Testing device for measuring deflation performance of vacuum material

Abstract

A testing device for measuring the deflation performance of a vacuum material comprises a mechanical pump, a first molecular pump, a backing valve, a magnet and a limiting block, one side of the mechanical pump is connected with the first molecular pump through a pipeline, the backing valve is installed on the pipeline between the mechanical pump and the first molecular pump, one side of the first molecular pump is connected with a second molecular pump through a pipeline, and the second molecular pump is connected with the magnet. A resistance gauge is installed on the pipeline between the forestage valve and the first molecular pump, one side of the second molecular pump is respectively connected with an ultrahigh vacuum micrometering valve and an ultrahigh vacuum stop valve through pipelines, and an ultrahigh vacuum deflation valve is installed on the pipeline at the front end of the ultrahigh vacuum micrometering valve. A dynamic conductance method is adopted to qualitatively and quantitatively analyze the deflation performance of a material, the deflation type, the deflation rate, the deflation amount of different gases and the total deflation amount of the material are mainly tested, a heater can be switched to bake and degas all backgrounds in a vacuum chamber, and the vacuum degree of the backgrounds is improved.

Description

Technical Field

[0001] The utility model relates to a testing device, in particular to a testing device for measuring the outgassing performance of vacuum materials. Background Technique

[0002] The outgassing rate of a material is an important performance index for evaluating materials, especially vacuum materials. Any solid material can dissolve and adsorb some gases in the atmospheric environment. When the material is placed in a vacuum, it will desorb and release gases. Therefore, the outgassing performance level of the material directly affects the reliability and lifespan of vacuum devices and hermetically sealed devices. With the development of vacuum technology, the analysis of the outgassing performance of materials plays a crucial guiding role in material selection in emerging fields such as microelectromechanical vacuum system packaging, semiconductor hermetic packaging, and large and small optoelectronic vacuum devices. The existing technologies for the analysis of the outgassing performance of materials have complex structures, narrow measurement ranges, no gas calibration devices, and relatively large uncertainties in the measurement results of the devices. Content of the Utility Model

[0003] In view of the above situation, to overcome the defects of the existing technology, the utility model provides a testing device for measuring the outgassing performance of vacuum materials, effectively solving the problems mentioned in the above background technique.

[0004] To achieve the above object, the utility model provides the following technical solutions: The utility model includes a mechanical pump, a first molecular pump, a foreline valve, a second molecular pump, a resistance gauge, an ultra-high vacuum vent valve, an ultra-high vacuum fine adjustment valve, a gas mass flowmeter, a high vacuum inlet valve, a gas storage tank, a pressure relief valve, a gas cylinder, an ultra-high vacuum isolation valve, an ultra-high vacuum ionization gauge, a conductance measurement device, an ultra-high vacuum valve, a measurement chamber, a sample chamber, a sample transfer device, a sample chamber heating oven, a quadrupole mass spectrometer, an ultra-high vacuum ionization gauge, a sample heating platform, an ultra-high vacuum system oven, a vacuum pipeline heating jacket, a track, an electromagnetic control device, a magnet and a limit block. One side of the mechanical pump is connected to the first molecular pump through a pipeline. A foreline valve is installed on the pipeline between the mechanical pump and the first molecular pump. One side of the first molecular pump is connected to the second molecular pump through a pipeline. A resistance gauge is installed on the pipeline between the foreline valve and the first molecular pump. One side of the second molecular pump is connected to the ultra-high vacuum fine adjustment valve and the ultra-high vacuum isolation valve respectively through pipelines. An ultra-high vacuum vent valve is installed on the pipeline in front of the ultra-high vacuum fine adjustment valve. The rear end of the ultra-high vacuum fine adjustment valve is connected to the gas mass flowmeter through a pipeline. One side of the gas mass flowmeter is connected to the high vacuum inlet valve through a pipeline. One side of the high vacuum inlet valve is connected to the gas storage tank through a pipeline. One side of the gas storage tank is connected to the pressure relief valve through a pipeline. One side of the pressure relief valve is connected to the gas cylinder through a pipeline. One end of the ultra-high vacuum isolation valve is connected to the ultra-high vacuum valve through a pipeline. Auxiliary pipelines are connected to both sides of the ultra-high vacuum isolation valve. An ultra-high vacuum ionization gauge and a conductance measurement device are sequentially installed on the auxiliary pipelines. One side of the ultra-high vacuum valve is connected to the measurement chamber through a pipeline. One side of the measurement chamber is connected to the sample chamber of the sample chamber heating oven through a pipeline. A sample transfer device is installed in the sample chamber heating oven. A quadrupole mass spectrometer is installed on the measurement chamber. An ultra-high vacuum ionization gauge is installed on one side of the measurement chamber where the quadrupole mass spectrometer is located. The sample transfer device consists of a track provided at the bottom, a sample heating platform slidably connected to the track, a magnet installed at one end of the sample heating platform, and a limit block installed at one end of the track.

[0005] Preferably, an ultra-high vacuum system oven that can be lifted is installed outside the ultra-high vacuum valve, the measurement chamber, the quadrupole mass spectrometer and the ultra-high vacuum ionization gauge.

[0006] Preferably, a vacuum pipeline heating jacket is installed outside the ultra-high vacuum vent valve, the ultra-high vacuum fine adjustment valve, the gas mass flowmeter, the high vacuum inlet valve, the gas storage tank, the ultra-high vacuum isolation valve, the ultra-high vacuum ionization gauge and the conductance measurement device.

[0007] Preferably, an electromagnetic control device for controlling the magnet is installed on the sample transfer device.

[0008] Preferably, the sample heating platform is provided with a sealing structure corresponding to the opening end of the ultra-high vacuum system oven. When the ultra-high vacuum system oven is lowered onto the sample heating platform, the opening end of the ultra-high vacuum system oven is hermetically connected to the platform.

[0009] Preferably, the gas storage tank stores calibration gas under a certain pressure.

[0010] Beneficial effects: The structure of the present utility model is novel and ingeniously conceived. The dynamic conductance method is used to qualitatively and quantitatively analyze the outgassing performance of materials, mainly testing the types of outgassing, outgassing rate, outgassing amounts of different gases, and the total outgassing amount of the materials. The system is suitable for computer automatic data acquisition and processing, and can collect the changing data of the ultra-high vacuum ionization gauge and the quadrupole mass spectrometer in a short time, and obtain the measurement results through calculation and processing. This system can also test the outgassing performance during the operation of micro-vacuum electronic components, and can measure the performance and outgassing characteristics of devices such as MEMS devices and semiconductor packaging devices when working at different vacuum degrees and different temperatures. The main components include an ultra-high vacuum pumping system, an intake system, a vacuum sample chamber, a vacuum measurement chamber, a quadrupole mass spectrometer, an ultra-high vacuum ionization vacuum gauge, a sample magnetic drive mechanism, multiple heating devices, and an auxiliary electrical control unit. The overall vacuum pipeline and vacuum chamber of the system are made of 316L stainless steel material, and the interfaces are all sealed with vacuum knife-edge flanges, and the ultimate vacuum is better than 5×10 -8 Pa; The system uses a gas mass flowmeter to micro-control the intake of gas and precisely control the vacuum degree of the vacuum system. By using the magnetic drive mechanism to transfer and switch the sample between the drive mechanism chamber and the sample chamber, the heater can be switched to bake and degas all the backgrounds in the vacuum chamber, improving the background vacuum degree. Description of the Drawings

[0011] The drawings are used to provide a further understanding of the present utility model, and constitute a part of the specification. Together with the embodiments of the present utility model, they are used to explain the present utility model, and do not constitute a limitation to the present utility model. In the drawings:

[0012] Figure 1 is the overall structure schematic diagram of the present utility model;

[0013] Figure 2 is the partial structure schematic diagram of the sample transfer device of the present utility model;

[0014] Reference numerals in the figure: 1, mechanical pump; 2, first molecular pump; 3, foreline valve; 4, second molecular pump; 5, resistance gauge; 6, ultra-high vacuum vent valve; 7, ultra-high vacuum fine adjustment valve; 8, gas mass flowmeter; 9, high vacuum inlet valve; 10, gas storage tank; 11, pressure relief valve; 12, gas cylinder; 13, ultra-high vacuum stop valve; 14, ultra-high vacuum ionization gauge; 15, conductance measurement device; 16, ultra-high vacuum valve; 17, measurement chamber; 18, sample chamber; 19, sample transfer device; 20, sample chamber heating oven; 21, quadrupole mass spectrometer; 22, ultra-high vacuum ionization meter; 23, sample heating platform; 24, ultra-high vacuum system oven; 25, vacuum pipeline heating sleeve; 26, track; 27, electromagnetic control device; 28, magnet; 29, limit block. Detailed implementation manners

[0015] The following combines the attached Figure 1-2 Further detailed description is made on the detailed implementation manners of the present utility model.

[0016] Embodiment 1, consisting of Figure 1-2Provided is a test device for measuring the outgassing performance of vacuum materials according to the present utility model, which includes a mechanical pump 1, a first molecular pump 2, a foreline valve 3, a second molecular pump 4, a resistance gauge 5, an ultra-high vacuum outgassing valve 6, an ultra-high vacuum fine adjustment valve 7, a gas mass flowmeter 8, a high vacuum inlet valve 9, a gas storage tank 10, a pressure relief valve 11, a gas cylinder 12, an ultra-high vacuum stop valve 13, an ultra-high vacuum ionization gauge 14, a conductance measuring device 15, an ultra-high vacuum valve 16, a measurement chamber 17, a sample chamber 18, a sample transfer device 19, a sample chamber heating oven 20, a quadrupole mass spectrometer 21, an ultra-high vacuum ionization gauge 22, a sample heating platform 23, an ultra-high vacuum system oven 24, a vacuum pipeline heating sleeve 25, a track 26, an electromagnetic control device 27, a magnet 28 and a limit block 29. One side of the mechanical pump 1 is connected to the first molecular pump 2 through a pipeline. A foreline valve 3 is installed on the pipeline between the mechanical pump 1 and the first molecular pump 2. One side of the first molecular pump 2 is connected to the second molecular pump 4 through a pipeline. A resistance gauge 5 is installed on the pipeline between the foreline valve 3 and the first molecular pump 2. One side of the second molecular pump 4 is connected to an ultra-high vacuum fine adjustment valve 7 and an ultra-high vacuum stop valve 13 respectively through pipelines. An ultra-high vacuum outgassing valve 6 is installed on the pipeline at the front end of the ultra-high vacuum fine adjustment valve 7. The rear end of the ultra-high vacuum fine adjustment valve 7 is connected to a gas mass flowmeter 8 through a pipeline. One side of the gas mass flowmeter 8 is connected to a high vacuum inlet valve 9 through a pipeline. One side of the high vacuum inlet valve 9 is connected to a gas storage tank 10 through a pipeline. One side of the gas storage tank 10 is connected to a pressure relief valve 11 through a pipeline. One side of the pressure relief valve 11 is connected to a gas cylinder 12 through a pipeline. One end of the ultra-high vacuum stop valve 13 is connected to an ultra-high vacuum valve 16 through a pipeline. Auxiliary pipelines are connected to both sides of the ultra-high vacuum stop valve 13. An ultra-high vacuum ionization gauge 14 and a conductance measuring device 15 are successively installed on the auxiliary pipelines. One side of the ultra-high vacuum valve 16 is connected to a measurement chamber 17 through a pipeline. One side of the measurement chamber 17 is connected to the sample chamber 18 of the sample chamber heating oven 20 through a pipeline. A sample transfer device 19 is installed in the sample chamber heating oven 20. A quadrupole mass spectrometer 21 is installed on the measurement chamber 17. An ultra-high vacuum ionization gauge 22 is installed on one side of the measurement chamber 17 where the quadrupole mass spectrometer 21 is located. The sample transfer device 19 includes a track 26 provided at the bottom end, a sample heating platform 23 slidably connected to the track 26, a magnet 28 installed at one end of the sample heating platform 23, and a limit block 29 installed at one end of the track 26.

[0017] An ultra-high vacuum system oven 24 that can be lifted is installed outside the ultra-high vacuum valve 16, the measurement chamber 17, the quadrupole mass spectrometer 21 and the ultra-high vacuum ionization gauge 22, facilitating the lifting use of the ultra-high vacuum system oven 24.

[0018] A vacuum line heating sleeve 25 is installed outside the ultra-high vacuum vent valve 6, ultra-high vacuum fine adjustment valve 7, gas mass flow meter 8, high vacuum inlet valve 9, gas storage tank 10, ultra-high vacuum stop valve 13, ultra-high vacuum ionization gauge 14 and conductance measuring device 15 for convenient heating use.

[0019] An electromagnetic control device 27 for controlling the magnet 28 is installed on the sample transfer device 19 to facilitate the coordinated control of the magnet 28.

[0020] The sample heating platform 23 is provided with a sealing structure corresponding to the open end of the ultra-high vacuum system oven 24. When the ultra-high vacuum system oven 24 is lowered onto the sample heating platform 23, the open end of the ultra-high vacuum system oven 24 is hermetically connected to the platform for convenient connection and sealing.

[0021] The gas storage tank 10 stores calibration gas under a certain pressure for convenient calibration.

[0022] The inlet end of the first molecular pump is the inlet end of the pumping device; the outlet end of the first molecular pump is connected to the inlet end of the second molecular pump; the outlet end of the second molecular pump is connected to the inlet end of the mechanical pump through a foreline valve; a resistance gauge is connected between the second molecular pump and the foreline valve;

[0023] The gas calibration inlet device includes a gas storage tank and a gas mass flow meter; the inlet end of the gas mass flow meter is connected to the gas storage tank through an inlet valve; the outlet end of the gas mass flow meter is connected to one end of the ultra-high vacuum fine adjustment valve, and the other end of the ultra-high vacuum fine adjustment valve is the outlet end of the gas calibration inlet device; the outlet end of the gas calibration inlet device is connected to the inlet end of the first molecular pump, and an ultra-high vacuum vent valve is also connected to the outlet end of the gas calibration inlet device; a heating sleeve is provided outside the gas calibration inlet device;

[0024] The gas storage tank of the gas calibration inlet device is also connected to a gas cylinder through a pressure relief valve;

[0025] The inlet end of the gas calibration inlet device is connected to a conductance unit; the conductance unit includes an ultra-high vacuum stop valve and a conductance; the ultra-high vacuum stop valve is connected between the inlet end and the outlet end of the conductance; an ultra-high vacuum ionization gauge is connected to the outlet end of the conductance; the outlet end of the conductance is connected to the inlet end of the first molecular pump; a heating sleeve is provided outside the conductance unit;

[0026] The measurement chamber is located on the platform and is sealed; the measurement chamber is connected to the inlet end of the conductance through an ultra-high vacuum valve; the measurement chamber is also connected to a quadrupole mass spectrometer and an ultra-high vacuum ionization gauge; a liftable first oven is provided outside the test device; the bottom surface of the first oven is provided with an opening, and when the first oven is lowered onto the platform, the opening of the first oven is hermetically connected to the platform;

[0027] The sample chamber is located on the platform and is airtight; the sample chamber is connected to the measurement chamber through an airtight channel; the outside of the sample chamber is covered with a second oven;

[0028] The sample chamber is provided with a housing made of glass material;

[0029] The sample transfer device includes a track, a sample heating platform and an electromagnetic control device; the track passes through the airtight channel, and both ends of the track are respectively in the measurement chamber and the sample chamber, and the track is fixed in the vacuum pipeline by welding or other means; the sample heating platform is slidably connected to the track; the electromagnetic control device is at the end of the track and is located outside the measurement chamber and the sample chamber; the sample heating platform is connected to the electromagnetic control device through a non-contact magnetic coupling mechanism;

[0030] Blocking structures are provided at both ends of the track, and the track is made of materials such as ceramics, quartz glass, and metal

[0031] The heating platform is made of a magnetic metal material, which can be made of materials such as kovar alloy, nickel, iron, and cobalt.

[0032] It also includes a heating device; the heating device is a high-frequency induction heating device sleeved outside the housing of the measurement chamber; or an infrared heating device facing the housing of the measurement chamber; or a heating sheet device externally placed outside the measurement chamber;

[0033] Temperature measuring devices are installed in both the measurement chamber and the sample chamber.

[0034] The ultra-high vacuum stop valve, conductance valve, ultra-high vacuum fine adjustment valve, and ultra-high vacuum bleed valve are all all-metal manual control valves.

[0035] The gas cylinder stores calibration gas under a certain pressure state.

[0036] It also includes an upper industrial control computer;

[0037] The temperature measuring device is an electronic temperature sensor, and its data output terminal is connected to the data input terminal of the industrial control computer;

[0038] The ultra-high vacuum ionization gauge is an electronic ultra-high vacuum ionization gauge, and the ultra-high vacuum ionization meter is an electronic ultra-high vacuum ionization meter, and their data output terminals are connected to the data input terminal of the industrial control computer;

[0039] The resistance gauge is an electronic resistance gauge vacuum gauge, and the data output terminal of the resistance gauge vacuum gauge is connected to the data input terminal of the industrial control computer;

[0040] The gas mass flowmeter is an electronic gas mass flowmeter, and its data output terminal is connected to the data input terminal of the industrial control computer;

[0041] The pre-stage valve described above is an electromagnetic pneumatic valve, and its control signal input terminals are all connected to the control signal output terminals of the industrial control computer;

[0042] The signals of the heating device and the controllers of the two molecular pumps are all connected to the control signal output terminals of the industrial control computer;

[0043] The control signal input terminals of the temperature controllers of the first oven, the second oven and the heating jacket are all connected to the control signal output terminals of the industrial control computer;

[0044] The switch input signal of the mechanical pump is connected to the signal output terminal of the industrial control computer;

[0045] The switch input signals of the lifting mechanism of the second oven are all connected to the signal output terminal of the industrial control computer.

[0046] Working principle: When the present utility model is in use, the material sample to be measured is fixedly placed on the magnetic tray of the magnetic sample transfer device 19.

[0047] Turn on the mechanical pump 1, the pre-stage valve 3, the ultra-high vacuum cut-off valve 13 and the ultra-high vacuum valve 16 to pre-pump the vacuum measurement system.

[0048] When the vacuum degree of the measurement system is better than 10 Pa (read by the resistance gauge 5), turn on the first molecular pump 2 and the second molecular pump 4 to pump the vacuum of the measurement system;

[0049] When the vacuum degree is better than 5×10 -4 Pa (read by the ultra-high vacuum ionization gauge 22), lower the ultra-high vacuum system oven 24, set the heating curve, slowly heat up to 300 °C, and keep warm for 10 hours to bake and degas the vacuum system and the sample chamber. At the same time, the vacuum pipeline heating jacket 25 also bakes and degasses the intake pipeline, and the degassing temperature is 150 °C.

[0050] After baking, turn off the power supply of the ultra-high vacuum system oven 24, slowly raise the ultra-high vacuum system oven 24 stage by stage until the temperature of the measurement chamber drops to 120 degrees Celsius, fully raise the ultra-high vacuum system oven 24, and after cooling to room temperature, through the sample magnetic drive mechanism 19, transfer the material sample from the sample chamber 18 to the measurement chamber 17 by magnetic drive. At this time, turn on the power supply of the sample chamber heating oven 20 to bake and degas the sample chamber 18. The baking temperature is 450 °C. After baking for 4 hours, turn off the power supply of the sample chamber heating oven 20 and the power supply of the heating jacket 25, and cool the sample chamber 18 to room temperature.

[0051] Continue to degas the vacuum measurement system until the background ultimate vacuum reaches the test requirements.

[0052] Ionize and degas the ultra-high vacuum ionization gauge 14, the ultra-high vacuum ionization gauge 22, and the quadrupole mass spectrometer 21.

[0053] After degassing is completed, close the ultra-high vacuum valve 16 and measure the leak rate of the vacuum system.

[0054] Open the ultra-high vacuum valve 16 and close the ultra-high vacuum stop valve 13. When the background vacuum degree of the vacuum measurement system reaches the ultimate vacuum, turn on the quadrupole mass spectrometer 21, record the data of the quadrupole mass spectrometer 21, the ultra-high vacuum ionization gauge 22, and the ultra-high vacuum ionization gauge 14, and obtain the outgassing types of the background vacuum. Substitute the correction coefficients of different gases to calculate the partial pressures of each gas component in the vacuum system. Multiply the pressure difference across the conductance measurement device 15 by the conductance to obtain the outgassing rate of the background vacuum. Through substitution and calculation of the partial pressures, obtain the outgassing rates of different gases in the background. The above data is used as correction data.

[0055] According to the test requirements, turn on the sample heating platform 23 to heat the sample. At this time, record the data that continuously changes with time measured by the quadrupole mass spectrometer 21 and the ultra-high vacuum ionization gauge 22. Through these data, obtain the outgassing types of the sample, calculate the partial pressures of each gas component released by the sample, multiply the pressure difference across the conductance measurement device 15 by the conductance value to obtain the outgassing rate of the sample at a certain temperature. Through substitution and calculation of the partial pressures, obtain the outgassing rates of different gases in the background. Multiply the average value of the pressure difference across the conductance at a certain data change time by the conductance value and then by a certain time to obtain the outgassing amount of the sample within a certain data change time. Integrate the gas amounts in different time periods to obtain the total outgassing amount. Then, through data correction, the outgassing gas components, outgassing rate, total outgassing amount, outgassing rates and outgassing amounts of different gases of the sample can be obtained, and curves can be plotted.

[0056] Mechanical pump 1, first molecular pump 2, foreline valve 3, second molecular pump 4, resistance gauge 5, ultra-high vacuum vent valve 6, ultra-high vacuum fine adjustment valve 7, gas mass flowmeter 8, high vacuum inlet valve 9, gas storage tank 10, pressure relief valve 11, gas cylinder 12, ultra-high vacuum stop valve 13, ultra-high vacuum ionization gauge 14, conductance measurement device 15, ultra-high vacuum valve 16, measurement chamber 17, sample chamber 18, sample transfer device 19, sample chamber heating oven 20, quadrupole mass spectrometer 21, ultra-high vacuum ionization gauge 22, sample heating platform 23, ultra-high vacuum system oven 24, vacuum pipeline heating sleeve 25, track 26, electromagnetic control device 27, magnet 28, and limit block 29.

[0057] Beneficial effects: The structure of the present utility model is novel and ingeniously conceived. The dynamic conductance method is adopted to qualitatively and quantitatively analyze the outgassing performance of materials, mainly testing the types of outgassing, outgassing rate, outgassing amounts of different gases, and the total outgassing amount of the materials. The system is suitable for computer automatic data acquisition and processing, and can collect the changing data of the ultra-high vacuum ionization gauge and the quadrupole mass spectrometer in a short time, and obtain the measurement results through calculation and processing. This system can also conduct outgassing performance tests on micro-vacuum electronic components during operation, and can measure the performance and outgassing characteristics of devices such as MEMS devices and semiconductor packaging devices when operating at different vacuum degrees and different temperatures. The main components are composed of an ultra-high vacuum pumping system, an intake system, a vacuum sample chamber, a vacuum measurement chamber, a quadrupole mass spectrometer, an ultra-high vacuum ionization gauge, a sample magnetic drive mechanism, multiple heating devices, and an auxiliary electrical control unit. The overall vacuum pipeline and vacuum chamber of the system are made of 316L stainless steel material, and the interfaces are all sealed with vacuum knife-edge flanges, and the ultimate vacuum is better than 5×10 -8 Pa; The system uses a gas mass flowmeter to micro-control the intake of gas and precisely control the vacuum degree of the vacuum system. By using the magnetic drive mechanism to transfer and switch the sample between the drive mechanism chamber and the sample chamber, the heater can be switched to bake and degas all the backgrounds of the vacuum chamber, improving the background vacuum degree.

[0058] Those skilled in the art should connect all the electrical components in this case to their adapted power supplies through wires, and should select appropriate controllers and encoders according to the actual situation to meet the control requirements. For the specific connection and control sequence, reference should be made to the sequence of operation of each electrical component in the following working principle to complete the electrical connection. The detailed connection means are well-known techniques in the art. The following mainly introduces the working principle and process, and no further description of the electrical control will be made.

[0059] Finally, it should be noted that the above are only the preferred embodiments of the present utility model and are not used to limit the present utility model. Although the present utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions recorded in the foregoing embodiments, or perform equivalent replacements for some of the technical features. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present utility model shall be included within the protection scope of the present utility model.

Claims

1. A test device for measuring the degassing performance of vacuum materials, comprising a mechanical pump (1), a first molecular pump (2), a front valve (3), a second molecular pump (4), a resistance gauge (5), an ultra-high vacuum degassing valve (6), an ultra-high vacuum fine-tuning valve (7), a gas mass flow meter (8), a high vacuum inlet valve (9), a gas storage tank (10), a decompression valve (11), a gas cylinder (12), an ultra-high vacuum stop valve (13), an ultra-high vacuum ionization gauge (14), a flow conductance measuring device (15), an ultra-high vacuum valve (16), a measuring chamber (17), a sample chamber (18), a sample conveying device (19), a sample chamber heating oven (20), a quadrupole mass spectrometer (21), an ultra-high vacuum ionization gauge (22), a sample heating platform (23), an ultra-high vacuum system oven (24), a vacuum pipeline heating jacket (25), a track (26), an electromagnetic control device (27), a magnet (28) and a stop block (29), characterized in that: One side of the mechanical pump (1) is connected to a first molecular pump (2) via a pipeline; a front valve (3) is installed on the pipeline between the mechanical pump (1) and the first molecular pump (2); one side of the first molecular pump (2) is connected to a second molecular pump (4) via a pipeline; a resistance gauge (5) is installed on the pipeline between the front valve (3) and the first molecular pump (2); one side of the second molecular pump (4) is connected to an ultra-high vacuum fine-tuning valve (7) and an ultra-high vacuum stop valve (13) via pipelines, respectively; An ultra-high vacuum deflation valve (6) is installed on the pipeline at the front end of the air fine-tuning valve (7), a gas mass flow meter (8) is connected to the rear end of the ultra-high vacuum fine-tuning valve (7) through a pipeline, a high vacuum air intake valve (9) is connected to one side of the gas mass flow meter (8) through a pipeline, a gas storage tank (10) is connected to one side of the high vacuum air intake valve (9) through a pipeline, a decompression valve (11) is connected to one side of the gas storage tank (10) through a pipeline, and a gas cylinder (12) is connected to one side of the decompression valve (11) through a pipeline. ), one end of the ultra-high vacuum stop valve (13) is connected to an ultra-high vacuum valve (16) through a pipeline, both sides of the ultra-high vacuum stop valve (13) are connected to auxiliary pipelines, and an ultra-high vacuum ionization gauge (14) and a flow conductance measuring device (15) are installed on the auxiliary pipelines in sequence, one side of the ultra-high vacuum valve (16) is connected to a measuring chamber (17) through a pipeline, and one side of the measuring chamber (17) is connected to a sample chamber (18) of a sample chamber heating oven (20) through a pipeline, and the sample chamber heating oven (20) is connected to a sample chamber (18) of a sample chamber heating oven (20). A sample conveying device (19) is installed, a quadrupole mass spectrometer (21) is installed on the measuring chamber (17), an ultra-high vacuum ionization meter (22) is installed on one side of the measuring chamber (17) located on the quadrupole mass spectrometer (21), the sample conveying device (19) comprises a track (26) arranged at the bottom, a sample heating platform (23) slidably connected to the track (26), a magnet (28) is installed at one end of the sample heating platform (23), and a limit block (29) is installed at one end of the track (26).

2. A test device for measuring the degassing performance of vacuum materials according to claim 1, characterized in that: An ultra-high vacuum system oven (24) that can be raised and lowered is installed outside the ultra-high vacuum valve (16), the measuring chamber (17), the quadrupole mass spectrometer (21) and the ultra-high vacuum ionization meter (22).

3. A test device for measuring the degassing performance of vacuum materials according to claim 1, characterized in that: A vacuum pipeline heating sleeve (25) is installed on the outer sides of the ultra-high vacuum exhaust valve (6), the ultra-high vacuum fine-tuning valve (7), the gas mass flow meter (8), the high vacuum intake valve (9), the gas storage tank (10), the ultra-high vacuum stop valve (13), the ultra-high vacuum ionization gauge (14) and the conductance measuring device (15).

4. A test device for measuring the degassing performance of vacuum materials according to claim 1, characterized in that: The sample conveying device (19) is equipped with an electromagnetic control device (27) for controlling the magnet (28).

5. A test device for measuring the degassing performance of vacuum materials according to claim 2, characterized in that: The sample heating platform (23) is provided with a sealing structure corresponding to the opening end of the ultra-high vacuum system oven (24); when the ultra-high vacuum system oven (24) is lowered onto the sample heating platform (23), the opening end of the ultra-high vacuum system oven (24) is tightly connected to the platform.

6. A test device for measuring the degassing performance of vacuum materials according to claim 1, characterized in that: The gas storage tank (10) stores calibration gas under a certain pressure.

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