Radio frequency coil installation adjusting device and semiconductor equipment

Abstract

The utility model discloses a radio frequency coil installation adjusting device and a semiconductor device. The mounting and adjusting device comprises a lifting frame which is positioned in the center of the whole device and is mounted at the central position of the top of the reaction chamber; the plurality of horizontal adjusting assemblies are radially and concentrically mounted on the circumferential outer side of the lifting frame and can be telescopically adjusted in the horizontal direction; the multiple vertical adjusting assemblies are installed at the telescopic ends of the multiple horizontal adjusting assemblies correspondingly and can be adjusted in a telescopic mode in the vertical direction; the telescopic ends of the multiple vertical adjusting assemblies are used for being connected with a coil bracket of the radio frequency coil. According to the mounting and adjusting device disclosed by the utility model, the radio frequency coil and the reaction chamber can be radially concentric, the mounting of the radio frequency coils with different sizes can be realized through the horizontal adjusting assembly, and the adjustment of the mounting height of the radio frequency coil can be realized through the vertical adjusting assembly.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductors, and particularly relates to a radio frequency coil installation and adjustment device and a semiconductor device. Background Art

[0002] The plasma used in existing semiconductor thin film deposition equipment is generated by low-pressure discharge in a closed vacuum chamber. Commonly used methods for generating plasma by low-pressure discharge include radio frequency capacitive coupled plasma CCP and radio frequency inductive coupled plasma ICP. Among them, due to the advantages of inductively coupled plasma in obtaining high-density plasma and depositing large-size area plasma uniformity, it is often used in the deposition of semiconductor thin films such as metals or silicon. However, since the spatial position of the radio frequency coil will affect the density uniformity of the inductively coupled plasma, the installation of the radio frequency coil needs to meet the requirements of being radially concentric with the non-metallic discharge chamber and accurately positioning the dimensions in the height direction.

[0003] At present, the method for ensuring the installation spatial position of the radio frequency coil is to insert a positioning center block into the entrance of the non-metallic discharge chamber to ensure the concentricity of the radio frequency coil and the non-metallic discharge chamber, and then remove the positioning center block after tightening the radio frequency coil with fixing screws. Specifically, four points are taken in the circumferential direction of the radio frequency coil in the height direction, and a vernier caliper is used to measure the distance between the upper surface of the radio frequency coil and the upper surface of the non-metallic discharge chamber. The measured distance needs to be within ±0.3. If it does not meet the requirement, the installation height of the radio frequency coil needs to be readjusted until the measured distance is met. The actual operation often requires repeated adjustment, the process is complex and cumbersome, requires two people to operate simultaneously, has a low work efficiency, and has a large operation error. Summary of the Utility Model

[0004] The purpose of the utility model is to provide a radio frequency coil installation and adjustment device and a semiconductor device, aiming to solve the problems in the existing radio frequency coil installation method that it is difficult to ensure concentricity with the non-metallic discharge chamber, and both the size adjustment and the installation height adjustment are relatively difficult.

[0005] To solve the above technical problems, the purpose of the utility model is achieved through the following technical solutions: A radio frequency coil installation and adjustment device is provided for installing a radio frequency coil on the top of a reaction chamber of a semiconductor device. The radio frequency coil installation and adjustment device includes:

[0006] A lifting frame, which is located at the center of the whole device and is installed at the center position of the top of the reaction chamber;

[0007] A plurality of horizontal adjustment components, which are radially concentrically installed on the circumferential outer side of the lifting frame and can be telescopically adjusted in the horizontal direction;

[0008] A plurality of vertical adjustment components are respectively installed at the telescopic ends of a plurality of horizontal adjustment components and can be telescopically adjusted in the vertical direction;

[0009] Among them, the telescopic ends of the plurality of vertical adjustment components are used to connect with the coil bracket of the radio frequency coil.

[0010] Furthermore, a central positioning member is installed at the bottom of the lifting bracket, and the lifting bracket is installed at the central position of the top of the reaction chamber through the central positioning member.

[0011] Furthermore, the central positioning member is detachably installed at the bottom of the lifting bracket, and the central positioning member includes positioning blocks of different sizes, and the positioning blocks of different sizes are used to adapt to reaction chambers with different opening sizes.

[0012] Furthermore, both the horizontal adjustment component and the vertical adjustment component include:

[0013] A fixed arm cylinder;

[0014] A telescopic arm cylinder, one end of which is slidably installed inside one end of the fixed arm cylinder;

[0015] An adjustment screw rod, which penetrates through the fixed arm cylinder and can rotate around the central axis of the fixed arm cylinder, and one end of the adjustment screw rod is threadedly connected to one end of the telescopic arm cylinder;

[0016] Among them, the fixed arm cylinder of the horizontal adjustment component is installed on the lifting bracket, and the fixed arm cylinder of the vertical adjustment component is installed on the telescopic arm cylinder of the corresponding horizontal adjustment component.

[0017] Furthermore, a knob is provided at the other end of the adjustment screw rod, and a rotation angle scale line is provided on the knob; a telescopic length scale line is provided on the telescopic arm cylinder.

[0018] Furthermore, the other end of the telescopic arm cylinder of the vertical adjustment component is bent outward in the horizontal direction to form a bottom foot; the bottom feet of the plurality of vertical adjustment components are used to connect with the coil bracket.

[0019] Furthermore, an arc-shaped groove concentric with the center point of the lifting bracket is provided on the lifting bracket, and at least one horizontal adjustment component is slidably installed in the arc-shaped groove;

[0020] Among them, the shape of the coil bracket is a non-closed ring structure with a notch, the notch position on the coil bracket corresponds to the radial outside of the arc-shaped groove, and the input interface and output interface of the radio frequency coil are located at the notch position of the coil bracket.

[0021] Furthermore, the fixed arm cylinder of the horizontal adjustment component is installed on the lifting bracket through a first mounting plate.

[0022] Furthermore, the fixed arm cylinder of the vertical adjustment component is installed on the telescopic arm cylinder of the corresponding horizontal adjustment component through the second mounting plate.

[0023] An embodiment of the present invention further provides a semiconductor device, including a reaction chamber and the above-mentioned RF coil mounting and adjusting device disposed on the top of the reaction chamber, and the RF coil mounting and adjusting device is used to mount the RF coil on the top of the reaction chamber of the semiconductor device.

[0024] The beneficial effects of the embodiment of the present invention are as follows: The mounting and adjusting device is installed at the central position on the top of the reaction chamber, and the horizontal adjustment component and the vertical adjustment component with the function of adjusting the telescopic length are designed, so that the RF coil can be radially concentric with the reaction chamber, and the installation of RF coils of different sizes and the adjustment of the installation height can be realized. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following will briefly introduce the drawings required for the description of the embodiments. Obviously, the following drawings are some embodiments of the present invention. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts.

[0026] Figure 1 It is a schematic perspective structure diagram of the first perspective of the mounting and adjusting device provided by the embodiment of the present invention.

[0027] Figure 2 It is a schematic perspective structure diagram of the second perspective of the mounting and adjusting device provided by the embodiment of the present invention.

[0028] Figure 3 It is a schematic cross-sectional structure diagram of the horizontal adjustment component provided by the embodiment of the present invention.

[0029] Figure 4 It is a schematic assembly structure diagram of the RF coil mounted on the mounting and adjusting device provided by the embodiment of the present invention.

[0030] Figure 5 It is a schematic assembly structure diagram of the mounting and adjusting device on the top of the reaction chamber provided by the embodiment of the present invention.

[0031] Figure 6 It is a schematic flow chart of the RF coil mounting and adjusting method provided by the embodiment of the present invention.

[0032] Explanation of the reference numerals in the drawings:

[0033] 1. Lifting frame; 11. Arc-shaped groove

[0034] 2. Horizontal adjustment assembly; 21. First fixed arm cylinder; 22. First telescopic arm cylinder; 23. First adjustment screw; 24. First knob; 25. First mounting plate;

[0035] 3. Vertical adjustment assembly; 31. Second fixed arm cylinder; 32. Second telescopic arm cylinder; 33. Second adjustment screw; 34. Second knob; 35. Second mounting plate; 36. Foot;

[0036] 4. Central positioning member;

[0037] 5. Radio frequency coil; 51. Input interface; 52. Output interface;

[0038] 6. Coil bracket;

[0039] 7. Reaction chamber;

[0040] 8. Shielding cover. Specific embodiments

[0041] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments in the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0042] It should be understood that when used in this specification and the appended claims, the terms "including" and "comprising" indicate the presence of the described features, wholes, steps, operations, elements, and / or components, but do not exclude the presence or addition of one or more other features, wholes, steps, operations, elements, components, and / or their combinations.

[0043] It should also be understood that the terms used in this specification of the present invention are only for the purpose of describing specific embodiments and are not intended to limit the present invention. As used in this specification of the present invention and the appended claims, unless the context clearly indicates otherwise, the singular forms "a", "an", and "the" are intended to include the plural forms.

[0044] It should be further understood that the term " / and" as used in this specification of the present invention and the appended claims refers to any combination and all possible combinations of one or more of the related listed items, and includes these combinations.

[0045] Combined with Figure 1 and Figure 2 , Figure 1 is a schematic perspective view of the first perspective of the installation and adjustment device provided by the embodiment of the present invention; Figure 2Schematic diagram of the three-dimensional structure of the second perspective of the installation and adjustment device provided by the embodiment of the present invention.

[0046] The embodiment of the present invention provides a mounting and adjusting device for a radio frequency coil 5, which is used to mount the radio frequency coil 5 on the top of a reaction chamber 7 of a semiconductor device (refer to Figure 4 ). The mounting and adjusting device includes a lifting frame 1, a plurality of horizontal adjusting components 2 and a plurality of vertical adjusting components 3.

[0047] The lifting frame 1 is located at the center of the entire device and is mounted at the center position of the top of the reaction chamber 7; a plurality of horizontal adjusting components 2 are radially concentrically mounted on the circumferential outer side of the lifting frame 1 and can be telescopically adjusted in the horizontal direction; a plurality of vertical adjusting components 3 are respectively mounted on the telescopic ends of the plurality of horizontal adjusting components 2 and can be telescopically adjusted in the vertical direction; the telescopic ends of the plurality of vertical adjusting components 3 are used to connect with a coil bracket 6 of the radio frequency coil 5.

[0048] In this embodiment, the shape of the lifting frame 1 can be circular. The lifting frame 1 is located at the center of the entire device and mainly plays a supporting and connecting role. A plurality of horizontal adjusting components 2 are distributed along the central horizontal circumferential direction on the circumferential outer side of the lifting frame 1. The arc center of the arc-shaped connection line between the plurality of horizontal adjusting components 2 is concentric with the lifting frame 1, that is, concentric with the center of the top of the reaction chamber 7. The number of the plurality of vertical adjusting components 3 is the same as that of the plurality of horizontal adjusting components 2. The plurality of vertical adjusting components 3 are correspondingly mounted on the telescopic ends of the plurality of horizontal adjusting components 2, that is, the arc center of the arc-shaped connection line between the plurality of vertical adjusting components 3 is also concentric with the center of the top of the reaction chamber 7.

[0049] More specifically, the telescopic end of the vertical adjusting component 3 faces downward. The coil bracket 6 is used as the mounting structure of the radio frequency coil 5. The top of the coil bracket 6 is connected to the telescopic ends of the plurality of vertical adjusting components 3, and the radio frequency coil 5 is mounted at the bottom of the coil bracket 6, so that the center of the mounted radio frequency coil 5 can be radially concentric with the reaction chamber 7. And the installation of radio frequency coils 5 with different sizes can be realized through the horizontal adjusting components 2, and the adjustment of the installation height of the radio frequency coil 5 can be realized through the vertical adjusting components 3. It can be compatible with the installation and adjustment problems of radio frequency coils 5 with different diameters, different vertical distances, and different connection and fixing positions.

[0050] Combined with Figure 2 , in an embodiment, a center positioning member 4 is mounted at the bottom of the lifting frame 1, and the lifting frame 1 is mounted at the center position of the top of the reaction chamber 7 through the center positioning member 4.

[0051] In this embodiment, a plurality of connection holes may be provided at the bottom of the lifting bracket 1. The central positioning member 4 is installed at the bottom of the lifting bracket 1 through a positioning pin, and the lifting bracket 1 is installed at the central position at the top of the reaction chamber 7 through the central positioning member 4 at the bottom. Specifically, the shape of the central positioning member 4 is adapted to the shape and size of the opening at the top of the reaction chamber 7, so as to ensure that the lifting bracket 1 can be located at the center of the reaction chamber 7, that is, to ensure that the entire radio frequency coil 5 installation and adjustment device is located at the center of the reaction chamber 7, and further ensure that the radio frequency coil 5 is radially concentric with the reaction chamber 7.

[0052] In one embodiment, the central positioning member 4 is detachably installed at the bottom of the lifting bracket 1. The central positioning member 4 includes positioning blocks of different sizes, and the positioning blocks of different sizes are used to adapt to reaction chambers 7 with different opening sizes.

[0053] In this embodiment, the central positioning member 4 is designed as a detachable structure, and different sizes of central positioning members 4 can be replaced to be compatible with reaction chambers 7 with different opening sizes.

[0054] Combined Figure 2 and Figure 3 , Figure 3 is a schematic cross-sectional structure diagram of the horizontal adjustment assembly 2 provided by an embodiment of the present invention.

[0055] In one embodiment, the structural principles of the horizontal adjustment assembly 2 and the vertical adjustment assembly 3 are the same.

[0056] The horizontal adjustment assembly 2 includes a first fixed arm cylinder 21, a first telescopic arm cylinder 22 and a first adjustment screw 23; one end of the first telescopic arm cylinder 22 is slidably installed inside one end of the first fixed arm cylinder 21; the first adjustment screw 23 passes through the first fixed arm cylinder 21 and can rotate around the central axis of the first fixed arm cylinder 21, and one end of the first adjustment screw 23 is threadedly connected to one end of the first telescopic arm cylinder 22; wherein, the first fixed arm cylinder 21 is installed on the lifting bracket 1 through a first mounting plate 25;

[0057] The vertical adjustment assembly 3 includes a second fixed arm cylinder 31, a second telescopic arm cylinder 32 and a second adjustment screw 33; one end of the second telescopic arm cylinder 32 is slidably installed inside one end of the second fixed arm cylinder 31; the second adjustment screw 33 passes through the second fixed arm cylinder 31 and can rotate around the central axis of the second fixed arm cylinder 31, and one end of the second adjustment screw 33 is threadedly connected to one end of the second telescopic arm cylinder 32; wherein, the second fixed arm cylinder 31 is installed on the first telescopic arm cylinder 22 through a second mounting plate 35.

[0058] In this embodiment, the adjustment process of the horizontal adjustment assembly 2 is as follows: Just operate the first adjustment screw 23 to rotate, and it can drive the first telescopic arm cylinder 22 to horizontally expand and contract radially relative to the first fixed arm cylinder 21, thereby driving the vertical adjustment assembly 3 to horizontally move in the radial direction, and further accommodating the installation of RF coils 5 with different radial dimensions.

[0059] In this embodiment, similarly, the adjustment process of the vertical adjustment assembly 3 is as follows: Just operate the second adjustment screw 33 to rotate, and it can drive the second telescopic arm cylinder 32 to expand and contract in the vertical direction relative to the second fixed arm cylinder 31, thereby driving the RF coil 5 installed at the bottom of the vertical adjustment assembly 3 (i.e., the second telescopic arm cylinder 32) to move in the height direction to achieve the adjustment of the installation height of the RF coil 5.

[0060] Next, take the horizontal adjustment assembly 2 as an example to introduce the specific adjustment principle.

[0061] In one embodiment, the other end of the first adjustment screw 23 is provided with a first knob 24, and the first knob 24 is provided with a rotation angle scale line; the first telescopic arm cylinder 22 is provided with a telescopic length scale line.

[0062] In this embodiment, to facilitate the rotation operation of the first adjustment screw 23, the first knob 24 is fixedly sleeved on the first adjustment screw 23 to improve the convenience of the rotation operation. In addition, the first knob 24 is provided with a rotation angle scale line, which can facilitate the operator to intuitively know the current rotation adjustment situation.

[0063] In this embodiment, to facilitate the operator to intuitively know the telescopic length of the first telescopic arm cylinder 22 during the rotation of the first knob 24, the first telescopic arm cylinder 22 is provided with a telescopic length scale line.

[0064] Specifically, to accurately control the adjustment amount according to the actual deviation, it is designed that when the first adjusting screw 23 rotates one week, the first telescopic arm cylinder can correspondingly advance or retreat a pitch distance relative to the first fixed arm cylinder 21. For example, the first adjusting screw 23 adopts a precision thread with a pitch of 0.5 mm, that is, when the first adjusting screw 23 rotates one week, it can drive the first telescopic arm cylinder to extend or retract 0.5 mm. Therefore, a small distance moved along the axial direction can be represented by the reading of the rotation angle scale line on the first knob 24. The circumferential direction of the first knob 24 can be set with 50 equally divided movable scales. When the first knob 24 rotates one week, the first telescopic arm cylinder can advance or retreat 0.5 mm. Therefore, rotating each small division is equivalent to extending or retracting 0.5 / 50 = 0.01 mm. That is, each small division of the movable scale represents 0.01 mm, and the telescopic adjustment of the horizontal adjustment component 2 can be accurate to 0.01 mm. It should be understood that the telescopic adjustment principle of the vertical adjustment component 3 is the same as that of the horizontal adjustment component 2, and the other end of the second adjusting screw 33 is also provided with a second knob 34 for rotation operation, and the specific process will not be elaborated here.

[0065] Combined Figure 2 and Figure 4 , Figure 4 FIG. is a schematic assembly structure diagram of the radio frequency coil 5 provided by the embodiment of the present invention mounted on the mounting and adjusting device.

[0066] In one embodiment, the other end of the second telescopic arm cylinder 32 of the vertical adjustment component 3 is bent outward in the horizontal direction to form a base foot 36; the base feet 36 of multiple vertical adjustment components 3 are used to connect with the coil bracket 6.

[0067] In this embodiment, to ensure that the coil bracket 6 can be stably connected to the vertical adjustment component 3, a base foot 36 is provided at the other end of the second telescopic arm cylinder 32. The base foot 36 can be integrally connected to the other end of the second telescopic arm cylinder 32 or can be a split combination. The bottom of the base foot 36 is parallel to the horizontal plane to ensure that the coil bracket 6 after installation can be in the horizontal direction, and further ensure that the radio frequency coil 5 at the bottom of the coil bracket 6 is in the horizontal direction.

[0068] In one embodiment, an arc-shaped groove 11 concentric with the center point of the lifting frame 1 is provided on the lifting frame 1; at least one horizontal adjustment component 2 is slidably adjusted and installed in the arc-shaped groove 11 through a first mounting plate 25; wherein, the shape of the coil bracket 6 is a non-closed annular structure with a notch, and the notch position on the coil bracket 6 corresponds to the radial outside of the arc-shaped groove 11, and the input interface 51 and the output interface 52 of the radio frequency coil 5 are located at the notch position of the coil bracket 6.

[0069] In this embodiment, for the radio frequency coil 5 with different sizes of input interface 51 and output interface 52, an arc-shaped groove 11 concentric with the center point of the lifting frame 1 is provided on the lifting frame 1, and a part of the horizontal adjustment component 2 is slidably connected in the arc-shaped groove 11, so as to realize the adjustment of the arrangement angle between the horizontal adjustment components 2 in the circumferential direction to adapt to the fixation of the coil bracket 6 of different radio frequency coils 5. Here, the difference mainly refers to the different connection positions of the coil bracket 6 with the feet 36 of the plurality of vertical adjustment components 3.

[0070] Specifically, taking Figure 1 and 2 shown three horizontal adjustment components 2 and three vertical adjustment components 3 as an example, the horizontal adjustment components 2 and vertical adjustment components 3 on both sides among the three can slide relative to the arc-shaped groove 11, and the horizontal adjustment component 2 and vertical adjustment component 3 in the middle among the three are relatively fixed on the lifting frame 1; thus, for the coil bracket 6 of different radio frequency coils 5, during installation, first connect the coil bracket 6 with the feet 36 of the middle vertical adjustment component 3, and then by sliding the vertical adjustment components 3 on both sides, the feet 36 of the vertical adjustment components 3 on both sides can be moved, so as to adapt to different connection positions on the coil bracket 6.

[0071] More specifically, the horizontal adjustment component 2 and the vertical adjustment component 3 need to avoid the input interface 51 and output interface 52 of the radio frequency coil 5 as much as possible to ensure that there is enough operating space when the radio frequency coil 5 is accessed and output. Therefore, the notch position on the coil bracket 6 is corresponding to the radial outside of the arc-shaped groove 11; in this way, by moving the horizontal adjustment components 2 and vertical adjustment components 3 on both sides relative to the middle horizontal adjustment component 2, the notch position on the coil bracket 6 becomes more vacant.

[0072] Combined with Figure 4 and Figure 5 , Figure 5 FIG. is a schematic assembly structure diagram of the installation and adjustment device provided by the embodiment of the present invention at the top of the reaction chamber.

[0073] The embodiment of the present invention also provides a semiconductor device, including a reaction chamber 7 and the above radio frequency coil 5 installation and adjustment device arranged on the top of the reaction chamber 7, and the installation and adjustment device is used to install the radio frequency coil 5 on the top of the reaction chamber 7 of the semiconductor device.

[0074] In this embodiment, a shielding cover 8 is provided on the top of the reaction chamber 7. After installing the radio frequency coil 5 on the top of the reaction chamber 7 of the semiconductor device by using the installation and adjustment device, the coil bracket 6 of the radio frequency coil 5 is fixed to the inner side of the shielding cover 8 to maintain stability.

[0075] Please combine Figure 6 , Figure 6Schematic flow chart of the method for installing and adjusting the radio frequency coil 5 provided by the embodiment of the present invention.

[0076] The embodiment of the present invention provides a method for installing and adjusting a radio frequency coil, which is applied to the above-mentioned radio frequency coil installation and adjustment device. The method for installing and adjusting the radio frequency coil includes steps S601 to S604:

[0077] S601. Install the lifting frame 1 at the central position on the top of the reaction chamber 7;

[0078] S602. Perform telescopic adjustment in the horizontal direction through the horizontal adjustment component 2 so that the position of the telescopic end of the horizontal adjustment component 2 reaches the theoretical radius length of the radio frequency coil 5;

[0079] S603. Align and fixedly connect the coil bracket 6 of the radio frequency coil 5 with the telescopic ends of a plurality of vertical adjustment components 3, and make the radio frequency coil 5 concentric with the reaction chamber 7; specifically include: first connect the coil bracket 6 of the radio frequency coil 5 with at least one vertical adjustment component 3 that cannot horizontally slide relative to the arc-shaped groove 11, and fix it after making the radio frequency coil 5 coincide with the center of the reaction chamber 7; then slide the horizontally adjustable component 2 that can slide horizontally relative to the arc-shaped groove 11 in the arc-shaped groove 11, and drive the vertical adjustment component 3 to slide synchronously, so that the telescopic ends of all the vertical adjustment components 3 correspond to all the connection positions on the coil bracket 6 one by one, and then complete the one-to-one alignment and connection fixation;

[0080] S604. Perform telescopic adjustment in the vertical direction through the vertical adjustment component 3 so that the position of the telescopic end of the horizontal adjustment component 2 reaches the theoretical installation height of the radio frequency coil 5.

[0081] In this embodiment, based on the process of steps S601 to S604, the radio frequency coil 5 can be made radially concentric with the reaction chamber 7, and the installation of radio frequency coils 5 of different sizes and the adjustment of the installation height can be realized.

[0082] Those skilled in the art can clearly understand that for the convenience and conciseness of description, the specific working process of the above-described method can refer to the corresponding process in the foregoing device embodiment, and will not be elaborated here.

[0083] The above is only the specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any person skilled in the art within the technical scope disclosed by the present invention can easily think of various equivalent modifications or substitutions, and these modifications or substitutions should all be covered within the protection scope of the present invention. Therefore, the protection scope of the present invention should be subject to the protection scope of the claims.

Claims

1. A radio frequency coil mounting and adjusting device for mounting a radio frequency coil on the top of a reaction chamber of a semiconductor device, characterized in that, The radio frequency coil installation and adjustment device includes: A lifting frame, which is located at the center of the entire device and is installed at the center position of the top of the reaction chamber; A plurality of horizontal adjustment components, which are radially concentrically installed on the circumferential outer side of the lifting frame and can be telescopically adjusted in the horizontal direction; A plurality of vertical adjustment components, which are respectively installed at the telescopic ends of the plurality of horizontal adjustment components and can be telescopically adjusted in the vertical direction; Wherein, the telescopic ends of the plurality of vertical adjustment components are used to connect with the coil bracket of the radio frequency coil.

2. The radio frequency coil mounting and adjusting device according to claim 1, wherein A central positioning member is installed at the bottom of the lifting frame, and the lifting frame is installed at the center position of the top of the reaction chamber through the central positioning member.

3. The radio frequency coil mounting and adjusting device according to claim 2, wherein The central positioning member is detachably installed at the bottom of the lifting frame, and the central positioning member includes positioning blocks of different sizes, and the positioning blocks of different sizes are used to adapt to reaction chambers with different opening sizes.

4. The radio frequency coil mounting and adjusting device according to claim 1, wherein Both the horizontal adjustment component and the vertical adjustment component include: A fixed arm cylinder; A telescopic arm cylinder, one end of which is slidably installed inside one end of the fixed arm cylinder; An adjustment screw rod, which penetrates through the fixed arm cylinder and can rotate around the central axis of the fixed arm cylinder, and one end of the adjustment screw rod is threadedly connected to one end of the telescopic arm cylinder; Wherein, the fixed arm cylinder of the horizontal adjustment component is installed on the lifting frame, and the fixed arm cylinder of the vertical adjustment component is installed on the telescopic arm cylinder of the corresponding horizontal adjustment component.

5. The radio frequency coil mounting and adjusting device according to claim 4, characterized in that, A knob is provided at the other end of the adjustment screw rod, and a rotation angle scale line is provided on the knob; a telescopic length scale line is provided on the telescopic arm cylinder.

6. The radio frequency coil mounting and adjusting device according to claim 4, wherein The other end of the telescopic arm cylinder of the vertical adjustment component is bent outward in the horizontal direction to form a bottom foot; the bottom feet of the plurality of vertical adjustment components are used to connect with the coil bracket.

7. The radio frequency coil mounting and adjusting device according to claim 1, characterized in that An arc-shaped groove concentric with the center point of the lifting frame is provided on the lifting frame, and at least one horizontal adjustment component is slidably installed in the arc-shaped groove; Wherein, the shape of the coil bracket is a non-closed ring structure with a notch, the notch position on the coil bracket corresponds to the radial outer side of the arc-shaped groove, and the input interface and output interface of the radio frequency coil are located at the notch position of the coil bracket.

8. The radio frequency coil mounting and adjusting device according to claim 4, wherein, The fixed arm cylinder of the horizontal adjustment component is installed on the lifting frame through a first mounting plate.

9. The radio frequency coil mounting and adjusting device according to claim 4, characterized in that The fixed arm cylinder of the vertical adjustment component is installed on the telescopic arm cylinder of the corresponding horizontal adjustment component through a second mounting plate.

10. A semiconductor device, characterized in that, It includes a reaction chamber and the radio frequency coil installation and adjustment device as described in any one of claims 1 to 9 provided on the top of the reaction chamber, and the radio frequency coil installation and adjustment device is used to install a radio frequency coil on the top of the reaction chamber of a semiconductor device.

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