Circulating type silicon wafer surface cleaning machine

Abstract

The utility model discloses a circulating type silicon wafer surface cleaning machine which comprises a shell, a feeding pipe is communicated and fixed to the bottom of the side face of the shell, a circulating spraying assembly communicated with the feeding pipe is arranged on one side of the shell, a connecting column is fixedly connected to the inner wall of one side of the shell, a sliding groove is formed in the connecting column, and the sliding groove is communicated with the feeding pipe. Fixing blocks are movably connected into the sliding grooves, a filtering plate is fixedly connected between the fixing blocks, the filtering plate makes contact with the feeding pipe, fixing rods are fixedly connected to the outer wall of one side of the connecting column, a sliding frame is movably connected between the fixing rods, and the outer sides of the fixing rods are sleeved with first springs; the two ends of the first spring are fixed to the connecting column and the sliding frame correspondingly. According to the silicon wafer cleaning device, silicon wafers can be cleaned more cleanly through the filter plate, meanwhile, the filter plate can be detached conveniently, a worker can clean and replace the filter plate conveniently, and the worker can take the filter plate conveniently through a second spring.

Description

Technical Field

[0001] The utility model relates to the technical field of silicon wafer cleaning, in particular to a circulating silicon wafer surface cleaning machine. Background Art

[0002] Since silicon is one of the most abundant elements in the earth's crust, for products such as solar cells that are destined to enter the large-scale market, the advantage of reserves is also one of the reasons why silicon has become the main material for photovoltaics.

[0003] Impurities will exist in silicon wafers after production, and some are attached to the surface of silicon wafers in the form of thin films or particles. These contaminations may cause various defects, so they need to be cleaned. When cleaning silicon wafers, since the cleaning liquid is recycled, it is easy for some particles to return to the surface of the silicon wafers again, thus affecting the cleaning effect. Content of the Utility Model

[0004] The purpose of the utility model is to solve the defects existing in the prior art, and a circulating silicon wafer surface cleaning machine is proposed.

[0005] In order to achieve the above purpose, the utility model adopts the following technical scheme:

[0006] A circulating silicon wafer surface cleaning machine, including a housing. A feed pipe is fixedly connected and communicated at the bottom of the side surface of the housing. A circulating spraying assembly communicated with the feed pipe is arranged on one side of the housing. A connecting column is fixedly connected to the inner wall of one side of the housing. A chute is opened in the connecting column. A fixing block is movably connected in the chute. A filter plate is fixedly connected between the fixing blocks, and the filter plate is in contact with the feed pipe. A fixing rod is fixedly connected to the outer wall of one side of the connecting column. A sliding frame is movably connected between the fixing rods. A first spring is sleeved outside the fixing rod, and both ends of the first spring are fixed to the connecting column and the sliding frame respectively. An insertion port is opened in the fixing block, and the sliding frame passes through the connecting column and is inserted into the insertion port.

[0007] As a further scheme of the utility model, the circulating spraying assembly includes a water pump, and the water pump is fixed to the outer wall of one side of the housing by bolts. Two brackets are fixedly connected to the outer wall of one side of the housing. A connecting pipe is connected between the two brackets. A discharge pipe is fixedly connected and communicated at the top of the side surface of the housing. One end of the discharge pipe passes through the housing and is fixedly connected and communicated with a spraying frame.

[0008] As a further scheme of the utility model, both ends of the feed pipe are communicated with the connecting pipe and the discharge pipe respectively.

[0009] As a further scheme of the utility model, a slider is movably connected in the chute, and the slider is in contact with the fixing block.

[0010] As a further solution of the utility model, a second spring is fixedly connected to the bottom of the slider, and the second spring is fixed to the bottom of the chute.

[0011] As a further solution of the utility model, a telescopic rod is fixedly connected to the bottom of the slider, and the bottom end of the telescopic rod is fixed to the bottom of the chute, and the second spring is sleeved outside the telescopic rod.

[0012] As a further solution of the utility model, a pull handle is fixedly connected to one side of the carriage.

[0013] As a further solution of the utility model, a plurality of spaced-apart placement racks are fixedly connected to the inner wall of the housing.

[0014] The beneficial effects of the utility model are as follows:

[0015] 1. Through the setting of the filter plate, impurities in the recycled cleaning liquid are filtered, so that the silicon wafers are cleaned more cleanly. At the same time, the staff can disassemble the filter plate, which is convenient for subsequent cleaning and replacement, and the operation is simple, improving the cleaning effect of the device.

[0016] 2. In the utility model, the second spring can make the fixed block move upward by rebounding, which is convenient for the staff to take the filter plate, improving the convenience of the device.

[0017] 3. In the utility model, the fixed rod can guide the carriage, enabling it to move stably, so that the carriage can be quickly and accurately inserted into the socket, avoiding the need for repeated adjustment of the position due to the inclination of the carriage, and improving the guiding effect of the device. Description of the Drawings

[0018] Figure 1 It is a front-side three-dimensional structural schematic diagram of the circulating silicon wafer surface cleaning machine proposed by the utility model;

[0019] Figure 2 It is a rear-side three-dimensional structural schematic diagram of the circulating silicon wafer surface cleaning machine proposed by the utility model;

[0020] Figure 3 It is a partial enlarged structural schematic diagram of the circulating silicon wafer surface cleaning machine proposed by the utility model;

[0021] Figure 4 It is a slider assembly structural schematic diagram of the circulating silicon wafer surface cleaning machine proposed by the utility model.

[0022] In the figure: 1. water pump; 2. bracket; 3. connecting pipe; 4. discharge pipe; 5. shell; 6. connecting column; 7. feed pipe; 8. filter plate; 9. slide; 10. first spring; 11. fixing rod; 12. slide; 13. second spring; 14. telescopic rod; 15. slider; 16. fixing block; 17. socket; 18. spray rack. DETAILED DESCRIPTION

[0023] It should be noted that the terms "first", "second", etc. in the specification and claims of this application and the above-mentioned drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequence, so that the embodiments of the application described here, based on the embodiments in this application, all other embodiments obtained by ordinary technicians in this field without making creative work should fall within the scope of protection of this application.

[0024] Reference Figures 1-4 The circulating silicon wafer surface cleaning machine comprises a shell 5, a feed pipe 7 is connected and fixed to the bottom of the side of the shell 5, a circulating spraying assembly connected to the feed pipe 7 is provided on one side of the shell 5, a connecting column 6 is fixed to the inner wall of one side of the shell 5 by bolts, a slide groove 9 is provided inside the connecting column 6, a fixing block 16 is slidably connected in the slide groove 9, a filter plate 8 is fixed between the fixing blocks 16 by bolts, and the filter plate 8 is in contact with the feed pipe 7, a fixing rod 11 is fixed to the outer wall of one side of the connecting column 6 by bolts, a slide 12 is slidably connected between the fixing rods 11, and the fixing rod 11 can guide the slide 12, To enable it to move stably, a first spring 10 is sleeved on the outer side of the fixing rod 11, and the two ends of the first spring 10 are respectively fixed to the connecting column 6 and the slide 12, a socket 17 is opened inside the fixing block 16, and the slide 12 passes through the connecting column 6 and is inserted into the socket 17, and the slide 12 is pulled to move outward along the fixing rod 11, and the first spring 10 is extended until the slide 12 moves out of the socket 17, at which time the fixing block 16 loses its restriction, and then the staff pulls the filter plate 8 until the fixing block 16 is completely out of the slide groove 9, thereby completing the disassembly of the filter plate 8, which is convenient for subsequent cleaning.

[0025] In the present utility model, it should be noted that the circulating spraying assembly includes a water pump 1, which is fixed to one side outer wall of a shell 5 by bolts. Two brackets 2 are fixed to one side outer wall of the shell 5 by bolts. A connecting pipe 3 is connected between the two brackets 2. A discharge pipe 4 is connected and fixed to the top of the side of the shell 5. One end of the discharge pipe 4 passes through the shell 5 and is connected and fixed to a spray rack 18. The water pump 1 is started to extract the cleaning liquid of the shell 5 and enter the connecting pipe 3 through the feeding pipe 7. At this time, the filter plate 8 filters the impurities in the cleaning liquid, and then the filtered cleaning liquid enters the discharge pipe 4 through the connecting pipe 3, and then is sprayed onto the silicon wafer through the spray rack 18, so that the silicon wafer is rinsed. The two ends of the feeding pipe 7 are respectively connected to the connecting pipe 3 and the discharge pipe 4. The inside of the slide 9 is slidably connected with a slider 15, and the slider 15 is connected to the fixed block 16. The second spring 13 is welded to the bottom of the slider 15, and the second spring 13 is fixed to the bottom of the slide 9. The bottom of the slider 15 is fixed with a telescopic rod 14 by bolts, and the bottom end of the telescopic rod 14 is fixed to the bottom of the slide 9. The telescopic rod 14 can guide the slider 15 so that it can move up and down stably. The second spring 13 is sleeved on the outside of the telescopic rod 14, and the fixed block 16 loses its restriction. The second spring 13 rebounds and stretches, so that the slider 15 pushes the fixed block 16 to move upward along the slide 9, which is convenient for the staff to take the filter plate 8. A handle is bonded to one side of the slide 12, and a plurality of spaced placement racks are fixed on the inner wall of the shell 5 by bolts. The cleaning liquid flows back into the bottom of the shell 5 through the gaps between the placement racks, so that the device filters and pumps water again, and the cycle is repeated, so that the silicon wafers are efficiently rinsed.

[0026] Working principle: when it is necessary to clean the silicon wafers on the placement rack, first start the water pump 1 to extract the cleaning liquid from the shell 5 and allow it to enter the connecting pipe 3 through the feed pipe 7. At this time, the filter plate 8 filters the impurities in the cleaning liquid, and then the filtered cleaning liquid enters the discharge pipe 4 through the connecting pipe 3, and then is sprayed onto the silicon wafers through the spray rack 18, thereby flushing the silicon wafers. When it is necessary to disassemble and clean the filter plate 8, pull the slide 12 to move it outward along the fixed rod 11, and the first spring 10 extends until the slide 12 moves out of the socket 17. At this time, the fixed block 16 loses its restriction, and the second spring 13 rebounds and extends, so that the slider 15 pushes the fixed block 16 to move upward along the slide groove 9, and then the staff pulls the filter plate 8 until the fixed block 16 is completely out of the slide groove 9, thereby completing the disassembly of the filter plate 8, which is convenient for subsequent cleaning.

[0027] The present utility model has been described through the above embodiments. Those skilled in the art can understand that the present utility model is not limited to the above embodiments, and more modifications can be made according to the teachings of the present utility model. All these modifications fall within the scope of protection required by the present utility model. The scope of protection of the present utility model is defined by the appended claims and their equivalent scope.

Claims

1. Circulating silicon wafer surface cleaning machine, including a housing (5), characterized in that, A feed pipe (7) is fixedly connected and communicated at the bottom of the side surface of the housing (5). A circulating spraying assembly communicated with the feed pipe (7) is arranged on one side of the housing (5). A connecting column (6) is fixedly connected to the inner wall of one side of the housing (5). A chute (9) is arranged inside the connecting column (6). A fixing block (16) is movably connected in the chute (9). A filter plate (8) is fixedly connected between the fixing blocks (16). The filter plate (8) is in contact with the feed pipe (7). A fixing rod (11) is fixedly connected to the outer wall of one side of the connecting column (6). A sliding frame (12) is movably connected between the fixing rods (11). A first spring (10) is sleeved outside the fixing rod (11). The two ends of the first spring (10) are respectively fixed to the connecting column (6) and the sliding frame (12). A socket (17) is arranged inside the fixing block (16). The sliding frame (12) passes through the connecting column (6) and is inserted into the socket (17).

2. The cyclic silicon wafer surface cleaning machine according to claim 1, characterized in that The circulating spraying assembly includes a water pump (1). The water pump (1) is fixedly installed on the outer wall of one side of the housing (5) by bolts. Two brackets (2) are fixedly connected to the outer wall of one side of the housing (5). A connecting pipe (3) is connected between the two brackets (2). A discharge pipe (4) is fixedly connected and communicated at the top of the side surface of the housing (5). One end of the discharge pipe (4) passes through the housing (5) and is fixedly connected to a spraying rack (18).

3. The cyclic silicon wafer surface cleaning machine according to claim 2, characterized in that, The two ends of the feed pipe (7) are respectively communicated with the connecting pipe (3) and the discharge pipe (4).

4. The cyclic silicon wafer surface cleaning machine according to claim 1, characterized in that, A slider (15) is movably connected inside the chute (9). The slider (15) is in contact with the fixing block (16).

5. The cyclic silicon wafer surface cleaning machine according to claim 4, characterized in that, A second spring (13) is fixedly connected to the bottom of the slider (15). The second spring (13) is fixed to the bottom of the chute (9).

6. The cyclic silicon wafer surface cleaning machine according to claim 5, wherein, A telescopic rod (14) is fixedly connected to the bottom of the slider (15). The bottom end of the telescopic rod (14) is fixed to the bottom of the chute (9). The second spring (13) is sleeved outside the telescopic rod (14).

7. The cyclic silicon wafer surface cleaning machine according to claim 1, characterized in that, A pull handle is fixedly connected to one side of the sliding frame (12).

8. The cyclic silicon wafer surface cleaning machine according to claim 1, characterized in that, A plurality of spaced-apart placement racks are fixedly connected to the inner wall of the housing (5).

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