Plasma generating device

Abstract

The utility model relates to the technical field of vacuum processing, in particular to a plasma generating device which comprises a plasma generating assembly and a sealing assembly, the plasma generating assembly comprises an excitation source, a connecting line, a discharge electrode and a dielectric tube, and one end of the discharge electrode is electrically connected to the excitation source through the connecting line; the dielectric tube is sleeved outside the discharge electrode; the dielectric tube and the discharge electrode sequentially and unidirectionally penetrate through the first opening and the second opening of the mounting flange along the first direction; the sealing assemblies are arranged between the outer wall of the dielectric tube and the inner wall of the first opening and between the outer wall of the dielectric tube and the inner wall of the second opening in a sealed mode. The plasma generating device generates low-temperature plasma with uniform density along the extension direction of the discharge electrode, the discharge electrode is not easy to form standing waves, and two ends of the discharge electrode are arranged outside the vacuum processing chamber, so that the plasma is wide in acting range and high in uniformity, and can be applied to the field of large-area vacuum processing.

Description

Technical Field

[0001] The utility model relates to the technical field of vacuum treatment, in particular to a plasma generating device. Background Art

[0002] Plasma technology is one of the important technologies in the field of vacuum treatment such as vacuum coating and etching. Among them, ICP (Inductively Coupled Plasma, inductively coupled plasma) plasma sources are widely used in physical vapor deposition and chemical vapor deposition equipment due to their advantages such as high plasma density and low-pressure discharge.

[0003] At present, the discharge coil of the ICP plasma source usually generates an alternating electric field in the vacuum chamber through a quartz material, so that the free electrons in the vacuum chamber collide with gas molecules under the action of the electric field to trigger an electron avalanche, and then gas discharge and plasma generation occur. In the prior art, the discharge coils of ICP plasma sources are mostly in a coiled form, but the coiled discharge coils have technical problems such as complex structural design and unstable performance in application scenarios that require a larger plasma action range and higher plasma uniformity, which limits their application in the field of large-area vacuum treatment. Summary of the Utility Model

[0004] The purpose of the utility model is to provide a plasma generating device to solve the technical problems such as complex structural design and unstable performance of the coiled discharge coil in application scenarios that require a larger plasma action range and higher plasma uniformity in the prior art, thereby limiting its application in the field of large-area vacuum treatment.

[0005] To achieve the above object, the utility model adopts the following technical solutions:

[0006] The utility model provides a plasma generating device, which can be arranged on the mounting flange of the vacuum treatment chamber and is used for surface treatment of the substrate to be treated in the vacuum treatment chamber. The plasma generating device includes:

[0007] A plasma generating assembly, which includes an excitation source, a connection line, a discharge electrode and a dielectric tube; one end of the discharge electrode is electrically connected to the excitation source through the connection line; the dielectric tube is sleeved outside the discharge electrode; the dielectric tube and the discharge electrode sequentially pass through the first opening and the second opening of the mounting flange in a one-way manner along a first direction, so that the middle parts of the dielectric tube and the discharge electrode are located in the vacuum treatment chamber, and both ends of the dielectric tube and the discharge electrode are located outside the vacuum treatment chamber;

[0008] A sealing assembly, which is sealingly arranged between the outer wall of the dielectric tube and the inner wall of the first opening, and between the outer wall of the dielectric tube and the inner wall of the second opening.

[0009] As an alternative embodiment of the above plasma generating device, the sealing assembly includes a sealing seat and a first sealing member. The sealing seat has a sealing channel that communicates between the inside and the outside of the vacuum processing chamber. The dielectric tube and the discharge electrode sequentially pass through the sealing channel unidirectionally along the first direction; the first sealing member is sleeved outside the dielectric tube to seal the gap between the outer wall of the dielectric tube and the inner wall of the sealing channel.

[0010] As an alternative embodiment of the above plasma generating device, the sealing assembly further includes a spacer ring, which is sleeved outside the dielectric tube; a plurality of spacer rings and a plurality of first sealing members are provided, and the plurality of spacer rings and the plurality of first sealing members are arranged in a cross-stacked manner.

[0011] As an alternative embodiment of the above plasma generating device, the sealing assembly further includes a gland, which is arranged on the sealing seat to seal one side of the sealing channel along the axial direction. A stop boss is protrudingly provided on the inner wall of the sealing channel, and the stop boss is used to stop the other side of the sealing channel along the axial direction.

[0012] As an alternative embodiment of the above plasma generating device, the sealing assembly further includes a first insulating limiting block and a second insulating limiting block. The first insulating limiting block is sleeved between the discharge electrode and the dielectric tube to abut and limit the discharge electrode and the dielectric tube; the second insulating limiting block is sleeved outside the two ends of the discharge electrode and the dielectric tube to abut and limit the discharge electrode and the dielectric tube.

[0013] As an alternative embodiment of the above plasma generating device, the plasma generating device further includes a second sealing member and a third sealing member. The second sealing member is sealingly arranged between the sealing seat and the mounting flange, and the third sealing member is sealingly arranged between the mounting flange and the vacuum processing chamber.

[0014] As an alternative embodiment of the above plasma generating device, the sealing assembly further includes a fourth sealing member, which is used to keep the space between the outside of the discharge electrode and the inside of the dielectric tube relatively gas-isolated from the space outside the vacuum processing chamber.

[0015] As an alternative embodiment of the above plasma generating device, the plasma generating device further includes a ferromagnetic member, which is arranged on the side of the discharge electrode away from the substrate to be processed.

[0016] As an optional solution of the above-mentioned plasma generating device, the plasma generating assembly further includes a variable capacitor and / or a variable inductor, and the other end of the discharge electrode is electrically connected to the variable capacitor and / or the variable inductor through the connecting line.

[0017] As an optional solution of the above-mentioned plasma generating device, the plasma generating device further includes a support frame, which is arranged on a side of the mounting flange away from the vacuum processing chamber, and the excitation source and the connecting line are both arranged on the support frame.

[0018] As an optional solution of the above-mentioned plasma generating device, the plasma generating device further includes an electromagnetic shielding protective plate, and the electromagnetic shielding protective plate covers the outside of the supporting frame, the connecting line and the discharge electrode.

[0019] As an optional solution of the above-mentioned plasma generating device, a plurality of plasma generating assemblies are provided, and the plurality of plasma generating assemblies are arranged at intervals around the circumference of the vacuum processing chamber.

[0020] The beneficial effects of the utility model are:

[0021] The plasma generating device includes a plasma generating component and a sealing component. The plasma generating component includes an excitation source, a connection line, a discharge electrode, and a dielectric tube. One end of the discharge electrode is electrically connected to the excitation source through the connection line, and the dielectric tube is sleeved outside the discharge electrode, so that the excitation source can output and couple to the discharge electrode, enabling the high-frequency current on the discharge electrode to induce an alternating magnetic field. Among them, the dielectric tube and the discharge electrode sequentially pass through the first opening and the second opening of the mounting flange unidirectionally along the first direction, so that the middle parts of the dielectric tube and the discharge electrode are located inside the vacuum processing chamber, and both ends of the dielectric tube and the discharge electrode are located outside the vacuum processing chamber. Thus, the alternating magnetic field induced by the discharge electrode can induce an alternating electric field inside the vacuum processing chamber after passing through the dielectric tube, enabling free electrons to collide with gas molecules after being accelerated by the alternating electric field to trigger ionization, generating self-sustained glow discharge, and simultaneously generating a low-temperature plasma with a uniform density along the extension direction of the discharge electrode. This discharge electrode is not prone to forming standing waves, and both ends are outside the vacuum processing chamber, so that the plasma has a wide action range and high uniformity, meeting the application requirements in the field of large-area vacuum processing. At the same time, the sealing component is hermetically arranged between the outer wall of the dielectric tube and the inner wall of the first opening, and between the outer wall of the dielectric tube and the inner wall of the second opening, realizing the sealing of the gap between the dielectric tube and the mounting flange. While ensuring the vacuum degree, the use of PEI insulation and limiting at the connection can prevent electrons in the plasma from leaking from here inside the vacuum processing chamber, causing unstable glow discharge or even inability to self-sustain the discharge, and the discharge electrode of this plasma generating device will not be in communication with the inside of the vacuum processing chamber, thereby reducing the design difficulty of the structure and improving the stability of the performance. Description of the Drawings

[0022] Figure 1 It is a schematic structural diagram of the plasma generating device provided by an embodiment of the present invention;

[0023] Figure 2 It is a structural sectional view of the plasma generating device provided by an embodiment of the present invention;

[0024] Figure 3 It is a partial sectional view of the plasma generating device provided by an embodiment of the present invention.

[0025] In the figure:

[0026] 1. Mounting flange; 2. Support frame; 3. Plasma generating assembly; 31. Excitation source; 32. Connecting line; 33. Discharge electrode; 34. Dielectric tube; 35. Variable capacitor; 4. Sealing assembly; 41. Sealing seat; 411. Sealing channel; 412. Stop projection; 42. First seal; 43. Spacer ring; 44. gland; 45. First insulating limit block; 46. Second insulating limit block; 5. Second seal; 6. Third seal; 7. Electromagnetic shielding guard plate; 8. Vacuum treatment chamber. Detailed implementation mode

[0027] The technical solution of the present utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are some, but not all, of the embodiments of the present utility model. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present utility model without creative efforts shall fall within the protection scope of the present utility model.

[0028] In the description of the present utility model, it should be noted that the orientation or positional relationship indicated by the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the present utility model. In addition, the terms "first" and "second" are only used for descriptive purposes and cannot be understood as indicating or implying relative importance. Among them, the terms "first position" and "second position" are two different positions, and the first feature being "above", "above" and "on" the second feature includes the first feature being directly above and obliquely above the second feature, or simply indicating that the first feature has a higher horizontal height than the second feature. The first feature being "below", "below" and "under" the second feature includes the first feature being directly below and obliquely below the second feature, or simply indicating that the first feature has a lower horizontal height than the second feature.

[0029] In the description of the present utility model, it should be noted that unless otherwise clearly specified and limited, the terms "mount", "connect" and "couple" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the internal communication of two elements. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.

[0030] Embodiments of the present utility model will be described in detail below. Examples of the embodiments are shown in the accompanying drawings, where the same or similar reference numerals represent the same or similar elements or elements with the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present utility model and should not be construed as a limitation of the present utility model.

[0031] As Figures 1 to 3 shown, this embodiment provides a plasma generating device, which is arranged on the mounting flange 1 of the vacuum processing chamber 8 and is used for surface treatment of the substrate to be processed in the vacuum processing chamber 8.

[0032] The plasma generating device includes a plasma generating assembly 3 and a sealing assembly 4. The plasma generating assembly 3 includes an excitation source 31, a connection line 32, a discharge electrode 33, and a dielectric tube 34. One end of the discharge electrode 33 is electrically connected to the excitation source 31 through the connection line 32, and the dielectric tube 34 is sleeved outside the discharge electrode 33, so that the excitation source 31 can output and couple to the discharge electrode 33, making the high-frequency current on the discharge electrode 33 induce an alternating magnetic field. Optionally, the plasma generating assembly 3 is an ICP source, the excitation source 31 is a radio frequency power supply, the discharge electrode 33 is a linear conductive copper rod, and the dielectric tube 34 is a quartz tube.

[0033] Wherein, the dielectric tube 34 and the discharge electrode 33 sequentially pass through the first opening and the second opening of the mounting flange 1 in a one-way manner along the first direction (i.e., the X direction in the accompanying drawings), so that the middle parts of the dielectric tube 34 and the discharge electrode 33 are located inside the vacuum processing chamber 8, and both ends of the dielectric tube 34 and the discharge electrode 33 are located outside the vacuum processing chamber 8. Thus, the alternating magnetic field induced by the discharge electrode 33 can induce an alternating electric field in the vacuum processing chamber 8 after passing through the dielectric tube 34, enabling free electrons to collide with gas molecules after being accelerated by the alternating electric field to trigger ionization, generating self-sustained glow discharge, and simultaneously generating a low-temperature plasma with uniform density along the extension direction of the discharge electrode 33. The discharge electrode 33 is not prone to forming standing waves, and both ends are outside the vacuum processing chamber 8, so that the plasma has a wider action range and higher uniformity, meeting the application in the field of large-area vacuum processing.

[0034] At the same time, the sealing assembly 4 is hermetically arranged between the outer wall of the dielectric tube 34 and the inner wall of the first opening, and between the outer wall of the dielectric tube 34 and the inner wall of the second opening, realizing the sealing of the gap between the dielectric tube 34 and the mounting flange 1. While ensuring the vacuum degree, the PEI insulating material is used at the connection to prevent electrons in the plasma from leaking through here from the vacuum processing chamber 8, causing unstable glow discharge or even inability to self-sustain the discharge, and the discharge electrode 33 of the plasma generating device will not communicate with the inside of the vacuum processing chamber 8, thereby reducing the design difficulty of the structure and improving the stability of the performance.

[0035] Optionally, the plasma generating assembly 3 further includes a radio frequency matcher which is electrically connected to the connection line 32 and is located between the discharge coil 33 and the excitation source 31, so that the energy transfer efficiency can be optimized through the radio frequency matcher and the energy loss can be reduced. At the same time, the plasma generating assembly 3 further includes a variable capacitor 35 and / or a variable inductor. The other end of the discharge electrode 33 is electrically connected to the variable capacitor 35 and / or the variable inductor through the connection line 32, so that the circuit parameters can be adjusted through the variable capacitor 35 and / or the variable inductor, thereby adapting to different working conditions and optimizing the performance. Wherein, the discharge electrode 33 is grounded through the connection line 32 and the variable capacitor 35 and / or the variable inductor. Further optionally, the connection line 32 is an electric connection plate. By setting the electric connection plate, while realizing the circuit connection, it can also support the discharge electrode 33 and improve the connection strength of the discharge electrode 33.

[0036] As Figure 3 shown, the sealing assembly 4 includes a sealing seat 41 and a first seal 42. The sealing seat 41 has a sealing channel 411 which communicates between the inside and the outside of the vacuum processing chamber 8. The dielectric tube 34 and the discharge electrode 33 pass through the sealing channel 411 unidirectionally in sequence along the first direction. The first seal 42 is sleeved outside the dielectric tube 34 and is used to seal the gap between the outer wall of the dielectric tube 34 and the inner wall of the sealing channel 411. Thus, the first seal 42 can seal the gap between the sealing seat 41 and the dielectric tube 34 to ensure a reliable vacuum environment.

[0037] Furthermore, the sealing assembly 4 further includes a spacer ring 43 which is sleeved outside the dielectric tube 34. A plurality of spacer rings 43 and a plurality of first seals 42 are provided. The plurality of spacer rings 43 and the plurality of first seals 42 are arranged in a cross-stacked manner. Thus, the plurality of first seals 42 can be isolated by the plurality of spacer rings 43, so as to facilitate the extrusion of the first seals 42 and improve the sealing effect of the first seals 42. At the same time, the sealing assembly 4 further includes a gland 44 which is arranged on the sealing seat 41 and is used to seal one side of the sealing channel 411 along the axial direction. A stop boss is protrudingly provided on the inner wall of the sealing channel 411 and is used to stop the other side of the sealing channel 411 along the axial direction. Thus, through the arrangement of the gland 44 and the stop boss, the installation of the spacer rings 43 and the first seals 42 in the sealing channel 411 can be facilitated, and the spacer rings 43 and the first seals 42 can be stopped and limited.

[0038] Further, the sealing assembly 4 further includes a first insulating limiting block 45 and a second insulating limiting block 46. The first insulating limiting block 45 is sleeved between the discharge electrode 33 and the dielectric tube 34 to abut and limit the discharge electrode 33 and the dielectric tube 34, so that the discharge electrode 33 and the dielectric tube 34 are spaced apart, ensuring that the discharge electrode 33 is in potential suspension and does not contact the wall of the dielectric tube 34 after connecting the circuit. The second insulating limiting block 46 is sleeved outside both ends of the discharge electrode 33 and the dielectric tube 34 to abut and limit the discharge electrode 33 and the dielectric tube 34. Thus, after the first insulating limiting block 45 and the second insulating limiting block 46 cooperate with each other, electrical insulation of the discharge electrode 33 can be achieved, and the movement of the discharge electrode 33 and the dielectric tube 34 can be restricted to prevent displacement, thereby ensuring stable dimensions. Among them, a seal is provided between the discharge electrode 33 and the dielectric tube 34, so that a vacuum is formed between the discharge electrode 33 and the dielectric tube 34. Optionally, the sealing assembly 4 further includes a fourth seal, and the fourth seal is used to keep the space between the outside of the discharge electrode 33 and the inside of the dielectric tube 34 in relative gas isolation from the space outside the vacuum processing chamber 8 to prevent external gas from affecting the discharge electrode 33. Further optionally, the second insulating limiting block 46 is fixedly provided on the gland 44 or the sealing seat 41. Optionally, the first insulating limiting block 45 and the second insulating limiting block 46 are made of materials such as PTFE, PEI, PI, and PEEK with high temperature resistance, stable dimensions, and good electrical insulation.

[0039] Further, the plasma generating device further includes a second seal 5 and a third seal 6. The second seal 5 is hermetically provided between the sealing seat 41 and the mounting flange 1 to prevent the inside of the vacuum processing chamber 8 from communicating with the outside through the gap between the sealing seat 41 and the mounting flange 1. The third seal 6 is hermetically provided between the mounting flange 1 and the vacuum processing chamber 8 to prevent the inside of the vacuum processing chamber 8 from directly communicating with the outside through the gap between the vacuum processing chamber 8 and the mounting flange 1.

[0040] Further, the plasma generating device further includes a ferromagnetic member, and the ferromagnetic member is provided on the side of the discharge electrode 33 away from the substrate to be processed. By providing the ferromagnetic member, it is beneficial to regulate the electromagnetic field emitted by the discharge electrode 33, improve the intensity of the electromagnetic field emitted by the discharge electrode 33, and thereby improve the density and energy of the plasma. Optionally, the ferromagnetic member is located outside the dielectric tube 34 and is provided on the mounting flange 1.

[0041] Furthermore, the discharge electrode 33 has a cooling channel inside, which is used for circulating cooling water. Through the cooling water, the discharge electrode 33, the dielectric tube 34 and the first seal 42 in the sealing assembly 4 can be cooled down, preventing the dielectric tube 34 from cracking due to uneven heat absorption and the first seal 42 from aging and failing due to excessive temperature. Optionally, the outside of the discharge electrode 33 is silver-plated to reduce the skin effect and lower the power loss inside the discharge electrode 33. Further optionally, the discharge electrode 33 includes a hollow pipeline, and one or more hollow pipelines are provided. When the discharge electrode 33 includes multiple hollow pipelines, the multiple hollow pipelines are arranged in parallel. Optionally, the discharge electrode 33 is composed of one or more hollow pipelines with a diameter of 3 mm - 20 mm in parallel, the wall thickness of the pipeline is 1 mm - 4 mm, the pipeline length is 500 mm - 3000 mm, the material of the discharge electrode 33 can be red copper, and its surface is silver-plated. Optionally, the diameter of the dielectric tube 34 is 10 mm - 50 mm, and the wall thickness is 3 mm - 10 mm.

[0042] As Figure 2 and Figure 3 shown, the plasma generating device further includes a support frame 2, which is arranged on the side of the mounting flange 1 away from the vacuum processing chamber 8. The excitation source 31 and the connection line 32 are both arranged on the support frame 2, so that the support frame 2 is arranged in the outside world, facilitating the installation and fixation of the excitation source 31 and the connection line 32. At the same time, the plasma generating device further includes an electromagnetic shielding guard plate 7, which covers the support frame 2, the connection line 32 and the discharge electrode 33 to achieve electromagnetic shielding and prevent external magnetic field interference. Optionally, a magnetic shielding strip is further provided between the mounting flange 1 and the vacuum processing chamber 8 to prevent magnetic leakage in the vacuum processing chamber 8 through the magnetic shielding strip. Further optionally, the electromagnetic shielding guard plate 7 needs to be separately connected to the ground wire.

[0043] Optionally, the plasma generating assembly 3 is coated with a vacuum side guard plate assembly on the side facing the vacuum to prevent electrons in the plasma from directly escaping through the mounting flange 1, resulting in unstable glow discharge or even inability to sustain self-discharge. The vacuum side guard plate assembly can be made by methods such as spraying ceramics on the surface of a stainless steel guard plate and anodizing the surface of an aluminum guard plate. As Figure 1As shown, a plurality of plasma generating components 3 are provided, and the plurality of plasma generating components 3 are arranged at intervals in the circumferential direction of the vacuum processing chamber 8. Thus, when the discharge electrodes 33 generate low-temperature plasma with uniform longitudinal density in the extending direction, after the plurality of plasma generating components 3 are mutually matched, they can also generate low-temperature plasma with uniform transverse density in the circumferential direction of the vacuum processing chamber 8, so as to improve the overall uniformity of the low-temperature plasma, and further improve the performance of the thin film. Among them, if a plurality of discharge electrodes 33 are connected in parallel, when the interval between two adjacent discharge electrodes 33 is relatively large, only one excitation source 31 can be provided. When the interval between two adjacent discharge electrodes 33 is relatively small, the current directions of the adjacent discharge electrodes 33 need to be set in opposite directions, that is, a plurality of excitation sources 31 need to be correspondingly provided.

[0044] Obviously, the above embodiments of the present invention are merely examples for clearly explaining the present invention, rather than limiting the implementation manners of the present invention. For those of ordinary skill in the art, other different forms of changes or variations can be made based on the above description. It is not necessary and impossible to list all the implementation manners here. Any modifications, equivalent replacements, and improvements made within the spirit and principle of the present invention shall be included in the protection scope of the claims of the present invention.

Claims

1. A plasma generating device, which can be arranged on the mounting flange (1) of a vacuum processing chamber (8) and is used for surface treatment of a substrate to be processed in the vacuum processing chamber (8), characterized in that, The plasma generating device includes: A plasma generating assembly (3), the plasma generating assembly (3) including an excitation source (31), a connection line (32), a discharge electrode (33), and a dielectric tube (34); one end of the discharge electrode (33) is electrically connected to the excitation source (31) through the connection line (32); the dielectric tube (34) is sleeved outside the discharge electrode (33); the dielectric tube (34) and the discharge electrode (33) sequentially pass through the first opening and the second opening of the mounting flange (1) unidirectionally along a first direction, so that the middle parts of the dielectric tube (34) and the discharge electrode (33) are located inside the vacuum processing chamber (8), and both ends of the dielectric tube (34) and the discharge electrode (33) are located outside the vacuum processing chamber (8); A sealing assembly (4), the sealing assembly (4) being hermetically provided between the outer wall of the dielectric tube (34) and the inner wall of the first opening, and between the outer wall of the dielectric tube (34) and the inner wall of the second opening.

2. The plasma generating device according to claim 1, wherein The sealing assembly (4) includes a sealing seat (41) and a first sealing member (42), the sealing seat (41) having a sealing channel (411), the sealing channel (411) communicating the inside and the outside of the vacuum processing chamber (8), the dielectric tube (34) and the discharge electrode (33) sequentially passing through the sealing channel (411) unidirectionally along the first direction; the first sealing member (42) is sleeved outside the dielectric tube (34) for sealing the gap between the outer wall of the dielectric tube (34) and the inner wall of the sealing channel (411).

3. The plasma generating device according to claim 2, wherein, The sealing assembly (4) further includes a spacer ring (43), the spacer ring (43) being sleeved outside the dielectric tube (34); a plurality of the spacer rings (43) and a plurality of the first sealing members (42) are provided, and the plurality of spacer rings (43) and the plurality of first sealing members (42) are cross-stacked.

4. The plasma generating device according to claim 3, characterized in that, The sealing assembly (4) further includes a gland (44), the gland (44) being provided on the sealing seat (41) for sealingly pressing one side of the sealing channel (411) in the axial direction, and a stop boss is protrudingly provided on the inner wall of the sealing channel (411) for stopping the other side of the sealing channel (411) in the axial direction.

5. The plasma generating device according to claim 2, characterized in that, The sealing assembly (4) further includes a first insulating limiting block (45) and a second insulating limiting block (46), the first insulating limiting block (45) being sleeved between the discharge electrode (33) and the dielectric tube (34) to abut and limit the discharge electrode (33) and the dielectric tube (34); the second insulating limiting block (46) is sleeved outside both ends of the discharge electrode (33) and the dielectric tube (34) to abut and limit the discharge electrode (33) and the dielectric tube (34).

6. The plasma generating device according to claim 2, characterized in that, The plasma generating device further includes a second seal (5) and a third seal (6). The second seal (5) is sealingly provided between the seal seat (41) and the mounting flange (1), and the third seal (6) is sealingly provided between the mounting flange (1) and the vacuum processing chamber (8).

7. The plasma generating device according to claim 1, characterized in that, The seal assembly (4) further includes a fourth seal, and the fourth seal is configured to keep the space between the outside of the discharge electrode (33) and the inside of the dielectric tube (34) in relative gas isolation from the space outside the vacuum processing chamber (8).

8. The plasma generating device according to claim 1, wherein The plasma generating device further includes a ferromagnetic member, and the ferromagnetic member is provided on a side of the discharge electrode (33) away from the substrate to be processed.

9. The plasma generating device according to claim 1, wherein The plasma generating assembly (3) further includes a variable capacitor (35) and / or a variable inductor, and the other end of the discharge electrode (33) is electrically connected to the variable capacitor (35) and / or the variable inductor through the connection line (32).

10. The plasma generating device according to claim 1, characterized in that, The plasma generating device further includes a support frame (2), and the support frame (2) is provided on a side of the mounting flange (1) facing away from the vacuum processing chamber (8). Both the excitation source (31) and the connection line (32) are provided on the support frame (2).

11. The plasma generating device according to claim 10, characterized in that, The plasma generating device further includes an electromagnetic shielding cover plate (7), and the electromagnetic shielding cover plate (7) covers the support frame (2), the connection line (32), and the discharge electrode (33).

12. The plasma generating device according to any one of claims 1 to 11, characterized in that, A plurality of the plasma generating assemblies (3) are provided, and the plurality of plasma generating assemblies (3) are arranged at intervals in the circumferential direction around the vacuum processing chamber (8).

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