MPCVD cavity structure

Abstract

The utility model relates to an MPCVD cavity structure, which comprises a bottom plate and an adjustable support member supported on the bottom plate, the upper surface of the bottom plate is provided with a lower shell, and the adjustable support member adjustably suspends an upper shell above the lower shell, so that the lower shell can be matched with the upper shell to construct a deposition growth cavity; a deposition growth pedestal is arranged in the lower shell, the outer side of the deposition growth pedestal is further sleeved with a shielding ring sleeve, and the shielding ring sleeve is rotatably installed on the inner bottom face of the lower shell in the mode that the shielding ring sleeve can rotate around the axis relative to the deposition growth pedestal which is coaxially arranged with the shielding ring sleeve. According to the utility model, oxygen which spreads from outside to inside can be conveyed to the seed crystal placement matrix on the table surface in a manner of surrounding the deposition growth table base, so that the growth thickening rate of edge seed crystals is slowed down, and the quality of generated diamonds is improved at the same time.

Description

Technical Field

[0001] The utility model relates to the technical field of diamond production equipment, in particular to an MPCVD cavity structure. Background Art

[0002] Diamond films have excellent optical, electrical, mechanical, and thermal properties, making them have broad application prospects in traditional and emerging industries. In particular, the high breakdown electric field, high saturated carrier velocity, high carrier mobility, low dielectric constant, wide bandgap, high optical transparency, and high thermal conductivity of diamond films make them ideal semiconductor materials for current and future electronic applications. Currently, the methods for artificially synthesizing diamond include the high temperature and high pressure method (HTHP), the direct current arc plasma jet method (DCAPJ), the hot filament chemical vapor deposition method (HFCVD), and the microwave plasma chemical vapor deposition method (MPCVD). Among them, MPCVD is often used as the preferred method for preparing high-quality diamond films due to its good product quality and less production pollution. When manufacturing diamond, first, a seed crystal is placed on a deposition growth table made of molybdenum material in a reaction chamber, and then methane and oxygen are continuously input into the closed chamber after closing. Thus, under the action of microwave energy, the deposition gas is excited into a plasma state. Under the action of the electromagnetic field generated by the microwave, electrons in the cavity collide with each other and generate intense oscillations, promoting the mutual collision between other atoms, groups, and molecules in the resonant cavity. Thus, the ionization degree of the reaction gas is effectively increased, and a higher density of plasma is generated, causing diamond films to be deposited on the surface and edge of the seed crystal, so that the seed crystal gradually grows to obtain a larger diamond sheet. In addition, the continuously input oxygen can slow down the growth rate of the seed crystal and improve the growth quality while assisting methane to generate carbon-containing groups.

[0003] However, due to the difference in the placement positions of multiple seed crystals arranged in a matrix on the deposition growth table, the distances between the seed crystals at different positions and the plasma light are different, resulting in different growth rates of the seed crystals at different positions. In particular, the edges of the seed crystals located at the edge of the table are prone to grow polycrystals, resulting in a fast growth rate; the seed crystals in the middle region of the table will be connected during the growth process to complete the splicing of the seed crystals and further thickening growth. In particular, the growth rate at the four corners of the matrix edge is relatively fast. The deposition growth rate on the surface of the seed crystals at the edge position is fast, resulting in a higher height, which is extremely likely to cause discharge and a high temperature here, and then make the edge part grow faster, resulting in a vicious cycle. Therefore, during the process of depositing and producing diamond, it is necessary to adjust the deposition growth rates of the seed crystals in different regions so that several seed crystals on the entire deposition table can maintain a roughly equal thickness growth rate while growing and splicing with each other, which is convenient for obtaining diamond sheets with high growth quality and uniform thickness. Summary of the Utility Model

[0004] The utility model aims to provide an MPCVD chamber structure which can transmit oxygen spreading from the outside to the inside to the seed crystal arrangement matrix on the table in a manner of surrounding a deposition growth table to slow down the growth and thickening rate of the edge seed crystals while improving the quality of the generated diamonds, so as to solve the problem that the seed crystals arranged in the existing matrix are very likely to generate edge seed crystals too quickly during the deposition growth process, resulting in uneven thickness of the generated diamond sheets, and the too fast growth of the edge area will cause the edge diamond height to be too high and easily exceed the height of the enclosure, which is very likely to cause discharge and cause high temperature here, thereby making the edge part grow faster, causing a vicious circle, and the quality of the diamonds produced by the too fast deposition growth is reduced, affecting the overall quality of the diamonds.

[0005] The technical solution adopted by the utility model is: an MPCVD chamber structure, including a base plate and an adjustable support member supported on the base plate, a lower shell is arranged on the upper surface of the base plate, and the adjustable support member can adjustably suspend the upper shell above the lower shell, so that the lower shell can cooperate with the upper shell to construct a deposition growth chamber; a deposition growth platform is arranged in the lower shell, and a shielding ring sleeve is also sleeved on the outer side of the deposition growth platform, and the shielding ring sleeve is rotatably mounted on the inner bottom surface of the lower shell in a manner that it can rotate around the axis relative to the deposition growth platform coaxially arranged therewith.

[0006] According to a preferred embodiment, the shielding ring sleeve includes an upper ring body, a lower ring body, a sealed bearing and an external rotary drive mechanism, wherein the upper ring body is rotatably connected to the lower ring body coaxially through the sealed bearing, and the upper ring body is also transmission-connected to the external rotary drive mechanism; the lower ring body is mounted on the inner bottom surface of the lower shell; the external rotary drive mechanism is mounted on the lower surface of the base plate, and its power output end is rotatably inserted into the shell cavity of the lower shell and meshes with the upper ring body for transmission.

[0007] According to a preferred embodiment, a radial through-ring groove is provided on the inner side surface of the upper ring body which is higher than the deposition growth platform, and first axial tube holes connected to the radial through-ring groove are circumferentially spaced apart inside the upper ring body, and the first axial tube hole is connected to a bottom surface ring groove provided on the bottom surface of the upper ring body at an axial lower end away from the radial through-ring groove.

[0008] According to a preferred embodiment, a top ring groove corresponding to the bottom ring groove is also opened on the upper surface of the lower ring body, so that the groove cavity of the top ring groove is connected with the groove cavity of the bottom ring groove; a second axial tube hole axially penetrating the lower ring body is also provided on the bottom surface of the top ring groove.

[0009] According to a preferred embodiment, the sealed bearing includes a first sealed bearing and a second sealed bearing arranged coaxially. Wherein, the outer ring of the first sealed bearing and the inner ring of the second sealed bearing are respectively clamped on the two annular groove side walls of the bottom surface ring groove; the inner ring of the first sealed bearing and the outer ring of the second sealed bearing are respectively clamped on the two annular groove side walls of the top surface ring groove.

[0010] According to a preferred embodiment, a ring-shaped external tooth capable of meshing with the external rotary drive mechanism to transmit the rotational action is further sleeved on the outer side wall of the upper ring body.

[0011] According to a preferred embodiment, the external rotary drive mechanism includes a rotary motor, a transmission shaft and a transmission gear. Wherein, the rotary motor is detachably installed on the lower surface of the bottom plate, and the transmission shaft connected to the output end thereof sequentially penetrates through the bottom plate and the lower housing. The transmission gear capable of rotating around the axis along with the transmission shaft is sleeved on the upper end of the transmission shaft in the axial direction within the housing cavity of the lower housing, and the transmission gear meshes and drives with the ring-shaped external tooth.

[0012] According to a preferred embodiment, the transmission shaft fills the insertion gap through a sealed rotary bearing embedded on the bottom plate and / or the lower housing.

[0013] According to a preferred embodiment, a connecting insertion tube communicating with the second axial tube hole is further penetrated on the bottom plate and the lower housing, and the input end of the connecting insertion tube is connected to the oxygen supply tank.

[0014] According to a preferred embodiment, a cooling mechanism capable of controlling the temperature of the oxygen flow conveyed by the connecting insertion tube is further sleeved on the tube body of the connecting insertion tube. The cooling mechanism includes a circulating refrigeration unit, a coolant delivery tube connected to the inlet and outlet of the circulating refrigeration unit, and a spiral cooling tube surrounding the connecting insertion tube.

[0015] The beneficial effects of the present utility model are:

[0016] The sealed bearing provided in this application can, while enabling the rotatable connection between the upper ring body and the lower ring body, cooperate with the upper ring body and the lower ring body to define an internal gas guiding channel, so as to define the directional transportation of the input oxygen inside the ring wall structure defined by the rotatable tubular shielding ring sleeve, enabling the oxygen to flow directionally in the relatively rotatable upper ring body and lower ring body, ensuring that the oxygen can be effectively defined to discharge from the ring surface outlet on the radial inner side, thereby effectively spreading from the outside to the inside on the circular plane defined by the deposition growth pedestal, so that the seed crystals in the edge region can have their excessive growth rates inhibited while improving the growth quality under a high oxygen concentration state, enabling the deposition growth rates in the centroid region and the edge region of the entire plane to be approximately equal, thus ensuring that the entire diamond wafer can have a uniform thickness increase. The upper ring body provided in this application can rotate under the drive of an external rotation drive mechanism, so that the multi-strand oxygen flows input radially through the ring grooves from the first axial holes arranged at intervals can be mixed during the rotation of the upper ring body, gradually improving the uniformity of the oxygen flow discharging radially through the ring grooves on the ring surface, facilitating the equal growth restriction of the seed crystals in different regions on the same circumferential line at different radial positions of the circular surface, thus ensuring the growth uniformity of the seed crystals, avoiding the problem that the deposition growth rate on the surface of the seed crystals at the edge position is too fast, resulting in a high height and a large difference in deposition thickness, which affects the overall thickness uniformity and quality of the diamond wafer, and also preventing the occurrence of local high height leading to discharge, causing the temperature in this region to further rise and resulting in the further acceleration of the growth of the seed crystals in the edge region. This application effectively inhibits the too fast deposition rate of the outer ring through the gradually spreading oxygen supply from the outer ring to the inner ring, enabling the deposition growth rates of the seed crystals in different regions to be effectively adjusted, so that several seed crystals on the entire deposition table can maintain a roughly equal thickness growth rate while growing and splicing with each other, and the high-concentration oxygen also improves the growth quality of the diamond in the edge region, facilitating the acquisition of a diamond wafer with high growth quality and uniform thickness. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 FIG. is a schematic structural diagram of a preferred MPCVD cavity structure proposed by the present utility model;

[0018] Figure 2 FIG. is an enlarged structural diagram of part A of a preferred MPCVD cavity structure proposed by the present utility model.

[0019] LIST OF REFERENCE NUMERALS

[0020] 1: Bottom plate; 2: Adjustable support; 3: Lower housing; 4: Upper housing; 5: Deposition growth pedestal; 6: Shielding ring sleeve; 7: Oxygen supply tank; 8: Connecting insertion tube; 9: Cooling mechanism; 61: Upper ring body; 62: Lower ring body; 63: Sealing bearing; 64: External rotation drive mechanism; 611: Radial through-ring groove; 612: First axial tube hole; 613: Bottom surface ring groove; 614: Ring-shaped external teeth; 621: Top ring groove; 622: Second axial tube hole; 631: First sealing bearing; 632: Second sealing bearing; 641: Rotation motor; 642: Transmission shaft; 643: Transmission gear; 644: Sealing rotation bearing; 91: Circulating refrigeration unit; 92: Coolant delivery pipe; 93: Spiral cooling pipe. Detailed implementation manners

[0021] In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the present invention in combination with the drawings and the descriptions of the embodiments or the prior art. Obviously, the following descriptions of the structures of the drawings are only some embodiments of the present invention. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts.

[0022] The following will refer to the drawings and describe in detail the technical solutions provided by the present invention through embodiment modes. It should be noted here that the descriptions of these embodiment modes are used to help understand the present invention, but do not constitute a limitation to the present invention. In some examples, since some embodiment modes belong to the prior art or conventional technology, they are not described or are not described in detail.

[0023] In addition, the technical features recorded herein, or the steps in all the methods or processes disclosed, except for mutually exclusive features and / or steps, can also be combined in any suitable manner in one or more embodiments. For those skilled in the art, the steps or operation sequences of the methods related to the embodiments provided herein can also be changed. Any sequence in the drawings and the embodiments is only for illustrative purposes and does not imply a requirement to follow a certain sequence, unless clearly stated to follow a certain sequence.

[0024] The serial numbers assigned to the components herein, such as "first", "second", etc., are only used to distinguish the described objects and do not have any sequential or technical meanings. And the "connection" and "coupling" mentioned in this application, under reasonable circumstances (without self-contradiction), both include direct and indirect connections (couplings).

[0025] The following will be described in detail with reference to the drawings.

[0026] Embodiment 1

[0027] The present application provides an MPCVD cavity structure, which includes a bottom plate 1, an adjustable support member 2, a lower housing 3, an upper housing 4, a deposition growth pedestal 5, a shielding ring sleeve 6, an oxygen supply tank 7, a connecting insertion tube 8, and a cooling mechanism 9.

[0028] According to Figure 1-2 A specific embodiment shown, the adjustable support member 2 is supported on the bottom plate 1. The upper surface of the bottom plate 1 is provided with a lower housing 3. The adjustable support member 2 suspends the upper housing 4 above the lower housing 3 in an adjustable manner, so that the lower housing 3 and the upper housing 4 can cooperate to construct a deposition growth chamber. A deposition growth pedestal 5 is arranged in the lower housing 3. A shielding ring sleeve 6 is also sleeved outside the deposition growth pedestal 5. The shielding ring sleeve 6 is rotatably installed on the inner bottom surface of the lower housing 3 in a manner that can rotate around the axis relative to the deposition growth pedestal 5 coaxial with it. The bottom of the shielding ring sleeve 6 is also communicated with the oxygen supply tank 7 through the connecting insertion tube 8, and a cooling mechanism 9 is also sleeved on the connecting insertion tube 8, so that the oxygen transported through the connecting insertion tube 8 can enter the inside of the shielding ring sleeve 6, and the annular exhaust port defined by the shielding ring sleeve 6 can swirl around the central axis and evenly spray an oxygen flow with adjustable temperature and spreading from the plane edge to the plane center onto the tabletop of the deposition growth pedestal 5, so that the circumferentially output oxygen can effectively inhibit the diamond deposition growth rate in the outer edge area of the deposition growth pedestal 5 and ensure the uniform deposition growth of the diamond film on the entire plane, ensure the uniform thickness of the diamond while also improving the quality of the diamond deposition growth, and avoid problems such as excessive growth in the outer ring, less oxygen reaction amount, and quality decline.

[0029] Preferably, the bottom plate 1 is detachably installed on the workshop wall or prefabricated support frame. The adjustable support member 2 provided on the bottom plate 1 is preferably a liftable support gantry. The lower housing 3 and the upper housing 4 provided in the present application are conventional cavity structures for deposition growth, and plasma light and other processing and production components are arranged inside them, and pipelines for transporting production gases such as methane are also arranged. Preferably, the deposition growth pedestal 5 is a liftable object placement table commonly used in existing MPCVD equipment, so as to ensure that the seed crystal can be effectively and evenly deposited on the liftable object placement table with a molybdenum support or made entirely of molybdenum metal, and avoid the problem that the seed crystal in some areas is too close to the plasma light and grows too fast, resulting in a decline in the quality of the produced diamond and the height of the diamond exceeding the surrounding fence, causing discharge of the diamond and affecting the deposition quality.

[0030] Preferably, the shielding ring sleeve 6 includes an upper ring body 61, a lower ring body 62, a sealed bearing 63, and an external rotary drive mechanism 64. Preferably, the upper ring body 61 is coaxially connected to the lower ring body 62 through the sealed bearing 63 in a rotatable manner. Further preferably, the upper ring body 61 is also in transmission connection with the external rotary drive mechanism 64. Preferably, the lower ring body 62 is mounted on the inner bottom surface of the lower housing 3. Preferably, the external rotary drive mechanism 64 is mounted on the lower surface of the bottom plate 1, and its power output end is rotatably inserted into the cavity of the lower housing 3 and is in meshing transmission with the upper ring body 61. The upper ring body 61 and the lower ring body 62 provided in the present application are connected through the sealed bearing 63 to construct an annular fence structure capable of partially rotating around the axis, so as to limit the deposition growth range of the seed crystal and avoid the discharge phenomenon of the seed crystal, while enabling the upper section structure to rotate, so that the oxygen transported in the internal channel chamber of the ring body structure can be effectively and evenly output in a continuous manner from the outer edge to the plane center on the deposition growth pedestal 5, so that the output oxygen concentration gradually decreases from the outside to the inside, effectively limiting the growth rate of the edge seed crystal, and further avoiding the problem that the edge seed crystal grows too fast relative to the middle seed crystal and has poor quality. The sealed bearing 63 provided in the present application can, while realizing the rotatable connection between the upper ring body 61 and the lower ring body 62, also cooperate with the upper ring body 61 and the lower ring body 62 to define an internal air guide channel, so as to limit the directional transportation of the input oxygen inside the ring wall structure defined by the rotatable tubular shielding ring sleeve 6, so that the oxygen flows directionally in the relatively rotatable upper ring body 61 and lower ring body 62, ensuring that the oxygen can be effectively defined to be discharged from the ring surface outlet on the radial inner side, so as to effectively spread from the outside to the inside on the circular plane defined by the deposition growth pedestal 5, so that the seed crystal in the edge area can be inhibited from growing too fast under the condition of high oxygen concentration while improving the growth quality, enabling the deposition growth rates in the centroid area and the edge area of the entire plane to be approximately equal, and thus ensuring that the entire diamond wafer can have a uniform thickness increase. The upper ring body 61 provided in the present application can rotate under the drive of the external rotary drive mechanism 64, so that the multi-strand oxygen flows input radially through the radial through-ring grooves 611 from the first axial tube holes 612 arranged at intervals can be mixed during the rotation of the upper ring body 61, gradually improving the uniformity of the oxygen flow discharged from the radial through-ring grooves 611 on the ring surface, facilitating the generation of equal growth restrictions on the seed crystals in different regions on the same circumference at different radial directions of the circular surface, thus ensuring the growth uniformity of the seed crystals, avoiding the problem that the deposition growth rate on the surface of the seed crystal at the edge position is too fast, resulting in a high height, a large difference in deposition thickness, and affecting the overall thickness uniformity and quality of the diamond wafer, and also preventing the occurrence of excessive height in a local area, leading to discharge, causing the temperature in this area to further increase, and resulting in further acceleration of the growth of the seed crystal in the edge area.The present application effectively inhibits the too-fast deposition rate of the outer ring through an oxygen supply that gradually spreads from the outer ring to the inner ring, enabling the deposition growth rates of the seed crystals in different regions to be effectively adjusted, so that the several seed crystals on the entire deposition table can maintain a substantially equal thickness growth rate while growing and splicing with each other. Moreover, the high-concentration oxygen also improves the growth quality of the diamond in the edge region, facilitating the acquisition of diamond wafers with high growth quality and uniform thickness.

[0031] Preferably, a radially penetrating annular groove 611 is formed on the inner side surface of the upper ring body 61 that is higher than the deposition growth pedestal 5. Further preferably, a first axial pipe hole 612 that communicates with the radially penetrating annular groove 611 is circumferentially spaced inside the upper ring body 61. Preferably, the axial lower end of the first axial pipe hole 612 away from the radially penetrating annular groove 611 communicates with a bottom surface annular groove 613 formed on the bottom surface of the upper ring body 61. Preferably, an annular external tooth 614 that can mesh with an external rotary drive mechanism 64 to transmit a rotary action is sleeved on the outer side wall of the upper ring body 61. The bottom surface annular groove 613 of the upper ring body 61 of the present application can communicate with the top annular groove 621 of the lower ring body 62 through the clearance annular cavity defined by the sealing bearing 63. The bottom surface annular groove 613 also communicates with the radially penetrating annular groove 611 with an opening facing the center of the circle through the first axial pipe holes 612 arranged at intervals, thereby delivering oxygen to the radially penetrating annular groove 611 more evenly and continuously outputting from the radially penetrating annular groove 611 to achieve oxygen discharge on the annular surface, so that the entire platform circular surface can be covered by oxygen that spreads evenly from the outside to the inside. Furthermore, methane that can effectively react with oxygen can deposit carbon-containing groups on the surface of the seed crystals on the platform, realizing the growth of the seed crystals. At the same time, by means of inhibiting growth with excess oxygen, the seed crystals on the entire plane can grow evenly, ensuring that the produced diamond wafers have a relatively uniform thickness.

[0032] Preferably, a top annular groove 621 corresponding to the bottom surface annular groove 613 is also formed on the upper surface of the lower ring body 62, so that the groove cavity of the top annular groove 621 communicates with the groove cavity of the bottom surface annular groove 613. Further preferably, a second axial pipe hole 622 that axially penetrates the lower ring body 62 is provided on the bottom surface of the top annular groove 621. Preferably, the inner diameter of the top annular groove 621 is larger than the inner diameter of the bottom surface annular groove 613, and the outer diameter of the top annular groove 621 is smaller than the outer diameter of the bottom surface annular groove 613, so that the notch area of the top annular groove 621 is smaller than the notch area of the bottom surface annular groove 613.

[0033] Preferably, the sealed bearing 63 includes a first sealed bearing 631 and a second sealed bearing 632 arranged coaxially. Further preferably, the outer ring of the first sealed bearing 631 and the inner ring of the second sealed bearing 632 are respectively clamped on the two annular groove side walls of the bottom ring groove 613. Further preferably, the inner ring of the first sealed bearing 631 and the outer ring of the second sealed bearing 632 are respectively clamped on the two annular groove side walls of the top ring groove 621. The first sealed bearing 631 and the second sealed bearing 632 arranged coaxially with a gap inserted sleeve in the present application can construct a conduction gap space for oxygen delivery while defining the rotatable connection between the upper ring body 61 and the lower ring body 62, so as to assist in defining the delivery of oxygen.

[0034] Preferably, the external rotary drive mechanism 64 includes a rotary motor 641, a transmission shaft 642, a transmission gear 643 and a sealed rotary bearing 644. Preferably, the rotary motor 641 is detachably mounted on the lower surface of the bottom plate 1. Further preferably, the transmission shaft 642 connected to its output end sequentially penetrates through the bottom plate 1 and the lower housing 3. Preferably, a transmission gear 643 capable of rotating around the axis with the transmission shaft 642 is sleeved on the upper end of the transmission shaft 642 in the axial direction within the cavity of the lower housing 3. Specifically, the transmission gear 643 meshes with the annular external teeth 614 for transmission. Preferably, the transmission shaft 642 fills the insertion gap through the sealed rotary bearing 644 embedded in the bottom plate 1 and / or the lower housing 3. Preferably, the sealed rotary bearing 644 can be a bearing for sealed connection of the same type as the first sealed bearing 631 and the second sealed bearing 632, and it has a rotatable sealing structure with an end face sealing ring to ensure the effectiveness of the seal while realizing relative rotatable connection.

[0035] Preferably, a connecting insertion tube 8 communicating with the second axial tube hole 622 is also inserted through the bottom plate 1 and the lower housing 3. Specifically, the top port of the connecting insertion tube 8 is connected to the second axial tube hole 622 by means of socket connection. Preferably, the input end of the connecting insertion tube 8 is connected to the oxygen supply tank 7. Preferably, a cooling mechanism 9 capable of controlling the temperature of the oxygen flow conveyed by it is also sleeved on the tube body of the connecting insertion tube 8. Further preferably, the cooling mechanism 9 includes a circulating refrigeration unit 91, a coolant delivery pipe 92 connected to the inlet and outlet of the circulating refrigeration unit 91, and a spiral cooling pipe 93 surrounding the connecting insertion tube 8. Specifically, the input end and the output end of the spiral cooling pipe 93 are respectively connected to the outlet and the inlet of the circulating refrigeration unit 91 through the coolant delivery pipe 92 to construct a closed-loop circulation circuit, so that the continuously circulating coolant can continuously complete refrigeration. Preferably, the circulating refrigeration unit 91 adopts an existing conventional circulating freezer, for example: a circulating chilled water freezer with the model number ZGLY-14ALC, and liquid flow driving pumps can be arranged at its inlet and outlet according to requirements. The cooling mechanism 9 provided in the present application can cool the oxygen conveyed in the connecting insertion tube 8 according to requirements, so as to be used for cooling and temperature reduction in the later growth stage, and accelerate the production efficiency and the quality during temperature reduction and cooling.

[0036] The present utility model is not limited to the above optional embodiments. Any person can obtain other various forms of products under the inspiration of the present utility model. However, no matter what changes are made in its shape or structure, as long as the technical solutions fall within the scope defined by the claims of the present utility model, they all fall within the protection scope of the present utility model. Those skilled in the art should understand that the specification and drawings of the present utility model are illustrative and do not constitute a limitation on the claims. The protection scope of the present utility model is defined by the claims and their equivalents. Throughout the text, the features guided by "preferably" are only an optional manner and should not be understood as must be provided. Therefore, the applicant reserves the right to abandon or delete the relevant preferred features at any time.

Claims

1. An MPCVD chamber structure, comprising a base plate (1) and an adjustable support member (2) supported on the base plate (1), characterized in that: The upper surface of the base plate (1) is provided with a lower shell (3), and the adjustable support member (2) can adjustably suspend the upper shell (4) above the lower shell (3), so that the lower shell (3) can cooperate with the upper shell (4) to construct a deposition growth chamber; A deposition growth platform (5) is arranged in the lower shell (3), and a shielding ring (6) is also sleeved on the outer side of the deposition growth platform (5). The shielding ring (6) is rotatably mounted on the inner bottom surface of the lower shell (3) in a manner that it can rotate around the axis relative to the deposition growth platform (5) arranged coaxially therewith.

2. The MPCVD chamber structure according to claim 1, characterized in that: The shielding ring sleeve (6) comprises an upper ring body (61), a lower ring body (62), a sealing bearing (63) and an external rotating drive mechanism (64), wherein: The upper ring body (61) is rotatably connected to the lower ring body (62) coaxially via the sealing bearing (63), and the upper ring body (61) is also transmission-connected to the external rotary drive mechanism (64); The lower ring body (62) is mounted on the inner bottom surface of the lower shell (3); The external rotary drive mechanism (64) is mounted on the lower surface of the base plate (1), and its power output end is rotatably inserted into the shell cavity of the lower shell (3) to mesh with the upper ring body (61) for transmission.

3. The MPCVD chamber structure according to claim 2, characterized in that: A radially penetrating annular groove (611) is provided on the inner side surface of the upper ring body (61) which is higher than the deposition growth platform (5), and first axial tube holes (612) communicating with the radially penetrating annular groove (611) are also provided in the interior of the upper ring body (61) at intervals in the circumferential direction. The axial lower end of the first axial tube hole (612) away from the radially penetrating annular groove (611) is communicated with a bottom surface annular groove (613) provided on the bottom surface of the upper ring body (61).

4. The MPCVD chamber structure according to claim 3, characterized in that: A top annular groove (621) corresponding to the bottom annular groove (613) is also provided on the upper surface of the lower annular body (62), so that the groove cavity of the top annular groove (621) and the groove cavity of the bottom annular groove (613) are communicated with each other; A second axial tube hole (622) axially penetrating the lower ring body (62) is also provided on the bottom surface of the top annular groove (621).

5. The MPCVD chamber structure according to claim 4, characterized in that: The sealed bearing (63) comprises a first sealed bearing (631) and a second sealed bearing (632) which are coaxially arranged, wherein: The outer ring of the first sealed bearing (631) and the inner ring of the second sealed bearing (632) are respectively embedded in the two annular groove side walls of the bottom surface annular groove (613); The inner ring of the first sealed bearing (631) and the outer ring of the second sealed bearing (632) are respectively embedded in the two annular groove side walls of the top annular groove (621).

6. The MPCVD chamber structure according to claim 5, characterized in that: The outer side wall of the upper ring body (61) is also sleeved with an annular outer tooth (614) capable of meshing with the external rotary drive mechanism (64) to transmit a rotary action.

7. The MPCVD chamber structure according to claim 6, characterized in that: The external rotary drive mechanism (64) comprises a rotary motor (641), a transmission shaft (642) and a transmission gear (643), wherein: The rotating motor (641) is detachably mounted on the lower surface of the base plate (1), and the transmission shaft (642) connected to its output end passes through the base plate (1) and the lower housing (3) in sequence. The axial upper end of the transmission shaft (642) located in the shell cavity of the lower shell (3) is sleeved with the transmission gear (643) capable of rotating around the axis thereof, and the transmission gear (643) is meshed with the annular external teeth (614) for transmission.

8. The MPCVD chamber structure according to claim 7, characterized in that: The transmission shaft (642) fills the interlaced gap through a sealed rotating bearing (644) embedded in the base plate (1) and / or the lower shell (3).

9. The MPCVD chamber structure according to claim 8, characterized in that: The bottom plate (1) and the lower shell (3) are also provided with a connecting cannula (8) communicating with the second axial tube hole (622), and the input end of the connecting cannula (8) is connected to the oxygen supply tank (7).

10. The MPCVD chamber structure according to claim 9, characterized in that: The connecting cannula (8) is also provided with a cooling mechanism (9) capable of controlling the temperature of the oxygen flow it transports. The cooling mechanism (9) comprises a circulating refrigeration unit (91), a cooling liquid delivery pipe (92) connected to the inlet and outlet of the circulating refrigeration unit (91), and a spiral cooling pipe (93) surrounding the connecting plug (8).

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