Display panel

Abstract

The display panel includes: a base layer including a display area and a non-display area, the display area including a first light emitting area, a second light emitting area, and a non-light emitting area; a first lower electrode on the base layer, overlapping the first light emitting region, and including a first reflective electrode and a first transparent electrode on the first reflective electrode; a second lower electrode on the base layer, overlapping the second light emitting region, and including a second reflective electrode and a second transparent electrode on the second reflective electrode; and a first inorganic film overlapping the first light emitting region and at least partially between the first reflective electrode and the first transparent electrode, in which the first inorganic film is spaced apart from the second reflective electrode and has a first gap therebetween.

Description

[0001] Cross - reference to related applications

[0002] This application claims the priority and benefit of Korean Patent Application No. 10 - 2023 - 0105050, filed on August 10, 2023, with the Korean Intellectual Property Office, the entire disclosure of which is incorporated herein by reference. Technical field

[0003] Aspects of some embodiments of the present disclosure herein relate to a display panel and a method for manufacturing the same. Background art

[0004] Display devices that display images to a user, such as televisions, monitors, smartphones, and tablet computers, include a display panel that displays an image. As the display panel, various display panels, such as a liquid crystal display panel, an organic light - emitting display panel, an electro - wetting display panel, and an electrophoretic display panel, are being developed.

[0005] Various methods for patterning light - emitting elements can enable the display panel to have relatively improved reliability, and recently, research on high - resolution display devices including light - emitting materials commonly provided through the use of an aperture mask is being conducted.

[0006] The above information disclosed in this background art section is only for enhancing the understanding of the background art, and thus the information discussed in this background art section does not necessarily constitute the prior art. Summary of the utility model

[0007] Aspects of some embodiments of the present disclosure herein relate to a display panel and a method for manufacturing the same, and for example, relate to a display panel having relatively improved durability and reliability.

[0008] Aspects of some embodiments of the present disclosure include a display panel and a method for manufacturing the same that have relatively improved durability and reliability while achieving a relatively high resolution.

[0009] According to some embodiments of the present disclosure, the display panel includes: a base layer including a display area and a non - display area, the display area including a first light - emitting area, a second light - emitting area, and a non - light - emitting area; a first lower electrode on the base layer, overlapping with the first light - emitting area, and including a first reflective electrode and a first transparent electrode on the first reflective electrode; a second lower electrode on the base layer, overlapping with the second light - emitting area, and including a second reflective electrode and a second transparent electrode on the second reflective electrode; and a first inorganic film overlapping with the first light - emitting area and at least partially between the first reflective electrode and the first transparent electrode, wherein the first inorganic film is spaced apart from the second reflective electrode and has a first gap between the first inorganic film and the second reflective electrode.

[0010] According to some embodiments, the first inorganic film may cover the upper surface and the side surface of the first reflective electrode.

[0011] According to some embodiments, the first inorganic film may include at least one of silicon oxide (SiO x ), silicon nitride (SiN x ), and silicon oxynitride (SiO x N y ).

[0012] According to some embodiments, the display panel may further include: a second inorganic film, overlapping with the first light-emitting region and the second light-emitting region, and at least partially on the first reflective electrode and the second reflective electrode.

[0013] According to some embodiments, the second inorganic film may be respectively between the first reflective electrode and the first transparent electrode and between the second reflective electrode and the second transparent electrode.

[0014] According to some embodiments, the display region may further include a third light-emitting region, and the display panel may further include a third lower electrode, which is on the base layer, overlaps with the third light-emitting region, and includes a third reflective electrode and a third transparent electrode on the third reflective electrode.

[0015] According to some embodiments, the second inorganic film may be spaced apart from the third reflective electrode and have a second gap between the second inorganic film and the third reflective electrode.

[0016] According to some embodiments, the third transparent electrode may be directly on the third reflective electrode.

[0017] According to some embodiments, a first distance in the thickness direction of the display panel between the first reflective electrode and the first transparent electrode may be greater than a second distance in the thickness direction between the second reflective electrode and the second transparent electrode.

[0018] According to some embodiments, the first lower electrode and the second lower electrode may respectively include: a first layer including a transparent conductive oxide; a second layer on the first layer and including a reflective metal material; and a third layer on the second layer and including a transparent conductive oxide.

[0019] According to some embodiments, the display panel may further include a pixel defining film that at least partially covers each of the first transparent electrode and the second transparent electrode and includes an inorganic material.

[0020] According to some embodiments, the display panel may further include: at least one organic layer on the first transparent electrode and the second transparent electrode and including a light-emitting layer; and an upper electrode on the at least one organic layer.

[0021] According to some embodiments, the display panel may further include: an encapsulation layer on the upper electrode; and a plurality of color filters on the encapsulation layer and in each of the first light-emitting region and the second light-emitting region.

[0022] According to some embodiments, the first reflective electrode and the second reflective electrode may be spaced apart from each other in a plan view and in the same layer.

[0023] According to some embodiments, the first transparent electrode may be in contact with the first reflective electrode through a first contact that passes through the first inorganic film.

[0024] According to some embodiments of the present disclosure, the display panel includes: a base layer including a display region and a non-display region, the display region including a first light-emitting region, a second light-emitting region, a third light-emitting region, and a non-light-emitting region; a first reflective electrode on the base layer and overlapping with the first light-emitting region; a second reflective electrode on the base layer and overlapping with the second light-emitting region; a third reflective electrode on the base layer and overlapping with the third light-emitting region; a first inorganic film overlapping with the first light-emitting region and at least partially on the first reflective electrode; and a second inorganic film overlapping with the first light-emitting region and the second light-emitting region and at least partially on the second reflective electrode, wherein the first inorganic film is spaced apart from the second reflective electrode and there is a first gap between the first inorganic film and the second reflective electrode, and the second inorganic film is spaced apart from the third reflective electrode and there is a second gap between the second inorganic film and the third reflective electrode.

[0025] According to some embodiments, the first inorganic film may cover the upper surface and the side surface of the first reflective electrode, and the second inorganic film may cover the upper surface and the side surface of the second reflective electrode.

[0026] According to some embodiments, the method includes: providing a preliminary display panel including a base layer, a first reflective electrode on the base layer, and a second reflective electrode on the base layer and spaced apart from the first reflective electrode; forming a first preliminary inorganic film to cover the first reflective electrode and the second reflective electrode respectively; and forming a first inorganic film by patterning the first preliminary inorganic film to remove a portion of the first preliminary inorganic film formed on the second reflective electrode, wherein when forming the first inorganic film, the first inorganic film and the second reflective electrode are patterned to be spaced apart from each other and there is a first gap between the first inorganic film and the second reflective electrode.

[0027] According to some embodiments, the method may further include: after forming the first inorganic film, forming a second preliminary inorganic film on the first inorganic film to cover the second reflective electrode; and forming a second inorganic film by patterning the second preliminary inorganic film.

[0028] According to some embodiments, the preliminary display panel may be on the first base layer and further include a third reflective electrode spaced apart from the first reflective electrode and the second reflective electrode. When forming the second preliminary inorganic film, the second preliminary inorganic film is formed to cover the third reflective electrode, and when forming the second inorganic film, the second inorganic film and the third reflective electrode are patterned to be spaced apart from each other with a second gap therebetween. Description of the Drawings

[0029] The drawings are included to provide a further understanding of the embodiments according to the present disclosure, and the drawings are incorporated into and constitute a part of this specification. The drawings illustrate aspects of some embodiments of the present disclosure and, together with the description, are used to explain aspects of some embodiments of the present disclosure. In the drawings:

[0030] Figure 1 is a perspective view showing an electronic device according to some embodiments of the present disclosure;

[0031] Figure 2A is a perspective view showing an electronic device according to some embodiments of the present disclosure;

[0032] Figure 2B is an exploded perspective view of an electronic device according to some embodiments of the present disclosure;

[0033] Figure 3 is a plan view of a display panel according to some embodiments of the present disclosure;

[0034] Figure 4 is a cross-sectional view of a display panel according to some embodiments of the present disclosure;

[0035] Figure 5A and Figure 5B are enlarged cross-sectional views of some configurations of a display panel according to some embodiments of the present disclosure, respectively;

[0036] Figure 6 is a cross-sectional view of a display panel according to some embodiments of the present disclosure;

[0037] Figure 7A and Figure 7B is a cross-sectional view of a light-emitting element according to some embodiments of the present disclosure;

[0038] Figure 8 is a flowchart of a method for manufacturing a display panel according to some embodiments of the present disclosure; and

[0039] Figures 9A to 9H is a cross-sectional view of some operations of a method for manufacturing a display panel according to some embodiments of the present disclosure. Detailed Description of the Embodiments

[0040] In this specification, when a component (or region, layer, part, etc.) is "on", "connected" or "coupled" to another component, this means that it is directly placed / connected / coupled on the other component, or a third component may be located between them.

[0041] The same reference numerals or symbols denote the same elements. Further, in the drawings, for the purpose of effectively describing the technical content, the thickness, ratio, and dimensions of components are exaggerated. "And / or" includes all combinations of one or more of the related elements that can be defined.

[0042] Terms such as first and second may be used to describe various components, but these components should not be limited by these terms. These terms are only for the purpose of differentiating one component from other components. For example, without departing from the scope of the present utility model, the first component may be referred to as the second component, and similarly, the second component may be referred to as the first component. Unless the context clearly indicates otherwise, singular expressions include plural expressions.

[0043] In addition, terms such as "below", "under", "above", and "on" are used to describe the relationship between components shown in the drawings. These terms are relative concepts and are described based on the directions indicated in the drawings.

[0044] Terms such as "comprising" or "having" are intended to specify the presence of features, numbers, steps, actions, components, parts, or combinations thereof described in the specification, and it should be understood that they do not exclude the possibility of the presence or addition of one or more other features, numbers, steps, operations, components, parts, or combinations thereof.

[0045] In this application, "directly located" may mean that no layer, film, region, plate, etc. is added between parts such as a layer, film, region, or plate. For example, "directly located" may mean placing two layers or two members without using an additional member such as an adhesive member between them.

[0046] Unless otherwise defined, all terms (including technical terms and scientific terms) used in this specification have the same meaning as commonly understood by those of ordinary skill in the art to which the present utility model belongs. In addition, terms, such as those defined in a common dictionary, should be interpreted as having a meaning consistent with the meaning in the context of the related art, and should not be interpreted as being too idealized or too formal unless clearly defined in this document.

[0047] Hereinafter, an electronic device and a display panel included therein according to some embodiments of the present disclosure will be described in more detail with reference to the drawings.

[0048] Figure 1is a perspective view showing an electronic device EE according to some embodiments of the present disclosure. The electronic device EE can be activated in response to an electrical signal. For example, the electronic device EE can be a television, a monitor, a billboard, a game console, a personal computer, a laptop computer, a mobile phone, a tablet computer, a navigation system, and a wearable device, but is not limited thereto according to the embodiments of the present disclosure.

[0049] Figure 1 Shows a head-mounted display (HMD) device as an example of the electronic device EE. The head-mounted display device can be a device mounted on a user's head to provide a screen for displaying images or videos to the user. The head-mounted display device can include a perspective type that provides augmented reality (AR) based on real external objects and an enclosed type that provides virtual reality (VR) to the user on a screen independent of external objects.

[0050] Reference Figure 1 , the electronic device EE can include a display panel DP and a lens part LS opposite to the display panel DP. In addition, the electronic device EE can include a main frame MF, a cover frame CF, and a fixing part FP.

[0051] The main frame MF can be attached to the user's face. The main frame MF can have a shape corresponding to the shape of the user's head (face). For example, the length of the fixing part FP can be controlled according to the circumference of the user's head. The fixing part FP as a structure facilitating the attachment of the main frame MF can include a sling, a strap, etc. However, it is not limited thereto according to the embodiments of the present disclosure, and the fixing part FP can have various forms such as a helmet or temple arms connected to the main frame MF.

[0052] The lens part LS, the display panel DP, and the cover frame CF can be mounted on the main frame MF. The main frame MF can include a space or structure in which the lens part LS and the display panel DP can be accommodated.

[0053] The lens part LS can be located between the display panel DP and the user. The light incident from the display panel DP can pass through the lens part LS and be provided to the user. For example, the lens part LS can include various types of lenses such as a multi-channel lens, a convex lens, a concave lens, a spherical lens, an aspherical lens, a single lens, a compound lens, a standard lens, a narrow-angle lens, a wide-angle lens, a fixed-focus lens, or a zoom lens.

[0054] The lens part LS can include a first lens LS1 and a second lens LS2. The first lens LS1 and the second lens LS2 can be respectively arranged corresponding to the positions of the user's left eye and right eye. The first lens LS1 and the second lens LS2 can be accommodated in the main frame MF.

[0055] The display panel DP can be set to a state fixed to the main frame MF, or to a state attachable to or detachable from the main frame MF. The display panel DP will be described in more detail later.

[0056] The cover frame CF can be located on one surface of the display panel DP to protect the display panel DP. The cover frame CF and the lens portion LS can be spaced apart from each other with the display panel DP therebetween.

[0057] Figure 1 The following drawings illustrate a first direction DR1 to a third direction DR3, and the directions indicated by the first direction DR1, the second direction DR2, and the third direction DR3 described in this specification are relative concepts and can be changed to other directions. In addition, the directions indicated by the first direction DR1, the second direction DR2, and the third direction DR3 can be described as the first to third directions and the same reference numerals or symbols can be used. In this specification, the first direction DR1 and the second direction DR2 can be perpendicular to each other, and the third direction DR3 can be the normal direction of the plane defined by the first direction DR1 and the second direction DR2.

[0058] The thickness direction of the electronic device EE can be parallel to the third direction DR3 which is the normal direction of the plane defined by the first direction DR1 and the second direction DR2. In this specification, the front surface (or upper surface) and the rear surface (or lower surface) of the components constituting the electronic device EE can be defined with respect to the third direction DR3. In this specification, "on a plane" or "in a plan view" means a view parallel to a surface parallel to the plane defined by the first direction DR1 and the second direction DR2, and "in a cross-section" means a surface parallel to the third direction DR3.

[0059] Figure 2A is a perspective view showing an electronic device EE-a according to some embodiments of the present disclosure. Figure 2A is a perspective view showing an electronic device according to some embodiments of the present disclosure, and shows a mobile phone as an example of the electronic device EE-a. The electronic device EE-a can display an image IM through an active area AA-DD. The active area AA-DD can include a plane defined by the first direction DR1 and the second direction DR2. The active area AA-DD can include a curved surface curved from at least one side of the plane defined by the first direction DR1 and the second direction DR2. However, this is an example, and the shape of the active area AA-DD is not limited thereto. For example, the active area AA-DD can include only a plane, or can also include at least two curved surfaces curved from the plane, such as four curved surfaces curved from the four side surfaces of the plane, respectively.

[0060] The peripheral region NAA-DD is adjacent to the active region AA-DD. The peripheral region NAA-DD can surround the active region AA-DD. Thus, the shape of the active region AA-DD can be substantially defined by the peripheral region NAA-DD. However, this is merely an example, and the peripheral region NAA-DD can be positioned adjacent to one side of the active region AA-DD, or can be omitted. The active region AA-DD can be provided in various shapes and is not limited to any one embodiment.

[0061] Figure 2B is Figure 2A an exploded perspective view of the electronic device EE-a shown in Figure 2B , the electronic device EE-a can include a housing HAU, a display panel DP, and a window member WM.

[0062] The window member WM can cover the entire exterior of the display panel DP. The window member WM can include a transmissive region TA and a border region BZA. The front surface of the window member WM including the transmissive region TA and the border region BZA can correspond to the front surface of the electronic device EE-a. The transmissive region TA can correspond to Figure 2A the active region AA-DD of the electronic device EE-a shown in Figure 2A and the border region BZA can correspond to

[0063] the peripheral region NAA-DD of the electronic device EE-a shown in

[0064] According to some embodiments, an input sensing portion can be provided on the display panel DP. The input sensing portion can sense an external input applied from the outside. The external input can be a user input. The user input can include various forms of external input such as a part of a user's body, light, heat, a pen, or pressure. For example, the input sensing portion can be located on the encapsulation layer TFE (see Figure 4 ) of the display panel DP which will be described in more detail later. Optionally, the input sensing portion can be directly located on the encapsulation layer TFE (see Figure 4 ), or can be directly located on a layer positioned on the encapsulation layer TFE (see Figure 4) on the bonding member. The bonding member may include a typical adhesive or binder.

[0065] In this specification, a component (region, layer, member, etc.) being "directly on" another component means that no third component is located between one component and the other component. That is, a component being "directly on" another component means that one component and the other component are in "contact" with each other.

[0066] The housing HAU may accommodate a display panel DP, etc. The housing HAU may be coupled to the window member WM.

[0067] Figure 3 is a plan view showing a display panel DP according to some embodiments of the present disclosure. Hereinafter, the description of the display panel DP may equally apply to Figure 1 and Figure 2B the display panel DP included in the electronic devices EE and EE-a shown in

[0068] Referring to Figure 3 , the display panel DP may include a light-emitting region PXA and a non-light-emitting region NPXA. The non-light-emitting region NPXA may surround the light-emitting region PXA. The light-emitting region PXA may be provided in plurality. The light-emitting region PXA may include a first light-emitting region PXA-1, a second light-emitting region PXA-2, and a third light-emitting region PXA-3. The first light-emitting region PXA-1, the second light-emitting region PXA-2, and the third light-emitting region PXA-3 may respectively emit light having different wavelength regions from each other. The first light-emitting region PXA-1 may emit first light, and the second light-emitting region PXA-2 may emit second light different from the first light. The third light-emitting region PXA-3 may emit third light different from the first light and the second light. At the same time, the first light may be red light, the second light may be green light, and the third light may be blue light.

[0069] Among the first light-emitting region PXA-1, the second light-emitting region PXA-2, and the third light-emitting region PXA-3, the third light-emitting region PXA-3 may have the largest area, and the second light-emitting region PXA-2 may have the smallest area. However, this is an example, and the areas of the first light-emitting region PXA-1, the second light-emitting region PXA-2, and the third light-emitting region PXA-3 are not limited thereto. Figure 3 shows that the first light-emitting region PXA-1 and the third light-emitting region PXA-3 are alternately arranged in a row, and the second light-emitting region PXA-2 is spaced apart from the first light-emitting region PXA-1 and the third light-emitting region PXA-3 to be arranged in another row. However, this is an example, and the arrangement of the first light-emitting region PXA-1, the second light-emitting region PXA-2, and the third light-emitting region PXA-3 is not limited thereto.

[0070] Figure 4 is a cross-sectional view of a display panel according to some embodiments of the present disclosure. Figure 5A and Figure 5B are enlarged cross-sectional views of some configurations of a display panel according to some embodiments of the present disclosure, respectively. Figure 4 is a cross-sectional view showing a portion corresponding to the line I-I' in Figure 3 . Figure 5A is an enlarged view of a first lower electrode LE1 and a second lower electrode LE2 included in the display panel DP in Figure 4 . Figure 5B is an enlarged view of a second lower electrode LE2 and a third lower electrode LE3 included in the display panel DP of Figure 4 .

[0071] Referring to Figure 4 , the display panel DP may include a base layer BS, a circuit layer DP-CL located on the base layer BS, a display element layer DP-ED located on the circuit layer DP-CL, and a packaging layer TFE located on the display element layer DP-ED. In addition, the display panel DP may further include a color filter layer CFL located on the packaging layer TFE.

[0072] Referring to Figure 4 , the base layer BS may be a member providing a base surface on which the circuit layer DP-CL is located. The base layer BS may be a rigid substrate or a flexible substrate that is bendable, foldable, or rollable. The base layer BS may be a glass substrate, a metal substrate, a polymer substrate, etc. However, according to the embodiments of the present disclosure, it is not limited thereto, and the base layer BS may be an inorganic layer, an organic layer, or a composite material layer.

[0073] The base layer BS may include a single layer or multiple layers. For example, the base layer BS may include a first synthetic resin layer, an intermediate layer having a single-layer structure or a multi-layer structure, and a second synthetic resin layer stacked in sequence. The intermediate layer may be referred to as a base barrier layer. The intermediate layer may include a silicon oxide (SiO x ) layer and an amorphous silicon (a-Si) layer located on the silicon oxide layer, but is not particularly limited thereto. For example, the intermediate layer may include at least one of a silicon oxide layer, a silicon nitride layer, a silicon oxynitride layer, and an amorphous silicon layer.

[0074] The first synthetic resin layer and the second synthetic resin layer may each include a polyimide-based resin. In addition, the first synthetic resin layer and the second synthetic resin layer may each include at least one of an acrylic resin, a methacrylate resin, a polyisoprene-based resin, a vinyl-based resin, an epoxy-based resin, a urethane-based resin, a cellulose-based resin, a silicone-based resin, a polyamide-based resin, and a perylene-based resin. In the present specification, "resin based on X" means a resin including "functional group X".

[0075] The circuit layer DP-CL may be located on the base layer BS. The circuit layer DP-CL may include an insulating layer, a semiconductor pattern, a conductive pattern, signal lines, etc. After forming the insulating layer, the semiconductor layer, and the conductive layer on the base layer BS by methods such as coating and deposition, the insulating layer, the semiconductor layer, and the conductive layer may be selectively patterned by multiple photolithography processes. Thereafter, the semiconductor pattern, the conductive pattern, and the signal lines included in the circuit layer DP-CL may be formed.

[0076] According to some embodiments, the base layer BS may be a silicon substrate. The base layer BS may be a single-crystalline silicon wafer, a polycrystalline silicon wafer, or an amorphous silicon wafer. The circuit layer DP-CL may include an insulating layer, a semiconductor pattern, a conductive pattern, signal lines, etc.

[0077] The display element layer DP-ED may be located on the circuit layer DP-CL. The display element layer DP-ED may include a first light-emitting element ED-1, a second light-emitting element ED-2, and a third light-emitting element ED-3, an inorganic film TCF, a pixel defining film PDL, and a cover layer CPL.

[0078] The first light-emitting element ED-1, the second light-emitting element ED-2, and the third light-emitting element ED-3 may be spaced apart from each other in a direction intersecting the third direction DR3. The first light-emitting element ED-1, the second light-emitting element ED-2, and the third light-emitting element ED-3 may each include a lower electrode LE1, LE2, and LE3, an organic layer OL located on the lower electrodes LE1, LE2, and LE3, and an upper electrode UE located on the organic layer OL. In addition, the display element layer DP-ED may include a cover layer CPL located on the upper electrode UE.

[0079] Refer together Figure 4 、 Figure 5A and Figure 5B, the lower electrodes LE1, LE2, and LE3 may respectively include reflective electrodes RE1, RE2, and RE3 located on the circuit layer DP-CL and transparent electrodes TE1, TE2, and TE3 respectively located on the reflective electrodes RE1, RE2, and RE3. At the same time, in this specification, the lower electrodes LE1, LE2, and LE3 may mean "anode". The lower electrodes LE1, LE2, and LE3 may respectively include a stacked structure of the reflective electrodes RE1, RE2, and RE3 and the transparent electrodes TE1, TE2, and TE3.

[0080] The reflective electrodes RE1, RE2, and RE3 may include a first reflective electrode RE1 included in the first light-emitting element ED-1, a second reflective electrode RE2 included in the second light-emitting element ED-2, and a third reflective electrode RE3 included in the third light-emitting element ED-3.

[0081] The first reflective electrode RE1, the second reflective electrode RE2, and the third reflective electrode RE3 may each include an electrode having a three-layer structure. The first reflective electrode RE1, the second reflective electrode RE2, and the third reflective electrode RE3 may respectively include a first layer E1-1, E1-2, and E1-3, a second layer E2-1, E2-2, and E2-3, and a third layer E3-1, E3-2, and E3-3 stacked in sequence. The first layer E1-1, E1-2, and E1-3 and the third layer E3-1, E3-2, and E3-3 may each include a transparent conductive oxide. The first layer E1-1, E1-2, and E1-3 and the third layer E3-1, E3-2, and E3-3 may each include at least one selected from the group consisting of indium tin oxide (ITO), indium zinc oxide (IZO), indium gallium zinc oxide (IGZO), zinc oxide (ZnO x ) or indium oxide (In2O3) and aluminum-doped zinc oxide (AZO). For example, the first layer E1-1, E1-2, and E1-3 and the third layer E3-1, E3-2, and E3-3 may each include indium tin oxide (ITO) or indium zinc oxide (IZO).

[0082] The second layer E2-1, E2-2, and E2-3 may include a reflective metal material. The second layer E2-1, E2-2, and E2-3 may include a metal with a high reflectivity, an oxide of a metal with a high reflectivity, a nitride of a metal with a high reflectivity, etc. The second layer E2-1, E2-2, and E2-3 may include any one of Ag, Mg, Cu, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, Li, Ca, LiF / Ca, LiF / Al, Mo, and Ti with a high reflectivity. For example, the second layer E2-1, E2-2, and E2-3 may include Ag.

[0083] The transparent electrodes TE1, TE2, and TE3 may include a first transparent electrode TE1 included in the first light-emitting element ED-1, a second transparent electrode TE2 included in the second light-emitting element ED-2, and a third transparent electrode TE3 included in the third light-emitting element ED-3.

[0084] The first transparent electrode TE1, the second transparent electrode TE2, and the third transparent electrode TE3 may each include a transparent conductive oxide. The first transparent electrode TE1, the second transparent electrode TE2, and the third transparent electrode TE3 may each include at least one selected from the group consisting of indium tin oxide (ITO), indium zinc oxide (IZO), indium gallium zinc oxide (IGZO), zinc oxide (ZnO x ), or indium oxide (In2O3) and aluminum-doped zinc oxide (AZO). For example, the first transparent electrode TE1, the second transparent electrode TE2, and the third transparent electrode TE3 may each include indium tin oxide (ITO) or indium zinc oxide (IZO).

[0085] The inorganic film TCF is located between at least some of the reflective electrodes RE1, RE2, and RE3 and the transparent electrodes TE1, TE2, and TE3. The inorganic film TCF may be located between at least some of the reflective electrodes RE1, RE2, and RE3 and the transparent electrodes TE1, TE2, and TE3, and thus may control the resonance distance of each of the first light-emitting element ED-1, the second light-emitting element ED-2, and the third light-emitting element ED-3. The inorganic film TCF may be located between at least some of the reflective electrodes RE1, RE2, and RE3 and the transparent electrodes TE1, TE2, and TE3, and thus the reflective electrodes RE1, RE2, and RE3 and the transparent electrodes TE1, TE2, and TE3 may be spaced apart from each other so as to be designed to achieve an optimal resonance frequency that causes optical resonance by the light emitted by the first light-emitting element ED-1, the second light-emitting element ED-2, and the third light-emitting element ED-3, respectively.

[0086] Meanwhile, different from Figure 4 , Figure 5A and Figure 5B shown, the lower electrodes LE1, LE2, and LE3 may include only the reflective electrodes RE1, RE2, and RE3 and may not include the transparent electrodes TE1, TE2, and TE3. The lower electrodes LE1, LE2, and LE3 may include the reflective electrodes RE1, RE2, and RE3, and the reflective electrodes RE1, RE2, and RE3 may include, for example, titanium oxide (TiO x ). At least a part of the inorganic film TCF may be located on the reflective electrodes RE1, RE2, and RE3.

[0087] The inorganic film TCF may include a first inorganic film TCF1 and a second inorganic film TCF2. The first inorganic film TCF1 is located between a first reflective electrode RE1 and a first transparent electrode TE1. The second inorganic film TCF2 may be located between the first reflective electrode RE1 and the first transparent electrode TE1. The second inorganic film TCF2 may be located between a second reflective electrode RE2 and a second transparent electrode TE2. The first inorganic film TCF1 may not be located between the second reflective electrode RE2 and the second transparent electrode TE2 and between a third reflective electrode RE3 and a third transparent electrode TE3. The second inorganic film TCF2 may not be located between the third reflective electrode RE3 and the third transparent electrode TE3.

[0088] The first inorganic film TCF1 and the second inorganic film TCF2 may all be located between the first reflective electrode RE1 and the first transparent electrode TE1, and thus the first reflective electrode RE1 and the first transparent electrode TE1 may be spaced apart from each other by a first distance d1 in the thickness direction of the display panel DP. The second inorganic film TCF2 may be located between the second reflective electrode RE2 and the second transparent electrode TE2, and thus the second reflective electrode RE2 and the second transparent electrode TE2 may be spaced apart from each other by a second distance d2 in the thickness direction of the display panel DP. The first distance d1 may be greater than the second distance d2. The inorganic film TCF may not be located between the third reflective electrode RE3 and the third transparent electrode TE3, and thus the third transparent electrode TE3 may be directly located on the third reflective electrode RE3.

[0089] The first inorganic film TCF1 may not be located between the second reflective electrode RE2 and the second transparent electrode TE2 and between the third reflective electrode RE3 and the third transparent electrode TE3, and may be spaced apart from each of the second reflective electrode RE2 and the third reflective electrode RE3. The first inorganic film TCF1 may be spaced apart from the second reflective electrode RE2 and have a first gap GP1 between the first inorganic film TCF1 and the second reflective electrode RE2. The first inorganic film TCF1 may be spaced apart from the third reflective electrode RE3 and have a second gap GP2 between the first inorganic film TCF1 and the third reflective electrode RE3. The second inorganic film TCF2 may not be located between the third reflective electrode RE3 and the third transparent electrode TE3, and may be spaced apart from the third reflective electrode RE3. The second inorganic film TCF2 may be spaced apart from the third reflective electrode RE3 and have the second gap GP2 between the second inorganic film TCF2 and the third reflective electrode RE3. The first gap GP1 and the second gap GP2 may each be, for example, about 2 μm or less.

[0090] The transparent electrodes TE1, TE2, and TE3 can be in contact with the reflective electrodes RE1, RE2, and RE3. The transparent electrodes TE1, TE2, and TE3 can be in contact with the reflective electrodes RE1, RE2, and RE3 to supply charge to the hole transport regions HTR (see Figure 7A ) located on the transparent electrodes TE1, TE2, and TE3. At the same time, since the first inorganic film TCF1 and the second inorganic film TCF2 are located between the first reflective electrode RE1 and the first transparent electrode TE1, the first transparent electrode TE1 can be in contact with the first reflective electrode RE1 through the first contact member CH1 passing through the first inorganic film TCF1 and the second inorganic film TCF2. Since the second inorganic film TCF2 is located between the second reflective electrode RE2 and the second transparent electrode TE2, the second transparent electrode TE2 can be in contact with the second reflective electrode RE2 through the second contact member CH2 passing through the second inorganic film TCF2.

[0091] The first inorganic film TCF1 can cover the upper surface and the side surface of the first reflective electrode RE1. The first inorganic film TCF1 can completely cover the remaining part of the upper surface of the first reflective electrode RE1 except for the part corresponding to the first contact member CH1 and the side surface. The second inorganic film TCF2 can cover the upper surface and the side surface of the second reflective electrode RE2. The second inorganic film TCF2 can completely cover the remaining part of the upper surface of the second reflective electrode RE2 except for the part corresponding to the second contact member CH2 and the side surface.

[0092] Each of the first inorganic film TCF1 and the second inorganic film TCF2 includes an inorganic material. Each of the first inorganic film TCF1 and the second inorganic film TCF2 can include at least one of silicon oxide (SiO x ), silicon nitride (SiN x ), and silicon oxynitride (SiO x N y ). Each of the first inorganic film TCF1 and the second inorganic film TCF2 can include, for example, silicon oxide (SiO x ).

[0093] The display element layer DP-ED of the display panel DP may include a pixel definition layer PDL. The pixel definition layer PDL may be located on at least a portion of the lower electrodes LE1, LE2, and LE3 and on the inorganic film TCF. The pixel definition layer PDL may partially cover each of the transparent electrodes TE1, TE2, and TE3 (e.g., cover the edges of the transparent electrodes TE1, TE2, and TE3). The pixel definition layer PDL may include pixel openings that at least partially expose the upper surfaces of each of the transparent electrodes TE1, TE2, and TE3 included in the lower electrodes LE1, LE2, and LE3, and the pixel openings may define a first light-emitting region PXA-1, a second light-emitting region PXA-2, and a third light-emitting region PXA-3.

[0094] The pixel definition layer PDL may include an inorganic material. The pixel definition layer PDL may include silicon oxide (SiO x ), silicon nitride (SiN x ), and silicon oxynitride (SiO x N y ) or at least one of them. The pixel definition layer PDL may include, for example, silicon oxide (SiO x ).

[0095] The side surfaces of the pixel definition layer PDL that define the pixel openings may each have a predetermined taper angle. The side surfaces of the pixel definition layer PDL may each have a taper angle of about 40° or greater. The side surfaces of the pixel definition layer PDL may each have a taper angle of, for example, about 75° to about 90°. Since the pixel definition layer PDL includes an inorganic material, the side surfaces of the pixel definition layer PDL may each have a large taper angle of about 75° or greater.

[0096] The first inorganic film TCF1 and the second inorganic film TCF2 may each have a thickness of, for example, about to about . The pixel definition layer PDL may have a thickness of, for example, about to about .

[0097] Among the first light-emitting element ED-1, the second light-emitting element ED-2, and the third light-emitting element ED-3, the organic layer OL may be set as a common layer. The organic layer OL may include at least one light-emitting layer. The first light-emitting element ED-1, the second light-emitting element ED-2, and the third light-emitting element ED-3 may be light-emitting elements having a tandem structure. The organic layer OL may overlap with the first light-emitting region PXA-1, the second light-emitting region PXA-2, the third light-emitting region PXA-3, and the non-light-emitting region NPXA. At the same time, in this specification, the phrase "one component overlaps with another component" includes not only that the two components have the same area and the same shape on a plane or in a plan view, but also that the two components have different areas and / or different shapes. The organic layer OL may at least include a plurality of light-emitting layers EML-1, EML-2, and EML-3 (see Figure 7A ). A more detailed description of the organic layer OL will be given later.

[0098] Among the first light-emitting element ED-1, the second light-emitting element ED-2, and the third light-emitting element ED-3, the upper electrode UE may be set as a common electrode. The upper electrode UE may be a common layer that overlaps with all of the first light-emitting region PXA-1, the second light-emitting region PXA-2, the third light-emitting region PXA-3, and the non-light-emitting region NPXA and has an integral shape. At the same time, in this specification, the upper electrode UE located on the organic layer OL may refer to a "cathode".

[0099] The cover layer CPL may be located on the upper electrode UE. The cover layer CPL may include a single layer or a plurality of layers. The cover layer CPL may be an organic layer or an inorganic layer. For example, when the cover layer CPL includes an inorganic material, the inorganic material may include an alkali metal compound such as LiF, an alkaline earth metal compound such as MgF2, SiON, SiN x , SiO y , etc. In contrast, when the cover layer CPL includes an organic material, the organic material may include α-NPD, NPB, TPD, m-MTDATA, Alq3, CuPc, TPD15 (N4,N4,N4',N4'-tetrakis(biphenyl-4-yl)biphenyl-4,4'-diamine), TCTA (4,4',4"-tris(carbazol-9-yl)triphenylamine), etc., or may include an epoxy resin or an acrylate such as a methacrylate.

[0100] The encapsulation layer TFE can be located on the display element layer DP-ED. The encapsulation layer TFE can protect the display element layer DP-ED from impurities such as moisture, oxygen, and dust particles. The encapsulation layer TFE can include at least one inorganic film (hereinafter, inorganic encapsulation film). In addition, the encapsulation layer TFE can include at least one organic film (hereinafter, organic encapsulation film) and at least one inorganic encapsulation film.

[0101] The inorganic encapsulation film can protect the display element layer DP-ED from moisture / oxygen, and the organic encapsulation film can protect the display element layer DP-ED from impurities such as dust particles. The inorganic encapsulation film can include silicon nitride, silicon oxynitride, silicon oxide, titanium oxide, aluminum oxide, etc., but is not particularly limited thereto. The organic encapsulation film can include acrylic compounds, epoxy-based compounds, etc. The organic encapsulation film can include an organic photosynthesizable material, but is not particularly limited thereto.

[0102] The color filter layer CFL can be located on the encapsulation layer TFE. The color filter layer CFL can include a first filter CF1 corresponding to the first light-emitting region PXA-1, a second filter CF2 corresponding to the second light-emitting region PXA-2, and a third filter CF3 corresponding to the third light-emitting region PXA-3. According to some embodiments, the color filter layer CFL can further include a light-blocking portion. The light-blocking portion can be a black matrix. The light-blocking portion can be formed to include an organic light-blocking material or an inorganic light-blocking material containing a black pigment or black dye. The light-blocking portion can prevent light leakage and can separate adjacent filters CF1, CF2, and CF3.

[0103] The first filter CF1, the second filter CF2, and the third filter CF3 can each include a polymer photosensitive resin and a colorant. In this specification, the colorant includes pigments and dyes. The red colorant includes red pigments and red dyes, the green colorant includes green pigments and green dyes, and the blue colorant includes blue pigments and blue dyes.

[0104] In Figure 4In this case, the first filter CF1 may include a red pigment and a red dye, the second filter CF2 may include a green pigment and a green dye, and the third filter CF3 may include a blue pigment and a blue dye. That is, the first filter CF1 located on the first light-emitting element ED-1 may include a red colorant, the second filter CF2 located on the second light-emitting element ED-2 may include a green colorant, and the third filter CF3 located on the third light-emitting element ED-3 may include a blue colorant. The outer coating OC is disposed on the color filter layer CFL and may cover each of the first color filter CF1, the second color filter CF2, and the third color filter CF3. The outer coating OC may flatten the upper surface of the color filter layer CFL. The outer coating OC may include an organic material.

[0105] Figure 6 is a cross-sectional view of a display panel according to some embodiments of the present disclosure. Figure 6 FIG. shows a display panel DP-1 according to some embodiments of the present disclosure. Hereinafter, in the description of the display panel DP-1 according to some embodiments of the present disclosure, the same configurations as those described above will be given the same numbers or symbols, and some of their repeated detailed descriptions may be omitted.

[0106] Reference Figure 6 , in the display panel DP-1 according to some embodiments, the inorganic film TCF-1 included in the display element layer DP-ED may include a first inorganic film TCF1, a second inorganic film TCF2, and a third inorganic film TCF3.

[0107] The first inorganic film TCF1 is located between the first reflective electrode RE1 and the first transparent electrode TE1. The second inorganic film TCF2 may be located between the first reflective electrode RE1 and the first transparent electrode TE1. The second inorganic film TCF2 may be located between the second reflective electrode RE2 and the second transparent electrode TE2. The third inorganic film TCF3 may be located between the first reflective electrode RE1 and the first transparent electrode TE1. The third inorganic film TCF3 may be located between the second reflective electrode RE2 and the second transparent electrode TE2. The third inorganic film TCF3 may be located between the third reflective electrode RE3 and the third transparent electrode TE3. The third inorganic film TCF3 may be provided as a common layer.

[0108] The first inorganic film TCF1 may not be located between the second reflective electrode RE2 and the second transparent electrode TE2 and between the third reflective electrode RE3 and the third transparent electrode TE3. The second inorganic film TCF2 may not be located between the third reflective electrode RE3 and the third transparent electrode TE3.

[0109] The first inorganic film TCF1 to the third inorganic film TCF3 may all be located between the first reflective electrode RE1 and the first transparent electrode TE1, the second inorganic film TCF2 and the third inorganic film TCF3 may be located between the second reflective electrode RE2 and the second transparent electrode TE2, and the third inorganic film TCF3 may be located between the third reflective electrode RE3 and the third transparent electrode TE3.

[0110] A display panel according to some embodiments of the present disclosure includes an inorganic film disposed between a reflective electrode and a transparent electrode in at least one lower electrode, and thus may have a resonance structure suitable for the wavelength of light emitted by a light-emitting element, thereby achieving excellent display resolution and improved light-emitting efficiency. For example, according to some embodiments of the present disclosure, since the thickness of the first resonance electrode in the light-emitting element is designed according to the wavelength of light to be output, the resonance distance can be controlled to have an optimal resonance frequency, thereby having excellent display resolution. At the same time, the inorganic film provided to control the resonance distance has a structure overlapping with the light-emitting element and is spaced apart from the reflective electrode of another light-emitting element. For example, as Figure 4 shown, the first inorganic film TCF1 located between the first reflective electrode RE1 and the first transparent electrode TE1 has a structure spaced apart from the second reflective electrode RE2 and the third reflective electrode RE3. Therefore, a large step difference in the pixel defining film including an inorganic material can be prevented, and thus a limitation on disconnection of the upper electrode located on the pixel defining film can be prevented. Therefore, the display panel according to some embodiments of the present disclosure can achieve high resolution and high light-emitting efficiency through excellent optical resonance design, and can improve the durability and reliability of the display panel.

[0111] Figure 7A and Figure 7B are cross-sectional views of a light-emitting element according to some embodiments of the present disclosure. Figure 7A and Figure 7B Specifically show the organic layer OL included in the light-emitting element ED according to some embodiments of the present disclosure. The description of the light-emitting element ED to be described later in Figure 7A and Figure 7B can be equally applied to each of the first light-emitting element ED-1, the second light-emitting element ED-2, and the third light-emitting element ED-3 in Figure 4 .

[0112] Refer to Figure 7A and Figure 7B, according to some embodiments, the organic layer OL may include a hole transport region HTR, a first emission layer EML-1, an auxiliary emission part EA, a second emission layer EML-2, a third emission layer EML-3, and an electron transport region ETR. In the light-emitting element ED, the hole transport region HTR, the first emission layer EML-1, the auxiliary emission part EA, the second emission layer EML-2, the third emission layer EML-3, and the electron transport region ETR may be provided as a common layer. The light-emitting element ED including the first emission layer EML-1, the second emission layer EML-2, and the third emission layer EML-3 that respectively generate light in different wavelength regions may emit white light. According to some embodiments, the thickness of each of the hole transport region HTR, the auxiliary emission part EA, and the electron transport region ETR included in the light-emitting element ED may be set such that red light, green light, or blue light has an nth resonance. At the same time, the thickness of the above-mentioned inorganic film TCF (see Figure 4 ) may also be set such that red light, green light, or blue light emitted by each of the emission layers EML-1, EML-2, and EML-3 of the light-emitting element ED has an nth resonance.

[0113] The first emission layer EML-1, the second emission layer EML-2, and the third emission layer EML-3 provided as a common layer may be deposited without any mask, and thus pixels having a smaller area may be formed. In the display panel DP according to some embodiments, more pixels having a smaller area may be arranged on a plane or in a plan view, thereby achieving a relatively high resolution.

[0114] In the light-emitting element ED, the hole transport region HTR may be provided on the lower electrode LE and the inorganic film TCF. At the same time, Figure 7A and Figure 7B the lower electrode LE in Figure 4 , Figure 5A and Figure 5BThe lower electrodes LE1, LE2, and LE3 described in . The hole transport region HTR may have a single layer composed of a single material, a single layer composed of multiple different materials, or a multilayer structure having multiple layers composed of multiple different materials. For example, the hole transport region HTR may include phthalocyanine compounds such as copper phthalocyanine, DNTPD (N1,N1'-([1,1'-biphenyl]-4,4'-diyl)bis(N1-phenyl-N4,N4-dim-tolyl-1,4-diamine)), m-MTDATA (4,4',4"-[tris(3-methylphenyl)phenylamino]triphenylamine), TDATA (4,4',4"-tris(N,N-diphenylamino)triphenylamine), 2-TNATA (4,4',4"-tris[N(2-naphthyl)-N-phenylamino]-triphenylamine), PEDOT / PSS (poly(3,4-ethylenedioxythiophene) / poly(4-styrenesulfonate)), PANI / DBSA (polyaniline / dodecylbenzenesulfonic acid), PANI / CSA (polyaniline / camphorsulfonic acid), PANI / PSS (polyaniline / poly(4-styrenesulfonate)), NPB (N,N'-di(naphthalen-1-yl)-N,N'-diphenyl-benzidine), TPAPEK (triarylamine-containing polyether ketone), 4-isopropyl-4'-methyldiphenyliodonium [tetrakis(pentafluorophenyl)borate], HATCN (dipyrazino[2,3-f:2',3'-h]quinoxaline-2,3,6,7,10,11-hexacarbonitrile), and the like.

[0115] In addition, the hole transport region HTR may include carbazole-based derivatives such as N-phenylcarbazole and polyvinylcarbazole, fluorene-based derivatives, triphenylamine-based derivatives such as TPD (N,N'-bis(3-methylphenyl)-N,N'-diphenyl-[1,1'-biphenyl]-4,4'-diamine) and TCTA (4,4',4"-tris(N-carbazolyl)triphenylamine), TAPC (4,4'-cyclohexylidenebis[N,N-bis(4-methylphenyl)aniline]), HMTPD (4,4'-bis[N,N'-(3-methylphenyl)amino]-3,3'-dimethylbiphenyl), CzSi (9-(4-tert-butylphenyl)-3,6-bis(triphenylsilyl)-9H-carbazole), CCP (9-phenyl-9H-3,9'-bicarbazole), mCP (1,3-bis(N-carbazolyl)benzene), mDCP (1,3-bis(1,8-dimethyl-9H-carbazol-9-yl)benzene), and the like.

[0116] The hole transport region HTR may further include a charge generation material to improve the conductive properties, as well as the above materials. The charge generation material may be uniformly or non-uniformly dispersed in the hole transport region HTR. The charge generation material may be, for example, a p-type dopant. The p-type dopant may include at least one of a metal halide compound, a quinone derivative, a metal oxide, and a cyanide-containing compound, but is not limited thereto. For example, the p-type dopant may be a metal halide compound such as CuI and RbI, a quinone derivative such as TCNQ (tetracyanoquinodimethane) and F4-TCNQ (2,3,5,6-tetrafluoro-7,7',8,8'-tetracyanoquinodimethane), a metal oxide such as tungsten oxide and molybdenum oxide, and a cyanide-containing compound such as HATCN (dipyrazino[2,3-f:2',3'-h]quinoxaline-2,3,6,7,10,11-hexacarbonitrile) and NDP9 (4-[[2,3-bis[cyano-(4-cyano-2,3,5,6-tetrafluorophenyl)methylene]cyclopropylidene]-cyanomethyl]-2,3,5,6-tetrafluorobenzonitrile), but is not limited thereto according to the embodiments of the present disclosure.

[0117] The hole transport region HTR may include a hole injection layer HIL, a first hole transport layer HTL, and a first sub-hole control layer AIL-1 stacked in sequence. Different from that shown, at least one of the hole injection layer HIL, the first hole transport layer HTL, and the first sub-hole control layer AIL-1 may be omitted. The hole injection layer HIL, the first hole transport layer HTL, and the first sub-hole control layer AIL-1 may include the compounds of the hole transport region HTR as described above.

[0118] The first sub-hole control layer AIL-1 may be positioned adjacent to the first light-emitting layer EML-1 that generates the first light. The first sub-hole control layer AIL-1 may be formed to have a HOMO (highest occupied molecular orbital) energy level and a LUMO (lowest unoccupied molecular orbital) energy level that promote the movement of holes. Therefore, an increase in the driving voltage of the light-emitting element ED including the first sub-hole control layer AIL-1 can be prevented. In addition, the first sub-hole control layer AIL-1 may prevent electrons from moving from the first light-emitting layer EML-1 to the hole transport region HTR. Therefore, the display panel DP including the light-emitting element ED including the first sub-hole control layer AIL-1 may have an improved display lifetime.

[0119] The electron transport region ETR may be provided on the auxiliary light-emitting portion EA. The electron transport region ETR may have a single-layer structure composed of a single material, a single-layer structure composed of a plurality of different materials, or a multi-layer structure having a plurality of layers composed of a plurality of different materials.

[0120] For example, the electron transport region ETR may include anthracene-based compounds, but is not limited thereto. The electron transport region ETR may include Alq3 (tris(8-hydroxyquinolinato)aluminum), 1,3,5-tris[(3-pyridyl)-benzene-3-yl]benzene, 2,4,6-tris(3'-(pyridin-3-yl)biphenyl-3-yl)-1,3,5-triazine, 2-(4-(N-phenylbenzimidazol-1-yl)phenyl)-9,10-dinaphthylanthracene, TPBi (1,3,5-tris(1-phenyl-1H-benzo[d]imidazol-2-yl)benzene), BCP (2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline), Bphen (4,7-diphenyl-1,10-phenanthroline), TAZ (3-(4-biphenyl)-4-phenyl-5-tert-butylphenyl-1,2,4-triazole), NTAZ (4-(naphthalen-1-yl)-3,5-diphenyl-4H-1,2,4-triazole), tBu-PBD (2-(4-biphenyl)-5-(4-tert-butylphenyl)-1,3,4-oxadiazole), BAlq (bis(2-methyl-8-hydroxyquinolinato-N1,O8)-(1,1'-biphenyl-4-yl)aluminum), BeBq2 (bis(benzoquinolinato-10)beryllium), ADN (9,10-di(naphthalen-2-yl)anthracene), BmPyPhB (1,3-bis[3,5-bis(pyridin-3-yl)phenyl]benzene), and mixtures thereof.

[0121] In addition, the electron transport region ETR may include metal halides such as LiF, NaCl, CsF, RbCl, RbI, CuI, KI, lanthanide metals such as Yb, or co-deposited materials of the above metal halides and lanthanide metals. For example, the electron transport region ETR may include KI:Yb, RbI:Yb, LiF:Yb, etc. as co-deposited materials. Meanwhile, metal oxides such as Li2O and BaO, Liq (lithium 8-hydroxyquinolate), etc. may be used as the electron transport region ETR, but are not limited thereto according to the embodiments of the present disclosure. The electron transport region ETR may also be composed of a mixture of an electron transport material and an insulating organometallic salt. The organometallic salt may have a band gap of about 4 eV or greater. For example, the organometallic salt may include metal acetates, metal benzoates, metal acetoacetates, metal acetylacetonates, or metal stearates.

[0122] The electron transport region ETR may further include at least one of BCP (2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline), TSPO1 (diphenyl(4-(triphenylsilyl)phenyl)phosphine oxide), and Bphen (4,7-diphenyl-1,10-phenanthroline) and the materials described above, but is not limited thereto according to the embodiments of the present disclosure.

[0123] The electron transport region ETR may include a buffer layer BUF-3, a first electron transport layer ETL, and an electron injection layer EIL stacked in sequence. Different from that shown, at least one of the buffer layer BUF-3, the first electron transport layer ETL, and the electron injection layer EIL may be omitted. The buffer layer BUF-3, the first electron transport layer ETL, and the electron injection layer EIL may include the compounds of the electron transport region ETR described above. The buffer layer BUF-3 may block holes from moving from the third light-emitting layer EML-3 to the electron transport region ETR.

[0124] The auxiliary light-emitting part EA located between the first light-emitting layer EML-1 and the second light-emitting layer EML-2 may include a buffer layer BUF, a second electron transport layer ETL-A, a first charge generation layer nCGL, a second charge generation layer pCGL, a second hole transport layer HTL-A, and a second sub-hole control layer AIL-2. The first charge generation layer nCGL may be an n-type charge generation layer, and the second charge generation layer pCGL may be a p-type charge generation layer. Different from that shown, at least one of the buffer layer BUF, the second electron transport layer ETL-A, the first charge generation layer nCGL, the second charge generation layer pCGL, the second hole transport layer HTL-A, and the second sub-hole control layer AIL-2 may be omitted.

[0125] The second sub-hole control layer AIL-2 may include a material different from that of the first sub-hole control layer AIL-1. The second sub-hole control layer AIL-2 may include a material that contributes to the generation of the second light of the second light-emitting layer EML-2 or the third light of the third light-emitting layer EML-3. The first sub-hole control layer AIL-1 may include a material that contributes to the generation of the first light of the first light-emitting layer EML-1, but is not limited thereto according to the embodiments of the present disclosure. The first sub-hole control layer AIL-1 and the second sub-hole control layer AIL-2 may include the same material.

[0126] The second sub-hole control layer AIL-2 may be positioned adjacent to the third light-emitting layer EML-3 that generates the third light or the second light-emitting layer EML-2 that generates the second light. The second sub-hole control layer AIL-2 may be formed to have a HOMO (highest occupied molecular orbital) energy level and a LUMO (lowest unoccupied molecular orbital) energy level that promote the movement of holes. Therefore, an increase in the driving voltage of the light-emitting element ED including the second sub-hole control layer AIL-2 can be prevented. In addition, the second sub-hole control layer AIL-2 may block electrons from moving from the second light-emitting layer EML-2 or the third light-emitting layer EML-3 to the second hole transport layer HTL-A. Therefore, the display panel DP including the light-emitting element ED including the second sub-hole control layer AIL-2 may have an improved display life.

[0127] The upper electrode UE may be disposed on the organic layer OL. Figure 7A and Figure 7B The upper electrode UE in may refer to Figure 4 The upper electrode UE described in . The upper electrode UE may include at least one selected from Ag, Mg, Cu, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, Li, Ca, LiF, Mo, Ti, W, In, Sn and Zn, a compound of two or more selected therefrom, a mixture of two or more selected therefrom, or an oxide of at least one selected therefrom. The upper electrode UE may be a transmissive electrode, a semi-transmissive electrode or a reflective electrode. When the upper electrode UE is a transmissive electrode, the upper electrode UE may be composed of a transparent metal oxide (e.g., indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium tin zinc oxide (IGZO)), etc.

[0128] When the upper electrode UE is a semi-transmissive electrode or a reflective electrode, the upper electrode UE may include Ag, Mg, Cu, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, Li, Ca, LiF / Ca, LiF / Al, Mo, Ti, Yb or W or a compound or mixture thereof (e.g., AgMg, AgYb or MgYb). Optionally, the upper electrode UE may have a structure having multiple layers, the multiple layers including a reflective film or a semi-transmissive film formed by the above materials and a transparent conductive film formed by indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium tin zinc oxide (ITZO), etc. For example, the upper electrode UE may include the above metal materials, a combination of two or more metal materials selected from the above metal materials, an oxide of the above metal materials, etc.

[0129] The cap layer CPL may be disposed on the upper electrode UE. The cap layer CPL may include a single layer or a plurality of layers. The cap layer CPL may be an organic layer or an inorganic layer. For example, when the cap layer CPL includes an inorganic material, the inorganic material may include an alkali metal compound such as LiF, an alkali metal compound such as MgF2, SiON, SiN x 、SiO y Alkaline earth metal compounds, etc. In contrast, when the cap layer CPL includes an organic material, the organic material may include α-NPD, NPB, TPD, m-MTDATA, Alq3, CuPc, TPD15 (N4,N4,N4',N4'-tetrakis(biphenyl-4-yl)biphenyl-4,4'-diamine), TCTA (4,4',4"-tris(carbazole-9-yl)triphenylamine), etc., or may include epoxy resin or acrylate such as methacrylate.

[0130] refer to Figure 7A, according to some embodiments, the first emission layer EML-1 may be located on the hole transport region HTR. The second emission layer EML-2 may be located on the auxiliary emission part EA. The third emission layer EML-3 may be located between the second emission layer EML-2 and the auxiliary emission part EA. Refer to Figure 7B , according to some embodiments, the first emission layer EML-1 may be located on the hole transport region HTR, the second emission layer EML-2 may be located on the auxiliary emission part EA, and the third emission layer EML-3 may be located between the first emission layer EML-1 and the auxiliary emission part EA. However, this is an example, and embodiments according to the present disclosure are not limited thereto.

[0131] The first emission layer EML-1 may generate blue light, the second emission layer EML-2 may generate red light, and the third emission layer EML-3 may generate green light. In contrast, the first emission layer EML-1 may generate green light, the second emission layer EML-2 may generate blue light, and the third emission layer EML-3 may generate red light. Optionally, the first emission layer EML-1 may generate red light, the second emission layer EML-2 may generate green light, and the third emission layer EML-3 may generate blue light.

[0132] Hereinafter, a method for manufacturing a display panel according to some embodiments of the present disclosure will be described in more detail with reference to the accompanying drawings. In the description of the method for manufacturing a display panel according to some embodiments, descriptions that are repetitive with the above description of the display panel according to some embodiments may be omitted.

[0133] Figure 8 is a flowchart of a method for manufacturing a display panel according to some embodiments of the present disclosure. Figures 9A to 9H is a cross-sectional view of some operations of a method for manufacturing a display panel according to some embodiments of the present disclosure. Figures 9A to 9H respectively show Figure 4 the states of some operations of the method for manufacturing the display panel on the corresponding cross-sections in

[0134] Refer to Figure 8 , the method for manufacturing a display panel includes: an operation S100 of providing a preliminary display panel including a base layer, a first reflective electrode, and a second reflective electrode; an operation S200 of forming a first preliminary inorganic film covering each of the first reflective electrode and the second reflective electrode; and an operation S300 of forming a first inorganic film by patterning the first preliminary inorganic film to remove a portion of the first preliminary inorganic film formed on the second reflective electrode.

[0135] Refer to together Figure 8 , Figure 9A and Figure 9B, a method for manufacturing a display panel according to some embodiments includes: an operation S100 of providing a preliminary display panel including a base layer BS and a plurality of reflective electrodes RE1, RE2, and RE3 located on the base layer BS; and an operation S200 of forming a first preliminary inorganic film by depositing an inorganic material on the preliminary display panel.

[0136] In the preliminary display panel, a circuit layer DP-CL may be located on the base layer BS, and the plurality of reflective electrodes RE1, RE2, and RE3 may be located on the circuit layer DP-CL.

[0137] The base layer BS may be a rigid substrate or a flexible substrate that is bendable, foldable, or rollable. The base layer BS may be a glass substrate, a metal substrate, a polymer substrate, etc. However, according to the embodiments of the present disclosure, it is not limited thereto, and the base layer BS may be an inorganic layer, an organic layer, or a composite material layer. The circuit layer DP-CL may include an insulating layer, a semiconductor pattern, a conductive pattern, signal lines, etc. After forming an insulating layer, a semiconductor layer, and a conductive layer on the base layer BS by a method such as coating or deposition, the insulating layer, the semiconductor layer, and the conductive layer may be selectively patterned by multiple photolithography processes. Thereafter, a semiconductor pattern, a conductive pattern, and signal lines included in the circuit layer DP-CL may be formed.

[0138] The reflective electrodes RE1, RE2, and RE3 may be located on the circuit layer DP-CL and may include a first reflective electrode RE1, a second reflective electrode RE2, and a third reflective electrode RE3. The first reflective electrode RE1, the second reflective electrode RE2, and the third reflective electrode RE3 may be arranged to be spaced apart from each other. The first reflective electrode RE1, the second reflective electrode RE2, and the third reflective electrode RE3 may all be located on the circuit layer DP-CL. The first reflective electrode RE1, the second reflective electrode RE2, and the third reflective electrode RE3 may be located on the uppermost layer of a plurality of insulating layers included in the circuit layer DP-CL.

[0139] The first reflective electrode RE1, the second reflective electrode RE2, and the third reflective electrode RE3 may each include a first layer E1-1, E1-2, and E1-3, a second layer E2-1, E2-2, and E2-3, and a third layer E3-1, E3-2, and E3-3 stacked in sequence. The first reflective electrode RE1, the second reflective electrode RE2, and the third reflective electrode RE3 may each include an electrode having a three-layer structure in which the first layer E1-1, E1-2, and E1-3, the second layer E2-1, E2-2, and E2-3, and the third layer E3-1, E3-2, and E3-3 are stacked.

[0140] A first preliminary inorganic film TCF1-P can be formed by depositing an inorganic material. The first preliminary inorganic film TCF1-P can be formed to cover the upper surfaces and side surfaces of each of the first reflective electrode RE1, the second reflective electrode RE2, and the third reflective electrode RE3. The inorganic material for forming the first preliminary inorganic film TCF1-P can include at least one of silicon oxide (SiO x ), silicon nitride (SiN x ), and silicon oxynitride (SiO x N y ).

[0141] Referring together Figure 8 、 Figures 9B to 9D , a method for manufacturing a display panel according to some embodiments includes an operation S300 of forming a first inorganic film TCF1 by patterning the first preliminary inorganic film TCF1-P.

[0142] The operation of patterning the first preliminary inorganic film TCF1-P can include an operation of partially removing the first preliminary inorganic film TCF1-P using a photoresist pattern as a mask. In a method for manufacturing a display panel according to some embodiments, after a first photoresist pattern PR1 is formed on the first preliminary inorganic film TCF1-P, the first photoresist pattern PR1 can be used as a mask to partially remove the first preliminary inorganic film TCF1-P.

[0143] A first opening PR1-OP can be provided in the first photoresist pattern PR1, and a portion of the first preliminary inorganic film TCF1-P corresponding to the first opening PR1-OP can be removed. The first opening PR1-OP can be provided to overlap each of the second reflective electrode RE2 and the third reflective electrode RE3. Accordingly, portions of the first preliminary inorganic film TCF1-P that overlap the second reflective electrode RE2 and the third reflective electrode RE3, respectively, can be removed, and thus the first inorganic film TCF1 can be formed. Since the first opening PR1-OP is provided to overlap not only portions where the second reflective electrode RE2 and the third reflective electrode RE3 are respectively disposed but also portions adjacent to the second reflective electrode RE2 and the third reflective electrode RE3, respectively, the patterned first inorganic film TCF1 can be formed to be spaced apart from each of the second reflective electrode RE2 and the third reflective electrode RE3. The first inorganic film TCF1 can be spaced apart from the second reflective electrode RE2 and have a first gap GP1 between the first inorganic film TCF1 and the second reflective electrode RE2, and the first inorganic film TCF1 can be spaced apart from the third reflective electrode RE3 and have a second gap GP2 between the first inorganic film TCF1 and the third reflective electrode RE3.

[0144] The patterning of the first preliminary inorganic film TCF1-P can be performed by a dry etching process. The patterning of the first preliminary inorganic film TCF1-P may include removing a portion of the first preliminary inorganic film TCF1-P corresponding to the first opening PR1-OP by a dry etching process.

[0145] Referring together Figure 9D and Figure 9E , a method for manufacturing a display panel according to some embodiments may include forming a second preliminary inorganic film TCF2-P after forming the first inorganic film TCF1.

[0146] The second preliminary inorganic film TCF2-P can be formed by depositing an inorganic material. The second preliminary inorganic film TCF2-P can be formed to cover an upper portion of the first inorganic film TCF1 and cover exposed upper surfaces and exposed side surfaces of each of the second reflective electrode RE2 and the third reflective electrode RE3. The inorganic material for forming the second preliminary inorganic film TCF2-P may include at least one of silicon oxide (SiO x ), silicon nitride (SiN x ), and silicon oxynitride (SiO x N y ).

[0147] Referring together Figures 9E to 9G , a method for manufacturing a display panel according to some embodiments may include forming a second inorganic film TCF2 by patterning the second preliminary inorganic film TCF2-P.

[0148] The patterning of the second preliminary inorganic film TCF2-P may include partially removing the second preliminary inorganic film TCF2-P using a photoresist pattern as a mask. In a method for manufacturing a display panel according to some embodiments, after forming a second photoresist pattern PR2 on the second preliminary inorganic film TCF2-P, the second photoresist pattern PR2 can be used as a mask to partially remove the second preliminary inorganic film TCF2-P.

[0149] A second opening PR2-OP may be provided in the second photoresist pattern PR2, and a portion of the second preliminary inorganic film TCF2-P corresponding to the second opening PR2-OP may be removed. The second opening PR2-OP may be provided to overlap with the third reflective electrode RE3. Accordingly, a portion of the second preliminary inorganic film TCF2-P overlapping with the third reflective electrode RE3 may be removed, and thus the second inorganic film TCF2 may be formed. Since the second opening PR2-OP is provided to overlap not only with the portion where the third reflective electrode RE3 is located but also with the portion adjacent to the third reflective electrode RE3, the patterned second inorganic film TCF2 may be formed to be spaced apart from the third reflective electrode RE3. The second inorganic film TCF2 may be spaced apart from the third reflective electrode RE3 and have a second gap GP2 between the second inorganic film TCF2 and the third reflective electrode RE3.

[0150] The operation of patterning the second preliminary inorganic film TCF2-P may be performed by a dry etching process. The operation of patterning the second preliminary inorganic film TCF2-P may include the operation of removing, by a dry etching process, a portion of the second preliminary inorganic film TCF2-P corresponding to the second opening PR2-OP.

[0151] Reference Figure 9G and Figure 9H , after the operation of forming the second inorganic film TCF2, the operations of forming the transparent electrodes TE1, TE2, and TE3 and the operation of forming the pixel defining layer PDL may further be included.

[0152] The transparent electrodes TE1, TE2, and TE3 may include a first transparent electrode TE1 located on the first reflective electrode RE1, a second transparent electrode TE2 located on the second reflective electrode RE2, and a third transparent electrode TE3 located on the third reflective electrode RE3. The first transparent electrode TE1 may be located on the first inorganic film TCF1 and the second inorganic film TCF2. The second transparent electrode TE2 may be located on the second inorganic film TCF2. The third transparent electrode TE3 may be directly located on the third reflective electrode RE3.

[0153] The pixel defining layer PDL may be formed on at least a portion of the lower electrodes LE1, LE2, and LE3 and on the inorganic film TCF. The pixel defining layer PDL may be formed to partially cover each of the transparent electrodes TE1, TE2, and TE3 (e.g., the edges of the transparent electrodes TE1, TE2, and TE3). The pixel defining layer PDL may be formed of an inorganic material. The pixel defining layer PDL may be formed of at least one of silicon oxide (SiO x ), silicon nitride (SiN x ), and silicon oxynitride (SiO x N y ).

[0154] Some embodiments of the present disclosure include a display panel having a narrow distance between its lower electrodes, which can have a relatively high resolution and includes an inorganic film between a reflective electrode and a transparent electrode in at least one of the lower electrodes to have a resonant structure suitable for the wavelength of light emitted by a light-emitting element, thereby achieving excellent display resolution and improved light-emitting efficiency. In addition, a large step difference in a pixel defining film including an inorganic material can be prevented, and thus a limitation of disconnection of an upper electrode located on the pixel defining film can be prevented. Accordingly, the durability and reliability of the display panel can be relatively improved.

[0155] In the foregoing, descriptions have been made with reference to aspects of some embodiments of the present disclosure, but those skilled in the art or ordinary technicians in the relevant technical field can understand that various modifications and changes can be made to the disclosed embodiments without departing from the spirit and technical scope of the embodiments according to the present disclosure described in the claims and their equivalents. Therefore, the technical scope of the embodiments according to the present disclosure is not limited to the content described in the specific embodiments of the specification, but should be determined by the claims and their equivalents.

Claims

1. A display panel, characterized in that: include: A base layer, comprising a display area, wherein the display area comprises a first light-emitting area, a second light-emitting area and a non-light-emitting area; a first lower electrode, on the base layer, overlapping the first light emitting region, and comprising a first reflective electrode and a first transparent electrode on the first reflective electrode; a second lower electrode, on the base layer, overlapping the second light emitting region, and comprising a second reflective electrode and a second transparent electrode on the second reflective electrode; as well as a first inorganic film overlapping the first light emitting region and at least partially between the first reflective electrode and the first transparent electrode, The first inorganic film is spaced apart from the second reflective electrode and a first gap is formed between the first inorganic film and the second reflective electrode.

2. The display panel according to claim 1, characterized in that: The first inorganic film covers an upper surface and side surfaces of the first reflective electrode.

3. The display panel according to claim 1, characterized in that: The first inorganic film includes at least one of silicon oxide, silicon nitride, and silicon oxynitride.

4. The display panel according to claim 1, characterized in that: A second inorganic film is also included, the second inorganic film overlaps the first light emitting region and the second light emitting region and is at least partially on the first reflective electrode and the second reflective electrode.

5. The display panel according to claim 4, characterized in that: The second inorganic film is respectively between the first reflective electrode and the first transparent electrode and between the second reflective electrode and the second transparent electrode.

6. The display panel according to claim 4, characterized in that: The display area also includes a third light emitting area, and The display panel further includes a third lower electrode, which is on the base layer, overlaps the third light emitting region, and includes a third reflective electrode and a third transparent electrode on the third reflective electrode.

7. The display panel according to claim 1, characterized in that: A first distance between the first reflective electrode and the first transparent electrode in a thickness direction of the display panel is greater than a second distance between the second reflective electrode and the second transparent electrode in the thickness direction.

8. The display panel according to claim 1, characterized in that: The first transparent electrode contacts the first reflective electrode through a first contact member passing through the first inorganic film.

9. A display panel, characterized in that: include: A base layer, comprising a display area, wherein the display area comprises a first light-emitting area, a second light-emitting area, a third light-emitting area and a non-light-emitting area; a first reflective electrode, on the base layer and overlapping the first light emitting area; a second reflective electrode, on the base layer and overlapping the second light emitting area; a third reflective electrode, on the base layer and overlapping the third light emitting area; a first inorganic film overlapping the first light emitting region and at least partially on the first reflective electrode; as well as a second inorganic film overlapping the first light emitting region and the second light emitting region and at least partially on the second reflective electrode, wherein the first inorganic film is spaced apart from the second reflective electrode and a first gap is formed between the first inorganic film and the second reflective electrode; and The second inorganic film is spaced apart from the third reflective electrode and has a second gap therebetween.

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