Universal type alkaline washing machine for broken silicon wafers
By designing a general alkaline washing machine for crushed silicon wafers and using a mechanized stirrer and rotary baffle for silicon wafer cleaning, the high cost problem caused by manual cleaning in photovoltaic module production is solved, and efficient and automated cleaning is achieved.
Patent Information
- Application Number
- CN202422236277.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-09-12
- Publication Date
- 2025-07-25
- Estimated Expiration
- 2034-09-12
AI Technical Summary
The cleaning of unqualified silicon wafers in the production of photovoltaic modules mainly relies on manual operations, resulting in large labor consumption and increased production costs.
A general alkaline washing machine for crushed silicon wafers is designed, using a mechanized stirrer and a rotating baffle for automatic cleaning, instead of manual operation, and cleaning of residual alkali in combination with spray pipes.
It improves silicon wafer cleaning efficiency, reduces labor demand and reduces production costs.
Smart Images
Figure CN223145452U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of caustic washing machine equipment, in particular to a general-purpose caustic washing machine for broken silicon wafers. Background Technique
[0002] The prospect of the photovoltaic power generation industry is very broad. With the continuous maturity of technology and the exertion of scale effect, the cost of photovoltaic power generation is constantly decreasing. The efficiency of solar cells is continuously increasing, and the manufacturing and installation costs of photovoltaic power generation equipment are also gradually decreasing.
[0003] At present, during the production process of photovoltaic modules, some silicon wafers that do not meet the requirements will be generated. These silicon wafers will undergo a series of treatments such as pickling / caustic washing and finally be put into the furnace for use again. Currently, during the cleaning process of silicon wafers, they are mainly operated by manual cleaning. However, a large amount of labor is consumed during the operation, which is not conducive to saving production costs. Content of the Utility Model
[0004] The purpose of the utility model is to provide a general-purpose caustic washing machine for broken silicon wafers, which uses the caustic washing machine to replace the manual cleaning method of silicon wafers to improve the actual production efficiency and solve the problems raised in the above background technique.
[0005] To achieve the above purpose, the utility model provides the following technical solutions:
[0006] A general-purpose caustic washing machine for broken silicon wafers includes a frame and a stirring bin. The stirring bin is arranged inside the frame. An upper through hole is arranged above the stirring bin. A feeding port and a discharge sieve are respectively arranged on both sides of the stirring bin. A matching clamping part is arranged at the connection position between the stirring bin and the feeding port, and a matching gear disk is arranged on the right side of the feeding port. A driving motor is arranged below the frame. A matching rotating shaft is arranged at the output end of the driving motor. The upper part of the matching rotating shaft corresponds to the position of the matching gear disk, and the two are connected by a conveyor belt in cooperation. A limiting disk is arranged on the left side of the matching gear disk. An auxiliary disk is arranged on the left side of the limiting disk. The limiting disk is arranged in cooperation with a limiting rotating wheel. The limiting rotating wheel is clamped and installed on a fixing frame. The fixing frame is installed above the frame, and a lower tray is arranged in cooperation on the left side of the fixing frame. The lower tray is arranged below the feeding port.
[0007] As a further scheme of the utility model: A cleaning water tank is arranged below the stirring bin. The water tank includes an output pipe, a transition water tank and an observation window. The output pipe is arranged at the outermost side of the water tank. The transition water tank is arranged inside the output pipe. A liquid control valve is arranged in cooperation on the outside of the transition water tank, and the liquid control valve is arranged on the outside of the frame. The observation window 103 is arranged above the liquid control valve 5.
[0008] As a further solution of the present utility model: The stirring bin includes an outer protective shell, a rotating bin and rotating baffles. The outer protective shell is arranged on the outer side of the stirring bin. The rotating bin is arranged inside the outer protective shell. The rotating bin is connected to a mating gear disk, and a plurality of uniformly distributed rotating baffles are arranged inside the rotating bin.
[0009] As a further solution of the present utility model: An auxiliary frame is arranged above the discharge sieve.
[0010] Compared with the prior art, the beneficial effects of the present utility model are as follows: This device can realize mechanized silicon wafer cleaning operations. By using the automatic stirring and cleaning method of the stirring bin, the silicon wafers are cleaned, replacing the previous manual silicon wafer processing work form, effectively improving the actual work efficiency; in addition, the relevant parameters inside this device are controllable, and the use state of the device can be adjusted according to the actual situation, so as to adapt to the silicon wafer cleaning tasks of the alkali washing machine under different conditions. BRIEF DESCRIPTION OF THE DRAWINGS
[0011] Figure 1 is the three-dimensional structure diagram of the present utility model;
[0012] Figure 2 is the cross-sectional structure diagram of the present utility model;
[0013] Figure 3 is the partial enlarged view of part A of the present utility model;
[0014] Figure 4 is the structure diagram of the stirring bin component of the present utility model.
[0015] In the figure: 1, frame; 2, auxiliary frame; 3, discharge sieve; 4, upper through hole; 5, liquid control valve; 6, drive motor; 7, mating rotating shaft; 8, stirring bin; 9, mating gear disk; 10, limit disk; 11, feed inlet; 12, fixing frame; 13, limit rotating wheel; 14, auxiliary disk; 15, lower tray; 101, output pipe; 102, transition water tank; 103, observation window; 201, outer protective shell; 202, rotating bin; 203, rotating baffle. DETAILED DESCRIPTION OF THE EMBODIMENTS
[0016] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described in conjunction with the drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present utility model.
[0017] Embodiment 1
[0018] Please refer to Figures 1-4, this embodiment provides a general-purpose alkaline washing machine for broken silicon wafers, including a frame 1 and a stirring bin 8. The stirring bin 8 is arranged inside the frame 1. There is an upper through-hole 4 above the stirring bin 8. An inlet 11 and a discharge sieve 3 are respectively arranged on both sides of the stirring bin 8. A matching clamping part is arranged at the connection position between the stirring bin 8 and the inlet 11, and a matching gear disk 9 is arranged on the right side of the inlet 11. A driving motor 6 is arranged below the frame 1. A matching rotating shaft 7 is arranged at the output end of the driving motor 6. The upper part of the matching rotating shaft 7 corresponds to the position of the matching gear disk 9, and the two are connected in cooperation through a conveyor belt. A limiting disk 10 is arranged on the left side of the matching gear disk 9. An auxiliary disk 14 is arranged on the left side of the limiting disk 10. The limiting disk 10 is arranged in cooperation with a limiting rotating wheel 13. The limiting rotating wheel 13 is snap-fitted on a fixed frame 12. The fixed frame 12 is installed above the frame 1, and a lower tray 15 is arranged in cooperation on the left side of the fixed frame 12. The lower tray 15 is arranged below the inlet 11.
[0019] Further, a cleaning water tank is arranged below the stirring bin 8. The water tank includes an output pipe 101, a transition water tank 102 and an observation window 103. The output pipe 101 is arranged at the outermost side of the water tank. The transition water tank 102 is arranged inside the output pipe 101. A liquid control valve 5 is arranged in cooperation on the outside of the transition water tank 102, and the liquid control valve 5 is arranged on the outside of the frame 1. The observation window 103 is arranged above the liquid control valve 5. During the working process inside the stirring bin 8, relevant solutions can be added to the cleaning water tank through a water inlet valve inside the device. The specific volume of the solution inside the cleaning water tank can be observed through the observation window 103, so as to adjust it in real time. After the cleaning is completed, the solution inside the cleaning water tank is discharged through the liquid control valve 5.
[0020] Still further, the stirring bin 8 includes an outer protective shell 201, a rotating bin 202 and rotating baffles 203. The outer protective shell 201 is arranged on the outside of the stirring bin 8. The rotating bin 202 is arranged inside the outer protective shell 201. The rotating bin 202 is connected to the matching gear disk 9, and a plurality of uniformly distributed rotating baffles 203 are arranged inside the rotating bin 202.
[0021] Still further, an auxiliary frame 2 is arranged above the discharge sieve 3. Workers can install corresponding collection components on the auxiliary frame 2 to collect the processed silicon wafers.
[0022] During the operation of the device, the unqualified silicon wafers generated in the production of photovoltaic modules fall into the interior of the alkali washer. The material is conveyed forward through the rotating baffle 203. While being conveyed, as the rotating bin 202 rotates, the material keeps turning in the rotating bin 202, so as to achieve cleaning the material without dead angles of 360°. At the position of the discharge sieve 3, an independent spray pipe is provided to spray residual alkali on the material.
[0023] It should be noted that in this article, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "comprise", "include" or any other variant thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements not only includes those elements, but also includes other elements not expressly listed, or further includes elements inherent to such process, method, article or device. Without more limitations. The element defined by the statement "including one..." does not exclude the existence of additional identical elements in the process, method, article or device including the said element.
[0024] In the present utility model, unless otherwise clearly stipulated and defined, terms such as "installation", "setting", "connection", "fixation", "swivel connection" and the like shall be understood in a broad sense. For example, it may be a fixed connection, a detachable connection, or integrated; it may be a mechanical connection or an electrical connection; it may be directly connected or indirectly connected through an intermediate medium, and it may be the communication inside two elements or the interaction relationship between two elements. Unless otherwise clearly defined, for those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.
[0025] Although the embodiments of the present utility model have been shown and described, for those of ordinary skill in the art, it can be understood that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principle and spirit of the present utility model. The scope of the present utility model is defined by the appended claims and their equivalents.
Claims
1. A general-purpose alkali washing machine for broken silicon wafers, characterized in that, It includes a frame (1) and a mixing bin (8). The mixing bin (8) is arranged inside the frame (1). An upper through-hole (4) is provided above the mixing bin (8). A feeding port (11) and a discharge sieve (3) are respectively arranged on both sides of the mixing bin (8). A mating clamping part is arranged at the connection position between the mixing bin (8) and the feeding port (11), and a mating gear disk (9) is arranged on the right side of the feeding port (11). A driving motor (6) is arranged below the frame (1). A mating rotating shaft (7) is arranged at the output end of the driving motor (6). The upper part of the mating rotating shaft (7) corresponds to the position of the mating gear disk (9), and the two are connected in cooperation through a conveyor belt. A limiting disk (10) is arranged on the left side of the mating gear disk (9). An auxiliary disk (14) is arranged on the left side of the limiting disk (10). The limiting disk (10) is arranged in cooperation with a limiting rotating wheel (13). The limiting rotating wheel (13) is snap-fitted on a fixing frame (12). The fixing frame (12) is installed above the frame (1), and a lower tray (15) is arranged in cooperation on the left side of the fixing frame (12). The lower tray (15) is arranged below the feeding port (11).
2. The general-purpose alkaline washing machine for broken silicon wafers according to claim 1, characterized in that, A cleaning water tank is arranged below the mixing bin (8). The water tank includes an output pipe (101), a transition water tank (102) and an observation window (103). The output pipe (101) is arranged at the outermost side of the water tank. The transition water tank (102) is arranged inside the output pipe (101). A liquid control valve (5) is arranged in cooperation on the outer side of the transition water tank (102), and the liquid control valve (5) is arranged on the outer side of the frame (1). The observation window (103) is arranged above the liquid control valve (5).
3. A general-purpose alkaline washing machine for broken silicon wafers according to claim 1, characterized in that, The mixing bin (8) includes an outer protective shell (201), a rotating bin (202) and rotating baffles (203). The outer protective shell (201) is arranged on the outer side of the mixing bin (8). The rotating bin (202) is arranged inside the outer protective shell (201). The rotating bin (202) is connected to the mating gear disk (9), and a plurality of uniformly distributed rotating baffles (203) are arranged inside the rotating bin (202).
4. The general-purpose alkaline washer for broken silicon wafers according to claim 3, characterized in that, An auxiliary frame (2) is arranged above the discharge sieve (3).