Semiconductor sand blasting processing dust removal device

Abstract

The utility model discloses a semiconductor sand blasting processing dust removal device, and relates to the technical field of semiconductor processing. The top of the washing cylinder is an opening, the bottom of the washing cylinder is communicated with a water pool through a liquid discharging pipe, and the outer surface of one side of the washing cylinder is communicated with an air inlet pipe; the spraying mechanism comprises a transverse plate arranged on the inner wall of the washing cylinder, and a guide pipe coaxial with the washing cylinder is arranged on the transverse plate; gas exhausted by the sand blasting equipment is conveyed into the washing cylinder through the gas inlet pipe to circulate upwards, the water pump conveys clear water in the water pool into the water distribution disc and sprays the clear water downwards through the multiple atomization nozzles, and under the action of the water power assembly, water mist is sprayed downwards in a rotating mode, so that the water mist can completely cover the washing cylinder, and the washing efficiency is improved. The gas flows upwards and is opposite to the water mist sprayed downwards, so that dust in the gas is stripped, the dust is conveyed into the water tank to be precipitated, water circulation dust removal is performed, the gas subjected to dust removal is discharged, the environmental sanitation is ensured, and the dust is convenient to clean.

Description

Technical Field

[0001] This application relates to the field of semiconductor processing technology, and particularly relates to a dust removal device for semiconductor sandblasting processing. Background Art

[0002] Semiconductor wafers are usually made of high-purity polysilicon ingots, which are mainly drawn into silicon single crystal ingots with different resistivity by the Czochralski method, and then processed through processes such as crystal orientation, heat treatment, grinding, and polishing to form silicon wafers. Sandblasting processing is a process in semiconductor wafer processing, which uses high-pressure air to drive emery to process the surface of the wafer. By using the fact that the hardness of emery is higher than that of the silicon glass on the wafer surface, high-pressure air is used to form a dust fluid of emery dust, which is ejected through a special pipeline and nozzle and acts on the wafer surface to remove the phosphosilicate glass and borosilicate glass on the wafer surface by surface grinding.

[0003] During the operation of the entire sandblasting equipment, some emery dust will be discharged through the exhaust system. If directly discharged, it will cause dust pollution to the environment. Currently, a dust-proof net is usually set at the exhaust port of the exhaust system. When the dust-proof net intercepts dust, the dust will adhere to the dust-proof net. After long-term use, it will affect the air permeability of the dust-proof net, and in severe cases, it will cause the dust-proof net to be blocked. At the same time, it is not convenient to clean the intercepted emery dust. Therefore, this application proposes a dust removal device for semiconductor sandblasting processing. Utility Model Content

[0004] The purpose of this application is to solve the problem that in the existing method, part of the dust is intercepted by a dust-proof net. After long-term use, not only is the dust-proof net easily blocked by emery dust, but also it is not convenient to clean the emery dust. This application provides a dust removal device for semiconductor sandblasting processing.

[0005] This application specifically adopts the following technical solutions to achieve the above purpose:

[0006] A dust removal device for semiconductor sandblasting processing, comprising:

[0007] A washing cylinder, the top of which is open, and the bottom is connected to a water tank through a drain pipe. One outer surface of the washing cylinder is connected to an air inlet pipe;

[0008] A spraying mechanism, including a cross plate arranged on the inner wall of the washing cylinder. A conduit coaxial with the washing cylinder is arranged on the cross plate. The bottom end of the conduit is connected to a water distribution plate through a rotary joint. A plurality of annularly distributed water distribution pipes are connected to the outer surface of the water distribution plate. A plurality of atomizing nozzles are connected to the bottom side of the water distribution pipe along its length direction in an array. A conveying pipe is connected between the top of the conduit and the water tank. A water pump arranged on the water tank is connected to the conveying pipe. A filter screen is arranged in the water tank. A water power component is arranged on the conduit, and the water power component drives the water distribution plate to rotate by means of water flow.

[0009] Furthermore, the hydrodynamic component includes a rotating shaft that penetrates through the conduit. An impeller is fixed on the rotating shaft and located inside the conduit. A bevel gear ring is fixedly arranged on the water distribution plate. Bevel gears are fixedly arranged at both ends of the rotating shaft, and both bevel gears are in tooth engagement with the teeth of the bevel gear ring.

[0010] Furthermore, two scraping plates are symmetrically arranged on the water distribution plate, and the scraping surfaces of the two scraping plates are in contact and overlap with the inner wall of the washing cylinder.

[0011] Furthermore, the bottom of the washing cylinder is of a conical structure, a drain pipe is connected to the conical tip, and the scraping plate is configured with a bent portion that fits the inner wall of the conical end.

[0012] Furthermore, a flow disturbing member is arranged at the bottom of the water distribution plate, and the flow disturbing member is used to disperse the gas conveyed by the intake pipe and make it flow upward.

[0013] Furthermore, the flow disturbing member includes a flow disturbing rod coaxially fixed at the bottom of the water distribution plate, and a plurality of flow disturbing vanes are arranged on the outer surface of the flow disturbing rod in a circular distribution.

[0014] Furthermore, the intake pipe is inclined, and the connection port of the intake pipe and the washing cylinder corresponds to the flow disturbing vanes.

[0015] Furthermore, the number of the filter meshes is several. The several filter meshes are arranged vertically and horizontally, and the apertures of the several filter meshes gradually decrease.

[0016] The beneficial effects of the present application are as follows: In the present application, the gas discharged from the sandblasting equipment is conveyed to the inside of the washing cylinder through the intake pipe and flows upward. The water pump conveys the clear water in the water tank to the water distribution plate through the conveying pipe and sprays it downward through a plurality of atomizing nozzles. Under the action of the hydrodynamic assembly, the water mist is sprayed downward in a rotating manner, so that the water mist can completely cover the washing cylinder. The upward flowing gas and the downward sprayed water mist collide with each other, thereby stripping the dust in the gas and conveying the dust to the water tank for precipitation, so as to perform water circulation dust removal. The dust-removed gas is then discharged outside, which not only ensures the environmental sanitation of the gas discharge, but also facilitates the cleaning of the intercepted dust. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 is a three-dimensional structure diagram of the present application;

[0018] Figure 2 is a cross-sectional view of the three-dimensional structure of the present application;

[0019] Figure 3 is another cross-sectional view of the three-dimensional structure of the present application;

[0020] Figure 4 is the present application Figure 2 enlarged view at A;

[0021] Reference numerals: 1, washing cylinder; 2, drain pipe; 3, water tank; 4, intake pipe; 5, spraying mechanism; 6, scraper; 7, flow disturbing member; 501, cross plate; 502, conduit; 503, water distribution tray; 504, water distribution pipe; 505, atomizing nozzle; 506, delivery pipe; 507, water pump; 508, filter screen; 509, water power member; 5091, rotating shaft; 5092, impeller; 5093, bevel gear ring; 5094, bevel gear; 701, flow disturbing rod; 702, flow disturbing piece. Detailed implementation manners

[0022] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions in the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of this application.

[0023] As Figures 1-4 shown, a dust removal device for semiconductor sandblasting processing proposed in an embodiment of this application includes:

[0024] A washing cylinder 1 with an open top and a bottom connected to a water tank 3 through a drain pipe 2. The water tank 3 can hold clean water. An intake pipe 4 is connected to the outer surface of one side of the washing cylinder 1. Preferably, the intake pipe 4 is connected to the exhaust pipe of the sandblasting device, and the air and part of the diamond abrasive dust discharged by the sandblasting device are transported into the washing cylinder 1;

[0025] The spraying mechanism 5 includes a cross plate 501 arranged on the inner wall of the washing cylinder 1. A conduit 502 coaxial with the washing cylinder 1 is arranged on the cross plate 501. The bottom end of the conduit 502 is connected to a water distribution plate 503 through a rotary joint. The water distribution plate 503 can rotate with the conduit 502 as the center. A number of annularly distributed water distribution pipes 504 are connected to the outer surface of the water distribution plate 503. A number of atomizing nozzles 505 are connected to the bottom side of the water distribution pipe 504 along its length direction in an array. A delivery pipe 506 is connected between the top of the conduit 502 and the water tank 3. A water pump 507 arranged on the water tank 3 is connected to the delivery pipe 506. A filter screen 508 is arranged in the water tank 3. A water power component 509 is arranged on the conduit 502. The water power component 509 drives the water distribution plate 503 to rotate by means of water flow. When dust removal is carried out on the air discharged by the sandblasting equipment, the water pump 507 does work. It conveys the water in the water tank 3 to the conduit 502 and the water distribution plate 503 in sequence through the delivery pipe 506, then distributes it to a number of water distribution pipes 504, and finally forms water mist and sprays downward from a number of atomizing nozzles 505. Since the water distribution plate 503 is connected to the conduit 502 through a rotary joint, and a water power component 509 for driving the water distribution plate 503 to rotate by means of water flow is arranged on the conduit 502, when atomizing spraying is carried out, the water distribution plate 503 drives a number of water distribution pipes 504 to rotate, so that the sprayed water mist can completely cover the entire washing cylinder 1. The gas discharged by the sandblasting equipment flows into the washing cylinder 1 through the intake pipe 4. The gas carries emery dust and flows upward along the washing cylinder 1. The downward sprayed water mist and the upward flowing gas are in countercurrent. During the countercurrent process, the dust in the gas will be mixed with the water mist, the mass of the dust is increased under the action of the water mist, and it will fall downward under the entrainment of the water mist and flow into the water tank 3 from the drain pipe 2 along with the sprayed water. After being washed by the water mist, the dust in the gas is stripped, and the clean gas continues to flow upward and finally is discharged from the opening at the top of the washing cylinder 1, so that the dust will not be discharged externally and will not pollute the external air environment. The water mist carrying the dust flows into the water tank 3. Through the interception of the filter screen 508, the dust is intercepted and deposited in the water tank 3 to prevent the dust in the water tank 3 from entering the water pump 507. The water pump 507 pumps clean water for water circulation, so as to continuously remove dust from the gas discharged by the sandblasting equipment. When it is necessary to clean the intercepted dust, the water in the water tank 3 can be drained;

[0026] Adopting water circulation, using the downward spraying of water mist and the upward flow of gas for countercurrent, using the water mist to strip the dust in the gas, discharging the clean gas externally, and depositing the stripped dust in the water tank 3 can not only effectively remove dust from the gas and ensure the environmental sanitation of the externally discharged gas, but also facilitate the cleaning of the intercepted dust.

[0027] Such as Figure 4As shown, in some embodiments, the hydrodynamic member 509 includes a rotating shaft 5091 that rotates and penetrates the conduit 502, and an impeller 5092 is fixed on the rotating shaft 5091 and located in the conduit 502. Preferably, the longitudinal section of the impeller 5092 is cross-shaped, and a bevel gear ring 5093 is fixed on the water diversion plate 503. Bevel gears 5094 are fixed at both ends of the rotating shaft 5091, and the two bevel gears 5094 are meshed with the teeth of the bevel gear ring 5093. The water flow has a large water pressure under the extraction of the water pump 507. When water flows along the conduit 502, the water flow will impact the impeller 5092, thereby driving the impeller 5092 to rotate, thereby driving the rotating shaft 5091 to rotate, and through the meshing of the teeth of the bevel gear 5094 and the bevel gear ring 5093, the water diversion plate 503 is driven to rotate. Through the linkage of the hydrodynamic part 509, the water diversion plate 503 is driven to rotate by the power of the water flow, which not only allows the water mist to completely cover the washing drum 1 to ensure the dust removal effect, but also does not require additional driving energy, thereby improving practicality.

[0028] like Figure 2 and Figure 3 As shown, in some embodiments, two scrapers 6 are symmetrically arranged on the water diversion tray 503, and the scraping surfaces of the two scrapers 6 are in contact with and overlap the inner wall of the washing drum 1. During the spraying process, since the water mist is sprayed in a rotating manner and the air flow flows upward, part of the dust will be wetted by the water mist and adhere to the inner wall of the washing drum 1. Through the scraper 6, the water diversion tray 503 rotates and drives the scraper 6 to rotate, so that the scraper 6 scrapes the inner wall of the washing drum 1, which can not only clean the inner wall of the washing drum 1, but also scrape the dust into the pool 3, so as to facilitate the subsequent cleaning of the dust.

[0029] like Figure 2 and Figure 3 As shown, in some embodiments, the bottom of the washing drum 1 is in a conical structure, the drain pipe 2 is connected to the tip of the cone, and the scraper 6 is configured with a bent portion that fits the inner wall of the conical end. By making the bottom of the washing drum 1 in a conical structure and extending the bent end of the scraper 6 to fit the bottom of the cone, the dust can be effectively transported to the water pool 3 by the water flow and the scraping of the scraper 6, thereby avoiding residual dust in the washing drum 1, thereby improving practicality.

[0030] like Figure 3 As shown, in some embodiments, a spoiler 7 is provided at the bottom of the water diversion plate 503, and the spoiler 7 is used to disperse the gas transported by the air inlet pipe 4 and circulate it upward. After the gas is transported from the air inlet pipe 4 to the washing drum 1, the gas usually flows upward along the washing drum 1 in a stream or tends to flow upward toward the center. Through the spoiler 7, as the water diversion plate 503 rotates, the spoiler 7 disturbs the gas, breaks up the gas, and makes the gas flow upward in a dispersed state, and cooperates with the rotating and evenly covered water mist for flushing, so that the dust removal effect on the gas is better.

[0031] As Figure 2 shown, in some embodiments, the spoiler 7 includes spoiler rods 701 coaxially and fixedly arranged at the bottom of the water distribution tray 503. A plurality of spoiler vanes 702 are annularly distributed on the outer surface of the spoiler rods 701. When the water distribution tray 503 rotates, it drives the spoiler rods 701 to rotate, so that the spoiler vanes 702 stir the gas in the washing tub 1, making the gas flow upward in a dispersed state.

[0032] As Figure 2 shown, in some embodiments, the intake pipe 4 is inclined. The connection port of the intake pipe 4 and the washing tub 1 corresponds to the spoiler vanes 702. By inclining the intake pipe 4, it is possible to prevent the water mist sprayed downward from flowing back into the intake pipe 4. At the same time, the spoiler vanes 702 correspond to the connection port of the intake pipe 4, so that after the gas flows from the intake pipe 4 into the washing tub 1, the gas directly impacts the spoiler vanes 702, which not only improves the spoiler effect but also applies a rotational thrust to the spoiler vanes 702 to ensure the stability of the rotation of the spoiler 7.

[0033] As Figure 2 shown, in some embodiments, the number of filter screens 508 is several. The several filter screens 508 are arranged vertically and horizontally. The apertures of the several filter screens 508 gradually decrease. Preferably, the number of filter screens 508 is three, and the apertures of the filter screens 508 gradually become smaller from left to right. The pool 3 is sequentially divided into a primary sedimentation tank, a secondary sedimentation tank, a fine sedimentation tank, and a clear water tank from left to right. The drain pipe 2 is connected to the primary sedimentation tank, and the delivery pipe 506 is connected to the clear water tank. Through multi-stage sedimentation and filtration, the clear water circulation is effectively ensured.

[0034] The above description of the disclosed embodiments enables those skilled in the art to implement or use the present application. Various modifications to these embodiments will be apparent to those skilled in the art. The general principles defined herein can be implemented in other embodiments without departing from the spirit or scope of the present application. Therefore, the present application will not be limited to the embodiments shown herein, but rather to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A semiconductor sandblasting dust removal device, characterized in that: include: A washing cylinder (1) having an opening at the top and a bottom connected to a water pool (3) via a liquid discharge pipe (2); an outer surface of one side of the washing cylinder (1) being connected to an air intake pipe (4); The spray mechanism (5) comprises a horizontal plate (501) arranged on the inner wall of the washing drum (1), the horizontal plate (501) being provided with a conduit (502) coaxial with the washing drum (1), the bottom end of the conduit (502) being connected to a water distribution plate (503) via a rotating joint, the outer surface of the water distribution plate (503) being connected to a plurality of water distribution pipes (504) distributed in an annular shape, the bottom side of the water distribution pipe (504) being connected to a plurality of atomizing nozzles (505) in an array along its length direction, a delivery pipe (506) being connected between the top of the conduit (502) and the water pool (3), the delivery pipe (506) being connected to a water pump (507) arranged on the water pool (3), a filter screen (508) being arranged in the water pool (3), a water power component (509) being provided on the conduit (502), the water power component (509) driving the water distribution plate (503) to rotate by means of water flow.

2. The semiconductor sandblasting dust removal device according to claim 1, characterized in that: The hydrodynamic component (509) comprises a rotating shaft (5091) that rotates and penetrates the conduit (502); an impeller (5092) is fixed on the rotating shaft (5091) and located inside the conduit (502); a bevel gear ring (5093) is fixed on the water diversion plate (503); bevel gears (5094) are fixed at both ends of the rotating shaft (5091), and the two bevel gears (5094) are meshed with the teeth of the bevel gear ring (5093).

3. The semiconductor sandblasting dust removal device according to claim 1, characterized in that: Two scrapers (6) are symmetrically arranged on the water separation plate (503), and the scraping surfaces of the two scrapers (6) are in contact with and overlap the inner wall of the washing tub (1).

4. The semiconductor sandblasting dust removal device according to claim 3, characterized in that: The bottom of the washing cylinder (1) is in a conical structure, the drain pipe (2) is connected to the tip of the cone, and the scraper (6) is configured with a bent portion that fits the inner wall of the cone end.

5. The semiconductor sandblasting dust removal device according to claim 1, characterized in that: A spoiler (7) is provided at the bottom of the water distribution plate (503), and the spoiler (7) is used to disperse the gas transported by the air intake pipe (4) to flow upward.

6. The semiconductor sandblasting dust removal device according to claim 5, characterized in that: The spoiler (7) comprises a spoiler rod (701) coaxially fixed to the bottom of the water diversion plate (503), and the outer surface of the spoiler rod (701) is provided with a plurality of spoiler pieces (702) distributed in an annular shape.

7. The semiconductor sandblasting dust removal device according to claim 6, characterized in that: The air intake pipe (4) is arranged at an angle, and the connecting opening between the air intake pipe (4) and the washing tub (1) corresponds to the spoiler (702).

8. The semiconductor sandblasting dust removal device according to claim 1, characterized in that: The number of the filter screens (508) is a plurality, the plurality of filter screens (508) are arranged vertically and horizontally, and the apertures of the plurality of filter screens (508) gradually decrease.

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