Pipeline system
By designing the inclined drainage pipeline and gas-liquid separation device in the pipeline system, combined with pure water flushing, the problems of chemical residues and volatilization and reflux are solved, and the cleanliness of the wafer surface is achieved.
Patent Information
- Application Number
- CN202421970046.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-14
- Publication Date
- 2025-07-22
- Estimated Expiration
- 2034-08-14
AI Technical Summary
During wet etching, chemicals remain in the drainage pipeline and evaporate backflow into the process chamber, causing the environment of the process chamber to deteriorate and affect the cleanliness of the wafer surface.
A pipeline system is designed, including a liquid discharge pipeline and a gas-liquid separation device. Through an inclined branch liquid discharge pipeline and main liquid pipeline, combined with a pure water flushing system, the rapid discharge of liquid and timely discharge of gas is achieved to avoid reflux.
It effectively avoids the residual accumulation and volatility of chemicals in the drainage pipeline, maintains the cleanliness of the process chamber, and reduces wafer surface particle defects.
Smart Images
Figure CN223140727U_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the field of semiconductor manufacturing technology, and particularly relates to a pipeline system. Background Art
[0002] During the wet etching process of a wafer, high-temperature and high-concentration chemicals are used to etch the wafer. Referring to Figure 1 , since there is a horizontally arranged pipeline in the drain pipeline 20, part of the chemicals discharged from the process chamber 10 may remain in the discharge pipeline 20. When the chemicals have strong volatility, for example, when the chemicals are liquids such as HCl, TMAH, NH4OH, H2SO4, etc., the chemicals remaining in the discharge pipeline may return to the process chamber through volatilization, resulting in a deterioration of the process chamber environment, and further increasing the particle defects on the wafer surface and affecting the cleanliness of the wafer surface.
[0003] Therefore, it is necessary to develop a drain system to avoid the residual accumulation of chemicals in the drain pipeline. Summary of the Utility Model
[0004] The purpose of the present application is to provide a pipeline system for liquid discharge in a process chamber, to avoid the accumulation of liquid in the pipeline system and the volatilization and backflow of the liquid into the process chamber.
[0005] The present application provides a pipeline system for liquid discharge in a process chamber, including: a drain pipeline, the first end of the drain pipeline is communicated with at least one waste discharge port of the process chamber; and a gas-liquid separation device, the gas-liquid separation device includes a separation chamber, the separation chamber is provided with a first liquid inlet, an exhaust port and a liquid discharge port, the first liquid inlet is communicated with the second end of the drain pipeline; the exhaust port is used to connect to an exhaust system; and the liquid discharge port is used to connect to a waste liquid treatment system.
[0006] In some embodiments, the pipeline system further includes a pure water flushing system, the pure water flushing system is communicated with the separation chamber for introducing pure water into the separation chamber; and the separation chamber is further provided with a second liquid inlet for communicating with the pure water flushing system.
[0007] In some embodiments, the drain pipeline includes: a branch drain pipeline, the first end of the branch drain pipeline is communicated with the at least one waste discharge port; and a main drain pipeline, the first end of the main drain pipeline is communicated with the second end of the branch drain pipeline, the second end of the main drain pipeline is communicated with the first liquid inlet, and the branch drain pipeline is inclined.
[0008] In some embodiments, a valve body is provided on the main liquid pipeline.
[0009] In some embodiments, the pipeline system further includes a controller, which is connected to the valve body and used to control the opening and closing of the valve body.
[0010] In some embodiments, the pipeline system includes a plurality of branch drain pipelines. The first ends of the plurality of branch drain pipelines are respectively communicated with a plurality of waste discharge ports of the process chamber, and the second ends of the plurality of branch drain pipelines are respectively communicated with the first end of the main drain pipeline.
[0011] In some embodiments, the first liquid inlet is arranged on the side wall of the separation chamber, the exhaust port is arranged on the top wall of the separation chamber, and the drain port is arranged on the bottom wall of the separation chamber.
[0012] In some embodiments, the material of the inner wall of the separation chamber includes polytetrafluoroethylene.
[0013] The beneficial effects of the pipeline system provided by this application include but are not limited to the following:
[0014] The pipeline system provided by this application includes a drain pipeline and a gas-liquid separation device. After the liquid in the process chamber enters the gas-liquid separation device through the drain pipeline, the liquid is discharged from the drain port, and the gas volatilized from the liquid is discharged from the exhaust port by the exhaust system. The gas volatilized from the liquid can be discharged from the pipeline system through the exhaust port in time, avoiding the volatilized gas flowing back into the process chamber and causing pollution to the process chamber.
[0015] The drain pipeline provided by this application includes a branch drain pipeline and a main liquid pipeline. The branch drain pipeline is inclined, so that the liquid can quickly flow into the main liquid pipeline from the branch drain pipeline under the action of gravity, avoiding stagnation in the branch drain pipeline.
[0016] In addition, the pipeline system provided by this application is also provided with a pure water flushing system. The pure water flushing system is communicated with the gas-liquid separation device and used to introduce flushing water into the gas-liquid separation device, so that the liquid discharged from the process chamber can be quickly discharged after entering the gas-liquid separation device, and the gas-liquid separation device after discharging the liquid can be flushed. Description of the Drawings
[0017] The following drawings detail the exemplary embodiments disclosed in this application. Wherein the same reference numerals represent similar structures in several views of the drawings. Those of ordinary skill in the art will understand that these embodiments are non-limiting, exemplary embodiments. The drawings are only for the purpose of illustration and description, and are not intended to limit the scope of this application. Embodiments in other ways may also achieve the inventive intent in this application. It should be understood that the drawings are not drawn to scale.
[0018] Wherein:
[0019] Figure 1 A schematic structural diagram of a liquid discharge pipeline; and
[0020] Figure 2 A schematic structural diagram of a pipeline system according to some embodiments of the present application. Detailed implementation manners
[0021] The following description provides specific application scenarios and requirements of the present application, aiming to enable those skilled in the art to manufacture and use the content of the present application. For those skilled in the art, various partial modifications to the disclosed embodiments are obvious, and without departing from the spirit and scope of the present application, the general principles defined here can be applied to other embodiments and applications. Therefore, the present application is not limited to the illustrated embodiments, but has the broadest scope consistent with the claims.
[0022] The present application provides a pipeline system for liquid discharge in a process chamber, including: a liquid discharge pipeline, the first end of the liquid discharge pipeline is communicated with at least one waste discharge port of the process chamber; and a gas-liquid separation device, the gas-liquid separation device includes a separation chamber, the separation chamber is provided with a first liquid inlet, an exhaust port and a liquid discharge port, the first liquid inlet is communicated with the second end of the liquid discharge pipeline; the exhaust port is used to connect to an exhaust system; and the liquid discharge port is used to connect to a waste liquid treatment system.
[0023] The pipeline system provided by the present application includes a liquid discharge pipeline and a gas-liquid separation device. After the liquid in the process chamber enters the gas-liquid separation device through the liquid discharge pipeline, the liquid is discharged from the liquid discharge port, and the gas volatilized from the liquid is discharged from the exhaust port by the exhaust system. The gas volatilized from the liquid can be discharged from the pipeline system through the exhaust port in time, avoiding the volatilized gas from flowing back into the process chamber and causing pollution to the process chamber.
[0024] The pipeline system provided by the present application will be described in detail below in combination with specific embodiments and drawings.
[0025] Refer to Figure 2 , the present application provides a pipeline system for liquid discharge in a process chamber 100.
[0026] The process chamber 100 may be a process chamber 100 for wet etching of wafers, or may be other process chambers 100 that generate liquid in the process.
[0027] The process chamber 100 is provided with at least one waste discharge port 101 for discharging the liquid generated during the process from the process chamber 100. Generally, the number of the waste discharge ports 101 is multiple, and the multiple waste discharge ports 101 are evenly distributed to ensure that all the liquid in the process chamber 100 can be discharged from the process chamber 100 without residue. Unless otherwise specified, the height of the process chamber 100 is generally higher than that of the pipeline system, so that the liquid in the process chamber 100 can enter the pipeline system under the action of gravity.
[0028] The pipeline system includes a liquid discharge pipeline 200 and a gas-liquid separation device 300.
[0029] The first end of the liquid discharge pipeline 200 is communicated with the waste discharge port 101, and the second end of the liquid discharge pipeline 200 is communicated with the gas-liquid separation device 300.
[0030] In some embodiments, the liquid discharge pipeline 200 includes a branch liquid discharge pipeline 201 and a main liquid pipeline 202.
[0031] The first end of the branch liquid discharge pipeline 201 is communicated with the waste discharge port 101, and the branch liquid discharge pipeline 201 is communicated with the main liquid pipeline 202. The number of the branch liquid discharge pipelines 201 matches the number of the waste discharge ports 101. In some embodiments, the number of the branch liquid discharge pipelines 201 is multiple, the first ends of the multiple branch liquid discharge pipelines 201 are respectively communicated with the multiple waste discharge ports 101 of the process chamber 100, and the second ends of the multiple branch liquid discharge pipelines 201 are respectively communicated with the first end of the main liquid pipeline 202.
[0032] The first end of the main liquid pipeline 202 is communicated with the branch liquid discharge pipeline 201, and the second end of the main liquid pipeline 202 is communicated with the gas-liquid separation device 300. The liquid flows into the branch liquid discharge pipeline 201 through the waste discharge port 101 and then converges into the main liquid pipeline 202, and is then transported by the main liquid pipeline 202 to the gas-liquid separation device 300.
[0033] In order to avoid the liquid from staying when converging from the branch liquid discharge pipeline 201 to the main liquid pipeline 202, the branch liquid discharge pipeline 201 is inclined, that is, the branch liquid discharge pipeline 201 is not horizontally arranged. Compared with connecting the branch liquid discharge pipeline 201 to the main liquid pipeline 202 through a horizontally arranged pipeline, setting the branch liquid discharge pipeline 201 inclined enables the liquid to quickly flow into the main liquid pipeline 202 under the action of gravity and avoids accumulation in the branch liquid discharge pipeline 201.
[0034] In some embodiments, a valve body 202a is provided on the main liquid pipeline 202. When it is necessary to discharge the liquid from the process chamber 100, that is, at the start of the process, the valve body 202a opens. After a first set time period elapses after the liquid discharge ends, the valve body 202a closes. It should be noted that the end of the liquid discharge means that the process is completed and the chemical liquid is no longer used. The duration of the first set time period can be set according to the flow rate of the liquid, as long as it is ensured that before the valve body 202a closes, the liquid in the branch liquid discharge pipeline 201 and the main liquid pipeline 202 has been completely discharged into the gas-liquid separation device 300. In some embodiments, the first set time period can be 3 to 5 seconds. By providing the valve body 202a and controlling the opening and closing of the valve body 202a, it is possible to prevent the liquid in the branch liquid discharge pipeline 201 or the main liquid pipeline 202 from volatilizing and flowing back into the process chamber 100, thus deteriorating the environment in the process chamber 100.
[0035] In some embodiments, the valve body 202a is a pneumatic valve.
[0036] In some embodiments, the pipeline system provided in the present application further includes a controller 202b. The controller 202b is connected to the valve body 202a and is used to control the opening and closing of the valve body 202a. When it is necessary to discharge the liquid from the process chamber 100, the controller 202b controls the valve body 202a to open. After the liquid discharge ends and the first set time period elapses, the controller 202b controls the valve body 202a to close.
[0037] In some embodiments, the pipeline system provided in the present application further includes a pure water flushing system 400. The pure water flushing system 400 is communicated with the gas-liquid separation device 300 and is used to introduce flushing water into the gas-liquid separation device 300. The flushing water can be tap water, filtered water or deionized water. When it is necessary to discharge the liquid from the process chamber 100, the pure water flushing system 400 opens, so that the liquid discharged from the process chamber 100 can be quickly discharged after entering the gas-liquid separation device 300, and the gas-liquid separation device 300 after the liquid discharge is flushed. The pure water flushing system 400 can close after a second set time period elapses after the liquid discharge ends, or can remain in an always-open state. The second set time period can be 3 to 5 seconds.
[0038] The gas-liquid separation device 300 includes a separation chamber 301. The separation chamber 301 is provided with a first liquid inlet 301a, a second liquid inlet 301b, an exhaust port 301c and a liquid discharge port 301d.
[0039] In some embodiments, the material of the separation chamber 301 includes polytetrafluoroethylene to prevent the liquid from corroding the separation chamber 301.
[0040] In some embodiments, the shape of the separation chamber 301 is rectangular parallelepiped. In other embodiments, the separator chamber can also be cylindrical or other irregular shapes.
[0041] The first liquid inlet 301a is communicated with the second end of the main liquid pipeline 202, and the liquid enters the separation chamber 301 through the first liquid inlet 301a. In some embodiments, the first liquid inlet 301a is arranged on the side wall of the separation chamber 301.
[0042] The second liquid inlet 301b is communicated with the pure water flushing system 400. In some embodiments, the second liquid inlet 301b is on the top wall of the separation chamber 301.
[0043] The exhaust port 301c is used to connect to an exhaust system (not shown in the figure). In some embodiments, the exhaust port 301c is arranged on the top wall of the separation chamber 301. The exhaust system is the exhaust system of the factory utilities, and the exhaust system is in an always-on state to evacuate the gas volatilized from the liquid from the separation chamber 301 at any time.
[0044] The liquid discharge port 301d is used to connect to a waste liquid treatment system. In some embodiments, the liquid discharge port 301d is arranged on the bottom wall of the separation chamber 301. After the liquid enters the separation chamber 301, it is discharged to the waste liquid treatment system of the factory utilities through the liquid discharge port 301d.
[0045] In some embodiments, the working process of the pipeline system provided by the present application is as follows:
[0046] When the process starts, the valve body 202a opens, and the liquid in the process chamber 100 flows into the separation chamber 301 through the first discharge pipeline and the second discharge pipeline. The gas volatilized from the liquid is evacuated from the separation chamber 301 through the exhaust port 301c by the exhaust system of the factory utilities. The un-volatilized liquid is discharged into the waste liquid treatment system of the factory utilities through the liquid discharge port 301d. During this period, the pure water flushing system 400 remains open. When the process ends, after a delay of five seconds, the valve body 202a is closed. At this time, the liquid has been completely discharged from the first discharge pipeline and the second discharge pipeline into the return chamber. After a further delay of five seconds, the pure water flushing system 400 is closed. At this time, the liquid has been completely discharged from the separation chamber 301.
[0047] The beneficial effects of the pipeline system provided by the present application include but are not limited to the following:
[0048] The pipeline system provided by this application includes a liquid discharge pipeline and a gas-liquid separation device. After the liquid in the process chamber enters the gas-liquid separation device through the liquid discharge pipeline, the liquid is discharged from the liquid discharge port, and the gas volatilized from the liquid is discharged by the exhaust air system through the exhaust port. The gas volatilized from the liquid can be discharged from the pipeline system through the exhaust port in a timely manner, avoiding the backflow of the volatilized gas into the process chamber and causing pollution to the process chamber, etc.
[0049] The liquid discharge pipeline provided by this application includes a branch liquid discharge pipeline and a main liquid pipeline. The branch liquid discharge pipeline is inclined so that the liquid can quickly flow into the main liquid pipeline from the branch liquid discharge pipeline under the action of gravity, avoiding stagnation in the branch liquid discharge pipeline.
[0050] In addition, the pipeline system provided by this application is also provided with a pure water flushing system. The pure water flushing system is connected to the gas-liquid separation device and is used to introduce flushing water into the gas-liquid separation device, which can quickly discharge the liquid discharged from the process chamber after entering the gas-liquid separation device and flush the gas-liquid separation device after the liquid is discharged.
[0051] It should be noted that the beneficial effects that may be produced by different embodiments are different. In different embodiments, the beneficial effects that may be produced can be any one or several combinations of the above, or any other beneficial effects that may be obtained.
[0052] The basic concepts have been described above. Obviously, for those skilled in the art, the above detailed disclosure is only an example and does not constitute a limitation to this specification. Although not explicitly stated here, those skilled in the art may make various modifications, improvements, and corrections to this application. Such modifications, improvements, and corrections are proposed in this specification, so such modifications, improvements, and corrections still fall within the spirit and scope of the exemplary embodiments of this application.
[0053] It should be noted that in the description of this application, unless otherwise clearly specified and limited, the terms "installation", "connection", "connection", and "fixation" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or integrated; it can be a mechanical connection or an electrical connection; it can be a rotational connection or a sliding connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the communication inside two components or the interaction relationship between two components. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood in combination with specific situations.
[0054] In addition, when terms such as "first", "second", and "third" are used in the specification of the present application to describe various features, these terms are only used to distinguish these features and should not be construed as indicating or implying the relevance, relative importance, or implicitly indicating the number of the indicated features among the features.
[0055] In addition, the specification of the present application describes exemplary embodiments by referring to idealized exemplary cross-sectional views and / or plan views and / or three-dimensional views. Therefore, differences from the illustrated shapes due to, for example, manufacturing techniques and / or tolerances are foreseeable. Therefore, the exemplary embodiments should not be construed as being limited to the shapes of the regions shown herein, but should include deviations in the shapes caused by, for example, manufacturing. Therefore, the regions shown in the figures are substantially schematic, and their shapes are not intended to show the actual shape of the regions of the device nor to limit the scope of the exemplary embodiments.
[0056] Meanwhile, the present application uses specific words to describe the embodiments of this specification. For example, "an embodiment", "one embodiment", and / or "some embodiments" mean a certain feature, structure, or characteristic related to at least one embodiment of the present application. Therefore, it should be emphasized and noted that the "one embodiment" or "an embodiment" or "an alternative embodiment" mentioned twice or more at different positions in the present application does not necessarily refer to the same embodiment. In addition, certain features, structures, or characteristics in one or more embodiments of the present application can be appropriately combined.
[0057] Similarly, it should be noted that, in order to simplify the expression of the disclosure of the present application and thus help the understanding of one or more embodiments of the invention, in the foregoing description of the embodiments of the present application, sometimes multiple features are grouped into one embodiment, drawing, or description thereof. However, this disclosure method does not mean that the features required by the subject matter of the present application are more than those mentioned in the claims. In fact, the features of the embodiments are less than all the features of the individual embodiments disclosed above.
[0058] Finally, it should be understood that the embodiments described in the present application are only used to illustrate the principles of the embodiments of the present application. Other variations may also fall within the scope of the present application. Therefore, by way of example and not limitation, alternative configurations of the embodiments of the present application can be considered to be consistent with the teachings of the present application. Accordingly, the embodiments of the present application are not limited to the embodiments explicitly introduced and described in the present application.
Claims
1. A pipeline system for liquid discharge in a process chamber, characterized in that, Comprising: A drain pipe, the first end of the drain pipe being in communication with at least one waste discharge port of the process chamber; And A gas-liquid separation device, the gas-liquid separation device comprising a separation chamber, the separation chamber being provided with a first liquid inlet, an exhaust port and a liquid discharge port, the first liquid inlet being in communication with the second end of the drain pipe; the exhaust port being used for connecting to an exhaust system; and the liquid discharge port being used for connecting to a waste liquid treatment system.
2. The pipeline system according to claim 1, characterized in that, It further comprises a pure water flushing system, the pure water flushing system being in communication with the separation chamber for introducing pure water into the separation chamber; and the separation chamber is further provided with a second liquid inlet for being in communication with the pure water flushing system.
3. The pipeline system according to claim 1, characterized in that, The drain pipe comprises: A branch drain pipe, the first end of the branch drain pipe being in communication with the at least one waste discharge port; and A main drain pipe, the first end of the main drain pipe being in communication with the second end of the branch drain pipe, the second end of the main drain pipe being in communication with the first liquid inlet, and the branch drain pipe being inclined.
4. The pipeline system according to claim 3, characterized in that, A valve body is provided on the main drain pipe.
5. The pipeline system according to claim 4, characterized in that, It further comprises a controller, the controller being connected to the valve body for controlling the opening and closing of the valve body.
6. The pipeline system according to claim 5, characterized in that, It includes a plurality of branch drain pipes, the first ends of the plurality of branch drain pipes being respectively in communication with a plurality of waste discharge ports of the process chamber, and the second ends of the plurality of branch drain pipes being respectively in communication with the first end of the main drain pipe.
7. The pipeline system according to claim 1, characterized in that, The first liquid inlet is provided on the side wall of the separation chamber, the exhaust port is provided on the top wall of the separation chamber, and the liquid discharge port is provided on the bottom wall of the separation chamber.
8. The pipeline system according to claim 1, characterized in that, The material of the inner wall of the separation chamber comprises polytetrafluoroethylene.