of the first workpiece (700); The first driving member (102) can move the first workpiece (700) along the first direction to the first position state via the first positioning plate (104).

6. The positioning device according to claim 4, characterized in that: The second correcting mechanism (800) comprises a second mounting seat (801), a second driving member (802), a third driving member (803) and a second positioning plate (804); The second driving member (802) is fixed on the second mounting seat (801), the third driving member (803) is arranged on the second driving member (802), the second positioning plate (804) is arranged on the third driving member (803), and the second mounting seat (801) is fixed on the base (600), so that the second positioning plate (804) is located at the second side of the first workpiece (700); The second driving member (802) can move the first workpiece (700) along the second direction through the second positioning plate (804), and the third driving member (803) can deflect the first workpiece (700) to the second position state through the second positioning plate (804).

7. The positioning device according to claim 4, characterized in that: The second deviation-correcting mechanism (200) comprises a fourth driving member (209) and a movable bracket (202); The fourth driving member (209) is fixed on the base (600), and its output end is connected to the movable bracket (202), so that the movable bracket (202) can reciprocate along the third direction relative to the base (600), and the limiting mechanism (400) is arranged on the movable bracket (202).

8. The positioning device according to claim 7, characterized in that: The second workpiece (500) can be located on the movable support (202); The second deviation-correcting mechanism (200) further comprises a fifth driving member (208) disposed on the movable bracket (202) and a push plate (210) connected to an output end of the fifth driving member (208); The fifth driving member (208) can move the second workpiece (500) along the second direction through the push plate (210), so that the second workpiece (500) and the first workpiece (700) can be in the set position state relative to each other.

9. The positioning device according to claim 8, characterized in that: The second deviation-correcting mechanism (200) further comprises a limit detection mechanism arranged on the movable bracket (202); The limit detection mechanism comprises a first detection component and a second detection component (203), wherein the first detection component is used to detect the relative position state of the second workpiece (500) with respect to the first workpiece (700) in the third direction, and the second detection component (203) is used to detect the relative position state of the second workpiece (500) with respect to the first workpiece (700) in the second direction.

10. The positioning device according to claim 9, characterized in that: The first detection assembly comprises a mounting plate (205), a detection switch (204), a heat insulation and shock absorbing plate (206) and a limit plate (207); The limit plate (207) is arranged on the movable bracket (202), the detection switch (204) is assembled on the limit plate (207) through the mounting plate (205), and the heat insulation and shock absorbing plate (206) is located between the limit plate (207) and the mounting plate (205); The limiting plate (207) is used to limit the second workpiece (500) in the third direction, and the detection switch (204) is used to detect the position state of the second workpiece (500).

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