Ultrasonic cleaning box for wafer cleaning

Abstract

The utility model relates to the field of machinery, in particular to an ultrasonic cleaning box for wafer cleaning, which comprises a main body, a support frame, a handle A, a worm, a worm gear and the like. The main body is fixedly connected with a supporting frame, the handle A is fixedly connected with a worm, the worm is rotatably connected to the supporting frame, the worm gear is slidably connected with the main body, the main body is fixedly connected with a fixing shaft, the fixing shaft is rotatably connected with the worm gear, and the worm is meshed with the worm gear. The limiting rod is pulled out to enable the spring arranged on the limiting rod in a sleeving mode to be compressed, the limiting rod completes limiting of the wafer rack through spring-back pressure of the spring, the effect of reducing shaking of the wafer rack in the cleaning process is achieved, and the effect of protecting wafers from being abraded in the cleaning process is achieved.

Description

Technical Field

[0001] The utility model relates to the field of machinery, in particular to an ultrasonic cleaning tank for wafer cleaning. Background Technique

[0002] Ultrasonic technology is used for cleaning. With the continuous maturity of the technology, it is widely used in many industrial fields. In the semiconductor manufacturing field, ultrasonic cleaning technology is particularly important because it can effectively remove particles, metal impurities, organic substances and other contaminants on the wafer surface. Ultrasonic cleaning machines have higher cleaning efficiency, shorter cleaning time, and lower energy consumption and chemical usage, as well as ultrasonic power control, etc., to further improve the cleaning effect and efficiency.

[0003] In the existing wafer ultrasonic cleaning tank, when cleaning the wafer, since the size of the wafer is much smaller than that of the cleaning tank, the wafer rack will shake with the screen cage during the cleaning process, which may cause the internal wafers to rub against the wafer rack, resulting in wear of the wafers during the cleaning process. Content of the Utility Model

[0004] In order to overcome the above-mentioned disadvantages that the wafer rack shakes with the screen cage during the cleaning process and is prone to abrasion of the wafers, the technical problem to be solved is to provide an ultrasonic cleaning tank for wafer cleaning that prevents the wafer rack from shaking during use.

[0005] The technical solution is: an ultrasonic cleaning tank for wafer cleaning, including a main body, a support frame, a handle A, a worm, a worm gear, a fixed shaft, a lead screw, a screen cage, a limiting rod, a spring and a baffle. The main body is fixedly connected with the support frame. The handle A is fixedly connected with the worm. The worm is rotatably connected to the support frame. The worm gear is slidably connected to the main body. The main body is fixedly connected with the fixed shaft. The fixed shaft is rotatably connected to the worm gear. The worm and the worm gear are meshed with each other. The worm gear is in threaded cooperation with the lead screw. The bottom of the lead screw is fixedly connected with the screen cage. The screen cage is slidably connected with the limiting rod. The spring is sleeved on the limiting rod. The baffle is fixedly connected to the screen cage.

[0006] Furthermore, it also includes a rotating shaft, a soundproof window and a handle B. The main body is rotatably connected with the rotating shaft. The rotating shaft is rotatably connected with the soundproof window. The soundproof window is rotatably connected with the handle B.

[0007] Furthermore, it also includes a hook. The main body is fixedly connected with the hook.

[0008] Furthermore, it also includes moving wheels. The main body is fixedly connected with the moving wheels.

[0009] Furthermore, it also includes rubber pads. The limiting rod is fixedly connected with the rubber pads.

[0010] Furthermore, it also includes glove guards. The handle A is fixedly connected with the glove guards.

[0011] The utility model has the following advantages: 1. By pulling out the limit rod, the spring sleeved on the limit rod is compressed, and the pressure of the spring's rebound enables the limit rod to complete the limitation of the wafer holder, which reduces the shaking of the wafer holder during the cleaning process and achieves the effect of protecting the wafer from being scratched during the cleaning process.

[0012] 2. By driving the soundproof window to rotate through the rotating shaft and turning the handle B to the right to open the soundproof window, it plays the role of opening or closing the soundproof window and achieves the effect of improving the comfort of the operator.

[0013] 3. Through the rubber pad, it plays the role of preventing the wafer holder from sliding and achieves the effect of better clamping the wafer holder. Description of the Drawings

[0014] Figure 1 It is a three-dimensional structural schematic diagram of the utility model.

[0015] Figure 2 It is a three-dimensional structural schematic diagram of the screen cage, spring and limit rod of the utility model.

[0016] Figure 3 It is a three-dimensional structural schematic diagram of the baffle, limit rod and spring of the utility model.

[0017] In the above drawings: 1: main body, 2: support frame, 3: handle A, 4: worm, 5: worm gear, 6: fixed shaft, 7: lead screw, 8: screen cage, 9: limit rod, 10: spring, 11: baffle, 12: rotating shaft, 13: soundproof window, 14: handle B, 15: hook, 16: moving wheel, 17: rubber pad, 18: glove. Detailed Embodiment

[0018] To make the purpose, technical solution and advantages of the utility model clearer, the utility model will be further described in detail below in conjunction with the detailed embodiment and with reference to the drawings. It should be understood that these descriptions are exemplary and are not intended to limit the scope of the utility model. In addition, in the following description, the description of well-known structures and technologies is omitted to avoid unnecessarily confusing the concept of the utility model.

[0019] Embodiment: An ultrasonic cleaning tank for wafer cleaning, as Figures 1-3As shown in the figure, it includes a main body 1, a support frame 2, a handle A 3, a worm 4, a worm gear 5, a fixed shaft 6, a lead screw 7, a screen cage 8, a limit rod 9, a spring 10 and a baffle 11. The main body 1 is fixedly connected to the support frame 2. The handle A 3 is fixedly connected to the worm 4. The worm 4 is rotatably connected to the support frame 2. The worm gear 5 is slidably connected to the main body 1. The main body 1 is fixedly connected to the fixed shaft 6. The fixed shaft 6 is rotatably connected to the worm gear 5. The worm 4 meshes with the worm gear 5. The worm gear 5 is in threaded cooperation with the lead screw 7. The bottom of the lead screw 7 is fixedly connected to the screen cage 8. The screen cage 8 is slidably connected to the limit rod 9. The spring 10 is sleeved on the limit rod 9. The baffle 11 is fixedly connected to the screen cage 8.

[0020] When an operator needs to clean the wafer, after manually placing the wafer into the wafer holder, then put the wafer holder with the wafer into the screen cage 8, and manually pull out the limit rod 9. Since the spring 10 is sleeved on the limit rod 9, the spring 10 is compressed when pulling out the limit rod 9. Therefore, under the resilience of the spring 10, the limit rod 9 can fix the wafer holder. There is a baffle 11 on the screen cage 8 that can block the wafer holder to prevent the wafer from falling off. After the wafer holder is fixed, the operator manually rotates the handle A 3 to drive the worm 4 to rotate clockwise. The worm 4 meshes with the worm gear 5, and the worm gear 5 will also rotate clockwise. The worm gear 5 is in threaded cooperation with the lead screw 7. There is a groove on the worm gear 5. One end of the fixed shaft 6 is fixed to the main body 1, and the other end of the fixed shaft 6 slides in the groove of the worm gear 5, which can limit the worm gear 5 from deviating. The worm gear 5 and the lead screw 7 are in threaded cooperation. When the worm gear 5 rotates, the lead screw 7 moves downward. The bottom of the lead screw 7 is fixed to the top of the screen cage 8. So when rotating the handle A 3, the lead screw 7 moves downward to drive the screen cage 8 to move downward until the screen cage 8 completely enters the cleaning tank, and then the wafer can be cleaned, which reduces the shaking of the wafer holder during the cleaning process and achieves the effect of protecting the wafer from being scratched during the cleaning process.

[0021] As Figure 1 shown, it further includes a rotating shaft 12, a soundproof window 13 and a handle B 14. The main body 1 is rotatably connected to the rotating shaft 12. The rotating shaft 12 is rotatably connected to the soundproof window 13. The soundproof window 13 is rotatably connected to the handle B 14.

[0022] When the operator places the screen, close the soundproof window 13. The rotating shaft 12 drives the soundproof window 13 to rotate, and the handle B 14 rotates to the right to lock. When opening the cleaning box, manually rotate the handle B 14 in the soundproof window 13. Since there is a latch in the handle B 14, which is connected to a small groove in the main body 1 and blocks the soundproof window 13 from being opened, it can be opened by rotating to the right, which plays the role of opening or closing the soundproof window 13 and achieves the effect of improving the comfort of the operator.

[0023] As Figure 1As shown in the figure, it further includes a hook 15, and the main body 1 is fixedly connected with the hook 15.

[0024] The hook 15 plays a role in facilitating the placement of items, achieving the effect of improving the convenience of using the device.

[0025] As Figure 1 shown in the figure, it further includes a moving wheel 16, and the main body 1 is fixedly connected with the moving wheel 16.

[0026] The moving wheel 16 plays an effect of facilitating movement, achieving the effect of increasing the transfer performance of the device.

[0027] As Figure 1 shown in the figure, it further includes a rubber pad 17, and the limiting rod 9 is fixedly connected with the rubber pad 17.

[0028] The rubber pad 17 plays a role in preventing the wafer holder from sliding, achieving a better effect of clamping the wafer holder.

[0029] As Figure 1 shown in the figure, it further includes a glove 18, and the handle A3 is fixedly connected with the glove 18.

[0030] The glove 18 plays a role in isolating the contact of the user's hand with the device, achieving the effect of effectively protecting the operator's hand.

[0031] Finally, it should be noted that the above are only the preferred embodiments of the present invention and are not used to limit the present invention. Although the present invention has been described in detail with reference to the foregoing embodiments, for those skilled in the art, they can still modify the technical solutions recorded in the foregoing embodiments, or perform equivalent replacements on some of the technical features. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. An ultrasonic cleaning tank for wafer cleaning, comprising a main body (1) and a support frame (2), the main body (1) is fixedly connected to the support frame (2), and is characterized in that, It further includes a handle A (3), a worm (4), a worm wheel (5), a fixed shaft (6), a lead screw (7), a screen cage (8), a limit rod (9), a spring (10) and a baffle (11). The handle A (3) is fixedly connected to the worm (4), the worm (4) is rotatably connected to the support frame (2), the worm wheel (5) is slidably connected to the main body (1), the main body (1) is fixedly connected to the fixed shaft (6), the fixed shaft (6) is rotatably connected to the worm wheel (5), the worm (4) is meshed with the worm wheel (5), the worm wheel (5) is in threaded cooperation with the lead screw (7), the bottom of the lead screw (7) is fixedly connected to the screen cage (8), the screen cage (8) is slidably connected to the limit rod (9), the spring (10) is sleeved on the limit rod (9), and the baffle (11) is fixedly connected to the screen cage (8).

2. The ultrasonic cleaning tank for wafer cleaning according to claim 1, characterized in that, It further includes a rotating shaft (12), a soundproof window (13) and a handle B (14). The rotating shaft (12) is rotatably connected to the main body (1), the soundproof window (13) is rotatably connected to the rotating shaft (12), and the handle B (14) is rotatably connected to the soundproof window (13).

3. The ultrasonic cleaning tank for wafer cleaning according to claim 2, characterized in that, It further includes a hook (15), and the main body (1) is fixedly connected to the hook (15).

4. The ultrasonic cleaning tank for wafer cleaning according to claim 3, characterized in that, It further includes moving wheels (16), and the main body (1) is fixedly connected to the moving wheels (16).

5. The ultrasonic cleaning tank for wafer cleaning according to claim 4, characterized in that, It further includes a rubber pad (17), and the limit rod (9) is fixedly connected to the rubber pad (17).

6. The ultrasonic cleaning tank for wafer cleaning according to claim 5, characterized in that, It further includes a glove protector (18), and the handle A (3) is fixedly connected to the glove protector (18).

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