Purification device

Abstract

The present application provides a purification device. The purification device comprises N filtering tanks and N feeding valves. A filtering membrane is arranged in the filtering tank, in the height direction, the liquid material can downwards penetrate through the filtering membrane, and the solid material can be intercepted on the filtering membrane. The feeding valve comprises a feeding valve inlet and N feeding valve outlets, the N feeding valve outlets are connected to the N filtering tanks respectively, so that the feeding valve can be configured to convey materials to the filtering tanks through the feeding valve outlets in a time-sharing mode, and N is larger than or equal to 3. The feeding valve can be configured to feed the materials into the filtering tanks in a time-sharing manner through the outlets of the feeding valves, and a feeding valve closing and waiting process in a traditional purification process is converted into a process that the feeding valves feed the materials into other filtering tanks, so that the materials in the feeding valves can be in a conveying state all the time, the problems of material overstock and the like are avoided, and the purification efficiency is improved. And continuous real-time purification is realized.

Description

Technical Field

[0001] The present application relates to the technical field of quantum dot purification, and in particular to a purification device. Background Art

[0002] In addition to quantum dots, the quantum dot stock solution also contains unreacted precursors, solvents, etc. The traditional method of purifying quantum dots is to place the suspension obtained by mixing the stock solution with a poor solvent in a centrifuge tube, use a common commercial centrifuge to centrifuge and settle, and then use a good solvent to re-dissolve it to obtain quantum dots with higher purity. The volumes of the quantum dot stock solution, poor solvent, and good solvent, as well as the speed and centrifugation time of the centrifuge must be accurate, otherwise there may be problems with the consistency of the purified quantum dots. The entire process requires the operator to operate patiently, the work is repetitive and tedious, and the personnel are exposed to an organic solvent environment.

[0003] Considering the consistency of quantum dots, it is particularly important to develop new solid-liquid separation, cleaning, and re-dissolution technologies and realize automation on this basis.

[0004] The inventors know of a method for purifying quantum dots that uses the principle of different solubility of quantum dots and impurities in a specific solvent and membrane separation technology. However, because the separation device is an intermittent device, the input device for each material needs to be switched on and off, and materials cannot be added continuously. This will cause a backlog of materials, and the input device can only be restarted after processing a batch of materials to process the next batch of materials. The materials may deteriorate or other conditions that are not conducive to the product may occur due to the backlog.

[0005] Therefore, there is still room for improvement in the purification method of quantum dots. Utility Model Content

[0006] In order to solve or alleviate at least one of the problems mentioned in the background technology, the present application provides a purification device.

[0007] The purification device provided in the embodiment of the present application comprises:

[0008] N filter tanks, each filter tank being provided with a filter membrane, so that in the height direction, a material in the form of a liquid can pass downward through the filter membrane, and a material in the form of a solid can be retained on the filter membrane;

[0009] N feed valves, each of which comprises a feed valve inlet and N feed valve outlets, wherein the N feed valve outlets are respectively connected to the N filter tanks, so that the feed valve can be configured to deliver materials to each of the filter tanks through each of the feed valve outlets in a time-sharing manner, wherein N≥3.

[0010] In at least one embodiment, the purification device includes a material feeding mechanism, the material feeding mechanism includes N material feeding parts, and the N material feeding parts are respectively connected to the inlet of the N feed valves.

[0011] In at least one embodiment, the purification device includes one or more material collection parts, and the material collection part includes:

[0012] A waste liquid bottle;

[0013] A collection bottle;

[0014] A discharge valve, the discharge valve includes a discharge valve inlet and two discharge valve outlets, the discharge valve inlet is connected to the outlet of the filter tank, and the two discharge valve outlets are respectively connected to the waste liquid bottle and the collection bottle.

[0015] In at least one embodiment, the feed valve includes a first valve, a second valve and a third valve, and the material feeding part includes:

[0016] A mixed liquid adding part for adding a mixed material to be purified and a precipitant to the first valve;

[0017] A first solvent adding part for adding a first solvent to the second valve;

[0018] A second solvent adding part for adding a second solvent to the third valve.

[0019] In at least one embodiment, the feed valve includes a fourth valve, and the material feeding part includes a first gas adding part, and the first gas adding part is used for feeding a first drying gas into the fourth valve.

[0020] In at least one embodiment, the feed valve includes a fifth valve, and the material feeding part includes a third solvent adding part, and the third solvent adding part is used for adding a third solvent to the fifth valve.

[0021] In at least one embodiment, the feed valve includes a sixth valve, and the material feeding part includes a second gas adding part, and the second gas adding part is used for adding a second drying gas into the sixth valve.

[0022] In at least one embodiment, the purification device includes a control device, and the control device is configured to be able to control the connection state of the feed valve inlet and the N feed valve outlets.

[0023] In at least one embodiment, the purification device includes a control device and a pump, and the control device is configured to be able to control the pump to input liquid materials with corresponding flow rates and corresponding times into the feed valve.

[0024] In at least one embodiment, the purification device includes a control device and a mass flow controller, and the control device is configured to control the mass flow controller to input a gas material with a corresponding flow rate and for a corresponding time into the feed valve.

[0025] This application provides a plurality of filter tanks and a plurality of feed valves, and the feed valves are configured to feed materials to each filter tank at different times through the outlets of each feed valve, converting the shutdown waiting process of the feed valve in the traditional purification process into a process of feeding materials to other filter tanks by the feed valve, so that the materials in the feed valve can always be in a conveying state, avoiding problems such as material accumulation, and achieving continuous real-time purification. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 FIG. shows a schematic structural diagram of a purification device according to an embodiment of the present application.

[0027] Figure 2 FIG. shows a schematic structural diagram of a filter tank and a material collection part in a purification device according to an embodiment of the present application.

[0028] Figure 3 FIG. shows a top view of a feed valve in a purification device according to an embodiment of the present application.

[0029] Figure 4 FIG. shows Figure 3 a front view of the feed valve in

[0030] Figure 5 FIG. shows a schematic connection diagram of a feed valve and a filter tank in a purification device according to an embodiment of the present application.

[0031] Figure 6 FIG. shows a purification flow chart in a filter tank of a purification device according to an embodiment of the present application.

[0032] DESCRIPTION OF THE REFERENCE NUMERALS

[0033] 100 Filter tank; 101 First filter tank; 102 Second filter tank; 110 Filter membrane; 121 Tank A; 122 Tank B; 123 Tank C; 124 Tank D; 125 Tank E; 126 Tank F;

[0034] 200 Feed valve; 201 First valve; 202 Second valve; 203 Fourth valve; 204 Third valve; 205 Fifth valve; 206 Sixth valve; 210 Feed valve inlet; 220 Feed valve outlet;

[0035] 300 Material feeding part; 310 Mixed liquid adding part; 320 First solvent adding part; 330 First gas adding part; 340 Second solvent adding part; 350 Third solvent adding part; 360 Second gas adding part;

[0036] 410 waste liquid bottle; 420 collection bottle; 430 discharge valve;

[0037] 500 control device;

[0038] 610 pump; 620 mass flow controller;

[0039] 710 quantum dot stock solution; 720 chloroform; 730 ethanol; 740 acetone; 750 three-way mixing valve Detailed implementation manners

[0040] The exemplary implementation manners of the present application will be described below with reference to the accompanying drawings. It should be understood that these specific descriptions are only used to teach those skilled in the art how to implement the present application, rather than to exhaust all feasible manners of the present application, nor to limit the scope of the present application.

[0041] The implementation manner of the present application provides a purification device. Refer to Figure 1 , the purification device may include N filtering tanks 100 and N feed valves 200. Among them, N≥3. In one implementation manner, N may be equal to 6.

[0042] Refer to Figure 2 , the filtering tank 100 may be cylindrical, and a filter membrane 110 may be provided in the filtering tank 100. In the height direction h, the material in the form of liquid can pass downward through the filter membrane 110, and the material in the form of solid can be intercepted on the filter membrane 110.

[0043] Exemplarily, the filtering tank 100 may be formed into a first filtering tank 101 and a second filtering tank 102 that can be disassembled up and down. The diameter of the filter membrane 110 may be larger than the diameter of the filtering tank 100, and the filter membrane 110 may be fixed by being sandwiched between the first filtering tank 101 and the second filtering tank 102. Alternatively, grooves are provided at the openings of the first filtering tank 101 and / or the second filtering tank 102, and the filter membrane 110 is fixed in the grooves. The first filtering tank 101 and the second filtering tank 102 may be hermetically connected. The filter membrane 110 may be located at a lower position in the filtering tank 100. For example, the height ratio of the first filtering tank 101 to the second filtering tank 102 may be 4:1.

[0044] Refer to Figure 3 , the feed valve 200 may include one feed valve inlet 210 and N feed valve outlets 220. Refer to Figure 5, the outlets 220 of N feed valves can be respectively connected to N filter tanks 100, so that the feed valves 200 can be configured to convey materials to each filter tank 100 through each feed valve outlet 220 at different times. For example, logically, materials are conveyed to tank 121 in the first period and to tank 122 in the second period, etc. Specific conveying examples will be introduced later. Of course, the conveying order can be adjusted accordingly. For example, first convey to tank 122 and then to tank 121, etc. That is, the arrangement order of the tanks does not necessarily correspond to the feeding order.

[0045] Exemplarily, refer to Figure 4 , the inlet 210 of the feed valve can be arranged at one end of the feed valve 200, and the outlet 220 of the feed valve can be arranged at the other end of the feed valve 200. Of course, the positions of its inlet and outlet can be adjusted. For example, they can be located on the side of the feed valve 200.

[0046] Exemplarily, the feed valve 200 can be arranged such that the channels where the N feed valve outlets 220 are located can rotate relative to the feed valve inlet 210, and only one feed valve outlet 220 can communicate with the feed valve inlet 210. The rotation position of the feed valve outlet 220 can be controlled by a motor, and thus the connected feed valve outlet 220 can be controlled. The motor can be controlled by the control device 500 (introduced later), and thus the passage in the feed valve can be controlled.

[0047] Refer to Figure 1 and Figure 5 , it should be understood that the outlets 220 of each feed valve 200 are respectively connected to one filter tank 100. Only one kind of material is input in one feed valve 200, and this material is output to each filter tank 100 at different times.

[0048] The solubility of quantum dots and impurities is different in a specific polar mixed solvent. For example, they dissolve in a good solvent and precipitate in a poor solvent. This application utilizes this characteristic to put different substances into the filter tank 100 through each feed valve 200 at different times to achieve each purification step (introduced later).

[0049] After performing a precipitation step in a traditional filter tank, for example, the material feeding device for adding the material to be purified and the precipitant needs to be shut down and wait until the filter tank performs the next precipitation step before the material feeding device can be restarted. However, this application sets multiple filter tanks 100 and multiple feed valves 200, and configures the feed valves 200 to put materials into each filter tank 100 through each feed valve outlet 220 at different times, converting the waiting process of shutting down the material feeding device in the traditional purification process into a process of the feed valve 200 putting materials into other filter tanks 100, so that the materials in the feed valve 200 can always be in a conveying state, avoiding problems such as material backlog, and realizing continuous real-time purification.

[0050] In one embodiment of the present application, referring to Figure 1 , the purification device may include a material feeding mechanism, and the material feeding mechanism may include N material feeding parts 300. The N material feeding parts 300 are respectively connected to the inlet 210 of the N feed valves 200, so that each feed valve is used to add a single type of material.

[0051] Exemplarily, the material feeding part 300 may include a mixed liquid adding part 310, a first solvent adding part 320, a first gas adding part 330, a second solvent adding part 340, a third solvent adding part 350 and a second gas adding part 360. The materials specifically added by each adding part will be introduced later.

[0052] In one embodiment of the present application, referring to Figure 1 , the purification device includes one or more material collection parts. The material collection part may include a waste liquid bottle 410, a collection bottle 420 and a discharge valve 430. Referring to Figure 2 , the discharge valve 430 may include a discharge valve inlet and two discharge valve outlets. The discharge valve inlet is connected to the outlet of the filter tank 100, and the two discharge valve outlets are respectively connected to the waste liquid bottle 410 and the collection bottle 420. The discharge valve 430 may be a three-way solenoid valve.

[0053] Referring to Figure 1 , a waste liquid bottle 410 and a collection bottle 420 may be separately provided for each filter tank 100. It is also possible to provide a total of one waste liquid bottle 410 and one collection bottle 420, and the waste liquid in each filter tank 100 is introduced into the waste liquid bottle 410 through a pipeline, and the complex solvent (introduced later) in each filter tank 100 is introduced into the collection bottle 420. It can be understood that the waste gas can also be directed to the waste liquid bottle 410.

[0054] In one embodiment of the present application, referring to Figure 1 , the feed valve 200 may include a first valve 201, a second valve 202 and a third valve 204. Correspondingly, the material feeding part 300 includes a mixed liquid adding part 310, a first solvent adding part 320 and a second solvent adding part 340.

[0055] The mixed liquid adding part 310 may be used to add a mixed material to be purified (such as quantum dot stock solution 710) and a precipitant to the first valve 201. Exemplarily, the precipitant may include chloroform 720, ethanol 730 and acetone 740. First, the quantum dot stock solution 710 and chloroform 720 may be mixed to form a first mixed liquid, ethanol 730 and acetone 740 may be mixed to form a second mixed liquid, and then the first mixed liquid and the second mixed liquid are mixed. The mixed liquid adding part 310 may further include a three-way mixing valve 750, and the mixing ratio may be controlled by the three-way mixing valve 750.

[0056] The first solvent addition part 320 can be used to add the first solvent to the second valve 202. Exemplarily, the first solvent can be a quantum dot cleaning agent, such as ethanol.

[0057] The second solvent addition part 340 can be used to add the second solvent to the third valve 204. Exemplarily, the second solvent can be a complex solvent, such as chloroform.

[0058] In an embodiment of the present application, refer to Figure 1 , the feed valve 200 may include a fourth valve 203, and the material feeding part 300 includes a first gas addition part 330. The first gas addition part 330 is used to feed a first dry gas into the fourth valve 203. The first dry gas can be nitrogen with a relatively high purity, such as nitrogen with a purity of more than 99.99%. Of course, it can also be other types of inert gases. This is to prevent the quantum dots from contacting oxygen and water vapor.

[0059] In an embodiment of the present application, refer to Figure 1 , the feed valve 200 may include a fifth valve 205, and the material feeding part 300 includes a third solvent addition part 350. The third solvent addition part 350 is used to add a third solvent to the fifth valve 205. Exemplarily, the third solvent can be a membrane cleaning agent, such as n - hexane.

[0060] In an embodiment of the present application, refer to Figure 1 , the feed valve 200 may include a sixth valve 206, and the material feeding part 300 includes a second gas addition part 360. The second gas addition part 360 is used to feed a second dry gas into the sixth valve 206. Exemplarily, the second dry gas can be the same as the first dry gas, such as nitrogen. Of course, it can also be other types of inert gases.

[0061] In an embodiment of the present application, refer to Figure 1 , the material feeding mechanism may include a control device 500. The control device 500 can control the connection state of the feed valve inlet 210 and the N feed valve outlets 220 of the feed valve 200 to control the alternate input of materials into each filtration tank 100. The control device 500 can be formed as a computer. The various components can be controlled through LabVIEW (program development environment) software.

[0062] Furthermore, refer to Figure 1 , the material feeding mechanism may include a pump 610 (such as a high - performance liquid chromatography pump 610, also known as an HPLC pump) and a mass flow controller 620. The control device 500 is configured to be able to control the pump 610 to input liquid materials with corresponding flow rates and corresponding times into the feed valve 200. And, the control device 500 is configured to be able to control the mass flow controller 620 to input gas materials with corresponding flow rates and corresponding times into the feed valve 200.

[0063] Further, a stirring motor (not shown in the figure) may be provided at the filter membrane 110 of the filter tank 100 to spread the solid quantum dots remaining on the filter membrane 110 into a filter cake, so as to improve the efficiency of cleaning and redissolution. The operating state of the stirring motor can also be controlled by the control device 500.

[0064] Next, the present application provides an embodiment of purifying quantum dots by a purification device. The quantum dots may be cadmium selenide quantum dots.

[0065] See Figure 1 , the material feeding part 300 includes a mixed liquid adding part 310, a first solvent adding part 320, a first gas adding part 330, a second solvent adding part 340, a third solvent adding part 350, and a second gas adding part 360.

[0066] The purification device includes six feeding valves 200, and each feeding valve 200 is a seven-way valve including a feeding valve inlet 210 and six feeding valve outlets 220. Among them, the feeding valve 200 may include a first valve 201, a second valve 202, a fourth valve 203, a third valve 204, a fifth valve 205, and a sixth valve 206. The feeding valve inlets 210 of the six feeding valves 200 are respectively connected to six material feeding parts 300, so that each feeding valve 200 can receive a certain material and distribute it through its outlet.

[0067] The purification device includes six filter tanks 100, and the inlet of each filter tank 100 is connected to the feeding valve outlets 220 of the six feeding valves 200, so that the six feeding valves 200 can add corresponding materials to the filter tanks 100 at different times. The six filter tanks 100 may be respectively named a tank 121, a tank 122, a tank 123, a tank 124, a tank 125, and a tank 126.

[0068] The purification device includes six discharge valves 430, and each discharge valve 430 is respectively connected to a waste liquid bottle 410 and a collection bottle 420.

[0069] See Figure 6 , the purification process in one filter tank 100 may include the following steps.

[0070] (S1) Precipitation, the mixed liquid adding part 310 puts the quantum dot stock solution 710 and a precipitant into the filter tank 100 through the first valve 201. The quantum dots remain on the filter membrane 110, and the liquid is discharged.

[0071] (S2) First cleaning, the first solvent adding part 320 puts a first solvent, that is, a quantum dot cleaning solution, into the filter tank 100 through the second valve 202 to clean the impurities outside the precipitated quantum dots. The quantum dots remain on the filter membrane 110, and the liquid is discharged.

[0072] (S3) First drying: The first gas addition part 330 injects the first drying gas into the filtration tank 100 through the fourth valve 203 to dry the quantum dots. The quantum dots remain on the filter membrane 110, and the remaining quantum dot cleaning solution is completely discharged.

[0073] (S4) Re-dissolution: The second solvent addition part 340 injects the second solvent, i.e., the re-dissolving solvent, into the filtration tank 100 through the third valve 204 to re-dissolve the collected quantum dots and obtain a quantum dot solution with higher purity.

[0074] (S5) Second cleaning: The third solvent addition part 350 injects the third solvent, i.e., the membrane cleaning agent, into the filtration tank 100 through the fifth valve 205 to clean the filter membrane 110 after the quantum dots are collected, so as to reuse the filter membrane 110.

[0075] (S6) Second drying: The second gas addition part 360 injects the second drying gas into the filtration tank 100 through the sixth valve 206 to dry the filter membrane 110.

[0076] For the overall purification process of the six filtration tanks 100, it may include:

[0077] (1) The quantum dot stock solution 710 and the precipitant are controlled by the first valve 201 to flow into the first tank 121. The remaining five feed valves 200 do not admit liquid or gas temporarily.

[0078] (2) The quantum dot stock solution 710 and the precipitant are controlled by the first valve 201 to flow into the second tank 122. The quantum dot cleaning agent is controlled by the second valve 202 to flow into the first tank 121. The remaining four feed valves 200 do not admit liquid or gas temporarily.

[0079] (3) The quantum dot stock solution 710 and the precipitant are controlled by the first valve 201 to flow into the third tank 123. The quantum dot cleaning agent is controlled by the second valve 202 to flow into the second tank 122. The drying gas (such as nitrogen) is controlled by the fourth valve 203 to flow into the first tank 121. The remaining three feed valves 200 do not admit liquid or gas temporarily.

[0080] (4) The quantum dot stock solution 710 and the precipitant are controlled by the first valve 201 to flow into the fourth tank 124. The quantum dot cleaning agent is controlled by the second valve 202 to flow into the third tank 123. The drying gas (such as nitrogen) is controlled by the fourth valve 203 to flow into the second tank 122. The re-dissolving solvent is controlled by the third valve 204 to flow into the first tank 121. The remaining two feed valves 200 do not admit liquid or gas temporarily.

[0081] (5) The quantum dot stock solution 710 and the precipitant flow into the fifth tank 125 under the control of the first valve 201. The quantum dot cleaning agent flows into the fourth tank 124 under the control of the second valve 202. The drying gas (such as nitrogen) flows into the third tank 123 under the control of the fourth valve 203. The re-solvent flows into the second tank 122 under the control of the third valve 204. The membrane cleaning solution flows into the first tank 121 under the control of the fifth valve 205. The remaining one feed valve 200 does not feed liquid or gas temporarily.

[0082] (6) The quantum dot stock solution 710 and the precipitant flow into the sixth tank 126 under the control of the first valve 201. The quantum dot cleaning agent flows into the fifth tank 125 under the control of the second valve 202. The drying gas (such as nitrogen) flows into the fourth tank 124 under the control of the fourth valve 203. The re-solvent flows into the third tank 123 under the control of the third valve 204. The membrane cleaning solution flows into the second tank 122 under the control of the fifth valve 205. The drying gas (such as nitrogen) flows into the first tank 121 under the control of the sixth valve 206.

[0083] (7) The quantum dot stock solution 710 and the precipitant flow into the first tank 121 under the control of the first valve 201. The quantum dot cleaning agent flows into the sixth tank 126 under the control of the second valve 202. The drying gas (such as nitrogen) flows into the fifth tank 125 under the control of the fourth valve 203. The re-solvent flows into the fourth tank 124 under the control of the third valve 204. The membrane cleaning solution flows into the third tank 123 under the control of the fifth valve 205. The drying gas (such as nitrogen) flows into the second tank 122 under the control of the sixth valve 206.

[0084] (8) Repeat the process to carry out continuous purification.

[0085] That is, each filtration tank 100 is divided into six working stages: precipitating, cleaning quantum dots, drying quantum dots, re-dissolving quantum dots, cleaning the membrane, and drying the membrane. The six filtration tanks 100 work simultaneously, each undertaking one of the six stages. The tasks are allocated through the seven-way feed valve 200 to achieve continuous purification work.

[0086] The advantages of the purification device provided by this application include:

[0087] (1) The addition amounts of the quantum dot stock solution, precipitant, quantum dot cleaning agent, re-solvent, and membrane cleaning solution can all be accurately controlled by the flow rate and injection duration of a pump (such as an HPLC pump). The pressure and flow rate of the drying gas can also be accurately controlled. The connection conditions of the feed valve and the discharge valve can be controlled, enabling each batch of quantum dot purification process to be completely replicated, improving consistency.

[0088] (2) After startup, the system automatically samples, discharges liquid, collects samples according to the pre-designed program, and works in a cycle. It not only eliminates the physical labor of operating the centrifuge and centrifuge tubes by humans, protecting human health, but also eliminates the mental labor of operating the computer by humans, truly saving labor costs.

[0089] (3) The drying gas can be nitrogen, which isolates the quantum dots from water vapor and oxygen, avoiding contamination of the quantum dots.

[0090] The above is the preferred embodiment of the present application. It should be noted that for those skilled in the art, several improvements and refinements can be made without departing from the principle of the present application, and these improvements and refinements should also be regarded as the protection scope of the present application.

Claims

1. A purification device, characterized in that, Comprising: N filter tanks, in which filter membranes are provided. In the height direction, the material in the form of liquid can pass downward through the filter membranes, and the material in the form of solid can be retained on the filter membranes. N feed valves, each of the feed valves including a feed valve inlet and N feed valve outlets, and the N feed valve outlets are respectively connected to the N filter tanks, such that the feed valves can be configured to convey materials to the respective filter tanks through the respective feed valve outlets at different times, where N ≥ 3.

2. The purification device according to claim 1, wherein The purification device includes a material feeding mechanism, and the material feeding mechanism includes N material feeding parts, and the N material feeding parts are respectively connected to the feed valve inlets of the N feed valves.

3. The purification device according to claim 1, characterized in that, The purification device includes one or more material collection parts, and the material collection parts include: A waste liquid bottle; A collection bottle; A discharge valve, the discharge valve including a discharge valve inlet and two discharge valve outlets, the discharge valve inlet being connected to the outlet of the filter tank, and the two discharge valve outlets being respectively connected to the waste liquid bottle and the collection bottle.

4. The purification device according to claim 2, characterized in that, The feed valve includes a first valve, a second valve and a third valve, and the material feeding part includes: A mixed liquid adding part for adding a mixed material to be purified and a precipitant to the first valve; A first solvent adding part for adding a first solvent to the second valve; A second solvent adding part for adding a second solvent to the third valve.

5. The purification device according to claim 4, wherein, The feed valve includes a fourth valve, and the material feeding part includes a first gas adding part for adding a first drying gas to the fourth valve.

6. The purification device according to claim 4, characterized in that, The feed valve includes a fifth valve, and the material feeding part includes a third solvent adding part for adding a third solvent to the fifth valve.

7. The purification device according to claim 4, wherein, The feed valve includes a sixth valve, and the material feeding part includes a second gas adding part for adding a second drying gas to the sixth valve.

8. The purification device according to any one of claims 1 to 7, characterized in that, The purification device includes a control device, and the control device is configured to be able to control the connection situation of the feed valve inlet and the N feed valve outlets.

9. The purification device according to claim 4, characterized in that, The purification device includes a control device and a pump, and the control device is configured to be able to control the pump to input liquid materials with corresponding flow rates and corresponding times into the feed valves.

10. The purification device according to claim 4, characterized in that, The purification device includes a control device and a mass flow controller, and the control device is configured to be able to control the mass flow controller to input gas materials with corresponding flow rates and corresponding times into the feed valves.

Images