Monocrystalline silicon wafer cleaning device with multiple cleaning pools

Abstract

The utility model discloses a multi-cleaning-pool monocrystalline silicon wafer cleaning device which comprises a cleaning box, a plurality of cover doors and a plurality of multi-stage electric push rods, the cleaning box is provided with a plurality of cleaning pools, the plurality of cover doors and the plurality of multi-stage electric push rods are the same in number and are in one-to-one correspondence, the multi-stage electric push rods can drive the corresponding cover doors to move, and the cover doors can seal the cleaning pools. According to the cleaning device, through the design of the double cover plates and the multi-stage electric push rod, the overall width of the device is reduced, and therefore the occupied area is saved. The two ends of the multi-stage electric push rod are hinged to be matched with the two sliding grooves and the connecting springs at the walking wheels, so that the cover door is opened and closed more smoothly, and the precision requirement during operation is reduced. The buffer plate and the elastic cushion are arranged, so that the buffer effect can be improved, violent impact is avoided, and the upper cover plate and the lower cover plate are better protected.

Description

Technical Field

[0001] The utility model relates to the field of single crystal silicon wafer processing, and more specifically, to a multi-cleaning tank single crystal silicon wafer cleaning device. Background Art

[0002] After slicing is completed during the manufacturing process of single crystal silicon wafers, a degumming operation is required to separate the silicon wafers from the resin plates. And before inserting the wafers, the silicon wafers need to be cleaned. Therefore, a cleaning device is needed to clean the silicon wafers in different cleaning tanks in sequence to ensure the degumming and cleanliness of the single crystal silicon wafers.

[0003] When the cover door of a traditional single crystal silicon wafer cleaning device is opened and closed, it often requires a large space for movement, which may result in a larger overall width of the device, thus occupying more space. And when some cleaning devices close the cleaning tank, during the closing process, sometimes driven by the driving component, the cover door moves quickly, and the direct contact between the cover door and the cleaning tank may cause a large impact, affecting the service life of the cover door. Summary of the Utility Model

[0004] The utility model aims to overcome the defects of the prior art and provides a multi-cleaning tank single crystal silicon wafer cleaning device.

[0005] To achieve the above object, the utility model provides the following technical solution: A single crystal silicon wafer cleaning device, comprising a cleaning box, a plurality of cover doors and a plurality of multi-stage electric push rods. The cleaning box has a plurality of cleaning tanks. The number of the plurality of cover doors is the same as that of the plurality of multi-stage electric push rods and they are in one-to-one correspondence. The multi-stage electric push rods can drive the corresponding cover doors to move. The cover doors can close the cleaning tanks. The cover door includes an upper cover plate and a lower cover plate located below the upper cover plate. A first hinge seat hinged to the fixed end of the multi-stage electric push rod is installed at the top of the cleaning box. A second hinge seat hinged to the movable end of the multi-stage electric push rod is installed at the top of the upper cover plate. An end limiting plate is connected to one end of the lower cover plate close to the first hinge seat. Both ends of the end limiting plate are connected with mounting plates. The mounting plates are connected with a walking wheel frame through connecting springs. The walking wheel frame is provided with walking wheels. The two sides of the upper cover plate have upper slide rails, and the two sides of the lower cover plate have lower slide rails. The cleaning tank has an upper chute matching with the upper slide rail and a lower chute matching with the lower slide rail. An end mounting block is provided at the upper cover plate. A buffer unit is installed at the end mounting block. The buffer unit includes a first buffer plate, a second buffer plate and a guide rod connecting the first and second buffer plates. The end mounting block has a guide hole matching with the guide rod. A first spring is connected between the first buffer plate and the end mounting block, and a second spring is connected between the second buffer plate and the end mounting block. The lower cover plate has a first end limiting block capable of abutting against the first buffer plate and a second end limiting block capable of abutting against the second buffer plate.

[0006] Further, the cover door has a closed state and an open state. When in the open state, the multi-stage electric push rod is at a first length, and the first end limiting block abuts against the first buffer plate. When in the closed state, the multi-stage electric push rod is at a second length, and the second end limiting block abuts against the second buffer plate. The first length is less than the second length.

[0007] Thus, the multi-stage electric push rod can drive the cover door to open and close. When the upper and lower cover plates move, the buffer plates can increase the buffering effect and avoid violent impacts.

[0008] Further, a plurality of support frames are installed in the cleaning pool.

[0009] Thus, the support frames are used to stably support the silicon wafer flower basket for easy cleaning.

[0010] Further, a water injection unit is installed in the cleaning pool. The water injection unit has a plurality of nozzles, and the cleaning pool is also connected with a drain pipe.

[0011] Preferably, the cleaning pool has an ultrasonic generating unit.

[0012] Thus, the performance of the cleaning pool is improved to ensure that the single crystal silicon wafer can be cleaned more thoroughly and efficiently.

[0013] Further, one end of the upper cover plate away from the first hinge seat has an elastic pad.

[0014] Thus, the elastic pad can reduce the impact when the cover door is closed.

[0015] Further, two of the guide rods are connected between the first and second buffer plates.

[0016] Thus, it is ensured that the two buffer plates can move stably.

[0017] Compared with the prior art, the beneficial effects of the present utility model are:

[0018] 1. For the cleaning device of the present application, the design of the double cover plates and the multi-stage electric push rod reduces the overall width of the device, thus saving floor space.

[0019] 2. For the cleaning device of the present application, the two ends of the multi-stage electric push rod are hinged, and together with the connecting springs at the two chutes and the walking wheels, the opening and closing operation of the cover door is smoother, reducing the precision requirements during operation.

[0020] 3. For the cleaning device of the present application, the arrangement of the buffer plates and the elastic pads can increase the buffering effect and avoid violent impacts, thus better protecting the upper and lower cover plates. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a schematic diagram of separated components;

[0022] Figure 2 It is a schematic diagram of the cover door;

[0023] Figure 3 It is an enlarged view of area A;

[0024] Figure 4 It is a schematic diagram of the opening of one of the cover doors;

[0025] Figure 5 It is Figure 4 a schematic diagram of another perspective of.

[0026] Explanation of reference numerals: 1 cleaning tank; 2 cleaning pool; 2.1 upper sliding groove; 2.2 lower sliding groove; 2.3 support frame; 2.4 water injection unit; 3 upper cover plate; 3.1 upper sliding rail; 3.2 end mounting block; 3.3 elastic pad; 4 lower cover plate; 4.1 lower sliding rail; 4.2 first end limiting block; 4.3 second end limiting block; 5 multi-stage electric push rod; 6 first hinge seat; 7 second hinge seat; 8 end limiting plate; 8.1 mounting plate; 8.2 connecting spring; 8.3 walking wheel frame; 8.4 walking wheel; 9.1 first buffer plate; 9.2 second buffer plate; 9.3 first spring; 9.4 second spring. Detailed implementation manners

[0027] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0028] The present invention provides as Figures 1-5A multi-washing-pool single-crystal silicon wafer cleaning device shown in the figure includes a cleaning box 1, a plurality of cover doors, and a plurality of multi-stage electric push rods 5. The cleaning box 1 has a plurality of cleaning pools 2. The number of the plurality of cover doors is the same as that of the plurality of multi-stage electric push rods 5 and they correspond one by one. The multi-stage electric push rods 5 can drive the corresponding cover doors to move. The cover doors can close the cleaning pools 2. The cover doors include an upper cover plate 3 and a lower cover plate 4 located below the upper cover plate 3. At the top of the cleaning box 1, a first hinge seat 6 hinged to the fixed end of the multi-stage electric push rod is installed. At the top of the upper cover plate 3, a second hinge seat 7 hinged to the movable end of the multi-stage electric push rod is installed. One end of the lower cover plate 4 close to the first hinge seat 6 is connected with an end limiting plate 8. Both ends of the end limiting plate 8 are connected with mounting plates 8.1. The mounting plates 8.1 are connected with a walking wheel frame 8.3 through connecting springs 8.2. The walking wheel frame is equipped with walking wheels 8.4. Both sides of the upper cover plate 3 have upper slide rails 3.1, and both sides of the lower cover plate 4 have lower slide rails 4.1. In the cleaning pool 2, there are upper slide grooves 2.1 matching with the upper slide rails and lower slide grooves 2.2 matching with the lower slide rails. At the end mounting block 3.2 of the upper cover plate 3, a buffer unit is installed. The buffer unit includes a first buffer plate 9.1, a second buffer plate 9.2, and a guide rod connecting the first and second buffer plates. The end mounting block 3.2 has a guide hole matching with the guide rod. A first spring 9.3 is connected between the first buffer plate 9.1 and the end mounting block 3.2, and a second spring 9.4 is connected between the second buffer plate 9.2 and the end mounting block 3.2. At the lower cover plate 4, there is a first end limiting block 4.2 capable of abutting against the first buffer plate 9.1 and a second end limiting block 4.3 capable of abutting against the second buffer plate 9.2.

[0029] The cover door has a closed state and an open state. When in the open state, the multi-stage electric push rod 5 is at a first length. The first end limiting block 4.2 abuts against the first buffer plate 9.1. When in the closed state, the multi-stage electric push rod 5 is at a second length. The second end limiting block 4.3 abuts against the second buffer plate 9.2. The first length is less than the second length. A plurality of support frames 2.3 are installed in the cleaning pool 2. A water injection unit 2.4 is installed in the cleaning pool 2. The water injection unit has a plurality of nozzles. The cleaning pool 2 is also connected with a drain pipe. One end of the upper cover plate 3 far from the first hinge seat 6 has an elastic pad 3.3. There are two guide rods connecting the first and second buffer plates.

[0030] Working principle: In the cleaning device of the present application, the design of the double cover plate and the multi-stage electric push rod reduces the overall width of the device, thus saving floor space. The two ends of the multi-stage electric push rod are hinged. Cooperating with the two slide grooves and the connecting springs at the walking wheels, the opening and closing operation of the cover door is smoother, reducing the precision requirements during operation.

[0031] Specifically, by controlling the multi-stage electric push rod, the cover door is in the open state. At this time, the multi-stage electric push rod is at the first length, the first end limiting block abuts against the first buffer plate, and the walking wheels support the lower cover plate. In addition, the cover door is closed by the multi-stage electric push rod. At this time, the multi-stage electric push rod is at the second length, and the second end limiting block abuts against the second buffer plate. Thus, the opening and closing of the cover door can be realized, facilitating the loading and unloading of silicon wafers.

[0032] Although the preferred embodiments of the present invention have been illustrated and described, those skilled in the art should understand that various changes and modifications can be made to the present invention as long as they do not exceed the scope defined by the claims of the present invention.

Claims

1. A multi-washing-pool single-crystal silicon wafer cleaning device, characterized in that It includes a cleaning tank, a plurality of cover doors, and a plurality of multi-stage electric push rods. The cleaning tank has a plurality of cleaning pools. The number of the plurality of cover doors is the same as that of the plurality of multi-stage electric push rods and they are in one-to-one correspondence. The multi-stage electric push rods can drive the corresponding cover doors to move. The cover doors can close the cleaning pools. The cover doors include an upper cover plate and a lower cover plate located below the upper cover plate. A first hinge seat hinged to the fixed end of the multi-stage electric push rod is installed at the top of the cleaning tank. A second hinge seat hinged to the movable end of the multi-stage electric push rod is installed at the top of the upper cover plate. An end limiting plate is connected to one end of the lower cover plate close to the first hinge seat. Installation plates are connected to both ends of the end limiting plate. The installation plates are connected with a walking wheel frame through connecting springs. The walking wheel frame is installed with walking wheels. The two sides of the upper cover plate have upper slide rails, and the two sides of the lower cover plate have lower slide rails. The cleaning pool has upper slide grooves matching with the upper slide rails and lower slide grooves matching with the lower slide rails. An end installation block is provided at the upper cover plate. A buffer unit is installed at the end installation block. The buffer unit includes a first buffer plate, a second buffer plate, and a guide rod connecting the first and second buffer plates. The end installation block has a guide hole matching with the guide rod. A first spring is connected between the first buffer plate and the end installation block, and a second spring is connected between the second buffer plate and the end installation block. The lower cover plate has a first end limiting block capable of abutting against the first buffer plate and a second end limiting block capable of abutting against the second buffer plate.

2. The multi-cleaning-pool single-crystalline silicon wafer cleaning device according to claim 1, wherein, The cover door has a closed state and an open state. When in the open state, the multi-stage electric push rod is at a first length, and the first end limiting block abuts against the first buffer plate. When in the closed state, the multi-stage electric push rod is at a second length, and the second end limiting block abuts against the second buffer plate. The first length is less than the second length.

3. The multi-washing-pool single-crystal silicon wafer washing device according to claim 1, wherein, A plurality of support frames are installed in the cleaning pool.

4. The multi-washing-pool single-crystalline silicon wafer washing device according to claim 1, characterized in that, A water injection unit is installed in the cleaning pool. The water injection unit has a plurality of nozzles. The cleaning pool is also connected with a drain pipe.

5. The multi-washing-pool single-crystalline silicon wafer washing device according to claim 1, wherein, An elastic pad is provided at one end of the upper cover plate away from the first hinge seat.

6. The multi-washing-pool single-crystalline silicon wafer washing device according to claim 1, characterized in that, Two of the guide rods are connected between the first and second buffer plates.

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