Spraying plate structure and spraying equipment
By designing a shower plate with an interlaced helical groove structure, the gas flow rate is controlled to achieve different film thickness, the problem of wafer warping and deformation caused by stress in semiconductor manufacturing is solved, and the uniformity and adaptability of the film is improved.
Patent Information
- Application Number
- CN202422259046.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-09-13
- Publication Date
- 2025-06-24
- Estimated Expiration
- 2034-09-13
AI Technical Summary
During semiconductor manufacturing, when the spray plate distributes gas to the semiconductor surface, the thermal expansion coefficients of the film and the substrate are different due to the different thermal expansion coefficients of the film and the substrate, resulting in stress after falling to room temperature, which leads to warping and deformation of the wafer.
A shower plate structure is designed, including an inner circle gas channel and an outer circle gas channel. The inner circle gas channel is composed of two spiral grooves arranged intersected and arranged intersected, and the outer circle gas channel is also composed of two spiral grooves arranged intersected and arranged intersected. Different film thicknesses are achieved by controlling the distribution of the first and second gases at the center and edges at different flow rates.
By changing the thickness of the film at the center and edges, stress can be offset and the problem of wafer warping and deformation can be solved. At the same time, films with thick edges, thin middle edges, and thick middle and edges can be generated to meet different needs.
Smart Images
Figure CN223016963U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of semiconductor processing equipment, in particular to a shower plate structure and a shower device. Background Technique
[0002] The shower plate in semiconductor equipment is usually used in the chemical vapor deposition (CVD) process in semiconductor manufacturing, as well as other process steps that require uniform distribution of gas to the semiconductor surface. It can make the reaction gas and the purifying gas flow into the shower head through the central pipeline and then discharge from the outside of the shower head and the central pipeline to achieve uniform distribution of the gas. Therefore, the shower plate plays a role in transporting and controlling the gas flow rate and uniformly distributing the gas in the semiconductor process equipment, and has an important impact on the efficiency and quality of the semiconductor manufacturing process.
[0003] In the chemical vapor deposition process, when the shower plate distributes the gas onto the semiconductor surface, since the thin film is grown at a high temperature and the thermal expansion coefficients of the thin film and the substrate are different, stress will be generated after cooling to room temperature, so the wafer will warp and deform. Content of the Utility Model
[0004] The embodiments of the utility model provide a shower plate structure and a shower device, aiming to solve the technical problem of wafer warping and deformation caused by stress.
[0005] To solve the above problems, according to one aspect of the present application, the utility model provides a shower plate structure, including a shower plate body and a gas channel arranged on the shower plate body. The gas channel includes an inner ring gas channel and an outer ring gas channel, and the outer ring gas channel is arranged around the inner ring gas channel; the inner ring gas channel includes two first inner spiral grooves and second inner spiral grooves arranged in an interleaved and nested manner, the first inner spiral groove and the second inner spiral groove respectively have a first inner ring air inlet and a second inner ring air inlet, the outer ring gas channel includes two first outer spiral grooves and second outer spiral grooves arranged in an interleaved and nested manner, the first outer spiral groove and the second outer spiral groove respectively have a first outer ring air inlet and a second outer ring air inlet; the first inner ring air inlet and the first outer ring air inlet introduce the first gas at different flow rates, and the second inner ring air inlet and the second outer ring air inlet introduce the second gas at different flow rates.
[0006] In some embodiments, the flow rate V of the first gas introduced into the first inner ring air inlet 内1 , the flow rate V of the first gas introduced into the first outer ring air inlet 外1 , the flow rate V of the second gas passing through the second inner ring air inlet 内2 and the flow rate V of the second gas passing through the second outer ring air inlet 外2 satisfy: V 内1 : V 外1= V 内2 : V 外2 。
[0007] In some embodiments, the gas channels are two first spiral air guide grooves and second spiral air guide grooves arranged in an interleaved and nested manner. A first break point is set along any one turn of the first spiral air guide groove, and a second break point is set along any one turn of the second spiral air guide groove. The first break point and the second break point cause the first spiral air guide groove and the second spiral air guide groove to form the inner ring gas channel and the outer ring gas channel; wherein, any one turn of the first spiral air guide groove and any one turn of the second spiral air guide groove are adjacent first spiral air guide grooves and second spiral air guide grooves.
[0008] In some embodiments, one inner ring gas channel is provided, and at least two outer ring gas channels are provided, and the two outer ring gas channels are evenly distributed circumferentially around the inner ring gas channel.
[0009] In some embodiments, when at least two outer ring gas channels are provided, on the spray plate body, a first port located on a first circumference and a second port located on a second circumference are formed; wherein, a part of the first ports on the first circumference and a part of the second ports on the second circumference form at least two first outer ring air inlets, and the remaining first ports on the first circumference and the remaining second ports on the second circumference form at least two second outer ring air inlets.
[0010] In some embodiments, among at least two first outer ring air inlets, two adjacent first outer ring air inlets are located on different circumferences; among at least two second outer ring air inlets, two adjacent second outer ring air inlets are located on different circumferences.
[0011] In some embodiments, when the V 内1 and V 外1 , V 内2 and V 外2 satisfy V 内1 > V 外1 , V 内2 > V 外2 , a film with a thick middle and thin edges can be generated through the spray plate structure; when V 内1 and V 外1 , V 内2 and V 外2 satisfy V 内1 < V 外1 , V 内2 < V 外2 , a film with a thin middle and thick edges can be generated through the spray plate structure; when V 内1 and V 外1 , V内2 With V 外2 Meet V 内1 =V 外1 、V 内2 =V 外2 When the spray plate structure is used, a film with equal thickness in the middle and at the edge can be generated.
[0012] In some embodiments, the shower plate structure further includes a rubber plate, which is disposed on a side of the shower plate body having the gas channel and is used to separate the inner ring gas channel from the outer ring gas channel.
[0013] In some embodiments, the spray plate structure also includes a pressure plate, which is arranged above the rubber plate, and the rubber plate is fixed on the pressure plate, and the pressure plate has a gas inlet corresponding to the first inner ring air inlet, the second inner ring air inlet, the first outer ring air inlet and the second outer ring air inlet.
[0014] According to another aspect of the present application, the utility model provides a spray device, which includes the above-mentioned spray plate structure.
[0015] Compared with the prior art, the spray plate structure of the utility model has the following beneficial effects:
[0016] The utility model provides a spray plate structure, comprising a spray plate body and a gas channel arranged on the spray plate body, the gas channel comprising an inner ring gas channel and an outer ring gas channel, the outer ring gas channel being arranged around the inner ring gas channel; the inner ring gas channel comprising two first inner spiral grooves and a second inner spiral groove arranged in an interlaced manner, the first inner spiral groove and the second inner spiral groove respectively having a first inner ring air inlet and a second inner ring air inlet, the outer ring gas channel comprising two first outer spiral grooves and a second outer spiral groove arranged in an interlaced manner, the first outer spiral groove and the second outer spiral groove respectively having a first outer ring air inlet and a second outer ring air inlet; the first inner ring air inlet and the first outer ring air inlet are passed with a first gas at different flow rates, and the second inner ring air inlet and the second outer ring air inlet are passed with a second gas at different flow rates.
[0017] In the present utility model, the inner ring gas channel includes two first inner spiral grooves and two second inner spiral grooves which are arranged in an interlaced and nested manner. The outer ring gas channel includes two first outer spiral grooves and two second outer spiral grooves which are arranged in an interlaced and nested manner. At the same time, the first inner spiral groove and the second inner spiral groove respectively have a first inner ring air inlet and a second inner ring air inlet, and the first outer spiral groove and the second outer spiral groove respectively have a first outer ring air inlet and a second outer ring air inlet. In this way, two air inlets are formed in the central area of the spray plate body, and two air inlets are also formed in the edge area of the spray plate body. A first gas is introduced into one of the air inlets in the central area, and a second gas is introduced into the other air inlet. A first gas is introduced into one of the air inlets in the edge area, and a second gas is introduced into the other air inlet. That is, the first gas is introduced into the first inner ring air inlet and the first outer ring air inlet, and the second gas is introduced into the second inner ring air inlet and the second outer ring air inlet. In this way, the simultaneous introduction of two gases is realized. Importantly, the first gas is introduced into the first inner ring air inlet and the first outer ring air inlet at different flow rates, and the second gas is introduced into the second inner ring air inlet and the second outer ring air inlet at different flow rates. In this way, the speeds of the first gas at the center and the edge are different, and the speeds of the second gas at the center and the edge are also different. Different speeds can produce films with different thicknesses, so that the purpose of different thicknesses of the films at the edge and the center is realized, and thus the stress problem can be solved.
[0018] The spray device provided by the present utility model is designed based on the above spray plate structure, and its beneficial effects can be referred to the beneficial effects of the above spray plate structure, which will not be elaborated here one by one.
[0019] The above description is only an overview of the technical solution of the present utility model. In order to understand the technical means of the present utility model more clearly and implement it according to the content of the description, the following takes the preferred embodiments of the present utility model and describes them in detail with the accompanying drawings as follows. BRIEF DESCRIPTION OF THE DRAWINGS
[0020] In order to more clearly illustrate the technical solutions of the embodiments of the present utility model, the drawings required for the description of the embodiments will be briefly introduced below. Obviously, the drawings in the following description are some embodiments of the present utility model. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts.
[0021] Figure 1 is a cross-sectional view of a spray plate structure provided by an embodiment of the present utility model;
[0022] Figure 2 is a distribution diagram of the air inlets of a spray plate structure provided by an embodiment of the present utility model;
[0023] Figure 3It is another cross-sectional view of a spray plate structure provided by an embodiment of the present utility model;
[0024] Figure 4 It is another distribution diagram of the air inlet of a spray plate structure provided by an embodiment of the present utility model;
[0025] Figure 5 It is a schematic structural diagram of a spray plate structure provided by an embodiment of the present utility model;
[0026] Figure 6 It is another schematic structural diagram of a spray plate structure provided by an embodiment of the present utility model;
[0027] Figure 7 It is a cross-sectional view of a film generated by a spray plate structure provided by an embodiment of the present utility model;
[0028] Figure 8 It is a cross-sectional view of another film generated by a spray plate structure provided by an embodiment of the present utility model;
[0029] Reference numerals:
[0030] 1. Spray plate body; 2. Inner ring gas channel; 3. Outer ring gas channel; 4. First inner spiral groove; 41. First inner ring air inlet; 5. Second inner spiral groove; 51. Second inner ring air inlet; 6. First outer spiral groove; 61. First outer ring air inlet; 7. Second outer spiral groove; 71. Second outer ring air inlet; 8. Rubber plate; 9. Pressing plate; 91. Gas inlet. Detailed implementation manners
[0031] To further elaborate on the technical means and effects adopted by the present utility model to achieve the predetermined utility model purpose, the following, in combination with the attached drawings and preferred embodiments, details the specific implementation manners, structures, features, and their effects of the application according to the present utility model. In the following description, different "one embodiment" or "embodiment" do not necessarily refer to the same embodiment. In addition, the specific features, structures, or characteristics in one or more embodiments can be combined in any suitable form.
[0032] In the description of the present utility model, it should be clear that the terms "first", "second", etc. in the description and claims of the present utility model and the above-mentioned drawings are used to distinguish similar objects, and do not necessarily need to be used to describe a specific order or sequence; the terms "vertical", "horizontal", "longitudinal", "front", "rear", "left", "right", "up", "down", "horizontal", etc. indicate the orientation or position relationship based on the orientation or position relationship shown in the drawings, and are only for the convenience of describing the present utility model, rather than meaning that the indicated device or element must have a specific orientation or position, and thus cannot be construed as a limitation to the present utility model.
[0033] In the description of the present utility model, it should be noted that unless otherwise clearly specified and defined, the terms "installation", "connection", and "coupling" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.
[0034] During the chemical vapor deposition process, when the shower plate distributes gas onto the semiconductor surface, since the thin film is grown at a high temperature and the thermal expansion coefficients of the thin film and the substrate are different, stress will be generated after cooling to room temperature, thus causing the wafer to warp and deform. To address this problem, the present utility model mainly offsets the stress by changing the thickness of the thin film at the center and the edge, making the thicknesses at the two places different. Of course, the present utility model can not only make the thicknesses of the thin film at the edge and the center different, but also make the thicknesses of the thin film at the edge and the center the same.
[0035] To better understand the above technical solution, the above technical solution will be described in detail below in conjunction with the accompanying drawings of the specification and specific embodiments.
[0036] Embodiment 1
[0037] An embodiment of the present utility model provides a shower plate structure, as Figure 1-8 shown, including a shower plate body 1 and a gas channel provided on the shower plate body 1. The gas channel includes an inner ring gas channel 2 and an outer ring gas channel 3. The outer ring gas channel 3 is arranged around the inner ring gas channel 2. The inner ring gas channel 2 includes two first inner spiral grooves 4 and second inner spiral grooves 5 that are arranged in an interleaved and nested manner. The first inner spiral groove 4 and the second inner spiral groove 5 respectively have a first inner ring air inlet 41 and a second inner ring air inlet 51. The outer ring gas channel 3 includes two first outer spiral grooves 6 and second outer spiral grooves 7 that are arranged in an interleaved and nested manner. The first outer spiral groove 6 and the second outer spiral groove 7 respectively have a first outer ring air inlet 61 and a second outer ring air inlet 71. The first inner ring air inlet 41 and the first outer ring air inlet 61 introduce a first gas at different flow rates, and the second inner ring air inlet 51 and the second outer ring air inlet 71 introduce a second gas at different flow rates.
[0038] The spray plate body 1 is a circular plate-like structure with a certain thickness. A gas channel is provided on the upper surface of the spray plate body 1. The gas channel has a corresponding gas inlet and a nozzle. Gas enters the gas channel of the spray plate body 1 from the gas inlet. Usually, the number and position of the gas inlets are set according to the overall structure of the equipment. Then, it flows in the gas channel to achieve uniform distribution of the gas. After that, it leaves the spray plate body 1 through the nozzle and enters the channel or outlet of the reaction chamber.
[0039] The gas channel includes an inner ring gas channel 2 and an outer ring gas channel 3. The inner ring gas channel 2 is arranged at the central position of the spray plate body 1, and the outer ring gas channel 3 is arranged at a position far from the spray plate body 1 around the inner ring gas channel 2. That is to say, in this embodiment, the surface of the spray plate body 1 is divided into an inner part and an outer part, and the inner ring gas channel 2 and the outer ring gas channel 3 are respectively arranged on the inner and outer parts.
[0040] If only one kind of gas needs to be introduced into the spray plate structure provided in this embodiment, the inner ring gas channel 2 and the outer ring gas channel 3 respectively include corresponding pipelines. By controlling the gas flow rate in the corresponding pipelines, the thickness of the film at the center and the edge can be changed. For example, assume that the inner ring gas channel 2 is a first spiral pipeline and the outer ring gas channel 3 is a second spiral pipeline. Then, when the gas flow rate in the first spiral pipeline is greater than the gas flow rate in the second spiral pipeline, a film with a thick middle and a thin edge can be generated through the spray plate structure. And when the gas flow rate in the first spiral pipeline is less than the gas flow rate in the second spiral pipeline, a film with a thin middle and a thick edge can be generated through the spray plate structure. In this way, the purpose of different film thicknesses at the edge and the center is achieved, and thus the stress problem can be solved.
[0041] If two gases need to be introduced into the spray plate structure provided in this embodiment, the inner ring gas channel 2 includes two first inner spiral grooves 4 and second inner spiral grooves 5 arranged in an interleaved and nested manner, and the outer ring gas channel 3 includes two first outer spiral grooves 6 and second outer spiral grooves 7 arranged in an interleaved and nested manner; at the same time, the first inner spiral groove 4 and the second inner spiral groove 5 respectively have a first inner ring air inlet 41 and a second inner ring air inlet 51, and the first outer spiral groove 6 and the second outer spiral groove 7 respectively have a first outer ring air inlet 61 and a second outer ring air inlet 71; in this way, two air inlets are formed in the central area of the spray plate body 1, and two air inlets are also formed in the edge area of the spray plate body 1. The first gas is introduced into one of the air inlets in the central area, and the second gas is introduced into the other air inlet. The first gas is introduced into one of the air inlets in the edge area, and the second gas is introduced into the other air inlet. That is, the first gas is introduced into the first inner ring air inlet 41 and the first outer ring air inlet 61, and the second gas is introduced into the second inner ring air inlet 51 and the second outer ring air inlet 71. In this way, the simultaneous introduction of two gases is achieved. Importantly, the first gas is introduced into the first inner ring air inlet 41 and the first outer ring air inlet 61 at different flow rates, and the second gas is introduced into the second inner ring air inlet 51 and the second outer ring air inlet 71 at different flow rates. In this way, the speeds of the first gas at the center and the edge are different, and the speeds of the second gas at the center and the edge are also different. Different speeds can produce films with different thicknesses, so that the purpose of different thicknesses of the films at the edge and the center is achieved, and thus the stress problem can be solved.
[0042] In a specific embodiment, the flow rate V of the first gas introduced into the first inner ring air inlet 41 内1 and the flow rate V of the first gas introduced into the first outer ring air inlet 61 外1 and the flow rate V of the second gas passing through the second inner ring air inlet 51 内2 and the flow rate V of the second gas passing through the second outer ring air inlet 71 外2 satisfy: V 内1 : V 外1 = V 内2 : V 外2 . The first gas is introduced into the first inner ring air inlet 41 and the first outer ring air inlet 61 at different flow rates, and the second gas is introduced into the second inner ring air inlet 51 and the second outer ring air inlet 71 at different flow rates, which can make the thicknesses of the first gas at the center and the edge different, and at the same time make the thicknesses of the second gas at the center and the edge different. On this basis, restricting the flow rate ratio of the first gas at the center and the edge to be the same as the flow rate ratio of the second gas at the center and the edge, that is, different flows are divided into two paths by one gas and then the flow resistance is increased to achieve, can make the thicknesses of different gases at different positions on the same film have an equal-proportion difference, and thus solve the same stress problem.
[0043] To divide the area on the spray plate body 1 into a central area and an edge area, there are many methods. In this embodiment, the following two methods are introduced in detail:
[0044] First, as Figure 3 , Figure 4 and Figure 6 shown, the gas channels are two first spiral air guide grooves and second spiral air guide grooves arranged in an interlaced and nested manner. A first break point is set along any one turn of the first spiral air guide groove, and a second break point is set along any one turn of the second spiral air guide groove. The first break point and the second break point cause the first spiral air guide groove and the second spiral air guide groove to form the inner ring gas channel 2 and the outer ring gas channel 3; wherein, any one turn of the first spiral air guide groove and any one turn of the second spiral air guide groove are adjacent first spiral air guide groove and second spiral air guide groove.
[0045] On the surface of the spray plate body 1, two interlaced and nested spiral grooves are opened, which are the above-mentioned first spiral air guide groove and second spiral air guide groove. The first spiral air guide groove and the second spiral air guide groove basically cover the surface of the spray plate body 1. And, since the first spiral air guide groove and the second spiral air guide groove are arranged in an interlaced and nested manner, except for the outermost spiral groove, the two sides of the first spiral air guide groove must be the second spiral air guide groove, and the two sides of the second spiral air guide groove must be the first spiral air guide groove. Then, to divide the area on the spray plate body 1 into a central area and an edge area, a first break point and a second break point can be respectively opened on an adjacent first spiral air guide groove and a second spiral air guide groove, thereby separating the originally continuous spiral groove. Of course, in order to divide the spiral groove into a part located in the central area and another part located in the edge area, the first break point and the second break point need to be located on both sides of the center of the spray plate body 1, and the original formed by the first break point and the second break point is concentric with the center of the spray plate body 1, so that a part located in the central area is exactly located at the center.
[0046] Of course, in addition to the above setting of the first break point and the second break point to divide the area on the spray plate body 1 into a central area and an edge area, a disconnected spiral groove can also be directly set. For example, one of the spiral grooves includes a first part located in the center and a second part located in the edge. The second part continues to spiral after the end of the first part. At the same time, the other spiral groove also includes a first part located in the center and a second part located in the edge. The second part also continues to spiral after the end of the first part. However, whether it is the first spiral groove or the second spiral groove, the end of the first part and the start end of the second part are not connected.
[0047] Second, as Figure 1 ,Figure 2 and Figure 5 As shown, one inner ring gas channel 2 is provided, and at least two outer ring gas channels 3 are provided. The two outer ring gas channels 3 are evenly distributed around the circumference of the inner ring gas channel 2.
[0048] In a specific embodiment, when at least two outer ring gas channels 3 are provided, on the spray plate body 1, a first port located on a first circumference and a second port located on a second circumference are formed; wherein, a part of the first ports on the first circumference and a part of the second ports on the second circumference form at least two first outer ring air inlets 61, and the remaining first ports on the first circumference and the remaining second ports on the second circumference form at least two second outer ring air inlets 71.
[0049] For better explanation, assume that six outer ring gas channels 3 are provided, which are respectively a first outer ring gas channel, a second outer ring gas channel, a third outer ring gas channel, a fourth outer ring gas channel, a fifth outer ring gas channel and a sixth outer ring gas channel arranged in sequence along the circumference. Then the first outer ring gas channel, the second outer ring gas channel, the third outer ring gas channel, the fourth outer ring gas channel, the fifth outer ring gas channel and the sixth outer ring gas channel each include two first outer spiral grooves 6 and second outer spiral grooves 7 arranged in an interleaved and nested manner. The first outer spiral groove 6 and the second outer spiral groove 7 respectively have a first outer ring air inlet 61 and a second outer ring air inlet 71, and six outer ring gas channels 3 generate six first outer ring air inlets 61 and six second outer ring air inlets 71. And, in one of the embodiments, six first outer ring air inlets 61 and six second outer ring air inlets 71 form two circumferences, that is, the above-mentioned first circumference and second circumference, but it is not that six first outer ring air inlets 61 form the first circumference or six second outer ring air inlets 71 form the second circumference, but they are arranged in a cross manner, that is, the first outer ring air inlet 61 has a first outer ring air inlet 61 on the first circumference and also a second outer ring air inlet 71 on the second circumference, then the remaining first outer ring air inlets 61 and second outer ring air inlets 71 are located on the second circumference. Of course, six first outer ring air inlets 61 and six second outer ring air inlets 71 can also be all located on the same circumference.
[0050] In a specific embodiment, among at least two of the first outer-ring air inlets 61, two adjacent first outer-ring air inlets 61 are located on different circumferences; among at least two of the second outer-ring air inlets 71, two adjacent second outer-ring air inlets 71 are located on different circumferences. That is, among the six first outer-ring air inlets 61 and six second outer-ring air inlets 71 mentioned above, the first outer-ring air inlets 61 of the first outer-ring gas passage, the second outer-ring air inlets 71 of the second outer-ring gas passage, the first outer-ring air inlets 61 of the third outer-ring gas passage, the second outer-ring air inlets 71 of the fourth outer-ring gas passage, the first outer-ring air inlets 61 of the fifth outer-ring gas passage, and the second outer-ring air inlets 71 of the sixth outer-ring gas passage are located on the same circumference, as shown in the connection line in Figure 2 ; while the second outer-ring air inlets 71 of the first outer-ring gas passage, the first outer-ring air inlets 61 of the second outer-ring gas passage, the second outer-ring air inlets 71 of the third outer-ring gas passage, the first outer-ring air inlets 61 of the fourth outer-ring gas passage, the second outer-ring air inlets 71 of the fifth outer-ring gas passage, and the first outer-ring air inlets 61 of the sixth outer-ring gas passage are located on another circumference. Since different gases are introduced into the first outer-ring air inlets 61 and the second outer-ring air inlets 71, this structure set in this embodiment enables cross-air intake in the outer ring, which is beneficial to gas mixing.
[0051] In a specific embodiment, when the V 内1 and V 外1 , V 内2 and V 外2 satisfy V 内1 > V 外1 , V 内2 > V 外2 , a film with a thick middle and thin edges can be generated through the spray plate structure; when V 内1 and V 外1 , V 内2 and V 外2 satisfy V 内1 < V 外1 , V 内2 < V 外2 , a film with a thin middle and thick edges can be generated through the spray plate structure; when V 内1 and V 外1 , V 内2 and V 外2 satisfy V 内1 = V 外1 , V 内2 = V 外2 , a film with equal thickness in the middle and at the edges can be generated through the spray plate structure. That is to say, the spray plate structure provided in this embodiment can make the generated film have three different forms by controlling the flow rates of different gases at different positions, as shown in Figure 7 andFigure 8 As shown, they are respectively a thin film with a thick middle and thin edges, a thin film with a thin middle and thick edges, and a thin film with the same thickness in the middle and at the edges. Among them, the thin film with a thick middle and thin edges and the thin film with a thin middle and thick edges can offset stress, thereby solving the problem of wafer warping and deformation caused by stress. Moreover, in the traditional shower plate structure, since gas continuously enters the reaction chamber through the air holes, and due to the structural characteristics of the shower panel in the prior art, as the airflow is lost, the gas flow rate is large and the flow velocity is fast at the radial edge position of the shower panel, while the gas flow rate is small and the flow velocity is small near the center position of the shower panel. In this embodiment, since the gas is transported separately for the center and the edge, it can also be used to improve the uneven gas flow in the central part. Additionally, assuming there is no stress problem, the shower plate structure provided in this embodiment can also produce a thin film with the same thickness in the middle and at the edges, so it is also suitable for this situation.
[0052] In addition, in the above embodiment, in order to obtain the spiral groove structure, after the shower plate body 1 is divided into regions, each region is stretched according to the outer shape and the corresponding spiral radius, thereby obtaining the groove shape of the spiral groove structure.
[0053] In a specific embodiment, the shower plate structure further includes a rubber plate 8, and the rubber plate 8 is disposed on one side of the shower plate body 1 having the gas channels, and is used to separate the inner ring gas channel 2 and the outer ring gas channel 3. The shape of the rubber plate 8 matches the shape of the shower plate body 1, and it is disposed on the shower plate body 1 to seal the gas channels.
[0054] In a specific embodiment, the shower plate structure further includes a pressing plate 9, and the pressing plate 9 is disposed above the rubber plate 8, and the rubber plate 8 is fixed on the pressing plate 9, and the pressing plate 9 has gas inlets 91 corresponding to the first inner ring air inlet 41, the second inner ring air inlet 51, the first outer ring air inlet 61, and the second outer ring air inlet 71. The pressing plate 9 is used to install the rubber plate 8. The shower plate structure provided in this embodiment can achieve the sealing of the shower plate structure through the cooperation of the rubber plate 8 and the pressing plate 9. The rubber plate 8 is disposed between the shower plate body 1 and the pressing plate 9, which is convenient for installation. Additionally, the pressing plate 9 has gas inlets 91, and the number and positions of the gas inlets 91 correspond to those of the first inner ring air inlet 41, the second inner ring air inlet 51, the first outer ring air inlet 61, and the second outer ring air inlet 71. In this way, the first gas and the second gas can enter the gas channels through the gas inlets 91, and then the gas is distributed on the semiconductor surface.
[0055] The shower plate structure provided in this embodiment realizes different film thicknesses of the thin films in the central region and the edge region through gas flow, and can also be used to improve the uneven gas flow in the central part. At the same time, the gas flow in the outer ring no longer has a concentric feature, reducing the regularity of the gas flow.
[0056] Example 2
[0057] This embodiment provides a spraying device, and the spraying device includes the spraying plate structure described in Embodiment 1.
[0058] In summary, it is easy for those skilled in the art to understand that, on the premise of no conflict, the above-mentioned advantageous technical features can be freely combined and superimposed.
[0059] The above are only the preferred embodiments of the present invention, and do not impose any form of limitation on the present invention. Any simple modification, equivalent change and modification made to the above embodiments according to the technical essence of the present invention still fall within the scope of the technical solution of the present invention.
Claims
1. A shower plate structure, characterized in that: It includes a spray plate body and a gas channel arranged on the spray plate body, the gas channel includes an inner circle gas channel and an outer circle gas channel arranged around the inner circle gas channel; the inner circle gas channel includes a first inner spiral groove and a second inner spiral groove arranged in an interlaced manner, the first inner spiral groove and the second inner spiral groove respectively have a first inner circle air inlet and a second inner circle air inlet, the outer circle gas channel includes a first outer spiral groove and a second outer spiral groove arranged in an interlaced manner, the first outer spiral groove and the second outer spiral groove respectively have a first outer circle air inlet and a second outer circle air inlet; the first inner circle air inlet and the first outer circle air inlet are used to pass the first gas at different flow rates, and the second inner circle air inlet and the second outer circle air inlet are used to pass the second gas at different flow rates.
2. The shower plate structure according to claim 1, characterized in that: The flow rate V of the first gas introduced into the first inner ring gas inlet is 内1 , the flow rate V of the first gas introduced into the first outer ring air inlet 外1 , the flow rate V of the second gas passing through the second inner ring air inlet 内2 and the flow rate V of the second gas through the second outer ring inlet 外2 Between: V 内1 :V 外1 =V 内2 :V 外2 .
3. The shower plate structure according to claim 1, characterized in that: The gas channel is composed of two first spiral gas guide grooves and a second spiral gas guide groove arranged in an interlaced manner. A first breakpoint is set along any circle of the first spiral gas guide groove, and a second breakpoint is set along any circle of the second spiral gas guide groove. The first breakpoint and the second breakpoint make the first spiral gas guide groove and the second spiral gas guide groove form the inner circle gas channel and the outer circle gas channel; wherein, any circle of the first spiral gas guide groove and any circle of the second spiral gas guide groove are adjacent first spiral gas guide grooves and second spiral gas guide grooves.
4. The shower plate structure according to claim 1, characterized in that: One inner ring gas channel is provided, and at least two outer ring gas channels are provided, and the two outer ring gas channels are evenly distributed around the circumference of the inner ring gas channel.
5. The shower plate structure according to claim 4, characterized in that: When at least two outer ring gas channels are provided, a first port located on the first circumference and a second port located on the second circumference are formed on the shower plate body; wherein, part of the first port on the first circumference and part of the second port on the second circumference form at least two of the first outer ring air inlets, and the remaining first ports on the first circumference and the remaining second ports on the second circumference form at least two of the second outer ring air inlets.
6. The shower plate structure according to claim 5, characterized in that: Among at least two of the first outer ring air inlets, two adjacent first outer ring air inlets are located on different circumferences; and among at least two of the second outer ring air inlets, two adjacent second outer ring air inlets are located on different circumferences.
7. The shower plate structure according to claim 2, characterized in that: When the V 内1 With V 外1 、V 内2 With V 外2 Meet V 内1 >V 外1 、V 内2 >V 外2 When V 内1 With V 外1 、V 内2 With V 外2 Meet V 内1 <V 外1 、V 内2 <V 外2 When the spray plate structure is used, a thin film with a thin middle and thick edges can be generated; When V 内1 With V 外1 、V 内2 With V 外2 Meet V 内1 =V 外1 、V 内2 =V 外2 When the spray plate structure is used, a film with equal thickness in the middle and at the edge can be generated.
8. The shower plate structure according to any one of claims 1 to 7, characterized in that: The spray plate structure further includes a rubber plate, which is arranged on one side of the spray plate body having the gas channel and is used to separate the inner ring gas channel from the outer ring gas channel.
9. The shower plate structure according to claim 8, characterized in that: The spray plate structure also includes a pressure plate, which is arranged above the rubber plate and fixed on the pressure plate, and the pressure plate has a gas inlet corresponding to the first inner ring air inlet, the second inner ring air inlet, the first outer ring air inlet and the second outer ring air inlet.
10. A spraying device, characterized in that: The spraying equipment comprises the spray plate structure according to any one of claims 1-9.