High-integration XY theta platform

Abstract

The utility model discloses a high-integration XY theta platform which comprises a base and a plurality of supporting platforms. The base comprises an X-axis track; the plurality of supporting platforms are supported on the X-axis track and can move on the X-axis track, each supporting platform comprises a Y-axis track and a rotating platform which is supported on the Y-axis track and can move on the Y-axis track, and the rotating platform is provided with a rotatable supporting surface; the supporting platform is further provided with a feedback device used for recording position information. According to the high-integration-level XY theta platform, the miniaturized supporting platform design is adopted, so that more supporting platforms can be supported on the base, the number of workpieces machined at a time is increased, the production efficiency is improved, the feedback device used for feeding back position information is arranged, and the production efficiency is improved. The position information of the workpiece to be machined can be fed back in real time without depending on a visual system.

Description

Technical Field

[0001] The utility model belongs to the technical field of processing equipment, and particularly relates to a high-integration XYθ platform. Background Art

[0002] A high-integration XYθ platform is a device that can move in two directions while rotating, and it is widely used in the semiconductor field. With the continuous iterative upgrade of the domestic semiconductor industry, the improvement of the process and processing accuracy of equipment has continuously increased the accuracy requirements for platforms with traditional structures, and the platforms with traditional structures can no longer meet special process requirements.

[0003] The information disclosed in this background art section is only intended to enhance the overall understanding of the utility model and should not be regarded as an admission or any form of suggestion that this information constitutes prior art already known to those of ordinary skill in the art. Summary of the Utility Model

[0004] The purpose of the utility model is to provide a high-integration XYθ platform with high accuracy during operation.

[0005] To achieve the above purpose, a specific embodiment of the utility model provides a high-integration XYθ platform, which includes a base and a plurality of support platforms. The base includes an X-axis track; the plurality of support platforms are supported on the X-axis track and can move on the X-axis track. The support platform includes a Y-axis track, and a rotating platform supported on the Y-axis track and capable of moving on the Y-axis track. The rotating platform is provided with a rotatable support surface, and the support platform is also provided with a feedback device for recording position information.

[0006] In one or more embodiments of the utility model, the support platform includes a mounting block that supports and moves on the X-axis track, the Y-axis track is fixed on the mounting block, and the feedback device includes a first feedback device fixed on the mounting block for feedbacking position information in the X-axis direction.

[0007] In one or more embodiments of the utility model, the support platform further includes a mounting plate supported on the Y-axis track, the rotating platform is fixed on the mounting plate, and the feedback device further includes a second feedback device fixed on the mounting plate and used for recording position information in the Y-axis direction.

[0008] In one or more embodiments of the utility model, the first feedback device and the second feedback device are position sensors or displacement sensors.

[0009] In one or more embodiments of the present utility model, the support platform further includes buffer columns fixed to the mounting block and located on both sides of the X-axis track, and the buffer columns protrude along the X-axis direction outside the side walls of the mounting block and the mounting plate.

[0010] In one or more embodiments of the present utility model, all the buffer columns are arranged on the same side of their corresponding support platforms.

[0011] In one or more embodiments of the present utility model, a buffer plate is further fixed to the mounting block, and the buffer plate is arranged on the other side of the buffer columns along the X-axis direction.

[0012] In one or more embodiments of the present utility model, a plurality of adsorption holes for adsorbing the workpiece to be processed are arranged on the support surface.

[0013] In one or more embodiments of the present utility model, two X-axis tracks are arranged in parallel, the support platform includes two sliders respectively supported on the two X-axis tracks, and the mounting block is supported on the two sliders.

[0014] In one or more embodiments of the present utility model, the mounting block is formed with a through hole penetrating along the X-axis direction, and the base includes a cover plate extending into the through hole.

[0015] Compared with the prior art, the high-integration XYθ platform of the present utility model is provided with a feedback device for feeding back position information, and can feed back the position information of the workpiece to be processed in real time without relying on a vision system. Moreover, the high-integration XYθ platform adopts a miniaturized support platform design, enabling more support platforms to be supported on the base to increase the number of workpieces processed at one time and improve production efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the technical solutions in the embodiments of the present utility model or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the drawings in the following description are only some embodiments recorded in the present utility model. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts.

[0017] Figure 1 It is a schematic diagram of a high-integration XYθ platform in an embodiment of the present utility model;

[0018] Figure 2 It is a schematic diagram of a support platform in an embodiment of the present utility model;

[0019] Figure 3 It is a schematic diagram of a base in an embodiment of the present utility model.

[0020] Description of Main Reference Numerals:

[0021] 100 - High - integration XYθ platform, 10 - Base, 11 - X - axis track, 12 - Cover plate, 20 - Support platform, 21 - Y - axis track, 22 - Rotating platform, 23 - Support surface, 241 - First feedback device, 242 - Second feedback device, 25 - Mounting block, 251 - Channel, 26 - Mounting plate, 27 - Buffer column, 28 - Buffer plate, 29 - Slide block. Detailed Implementation Manner

[0022] In order to enable those skilled in the art to better understand the technical solutions in the present utility model, the following will clearly and completely describe the technical solutions in the embodiments of the present utility model with reference to the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all of the embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present utility model.

[0023] As Figures 1-3 shown, the high - integration XYθ platform 100 in an embodiment of the present utility model includes a base 10 and at least one support platform 20. An X - axis track 11 is provided inside the base 10, and the support platform 20 is supported on the X - axis track 11 and can move on the X - axis track 11. A Y - axis track 21 is provided on the support platform 20, and its extending direction is perpendicular to the X - axis track 11. A rotating platform 22 is supported on the Y - axis track 21. The rotating platform 22 can move on the Y - axis track 21 and is provided with a rotatable support surface 23 for supporting the workpiece to be processed. Therefore, the workpiece can move and rotate in two directions through the high - integration XYθ platform 100 to facilitate processing.

[0024] To improve the working accuracy, a feedback device for recording position information is provided on the support platform 20, which is used to feedback the position information in real - time during movement to accurately position the workpiece without relying on a vision system. Secondly, the overall structure of the high - integration XYθ platform 100 is streamlined, especially the support platform 20 is miniaturized, so that a single X - axis track 11 can accommodate more support platforms 20, increasing the number of workpieces that can be transmitted and processed per unit time and improving the production efficiency.

[0025] Specifically, the support platform 20 includes a mounting block 25 supported on the X-axis rail 11, and the Y-axis rail 21 is fixed to the mounting block 25. The feedback device includes a first feedback device 241 fixed to the mounting block 25, which moves along the X-axis direction following the mounting block 25 and is used to detect and feedback the position information of the workpiece in the X-axis direction. The first feedback device 241 can be a position sensor, a displacement sensor or other induction devices, and this embodiment does not limit it.

[0026] Preferably, since the support platform 20 adopts a miniaturized design, in order to avoid interference between the first feedback devices 241 on adjacent support platforms 20, the first feedback devices 241 on adjacent support platforms 20 are arranged on both sides of the X-axis rail 11, that is, the first feedback devices 241 on the same side of the X-axis rail 11 are arranged at intervals, and the two adjacent first feedback devices 241 will not collide with each other during operation.

[0027] Furthermore, the support platform 20 further includes a mounting plate 26 supported on the Y-axis rail 21, and the rotating platform 22 is fixed to the mounting plate 26. The feedback device further includes a second feedback device 242 fixed to the mounting plate 26, which moves along the Y-axis direction following the mounting plate 26 and is used to detect and feedback the position information of the workpiece in the Y-axis direction. The second feedback device 242 can also be a position sensor, a displacement sensor or other induction devices, and this embodiment does not limit it.

[0028] As Figure 2 shown, in an embodiment, a buffer column 27 is provided on the support platform 20, which is fixed to the mounting block 25 and located on one side or both sides of the X-axis rail 11. The buffer column 27 protrudes outward beyond the edge of all components on that side of the support platform 20 and is used to provide buffering when adjacent support platforms 20 are about to collide, so as to avoid collision between the main bodies of the two support platforms 20 and cause failures or even damage.

[0029] Preferably, buffer columns 27 are installed on both sides of the X-axis rail 11, and after being installed on the X-axis rail 11, all the buffer columns 27 on the support platforms 20 have a unified orientation, that is, all the buffer columns 27 are fixed on the same side of their corresponding support platforms 20, so that when contact or collision is about to occur, the buffer column 27 can contact the mounting block 25 on another support platform 20, rather than contacting the buffer column 27 fixed to the mounting block 25.

[0030] Furthermore, a buffer plate 28 is fixed to the other side of the mounting block 25, which is arranged opposite to the buffer column 27 and faces the buffer column 27 on the corresponding side of the support platform 20. The buffer plate 28 also protrudes beyond the overall outer side of the support platform 20, so that the buffer column 27 directly collides with the buffer plate 28 during collision.

[0031] To improve the overall stability of the platform, two X-axis rails 11 are provided, and two sliders 29 are provided on the support platform 20, respectively corresponding to and supported on the two X-axis rails 11.

[0032] It is easy to think that adsorption holes (not shown in the figure) can be opened on the support surface of the rotating platform 22. By connecting a negative pressure device, the workpiece to be processed can be adsorbed on the rotating platform 22 to prevent the workpiece from slipping during movement or rotation. And when using the adsorption fixing method, there is no need to consider the shape of the workpiece to be processed, and there is no need to set additional limiting or fixing structures on the support surface of the rotating platform 22, so the manufacturing cost is relatively low and the flexibility is relatively high.

[0033] Combined with Figure 2 and 3 As shown, the X-axis rail 11 is supported on the base 10. Each mounting block 25 is formed with a channel 251 penetrating in the X-axis direction. A cover plate 12 extending between the channels 251 of each mounting block 25 is fixed on the base 10, which can prevent sundries from falling onto the X-axis rail 11 and causing faults or damage.

[0034] It is easy to think that the length of the X-axis rail 11 and the number of support platforms 20 can be set according to actual production needs. When the number of workpieces to be processed is large, multiple groups of X-axis rails 11 can be arranged in parallel to form a processing array to further improve production efficiency.

[0035] For those skilled in the art, it is obvious that the present utility model is not limited to the details of the above exemplary embodiments, and can be implemented in other specific forms without departing from the spirit or basic characteristics of the present utility model. Therefore, from any point of view, the embodiments should be regarded as exemplary and non-limiting. The scope of the present utility model is defined by the appended claims rather than the above description. Therefore, all changes falling within the meaning and scope of the equivalent elements of the claims are intended to be encompassed within the present utility model. Any reference signs in the claims should not be construed as limiting the claimed rights.

[0036] In addition, it should be understood that although this specification is described according to embodiments, not every embodiment only contains an independent technical solution. This narrative way of the specification is only for clarity. Those skilled in the art should regard the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. A high-integration XYθ platform, characterized in that Comprising: A base, the base including an X-axis track; A plurality of support platforms, supported on the X-axis track and capable of moving on the X-axis track, the support platform including a Y-axis track, and a rotating platform supported on the Y-axis track and capable of moving on the Y-axis track, the rotating platform being provided with a rotatable support surface, and the support platform is further provided with a feedback device for recording position information.

2. The highly integrated XYθ platform according to claim 1, wherein The support platform includes a mounting block supported and moving on the X-axis track, the Y-axis track being fixed to the mounting block, and the feedback device includes a first feedback device fixed to the mounting block for feeding back position information in the X-axis direction.

3. The highly integrated XYθ platform according to claim 2, wherein, The support platform further includes a mounting plate supported on the Y-axis track, the rotating platform being fixed to the mounting plate, and the feedback device further includes a second feedback device fixed to the mounting plate and for recording position information in the Y-axis direction.

4. The highly integrated XYθ platform according to claim 3, wherein The first feedback device and the second feedback device are position sensors or displacement sensors.

5. The highly integrated XYθ platform according to claim 3, characterized in that The support platform further includes buffer columns fixed to the mounting block and located on both sides of the X-axis track, the buffer columns protruding along the X-axis direction outside the side walls of the mounting block and the mounting plate.

6. The highly integrated XYθ platform according to claim 5, wherein, All the buffer columns are provided on the same side of their corresponding support platforms.

7. The highly integrated XYθ platform according to claim 6, wherein A buffer plate is further fixed to the mounting block, the buffer plate being arranged along the X-axis direction on the other side of the buffer columns.

8. The highly integrated XYθ platform according to claim 1, wherein A plurality of suction holes for sucking the workpiece to be processed are provided on the support surface.

9. The highly integrated XYθ platform according to claim 2, characterized in that, There are two X-axis tracks arranged in parallel, the support platform including two sliders respectively supported on the two X-axis tracks, and the mounting block being supported on the two sliders.

10. The highly integrated XYθ platform according to claim 2, characterized in that, The mounting block is formed with a through hole penetrating along the X-axis direction, and the base includes a cover plate extending into the through hole.

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