Photoelectric bracket applied to CVD (Chemical Vapor Deposition)

Abstract

The utility model relates to the technical field of photoelectric supports, and discloses a photoelectric support applied to CVD (chemical vapor deposition), which comprises a base and a deposition platform, supporting slide rails are arranged on two sides of the center of the top of the base, a fixing cover is arranged at the top ends of the supporting slide rails, a threaded sleeve is arranged at the top end of the fixing cover, a threaded rod is arranged in the threaded sleeve, and the top end of the threaded rod is fixedly connected with the base. A sliding block is arranged on one side of the supporting sliding rail, a servo motor is fixed between the sliding blocks, the servo motor drives the threaded rod to rotate in the threaded sleeve, external threads of the threaded rod are matched with internal threads of the threaded sleeve, the threaded rod ascends or descends relative to the threaded sleeve, and therefore the deposition platform is driven to ascend or descend. And through rotating connection of the rotating seat and the threaded rod and the guide effect of the L-shaped bracket, the guide wheel and the guide strip, the deposition platform is more stable in the lifting process, does not shake easily, and is convenient for a user to use.

Description

Technical Field

[0001] The utility model relates to the technical field of optoelectronic brackets, in particular to an optoelectronic bracket applied to CVD. Background Technique

[0002] CVD is the abbreviation of Chemical Vapor Deposition. This is a technology for depositing thin films on the surface of materials, which is widely used in the fields of semiconductors, optics, photovoltaics, hard coatings, etc. In the CVD process, gaseous reactants containing the material to be deposited are introduced into the reaction chamber, and chemical reactions occur with the surface of the substrate under appropriate temperature and pressure conditions to form a solid thin film.

[0003] An optoelectronic bracket applied to CVD refers to a device used to carry substrates such as wafers or other materials to be coated in the CVD process.

[0004] For example, the existing Chinese patent (CN104053816A) discloses a CVD reactor and a substrate bracket for the CVD reactor, which has a reactor housing and a processing chamber, and a processing gas can be input into the processing chamber by means of an intake mechanism; it has a substrate bracket with one or more grooves on its upper side, and is designed such that the substrate is only arranged on a supporting area raised relative to the bottom of the groove; it has a heater, which is spaced from the lower side of the substrate bracket by a gap, and the lower side of the substrate bracket is designed differently in terms of heat transfer from the heater to the substrate bracket (3) in the central area below the center area of the groove and the peripheral area below the edge area near the groove. The heater is designed as a substantially flat heat source. The gas flushing device flushes the gap with flushing gas. The gap has a gap height, and when the first flushing gas with a first thermal conductivity is replaced by the second flushing gas with a second thermal conductivity, the change in heat transfer from the heater to the substrate bracket in the peripheral area is different from that in the central area.

[0005] The existing technical problems are: the height of the existing support frame cannot be adjusted, so it cannot be adjusted for operating platforms of different heights, and during transportation, it is prone to shaking, so manual support is required, and there is a lack of positioning, which is inconvenient for users to use. Summary of the Utility Model

[0006] The purpose of the utility model is to provide an optoelectronic bracket applied to CVD to solve the problems raised in the above background technique.

[0007] To achieve the above object, the present utility model provides the following technical solutions: An optoelectronic bracket applied to CVD, comprising: a base and a deposition platform. On both sides of the center of the top of the base, there are support slide rails. At the top of the support slide rails, there is a fixed cover. At the top of the fixed cover, there is a threaded sleeve. Inside the threaded sleeve, there is a threaded rod. On one side of the support slide rails, there are sliders. A servo motor is fixed between the sliders. One end of the output shaft of the servo motor is fixedly connected to the bottom end of the threaded rod. At the top of the threaded rod, there is a rotating seat rotatably provided. At the top of the rotating seat, there is a deposition platform fixedly provided.

[0008] Further, a protective housing is provided on the top of the base. At the top of the protective housing, there is a telescopic cover. The top of the telescopic cover is fixedly connected to the bottom of the deposition platform.

[0009] Further, a flange is fixedly provided on the outer wall of the bottom of the rotating seat. On the outer wall of the flange, there is an L-shaped bracket. At one end of the L-shaped bracket, there is a guide wheel. On the inner wall of the protective housing, there is a guide bar. A guide groove matching the guide bar is provided in the middle of the guide wheel.

[0010] Further, there are three L-shaped brackets. The three L-shaped brackets are circumferentially and evenly arranged on the outer wall of the flange.

[0011] Further, a bearing is provided at the top of the threaded rod. The threaded rod and the rotating seat are connected through the bearing.

[0012] Further, a substrate placement seat is provided on the top of the deposition platform.

[0013] Compared with the prior art, the beneficial effects of the present utility model are:

[0014] By providing the base, the deposition platform and the threaded rod, when the optoelectronic bracket applied to CVD is in use, the servo motor drives the threaded rod to rotate in the threaded sleeve. The external thread of the threaded rod cooperates with the internal thread of the threaded sleeve, so that the threaded rod rises or falls relative to the threaded sleeve, thereby driving the deposition platform to lift and lower;

[0015] During the lifting and lowering process of the deposition platform, through the rotational connection between the rotating seat and the threaded rod, and in cooperation with the guiding effects of the L-shaped bracket, the guide wheel and the guide bar, the lifting and lowering process of the deposition platform is more stable, not prone to shaking, and convenient for users to use. Description of the Drawings

[0016] Figure 1 is a three-dimensional view of the optoelectronic bracket applied to CVD of the present utility model;

[0017] Figure 2 is a main sectional view of the optoelectronic bracket applied to CVD of the present utility model;

[0018] Figure 3Schematic diagram of the internal structure of the optoelectronic support applied to CVD in the present utility model;

[0019] Figure 4 Schematic diagram of the internal structure of the optoelectronic support applied to CVD in the present utility model from another perspective.

[0020] In the figure: 1, base; 2, protective housing; 3, telescopic cover; 4, deposition platform; 5, substrate placement seat; 6, swivel base; 7, flange; 8, L-shaped bracket; 9, guide wheel; 10, guide bar; 11, support slide rail; 12, slider; 13, servo motor; 14, threaded rod; 15, fixed cover; 16, threaded sleeve. Detailed implementation manners

[0021] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments.

[0022] Please refer to Figures 1 - 4 , the present utility model provides a technical solution: an optoelectronic support applied to CVD, including: a base 1 and a deposition platform 4. On both sides of the center of the top of the base 1, there are support slide rails 11. At the top of the support slide rails 11, there is a fixed cover 15. At the top of the fixed cover 15, there is a threaded sleeve 16. Inside the threaded sleeve 16, there is a threaded rod 14. On one side of the support slide rails 11, there is a slider 12. Between the sliders 12, a servo motor 13 is fixed. One end of the output shaft of the servo motor 13 is fixedly connected to the bottom end of the threaded rod 14. At the top of the threaded rod 14, a swivel base 6 is rotatably provided. At the top of the swivel base 6, a deposition platform 4 is fixed. When the optoelectronic support applied to CVD is in use, the servo motor 13 drives the threaded rod 14 to rotate inside the threaded sleeve 16. The external thread of the threaded rod 14 cooperates with the internal thread of the threaded sleeve 16, so that the threaded rod 14 rises or falls relative to the threaded sleeve 16, thereby driving the deposition platform 4 to lift and lower. The up and down movement of the threaded rod 14 is transmitted to the deposition platform 4 through the swivel base 6, causing the deposition platform 4 to lift and lower. In this way, the position of the deposition platform can be accurately controlled, and then the distance between the deposition material and the reactor can be adjusted. During the CVD process, this lifting mechanism can be used to optimize the film deposition conditions, such as adjusting the deposition rate, film thickness, etc. Precise positioning control is achieved through screw drive, which is very suitable for CVD application scenarios that require high-precision control. By adjusting the height of the deposition platform, the parameters during the deposition process can be effectively controlled, thereby obtaining the required film quality.

[0023] The top of the base 1 is provided with a protective housing 2. The top of the protective housing 2 is provided with a telescopic cover 3. The top of the telescopic cover 3 is fixedly connected to the bottom of the deposition platform 4. When the deposition platform 4 is lifted or lowered, the telescopic cover 3 follows the expansion and contraction, which can protect the structure inside the telescopic cover 3 and prevent reactants from entering. Through this design of the telescopic cover 3, even if the deposition platform is lifted and lowered frequently, the isolation between the deposition area and other components can be ensured, which is crucial for maintaining the cleanliness and safety of the CVD process.

[0024] A flange 7 is fixedly attached to the outer wall of the bottom of the swivel base 6. An L-shaped bracket 8 is provided on the outer wall of the flange 7. A guide wheel 9 is provided at one end of the L-shaped bracket 8. A guide bar 10 is provided on the inner wall of the protective housing 2. A guide groove matching the guide bar 10 is formed in the middle of the guide wheel 9. During the lifting and lowering process of the deposition platform 4, through the rotational connection between the swivel base 6 and the threaded rod 14, and in cooperation with the guiding functions of the L-shaped bracket 8, the guide wheel 9 and the guide bar 10, the lifting and lowering process of the deposition platform 4 is more stable, not prone to shaking, and convenient for users to use. When the servo motor is started and drives the threaded rod to rotate, the deposition platform rises and falls accordingly. Since the swivel base 6 and the threaded rod are rotationally connected, the swivel base can move up and down with the lifting and lowering of the threaded rod. As the deposition platform 4 rises and falls, the swivel base 6 will also move accordingly. The flange 7 fixed below the swivel base 6 will drive the L-shaped bracket 8 to move. The guide wheel 9 on the L-shaped bracket 8 will roll on the guide bar 10 on the inner wall of the protective housing 2. The guide groove of the guide wheel 9 matches the structure of the guide bar 10 and can slide smoothly along the guide bar to ensure that the deposition platform does not shake when lifting and lowering.

[0025] There are three L-shaped brackets 8, and the three L-shaped brackets 8 are circumferentially and evenly arranged on the outer wall of the flange 7. By means of the three L-shaped brackets 8, the force is evenly distributed during guiding, improving the stability of lifting.

[0026] A bearing is provided at the top of the threaded rod 14, and the threaded rod 14 and the swivel base 6 are connected through the bearing. Through the rotational connection between the swivel base 6 and the threaded rod 14, and in cooperation with the guiding of the guide wheel 9 and the guide bar 10, it can prevent the swivel base 6 from rotating along with the threaded rod 14, thus ensuring the stable ascent of the swivel base 6 and the deposition platform 4.

[0027] A substrate placement seat 5 is provided on the top of the deposition platform 4. The substrate placement seat 5 is a fixture for fixing the substrate or can be a negative pressure suction cup seat in this application, and the substrate is fixed by negative pressure adsorption.

[0028] When the optoelectronic bracket applied to CVD is in use, the servo motor 13 drives the threaded rod 14 to rotate within the threaded sleeve 16. The external thread of the threaded rod 14 is matched with the internal thread of the threaded sleeve 16, so that the threaded rod 14 rises or falls relative to the threaded sleeve 16, thereby driving the deposition platform 4 to rise and fall;

[0029] During the lifting process of the deposition platform 4, through the rotational connection between the transposition 6 and the threaded rod 14, and in cooperation with the guiding effects of the L-shaped bracket 8, the guide wheel 9, and the guide bar 10, the lifting process of the deposition platform 4 becomes more stable, is not prone to shaking, and is convenient for users to use.

[0030] Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the scope of protection of the present invention.

Claims

1. Photoelectric supports used in CVD, including: A base (1) and a deposition platform (4), characterized in that: support rails (11) are provided on both sides of the center of the top of the base (1), a fixed cover (15) is provided on the top of the support rail (11), a threaded sleeve (16) is provided on the top of the fixed cover (15), a threaded rod (14) is provided inside the threaded sleeve (16), a slider (12) is provided on one side of the support rail (11), a servo motor (13) is fixed between the sliders (12), one end of the output shaft of the servo motor (13) is fixedly connected to the bottom end of the threaded rod (14), a swivel seat (6) is rotatably provided on the top of the threaded rod (14), and a deposition platform (4) is fixed on the top of the swivel seat (6).

2. The photoelectric support for CVD according to claim 1, characterized in that: A protective shell (2) is provided on the top of the base (1), a telescopic cover (3) is provided on the top of the protective shell (2), and the top of the telescopic cover (3) is fixedly connected to the bottom of the deposition platform (4).

3. The photoelectric support for CVD according to claim 2, characterized in that: A flange (7) is fixed to the outer wall of the bottom of the swivel seat (6), an L-shaped bracket (8) is provided on the outer wall of the flange (7), a guide wheel (9) is provided at one end of the L-shaped bracket (8), a guide bar (10) is provided on the inner wall of the protective shell (2), and a guide groove matching the guide bar (10) is provided in the middle of the guide wheel (9).

4. The photoelectric support for CVD according to claim 3, characterized in that: There are three L-shaped brackets (8), and the three L-shaped brackets (8) are evenly arranged in the circumferential direction on the outer wall of the flange (7).

5. The photoelectric support for CVD according to claim 1, characterized in that: A bearing is provided at the top end of the threaded rod (14), and the threaded rod (14) and the rotating seat (6) are connected via the bearing.

6. The photoelectric support for CVD according to claim 1, characterized in that: A substrate placement seat (5) is provided on the top of the deposition platform (4).

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