Filtering device for producing silicon carbide polishing solution

Abstract

The utility model belongs to the technical field of filtering equipment, and particularly relates to a filtering device for silicon carbide polishing solution production, which comprises a fixing base and a fixing support, the fixing support is of a T-shaped structure and is welded on the surface of the fixing base, and a first filtering barrel and a second filtering barrel are mounted on the surface of the fixing base. The first filtering barrel and the second filtering barrel are symmetrically arranged, hydraulic rods are installed at the two ends of the fixing support, pressing discs are connected to the ends of the hydraulic rods, filtering nets are installed at the bottoms of inner cavities of the first filtering barrel and the second filtering barrel, and a feeding main pipe is arranged on the surface of the fixing support; according to the silicon carbide polishing liquid filtering device, the two filtering barrels are arranged, alternate feeding can be achieved, silicon carbide polishing liquid can be alternately filtered, meanwhile, pressure is applied to the silicon carbide polishing liquid in the filtering barrels during filtering, the silicon carbide polishing liquid can rapidly penetrate through the filtering nets, and the filtering efficiency of the silicon carbide polishing liquid is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of filtering equipment, in particular to a filtering device for the production of silicon carbide polishing liquid. Background Technique

[0002] With the development of high-tech enterprises such as semiconductors, new energy, high-end intelligent manufacturing, 5G information technology, and AI artificial intelligence, the semiconductor industry has increasingly become a new popular industry. The semiconductor market has become booming, the quantity demand for semiconductor materials is increasing, and the quality requirement is also getting higher. Semiconductor wafers need to be polished by silicon carbide polishing liquid during the production process. When producing silicon carbide polishing liquid, the acidity and alkalinity need to be precisely controlled to reduce the corrosion of wafers.

[0003] Currently, the invention patent with the publication number of CN220968380U discloses a filtering device for silicon carbide polishing liquid. The filtering device for silicon carbide polishing liquid provided by this application includes: a liquid inlet pipe; a liquid outlet pipe corresponding to the liquid inlet pipe; a plurality of filtering parts arranged between the liquid inlet pipe and the liquid outlet pipe, and the liquid in the liquid inlet pipe flows through one of the filtering parts and then enters the liquid outlet pipe; a switching mechanism configured to replace the next filtering part to the position of the previous filtering part. Through the switching mechanism, after the filtering part filters the solution for a predetermined time, the switching mechanism automatically replaces the next filtering part to the position of the previous filtering part, so that the filtering part always maintains a stable filtering effect, which is beneficial to continuously filter the solution.

[0004] During the use of the existing filtering device for the production of silicon carbide polishing liquid, the silicon carbide polishing liquid is provided with forward power by a pumping device, so that the silicon carbide polishing liquid passes through the filter screen. The silicon carbide polishing liquid is a viscous liquid, and the speed at which the silicon carbide polishing liquid passes through the filter screen during filtration is slow, which will affect the filtration efficiency of the silicon carbide polishing liquid. To solve the above problems, a filtering device for the production of silicon carbide polishing liquid is proposed in this application. Content of the Utility Model

[0005] (I) Purpose of the Utility Model

[0006] To solve the technical problems in the background technique, the utility model proposes a filtering device for the production of silicon carbide polishing liquid. By setting two groups of filtering barrels, alternate feeding can be realized, and alternate filtration of the silicon carbide polishing liquid can be achieved. At the same time, pressure is applied to the silicon carbide polishing liquid in the filtering barrel during filtration, so that the silicon carbide polishing liquid can quickly pass through the filter screen to improve the filtration efficiency of the silicon carbide polishing liquid and solve the problems proposed in the background technique.

[0007] (II) Technical Solution

[0008] To solve the above technical problems, the utility model provides a filtering device for the production of silicon carbide polishing liquid, which includes a fixed base and a fixed bracket. The fixed bracket is in a T-shaped structure and is welded to the surface of the fixed base. A first filtering barrel and a second filtering barrel are installed on the surface of the fixed base, and the first filtering barrel and the second filtering barrel are symmetrically arranged.

[0009] Hydraulic rods are installed at both ends of the fixed bracket, and pressing plates are connected to the ends of the hydraulic rods. Filter meshes are installed at the bottom of the inner cavities of the first filtering barrel and the second filtering barrel.

[0010] A main feed pipe is provided on the surface of the fixed bracket. The end of the main feed pipe is symmetrically connected to guide feed branch pipes through a tee pipe. The ends of the guide feed branch pipes are all connected to spiral telescopic connecting pipes, and the ends of the spiral telescopic connecting pipes far from the guide feed branch pipes are conductively connected to the pressing plates.

[0011] Preferably, a first feed electromagnetic valve is installed on the guide feed branch pipe connected to the first filtering barrel.

[0012] Preferably, a second feed electromagnetic valve is installed on the guide feed branch pipe connected to the second filtering barrel.

[0013] Preferably, a sealing ring is sleeved on the outer wall surface of the pressing plate, and the outer wall of the sealing ring abuts against the inner wall surfaces of the first filtering barrel and the second filtering barrel respectively.

[0014] Preferably, mounting holes are penetrated through the surface of the pressing plate, and breathing valves are installed in the inner cavities of the mounting holes.

[0015] Preferably, discharge pipes are conductively connected to the bottoms of the side walls of the first filtering barrel and the second filtering barrel, and the filter mesh is located above the discharge pipes.

[0016] Preferably, discharge electromagnetic valves are installed on the discharge pipes.

[0017] The above technical solution of the utility model has the following beneficial technical effects.

[0018] In the utility model, by setting two groups of filtering barrels, alternate feeding can be realized, and alternate filtering of the silicon carbide polishing liquid can be achieved. At the same time, pressure is applied to the silicon carbide polishing liquid in the filtering barrel during filtering, so that the silicon carbide polishing liquid can quickly pass through the filter mesh, thereby improving the filtering efficiency of the silicon carbide polishing liquid.

[0019] In the utility model, when the hydraulic rods contract, the pressing plates can be respectively lifted out of the first filtering barrel and the second filtering barrel, which is convenient for cleaning the impurities on the inner walls of the first filtering barrel, the second filtering barrel and the surface of the filter mesh, and the use is more convenient. Description of the Drawings

[0020] Figure 1This is the overall structural schematic diagram of a filtering device for the production of silicon carbide polishing liquid of the present utility model;

[0021] Figure 2 This is the sectional structural schematic diagram of a filtering device for the production of silicon carbide polishing liquid of the present utility model;

[0022] Figure 3 This is the structural schematic diagram of the pressing plate lifting of a filtering device for the production of silicon carbide polishing liquid of the present utility model;

[0023] Figure 4 This is the structural schematic diagram of the connection of the feeding pipe of a filtering device for the production of silicon carbide polishing liquid of the present utility model.

[0024] Reference numerals.

[0025] 1. Fixed base; 2. First filtering barrel; 3. Second filtering barrel; 4. Fixed bracket; 5. Total feeding pipe; 6. Feeding branch pipe; 7. Spiral telescopic connecting pipe; 8. First feeding solenoid valve; 9. Second feeding solenoid valve; 10. Hydraulic rod; 11. Pressing plate; 12. Sealing ring; 13. Breather valve; 14. Filter screen; 15. Discharge pipe; 16. Discharge solenoid valve. Detailed implementation manners

[0026] To make the purpose, technical solutions and advantages of the present utility model clearer, the present utility model will be further described in detail below in conjunction with the specific implementation manners and with reference to the accompanying drawings. It should be understood that these descriptions are exemplary and are not intended to limit the scope of the present utility model. In addition, in the following description, the descriptions of well-known structures and technologies are omitted to avoid unnecessarily confusing the concepts of the present utility model.

[0027] As Figures 1-4 shown, a filtering device for the production of silicon carbide polishing liquid proposed by the present utility model includes a fixed base 1 and a fixed bracket 4. The fixed bracket 4 is in a T-shaped structure, and the fixed bracket 4 is welded on the surface of the fixed base 1. The surface of the fixed base 1 is provided with a first filtering barrel 2 and a second filtering barrel 3, and the first filtering barrel 2 and the second filtering barrel 3 are symmetrically arranged.

[0028] Both ends of the fixed bracket 4 are provided with hydraulic rods 10, the ends of the hydraulic rods 10 are both connected with a pressing plate 11, and filter screens 14 are installed at the bottom of the inner cavities of the first filtering barrel 2 and the second filtering barrel 3.

[0029] The surface of the fixed bracket 4 is provided with a total feeding pipe 5. The end of the total feeding pipe 5 is symmetrically connected with feeding branch pipes 6 through a tee pipe. The ends of the feeding branch pipes 6 are both connected with spiral telescopic connecting pipes 7, and the end of the spiral telescopic connecting pipe 7 away from the feeding branch pipe 6 is conductively connected with the pressing plate 11.

[0030] It should be noted that when the first feed solenoid valve 8 is opened and the second feed solenoid valve 9 is closed, the main feed pipe 5 diverts the silicon carbide polishing liquid raw material through the three-way pipe into the material guiding branch pipe 6, and then injects it into the first filter barrel 2 through the spiral telescopic connecting pipe 7. After the silicon carbide polishing liquid raw material in the first filter barrel 2 is full, the first feed solenoid valve 8 is closed, and the second feed solenoid valve 9 is opened, so that the silicon carbide polishing liquid raw material can be injected into the second filter barrel 3, realizing uninterrupted feeding of the silicon carbide polishing liquid raw material. During the process of injecting materials into the second filter barrel 3, the hydraulic rod 10 above the first filter barrel 2 pushes the pressing plate 11 downward. The pressing plate 11 can apply a downward pressure to the silicon carbide polishing liquid raw material in the first filter barrel 2, enabling the silicon carbide polishing liquid raw material to quickly pass through the filter screen 14, realizing rapid filtration of the silicon carbide polishing liquid raw material. After filtration, the pressing plate 11 is controlled to rise. Through the breathing valve 13, air can enter the first filter barrel 2 during the rising process of the pressing plate 11. Then, the first feed solenoid valve 8 is opened again, and the second feed solenoid valve 9 is closed, and the first filter barrel 2 can be refilled. The hydraulic rod 10 can push the pressing plate 11 to make the silicon carbide polishing liquid raw material in the second filter barrel 3 pass through the filter screen 14.

[0031] In this embodiment, as Figure 1 and Figure 3 shown, a first feed solenoid valve 8 is installed on the material guiding branch pipe 6 connected to the first filter barrel 2, and a second feed solenoid valve 9 is installed on the material guiding branch pipe 6 connected to the second filter barrel 3.

[0032] It should be noted that by alternately switching the first feed solenoid valve 8 and the second feed solenoid valve 9, alternate feeding of the first filter barrel 2 and the second filter barrel 3 can be realized.

[0033] In this embodiment, as Figure 2 and Figure 3 shown, a sealing ring 12 is sleeved on the outer wall surface of the pressing plate 11, and the outer wall of the sealing ring 12 is respectively abutted against the inner wall surfaces of the first filter barrel 2 and the second filter barrel 3.

[0034] It should be noted that the sealing ring 12 can seal the connection between the pressing plate 11 and the inner walls of the first filter barrel 2 and the second filter barrel 3.

[0035] In this embodiment, as Figure 2 and Figure 3 shown, mounting holes are formed through the surface of the pressing plate 11, and breathing valves 13 are installed in the inner cavities of the mounting holes.

[0036] It should be noted that when the pressing plate 11 rises, through the breathing valve 13, air can enter the first filter barrel 2 during the rising process of the pressing plate 11, making the pressure inside the barrel balance with the external pressure.

[0037] In this embodiment, asFigure 1 As shown, discharge pipes 15 are conductively connected to the bottoms of the side walls of the first filter barrel 2 and the second filter barrel 3, the filter screen 14 is located above the discharge pipes 15, and discharge solenoid valves 16 are installed on the discharge pipes 15.

[0038] It should be noted that the filtered silicon carbide polishing liquid raw material is discharged through the discharge pipe 15, and the discharge solenoid valve 16 can control the on-off of the discharge pipe 15.

[0039] The working principle and usage process of the present utility model: Open the first feed solenoid valve 8 and close the second feed solenoid valve 9. The feed main pipe 5 guides the silicon carbide polishing liquid raw material through the three-way pipe into the diversion feed branch pipe 6, and then injects it into the first filter barrel 2 through the spiral telescopic connecting pipe 7. After the silicon carbide polishing liquid raw material in the first filter barrel 2 is full, close the first feed solenoid valve 8 and open the second feed solenoid valve 9. The silicon carbide polishing liquid raw material can be injected into the second filter barrel 3, enabling continuous feeding of the silicon carbide polishing liquid raw material. During the injection process of the second filter barrel 3, the hydraulic rod 10 above the first filter barrel 2 pushes the pressure plate 11 downward. The pressure plate 11 can apply a downward pressure to the silicon carbide polishing liquid raw material in the first filter barrel 2, enabling the silicon carbide polishing liquid raw material to quickly pass through the filter screen 14, achieving rapid filtration of the silicon carbide polishing liquid raw material. After filtration, control the pressure plate 11 to rise. The breathing valve 13 allows air to enter the first filter barrel 2 during the rising process of the pressure plate 11. Open the first feed solenoid valve 8 again and close the second feed solenoid valve 9 to refill the first filter barrel 2. The hydraulic rod 10 can push the pressure plate 11 to make the silicon carbide polishing liquid raw material in the second filter barrel 3 pass through the filter screen 14. The filtered silicon carbide polishing liquid raw material is discharged through the discharge pipe 15. When the hydraulic rod 10 contracts, the pressure plate 11 can be lifted out of the first filter barrel 2 and the second filter barrel 3 respectively, facilitating the cleaning of impurities on the inner walls of the first filter barrel 2 and the second filter barrel 3 and the surface of the filter screen 14, making the use more convenient.

[0040] It should be understood that the above specific embodiments of the present utility model are only used for exemplary illustration or explanation of the principle of the present utility model, and do not constitute a limitation to the present utility model. Therefore, any modifications, equivalent replacements, improvements, etc. made without departing from the spirit and scope of the present utility model shall be included within the protection scope of the present utility model. In addition, the appended claims of the present utility model are intended to cover all changes and modification examples that fall within the scope and boundary of the appended claims or equivalent forms of such scope and boundary.

Claims

1. A filtering device for producing silicon carbide polishing liquid, comprising a fixed base (1) and a fixed bracket (4), wherein the fixed bracket (4) is in a T-shaped structure and is welded to the surface of the fixed base (1), characterized in that: A first filter barrel (2) and a second filter barrel (3) are mounted on the surface of the fixed base (1), and the first filter barrel (2) and the second filter barrel (3) are symmetrically arranged; Hydraulic rods (10) are installed at both ends of the fixed bracket (4), and pressure plates (11) are connected to the ends of the hydraulic rods (10). Filter screens (14) are installed at the bottom of the inner cavities of the No. 1 filter barrel (2) and the No. 2 filter barrel (3); A main feed pipe (5) is provided on the surface of the fixed bracket (4), and the ends of the main feed pipe (5) are symmetrically connected to material guide pipes (6) via three-way pipes. The ends of the material guide pipes (6) are both connected to spiral telescopic connecting pipes (7), and the end of the spiral telescopic connecting pipe (7) away from the material guide pipes (6) is conductively connected to the pressure plate (11).

2. A filtering device for producing silicon carbide polishing liquid according to claim 1, characterized in that: A No. 1 material feed solenoid valve (8) is installed on the material guide branch pipe (6) connected to the No. 1 filter barrel (2).

3. A filtering device for producing silicon carbide polishing liquid according to claim 2, characterized in that: A No. 2 feed solenoid valve (9) is installed on the material guide branch pipe (6) connected to the No. 2 filter barrel (3).

4. A filtering device for producing silicon carbide polishing liquid according to claim 3, characterized in that: The outer wall surface of the pressure plate (11) is sleeved with a sealing ring (12), and the outer wall of the sealing ring (12) abuts against the inner wall surfaces of the first filter barrel (2) and the second filter barrel (3).

5. A filtering device for producing silicon carbide polishing liquid according to claim 4, characterized in that: The surface of the pressure plate (11) is provided with mounting holes, and the inner cavities of the mounting holes are provided with breathing valves (13).

6. A filtering device for producing silicon carbide polishing liquid according to claim 5, characterized in that: The bottoms of the side walls of the No. 1 filter barrel (2) and the No. 2 filter barrel (3) are both connected to a discharge pipe (15), and the filter screen (14) is located above the discharge pipe (15).

7. A filtering device for producing silicon carbide polishing liquid according to claim 6, characterized in that: A discharge solenoid valve (16) is installed on each of the discharge pipes (15).

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