Multi-channel gas mixing device and semiconductor equipment

Abstract

The utility model discloses a multi-channel gas mixing device and semiconductor equipment. The multi-channel gas mixing device comprises a gas mixing main body, a plurality of gas channels and a gas outlet channel, a gas mixing cavity is formed in the gas mixing main body; the plurality of gas channels are formed in the gas mixing main body and are distributed around the center of the gas mixing main body, one end of each gas channel is a gas inlet end, and the other end of each gas channel is communicated with the gas mixing cavity and faces the center of the gas mixing cavity; one end of the gas outlet channel communicates with the gas mixing cavity, and the other end of the gas outlet channel is a gas outlet end. According to the utility model, the problem that different types of gases are not uniformly mixed is effectively solved; when gas passes through the multi-channel gas mixing device disclosed by the utility model, gas hedging can be carried out, so that different gases can be fully mixed in the gas mixing cavity and then flow into the next link through the gas outlet channel.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductors, and particularly relates to a multi-channel gas mixing device and a semiconductor device. Background Art

[0002] At present, in the semiconductor device manufacturing process, various types of processing gases are required. Different processing gases have multiple usage conditions. Sometimes a single gas needs to enter the reaction chamber, and sometimes multiple gases need to be fully mixed before entering the reaction chamber. Therefore, a structure that can fully mix gases and can simultaneously meet the function of controlling the on / off of the gases is needed.

[0003] The prior art has been able to achieve a structure in which gases are fully mixed and then enter the reaction chamber, but currently, it can only achieve the function of mixing two gases in one structure, and there is a phenomenon of uneven gas mixing during the gas mixing process. Summary of the Utility Model

[0004] The purpose of the utility model is to provide a multi-channel gas mixing device and a semiconductor device, aiming to solve the problem of uneven mixing of multiple gases in the existing gas mixing device.

[0005] To solve the above technical problems, the purpose of the utility model is achieved through the following technical solutions: A multi-channel gas mixing device is provided, including:

[0006] A gas mixing main body with a gas mixing chamber inside;

[0007] Multiple gas channels are opened inside the gas mixing main body and are distributed around the center of the gas mixing main body. One end of each of the multiple gas channels is an air inlet end, and the other end of each of the multiple gas channels is communicated with the gas mixing chamber and faces the center of the gas mixing chamber;

[0008] An air outlet channel, one end of which is communicated with the gas mixing chamber and the other end is an air outlet end.

[0009] Further, the multi-channel gas mixing device further includes:

[0010] Multiple control valves are arranged around the outer periphery of the gas mixing main body;

[0011] The multiple control valves are respectively connected to the multiple gas channels, and the multiple control valves are respectively used to control the on / off of the multiple gas channels.

[0012] Further, the gas channel includes:

[0013] An air inlet channel, one end of which is an air inlet end and the other end is connected to the corresponding control valve;

[0014] A gas mixing channel, one end of which is connected to the corresponding control valve and the other end is connected to the gas mixing chamber.

[0015] Further, the multiple gas channels are of equal length, and the distribution shape of the multiple gas channels forms a polygon.

[0016] Further, the distribution shape of the multiple gas channels is a hexagon.

[0017] Further, the gas mixing chamber is located at the bottom within the gas mixing main body;

[0018] One ends of the multiple gas channels are located at the top of the gas mixing main body;

[0019] The other end of the gas outlet channel extends out of the top of the gas mixing main body.

[0020] Further, a groove is formed in the bottom of the gas mixing main body, and a sealing plate is provided at the bottom of the gas mixing main body. The sealing plate is used to encapsulate the groove to form the gas mixing chamber.

[0021] Further, a heating element for heating the gas channels is provided within the gas mixing main body.

[0022] Further, a heating groove is formed inwardly at the top of the gas mixing main body; the heating element is inserted into the heating groove.

[0023] An embodiment of the present invention further provides a semiconductor device, which includes: the multi-channel gas mixing device as described above.

[0024] The beneficial effects of the embodiment of the present invention are as follows: effectively solving the problem of uneven gas mixing of different types of gases; when the gas passes through the multi-channel gas mixing device of the present invention, gas counterflow can occur, so that different gases can be fully mixed within the gas mixing chamber and then flow into the next link through the gas outlet channel.

[0025] The embodiment of the present invention can control whether the gas enters the gas mixing chamber through a control valve, and independently control the opening and closing of multiple gas channels through multiple control valves, so as to realize the rapid switching of multiple gases or a single gas into the gas mixing chamber to meet different process requirements. Description of the Drawings

[0026] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following will briefly introduce the drawings required for the description of the embodiments. Obviously, the following drawings are some embodiments of the present invention. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts.

[0027] Figure 1 It is a schematic diagram of the overall structure of the multi-channel gas mixing device provided by the embodiment of the present invention;

[0028] Figure 2Schematic cross-sectional structure diagram of the multi-channel gas mixing device provided by the embodiment of the present utility model;

[0029] Figure 3 Schematic three-dimensional structure diagram of the gas mixing main body provided by the embodiment of the present utility model;

[0030] Figure 4 Schematic structure diagram of the gas mixing main body from the first cross-sectional perspective provided by the embodiment of the present utility model;

[0031] Figure 5 Schematic structure diagram of the gas mixing main body from the second cross-sectional perspective provided by the embodiment of the present utility model.

[0032] Explanation of the markings in the figure:

[0033] 1. Gas mixing main body; 11. Gas mixing chamber; 12. Sealing plate; 13. Heating groove;

[0034] 2. Gas channel; 21. Intake channel; 22. Gas mixing channel; 23. Intake joint;

[0035] 3. Outlet channel;

[0036] 4. Control valve. Specific implementation manners

[0037] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are part of the embodiments of the present utility model, rather than all the embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present utility model.

[0038] It should be understood that when used in this specification and the appended claims, the terms "comprises" and "comprising" indicate the presence of the described features, wholes, steps, operations, elements, and / or components, but do not preclude the presence or addition of one or more other features, wholes, steps, operations, elements, components, and / or their combinations.

[0039] It should also be understood that the terms used in this specification of the present utility model are only for the purpose of describing specific embodiments and are not intended to limit the present utility model. As used in this specification of the present utility model and the appended claims, unless the context clearly indicates otherwise, the singular forms "a", "an", and "the" are intended to include the plural forms.

[0040] It should be further understood that the term "and / or" used in this specification of the present utility model and the appended claims refers to any combination and all possible combinations of one or more of the associated listed items, and includes these combinations.

[0041] Please refer to Figures 1 to 4 Figures 1 to 4 , an embodiment of the present utility model provides a multi-channel gas mixing device and a semiconductor device. The multi-channel gas mixing device includes: a gas mixing main body 1, a plurality of gas channels 2 and an air outlet channel 3; a gas mixing cavity 11 is provided inside the gas mixing main body 1; the plurality of gas channels 2 are opened inside the gas mixing main body 1 and are distributed around the center of the gas mixing main body 1, one end of each of the plurality of gas channels 2 is an air inlet end, and the other end of each of the plurality of gas channels 2 communicates with the gas mixing cavity 11 and faces the center of the gas mixing cavity 11; one end of the air outlet channel 3 communicates with the gas mixing cavity 11, and the other end of the air outlet channel 3 is an air outlet end.

[0042] In this embodiment, air inlet joints 23 are externally connected to the air inlet ends of the plurality of gas channels 2 respectively for externally connecting different gas sources. A variety of gases enter the gas mixing cavity 11 through the plurality of gas channels 2 respectively for mixing. During this mixing process, based on the distribution design of the plurality of gas channels 2 around the center of the gas mixing main body 1 and the design that the other ends of the plurality of gas channels 2 face the center of the gas mixing cavity 11, it can be ensured that a variety of gases are in gas counterflow after entering the gas mixing cavity 11, so that a variety of gases can be fully mixed in the gas mixing cavity 11 and then flow into the next link through the air outlet channel 3. The problem of uneven mixing of different types of gases is effectively solved, and a variety of gases are more evenly mixed during the gas mixing process.

[0043] In one embodiment, the multi-channel gas mixing device further includes a plurality of control valves 4, and the plurality of control valves 4 are arranged around the outer periphery of the gas mixing main body 1; the plurality of control valves 4 are respectively connected to the plurality of gas channels 2, and the plurality of control valves 4 are respectively used to control the on-off of the plurality of gas channels 2.

[0044] In this embodiment, the control valve 4 can be used to control whether the gas enters the gas mixing cavity 11. The plurality of control valves 4 independently control the on-off of the plurality of gas channels 2, so as to realize the rapid switching of a variety of gases or a single gas into the gas mixing cavity 11 to meet different process requirements.

[0045] Specifically, the overall shape of the gas mixing main body 1 can be columnar, and a plurality of mounting planes can be arranged on the outer periphery of the gas mixing main body 1; the plurality of control valves 4 are circumferentially mounted on the outer peripheral planes of the gas mixing main body 1; the plurality of control valves 4 are respectively connected to the plurality of gas channels 2 and are used to control the on-off of the plurality of gas channels 2, that is, one control valve 4 is connected to one gas channel 2 to realize the independent control of each gas channel 2. In this way, the number and type of gas channels 2 entering the gas mixing cavity 11 can be controlled, and the rapid switching of a variety of gases or a single gas into the gas mixing cavity 11 can be realized to meet different process requirements.

[0046] In one embodiment, each gas passage 2 includes an intake passage 21 and a gas mixing passage 22. One end of the intake passage 21 is the intake end, and the other end of the intake passage 21 is connected to the corresponding control valve 4; one end of the gas mixing passage 22 is connected to the corresponding control valve 4, and the other end of the gas mixing passage 22 is connected to the gas mixing chamber 11.

[0047] In this embodiment, to ensure that the control valve 4 can well control the on-off of the gas passage 2, the gas passage 2 is segmented into the intake passage 21 and the gas mixing passage 22. The two ends of the intake passage 21 are respectively communicated with the top and the outer peripheral plane of the gas mixing main body 1, and the two ends of the gas mixing passage 22 are respectively communicated with the outer peripheral plane of the gas mixing main body 1 and the gas mixing chamber 11; thus, by installing the control valve 4 on the outer peripheral plane of the gas mixing passage 2, it can be connected to both the intake passage 21 and the gas mixing passage 22 at the same time as the connection structure between the intake passage 21 and the gas mixing passage 22, thereby realizing the control of the on-off between the intake passage 21 and the gas mixing passage 22, that is, realizing the control of the on-off of the gas passage 2.

[0048] In one embodiment, the gas mixing chamber 11 is located at the bottom inside the gas mixing main body 1; one ends of a plurality of gas passages 2 are located at the top of the gas mixing main body 1; the other end of the air outlet passage 3 extends out of the top of the gas mixing main body 1.

[0049] In this embodiment, the gas enters one end of the gas passage 2 from the top of the gas mixing main body 1, passes through the corresponding control valve 4 and then enters the gas mixing chamber 11 from the other end of the gas passage 2. A variety of gases are mixed by impact in the gas mixing chamber 11 and then output through the air outlet passage 3 towards the top of the gas mixing main body 1. In this process, the entering direction of the gas is opposite to the output direction after mixing, which helps to improve the mixing effect of a variety of gases.

[0050] More specifically, a plurality of gas passages 2 are arranged to be of equal length, so that each path of gas can better perform impact when entering the gas mixing chamber 11, increasing the mixing efficiency.

[0051] In one embodiment, the distribution shape of a plurality of gas passages 2 forms a polygon. Preferably, the distribution shape of a plurality of gas passages 2 is a hexagon.

[0052] Taking the hexagon in this embodiment as an example, correspondingly, the outer peripheral plane of the gas mixing main body 1 can include six planes and enclose to form a hexagon. The six gas passages 2 are all independent passages, and each can enter the gas mixing chamber 11 separately through the corresponding control valve 4.

[0053] It should be noted that the distribution shape of a plurality of gas passages 2 is not limited to a hexagon, and may also be other polygon shapes.

[0054] In one embodiment, a groove is formed at the bottom of the gas mixing main body 1, and a sealing plate 12 is provided at the bottom of the gas mixing main body 1. The sealing plate 12 is used to seal the groove to form the gas mixing chamber 11.

[0055] In this embodiment, the shape of the groove can be hemispherical, and the sealing plate 12 can be hermetically installed at the bottom of the gas mixing main body 1 by means of a sealing flange or the like, so as to seal the groove to form a closed hemispherical gas mixing cavity 11; after various gases enter the gas mixing cavity 11 and are mixed, the hemispherical inner wall of the gas mixing cavity 11 can enable the mixed gas to better enter the air outlet channel 3 along the inner wall and flow from the air outlet channel 3 to the next process.

[0056] In one embodiment, a heating member (not shown in the figure) for heating the gas channel 2 is provided in the gas mixing main body 1.

[0057] In this embodiment, by heating the gas mixing main body 1 through the heating member, the temperature of the gas channel 2 in the gas mixing main body 1 can be raised, that is, the gas can be heated when it enters the gas channel 2 to meet the process requirements that need heating.

[0058] Combined Figure 5 As shown, in one embodiment, a heating groove 13 is formed inwardly at the top of the gas mixing main body 1; the heating member is inserted into the heating groove 13.

[0059] In this embodiment, the shape of the heating groove 13 is the same as that of the heating member, and both can be rod-shaped, that is, the heating member can be a heating rod and is inserted into the heating groove 13, so as to realize heating of the gas mixing main body 1.

[0060] Specifically, a heating groove 13 can be formed inwardly at the top of the gas mixing main body 1, and the number of the heating grooves 13 can be multiple, and the specific number can be set according to actual needs.

[0061] Preferably, two heating grooves 13 are vertically formed downward at the top of the gas mixing main body 1, and the two heating grooves 13 are symmetrically distributed with the air outlet channel 3 as the center, and two heating members are respectively inserted into the two heating grooves 13 to realize the heating function.

[0062] The embodiment of the present invention also provides a semiconductor device, which includes the multi-channel gas mixing device as described above.

[0063] The above is only the specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Any person skilled in the art within the technical scope disclosed by the present invention can easily think of various equivalent modifications or substitutions, and these modifications or substitutions should all be covered within the protection scope of the present invention. Therefore, the protection scope of the present invention should be subject to the protection scope of the claims.

Claims

1. A multi-channel gas mixing device, characterized in that, Comprising: A gas mixing main body with a gas mixing chamber provided inside; A plurality of gas channels are opened inside the gas mixing main body and distributed around the center of the gas mixing main body. One end of each of the plurality of gas channels is an air inlet end, and the other end of each of the plurality of gas channels communicates with the gas mixing chamber and faces the center of the gas mixing chamber; An air outlet channel, one end of which communicates with the gas mixing chamber and the other end is an air outlet end.

2. The multi-channel gas mixing device according to claim 1, characterized in that, It further comprises: A plurality of control valves are arranged around the outer periphery of the gas mixing main body; The plurality of control valves are respectively connected to the plurality of gas channels, and the plurality of control valves are respectively used to control the on-off of the plurality of gas channels.

3. The multi-channel gas mixing device according to claim 2, characterized in that, The gas channel comprises: An air inlet channel, one end of which is an air inlet end and the other end is connected to the corresponding control valve; A gas mixing channel, one end of which is connected to the corresponding control valve and the other end is connected to the gas mixing chamber.

4. The multi-channel gas mixing device according to claim 1 or 2, characterized in that, The plurality of gas channels are arranged to be of equal length, and the distribution shape of the plurality of gas channels forms a polygon.

5. The multi-channel gas mixing device according to claim 1 or 2, characterized in that The distribution shape of the plurality of gas channels is a hexagon.

6. The multi-channel gas mixing device according to claim 1 or 2, characterized in that, The gas mixing chamber is located at the bottom inside the gas mixing main body; One end of the plurality of gas channels is located at the top of the gas mixing main body; The other end of the air outlet channel extends out of the top of the gas mixing main body.

7. The multi-channel gas mixing device according to claim 6, wherein A groove is opened at the bottom of the gas mixing main body, and a sealing plate is provided at the bottom of the gas mixing main body. The sealing plate is used to seal the groove to form the gas mixing chamber.

8. The multi-channel gas mixing device according to claim 1 or 2, characterized in that, A heating element for heating the gas channel is provided inside the gas mixing main body.

9. The multi-channel gas mixing device according to claim 8, characterized in that, A heating groove is opened inward at the top of the gas mixing main body; the heating element is inserted into the heating groove.

10. A semiconductor device, characterized in that, Comprising the multi-channel gas mixing device according to any one of claims 1 to 9.

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