Bonded double-layer crossed and staggered conductive grid fabric

By connecting the double-layer cross-displacement conductive grid fabric structure, the problem of poor anti-static effect of existing anti-static fabrics is solved, and better anti-static performance and wear resistance are achieved, and the visual effect is novel.

CN223074349UActive Publication Date: 2025-07-08TEXTILE INST JIANGSU PROVINCE
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Patent Information

Application Number
CN202422473287.1
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-10-14
Publication Date
2025-07-08
Estimated Expiration
2034-10-14

AI Technical Summary

Technical Problem

The existing anti-static fabrics cannot be significantly improved through simple overlapping methods, resulting in limited use in different fields.

Method used

A double-layer cross-dislocation conductive grid fabric structure is used to connect the surface layer and the inner layer fabric is connected by an interwoven structure. The surface layer and the inner layer conductive grid form more and smaller conductive grids in the fabric interlayer. Some conductive wires are in the interlayer position, and the starting position of the fabric tissue circulation is adjusted to form cross-dislocation.

Benefits of technology

It improves the anti-static properties and wear resistance of the fabric, the fabric is not prone to cracking, and the visual effect is unique.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a binding double-layer crossed and staggered conductive grid fabric, which comprises a surface layer conductive grid fabric formed by surface layer warp yarns and surface layer weft yarns, and an inner layer conductive grid fabric formed by inner layer warp yarns and inner layer weft yarns, and is formed by interweaving an integrated double-layer structure, and the fabric is not easy to crack. The surface layer texture and the inner layer texture are both formed by interweaving two groups of warp yarns and two groups of weft yarns, the first warp yarns and the first weft yarns adopt T / C single yarns, the second warp yarns and the second weft yarns adopt conductive yarns formed by doubling and twisting conductive fibers and T / C single yarns, and the surface layer and the inner layer are both formed by interweaving the second warp yarns and the second weft yarns to form conductive grids. And the conductive grids formed on the surface layer and the conductive grids formed on the inner layer are crossed and staggered up and down. According to the binding double-layer crossed and staggered conductive grid fabric, through the double-layer crossed and staggered structural design, the conductive grids formed on the surface layer and the conductive grids formed on the inner layer form more and smaller conductive grids in the interlayer of the fabric, and the anti-static performance of the fabric is further improved.
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Description

Technical Field

[0001] The utility model relates to the technical field of woven fabrics, in particular to a double-layer cross-displaced conductive mesh fabric. Background Art

[0002] Static electricity is common in daily life, especially in special fields such as electronic technology, national defense and military industry, automobile manufacturing, aerospace, petroleum, chemical and gas industries. In order to reduce the harm caused by static electricity, most companies will choose to use anti-static fabrics;

[0003] The most widely used anti-static fabrics on the market are mainly made by twisting conductive fibers and conventional yarns into fabrics. In order to improve the anti-static effect, the amount of conductive fibers embedded is usually increased, and the fabric is embedded in the warp and weft directions to form a conductive grid. Since the strength of conductive fibers is low, the more they are embedded, the more likely they are to break due to friction during use;

[0004] In order to solve the above defects, a light and dark anti-static grid fabric structure with publication number CN218711197U is disclosed, wherein the first to the thirty-third B warp yarns are arranged in a "two up and one down" manner, and the thirty-fourth A warp yarn is arranged in a "one up and two down" manner, and the upper tissue point of the thirty-fourth A warp yarn is kept overlapping with the upper tissue point of the thirty-third B warp yarn, and the A warp yarn is a conductive yarn formed by twisting conductive fiber and T / C single yarn, and the B warp is a T / C double-stranded yarn. The linear density of the T / C single yarn in the A warp yarn is less than the linear density of the T / C double-stranded single yarn in the B warp yarn. The thinner A warp yarn and the thicker B warp yarn are better hidden and float on the reverse side of the fabric due to their different arrangements, and the resistance value test is more intuitive and the anti-static effect is better;

[0005] In the use of the above materials, hiding part of the conductive threads by using yarns of different thicknesses can reduce friction on the conductive threads, but the effect on improving the antistatic performance of the fabric is limited. The antistatic effect can be further improved by overlapping the fabrics, but simple overlapping of two fabrics cannot maximize the antistatic effect of the fabric, resulting in limited use in different fields.

[0006] Therefore, we proposed a double-layer cross-staggered conductive mesh fabric that can solve the above problems well. Utility Model Content

[0007] The purpose of the utility model is to provide a double-layer cross-staggered conductive mesh fabric to solve the problem raised by the above-mentioned background technology that the anti-static effect of the fabric cannot be significantly improved by simply overlapping two by two in the current market, resulting in limited use in different fields.

[0008] To achieve the above object, the present utility model provides the following technical solutions: A knotted double-layer cross-displaced conductive grid fabric, including a surface fabric, and a lining fabric is attached to the rear end of the surface fabric;

[0009] It further includes:

[0010] The surface fabric is formed by interweaving surface warp yarns and surface weft yarns, the lining fabric is formed by interweaving lining warp yarns and lining weft yarns, and the surface fabric and the lining fabric are connected through an interweaving structure.

[0011] Preferably, both the surface fabric and the lining fabric are formed by interweaving two groups of warp yarns and two groups of weft yarns. The warp yarns include A warp yarns and B warp yarns, and the weft yarns include A weft yarns and B weft yarns.

[0012] Preferably, in the surface fabric and the lining fabric, the A warp yarns and the A weft yarns are T / C single yarns, and the B warp yarns and the B weft yarns are conductive yarns formed by twisting conductive fibers and T / C single yarns.

[0013] Preferably, the conductive grids of the surface fabric and the lining fabric are both formed by interweaving B warp yarns and B weft yarns. The conductive grid formed on the surface and the conductive grid formed on the lining are cross-displaced vertically.

[0014] Preferably, the arrangement of the warp yarns and the weft yarns in the surface fabric is: A warp:B warp = 15:1, A weft:B weft = 15:1.

[0015] Preferably, the arrangement of the warp yarns and the weft yarns in the lining fabric is: A warp:B warp:A warp = 7:1:8, A weft:B weft:A weft = 7:1:8.

[0016] Preferably, in the surface fabric and the lining fabric, the warp yarns and the weft yarns both adopt an "over-one-under-one" arrangement.

[0017] Preferably, in the surface conductive grid fabric, the arrangement of the yarns is: from bottom to top, the first weft yarn is sequentially placed on one warp yarn in the warp structure and then on one warp yarn under it.

[0018] Preferably, in the lining conductive grid fabric, the arrangement of the yarns is: from bottom to top, the first weft yarn is sequentially placed under one warp yarn in the warp structure and then on one warp yarn above it.

[0019] Compared with the prior art, the beneficial effects of the present utility model are: This knotted double-layer cross-displaced conductive grid fabric has good anti-static property and good wear resistance. The anti-static property of the fabric can be improved through the inlay weaving method, and through the setting of the double-layer structure, the wear resistance of the fabric is further improved. The specific content is as follows:

[0020] The conductive yarn formed by twisting conductive fibers and T / C single yarns is interwoven in the warp and weft directions to form a conductive grid. The sixteenth ethyl warp in the surface layer structure overlaps with the eighth ethyl weft in the inner layer structure, and the sixteenth ethyl weft in the surface layer structure overlaps with the eighth ethyl warp in the inner layer structure, so that the conductive grid formed on the surface layer and the conductive grid formed on the inner layer form more and smaller conductive grids in the fabric interlayer, further improving the anti-static performance of the fabric;

[0021] Adopting the integrated double-layer structure design, compared with the single-layer structure design, some conductive wires are in the interlayer position, reducing the exposure of conductive fibers on the front and back sides of the fabric, and the fabric has better wear resistance;

[0022] By adjusting the starting position of the fabric tissue cycle of the surface and inner layers, cross-misaligned conductive grids are formed on the front and back sides of the fabric, bringing a different visual experience;

[0023] The surface conductive grid fabric is formed by the surface warp yarns and surface weft yarns, and the inner conductive grid fabric is formed by the inner warp yarns and inner weft yarns. The two layers are connected together by the self-connection method, and the integrated double-layer structure is interwoven, so that the fabric is not easily cracked; Brief Description of the Drawings

[0024] Figure 1 It is a front view structural schematic diagram of the surface conductive grid fabric of the present utility model;

[0025] Figure 2 It is a front view structural schematic diagram of the surface warp yarn of the present utility model;

[0026] Figure 3 It is a front view structural schematic diagram of the inner conductive grid fabric of the present utility model;

[0027] Figure 4 It is a front view structural schematic diagram of the inner warp yarn of the present utility model;

[0028] Figure 5 It is a structural schematic diagram of the fabric tissue of the conductive grid fabric of the present utility model.

[0029] In the figure: 1. Surface fabric; 101. Surface warp yarn; 102. Surface weft yarn; 2. Inner fabric; 201. Inner warp yarn; 202. Inner weft yarn. Detailed Description of the Embodiment

[0030] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present utility model. Embodiment

[0031] The utility model solves the problem that the antistatic effect of the fabric cannot be significantly improved by the existing simple pairwise overlapping method, resulting in limited use in different fields, and discloses:

[0032] A surface fabric 1, with a lining fabric 2 attached to the rear end of the surface fabric 1; further comprising: the surface fabric 1 is woven from surface warp yarns 101 and surface weft yarns 102, the lining fabric 2 is woven from lining warp yarns 201 and lining weft yarns 202, and the surface fabric 1 and the lining fabric 2 are connected by an interweaving structure. Both the surface fabric 1 and the lining fabric 2 are woven from two groups of warp yarns and two groups of weft yarns. The warp yarns include A warp yarns and B warp yarns, and the weft yarns include A weft yarns and B weft yarns;

[0033] Reference Figures 1 to 5 , the surface fabric 1 and the lining fabric 2 are connected together by the self - knotting method, and the integrated double - layer structure is interwoven, making the fabric not easy to crack. Compared with the single - layer conductive grid design of conventional products, the double - layer cross - staggered structure design of this product makes the conductive grids cross - staggered and arranged, and then more and smaller conductive grids are formed in the fabric interlayer between the conductive grids formed on the surface layer and the conductive grids formed on the inner layer, and the antistatic effect of the fabric is better; Embodiment

[0034] The utility model solves the problem that the existing antistatic products have poor wear resistance, and improves the wear resistance through the double - layer structure setting, and discloses

[0035] In the surface fabric 1 and the lining fabric 2, the A warp yarns and A weft yarns are T / C single yarns, and the B warp yarns and B weft yarns are conductive yarns formed by twisting conductive fibers and T / C single yarns. The conductive grids of both the surface fabric 1 and the lining fabric 2 are woven from B warp yarns and B weft yarns, and the conductive grids formed on the surface layer and the conductive grids formed on the inner layer are cross - staggered up and down;

[0036] Reference Figures 1 to 5 , the double - layer structure design of the surface fabric 1 and the lining fabric 2 has some conductive filaments in the interlayer position compared with the single - layer structure design, reducing the exposure of conductive fibers on the front and back of the fabric, and the wear resistance of the fabric is better. In addition, by adjusting the starting position of the fabric tissue cycle of the surface fabric 1 and the lining fabric 2, cross - staggered conductive grids are formed on the front and back of the fabric, bringing a different visual experience; Embodiment

[0037] The utility model solves the problem that the existing antistatic products have poor antistatic performance, and can further improve the antistatic performance through interweaving setting, and discloses:

[0038] The arrangement of the warp yarns and weft yarns of the surface fabric 1 is: A warp: B warp is 15:1, A weft: B weft is 15:1, and the arrangement of the warp yarns and weft yarns of the inner fabric 2 is: A warp: B warp: A warp is 7:1:8, A weft: B weft: A weft is 7:1:8;

[0039] refer to Figure 5 In terms of fabric structure, in order to better show the interweaving points of the yarns, different types of symbols are used to indicate the interweaving points: × indicates that the inner warp is raised when the inner weft is introduced; ▽ indicates the connection point of the upper and lower layers; ○ indicates that the surface warp is raised when the inner weft is introduced; ■ indicates that the surface warp is raised when the surface weft is introduced; □ indicates the weft organization point; in the surface conductive mesh fabric, there is one B warp for every fifteen A warps in the warp and weft directions, and the minimum organization cycle is 16. In the inner conductive mesh fabric, there are seven A wefts, one B weft, and then eight A wefts in the warp and weft directions, presenting a "7+1+8" arrangement, and the minimum organization cycle is 16. What needs to be specially explained is that since both the surface and inner layers are made of conductive fibers and conductive yarns twisted together by T / C single yarns, which are woven in the warp and weft directions to form a conductive grid, and the sixteenth B warp in the surface layer overlaps with the eighth B weft in the inner layer, and the sixteenth B weft in the surface layer overlaps with the eighth B warp in the inner layer, the conductive grid formed on the surface layer and the conductive grid formed on the inner layer form more and smaller conductive grids in the fabric interlayer, thereby further improving the antistatic performance of the fabric.

[0040] Working principle: When using this kind of double-layer cross-staggered conductive mesh fabric, first, refer to Figures 1 to 5 The surface fabric 1 and the inner fabric 2 are connected together by a self-joining method, and the integrated double-layer structure is interwoven, so that the fabric is not easy to crack, so that the conductive grids are arranged crosswise and staggered, and then the conductive grids formed on the surface layer and the conductive grids formed on the inner layer form more and smaller conductive grids in the fabric interlayer, and the anti-static effect of the fabric is better;

[0041] refer to Figures 1 to 5 Compared with the single-layer structure design, the double-layer structure design of the surface fabric 1 and the inner fabric 2 has some conductive threads in the interlayer position, which makes the fabric more wear-resistant. In addition, by adjusting the starting position of the weave loop of the surface fabric 1 and the inner fabric 2, a cross-displaced conductive grid is formed on the front and back of the fabric, which gives people a different visual experience.

[0042] refer to Figure 5, in terms of the fabric structure, in order to better show the intersection points of the yarns, since the conductive grids are formed by inlaying the conductive yarns formed by twisting the conductive fibers and T / C single yarns in both the warp and weft directions in the surface and inner layers, and the 16th B warp in the surface layer overlaps with the 8th B weft in the inner layer, and the 16th B weft in the surface layer overlaps with the 8th B warp in the inner layer, more and smaller conductive grids are formed in the fabric interlayer between the conductive grids formed in the surface layer and the conductive grids formed in the inner layer, further improving the anti-static performance of the fabric.

[0043] The content not described in detail in this specification belongs to the prior art well-known to those skilled in the art.

[0044] Although the present utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments, or perform equivalent replacements for some of the technical features. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present utility model shall be included within the protection scope of the present utility model.

Claims

1. A knotted double-layer cross-displaced conductive grid fabric, comprising a surface fabric (1), and a lining fabric (2) is attached to the rear end of the surface fabric (1); Characterized in that: The surface fabric (1) is woven from surface warp yarns (101) and surface weft yarns (102), the lining fabric (2) is woven from lining warp yarns (201) and lining weft yarns (202), and the surface fabric (1) and the lining fabric (2) are connected through an interwoven structure.

2. The double-layer cross-staggered conductive mesh fabric according to claim 1, characterized in that: Both the surface fabric (1) and the lining fabric (2) are woven from two groups of warp yarns and two groups of weft yarns. The warp yarns include A warp yarns and B warp yarns, and the weft yarns include A weft yarns and B weft yarns.

3. The interlaced double-layer cross-displaced conductive mesh fabric according to claim 2, characterized in that: In the surface fabric (1) and the lining fabric (2), the A warp yarns and the A weft yarns are T / C single yarns, and the B warp yarns and the B weft yarns are conductive yarns formed by twisting conductive fibers and T / C single yarns.

4. The interlaced double-layer cross-displaced conductive mesh fabric according to claim 1, wherein: The conductive grid of the surface fabric (1) and the lining fabric (2) is woven from B warp yarns and B weft yarns, and the conductive grid formed on the surface and the conductive grid formed on the lining are vertically cross-displaced.

5. The interlaced double-layer cross-offset conductive mesh fabric according to claim 1, characterized in that: The arrangement of the warp yarns and the weft yarns of the surface fabric (1) is: A warp: B warp is 15:1, and A weft: B weft is 15:

1.

6. The interlaced double-layer cross-displaced conductive mesh fabric according to claim 1, wherein: The arrangement of the warp yarns and the weft yarns of the lining fabric (2) is: A warp: B warp: A warp is 7:1:8, and A weft: B weft: A weft is 7:1:

8.

7. A knotted double-layer cross-displaced conductive mesh fabric according to claim 1, characterized in that: In the surface fabric (1) and the lining fabric (2), the warp yarns and the weft yarns both adopt an "over-one-under-one" arrangement.