Polishing head of polishing equipment and polishing equipment

Abstract

The polishing head of the polishing equipment comprises a polishing head body and a vacuum adsorption assembly, the vacuum adsorption assembly comprises a movable hole plate and an air film, the movable hole plate is arranged in the air film, the air film comprises a bottom film part, a first side film part and an inclined film part, the first side film part is circumferentially arranged on the outer side wall of the movable hole plate in a surrounding mode, and the inclined film part is arranged on the outer side wall of the movable hole plate. The inclined film part is connected between the bottom film part and the first side film part. Therefore, the inclined film part is obliquely arranged relative to the bottom film part and the first side film part, and the bottom film part protrudes outwards in the radial direction relative to the first side film part, so that the diameter of the bottom film part can be increased, the diameter of the bottom film part can be larger than that of an adsorbed material, and the bottom film part can fully cover the material; and the friction trace defect of the side, away from the polishing disc, of the material and the bottom film part due to the fact that the polishing liquid enters the space between the bottom film part and the material in the polishing process is avoided, and therefore the quality of the polished material can be improved.

Description

Technical Field

[0001] The utility model relates to the technical field of polishing, in particular to a polishing head of a polishing device and a polishing device. Background Art

[0002] With the progress of technology, the polishing technology is also constantly developing. The polishing technology is a processing method used to improve the surface quality of materials. It can remove minute unevenness, scratches or oxide layers on the material surface, thereby making the material surface smooth and flat.

[0003] In the related art, the polishing device is a single-sided polishing device. It adsorbs the wafer by using a polishing head with an air film and applies pressure to press the wafer onto the polishing platen for polishing. However, during the polishing process, friction mark defects will be generated on the back side of the wafer, which hinders the application of the single-sided polishing device in wafer polishing. Summary of the Utility Model

[0004] The utility model aims to solve at least one of the technical problems existing in the prior art. For this purpose, an object of the utility model is to provide a polishing head of a polishing device, and the reliability of the polishing head of the polishing device is relatively good, which can avoid the generation of friction mark defects on the side of the material away from the polishing platen.

[0005] The utility model further provides a polishing device.

[0006] To achieve the above object, according to an embodiment of the utility model, a polishing head of a polishing device is provided, including: a polishing head body; a vacuum adsorption assembly, the vacuum adsorption assembly is arranged at the bottom of the polishing head body, the vacuum adsorption assembly includes a moving hole plate and an air film, the moving hole plate is arranged in the air film to be supported and attached to the air film, the air film includes a bottom film part, the bottom film part is arranged at the bottom of the moving hole plate, a vacuum channel is arranged in the moving hole plate, and the bottom film part is adapted to adsorb the material; a first side film part, the first side film part is circumferentially arranged around the outer side wall of the moving hole plate, the first side film part and the bottom film part are axially spaced, and the bottom film part protrudes radially outward relative to the first side film part; an inclined film part, the inclined film part is connected between the bottom film part and the first side film part, and the inclined film part is inclined relative to both the bottom film part and the first side film part.

[0007] Thus, by connecting the inclined film portion between the bottom film portion and the first side film portion, the inclined film portion is inclined relative to both the bottom film portion and the first side film portion, and the bottom film portion is radially outwardly convex relative to the first side film portion. In this way, the diameter of the bottom film portion can be increased, so that the diameter of the bottom film portion is larger than the diameter of the adsorbed material, enabling the bottom film portion to fully cover the material and preventing polishing liquid from entering between the bottom film portion and the material during the polishing process, which may cause friction mark defects on the side of the material away from the polishing disc and the bottom film portion. Therefore, the structural reliability of the polishing head can be improved, and the quality of the polished material can be enhanced.

[0008] According to some embodiments of the present invention, an included angle α is formed between the inclined film portion and the bottom film portion, and α is an acute angle.

[0009] According to some embodiments of the present invention, α satisfies the relational expression: 20° ≤ α ≤ 70°.

[0010] According to some embodiments of the present invention, the air film is at least one of a silicone rubber air film and a fluororubber air film.

[0011] According to some embodiments of the present invention, the polishing head of the polishing equipment further includes a retaining ring, the retaining ring is disposed at the bottom of the polishing head body, and the retaining ring is disposed around the outer periphery of the air film and circumferentially presses the air film.

[0012] According to some embodiments of the present invention, the polishing head of the polishing equipment further includes a fixing ring, the air film further includes a first top film portion, the first top film portion is disposed on the side of the first side film portion axially away from the bottom film portion and above the moving hole plate, and the fixing ring is disposed on the first top film portion and axially presses the first top film portion.

[0013] According to some embodiments of the present invention, the polishing head of the polishing equipment further includes a fixing ring, the air film further includes a first top film portion, a second side film portion, and a second top film portion. The first top film portion is disposed on the side of the first side film portion axially away from the bottom film portion, the fixing ring is disposed on the first top film portion and axially presses the first top film portion, the second side film portion is connected to the first top film portion and is parallel to the first side film portion, the second top film portion is connected to the second side film portion and is parallel to the first top film portion, the second top film portion extends into the space between the polishing head body and the retaining ring, and the retaining ring is in extrusion fit with the second top film portion.

[0014] According to an embodiment of the present invention, a polishing equipment is provided, including: the polishing head of the above-described polishing equipment.

[0015] Additional aspects and advantages of the present utility model will be given in part in the following description, become apparent in part from the following description, or be learned through the practice of the present utility model. Description of the Drawings

[0016] The above and / or additional aspects and advantages of the present utility model will become apparent and be readily understood from the following description of embodiments in conjunction with the accompanying drawings, in which:

[0017] Figure 1 is a partial schematic view of a polishing device according to an embodiment of the present utility model;

[0018] Figure 2 is a schematic view of a polishing head of a polishing device according to an embodiment of the present utility model;

[0019] Figure 3 is a cross-sectional view of a polishing head according to the first embodiment of the present utility model;

[0020] Figure 4 is a partial cross-sectional view of an air film according to the first embodiment of the present utility model;

[0021] Figure 5 is a cross-sectional view of a polishing head according to the second embodiment of the present utility model;

[0022] Figure 6 is a partial cross-sectional view of an air film according to the second embodiment of the present utility model.

[0023] Reference Signs:

[0024] 100, polishing device;

[0025] 10, polishing head; 11, polishing head body; 111, air passage; 12, vacuum adsorption assembly; 121, moving hole plate; 1211, vacuum channel; 122, air film; 1221, bottom film part; 1222, first side film part; 1223, inclined film part; 1224, first top film part; 1225, second side film part; 1226, second top film part; 1227, second air film part; 13, retaining ring; 14, fixing ring;

[0026] 20, polishing disc; 30, polishing liquid delivery pipeline; 40, material. Detailed Description of the Embodiment

[0027] Embodiments of the present utility model will be described in detail below. The embodiments described with reference to the accompanying drawings are exemplary. Embodiments of the present utility model will be described in detail below.

[0028] Reference will be made below to Figures 1-6Describe the polishing head 10 of the polishing device 100 according to an embodiment of the present utility model. The polishing head 10 of the polishing device 100 can be applied to the polishing device 100.

[0029] Combined with Figures 1-6 As shown, the polishing head 10 according to an embodiment of the present utility model may mainly include: a polishing head body 11 and a vacuum adsorption assembly 12. The vacuum adsorption assembly 12 is disposed at the bottom of the polishing head body 11. The vacuum adsorption assembly 12 includes a moving hole plate 121 and an air film 122. The moving hole plate 121 is disposed within the air film 122 to be supported and attached to the air film 122. The air film 122 includes a bottom film portion 1221. The bottom film portion 1221 is disposed at the bottom of the moving hole plate 121. A vacuum channel 1211 is provided within the moving hole plate 121. The bottom film portion 1221 is adapted to adsorb the material 40; a first side film portion 1222, the first side film portion 1222 is circumferentially disposed around the outer sidewall of the moving hole plate 121. The first side film portion 1222 and the bottom film portion 1221 are axially spaced apart. The bottom film portion 1221 protrudes radially outward relative to the first side film portion 1222; an inclined film portion 1223, the inclined film portion 1223 is connected between the bottom film portion 1221 and the first side film portion 1222. The inclined film portion 1223 is inclined relative to both the bottom film portion 1221 and the first side film portion 1222.

[0030] Specifically, the vacuum adsorption assembly 12 is disposed at the bottom of the polishing head body 11. During the process of polishing the material 40 by the polishing device 100, first, it is necessary to use the vacuum adsorption assembly 12 to adsorb the material 40 and press the material 40 onto the polishing disc 20. After starting the polishing, both the polishing head 10 and the polishing disc 20 rotate around their own rotation axes. The polishing liquid delivery pipeline 30 will deliver the corrosive polishing liquid to the polishing disc 20, so that the material 40 becomes soft due to the corrosion of the polishing liquid. Furthermore, the relative friction between the material 40 and the polishing disc 20 will remove the softened material on the material 40, thereby realizing the polishing of the material 40.

[0031] Furthermore, the vacuum adsorption assembly 12 may mainly include a moving hole plate 121 and an air film 122. The moving hole plate 121 is disposed within the air film 122 to be supported and attached to the air film 122. In this way, not only can the pressure on the attachment surface be evenly distributed and a stable supporting force be provided for the air film 122, but also the structure of the vacuum adsorption assembly 12 can be made simpler and more reliable.

[0032] Furthermore, the air film 122 includes a bottom film portion 1221, a first side film portion 1222, and an inclined film portion 1223.

[0033] Among them, the bottom film part 1221 is arranged at the bottom of the moving hole plate 121. A vacuum channel 1211 is arranged in the moving hole plate 121, and the bottom film is suitable for adsorbing the material 40. Specifically, a vacuum channel 1211 is arranged in the moving hole plate 121. By adjusting the air pressure through the vacuum channel 1211 to adsorb the air film 122, a hemispherical concave deformation is generated at the bottom of the air film 122, forming a local vacuum with the material 40, and generating an adsorption effect on the material 40. In this way, it can ensure that the adsorption of the vacuum adsorption assembly 12 to the material 40 is more stable and reliable.

[0034] Furthermore, the first side film part 1222 is circumferentially arranged around the outer side wall of the moving hole plate 121, and the bottom film part 1221 is arranged at the bottom of the moving hole plate 121. Specifically, the first side film part 1222 is vertically arranged and circumferentially arranged around the outer side wall of the moving hole plate 121. The bottom film part 1221 is horizontally arranged at the bottom of the moving hole plate 121 and is connected to the first side film part 1222. The bottom film part 1221 and the first side film part 1222 provide a fixing surface for the moving hole plate 121, and jointly realize the fixation of the moving hole plate 121. In this way, it can ensure the stable and reliable structure setting of the moving hole plate 121.

[0035] Furthermore, the first side film part 1222 and the bottom film part 1221 are arranged at intervals in the axial direction. The bottom film part 1221 protrudes radially outward relative to the first side film part 1222. The inclined film part 1223 is connected between the bottom film part 1221 and the first side film part 1222. The inclined film part 1223 is inclined relative to both the bottom film part 1221 and the first side film part 1222, and the inclined film part 1223 is respectively connected to the bottom film part 1221 and the first side film part 1222. In this way, it can not only ensure the continuity and rationality of the structure setting of the air film 122, ensure the integrity of the structure of the air film 122, but also make the diameter of the bottom film part 1221 larger than the outer diameter of the first side film part 1222. When the bottom film part 1221 adsorbs the material 40, the bottom film part 1221 can fully cover the material 40, avoiding the polishing liquid from entering between the bottom film part 1221 and the material 40 during the polishing process, resulting in friction mark defects on the side of the material 40 away from the polishing disc 20 and the bottom film part 1221. Therefore, it can not only improve the structural reliability of the polishing head 10, improve the yield rate of the material 40, but also extend the service life of the polishing head 10.

[0036] It should be noted that in the prior art, usually the size of the material 40 adsorbed by the bottom film part 1221 is greater than or equal to the size of the first side film part 1222, or the material 40 partially protrudes from the first side film part 1222 due to position deviation. This will cause the polishing liquid to enter between the bottom film part 1221 and the material 40 during the polishing process, resulting in friction mark defects on the side of the material 40 away from the polishing disc 20 and the bottom film part 1221.

[0037] Thus, by connecting the inclined film portion 1223 between the bottom film portion 1221 and the first side film portion 1222, the inclined film portion 1223 is inclined relative to both the bottom film portion 1221 and the first side film portion 1222, and the bottom film portion 1221 protrudes radially outward relative to the first side film portion 1222. In this way, the diameter of the bottom film portion 1221 can be increased, so that the diameter of the bottom film portion 1221 is larger than the diameter of the adsorbed material 40, enabling the bottom film portion 1221 to fully cover the material 40 and preventing polishing liquid from entering between the bottom film portion 1221 and the material 40 during the polishing process, which may cause friction mark defects on the side of the material 40 away from the polishing disc 20 and the bottom film portion 1221. Therefore, the structural reliability of the polishing head 10 can be improved, and the quality of the polished material 40 can be enhanced.

[0038] In some embodiments of the present invention, an air passage 111 is provided in the polishing head main body 11, and the air passage 111 communicates with the vacuum passage 1211. During the adsorption of the material 40, a vacuum generator is externally connected to the polishing head 10, and the negative pressure generated by the vacuum generator is conveyed to the vacuum passage 1211 through the air passage 111, thereby realizing the adsorption of the air film 122. In this way, the structural reliability of the polishing head 10 can be ensured.

[0039] Combined with Figure 4 and Figure 6As shown, an included angle α is formed between the inclined film portion 1223 and the bottom film portion 1221, and α is an acute angle. Specifically, the inclined film portion 1223 is inclined relative to both the bottom film portion 1221 and the first side film portion 1222, so that an included angle is formed between the inclined film portion 1223 and the bottom film portion 1221, and this included angle needs to be an acute angle. In this way, it can be ensured that the diameter of the bottom film portion 1221 is larger than the outer diameter of the first side film portion 1222, so that the bottom film portion 1221 can fully cover the material 40, avoiding the polishing liquid from entering between the bottom film portion 1221 and the material 40 during the polishing process, and resulting in friction mark defects on the side of the material 40 away from the polishing disc 20 and the bottom film portion 1221. If this included angle is an obtuse angle, the diameter of the bottom film portion 1221 is smaller than the outer diameter of the first side film portion 1222; if this included angle is a right angle, the diameter of the bottom film portion 1221 is equal to the outer diameter of the first side film portion 1222. In these two cases, when the bottom film portion 1221 adsorbs the material 40 with the same size as the first side film portion 1222, it will cause the bottom film portion 1221 to not fully cover the material 40, or cause a poor adsorption effect of the bottom film portion 1221 on the material 40, so that it is necessary to replace the polishing head 10 or the polishing equipment 100 to meet the user's usage requirements. Therefore, by making the included angle formed between the inclined film portion 1223 and the bottom film portion 1221 an acute angle, this can not only help the bottom film portion 1221 to fully cover the material 40, improve the practicability of the polishing head 10, improve the adsorption and polishing effects of the polishing head 10 on the material 40, but also contribute to the subsequent improvement of the structure of the polishing head 10 and help save the production cost of the polishing head 10.

[0040] Combined with Figure 4 and Figure 6 As shown, α satisfies the relationship: 20° ≤ α ≤ 70°. Specifically, if the included angle formed between the inclined film portion 1223 and the bottom film portion 1221 is less than 20°, it will cause the protruding part structure of the bottom film portion 1221 relative to the first side film portion 1222 to be unstable, thus affecting the adsorption effect of the bottom film portion 1221 on the material 40; if the included angle formed between the inclined film portion 1223 and the bottom film portion 1221 is greater than 70°, it will cause the structural characteristics of the air film 122 to be not obvious, the inclination degree of the inclined film portion 1223 is small, and the polishing liquid may enter between the bottom film portion 1221 and the material 40, resulting in friction mark defects on the side of the material 40 away from the polishing disc 20 and the bottom film portion 1221. Therefore, making the included angle formed between the inclined film portion 1223 and the bottom film portion 1221 between 20° and 70°, and including 20° and 70°, can not only improve the stability and reliability of the air film 122 structure, improve the adsorption effect of the air film 122 on the material 40, but also ensure that the bottom film portion 1221 can fully cover the material 40, avoid the polishing liquid from entering between the bottom film portion 1221 and the material 40, so that friction mark defects do not appear on the side of the material 40 away from the polishing disc 20 and the bottom film portion 1221, in order to improve the yield rate of the material 40 and extend the service life of the polishing head 10.

[0041] Combined Figure 3 and Figure 5 As shown, the diameter of the bottom film part 1221 is larger than that of the moving hole plate 121, and the inclined film part 1223 is spaced from the moving hole plate 121. Specifically, the inner side wall of the air film 122 provides a fixing surface for the moving hole plate 121. The diameter of the bottom film part 1221 is larger than that of the moving hole plate 121. By setting the inclined film part 1223 to be spaced from the moving hole plate 121, the normal setting of the fixing surface of the moving hole plate 121 can be ensured, the influence of the setting of the inclined film part 1223 on the structural setting of the fixing surface of the moving hole plate 121 can be avoided, the stability and reliability of the structural setting of the moving hole plate 121 can be ensured, and it helps to optimize the structural design of the polishing head 10.

[0042] Combined Figure 3 、 Figure 4 、 Figure 5 and Figure 6 As shown, the air film 122 is at least one of a silicone rubber air film and a fluororubber air film. Specifically, the air film 122 is selectively set as silicone rubber or fluororubber, which can not only further improve the stability and durability of the air film 122, but also further improve the quality of the material 40 after the polishing equipment 100 finishes polishing the material 40, thereby improving the yield rate of the material 40.

[0043] Combined Figure 1 、 Figure 2 、 Figure 3 and Figure 5 As shown, the polishing head 10 of the polishing equipment 100 further includes a retaining ring 13. The retaining ring 13 is arranged at the bottom of the polishing head main body 11, and the retaining ring 13 surrounds the outer periphery of the air film 122 and circumferentially presses the air film 122. Specifically, by arranging the retaining ring 13 at the bottom of the polishing head main body 11, the retaining ring 13 surrounds the outer periphery of the air film 122, and the retaining ring 13 circumferentially presses the air film 122. During the process of the polishing disc 20 polishing the material 40, the air film 122 is pressurized through the vacuum channel 1211, so as to press against the material 40 to grind and polish the material 40. The retaining ring 13 can be arranged around the circumferential outer side of the material 40 to limit the material 40 and prevent the material 40 from moving, so as to ensure the relative stability of the position of the material 40. In this way, the stability and reliability of the polishing head 10 for grinding and polishing the material 40 can be improved.

[0044] Combined Figure 3 and Figure 4As shown, the polishing head 10 of the polishing device 100 further includes a fixing ring 14, and the air film 122 further includes a first top film portion 1224. The first top film portion 1224 is disposed on a side of the first side film portion 1222 axially away from the bottom film portion 1221 and is located above the moving hole plate 121. The fixing ring 14 is disposed on the first top film portion 1224 and axially presses the first top film portion 1224.

[0045] Specifically, by disposing the first top film portion 1224 on a side of the first side film portion 1222 axially away from the bottom film portion 1221 and making the first top film portion 1224 located above the moving hole plate 121, the stability of the fixation of the air film 122 can be further improved, preventing the air film 122 from falling off and causing the adsorption effect of its bottom film portion 1221 on the material 40 to fail.

[0046] Furthermore, by disposing the fixing ring 14 on the first top film portion 1224 and axially pressing the first top film portion 1224 by the fixing ring 14 to fix the first top film portion 1224 on the moving hole plate 121, the first top film portion 1224 is located between the moving hole plate 121 and the fixing ring 14. The fixing ring 14 and the moving hole plate 121 respectively limit and fix the first top film portion 1224 on the inner side wall and the outer side wall of the first top film portion 1224, thereby preventing the air film 122 from moving or falling off during the polishing process of the polishing device 100, and further improving the structural reliability of the polishing head 10 of the polishing device 100.

[0047] Combined Figure 3 and Figure 4 As shown, in the first embodiment of the present utility model, the outer periphery of the second air film portion 1227 is pressed and fixed on the polishing head main body 11 by the retaining ring 13, and the inner ring of the second air film portion 1227 is fixed on the lower fixing ring 14 by the upper fixing ring 14, realizing the sealing of the air film 122 chamber. The air film 122 is fixed on the moving hole plate 121 by the lower fixing ring 14. The moving hole plate 121 is fixed inside the air film 122 to provide support for the air film 122. The moving hole plate 121 is used to provide a gas pressure and vacuum channel 1211, and the material 40 is fixed on the bottom film portion 1221 of the air film 122 by vacuum adsorption.

[0048] In addition, the air film 122 includes a first top film portion 1224, a first side film portion 1222, an inclined film portion 1223, and a bottom film portion 1221, and the first top film portion 1224, the first side film portion 1222, the inclined film portion 1223, and the bottom film portion 1221 are connected in sequence. The first top film portion 1224 provides fixation and sealing for the air film 122, and the inner side walls of the first side film portion 1222 and the bottom film portion 1221 provide a fixing surface for the moving hole plate 121. The inclined film portion 1223 is connected to the first side film portion 1222 and the bottom film portion 1221, and the inclined film portion 1223 inclines away from the moving hole plate 121, forming an acute angle between the first side film portion 1222 and the bottom film portion 1221, so that the diameter of the bottom film portion 1221 is larger than the outer diameter of the first side film portion 1222. With such a setting, the bottom film portion 1221 can fully cover the material 40, avoiding the polishing liquid entering between the bottom film portion 1221 and the material 40 during the polishing process, which may cause friction mark defects on the side of the material 40 away from the polishing disc 20 and the bottom film portion 1221.

[0049] In the first embodiment of the present utility model, the polishing head 10 of the polishing device 100 is usually 8 inches.

[0050] Combined Figure 5 and Figure 6 As shown in the figure, the polishing head 10 of the polishing device 100 further includes a fixing ring 14, and the air film 122 further includes a first top film portion 1224, a second side film portion 1225, and a second top film portion 1226. The first top film portion 1224 is disposed on the side of the first side film portion 1222 axially away from the bottom film portion 1221. The fixing ring 14 is disposed on the first top film portion 1224 and axially presses the first top film portion 1224. The second side film portion 1225 is connected to the first top film portion 1224 and is parallel to the first side film portion 1222. The second top film portion 1226 is connected to the second side film portion 1225 and is parallel to the first top film portion 1224. The second top film portion 1226 extends into the space between the polishing head main body 11 and the retaining ring 13, and the retaining ring 13 is in extrusion fit with the second top film portion 1226.

[0051] Specifically, by disposing the first top film portion 1224 on the side of the first side film portion 1222 axially away from the bottom film portion 1221, and disposing the fixing ring 14 on the first top film portion 1224, and axially pressing the fixing ring 14 against the first top film portion 1224 to fix the first top film portion 1224 on the outer sidewall of the moving hole plate 121, the first top film portion 1224 is located between the moving hole plate 121 and the fixing ring 14. The fixing ring 14 and the moving hole plate 121 respectively limit and fix the first top film portion 1224 on the inner sidewall and the outer sidewall of the first top film portion 1224. In this way, it is possible to prevent the air film 122 from moving or falling off during the polishing process of the polishing device 100, and the stability of the fixation of the air film 122 can be further improved, and the failure of the adsorption effect of the bottom film portion 1221 of the air film 122 on the material 40 due to the air film 122 falling off can be prevented, thereby further improving the structural reliability of the polishing head 10 of the polishing device 100.

[0052] Furthermore, by providing the circumferentially extending second top film portion 1226 and extending the second top film portion 1226 into the space between the polishing head main body 11 and the retaining ring 13, and making the retaining ring 13 be in extrusion fit with the second top film portion 1226, in this way, while the retaining ring 13 axially presses the air film 122 circumferentially, the retaining ring 13 can seal the air film 122, thereby preventing the problem of unstable adsorption of the air film 122 on the material 40 due to air leakage of the air film 122. In this way, not only the structural reliability of the vacuum adsorption assembly 12 can be improved, but also the structural design of the polishing head 10 of the polishing device 100 can be optimized. In addition, the setting of the second side film portion 1225 can not only provide a fixing surface for the fixing ring 14 and the moving hole plate 121, but also connect the first top film portion 1224 and the second top film portion 1226 to ensure the continuity and sealing of the structure of the air film 122.

[0053] Combined Figure 5 with Figure 6 As shown, in the second embodiment of the present invention, the air film 122 is fixed on the polishing head main body 11 by being pressed by the retaining ring 13 to achieve the sealing of the air film 122. The fixing ring 14 presses on the outer sidewall of the air film 122 to fix the air film 122 and the moving hole plate 121 from the outside of the air film 122. The material 40 is fixed at the bottom of the air film 122 by vacuum adsorption.

[0054] In addition, the air film 122 includes a first top film portion 1224, a second top film portion 1226, a first side film portion 1222, a second side film portion 1225, an inclined film portion 1223, and a bottom film portion 1221, and the second top film portion 1226, the second side film portion 1225, the first top film portion 1224, the first side film portion 1222, the inclined film portion 1223, and the bottom film portion 1221 are connected in sequence. The second top film portion 1226 provides fixation and sealing for the air film 122. The inner side walls of the second side film portion 1225, the first top film portion 1224, the first side film portion 1222, and the bottom film portion 1221 provide a fixing surface for the moving hole plate 121. The outer side walls of the second side film portion 1225 and the first top film portion 1224 provide a fixing surface for the fixing ring 14. The inclined film portion 1223 is connected to the first side film portion 1222 and the bottom film portion 1221, and the inclined film portion 1223 inclines away from the moving hole plate 121, forming an acute angle between the first side film portion 1222 and the bottom film portion 1221. Further, the bottom film portion 1221 provides a direct contact surface for pressure and vacuum for the material 40, and the diameter of the bottom film portion 1221 is larger than the outer diameter of the first side film portion 1222. With such a setting, the bottom film portion 1221 can fully cover the material 40, avoiding polishing liquid from entering between the bottom film portion 1221 and the material 40 during the polishing process, which may cause friction mark defects on the side of the material 40 away from the polishing disc 20 and the bottom film portion 1221.

[0055] In the second embodiment of the present utility model, the polishing head 10 of the polishing device 100 is usually 6 inches.

[0056] The polishing device 100 according to the present utility model mainly includes: the polishing head 10 of the above-mentioned polishing device 100. Specifically, by disposing the polishing head 10 of the polishing device 100 in the polishing device 100, the bottom film portion 1221 can fully cover the material 40, avoiding polishing liquid from entering between the bottom film portion 1221 and the material 40 during the polishing process, which may cause friction mark defects on the side of the material 40 away from the polishing disc 20 and the bottom film portion 1221. This can improve the stability and reliability of the polishing of the material 40 by the polishing device 100, improve the quality of the polished material 40, and at the same time extend the service life of the polishing head 10.

[0057] In the description of the present utility model, it should be understood that the orientation or positional relationship indicated by terms such as "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation to the present utility model.

[0058] In the description of this specification, the description with reference to terms such as "one embodiment", "some embodiments", "schematic embodiments", "examples", "specific examples", or "some examples", etc. means that the specific features, structures, materials, or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present utility model. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example.

[0059] Although the embodiments of the present utility model have been shown and described, those of ordinary skill in the art can understand that various changes, modifications, substitutions, and variations can be made to these embodiments without departing from the principles and purposes of the present utility model, and the scope of the present utility model is defined by the claims and their equivalents.

Claims

1. A polishing head for a polishing device, characterized in that: include: Throwing head body (11); A vacuum adsorption component (12), the vacuum adsorption component (12) being arranged at the bottom of the polishing head body (11), the vacuum adsorption component (12) comprising a movable hole plate (121) and an air film (122), the movable hole plate (121) being arranged in the air film (122) so as to support and fit with the air film (122), the air film (122) comprising: A bottom membrane portion (1221), the bottom membrane portion (1221) being arranged at the bottom of the movable hole plate (121), a vacuum channel (1211) being arranged in the movable hole plate (121), and the bottom membrane portion (1221) being suitable for adsorbing materials (40); a first side membrane portion (1222), the first side membrane portion (1222) being circumferentially arranged on the outer side wall of the movable hole plate (121), the first side membrane portion (1222) being spaced apart from the bottom membrane portion (1221) in the axial direction, and the bottom membrane portion (1221) being radially protruding outward relative to the first side membrane portion (1222); An inclined membrane portion (1223), wherein the inclined membrane portion (1223) is connected between the bottom membrane portion (1221) and the first side membrane portion (1222), and the inclined membrane portion (1223) is arranged inclined relative to both the bottom membrane portion (1221) and the first side membrane portion (1222).

2. The polishing head of the polishing equipment according to claim 1, characterized in that: An angle α is formed between the inclined film portion (1223) and the bottom film portion (1221), and α is an acute angle.

3. The polishing head of the polishing equipment according to claim 2, characterized in that: α satisfies the relationship: 20°≤α≤70°.

4. The polishing head of the polishing equipment according to claim 1, characterized in that: The air film (122) is at least one of a silicone rubber air film (122) and a fluororubber air film (122).

5. The polishing head of the polishing equipment according to claim 1, characterized in that: It also comprises a retaining ring (13), wherein the retaining ring (13) is arranged at the bottom of the blasting head body (11), and the retaining ring (13) is arranged around the outer circumference of the air film (122) and presses the air film (122) in a circumferential direction.

6. The polishing head of the polishing equipment according to claim 5, characterized in that: It also includes a fixing ring (14), and the air membrane (122) also includes a first top membrane portion (1224), the first top membrane portion (1224) is arranged on a side of the first side membrane portion (1222) axially away from the bottom membrane portion (1221) and located on the upper side of the movable hole plate (121), and the fixing ring (14) is arranged on the first top membrane portion (1224) and axially presses the first top membrane portion (1224).

7. The polishing head of the polishing equipment according to claim 5, characterized in that: It also includes a fixing ring (14), and the air film (122) also includes a first top film portion (1224), a second side film portion (1225) and a second top film portion (1226), wherein the first top film portion (1224) is arranged on a side of the first side film portion (1222) axially away from the bottom film portion (1221), the fixing ring (14) is arranged on the first top film portion (1224) and axially presses the first top film portion (1224), the second side film portion (1225) is connected to the first top film portion (1224) and is parallel to the first side film portion (1222), the second top film portion (1226) is connected to the second side film portion (1225) and is parallel to the first top film portion (1224), the second top film portion (1226) extends between the polishing head body (11) and the retaining ring (13), and the retaining ring (13) is squeezed and fitted with the second top film portion (1226).

8. A polishing device, characterized in that: include: The polishing head of the polishing equipment according to any one of claims 1 to 7.

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