Exposure device and photoetching machine

Abstract

The utility model discloses an exposure device and a photoetching machine. The exposure device comprises a base, a first moving assembly, an exposure head and an alignment assembly, the first moving assembly is arranged on the base and at least comprises a first driving structure; the exposure head is arranged on the first moving assembly and connected with the first driving structure, and the exposure head can move relative to the base under the action of the first moving assembly; the alignment assembly is located at the front end of the exposure head in the first direction and comprises an alignment lens and an adjusting assembly, the adjusting assembly is arranged on the exposure head, the alignment lens is arranged on the adjusting assembly, and the alignment lens can move relative to the exposure head under the action of the adjusting assembly. According to the exposure device and the photoetching machine disclosed by the utility model, the alignment lens is movably integrated on the exposure head, the alignment lens can be conveniently adjusted according to different exposure requirements, and the alignment lens moves along with the exposure head, so that alignment exposure can be more accurately carried out.

Description

Technical Field

[0001] The utility model belongs to the technical field of lithography equipment, and particularly relates to an exposure device and a lithography machine. Background Art

[0002] With the wide application of micro-optical elements and the substantial increase in demand, there is an urgent need to improve and perfect the manufacturing technology of micro-optical elements to improve their quality and output, and the lithography machine came into being.

[0003] The lithography machine is mainly used for the microfabrication of conventional micro-devices and structures, and the deep microfabrication of special devices and structures such as microfluidic structures, MEMS, thyristors, surface acoustic wave devices, high-power rectifiers, and quartz crystal resonators. It can also be widely used as a related experimental device in universities and research institutes to carry out microfabrication process research.

[0004] In the existing lithography machines, the alignment system and the exposure system are independent of each other, so there are deficiencies in many aspects such as manufacturing functions, manufacturing accuracy, ease of operation and use, and equipment volume.

[0005] The information disclosed in this background art section is only intended to increase the understanding of the overall background of the present utility model, and should not be regarded as an admission or any form of suggestion that this information constitutes the prior art known to those of ordinary skill in the art. Summary of the Utility Model

[0006] The purpose of the present utility model is to provide an exposure device and a lithography machine, which integrally move the alignment lens onto the exposure head, can conveniently adjust the alignment lens according to different exposure requirements, and the alignment lens moves together with the exposure head, enabling more accurate alignment and exposure.

[0007] In order to achieve the above purpose, the technical solution provided by a specific embodiment of the present utility model is as follows:

[0008] An exposure device is applied to a lithography machine. The exposure device includes:

[0009] A base;

[0010] A first moving component is arranged on the base, and the first moving component at least includes a first driving structure;

[0011] An exposure head is arranged on the first moving component and connected to the first driving structure. The exposure head can move relative to the base in a first direction under the action of the first moving component;

[0012] The alignment component is arranged on the exposure head and at the front end of the exposure head in the first direction. The alignment component includes an alignment lens and an adjustment component. The adjustment component is arranged on the exposure head, and the alignment lens is arranged on the adjustment component. The alignment lens can move relative to the exposure head in the first direction, the second direction, and the third direction under the action of the adjustment component, and the first direction, the second direction, and the third direction are perpendicular to each other in pairs.

[0013] In one or more embodiments of the present invention, the first moving component includes:

[0014] At least two first guide rails, each of the first guide rails extends in the first direction, and at least two of the first guide rails are arranged side by side in the second direction;

[0015] A first slider is arranged on each of the first guide rails and can slide along the first guide rail in the first direction;

[0016] The first driving structure is arranged between the adjacent first guide rails.

[0017] In one or more embodiments of the present invention, the first moving component is a high-precision linear guide rail.

[0018] In one or more embodiments of the present invention, the exposure head includes a housing, the housing has a bottom plate, the bottom plate includes a main body portion and a plurality of connecting portions extending from the main body portion in the first direction, and the connecting portions are respectively fixedly connected to the first slider and the first driving structure.

[0019] In one or more embodiments of the present invention, a limiting rib protruding from the surface is arranged on the connecting portion of the bottom plate, and a corresponding limiting groove is arranged on the side plate of the housing.

[0020] In one or more embodiments of the present invention, the housing has a rear side plate adjacent to the bottom plate, and a first window is opened on the rear side plate;

[0021] A second window is opened on the main body portion of the bottom plate, and a condenser glass is arranged on the bottom plate at the second window;

[0022] A reflecting mirror is arranged in the housing, and the reflecting mirror is configured to reflect the light beam from the first window so as to emit it from the second window.

[0023] In one or more embodiments of the present invention, the housing has a front side plate opposite to the rear side plate, a top side plate is arranged on the front side plate, a bearing portion is arranged on the top side plate, and the alignment component is arranged on the bearing portion.

[0024] In one or more embodiments of the present utility model, the adjustment assembly includes a mounting plate, a second moving assembly, and a second driving structure;

[0025] The mounting plate is fixed to the front end of the exposure head in the first direction;

[0026] The second moving assembly includes a second guide rail extending along a second direction on the mounting plate, a second slider disposed on the second guide rail and capable of sliding along the second guide rail in the second direction, and a lead screw for driving the second slider to slide along the second guide rail;

[0027] The second driving structure includes a two-dimensional moving platform. The two-dimensional moving platform is disposed on the second slider. A fixing member is provided on the two-dimensional moving platform. The alignment lens is fixedly installed in the fixing member. The alignment lens can move in the first direction and the third direction under the action of the two-dimensional moving platform.

[0028] In one or more embodiments of the present utility model, the number of the second sliders, the two-dimensional moving platforms, and the alignment lenses is at least two. One two-dimensional moving platform is provided on each second slider. One alignment lens is provided on each two-dimensional moving platform. Each second slider can be independently driven to adjust the position of the corresponding alignment lens.

[0029] In one or more embodiments of the present utility model, the exposure device further includes a cover body disposed on the base and partially covering the exposure head. The exposure head can extend out of the cover body or retract into the cover body under the action of the first moving assembly.

[0030] A lithography machine includes the above-mentioned exposure device.

[0031] Compared with the prior art, the exposure device and the lithography machine of the present utility model have high integration. The movable alignment lens is integrated into the exposure head, and the alignment lens can be conveniently adjusted according to different exposure requirements. Moreover, the alignment lens moves together with the exposure head, and alignment exposure can be performed more precisely.

[0032] For the exposure device and the lithography machine of the present utility model, the telescopic setting of the exposure head relative to the cover body can reduce the volume of the entire lithography machine. When exposure is not required, the exposure head can be retracted into the cover body.

[0033] For the exposure device and the lithography machine of the present utility model, the movement of the exposure head is controlled by the first driving structure, and multiple first guide rails are cooperated, which increases the stability of the movement of the exposure head.

[0034] For the exposure device and lithography machine of the present utility model, since the alignment lens is installed at the front end of the exposure head, alignment can be made more convenient when the exposure head is retracted.

[0035] For the exposure device and lithography machine of the present utility model, the horizontal movement of the exposure head improves the exposure effect of the optical path horizontally arranged in the cover body. Through the reference plane of the installation cavity and in cooperation with the high-precision linear guide rail, the installation accuracy of the exposure head can be further improved, the stability of the horizontal movement of the exposure head can be enhanced, and at the same time, the relative position change during the reciprocating movement of the exposure head is restricted, thereby controlling the irradiation angle of the exposure light source and making the change of the irradiation angle of the exposure light source within an acceptable error range, thus improving the exposure imaging effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0036] In order to more clearly illustrate the technical solutions in the embodiments of the present utility model or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the drawings described below are only some embodiments recorded in the present utility model. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings.

[0037] Figure 1 It is a three-dimensional structure diagram of a lithography machine in an embodiment of the present utility model;

[0038] Figure 2 It is an exploded view of the exposure device in an embodiment of the present utility model;

[0039] Figure 3 It is an exploded view of the exposure head in the exposure device in an embodiment of the present utility model;

[0040] Figure 4 It is an exploded view of the alignment assembly in the exposure device in an embodiment of the present utility model. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0041] In order to enable those skilled in the art to better understand the technical solutions in the present utility model, the following will clearly and completely describe the technical solutions in the embodiments of the present utility model in conjunction with the drawings in the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, rather than all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present utility model.

[0042] As described in the background art, in the lithography machine in the prior art, its alignment system and exposure system are independent of each other, so there are deficiencies in many aspects such as manufacturing functions, manufacturing accuracy, operation convenience, and equipment volume.

[0043] Based on this, the present application provides an exposure device and a lithography machine, which integrally move the alignment lens into the exposure head, can conveniently adjust the alignment lens according to different exposure requirements, and the alignment lens moves together with the exposure head, enabling more accurate alignment exposure, greatly improving the manufacturing accuracy and operational convenience, and at the same time reducing the equipment volume.

[0044] As Figure 1 shown, the lithography machine in an embodiment of the present utility model includes a carrier 10, a sample operation table 20, an exposure device 30, and a control device 40 disposed on the carrier 10. The sample operation table 20 is used to place a mask and a sample to be exposed. The exposure device 30 is disposed adjacent to the sample operation table 20 to provide a light source to the sample to be exposed on the sample operation table 20. The control device 40 is connected to the sample operation table 20 and the exposure device 30 to control the two to cooperate to complete the exposure of the sample.

[0045] Among them, the sample operation table 20 and the control device 40 can both adopt the structures in the prior art. Since they are not the innovative points of the present application, the present application will not elaborate on them in detail here.

[0046] Referring to Figure 1 and Figure 2 shown, the exposure device 30 includes a base 31, a first moving component 32 disposed on the base 31, an exposure head 33 disposed on the first moving component 32, and an alignment component 34 disposed on the exposure head 33.

[0047] The base 31 is disposed on the carrier 10 and the installation height of the base 31 on the carrier 10 is higher than the upper surface of the sample operation table 20. The base 31 and the sample operation table 20 are arranged in alignment in the first direction, and the first direction is the Figure 1 and Figure 2 x direction shown in

[0048] The upper surface of the base 31 is recessed inward to form an installation cavity 311, and the first moving component 32 is installed in the installation cavity 311.

[0049] The installation cavity 311 is preferably set to a cuboid structure, and the installation cavity 311 has two reference planes that are oppositely arranged and parallel to the xoz plane.

[0050] The first moving component 32 is a high-precision linear guide. The first moving component 32 includes a first guide rail 321, a first slider 322, and a first driving structure 323.

[0050] Two first guide rails 321 are arranged in the second direction on the base 31, and the second direction is the Figure 1 and Figure 2 y direction shown in Figure 1 and Figure 2 Each first guide rail 321 extends in the first direction. Preferably, the two first guide rails 321 are respectively attached to the two reference planes of the installation cavity 311.

[0051] A first slider 322 is provided on each first guide rail 321. The first slider 322 can slide along the first guide rail 321 in the first direction. In order to improve the stability of the first slider 322 during the sliding process relative to the first guide rail 321, the first slider 322 has a certain length in the first direction, or, a plurality of first sliders 322 are provided on each of the first guide rails 321, and one side of the first slider 322 also fits against the reference surface of the installation cavity 311. This setting can improve the installation accuracy of the first slider 322 and the first guide rail 321, and further improve the installation accuracy of the subsequent exposure head 33.

[0052] The first driving structure 323 is also provided in the installation cavity 311 of the base 31 and is disposed between adjacent first guide rails 321. Preferably, the first driving structure 323 is provided in the middle of the installation cavity 311 in the second direction. The first driving structure 323 is preferably a two-way cylinder. When it is connected to the exposure head 33, it can drive the exposure head 33 to move back and forth in the first direction, and cooperate with the first moving assembly 32 to further increase the stability of the exposure head 33.

[0053] The exposure head 33 is disposed on the first moving assembly 32 and is connected to the first driving structure 323. The exposure head 33 can move relative to the base 31 in the first direction under the action of the first moving assembly 32, so that it can approach the sample operation table 20 and stop directly above the sample operation table 20, or move away from the sample operation table 20.

[0054] Reference Figure 2 and Figure 3 As shown, the exposure head 33 includes a housing 331. The housing 331 has a bottom plate 3311. The periphery of the bottom plate 3311 is provided with a front side plate 3312, a rear side plate 3313, a left side plate 3314 and a right side plate 3315. Above the bottom plate 3311, a top plate 3316 and a top side plate 3317 are provided. Among them, the height of the front side plate 3312 is much lower than the height of the rear side plate 3313. Therefore, the upper end of the front side plate 3312 is connected to the rear side plate 3313 through the top side plate 3317 and the top plate 3316. The top side plate 3317 is inclined.

[0055] The bottom plate 3311 can partially cover the installation cavity 311 during movement. It includes a main body portion 33111 and a plurality of connecting portions 33112 extending from the main body portion 33111 in the first direction. Preferably, the number of connecting portions 33112 is three, two of which are fixedly connected to the first sliders 322 on the two first guide rails 321 respectively, and the other connecting portion 33112 is fixedly connected to the first driving structure 323. On the connecting portion 33112 connected to the first slider 322, there is a limiting rib 33113 protruding from the surface. On the one hand, the limiting rib 33113 can enhance the strength of the connecting portion 33112 and improve the stability of the exposure head 33 during movement. On the other hand, it can limit the side plate of the housing 331, so that when installing, the side plate of the housing 331 can be more conveniently installed on the bottom plate 3311. For this purpose, on the bottom of the two side plates (front side plate 3312 and rear side plate 3313) of the housing 3311 in the first direction, there are limiting grooves 33114 corresponding to the limiting ribs 33113.

[0056] On the rear side plate 3313 of the housing 331, there is a first window 33131 for the exposure light source to pass through.

[0057] On the main body portion 33111 of the bottom plate 3311, there is a second window (not shown in the figure), which is also for the exposure light source to pass through. A reflecting mirror (not shown in the figure) is arranged in the housing 331, and the reflecting mirror is arranged to reflect the exposure light source beam from the first window 33131 and emit it from the second window. In order to improve the exposure effect, a condenser lens frame 331111 and a condenser glass 331112 are arranged on the bottom plate 3311 at the second window.

[0058] On the top side plate 3317 of the housing 331, there is a bearing portion 33171. Preferably, the bearing portion 33171 protrudes from the surface of the top side plate 3317 and is located at the lower end of the top side plate 3317.

[0059] Reference Figure 2 and Figure 4 As shown, the alignment assembly 34 is arranged on the exposure head 33 and is located at the front end of the exposure head 33 in the first direction. Preferably, the alignment assembly 34 is arranged on the bearing portion 33171.

[0060] The alignment assembly 34 includes an alignment lens 341 and an adjustment assembly 342. The adjustment assembly 342 is arranged on the bearing portion 33171, and the alignment lens 341 is arranged on the adjustment assembly 342. The alignment lens 342 can move relative to the exposure head 33 in the first direction, the second direction and the third direction under the action of the adjustment assembly 341. The first direction, the second direction and the third direction are perpendicular to each other in pairs and are respectively Figure 1 and Figure 2The x-direction, y-direction, and z-direction therein.

[0061] The adjusting component 342 includes a mounting plate 3421, a second moving component 3422, and a second driving structure 3423.

[0062] The mounting plate 3421 is fixed to the front end of the exposure head 33 in the first direction, preferably on the bearing part 33171. The mounting plate 3421 extends in the second direction, and limiting parts 34211 are provided at both ends of the mounting plate 3421 in the second direction for partial components of the second moving component 3422 to pass through.

[0063] The second moving component 3422 includes a second guide rail 34221 extending along the second direction on the mounting plate 3421, a second slider 34222 provided on the second guide rail 34221 and capable of sliding along the second guide rail 34221 in the second direction, and a lead screw 34223 for driving the second slider 34222 to slide along the second guide rail 34221. The lead screw 34223 is rotatably passed through the limiting part 34211 of the mounting plate 3421.

[0064] The second driving structure 3423 includes a two-dimensional moving platform provided on the second slider 34222. A fixing member 3424 is provided on the two-dimensional moving platform, and the fixing member 3424 is preferably an annular hoop. The alignment lens 341 is fixedly installed in the annular hoop and is limited by screwing. The alignment lens 341 can move in the first direction and the third direction under the action of the two-dimensional moving platform.

[0065] In the above technical solution, the number of the second sliders 34222, the two-dimensional moving platforms, the lead screws 34223, and the alignment lenses 341 are all set to two. One two-dimensional moving platform is provided on each second slider 34222, one alignment lens 341 is provided on each two-dimensional moving platform, and each second slider 34222 can be independently driven by the corresponding lead screw 34223 to adjust the position of the corresponding alignment lens 341.

[0066] The alignment lens 341 is preferably a microscope.

[0067] Reference Figure 1 As shown, the exposure device further includes a cover 35 and an exposure light source (not shown in the figure). The cover 35 is provided on the base 31 and partially covers the exposure head 33. The exposure light source is provided in the cover 35 and is located at the rear end of the exposure head 33 in the first direction. The exposure head 33 can extend out of the cover 35 or retract into the cover 35 under the action of the first moving component 32. The outgoing light path of the exposure light source is a horizontal light path.

[0068] After the sample to be exposed and the corresponding mask are placed on the sample operation table 20 (at this time, the exposure head 33 is in a state away from the sample operation table 20 - retracted into the cover body), the illumination light source of the alignment lens 341 at the front end of the exposure head 33 is automatically turned on to capture and clearly see the alignment marks on the mask. At the same time, the adjustment assembly 342 is activated to align the mark on the sample with the mark on the mask.

[0069] After the alignment adjustment is completed, the exposure head 33 automatically extends out of the cover body, and the second window (light exit) of the exposure head 33 is exactly above the mask. The exposure light source is turned on to start the countdown exposure. After the exposure is completed, the exposure light source is turned off, and the exposure head 33 automatically retracts into the cover body to complete the entire exposure process.

[0070] Among them, the operation of the exposure head 33, the operation of the exposure light source, and the operation of the adjustment assembly 342 can all be automatically controlled by the control device 40. Of course, the operation of the exposure light source and the operation of the adjustment assembly 342 can also be manually operated by the operator.

[0071] Compared with the prior art, the exposure device and the lithography machine of the present utility model have high integration. The movable alignment lens is integrated into the exposure head, and it can be conveniently adjusted according to different exposure requirements. Moreover, the alignment lens moves with the exposure head, enabling more accurate alignment exposure.

[0072] For the exposure device and the lithography machine of the present utility model, the telescopic setting of the exposure head relative to the cover body can reduce the volume of the entire lithography machine. When exposure is not required, the exposure head can be retracted into the cover body.

[0073] For the exposure device and the lithography machine of the present utility model, the movement of the exposure head is controlled by the first driving structure and is coordinated with multiple first guide rails, increasing the stability of the movement of the exposure head.

[0074] For the exposure device and the lithography machine of the present utility model, since the alignment lens is installed at the front end of the exposure head, it is more convenient to align when the exposure head is retracted.

[0075] For the exposure device and the lithography machine of the present utility model, the horizontal movement of the exposure head improves the exposure effect of the optical path horizontally arranged in the cover body. Through the reference plane of the installation cavity and in cooperation with the high-precision linear guide rail, the installation accuracy of the exposure head can be further improved, the stability of the horizontal movement of the exposure head can be enhanced, and at the same time, the relative position change during the reciprocating movement of the exposure head is restricted, thereby controlling the irradiation angle of the exposure light source and making the change of the irradiation angle of the exposure light source within an acceptable error range, thus improving the exposure imaging effect.

[0076] For those skilled in the art, it is obvious that the present utility model is not limited to the details of the above exemplary embodiments, and the present utility model can be implemented in other specific forms without departing from the spirit or basic characteristics of the present utility model. Therefore, from any point of view, the embodiments should be regarded as exemplary and non-limiting. The scope of the present utility model is defined by the appended claims rather than the above description. Therefore, all changes falling within the meaning and scope of the equivalent elements of the claims are intended to be embraced within the present utility model. Any reference signs in the claims should not be construed as limiting the claims involved.

[0077] In addition, it should be understood that although this specification is described in terms of embodiments, not every embodiment only contains an independent technical solution. This narrative manner of the specification is only for clarity. Those skilled in the art should regard the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. An exposure device, applied to a lithography machine, characterized in that, The exposure device includes: a base; a first moving component disposed on the base, the first moving component including at least a first driving structure; an exposure head disposed on the first moving component and connected to the first driving structure, the exposure head being movable relative to the base in a first direction under the action of the first moving component; an alignment component disposed on the exposure head and at the front end of the exposure head in the first direction, the alignment component including an alignment lens and an adjustment component, the adjustment component being disposed on the exposure head, the alignment lens being disposed on the adjustment component, the alignment lens being movable relative to the exposure head in a first direction, a second direction, and a third direction under the action of the adjustment component, the first direction, the second direction, and the third direction being perpendicular to each other in pairs.

2. The exposure apparatus according to claim 1, wherein, The first moving component includes: at least two first guide rails, each first guide rail extending in the first direction, and at least two first guide rails arranged in the second direction; first sliders, each first slider being disposed on a corresponding first guide rail and being slidable along the first guide rail in the first direction; the first driving structure is disposed between adjacent first guide rails.

3. The exposure apparatus according to claim 2, wherein The exposure head includes a housing having a bottom plate, the bottom plate including a main body portion and a plurality of connecting portions extending from the main body portion in the first direction, the connecting portions being fixedly connected to the first sliders and the first driving structure respectively.

4. The exposure apparatus according to claim 3, wherein, Limiting ribs protruding from the surface are provided on the connecting portions of the bottom plate, and corresponding limiting grooves are provided on the side plates of the housing.

5. The exposure apparatus according to claim 3, wherein The housing has a rear side plate adjacent to the bottom plate, and a first window is opened on the rear side plate; a second window is opened on the main body portion of the bottom plate, and a condenser glass is provided on the bottom plate at the second window; a reflecting mirror is disposed in the housing, and the reflecting mirror is configured to reflect a light beam from the first window to emit it from the second window.

6. The exposure apparatus according to claim 5, characterized in that, The housing has a front side plate opposite to the rear side plate, a top side plate is provided on the front side plate, a bearing portion is provided on the top side plate, and the alignment component is disposed on the bearing portion.

7. The exposure apparatus according to claim 1, wherein The adjustment component includes a mounting plate, a second moving component, and a second driving structure; the mounting plate is fixed to the front end of the exposure head in the first direction; the second moving component includes a second guide rail extending in the second direction on the mounting plate, a second slider disposed on the second guide rail and slidable along the second guide rail in the second direction, and a lead screw for driving the second slider to slide along the second guide rail; the second driving structure includes a two-dimensional moving platform, the two-dimensional moving platform is disposed on the second slider, a fixing member is provided on the two-dimensional moving platform, and the alignment lens is fixedly mounted in the fixing member, and the alignment lens is movable in the first direction and the third direction under the action of the two-dimensional moving platform.

8. The exposure apparatus according to claim 7, wherein The number of the second sliders, the two-dimensional moving platform, and the alignment lenses is at least two. One two-dimensional moving platform is arranged on each of the second sliders, one alignment lens is arranged on each of the two-dimensional moving platforms, and each of the second sliders can be independently driven to adjust the position of the corresponding alignment lens.

9. The exposure apparatus according to claim 1, wherein It further includes a cover body, which is arranged on the base and partially covers the exposure head. The exposure head can extend out of the cover body or retract into the cover body under the action of the first moving component.

10. A lithography machine, characterized in that, It includes the exposure device according to any one of claims 1-9.

Images