Magnetron sputtering equipment

Abstract

The utility model relates to magnetron sputtering equipment which comprises a shell, a sliding rail, a sliding block, a C-shaped insulating part and a magnetron, the shell is provided with a film coating cavity, the sliding rail is arranged in the film coating cavity, and the sliding block is connected to one side of the sliding rail in a sliding mode; the C-shaped insulating part is located on the side, away from the sliding rail, of the sliding block and bends and extends along the edge of the sliding block to form a first installation groove, the sliding block is fixed in the first installation groove, and the magnetron is fixed to the side, away from the sliding block, of the C-shaped insulating part. According to the magnetron sputtering equipment, the C-shaped insulating part is connected with the sliding rail, the sliding block is connected with the sliding rail in a sliding mode, the C-shaped insulating part, the sliding block and the sliding rail are matched with one another, the magnetron is fixed to the C-shaped insulating part, when the sliding block runs along the sliding rail, the magnetron can move together with the C-shaped insulating plate through the sliding block, and therefore the magnetron is fixed to the C-shaped insulating part. Through the cooperation of the shell, the sliding rail, the sliding block and the C-shaped insulating part structure, the magnetron is not prone to falling off from the sliding rail, the situation that the magnetron falls off can be effectively avoided, and the stability of the magnetron in the movement process can be improved.

Description

Technical Field

[0001] The utility model relates to the field of magnetron sputtering, in particular to a magnetron sputtering device. Background Art

[0002] Magnetron sputtering is a commonly used physical vapor deposition method. It offers numerous advantages, including low deposition temperature, fast deposition rate, highly uniform deposited thin films, and compositions close to those of the target material. As a highly efficient thin-film deposition technology, magnetron sputtering is widely used in vacuum coating applications such as semiconductors and photovoltaics. Magnetron sputtering utilizes the interaction of electric and magnetic fields. Electrons, accelerated by the electric field, collide with argon atoms as they fly toward the substrate, ionizing a large number of argon ions and electrons. The electrons then fly toward the substrate. The argon ions, accelerated by the electric field, bombard the target, sputtering a large number of target atoms and ions, which are deposited on the substrate to form a film. Driven by a lead screw, the magnetron moves back and forth at high speed in the X and Y directions. The high-speed vibration can cause screws to loosen. Existing magnetron sputtering equipment primarily uses screw locks, which are not suitable for vacuum clean environments and can easily cause the magnetron to fall off, hindering its high-speed motion. Utility Model Content

[0003] Based on this, it is necessary to provide a magnetron sputtering device that can improve the stability of the magnetron during movement.

[0004] A magnetron sputtering device includes a shell, a slide rail, a slider, a C-shaped insulating member and a magnetron, the shell is provided with a coating cavity, the slide rail is arranged in the coating cavity, and the slider is slidably connected to one side of the slide rail; the C-shaped insulating member is located on the side of the slider away from the slide rail and is bent and extended along the edge of the slider to form a first mounting groove, the slider is fixed in the first mounting groove, and the magnetron is fixed on the side of the C-shaped insulating member away from the slider.

[0005] In the magnetron sputtering equipment provided in the present application, a slide rail is arranged in a coating chamber, a slider is slidably connected to one side of the slide rail, a C-shaped insulating part is located on the side of the slider away from the slide rail and is bent and extended along the edge of the slider to form a first mounting groove, the slider is fixed to the first mounting groove, the C-shaped insulating part is connected to the slide rail, and the slider and the slide rail are slidably connected, so that the C-shaped insulating part, the slider and the slide rail cooperate with each other, and the magnetron is fixed to the C-shaped insulating part. When the slider runs along the slide rail, the magnetron can move together with the slider and the C-shaped insulating plate. The structural coordination between the shell, slide rail, slider and C-shaped insulating part can make the magnetron not easy to fall off the slide rail, which can effectively avoid the magnetron from falling off and improve the stability of the magnetron during movement.

[0006] In one embodiment, the wall surface of the first installation groove includes a groove bottom wall, a groove side wall and a groove top wall. The surface of the slider on the side away from the slide rail is in contact with the groove bottom wall, the side wall of the slider is in contact with the groove side wall, and the edge of the surface of the slider on the side close to the slide rail is in contact with the groove top wall.

[0007] In one embodiment, the C-shaped insulating member and the slider are fixed by a first fastening member. The C-shaped insulating member is provided with a first through hole that communicates with both sides of the C-shaped insulating member facing and away from the slider. The slider is provided with a first installation hole, and the first fastening member passes through the first through hole and is fixed in the first installation hole.

[0008] In one embodiment, an insulating backing plate is provided between the C-shaped insulating member and the magnetron, and the insulating backing plate covers the first fastening member.

[0009] In one embodiment, a second installation groove is formed on the side of the C-shaped insulating member away from the slider. The first through hole is opened in the second installation groove. The insulating backing plate is arranged in the second installation groove. In the depth direction of the second installation groove, the insulating backing plate has a moving space of 0.1 mm to 0.5 mm in the second installation groove, and the magnetron covers the second installation groove.

[0010] In one embodiment, the first through hole includes a first through hole section and a second through hole section that are connected. The first installation hole is a threaded blind hole. The first through hole section is farther away from the slider than the second through hole section and has a radial dimension larger than that of the second through hole section. The first fastening member includes a first screw. The first screw penetrates from the first through hole section into the second through hole section and is fixed in the first installation hole. A lock washer is provided between the nut of the first screw and the bottom of the first through hole section.

[0011] In one embodiment, the C-shaped insulating member and the magnetron are fixed by a second fastening member. The C-shaped insulating member is provided with a second through hole, and the magnetron is provided with a second installation hole. The second fastening member passes through the second through hole and is fixed in the second installation hole. An insulating set screw is also fixed in the second through hole, and the insulating set screw is located on the side of the second fastening member away from the second installation hole.

[0012] In one embodiment, the end face of the insulating set screw is flush with the surface of the C-shaped insulating member on the side away from the magnetron component.

[0013] In one embodiment, the second through hole includes a third through hole section and a fourth through hole section that are connected and communicate with each other. The second mounting hole is a threaded blind hole. The third through hole section is farther from the magnetron than the fourth through hole section and has a radial dimension larger than that of the fourth through hole section. The second fastener includes a second screw. The second screw sequentially passes through the third through hole section and the fourth through hole section and is fixed in the second mounting hole. The nut of the second screw is located in the third through hole section, and a lock washer is provided between the nut of the second screw and the bottom of the third through hole section.

[0014] In one embodiment, an X-axis driving member and a Y-axis driving member are provided in the coating cavity. The Y-axis driving member is connected to the coating cavity. The X-axis driving member includes the slide rail and the slider. The slide rail is connected to the Y-axis driving member. A target and a substrate to be coated are provided in the coating cavity, and the target is disposed adjacent to the magnetron. Description of the Drawings

[0015] The following further describes the present invention in conjunction with the drawings and embodiments, where:

[0016] Figure 1 is a first schematic diagram of a magnetron sputtering device provided by an embodiment of the present application;

[0017] Figure 2 is a cross-sectional view of a magnetron sputtering device provided by an embodiment of the present application;

[0018] Figure 3 is Figure 2 an enlarged view of the circled area in the schematic diagram of the magnetron sputtering device;

[0019] Figure 4 is a second schematic diagram of a magnetron sputtering device provided by an embodiment of the present application.

[0020] Reference Numerals: Magnetron Sputtering Device 10; Housing 20; Coating Cavity 21; X-Axis Driving Member 211; Y-Axis Driving Member 212; Slide Rail 30; Slider 40; First Mounting Hole 41; C-Type Insulating Member 50; First Mounting Groove 51; Bottom Wall of the Groove 511; Side Wall of the Groove 512; Top Wall of the Groove 513; Second Mounting Groove 52; First Through Hole 53; First Through Hole Section 531; Second Through Hole Section 532; Second Through Hole 54; Third Through Hole Section 541; Fourth Through Hole Section 542; Insulating Set Screw 540; Magnetron 60; Second Mounting Hole 61; First Fastener 71; First Screw 710; Insulating Pad 72; Second Fastener 73; Second Screw 730; Lock Washer 80 Detailed Embodiments

[0021] In order to make the above objects, features, and advantages of the present utility model more obvious and understandable, the following will describe the specific embodiments of the present utility model in detail with reference to the accompanying drawings. Many specific details are set forth in the following description to facilitate a full understanding of the present utility model. However, the present utility model can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without departing from the connotation of the present utility model. Therefore, the present utility model is not limited by the specific embodiments disclosed below.

[0022] In the description of the present utility model, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings. It is only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, it should not be construed as a limitation to the present utility model.

[0023] In the present utility model, unless otherwise clearly specified and defined, the terms "installation", "connection", "connection", "fixation", etc. should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or integrated; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium. It can be the communication inside two elements or the interaction relationship between two elements, unless otherwise clearly defined. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.

[0024] In the present utility model, unless otherwise clearly specified and defined, the first feature being "above" or "below" the second feature can be that the first and second features are in direct contact, or the first and second features are indirectly in contact through an intermediate medium. Moreover, the first feature being "above", "over", and "on" the second feature can be that the first feature is directly above or obliquely above the second feature, or merely indicates that the first feature has a higher horizontal height than the second feature. The first feature being "below", "under", and "beneath" the second feature can be that the first feature is directly below or obliquely below the second feature, or merely indicates that the first feature has a lower horizontal height than the second feature.

[0025] As an efficient thin film deposition technology, magnetron sputtering coating is widely used in vacuum coating industries such as semiconductors and photovoltaics. In magnetron sputtering coating, through the interaction of electric and magnetic fields, electrons collide with argon atoms during the process of accelerating towards the substrate under the action of the electric field, ionizing a large number of argon ions and electrons, and the electrons fly towards the substrate. The argon ions are accelerated by the electric field to bombard the target, sputtering out a large number of target atoms and ions, which are deposited on the substrate to form a film. However, the magnetron 60 moves back and forth at high speed in the X and Y directions driven by the lead screw, and the screws will become loose due to high-speed vibration. Since the target is charged with high voltage and there is a low-vacuum environment formed by the cavity, the target, and the cavity cover, and the distance between the magnetron 60 and the target is very small, arc discharge will occur, making the magnetron 60 also charged. Therefore, the magnetron 60 needs to be insulated from other components. During the magnetron sputtering process, an inert gas is first introduced into the vacuum chamber. When a high-voltage electric field acts on the gas, argon gas is ionized to form a plasma, which consists of positively charged ions and free electrons. The high-energy argon ions in the plasma impact the surface of the target under the acceleration of the electric field, causing the target atoms to be sputtered out. These sputtered atoms are then deposited on the substrate, forming the required thin film layer by layer. In existing magnetron sputtering equipment, the main methods for preventing screw loosening include double-nut butting and locking, split pin and slotted nut, stop washer, series steel spot welding, riveting, bonding, etc. These methods are not suitable for the vacuum clean environment and the structure is not compact. When the screws of the magnetron 60 become loose, it is easy to cause loosening between the insulating plate and the guide rail, resulting in various impact hazards.

[0026] Reference Figure 1 、 Figure 2 、 Figure 3 and Figure 4 To solve the above problems, an embodiment of the present application provides a magnetron sputtering device 10, including a housing 20, a slide rail 30, a slider 40, a C-shaped insulating member 50, and a magnetron 60. The housing 20 is provided with a coating cavity 21, the slide rail 30 is disposed in the coating cavity 21, and the slider 40 is slidably connected to one side of the slide rail 30; the C-shaped insulating member 50 is located on the side of the slider 40 away from the slide rail 30 and bends and extends along the edge of the slider 40 to form a first installation groove 51. The slider 40 is fixed in the first installation groove 51, and the magnetron 60 is fixed on the side of the C-shaped insulating member 50 away from the slider 40.

[0027] The magnetron sputtering device 10 includes a housing 20, a slide rail 30, a slider 40, a C-shaped insulator 50, and a magnetron 60. The housing 20 is provided with a coating chamber 21. Coating is one of the most important processes in the semiconductor and optical industries. A certain metal or non-metal is deposited on the surface of a material in the form of a gas phase to form a dense thin film. The quality of the coating is crucial to the functional formation of semiconductor devices. The materials can be metal materials, semiconductor materials, and compound materials such as oxides and fluorides. Magnetron sputtering coating is an advanced physical vapor deposition technology. Its core lies in utilizing the sputtering effect to transfer target atoms to the surface of the substrate to form a thin film. The sputtering effect refers to the phenomenon that when high-energy ions hit the solid surface, atoms on the surface of the target material are knocked out and scattered. The slider 40 is slidably connected to the slide rail 30, and the C-shaped insulating member 50 is located on the side of the slider 40 away from the slide rail 30. The C-shaped insulating member 50 is bent and extended along the edge of the slider 40 to form a first mounting groove 51. The slider 40 is in contact with the C-shaped insulating member 50, and the slider 40 is fixed in the first mounting groove 51. The C-shaped insulating member 50 can be tightly connected to the slider 40 and the slide rail 30. The magnetron 60 is fixed on the side of the C-shaped insulating member 50 away from the slider 40. The magnetron 60 is an electric vacuum device used to generate microwave energy. The coating chamber 21 is equipped with an X-axis drive 211 and a Y-axis drive 212. The Y-axis drive 212 is connected to the coating chamber 21. The X-axis drive 211 includes a slide 30 and a slider 40. A magnetron 60 is movable relative to the Y-axis drive 212. The slide 30 is connected to the Y-axis drive 212. The coating chamber contains a target and a substrate to be coated, with the target positioned adjacent to the magnetron 60. The magnetron 60 is a diode placed in a constant magnetic field. Under the control of the mutually perpendicular constant magnetic field and constant electric field, electrons within the tube interact with a high-frequency electromagnetic field, converting the energy obtained from the constant electric field into microwave energy, thereby generating microwave energy. The magnetron 60 consists of a sealed vacuum tube with a cylindrical central cathode placed within a cylindrical anode. Electrons are attracted to the anode by the electrostatic field. A stable magnetic field along the axis of the vacuum tube causes the electrons to deviate from their radial path, causing them to rotate around the cathode, generating microwave-frequency oscillations. The slider 40 is fixed to the first mounting slot 51, the C-shaped insulating member 50 is connected to the slide rail 30, and the slider 40 and the slide rail 30 are slidably connected, so that the C-shaped insulating member 50, the slider 40, and the slide rail 30 cooperate with each other. The magnetron 60 is fixed to the C-shaped insulating member 50. When the slider 40 moves along the slide rail 30, the magnetron 60 can move together through the slider 40 and the C-shaped insulating plate. The C-shaped insulating plate is in contact with the upper, lower, left, and right edges of the guide rail slider 40. Even if the fasteners connected thereto are loose, the C-shaped insulating plate will not separate from the guide rail slider 40 due to the mechanical structure. The structural coordination between the housing 20, the slide rail 30, the slider 40, and the C-shaped insulating member 50 prevents the magnetron 60 from falling off the slide rail 30, effectively preventing the magnetron 60 from falling off and improving the stability of the magnetron 60 during movement.

[0028] See Figure 2 and Figure 4The walls of the first mounting groove 51 include a bottom wall 511, side walls 512, and a top wall 513. The bottom wall 511 can be horizontal, with the surface of the slider 40 facing away from the slide rail 30 adjoining the bottom wall 511. The side walls 512 can be vertical, with the side walls of the slider 40 adjoining the side walls 512. The top wall 513 can be horizontal, with the edge of the surface of the slider 40 near the slide rail 30 adjoining the top wall 513. The slider 40 can fit tightly into the first mounting groove 51, thereby ensuring a stable and fixed position of the slider 40. This prevents the magnetron 60 from falling off the slider 40 when the slider 40 moves along the slide rail 30, thereby improving stability during movement. The C-shaped insulator 50 and the slider 40 are fixed by a first fastener 71. The first fastener 71 can fasten the C-shaped insulator 50 and the slider 40, ensuring a relatively fixed position between the C-shaped insulator 50 and the slider 40. In some embodiments, the first fastener 71 can be a screw or a pin. The first fastener 71 can be a metal fixing screw. The first fastener 71 is an insulating part. The conductive metal parts can be wrapped with an insulator to prevent the conductive metal parts from contacting or being in a straight line with other non-conductive metal parts. When wrapping the conductive metal parts with an insulator, pay attention to the degree of wrapping. In a vacuum environment, if the wrapping is too complicated, it will be inconvenient to inspect and maintain the screws; if the wrapping is too simple, it is easy to have incomplete insulation. The C-shaped insulating part 50 is provided with a first through hole 53. The first through hole 53 connects the two sides of the C-shaped insulating part 50 facing and away from the slider 40. The C-shaped insulating part 50 is provided with a first through hole 53. The position of the C-shaped insulating plate and the slider 40 can be fixed by fasteners, which is conducive to adjusting the position relationship between the C-shaped insulating plate and the slider 40. The slider 40 defines a first mounting hole 41. A first fastener 71 passes through the first through-hole 53 and is secured within the first mounting hole 41. Specifically, a portion of the first fastener 71 is positioned within the first through-hole 53 of the C-shaped insulating plate, while another portion of the first fastener 71 is positioned within the first mounting hole 41 of the slider 40. The first fastener 71 secures the position of the C-shaped insulating plate relative to the slider 40, maintaining a relative static state between the C-shaped insulating plate and the slider 40. This facilitates movement of the C-shaped insulating plate and the slider 40 relative to the rail 30, improving stability during movement of the C-shaped insulating plate. In some embodiments, the first through-hole 53 includes a first through-hole segment 531 and a second through-hole segment 532. The first through-hole segment 531 is a threaded blind hole. The first through-hole segment 531 is farther from the slider 40 than the second through-hole segment 532 and has a larger radial dimension than the second through-hole segment 532. The first through-hole segment 531 and the second through-hole segment 532 serve to accommodate the first fastener 71, thereby improving internal stability of the magnetron sputtering apparatus 10. Specifically, the first fastener 71 may be placed in the first through-hole section 531 and the second through-hole section 532 .The first fastener 71 includes a first screw 710. The first screw 710 passes through the first through-hole section 531 and into the second through-hole section 532 and is fixed in the first mounting hole 41. The first through-hole section 531 and the second through-hole section 532 can jointly limit the position of the first screw 710, making the position of the first screw 710 relatively fixed, which is beneficial to the stability inside the magnetron sputtering device 10. A lock washer 80 is provided between the nut of the first screw 710 and the bottom of the first through-hole section 531. The lock washer 80 can play a buffering role and at the same time can increase the fit between the first screw 710 and the first mounting hole 41, enabling the first screw 710 to be more stable. When the first screw 710 loosens, the lock washer 80 can also prevent the first screw 710 from moving a large distance due to loosening.

[0029] Refer to Figure 2 and Figure 3, the C-shaped insulating plate is connected to the magnetron 60. The C-shaped insulating member 50 and the magnetron 60 are fixed by a second fastener 73. The C-shaped insulating member 50 is provided with a second through hole 54, and the second through hole 54 has a receiving function. The magnetron 60 is provided with a second mounting hole 61, and the second mounting hole 61 also has a receiving function. The second fastener 73 passes through the second through hole 54 and is fixed in the second mounting hole 61. The second fastener 73 can be placed in the second through hole 54 and the second mounting hole 61. Specifically, the second through hole 54 includes a third through hole section 541 and a fourth through hole section 542 that are connected. The second fastener 73 can be placed in the third through hole section 541 and the fourth through hole section 542 on the C-shaped insulating plate and the second mounting hole 61 of the magnetron 60 at the same time. In this way, the second fastener 73 can relatively fix the positions of the C-shaped insulating plate and the magnetron 60, and further can realize the process of the magnetron 60 moving relative to the slide rail 30 together with the C-shaped insulating plate. In some embodiments, the second mounting hole 61 is a threaded blind hole. The third through hole section 541 is farther from the magnetron 60 than the fourth through hole section 542, and the radial dimension is larger than that of the fourth through hole section 542, which can make the position of the second fastener 73 stable. In some embodiments, the second fastener 73 includes a second screw 730. The second screw 730 sequentially passes through the third through hole section 541 and the fourth through hole section 542 and is fixed in the second mounting hole 61. The third through hole section 541, the fourth through hole section 542 and the second through hole 54 can jointly limit the position of the second screw 730. The nut of the second screw 730 is located in the third through hole section 541. A lock washer 80 is provided between the nut of the second screw 730 and the bottom of the third through hole section 541. The lock washer 80 can play a buffering role, and at the same time can increase the fit between the second screw 730 and the second mounting hole 61, making the second screw 730 more stable. When the second screw 730 loosens, the lock washer 80 can also prevent the second screw 730 from moving a large distance due to loosening. In some embodiments, an insulating set screw 540 is also fixed in the second through hole 54. The insulating set screw 540 is located on the side of the second fastener 73 away from the second mounting hole 61. The end face of the insulating set screw 540 is flush with the surface of the C-shaped insulating member 50 away from the magnetron component. Specifically, after the second fastener 73 is fixed and tightened, an insulating set screw 540 is screwed above it. The insulating set screw 540 can tighten the second fastener 73 to fix the second fastener 73 to prevent it from loosening. When the insulating set screw 540 is in a tightened state, its top end is flush with the C-shaped insulating plate. If the second fastener 73 loosens, the insulating set screw 540 will protrude, which can be easily found during manual cavity maintenance and detection, facilitating the repair and maintenance of the magnetron sputtering device 10.In some embodiments, an insulating pad 72 is provided between the C-shaped insulating plate and the magnetron 60. The insulating pad 72 not only provides insulation but also covers the first fastener 71, thereby stabilizing the position of the first fastener 71. Specifically, the side of the first fastener 71 adjacent to the insulating pad 72 is completely covered by the C-shaped insulating sheet and the insulating pad 72, thereby placing the first fastener 71 within a closed insulating space. In some embodiments, the C-shaped insulating member 50 can be placed within the mounting groove. Specifically, the side of the C-shaped insulating member 50 facing away from the slider 40 forms a second mounting groove 52, the first through hole 53 is provided in the second mounting groove 52, and the insulating pad 72 is disposed within the second mounting groove 52. In the depth direction of the second mounting groove 52, the insulating pad 72 has a movable space of 0.1 mm to 0.5 mm within the second mounting groove 52. Accordingly, even if the first fastener 71 is loose, there is only 0.1 mm to 0.5 mm of movable space, which will not seriously affect the high-speed movement of the magnetron 60, thereby improving the stability of the magnetron 60 during movement.

[0030] The technical features of the above embodiments may be combined arbitrarily. To make the description concise, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0031] The above embodiments merely illustrate several implementations of the present invention. While the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the utility model patent. It should be noted that a person skilled in the art would be able to make numerous variations and improvements without departing from the concept of the present invention, and these variations and improvements fall within the scope of protection of the present invention. Therefore, the scope of protection of the present utility model patent shall be determined by the appended claims.

Claims

1. A magnetron sputtering device, characterized in that, It includes a shell, a slide rail, a slider, a C-shaped insulating part and a magnetron. The shell is provided with a coating cavity, the slide rail is arranged in the coating cavity, and the slider is slidably connected to one side of the slide rail; the C-shaped insulating part is located on the side of the slider away from the slide rail and is bent and extended along the edge of the slider to form a first mounting groove, the slider is fixed in the first mounting groove, and the magnetron is fixed on the side of the C-shaped insulating part away from the slider.

2. The magnetron sputtering device according to claim 1, wherein The wall surface of the first mounting groove includes a groove bottom wall, a groove side wall and a groove top wall. The surface of the slider facing away from the slide rail is connected to the groove bottom wall, the side wall of the slider is connected to the groove side wall, and the surface edge of the slider close to the slide rail is connected to the groove top wall.

3. The magnetron sputtering device according to claim 1, wherein The C-shaped insulating member and the slider are fixed by a first fastener. The C-shaped insulating member is provided with a first through hole. The first through hole connects the two sides of the C-shaped insulating member facing and away from the slider. The slider is provided with a first mounting hole. The first fastener passes through the first through hole and is fixed in the first mounting hole.

4. The magnetron sputtering device according to claim 3, wherein An insulating pad is provided between the C-shaped insulating member and the magnetron, and the insulating pad covers the first fastener.

5. The magnetron sputtering device according to claim 4, characterized in that, A second mounting groove is formed on the side of the C-shaped insulating part facing away from the slider, the first through hole is opened in the second mounting groove, the insulating pad is arranged in the second mounting groove, and in the depth direction of the second mounting groove, the insulating pad has a movable space of 0.1mm to 0.5mm in the second mounting groove, and the magnetron covers the second mounting groove.

6. The magnetron sputtering device according to claim 3, characterized in that, The first through hole includes a first through hole section and a second through hole section that are connected to each other. The first through hole section is a threaded blind hole. The first through hole section is farther away from the slider relative to the second through hole section, and its radial dimension is larger than that of the second through hole section. The first fastener includes a first screw. The first screw passes through the first through hole section into the second through hole section and is fixed in the first mounting hole. An anti-loosening gasket is provided between the nut of the first screw and the bottom of the first through hole section.

7. The magnetron sputtering device according to claim 1, characterized in that, The C-shaped insulating member and the magnetron are fixed by a second fastener. The C-shaped insulating member is provided with a second through hole, and the magnetron is provided with a second mounting hole. The second fastener passes through the second through hole and is fixed in the second mounting hole. An insulating top screw is also fixed in the second through hole. The insulating top screw is located on the side of the second fastener away from the second mounting hole.

8. The magnetron sputtering device according to claim 7, wherein The end surface of the insulating top screw is flush with the surface of the C-shaped insulating member on a side away from the magnetron.

9. The magnetron sputtering device according to claim 7, characterized in that, The second through hole includes a third through hole section and a fourth through hole section that are connected to each other. The second mounting hole is a threaded blind hole. The third through hole section is away from the magnetron relative to the fourth through hole section, and its radial dimension is larger than that of the fourth through hole section. The second fastener includes a second screw. The second screw passes through the third through hole section and the fourth through hole section in sequence and is fixed in the second mounting hole. The nut of the second screw is located in the third through hole section, and an anti-loosening gasket is provided between the nut of the second screw and the bottom of the third through hole section.

10. The magnetron sputtering device according to claim 1, wherein, An X-axis driving member and a Y-axis driving member are provided in the coating cavity. The Y-axis driving member is connected to the coating cavity. The X-axis driving member includes the slide rail and the slider, and the slide rail is connected to the Y-axis driving member. A target and a substrate to be coated are provided in the coating cavity, and the target is disposed adjacent to the magnetron.

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