Rotary carrying table and machining equipment

Abstract

The utility model discloses a rotating carrying table and machining equipment, the rotating carrying table comprises a base, a leveling mechanism, a rotating mechanism and a mounting seat, the rotating mechanism comprises a rotating assembly and a rotating driving assembly which are arranged on the base, the rotating assembly comprises a rotating part, and the rotating driving assembly is used for driving the rotating part to rotate. The mounting seat is arranged on the rotating part and is used for mounting a workpiece; the leveling mechanism comprises a plurality of leveling pieces which are arranged at intervals, the leveling pieces are used for supporting the base, and the distance between the ends, away from the base, of the leveling pieces and the base can be adjusted so as to control the overall levelness of the rotary carrying table. Even if a rotating mechanism with low precision is adopted, the leveling mechanism can be used for compensating the deviation in levelness, so that the equipment cost is reduced.

Description

Technical Field

[0001] This application relates to the field of moving platforms, and particularly to a rotating platform and a processing device. Background Art

[0002] In the process of semiconductor processing, the vast majority of workpieces need to adjust their positions through a rotating shaft. After the rotating shaft rotates, the levelness of the platform will change, specifically resulting in a certain angle of inclination. The wafer (workpiece) being in an inclined state is not conducive to subsequent processing and is prone to processing errors. Currently, it is relatively common to use a direct drive rotary motor with high precision (commonly known as a DD motor) or an ultra-high precision bearing to drive or transmit the rotating platform to meet the accuracy requirements of levelness. However, using the above methods will increase the manufacturing cost of the wafer processing equipment. Summary of the Utility Model

[0003] This application provides a rotating platform and a processing device, which can reduce the manufacturing cost of the wafer processing equipment.

[0004] This application provides a rotating platform, including:

[0005] A base;

[0006] A leveling mechanism, including a plurality of leveling members spaced apart from each other. The leveling members are used to support the base, and the distance between the end of the leveling member away from the base and the base is adjustable;

[0007] A rotating mechanism, including a rotating component and a rotation driving component disposed on the base. The rotating component includes a rotating part, and the rotation driving component is used to drive the rotating part to rotate;

[0008] A mounting seat, disposed on the rotating part, for mounting a workpiece.

[0009] In some embodiments, the leveling member includes a lead screw rotatably connected to the base. The leveling mechanism further includes a first driving component for driving the leveling member to rotate. The leveling mechanism includes a plurality of the first driving components, and the first driving components are in one-to-one driving connection with the lead screws; the first driving component further includes a first motor drivingly connected to the lead screw.

[0010] In some embodiments, the leveling member includes a micro-displacement device disposed on the base.

[0011] In some embodiments, two of the leveling members are disposed on one side edge close to the base, the rotating component is disposed on the other side edge opposite to the leveling member, and the supporting member is located below the rotating component.

[0012] In some embodiments, the rotation driving assembly includes a second motor and a second transmission assembly connecting the second motor and the rotating part, and the second motor is disposed between the two leveling members.

[0013] In some embodiments, the second transmission assembly includes a first synchronous pulley disposed on the rotating part, a second synchronous pulley disposed on the rotating shaft of the second motor, and a first synchronous belt connecting the first synchronous pulley and the second synchronous pulley.

[0014] In some embodiments, the rotating stage further includes a guide pulley rotatably disposed on the base, and the position of the guide pulley is adjustable for adjusting the tension of the first synchronous belt.

[0015] In some embodiments, the mounting seat is provided with a mounting cavity for accommodating a carrier plate and an air passage communicating with the mounting cavity. The inner wall of the mounting cavity is provided with a first groove, and the first groove can form a negative pressure cavity with the outer wall of the carrier plate. The upper surface of the carrier plate is provided with a second groove, and the side wall of the mounting seat is further provided with a third groove for communicating the first groove and the second groove.

[0016] In some embodiments, a limiting assembly is further disposed on the rotating part, and the limiting assembly is adapted to the mounting seat for restricting the rotation of the mounting seat.

[0017] In some embodiments, an air bearing is further disposed at the lower end of the leveling member, and a light emitting unit is further disposed on the base, and the light irradiation direction of the light emitting unit is upward.

[0018] The present application also provides a processing device, including the above-mentioned rotating stage and a machine table for mounting the rotating stage.

[0019] The rotating stage in the present application includes a base, a leveling mechanism, a rotating mechanism and a mounting seat. The rotating mechanism includes a rotating assembly disposed on the base and a rotation driving assembly. The rotating assembly includes a rotating part, and the rotation driving assembly is used for driving the rotating part to rotate. The mounting seat is disposed on the rotating part for mounting a workpiece. The leveling mechanism includes a plurality of leveling members spaced apart from each other, and the leveling members are used for supporting the base. The distance between the end of the leveling member away from the base and the base is adjustable to control the overall levelness of the rotating stage. Even if a rotating mechanism with slightly lower precision is adopted, the leveling mechanism can be used to compensate for the deviation in levelness to reduce the equipment cost. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 is an exploded view of a rotating stage in an embodiment of the present application;

[0021] Figure 2 is a structural schematic diagram of a rotating stage in an embodiment of the present application;

[0022] Figure 3 For Figure 1 Schematic diagram of the structure of another perspective of the rotating stage in the embodiment;

[0023] Figure 4 Schematic diagram of the structure of the mounting base in an embodiment of the present application.

[0024] Label description:

[0025] 10. Base; 11. Support member; 12. Air bearing; 20. Leveling mechanism; 21. Leveling member; 22. First motor; 23. First transmission assembly; 30. Rotating mechanism; 31. First synchronous pulley; 311. Sunk groove; 312. Limiting groove; 313. Avoidance hole; 32. Second motor; 33. Second synchronous pulley; 34. Synchronous belt; 35. Rotating assembly; 36. Mounting base; 361. Mounting cavity; 362. First groove; 363. Third groove; 364. Round head protrusion; 365. Limiting block; 37. Magnet; 41. Guide wheel; 42. Mounting block; 50. Carrier plate; 51. Second groove.

[0026] The realization of the purpose, functional features and advantages of the present application will be further described in conjunction with the embodiments with reference to the accompanying drawings. Specific embodiments

[0027] A clear and complete description will be given. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present application without creative efforts shall fall within the protection scope of the present application.

[0028] It should be noted that all directional indications such as up, down, left, right, front, back... in the embodiments of the present application are only used to explain the relative position relationship and movement conditions between components in a specific posture as shown in the accompanying drawings. If the specific posture changes, the directional indications will also change accordingly.

[0029] It should also be noted that when an element is referred to as "fixed to" or "disposed on" another element, it can be directly on the other element or there may be an intermediate element at the same time. When an element is referred to as "connected" to another element, it can be directly connected to the other element or there may be an intermediate element at the same time.

[0030] In addition, the descriptions involving "first", "second", etc. in this application are for descriptive purposes only, and should not be construed as indicating or implying their relative importance or implicitly specifying the quantity of the indicated technical features. Thus, the features defined with "first" and "second" may explicitly or implicitly include at least one such feature. In addition, the technical solutions between various embodiments may be combined with each other, but it must be based on the ability of those of ordinary skill in the art to implement. When the combination of technical solutions results in contradictions or cannot be implemented, it should be considered that such a combination of technical solutions does not exist and is not within the scope of protection required by this application.

[0031] This application provides a rotary stage. Referring to Figures 1 to 4 , the rotary stage is used to mount a carrier plate 50 and includes: a base 10; a leveling mechanism 20 including a plurality of leveling members 21 spaced apart from each other. The leveling members 21 are used to support the base 10, and the distance between the end of the leveling member 21 away from the base and the base 10 is adjustable; a rotating mechanism 30 including a rotating assembly 35 provided on the base 10 and a rotation driving assembly. The rotating assembly 35 includes a rotating part, and the rotation driving assembly is used to drive the rotating part to rotate. A mounting seat 36 is provided on the rotating part for mounting a workpiece. In the embodiments of this application, the rotating assembly 35 may adopt a crossed roller bearing or a structure of an annular slide rail and an arc-shaped slider. When using a bearing, the inner ring of the bearing is provided on the base 10, and the outer ring constitutes the rotating part.

[0032] The leveling member 21 can adopt a mechanical adjustment method or a microelectric adjustment method. When adopting mechanical adjustment, the support length of the leveling member 21 can be adjusted by motor drive or manually for leveling. When adopting microelectric adjustment, the leveling member can be adjusted by a microdisplacement device, specifically, a piezoelectric ceramic microdisplacement device, an electromagnetic drive microdisplacement device, etc. After loading the microdisplacement device, the displacement distance can be controlled according to the voltage magnitude, thereby performing leveling. Since each leveling member 21 is independently adjustable, even if a rotating mechanism 30 with slightly lower precision is adopted, the leveling mechanism 20 can be used to compensate for the deviation in levelness to reduce the equipment cost.

[0033] In some embodiments, referring to Figures 1 to 4, the leveling member 21 includes a lead screw. The leveling mechanism 20 includes a plurality of first driving components, and the first driving components are in one-to-one driving connection with the lead screw. The first driving component further includes a first motor 22 disposed on one side of the lead screw, and a first transmission component 23 for connecting the first motor 22 and the lead screw. In this embodiment, through holes are provided on the base 10, and nuts adapted to the lead screw are provided at the through holes. The lead screw passes through the through holes and is rotatably connected to the base 10 through the nuts. The first motor 22 and the lead screw can be driven by a belt pulley drive or a gear drive. The above-mentioned first transmission component 23 can be two gears respectively disposed on the upper end of the lead screw and the rotating shaft of the first motor 22, or two synchronous pulleys. The two gears mesh with each other to achieve transmission. The two synchronous pulleys are connected by a first synchronous belt. When the first motor 22 rotates, it can drive the lead screw to rotate, and the lead screw can also move along its own length direction. Since the deflection of the rotating stage in the horizontal direction after rotation is very small, the moving range of the lead screw is also very small, generally within 1 mm. Such a small movement will not affect the cooperation between the first driving component and the first transmission component 23. Of course, the above-mentioned lead screw can also be replaced by a screw rod. The lead screw has higher precision and is more suitable for high-precision leveling.

[0034] In some embodiments, referring to Figures 1 to 4 , the rotating stage includes two leveling members 21 arranged at intervals. A support member 11 is provided at the bottom of the base 10. The leveling member 21 and the support member 11 jointly support the base 10; alternatively, the base 10 is only supported by a plurality of leveling members 21 together. In this embodiment, three leveling members 21 can be provided for three-point support. The number of leveling members 21 is not limited to three, and four leveling members 21 can also be provided for support. Of course, two leveling members 21 can also be provided for support, and a support member 11 is provided at the bottom of the base 10 to assist in supporting. The same three-point support effect can be achieved. Thus, during the leveling operation, only the lengths of the lower segments of the two leveling members 21 need to be adjusted, with lower cost and higher efficiency.

[0035] In some embodiments, referring to Figures 1 to 4 , the two leveling members 21 are arranged close to one side edge of the base 10, the rotating assembly 35 is arranged close to the other side edge opposite to the leveling member 21, and the support member 11 is located below the rotating assembly 35. The rotating assembly 35 is spaced apart from the leveling mechanism 20. In this way, the rotating assembly 35 is located at one end of the base 10, and the leveling mechanism 20 is located at the other end of the base, which can balance the center of gravity of the rotating stage.

[0036] Further, the rotation driving assembly includes a second motor 32 and a second transmission assembly connecting the second motor 32 and the rotating part. The second motor 32 is disposed between the two leveling members. The rotation assembly 35 is spaced apart from the first motor 22 and the second motor 32 respectively, which can balance the center of gravity of the rotating stage. When the first motor 22 and the second motor 32 are started, the vibration caused by rotation and transmission will be less transmitted to the rotation assembly 35, avoiding affecting the accuracy. At the same time, the rotation mechanism is disposed on one side of the mounting base 36, avoiding stacking in the vertical direction, and more space can be reserved in the vertical direction below the base 10 for installing other components, such as a CCD camera, etc.

[0037] In some embodiments, the second transmission assembly includes a first synchronous pulley 31 disposed on the rotating part, a second synchronous pulley 33 disposed on the rotating shaft of the second motor 32, and a first synchronous belt 34 connecting the first synchronous pulley 31 and the second synchronous pulley 33. The rotation of the rotating part can be driven by connecting the two synchronous pulleys through the first synchronous belt 34. Of course, the above belt and pulley mechanism can also be replaced by a gear set or a worm and worm gear.

[0038] Further, the rotating stage further includes a guide wheel 41 rotatably disposed on the base 10. The position of the guide wheel 41 is adjustable and is used to adjust the tension of the first synchronous belt 34. The guide wheel 41 is rotatably disposed on the mounting block 42. The mounting block 42 is provided with a strip-shaped hole, and the mounting block 42 is fixed on the base 10 by a bolt passing through the strip-shaped hole. The provision of the strip-shaped hole enables the position of the guide wheel 41 to be adjusted. Specifically, a pair of guide wheels 41 can be provided and are respectively arranged at two opposite sections of the first synchronous belt. After the first synchronous belt 34 is assembled with the first synchronous pulley 31 and the second synchronous pulley 33, there is a certain assembly gap between the pulley and the belt. By adjusting the position of the guide wheels 41, the two guide wheels 41 are brought closer to tension the first synchronous belt, so as to reduce the transmission error.

[0039] In some embodiments, refer to Figures 1 to 4, the rotating stage further includes a mounting seat 36 provided on the rotating part. The mounting seat 36 is provided with a mounting cavity 361 for accommodating the carrier plate 50 and an air path communicating with the mounting cavity 361. The inner wall of the mounting cavity 361 is provided with a first groove 362, and the first groove 362 can form a negative pressure cavity with the outer wall of the carrier plate 50. Further, the upper surface of the carrier plate 50 is provided with a second groove 51, and the side wall of the mounting seat 36 is further provided with a third groove 363 for communicating the first groove 362 and the second groove 51. The above air path can be connected to an external negative pressure generator through a pipeline, and the above negative pressure generator can be a suction pump. Thus, negative pressure can be formed in the negative pressure cavity to adsorb the carrier plate 50 on the mounting seat 36. Due to the existence of the third groove 363, negative pressure can also be formed in the second groove 51. When a wafer (workpiece) is placed on the carrier plate 50, the wafer closes the top of the first groove 362, and the negative pressure can adsorb and fix the wafer. The above setting of the mounting seat 36 only requires one negative pressure generator to adsorb and fix the carrier plate 50 and the wafer at the same time, with a simple structure and lower cost, and the carrier plate 50 and the mounting seat 36 can be quickly disassembled and assembled.

[0040] In some embodiments, referring to Figures 1 to 4 , a limiting component is further provided on the rotating part. The limiting component is adapted to the mounting seat 36 and is used to limit the rotation of the mounting seat 36. In this embodiment, the rotating component 35 can adopt a crossed roller bearing or a structure of an annular slide rail and an arc-shaped slider. When using a bearing, the inner ring of the bearing is arranged on the base 10, and the outer ring forms the rotating part. The first synchronous pulley 31 is fixedly connected to the outer ring. A sink 311 for mounting the above mounting seat 36 can be arranged on the upper surface of the first synchronous pulley 31. The inner wall of the sink 311 is provided with a limiting notch, and a limiting block corresponding to the limiting notch is arranged on the outer wall of the mounting seat 36. An elastic limiting member is further arranged on the inner wall of the limiting notch to abut against the limiting block. In addition, a round head protrusion 364 is arranged on the side of the mounting seat 36 opposite to the mounting block 42, and a V-shaped groove corresponding to the limiting protrusion is arranged on the inner wall of the sink 311 to complete centering and limiting. In this embodiment, the above limiting block, round head protrusion 364 and the side wall of the mounting seat 36 can form three-point positioning with the sink 311. It should be noted that even after three-point positioning is completed, there may still be a certain movement gap between the mounting seat 36 and the sink 311. A negative pressure groove communicating with the above air path can be arranged at the bottom of the mounting seat 36 to further adsorb and fix the mounting seat 36. Of course, magnets 37 can also be arranged on the mounting seat 36 and / or the first synchronous pulley 31 to adsorb each other to achieve complete fixation.

[0041] Further, the mounting base 36 may be an annular base, the mounting cavity 361 may be a counterbore provided on the annular base, the first groove 362 may be an annular groove provided on the bottom surface of the counterbore, and the negative pressure groove may also be an annular groove. In addition, the first synchronous pulley 31 is provided with some avoidance holes 313 for avoiding the connectors provided on the mounting base 36, and the connectors are used to communicate with the pipelines connected to an external negative pressure generator. In addition, the avoidance holes 313 can also be used for a human hand or a manipulator to extend into to grasp the edge of the mounting base 36 so as to take out the mounting base 36.

[0042] In some embodiments, referring to Figures 1 to 4 , an air bearing 12 is further provided at the lower end of the leveling member 21, and a light emitting unit is further provided on the base 10, and the light irradiation direction of the light emitting unit is upward. The air bearing 12 is used to connect with the machine table. The light emitted by the light emitting unit can pass through the carrier plate 50 to reveal the contour of the wafer for subsequent visual positioning of the wafer. Specifically, 4 LED lamp beads can be used to perform backlighting on the back of the workpiece for contour recognition of the workpiece. The 4 LED lamp beads and the lamp holder are embedded inside the base 10 and are located below the carrier plate 50, and are evenly distributed below the edge of the workpiece. When the workpiece is placed on the carrier table, the lamp beads are lit, and an industrial camera, visual algorithm and other means are used above to collect the contour of the workpiece to complete the initial positioning of the workpiece.

[0043] In this embodiment, the main function of the leveling mechanism 20 is to adjust the levelness of the workpiece. A driving structure in which a high-rigidity belt drives a precision ball screw to move is adopted. The precision ball screw and the bottom air bearing 12 are combined to form a simple and precise structure, realizing the fine adjustment function in the vertical direction without restricting the freedom degree of the horizontal plane. In the embodiment where the support member 11 is used for support, the air bearing 12 is also provided at the lower end of the support member 11.

[0044] This application also proposes a processing device, referring to Figures 1 to 4 , the processing device includes the above-mentioned rotating stage and a machine table for mounting the rotating stage, and the machine table may be a marble platform.

[0045] In the embodiments of this application, the working principles of the rotating stage and the processing device are as follows:

[0046] The overall design of the rotating stage is that the motor drives the large turntable (the first synchronous pulley 31) through synchronous belt transmission to move at a low speed, smoothly and with high precision. The workpiece is adsorbed on the carrier plate 50, and at the same time, the carrier plate 50 itself is also fixed by vacuum adsorption. When the carrier plate 50 is damaged, only the vacuum needs to be turned off, and then the glass carrier plate 50 can be replaced, which greatly shortens the replacement time of the carrier plate 50 and reduces the difficulty of replacing the carrier plate 50. In addition, with the assistance of the leveling mechanism 20, after the carrier plate 50 rotates to any angle, when the parallelism of the workpiece on the carrier plate 50 relative to the marble platform changes, the leveling mechanism 20 can automatically and quickly correct the parallelism. The main function of the leveling mechanism 20 is to adjust the level of the workpiece. It adopts a driving structure in which a high-rigidity belt drives a precision ball screw to move. The precision ball screw is combined with the bottom air-floating bearing 12 to form a simple and precise structure, realizing the fine-tuning function in the vertical direction without restricting the freedom degree of the horizontal plane.

[0047] The above are only partial or preferred embodiments of the present application. Neither the text nor the drawings can limit the scope of protection of the present application. Any equivalent structural transformation made by using the content of the specification and drawings of the present application under the overall concept of the present application, or any direct / indirect application in other related technical fields is included in the scope of protection of the present application.

Claims

1. A rotating stage, characterized in that: include: Pedestal; A leveling mechanism, comprising a plurality of leveling members spaced apart from each other, the leveling members being used to support the base, and the distance between the end of the leveling member away from the base and the base being adjustable; The rotating mechanism comprises a rotating assembly and a rotating drive assembly provided on the base, wherein the rotating assembly comprises a rotating part, and the rotating drive assembly is used to drive the rotating part to rotate; The mounting seat is arranged on the rotating part and is used for mounting the workpiece.

2. The rotating stage according to claim 1, characterized in that: The leveling member includes a screw rod rotatably connected to the base, and the leveling mechanism also includes a first driving component for driving the leveling member to rotate. The leveling mechanism includes a plurality of the first driving components, and the first driving components are drive-connected to the screw rod in a one-to-one correspondence; the first driving component also includes a first motor drive-connected to the screw rod.

3. The rotating stage according to claim 1, characterized in that: The leveling member includes a micro-displacer arranged on the base.

4. The rotating stage according to any one of claims 1 to 3, characterized in that: The rotating platform comprises two leveling members which are arranged at intervals, a supporting member is arranged at the bottom of the base, and the leveling member and the supporting member jointly support the base.

5. The rotating stage according to claim 4, characterized in that: The two leveling members are arranged close to one side edge of the base, the rotating assembly is arranged close to the other side edge opposite to the leveling members, and the supporting member is located below the rotating assembly.

6. The rotating stage according to claim 5, characterized in that: The rotary drive assembly includes a second motor and a second transmission assembly connecting the second motor and the rotating part, and the second motor is arranged between the two leveling members.

7. The rotating stage according to claim 6, characterized in that: The second transmission assembly includes a first synchronous wheel provided on the rotating part, a second synchronous wheel provided on the rotating shaft of the second motor, and a first synchronous belt connecting the first synchronous wheel and the second synchronous wheel; The rotating platform also includes a guide wheel rotatably arranged on the base, and the position of the guide wheel is adjustable for adjusting the tension of the first synchronous belt.

8. The rotating stage according to claim 1, characterized in that: The mounting seat is provided with a mounting cavity for accommodating a carrier board, and an air path connected to the mounting cavity, the inner wall of the mounting cavity is provided with a first groove, the first groove can form a negative pressure cavity with the outer wall of the carrier board, the upper surface of the carrier board is provided with a second groove, and the side wall of the mounting seat is also provided with a third groove for connecting the first groove and the second groove.

9. The rotating stage according to claim 1, characterized in that: The rotating part is also provided with a limiting component, which is adapted to the mounting seat and is used to limit the rotation of the mounting seat.

10. The rotating stage according to claim 1, characterized in that: An air bearing is also arranged at the lower end of the leveling member, and a light emitting unit is also arranged on the base, wherein the light irradiation direction of the light emitting unit is arranged upward.

11. A processing equipment, characterized in that: The invention comprises the rotating stage according to any one of claims 1 to 10 and a machine for installing the rotating stage.

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