Anti-deviation diffusion furnace wafer conveying device

Abstract

The utility model provides an anti-excursion diffusion furnace wafer conveyer, including: control box, guide rail subassembly, suction cup subassembly and baffle subassembly, the upper side surface of control box is symmetrically equipped with two guide rail subassembly, two guide rail subassembly structure is same, and there is the gap between two guide rail subassembly, guide rail subassembly includes: guide rail body, conveyer belt, and the baffle subassembly is equipped with the guide rail body. Compared with the prior art, the utility model has the following beneficial effects: through the arrangement of the sucker assembly, the sucker body can provide stable adsorption force during use, so that wafers are not easy to shift in the conveying process, and the sucker body realizes accurate positioning, so that the production efficiency is improved, and the production cost is reduced. According to the wafer anti-deviation device, the wafer can be accurately placed at the target position, through the arrangement of the baffle assembly, a baffle and the suction cup assembly act together in the using process, the more reliable anti-deviation effect is provided, and meanwhile the baffle assembly can prevent the wafer from being interfered by the outside.

Description

Technical Field

[0001] The utility model belongs to the field of conveying equipment, and in particular relates to an anti-deviating diffusion furnace wafer conveying device. Background Art

[0002] The wafer conveyor is a device used to transfer wafers during the semiconductor manufacturing process. However, the conveyor is prone to deviation in actual use. During the semiconductor manufacturing process, the deviation of the wafer may lead to a series of adverse consequences. The deviation will affect the wafer transportation, thereby affecting the processing efficiency. The offset wafer may be damaged, resulting in wafer performance degradation or failure. This is because there is a lack of anti-drift components. The lack of anti-drift components will not only lead to the above problems, but may also cause deviation and damage to the wafer, increasing the scrap rate and cost. Therefore, it is necessary to propose a new structure to solve the above technical problems. Utility Model Content

[0003] In view of the deficiencies in the prior art, the utility model aims to provide a diffusion furnace wafer conveying device with anti-drifting, so as to solve the problems raised in the above-mentioned background technology.

[0004] The utility model is achieved through the following technical scheme: an anti-drift diffusion furnace wafer conveying device, comprising: a control box, a guide rail assembly, a suction cup assembly and a baffle assembly, two guide rail assemblies are symmetrically installed on the upper surface of the control box, the two guide rail assemblies have the same structure, and a gap is set between the two guide rail assemblies, the guide rail assembly comprises: a guide rail body, a conveyor belt, a conveyor belt is installed on the outer surface of the guide rail body, suction cup assemblies are evenly installed on the outer surface of the conveyor belt, and multiple suction cup assemblies have the same structure, the suction cup assembly comprises: a mounting piece, a suction cup body, a suction cup body is installed on the upper surface of the mounting piece, and baffle assemblies are symmetrically installed on the left and right sides of the guide rail assembly.

[0005] As a preferred embodiment, the control box is electrically connected to the power supply and the guide rail assembly through wires, and a guide rail body is symmetrically installed on the left edge and the right edge of the upper surface of the control box, and a conveyor belt is rotatably installed on the outer surface of the guide rail body.

[0006] As a preferred embodiment, the baffle assembly includes baffle one and baffle two, and the baffle one has the same structure as baffle two. The lower edges of the surfaces of baffle one and baffle two are evenly provided with multiple threaded holes. The left surface and the right surface of the guide rail body are respectively fixed with baffle one and baffle two through threaded holes and screws. When in use, the baffle and the suction cup assembly work together to provide a more reliable anti-deviation effect. At the same time, the baffle assembly can also prevent the wafer from being interfered with externally.

[0007] As a preferred embodiment, the spacing formed between the baffle plate 1 and the baffle plate 2 is the same as the width of the conveyor belt, and a plurality of mounting parts are evenly installed on the outer surface of the conveyor belt, and the plurality of mounting parts have the same structure.

[0008] As a preferred embodiment, a suction cup body is installed on the upper surface of each mounting member, and the suction cup body is a double-layer suction cup. The suction cup body is an overall disc-shaped structure, and the diameter of the upper surface of the suction cup body matches the diameter of the wafer. When in use, the suction cup body can provide a stable adsorption force, so that the wafer is not easily displaced during the transmission process, and the suction cup body can achieve precise positioning, which helps to accurately place the wafer at the target position.

[0009] After adopting the above technical scheme, the beneficial effect of the utility model is as follows: by setting up a suction cup assembly, the suction cup assembly includes: a mounting part and a suction cup body, a conveyor belt is installed on the outer surface of the guide rail body, a plurality of mounting parts are evenly installed on the outer surface of the conveyor belt, and a suction cup body is installed on the upper surface of the mounting part. When in use, the suction cup body can provide a stable adsorption force, so that the wafer is not easily displaced during the transmission process, and the suction cup body can achieve precise positioning, which helps to accurately place the wafer at the target position.

[0010] By setting up a baffle assembly, the baffle assembly includes baffle one and baffle two, and the left surface and the right surface of the guide rail body are respectively fixed with baffle one and baffle two by screws. A conveyor belt is installed between baffle one and baffle two through the guide rail body. When in use, the baffle and the suction cup assembly work together to provide a more reliable anti-deviation effect. At the same time, the baffle assembly can also prevent the wafer from being interfered with externally. BRIEF DESCRIPTION OF THE DRAWINGS

[0011] In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0012] Figure 1 The utility model is a schematic diagram of the overall structure of an anti-drifting diffusion furnace wafer conveying device.

[0013] Figure 2 The utility model is a schematic diagram of a suction cup assembly of an anti-drifting diffusion furnace wafer conveying device.

[0014] Figure 3 The utility model is a schematic diagram of a baffle assembly of an anti-deviating diffusion furnace wafer conveying device.

[0015] In the figure, 100-control box, 110-guide rail body, 120-transmission belt, 121-suction cup assembly, 122-mounting piece, 123-suction cup body;

[0016] 200-Baffle assembly. DETAILED DESCRIPTION

[0017] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0018] See also Figures 1 to 3 The utility model provides a technical solution: an anti-drift diffusion furnace wafer conveying device, comprising: a control box 100, a guide rail assembly, a suction cup assembly 121 and a baffle assembly 200, two guide rail assemblies are symmetrically installed on the upper surface of the control box 100, the two guide rail assemblies have the same structure, and a gap is set between the two guide rail assemblies, the guide rail assembly comprises: a guide rail body 110, a conveyor belt 120, the outer surface of the guide rail body 110 is installed with the conveyor belt 120, the outer surface of the conveyor belt 120 is evenly installed with suction cup assemblies 121, and multiple suction cup assemblies 121 have the same structure, the suction cup assembly 121 comprises: a mounting member 122, a suction cup body 123, the upper surface of the mounting member 122 is installed with the suction cup body 123, and the baffle assembly 200 is symmetrically installed on the left and right sides of the guide rail assembly.

[0019] See also Figure 1 , Figure 2 As the first embodiment of the utility model: the control box 100 is electrically connected to the power supply and the guide rail assembly through wires, and a guide rail body 110 is symmetrically installed on the left edge and the right edge of the upper surface of the control box 100, and a transmission belt 120 is rotatably installed on the outer surface of the guide rail body 110.

[0020] The baffle assembly 200 includes baffle 1 and baffle 2. The baffle 1 and baffle 2 have the same structure. The lower edges of the surfaces of baffle 1 and baffle 2 are evenly provided with a plurality of threaded holes. The left and right surfaces of the guide rail body 110 are respectively fixed with baffle 1 and baffle 2 through threaded holes and screws.

[0021] The spacing between the baffle plate 1 and the baffle plate 2 is the same as the width of the conveyor belt 120. A plurality of mounting members 122 are evenly mounted on the outer surface of the conveyor belt 120. The plurality of mounting members 122 have the same structure.

[0022] When in use, the user can place the wafer to be transported above the suction cup body 123 of the conveyor belt 120 through an external machine. The placed wafer will squeeze out a certain amount of air inside the suction cup body 123, so that the wafer is adsorbed on the upper surface of the suction cup body 123. After the adsorption is completed, the wafer can be transported by the guide rail body 110 in combination with the conveyor belt 120. Since the suction cup body 123 can provide a stable adsorption force, the wafer is not easy to shift during the transportation process, and the suction cup body 123 can achieve precise positioning, which helps to place the wafer accurately at the target position. When the wafer is transported to the bottom of the conveyor belt 120, the wafer will leave the suction cup body 123 due to gravity and fall down. The user can set other equipment for subsequent operations according to the position where the wafer falls.

[0023] See also Figure 1 , Figure 2 , as the second embodiment of the utility model: a suction cup body 123 is installed on the upper surface of each mounting member 122, the suction cup body 123 is a double-layer suction cup, the suction cup body 123 is a disc-shaped structure as a whole, and the diameter of the upper surface of the suction cup body 123 matches the diameter of the wafer;

[0024] When in use, since the wafer is set on the conveyor belt 120 through the suction cup body 123, when the conveyor belt 120 drives the wafer for transportation, baffle 1, baffle 2 and suction cup assembly 121 work together to provide a more reliable anti-deviation effect, so that the wafer is always transported between baffle 1 and baffle 2, and at the same time, the baffle assembly 200 can also prevent the wafer from being disturbed by the outside.

[0025] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A diffusion furnace wafer conveying device with anti-drifting, comprising: A control box (100), a guide rail assembly, a suction cup assembly (121), and a baffle assembly (200), characterized in that two guide rail assemblies are symmetrically mounted on the upper surface of the control box (100), the two guide rail assemblies have the same structure, and a gap is provided between the two guide rail assemblies; The guide rail assembly comprises: a guide rail body (110) and a conveyor belt (120); the conveyor belt (120) is installed on the outer surface of the guide rail body (110); and suction cup assemblies (121) are evenly installed on the outer surface of the conveyor belt (120); The plurality of suction cup assemblies (121) have the same structure, and the suction cup assemblies (121) comprise: a mounting member (122) and a suction cup body (123); the suction cup body (123) is mounted on the upper surface of the mounting member (122); and baffle assemblies (200) are symmetrically mounted on the left and right sides of the guide rail assembly.

2. The anti-deviating diffusion furnace wafer conveying device according to claim 1, characterized in that: The control box (100) is electrically connected to a power source and a guide rail assembly via electric wires; a guide rail body (110) is symmetrically mounted on the left edge and the right edge of the upper surface of the control box (100); a conveyor belt (120) is rotatably mounted on the outer surface of the guide rail body (110).

3. The anti-drifting diffusion furnace wafer conveying device according to claim 2, characterized in that: The baffle assembly (200) comprises baffle one and baffle two, wherein baffle one and baffle two have the same structure, and the lower edges of the surfaces of baffle one and baffle two are evenly provided with a plurality of threaded holes, and the left surface and right surface of the guide rail body (110) are fixed with baffle one and baffle two via threaded holes and screws, respectively.

4. The anti-deviating diffusion furnace wafer conveying device according to claim 3, characterized in that: The spacing formed between the baffle plate 1 and the baffle plate 2 is the same as the width of the conveyor belt (120); a plurality of mounting members (122) are evenly mounted on the outer surface of the conveyor belt (120); and the plurality of mounting members (122) have the same structure.

5. The anti-deviating diffusion furnace wafer conveying device according to claim 4, characterized in that: A suction cup body (123) is mounted on the upper surface of each mounting member (122); the suction cup body (123) is a double-layer suction cup; the suction cup body (123) is in the shape of a circular disc as a whole; and the diameter of the upper surface of the suction cup body (123) matches the diameter of the wafer.

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