Plane angle fine adjustment mechanism

Abstract

The utility model relates to a plane angle fine adjustment mechanism which comprises a fixing plate, the inner edge of the fixing plate is movably connected with an outer rotating ring, and the inner edge of the outer rotating ring is movably connected with an inner rotating ring. Outer rotating shaft sleeves are arranged on the front and rear sides of the outer rotating ring, outer shaft pressing plates are arranged at the upper ends of the outer rotating shaft sleeves, inner rotating shafts are arranged on the left and right sides of the inner rotating ring, inner shaft pressing plates are arranged at the upper ends of the inner rotating shafts, inner ring adjusting screws are arranged at the front and rear ends of the fixing plate, and outer ring adjusting screws are arranged at the left and right ends of the fixing plate. Angle adjustment of the outer rotating ring and the inner rotating ring is achieved by adjusting the outer ring adjusting screw and the inner ring adjusting screw, and the purpose of high-precision fine adjustment is achieved. The device is reasonable in structural design and convenient to adjust, and the precision and efficiency of semiconductor wafer processing can be effectively improved.

Description

Technical Field

[0001] The utility model relates to the field of semiconductor processing, in particular to a planar angle fine-tuning mechanism. Background Technique

[0002] In the process of semiconductor wafer processing, the precise positioning and angle adjustment of the wafer are crucial. With the development of integrated circuit and microelectronics technologies, the precision requirements for wafer processing are constantly increasing. Especially in key process steps such as lithography, etching, and deposition, even a tiny angle error may lead to a decline in the performance of the final product and an increase in production costs. Therefore, a fine-tuning mechanism capable of achieving high-precision angle adjustment has become an indispensable part of semiconductor equipment.

[0003] Existing planar angle fine-tuning mechanisms usually include multiple rotating components and adjusting screws. Through precise control of these components, the angle fine-tuning of the wafer is achieved. However, these traditional fine-tuning mechanisms have some deficiencies. For example, during rotation, due to the friction and mechanical clearances between components, it is difficult to achieve high-precision angle control; at the same time, the adjustment process is complex, the operation is inconvenient, and the stability after adjustment is poor, being easily affected by external vibrations, resulting in angle deviation. In addition, in the prior art, the structural design of the adjustment mechanism is often relatively complex, increasing the manufacturing cost and maintenance difficulty. Summary of the Invention

[0004] (1) Technical Problems to be Solved

[0005] Aiming at the deficiencies of the prior art, the purpose of the utility model is to provide a planar angle fine-tuning mechanism, which solves the problems existing in the prior art. By setting a fixed plate, an outer rotating ring, an inner rotating ring, and corresponding adjusting screws, precise angle adjustment of the wafer is achieved. It has the characteristics of simple structure, convenient adjustment, and high stability, and can meet the requirements for high-precision angle adjustment in the process of semiconductor wafer processing, solving many problems in the prior art.

[0006] (2) Technical Solutions

[0007] To achieve the above purpose, the utility model provides the following technical solutions: A planar angle fine-tuning mechanism includes: a fixed plate, the inner edge of the fixed plate is movably connected with an outer rotating ring, and the inner edge of the outer rotating ring is movably connected with an inner rotating ring; outer rotating shaft sleeves are arranged on the front and rear sides of the outer rotating ring, an outer shaft pressing plate is arranged at the upper end of the outer rotating shaft sleeve, inner rotating shafts are arranged on the left and right sides of the inner rotating ring, inner shaft pressing plates are arranged at the upper ends of the inner rotating shafts, inner ring adjusting screws are arranged at the front and rear ends of the fixed plate, and outer ring adjusting screws are arranged at the left and right ends of the fixed plate.

[0008] Preferably, the fixed plate is integrally annular, and first pressing plate mounting grooves are arranged at its front and rear ends, and through clamping grooves are arranged at its left and right ends.

[0009] Preferably, the outer rotating ring is cross-shaped as a whole, with a circular hole in the middle, outer inclined surfaces at the left and right ends of the cross, and second pressing plate mounting grooves on both sides of the left side of the upper end of the outer rotating ring.

[0010] Preferably, the inner rotating ring is cylindrical as a whole, with inner inclined surfaces at its front and rear ends, and a workpiece clamping groove in the middle of the inner rotating ring.

[0011] Preferably, the inner ring adjusting screw penetrates into the inside of the outer rotating ring, and the inner ring adjusting screw fits with the inner inclined surface.

[0012] Preferably, the outer ring adjusting screw penetrates into the inside of the fixing plate, and the outer ring adjusting screw fits with the outer inclined surface.

[0013] Preferably, the two outer rotating shaft sleeves are in interference fit with the outer rotating ring and there is no relative rotation between them.

[0014] Preferably, the inner rotating shaft is in interference fit with the inner rotating ring and there is no relative rotation between them.

[0015] Preferably, the inclination angles of the outer inclined surface and the inner inclined surface are 45°.

[0016] (III) Advantageous Effects

[0017] The purpose of the present utility model is to provide a planar angle fine-tuning mechanism, which can achieve higher-precision angle adjustment during the processing of semiconductor wafers, has a simple structure, is convenient to operate, and has high stability and reliability. By improving the designs of key components such as the rotating ring, shaft sleeve, and adjusting screw, and optimizing the cooperation methods between components, the deficiencies of traditional fine-tuning mechanisms are effectively overcome, and the processing precision and production efficiency are improved. Description of the Drawings

[0018] Figure 1 It is the overall schematic diagram in the present invention.

[0019] Figure 2 It is the schematic diagram of the fixing plate in the present invention.

[0020] Figure 3 It is the schematic diagram of the outer rotating ring in the present invention.

[0021] Figure 4 It is the schematic diagram of the inner rotating ring in the present invention.

[0022] In the figure: 1 - fixed plate; 2 - outer rotating ring; 3 - inner rotating ring; 4 - outer rotating shaft sleeve; 5 - outer shaft pressing plate; 6 - inner rotating shaft; 7 - inner shaft pressing plate; 8 - inner ring adjusting screw; 9 - outer ring adjusting screw; 11 - first pressing plate installation groove; 12 - clamping groove; 21 - outer inclined surface; 22 - second pressing plate installation groove; 31 - inner inclined surface; 32 - workpiece clamping groove. Detailed implementation mode

[0023] The following will combine the attached drawings in the examples of the present utility model Figures 1 - 4 The technical solutions in the embodiments of the present utility model will be described clearly and completely. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present utility model.

[0024] A planar angle fine-tuning mechanism includes a fixed plate 1. The inner edge of the fixed plate 1 is movably connected to an outer rotating ring 2, and the inner edge of the outer rotating ring 2 is movably connected to an inner rotating ring 3. Outer rotating shaft sleeves 4 are arranged on the front and rear sides of the outer rotating ring 2, an outer shaft pressing plate 5 is arranged at the upper end of the outer rotating shaft sleeve 4, inner rotating shafts 6 are arranged on the left and right sides of the inner rotating ring 3, an inner shaft pressing plate 7 is arranged at the upper end of the inner rotating shaft 6, inner ring adjusting screws 8 are arranged at the front and rear ends of the fixed plate 1, and outer ring adjusting screws 9 are arranged at the left and right ends of the fixed plate 1.

[0025] The fixed plate 1 is the basic component of the entire fine-tuning mechanism, used to support and fix other components. Its inner edge is movably connected to the outer rotating ring, enabling the outer rotating ring to rotate on the fixed plate, thereby achieving angle adjustment. The outer rotating ring 2 is an intermediate connecting component, with its inner edge movably connected to the inner rotating ring and its outer edge movably connected to the fixed plate. The rotation of the outer rotating ring can achieve preliminary angle adjustment of the inner rotating ring, providing a basis for further precise adjustment. The inner rotating ring 3 is the component responsible for the final precise angle adjustment. Its inner edge can fix or clamp the workpiece to be processed. Through the movable connections with the outer rotating ring and the fixed plate, the inner rotating ring can be adjusted at a fine angle to achieve precise positioning of the workpiece. The outer rotating shaft sleeves 4 are arranged on the front and rear sides of the outer rotating ring, used to support and stabilize the rotation of the outer rotating ring. Through their cooperation with the outer shaft pressing plates, they ensure the smooth rotation of the outer rotating ring, reduce friction and mechanical clearances, and improve the accuracy and stability of angle adjustment. The outer shaft pressing plate 5 is arranged at the upper end of the outer rotating shaft sleeve, used to apply pressure to the outer rotating shaft sleeve and fix the position of the outer rotating ring. The function of the outer shaft pressing plate is to control the tightness of the outer rotating ring by adjusting the pressure to ensure that it does not shift during rotation. The inner rotating shafts 6 are arranged on the left and right sides of the inner rotating ring, used to support and stabilize the rotation of the inner rotating ring. Through their cooperation with the inner shaft pressing plates, they ensure the smooth rotation of the inner rotating ring and further improve the accuracy of angle adjustment. The inner shaft pressing plate 7 is arranged at the upper end of the inner rotating shaft, used to apply pressure to the inner rotating shaft and fix the position of the inner rotating ring. The function of the inner shaft pressing plate is to control the tightness of the inner rotating ring by adjusting the pressure to ensure its precise positioning during rotation. The inner ring adjusting screws 8 are arranged at the front and rear ends of the fixed plate, used to make fine angle adjustments to the inner rotating ring. By rotating the inner ring adjusting screws, pressure can be applied or released on the inner rotating ring to achieve precise angle adjustment of the inner rotating ring. The outer ring adjusting screws 9 are arranged at the left and right ends of the fixed plate, used to make angle adjustments to the outer rotating ring. By rotating the outer ring adjusting screws, pressure can be applied or released on the outer rotating ring, thereby achieving angle adjustment of the outer rotating ring and further cooperating with the inner rotating ring to complete precise angle adjustment.

[0026] The fixed plate 1 is integrally circular, with first pressing plate mounting grooves 11 provided at its front and rear ends and through clamping grooves 12 provided at its left and right ends. The fixed plate is integrally circular and is the basic component of the entire fine-tuning mechanism, used to support and fix other components. Its circular structure helps to provide stability and symmetry, ensuring that each rotating component can move freely in the same plane. The first pressing plate mounting grooves 11 are provided at the front and rear ends of the fixed plate 1. This groove is used to mount and fix the outer shaft pressing plate 5. The clamping grooves 12 that penetrate are provided at the left and right ends of the fixed plate 11. The clamping grooves are used to fix and position the raised portions with inclined surfaces on both sides of the outer rotating ring 2 to ensure the stability of the rotating ring during adjustment.

[0027] The outer rotating ring 2 is cross-shaped as a whole, with a circular hole in the middle. Outer inclined surfaces 21 are provided at the left and right ends of the cross shape. Second pressure plate mounting grooves 22 are provided on both sides of the left side of the upper end of the outer rotating ring 2. The outer rotating ring 2 is designed to be cross-shaped as a whole. This design can provide a large contact surface and stability, which helps to precisely control the angle of the rotating ring. In addition, the cross-shaped structure can make the rotating ring more flexible during adjustment. The circular hole in the middle is used for movable connection with the inner rotating ring to ensure that the inner rotating ring can freely rotate inside the outer rotating ring. The outer inclined surfaces 21 provided at the left and right ends of the cross shape are used to cooperate with the outer ring adjusting screw 9, and the precise angle adjustment of the outer rotating ring is achieved by adjusting the pressure of the screw. Second pressure plate mounting grooves 22 are provided on both sides of the left side of the upper end of the outer rotating ring 2, which are used for installing and fixing the pressure plate, so as to apply pressure to the outer rotating ring and maintain its stability.

[0028] The inner rotating ring 3 is cylindrical as a whole, with inner inclined surfaces 31 provided at its front and rear ends, and a workpiece clamping groove 32 is provided in the middle of the inner rotating ring 3. The inner rotating ring 3 is designed to be cylindrical as a whole. This design helps to provide uniform rotation characteristics and stability, ensuring that the inner rotating ring can maintain an accurate angle during adjustment. The inner inclined surfaces 31 provided at the front and rear ends are used to cooperate with the inner ring adjusting screw 8, and the precise angle adjustment of the inner rotating ring is achieved by adjusting the pressure of the screw 8. The workpiece clamping groove 32 provided in the middle is used for fixing and positioning the workpiece to be processed. Through the clamping groove design, it can ensure the stable position of the workpiece during fine adjustment without moving.

[0029] The inner ring adjusting screw 8 penetrates into the inside of the outer rotating ring 2, and the inner ring adjusting screw 8 is in contact with the inner inclined surface 31. The inner ring adjusting screw 8 controls the precise angle of the inner rotating ring by rotating to adjust its contact pressure with the inner inclined surface 31. Specifically, by applying or reducing pressure, the inner ring adjusting screw can finely adjust the rotation angle of the inner rotating ring, enabling the inner rotating ring to perform high-precision angle adjustment within a very small range.

[0030] The outer ring adjusting screw 9 penetrates into the inside of the fixing plate 1, and the outer ring adjusting screw 9 is in contact with the outer inclined surface 21. The outer ring adjusting screw 9 controls the precise angle of the outer rotating ring 2 by rotating to adjust its contact pressure with the outer inclined surface 21. The outer ring adjusting screw adjusts the rotation angle of the outer rotating ring, enabling the outer rotating ring to perform angle adjustment within a large range, providing a basis for the precise fine adjustment of the inner rotating ring.

[0031] Through the design and cooperation of the above components, the planar angle fine adjustment mechanism can achieve high-precision angle adjustment, ensuring that during the semiconductor wafer processing, the workpiece can be accurately positioned and adjusted to meet the requirements of high-precision processing. The combination of these designs helps to improve the processing efficiency and product quality.

[0032] Working principle:

[0033] Rotation of the outer rotating ring 2: The outer rotating ring is connected to the fixed plate 1 through the outer rotating shaft sleeve 4. An interference fit is provided between the two outer rotating shaft sleeves and the outer rotating ring to prevent relative rotation and ensure stability. By adjusting the outer ring adjusting screw 9, pressure on the outer inclined surface 21 can be applied or released, thereby adjusting the angle of the outer rotating ring. The outer ring adjusting screw penetrates through the interior of the fixed plate and fits against the outer inclined surface of the outer rotating ring, and the angle adjustment is achieved by rotating the screw.

[0034] Rotation of the inner rotating ring 3: The inner rotating ring is connected to the outer rotating ring 2 through the inner rotating shaft 6. An interference fit is provided between the inner rotating shaft and the inner rotating ring to prevent relative rotation and ensure stability. By adjusting the inner ring adjusting screw 8, pressure on the inner inclined surface 31 can be applied or released, thereby adjusting the angle of the inner rotating ring. The inner ring adjusting screw penetrates into the interior of the outer rotating ring and fits against the inner inclined surface of the inner rotating ring, and the angle adjustment is achieved by rotating the screw.

[0035] Preliminary adjustment: First, the outer rotating ring 2 is subjected to preliminary angle adjustment through the outer ring adjusting screw 9. The pressure applied by the outer ring adjusting screw enables the outer rotating ring to perform a rough angle adjustment within a large range, ensuring the general direction and position of the workpiece.

[0036] Precise fine-tuning: Then, the inner rotating ring 3 is subjected to precise fine-tuning through the inner ring adjusting screw 8. The pressure applied by the inner ring adjusting screw enables the inner rotating ring to perform a fine angle adjustment within a small range, ensuring the precise positioning and angle control of the workpiece.

[0037] Multi-level adjustment: Through the multi-level adjustment of the outer rotating ring and the inner rotating ring, both a large-range preliminary angle adjustment can be achieved and high-precision fine adjustment can be carried out, meeting the strict requirements for angle control during the semiconductor wafer processing.

[0038] This planar angle fine-tuning mechanism is mainly used in the semiconductor wafer processing. Through the above structure and adjustment method, high-precision angle adjustment of the wafer can be achieved, ensuring the processing accuracy of key process steps such as lithography, etching, and deposition, and improving the quality and production efficiency of the final product.

[0039] Although the embodiments of the present invention have been shown and described, for those of ordinary skill in the art, it can be understood that various changes, modifications, substitutions, and variations can be made to these embodiments without departing from the principles and spirit of the present invention. The scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A plane angle fine-tuning mechanism, characterized in that: include: A fixed plate (1), wherein the inner edge of the fixed plate (1) is movably connected to an outer rotating ring (2), and the inner edge of the outer rotating ring (2) is movably connected to an inner rotating ring (3); outer rotating sleeves (4) are provided on the front and rear sides of the outer rotating ring (2), and an outer shaft pressure plate (5) is provided on the upper end of the outer rotating sleeve (4); inner rotating shafts (6) are provided on the left and right sides of the inner rotating ring (3), and an inner shaft pressure plate (7) is provided on the upper end of the inner rotating shaft (6); inner ring adjustment screws (8) are provided on the front and rear ends of the fixed plate (1), and outer ring adjustment screws (9) are provided on the left and right ends of the fixed plate (1).

2. A plane angle fine-tuning mechanism according to claim 1, characterized in that: The fixing plate (1) is in the shape of a circular ring as a whole, and is provided with first pressing plate mounting grooves (11) at its front and rear ends, and penetrating clamping grooves (12) at its left and right ends.

3. A plane angle fine-tuning mechanism according to claim 1, characterized in that: The outer rotating ring (2) is in the shape of a cross as a whole, with a circular hole in the middle, outer inclined surfaces (21) at the left and right ends of the cross, and second pressure plate mounting grooves (22) are provided on both sides of the left side of the upper end of the outer rotating ring (2).

4. A plane angle fine-tuning mechanism according to claim 1, characterized in that: The inner rotating ring (3) is cylindrical in shape as a whole, and inner inclined surfaces (31) are arranged at the front and rear ends thereof, and a workpiece clamping groove (32) is arranged in the middle of the inner rotating ring (3).

5. The plane angle fine-tuning mechanism according to claim 1, characterized in that: The inner ring adjusting screw (8) penetrates into the interior of the outer rotating ring (2), and the inner ring adjusting screw (8) is in contact with the inner inclined surface (31).

6. A plane angle fine-tuning mechanism according to claim 1, characterized in that: The outer ring adjusting screw (9) passes through the interior of the fixing plate (1), and the outer ring adjusting screw (9) is in contact with the outer inclined surface (21).

7. A plane angle fine-tuning mechanism according to claim 1, characterized in that: The two outer rotating sleeves (4) are interference fit with the outer rotating ring (2) and do not rotate relative to each other.

8. The plane angle fine-tuning mechanism according to claim 1, characterized in that: The inner rotating shaft (6) and the inner rotating ring (3) are interference fit and do not rotate relative to each other.

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