Raw material proportioning and mixing machine for photovoltaic silicon wafer cleaning agent

Abstract

The utility model relates to the technical field of photovoltaic silicon wafer cleaning agent raw material proportioning and mixing, in particular to a photovoltaic silicon wafer cleaning agent raw material proportioning and mixing machine which is provided with a flushing mechanism and a drying mechanism, so that in the photovoltaic silicon wafer cleaning agent raw material proportioning and mixing process, equipment can be thoroughly cleaned after being used, and the production efficiency is improved. Drying is carried out, so that the occurrence of equipment corrosion is reduced, and the processing efficiency is improved; comprising a mixing mechanism; the device further comprises a rotating mechanism, two brushing mechanisms, a drying mechanism and a flushing mechanism, the rotating mechanism is installed on the mixing mechanism, the two brushing mechanisms are installed on the rotating mechanism, the drying mechanism is installed on the mixing mechanism, and the flushing mechanism is installed at the lower end of the mixing mechanism. The mixing mechanism is used for mixing, the rotating mechanism is used for driving the scrubbing mechanism, the scrubbing mechanism is used for scrubbing, the drying mechanism is used for drying, and the flushing mechanism is used for flushing.

Description

Technical Field

[0001] The utility model relates to the technical field of raw material proportioning and mixing of photovoltaic silicon wafer cleaning agents, in particular to a raw material proportioning and mixing machine for photovoltaic silicon wafer cleaning agents. Background Technique

[0002] Photovoltaic silicon wafers are usually made of high-purity silicon materials and are semiconductor materials that convert solar energy into electrical energy using the photovoltaic effect. The quality and performance of the silicon wafers directly affect the efficiency and lifespan of solar panels. As the core component of solar panels, photovoltaic silicon wafers play a crucial role in the process of converting solar energy into electrical energy.

[0003] In existing raw material proportioning and mixing machines for photovoltaic silicon wafer cleaning agents, for example, a raw material proportioning and mixing machine for photovoltaic silicon wafer cleaning agents disclosed in the utility model patent with the application number 202322117956.7. In this utility model, a feeding assembly is arranged on the side of the reaction kettle, and non-contact feeding of multiple materials is carried out through a hopper. On the one hand, feeding multiple materials simultaneously can make the materials evenly distributed, which is beneficial to the progress of the reaction. On the other hand, there is no need for manual feeding close to the reaction kettle, that is, it avoids the reaction between the fed materials to generate poisonous gases and affect the health of workers. A sealing gate is set to ensure the sealing of the connection part between the reaction kettle and the hopper, guarantee the integrity and sealing of the reaction kettle space, and ensure that the reaction in the reaction kettle does not affect the external environment.

[0004] However, during the process of raw material proportioning and mixing of photovoltaic silicon wafer cleaning agents, after the equipment is used, it needs to be cleaned manually, and the cleaning efficiency is low. Summary of the Utility Model

[0005] To solve the above technical problems, the utility model provides a raw material proportioning and mixing machine for photovoltaic silicon wafer cleaning agents, which can thoroughly clean and dry the equipment after use during the process of raw material proportioning and mixing of photovoltaic silicon wafer cleaning agents by setting a flushing mechanism and a drying mechanism, reduce the occurrence of equipment corrosion, and improve the processing efficiency.

[0006] A raw material proportioning and mixing machine for photovoltaic silicon wafer cleaning agents of the utility model includes a mixing mechanism; it also includes a rotating mechanism, two groups of brushing mechanisms, a drying mechanism, and a flushing mechanism. The rotating mechanism is installed on the mixing mechanism, the two groups of brushing mechanisms are installed on the rotating mechanism, the drying mechanism is installed on the mixing mechanism, and the flushing mechanism is installed at the lower end of the mixing mechanism;

[0007] The mixing mechanism performs mixing, the rotating mechanism drives the brushing mechanism, the brushing mechanism performs brushing, the drying mechanism performs drying, and the rinsing mechanism performs rinsing; the material is mixed by the mixing mechanism, the brushing mechanism is driven by the rotating mechanism, the mixing mechanism is brushed by the brushing mechanism, and at the same time, the equipment is rinsed by opening the rinsing mechanism, and the inside of the equipment is dried by opening the drying mechanism, so that during the mixing process of the raw material ratio of the photovoltaic silicon wafer cleaning agent, the equipment can be thoroughly cleaned and dried after use, reducing the occurrence of equipment corrosion and improving the processing efficiency.

[0008] Preferably, the mixing mechanism includes a mixing chamber, a feed inlet, a discharge channel, and a sealing cover. The feed inlet is installed at the left end of the mixing chamber, the discharge channel is installed at the lower end of the mixing chamber, and the sealing cover is hinged to the output end of the discharge channel; feeding is carried out through the feed inlet, mixing is carried out through the mixing chamber, and discharging is carried out through the discharge channel by opening the sealing cover.

[0009] Preferably, the rotating mechanism includes a rotating frame, a motor, a main gear, and a driven gear. The rotating frame is rotatably installed in the mixing chamber, and the input end of the rotating frame extends to the upper side of the mixing chamber. The motor is installed at the upper end of the mixing chamber. The main gear is connected to the output end of the motor, the driven gear is connected to the input end of the rotating frame, and the main gear meshes with the driven gear; the main gear is driven to rotate by turning on the motor, and while the main gear rotates, it meshes with the driven gear to drive the rotating frame to rotate.

[0010] Preferably, the brushing mechanism includes a pipe rack, a spring, and two groups of brushes. The pipe rack is rotatably installed on the rotating frame, and the pipe rack is connected to the rotating frame by a spring. The two groups of brushes are rotatably installed on the pipe rack; the pipe rack is made vertical by the centrifugal force generated by the rotation of the rotating frame, and at the same time, the inside of the mixing chamber is brushed by the brushes.

[0011] Preferably, the drying mechanism includes a drying box, a one-way valve, and a blower. The drying box is connected to the discharge channel through the one-way valve, and the blower is installed at the front end of the drying box; the hot air in the drying box is blown into the mixing chamber through the one-way valve by turning on the blower for drying.

[0012] Preferably, the rinsing mechanism includes a water tank, a pump, a spray head, and a water pipe. The water tank is installed at the lower end of the mixing chamber, the pump is installed at the rear end of the water tank, the spray head is installed in the mixing chamber, and the output end of the pump is connected to the input end of the spray head through the water pipe; the inside of the mixing chamber is rinsed by turning on the pump and cooperating with the spray head through the water pipe.

[0013] Compared with the prior art, the beneficial effects of the present utility model are as follows: The materials are mixed by the mixing mechanism, the brushing mechanism is driven by the rotating mechanism, the mixing mechanism is brushed by the brushing mechanism, and at the same time, the equipment is rinsed by opening the rinsing mechanism, and the inside of the equipment is dried by opening the drying mechanism. Therefore, during the mixing process of the raw material ratio of the photovoltaic silicon wafer cleaning agent, the equipment can be thoroughly cleaned and dried after use, reducing the occurrence of equipment corrosion and improving the processing efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 is the first axonometric structural schematic diagram of the present utility model;

[0015] Figure 2 is the second axonometric structural schematic diagram of the present utility model;

[0016] Figure 3 is the first front elevation sectional axonometric structural schematic diagram of the present utility model;

[0017] Figure 4 is the second front elevation sectional axonometric structural schematic diagram of the present utility model;

[0018] Figure 5 is the bottom elevation sectional axonometric structural schematic diagram of the present utility model;

[0019] Reference numerals in the drawings: 1, mixing mechanism; 11, mixing bin; 12, feed inlet; 13, discharge channel; 14, sealing cover; 2, rotating mechanism; 21, rotating frame; 22, motor; 23, main gear; 24, driven gear; 3, brushing mechanism; 31, pipe rack; 32, spring; 33, brush; 4, drying mechanism; 41, drying box; 42, check valve; 43, fan; 5, rinsing mechanism; 51, water tank; 52, pump; 53, spray head; 54, water pipe. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0020] To facilitate the understanding of the present utility model, the present utility model will be described more comprehensively below with reference to the relevant drawings. The present utility model can be implemented in many different forms and is not limited to the embodiments described herein. On the contrary, these embodiments are provided to make the disclosure of the present utility model more thorough and comprehensive.

[0021] Embodiment 1

[0022] As Figures 1 to 5 shown, a mixer for mixing the raw material ratio of a photovoltaic silicon wafer cleaning agent includes a mixing mechanism 1, and also includes a rotating mechanism 2, two groups of brushing mechanisms 3, a drying mechanism 4, and a rinsing mechanism 5. The rotating mechanism 2 is installed on the mixing mechanism 1, the two groups of brushing mechanisms 3 are installed on the rotating mechanism 2, the drying mechanism 4 is installed on the mixing mechanism 1, and the rinsing mechanism 5 is installed at the lower end of the mixing mechanism 1;

[0023] The mixing mechanism 1 mixes, the rotating mechanism 2 drives the brushing mechanism 3, the brushing mechanism 3 brushes, the drying mechanism 4 dries, and the rinsing mechanism 5 rinses;

[0024] The mixing mechanism 1 includes a mixing bin 11, a feed inlet 12, a discharge channel 13, and a sealing cover 14. The feed inlet 12 is installed at the left end of the mixing bin 11, the discharge channel 13 is installed at the lower end of the mixing bin 11, and the sealing cover 14 is hinged to the output end of the discharge channel 13;

[0025] The rotating mechanism 2 includes a rotating frame 21, a motor 22, a main gear 23, and a driven gear 24. The rotating frame 21 is rotatably installed in the mixing bin 11, and the input end of the rotating frame 21 extends to the upper side of the mixing bin 11. The motor 22 is installed at the upper end of the mixing bin 11. The main gear 23 is connected to the output end of the motor 22. The driven gear 24 is connected to the input end of the rotating frame 21, and the main gear 23 meshes with the driven gear 24;

[0026] The brushing mechanism 3 includes a pipe rack 31, a spring 32, and two groups of brushes 33. The pipe rack 31 is rotatably installed on the rotating frame 21, and the pipe rack 31 is connected to the rotating frame 21 by the spring 32. The two groups of brushes 33 are rotatably installed on the pipe rack 31;

[0027] The drying mechanism 4 includes a drying box 41, a one-way valve 42, and a blower 43. The drying box 41 is connected to the discharge channel 13 through the one-way valve 42, and the blower 43 is installed at the front end of the drying box 41;

[0028] The rinsing mechanism 5 includes a water tank 51, a pump 52, a spray head 53, and a water pipe 54. The water tank 51 is installed at the lower end of the mixing bin 11. The pump 52 is installed at the rear end of the water tank 51. The spray head 53 is installed in the mixing bin 11, and the output end of the pump 52 is connected to the input end of the spray head 53 through the water pipe 54;

[0029] Charging is carried out through the feed inlet 12, mixing is carried out through the mixing bin 11, discharging is carried out through the discharge channel 13 by opening the sealing cover 14. The main gear 23 is rotated by driving the main gear 23 by turning on the motor 22. While the main gear 23 rotates, it meshes with the driven gear 24 to drive the driven gear 24 to drive the rotating frame 21 to rotate. The centrifugal force generated by the rotation of the rotating frame 21 makes the pipe rack 31 vertical. At the same time, the inside of the mixing bin 11 is brushed by the brushes 33. At the same time, the inside of the mixing bin 11 is rinsed by turning on the pump 52 and cooperating with the spray head 53 through the water pipe 54. The hot air in the drying box 41 is blown into the mixing bin 11 through the one-way valve 42 by turning on the blower 43 for drying. Thus, during the mixing process of the raw material ratio of the photovoltaic silicon wafer cleaning agent, the equipment can be thoroughly cleaned and dried after use, reducing the occurrence of equipment corrosion and improving the processing efficiency.

[0030] Such asFigures 1 to 5 As shown in the figure, a raw material proportioning mixer for a photovoltaic silicon wafer cleaning agent of the present utility model, when working, feeds materials through the feed port 12, mixes them in the mixing chamber 11, discharges materials through the discharge channel 13 by opening the sealing cover 14, drives the main gear 23 to rotate by turning on the motor 22, makes the driven gear 24 drive the rotating frame 21 to rotate while the main gear 23 rotates, generates centrifugal force through the rotation of the rotating frame 21 to make the pipe rack 31 vertical, simultaneously brushes the inside of the mixing chamber 11 through the brush 33, simultaneously flushes the inside of the mixing chamber 11 through the water pump 52 via the water pipe 54 and the spray head 53, and dries the inside of the mixing chamber 11 by blowing the hot air in the drying box 41 into the mixing chamber 11 through the one-way valve 42 by turning on the blower 43.

[0031] The motor 22, blower 43 and water pump 52 of the present utility model are purchased on the market. Those skilled in the art only need to install and operate them according to the attached operation manuals, without the need for creative labor from those skilled in the art.

[0032] The main functions achieved by the present utility model are: during the process of proportioning and mixing the raw materials of the photovoltaic silicon wafer cleaning agent, by setting up a flushing mechanism and a drying mechanism, it is possible to thoroughly clean and dry the equipment after use during the process of proportioning and mixing the raw materials of the photovoltaic silicon wafer cleaning agent, reduce the occurrence of equipment corrosion, and improve the processing efficiency.

[0033] The above is only the preferred embodiment of the present utility model. It should be noted that for those of ordinary skill in the art in this technical field, without departing from the technical principle of the present utility model, several improvements and modifications can still be made, and these improvements and modifications should also be regarded as the protection scope of the present utility model.

Claims

1. A raw material proportioning mixer for a photovoltaic silicon wafer cleaning agent, comprising a mixing mechanism (1); characterized in that, It also includes a rotating mechanism (2), two groups of brushing mechanisms (3), a drying mechanism (4) and a flushing mechanism (5). The rotating mechanism (2) is installed on the mixing mechanism (1), the two groups of brushing mechanisms (3) are installed on the rotating mechanism (2), the drying mechanism (4) is installed on the mixing mechanism (1), and the flushing mechanism (5) is installed at the lower end of the mixing mechanism (1). The mixing mechanism (1) performs mixing, the rotating mechanism (2) drives the brushing mechanism (3), the brushing mechanism (3) performs brushing, the drying mechanism (4) performs drying, and the flushing mechanism (5) performs flushing.

2. The raw material proportion mixer for a photovoltaic silicon wafer cleaning agent according to claim 1, characterized in that, The mixing mechanism (1) includes a mixing bin (11), a feed inlet (12), a discharge channel (13) and a sealing cover (14). The feed inlet (12) is installed at the left end of the mixing bin (11), the discharge channel (13) is installed at the lower end of the mixing bin (11), and the sealing cover (14) is hinged to the output end of the discharge channel (13).

3. The raw material proportion mixer for a photovoltaic silicon wafer cleaning agent according to claim 2, characterized in that, The rotating mechanism (2) includes a rotating frame (21), a motor (22), a main gear (23) and a driven gear (24). The rotating frame (21) is rotatably installed in the mixing bin (11), and the input end of the rotating frame (21) extends to the upper side of the mixing bin (11). The motor (22) is installed at the upper end of the mixing bin (11). The main gear (23) is connected to the output end of the motor (22), the driven gear (24) is connected to the input end of the rotating frame (21), and the main gear (23) meshes with the driven gear (24).

4. The mixing machine for raw material ratio of a photovoltaic silicon wafer cleaning agent according to claim 3, characterized in that, The brushing mechanism (3) includes a pipe rack (31), a spring (32) and two groups of brushes (33). The pipe rack (31) is rotatably installed on the rotating frame (21), and the pipe rack (31) is connected to the rotating frame (21) through the spring (32). The two groups of brushes (33) are rotatably installed on the pipe rack (31).

5. The mixing machine for raw material ratio of a photovoltaic silicon wafer cleaning agent according to claim 2, wherein The drying mechanism (4) includes a drying box (41), a one-way valve (42) and a blower (43). The drying box (41) is connected to the discharge channel (13) through the one-way valve (42), and the blower (43) is installed at the front end of the drying box (41).

6. The raw material proportion mixer for a photovoltaic silicon wafer cleaning agent according to claim 2, characterized in that, The flushing mechanism (5) includes a water tank (51), a pump (52), a spray head (53) and a water pipe (54). The water tank (51) is installed at the lower end of the mixing bin (11), the pump (52) is installed at the rear end of the water tank (51), the spray head (53) is installed in the mixing bin (11), and the output end of the pump (52) is connected to the input end of the spray head (53) through the water pipe (54).

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