Gas diffusion chamber structure

Abstract

The utility model belongs to the technical field of semiconductor gas supply, and particularly relates to a gas diffusion chamber structure which comprises a diffusion chamber main body and a layered diffusion plate assembly, and the layered diffusion plate assembly comprises a lower layer fixing plate and an upper layer adjusting plate. By adjusting the upper-layer adjusting plate and changing the relative position of the upper-layer adjusting plate and the lower-layer fixing plate, the diffusion ports B of the upper-layer adjusting plate completely, partially or completely keep away from the corresponding diffusion ports A in the lower-layer fixing plate; and thus, the gas forms specified density distribution in the process cavity after passing through the cavity and going out from the diffusion ports B and the diffusion ports A. According to the layered diffusion plate assembly, compared with an original independent diffusion plate of an integral plate-shaped structure, the size of the drift diameter of gas flowing out through the diffusion opening B and the diffusion opening A can be changed, and then adjustment can be carried out according to specified density distribution required by different working conditions.

Description

Technical Field

[0001] The utility model belongs to the technical field of semiconductor gas supply, in particular to a gas diffusion chamber structure. Background Art

[0002] In semiconductor equipment, process gases are usually introduced to react and be used for various operations. Gases generally pass through a diffusion chamber before entering the process chamber of the semiconductor equipment. When the gas leaves the diffusion chamber, it needs to reach a specified density distribution. The current diffusion chamber structure is as follows: Figure 1 As shown, it generally includes a diffusion chamber body 001 and a diffusion plate 002. A gas passage cavity is formed on the inner side of the diffusion chamber body 001. The diffusion chamber body 001 has an air inlet port 0011 and an air outlet port 0012. The air inlet port 0011 and the air outlet port 0012 of the diffusion chamber body 001 are respectively connected to the gas passage cavity of the diffusion chamber body 001. The diffusion plate 002 is installed on the air outlet port 0012 of the diffusion chamber body 001, and a plurality of air outlet holes are opened on the diffusion plate 002.

[0003] In the prior art, the diffuser plate 002 is generally a single integral plate structure, which cannot be adjusted according to the specified density distribution required by different working conditions, thereby making the entire device unable to adapt well to other working conditions and having poor applicability. Utility Model Content

[0004] In view of the above problems, the purpose of the present invention is to provide a gas diffusion chamber structure.

[0005] The purpose of this utility model is achieved through the following technical solutions:

[0006] A gas diffusion chamber structure includes a diffusion chamber body, a gas passage cavity formed inside the diffusion chamber body, the diffusion chamber body having an air inlet port and an air outlet port, the air inlet port and the air outlet port of the diffusion chamber body respectively communicating with the gas passage cavity of the diffusion chamber body, and further includes a layered diffusion plate assembly, the layered diffusion plate assembly including a lower fixed plate and an upper adjustment plate;

[0007] The lower fixed plate is installed at the gas outlet port of the diffusion chamber body, and a plurality of diffusion ports A are opened on the lower fixed plate;

[0008] The upper adjustment plate is arranged on the lower fixed plate, and the upper adjustment plate and the lower fixed plate are respectively provided with diffusion ports B at positions corresponding to the diffusion ports A.

[0009] By adjusting the upper adjustment plate and changing the relative position of the upper adjustment plate and the lower fixed plate, the diffusion ports B of the upper adjustment plate are made to completely block, partially block or completely clear the corresponding diffusion ports A on the lower fixed plate, thereby achieving a specified density distribution in the process chamber after the gas passes through the cavity and exits from the diffusion ports B and A.

[0010] The lower fixing plate is fixedly connected to the diffusion chamber body by screws.

[0011] The central axis of the lower fixed plate and the central axis of the upper adjustment plate are collinear.

[0012] The upper adjustment plate is located inside a space enclosed by the lower fixing plate and the diffusion chamber body.

[0013] The lower fixed plate is an integral structure, and is provided with multiple layers of concentrically arranged annular diffuser groups A in sequence from the center to the periphery. Each layer of the annular diffuser group A includes a plurality of diffusers A, and each diffuser A of each layer of the annular diffuser group A is located on the same circle.

[0014] The upper adjustment plate includes a concentrically arranged outer ring fixed plate, a center circle plate and several layers of inner ring plates. The center circle plate is located at the center of the upper adjustment plate as a whole. The outer side of the center circle plate is sequentially provided with the layers of inner ring plates from the outside to the inside. The outer ring fixed plate is arranged on the outer side of the inner ring plate located at the outermost layer and is fixedly connected to the lower fixed plate. The diffusion ports B are all provided at the corresponding positions of the diffusion ports A on the center circle plate and each layer of the inner ring plates and the lower fixed plate.

[0015] The central circular plate and each inner ring plate are each provided with only one layer of annular diffuser group B, and each layer of the annular diffuser group B includes a plurality of diffusers B. The arrangement positions of the diffusers B of each layer of the annular diffuser group B correspond one-to-one to the diffusers A of the corresponding layer of the annular diffuser group A.

[0016] A positioning protrusion is provided on the bottom of the central circular plate, and a positioning groove that fits with the positioning protrusion is provided on the lower fixing plate.

[0017] The outer peripheral surface of the central circular plate forms a step surface A, the inner peripheral surface of each of the inner ring plates forms a step surface B, the outer peripheral surface of each of the inner ring plates forms a step surface C, and the inner peripheral surface of the outer ring fixed plate forms a step surface D; the step surface B of the inner ring plate located in the innermost layer is used to press the step surface A of the central circular plate and press the central circular plate onto the lower fixed plate, and the step surfaces B of each of the inner ring plates except the inner ring plate located in the innermost layer are used in turn to press the step surface C of an adjacent inner ring plate located further inside and press the inner ring plate located further inside onto the lower fixed plate, and the step surface D of the outer ring fixed plate is used to press the step surface C of the inner ring plate located in the outermost layer and press the inner ring plate located in the outermost layer onto the lower fixed plate.

[0018] The outer ring fixing plate is fixedly connected to the lower fixing plate by a plurality of locking screws A, and the axial center line of each locking screw A is parallel to the central axis of the lower fixing plate.

[0019] An annular convex portion is provided at the outer peripheral edge of the lower fixing plate, and the annular convex portion is located on the outer side of the outer ring fixing plate. A plurality of locking screws B are circumferentially provided on the whole composed of the annular convex portion of the lower fixing plate and the outer ring fixing plate. The axial center line of each locking screw B is perpendicular to the central axis of the lower fixing plate, and one end of each locking screw B respectively abuts against the inner ring plate located at the outermost layer when the locking screw B is tightened.

[0020] The advantages and positive effects of this utility model are:

[0021] 1. The utility model adopts the arrangement of a layered diffuser plate assembly, which can change the diameter of the gas flowing out through the diffuser port B and the diffuser port A, compared with the original diffuser plate with a single integral plate structure, and can thus be adjusted according to the specified density distribution required by different working conditions.

[0022] 2. The utility model has a structure of an upper adjustment plate including an outer ring fixed plate, a central circular plate and a plurality of layers of inner ring plates, and can further adjust the density distribution of the output gas in different regions as needed, thus having better applicability. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 A schematic diagram of a diffusion chamber structure in the prior art;

[0024] Figure 2 This is a structural diagram of the diffusion chamber structure of the present invention;

[0025] Figure 3 This is a schematic top view of the structure of the layered diffuser plate assembly of the present invention;

[0026] Figure 4 This is a bottom view of the structure of the layered diffuser plate assembly of the present invention;

[0027] Figure 5 This is a schematic cross-sectional view of the layered diffuser plate assembly of the present invention;

[0028] Figure 6 This is a schematic diagram of the top view of the central circle plate of the utility model;

[0029] Figure 7 This is a schematic diagram of the cross-sectional structure of the central circle plate of the present invention;

[0030] Figure 8 This is a schematic diagram of the top view of the inner ring plate of the present invention;

[0031] Figure 9 This is a schematic diagram of a partial cross-sectional structure of the inner ring plate of the present utility model;

[0032] Figure 10 This is a schematic diagram of the top view of the outer ring fixed plate of the utility model;

[0033] Figure 11 This is a schematic diagram of a partial cross-sectional structure of the outer ring fixed plate of the utility model;

[0034] Figure 12 for Figure 5 A magnified view of point A;

[0035] Figure 13 for Figure 5 Enlarged view of point B;

[0036] Figure 14 This is a schematic diagram of the external structure of the layered diffuser plate assembly of the present utility model;

[0037] Figure 15 This is a schematic diagram of the arrangement structure of the locking screw B of the present invention.

[0038] In the figure: 001 is the diffusion chamber body, 0011 is the air inlet port, 0012 is the air outlet port, and 002 is the diffusion plate;

[0039] 1 is a layered diffuser plate assembly, 101 is a lower fixed plate, 1010 is a diffuser port A, 1011 is a positioning groove, 1012 is an annular convex edge, 102 is an upper adjustment plate, 1020 is a diffuser port B, 1021 is an outer ring fixed plate, 10211 is a step surface D, 1022 is a center circle plate, 10221 is a positioning protrusion, 10222 is a step surface A, 1023 is an inner ring plate, 10231 is a step surface B, and 10232 is a step surface C;

[0040] 2 is locking screw A, and 3 is locking screw B. DETAILED DESCRIPTION

[0041] The following is combined with Figure 2-15 The utility model is further described in detail.

[0042] A gas diffusion chamber structure, such as Figure 2-15 As shown, this embodiment includes a diffusion chamber body 001. A gas passage cavity is formed inside diffusion chamber body 001. Diffusion chamber body 001 has an inlet port 0011 and an outlet port 0012. The inlet port 0011 and the outlet port 0012 of diffusion chamber body 001 are respectively connected to the gas passage cavity of diffusion chamber body 001. In this embodiment, the structure of diffusion chamber body 001 itself adopts the existing technology.

[0043] The gas diffusion chamber structure in this embodiment also includes a layered diffuser plate assembly 1, which includes a lower fixed plate 101 and an upper adjustment plate 102. The lower fixed plate 101 is screwed to the gas outlet port 0012 of the diffusion chamber body 001. The lower fixed plate 101 is provided with a plurality of diffuser ports A 1010. The upper adjustment plate 102 is disposed on the lower fixed plate 101 and is located within the space enclosed by the lower fixed plate 101 and the diffusion chamber body 001. The central axis of the lower fixed plate 101 and the central axis of the upper adjustment plate 102 are collinear. Diffuser ports B 1020 are provided on the upper adjustment plate 102 at locations corresponding to the diffuser ports A 1010 on the lower fixed plate 101. The layered diffuser plate assembly 1 may also include a multi-layer plate structure.

[0044] By adjusting the upper adjustment plate 102 and changing the relative position of the upper adjustment plate 102 and the lower fixed plate 101, the diffusers B 1020 of the upper adjustment plate 102 are made to completely block, partially block, or completely clear the corresponding diffusers A 1010 on the lower fixed plate 101, thereby changing the diameter of the gas flowing out through the diffusers B 1020 and A 1010, thereby achieving a specified density distribution in the process chamber after the gas passes through the diffusers B 1020 and A 1010 in the chamber.

[0045] Specifically, in this embodiment, the lower fixed plate 101 is a one-piece structure. Eleven concentrically arranged annular diffuser groups A are formed on the lower fixed plate 101, sequentially from the center toward the periphery. Each annular diffuser group A includes a plurality of diffusers A 1010 evenly spaced along the circumference. Each diffuser A 1010 in each annular diffuser group A is located on the same circle to achieve basic uniform airflow. The number of annular diffuser groups A and the specific number of diffusers A 1010 included in each annular diffuser group A can be selected based on usage requirements. The upper adjustment plate 102 can be simply formed as a single, one-piece plate. In this case, by moving the entire upper adjustment plate 102 to adjust its relative position to the lower fixed plate 101, the density distribution of gas in the process chamber after exiting the diffusers B 1020 and A 1010 can be easily altered.

[0046] like Figure 3-13 As shown, in this embodiment, the upper adjustment plate 102 includes a concentrically arranged outer ring fixed plate 1021, a central circular plate 1022, and ten layers of inner ring plates 1023. The central circular plate 1022 is located at the center of the upper adjustment plate 102 as a whole. The outer side of the central circular plate 1022 is sequentially provided with layers of inner ring plates 1023 from the outside to the inside. The outer ring fixed plate 1021 is provided on the outer side of the inner ring plate 1023 located in the outermost layer and is fixedly connected to the lower fixed plate 101. Diffuser ports B 1020 are provided on the central circular plate 1022 and the layers of inner ring plates 1023 at locations corresponding to the diffuser ports A 1010 on the lower fixed plate 101.

[0047] In this embodiment, only one annular diffuser group B is provided on the central circular plate 1022 and each inner ring plate 1023. Each annular diffuser group B includes a plurality of diffusers B 1020. The positions of the diffusers B 1020 in each annular diffuser group B correspond one-to-one with the diffusers A 1010 in the corresponding annular diffuser group A. The number of inner ring plates 1023 provided and the specific number of annular diffuser groups B provided on each inner ring plate 1023 can also be selected based on usage requirements.

[0048] Specifically, if Figure 7 and Figure 12 As shown, in this embodiment, a positioning protrusion 10221 is protruded from the bottom of the center circular plate 1022, and a positioning groove 1011 is formed on the lower fixing plate 101 to fit with the positioning protrusion 10221, so as to facilitate the installation and positioning of the center circular plate 1022.

[0049] Specifically, if Figure 3-13As shown, in this embodiment, the outer circumferential surface of the central circular plate 1022 forms a step surface A10222, the inner circumferential surface of each inner ring plate 1023 forms a step surface B 10231, the outer circumferential surface of each inner ring plate 1023 forms a step surface C 10232, and the inner circumferential surface of the outer ring fixed plate 1021 forms a step surface D 10211. The step surface B 10231 of the inner ring plate 1023 located in the innermost layer is used to press the step surface A 10222 of the center circular plate 1022 and press the center circular plate 1022 onto the lower fixed plate 101. The step surfaces B 10231 of each inner ring plate 1023 except the inner ring plate 1023 located in the innermost layer are used in turn to press the step surface C 10232 of an adjacent inner ring plate 1023 located further inward and press the inner ring plate 1023 located further inward onto the lower fixed plate 101. The step surface D 10211 of the outer ring fixed plate 1021 is used to press the step surface C 10232 of the inner ring plate 1023 located in the outermost layer and press the inner ring plate 1023 located in the outermost layer onto the lower fixed plate 101. The coordinated arrangement of step surface A 10222, step surface B 10231, step surface C 10232, and step surface D 10211 allows the central circular plate 1022 and each layer of inner ring plates 1023 to rotate relative to each other while remaining stably secured to the lower fixed plate 101. The specific shapes of step surface A 10222, step surface B 10231, step surface C 10232, and step surface D 10211 can be adjusted as needed based on usage.

[0050] Specifically, if Figure 3 As shown, in this embodiment, the outer ring fixing plate 1021 is fixed to the lower fixing plate 101 by six locking screws A2. The axial center lines of each locking screw A2 are parallel to the central axis of the lower fixing plate 101, which facilitates assembly and disassembly and effectively enables the outer ring fixing plate 1021 to press the step surface C 10232 of the outermost inner ring plate 1023. Figure 14 and Figure 15As shown, an annular convex portion 1012 is protruded from the outer peripheral edge of the lower fixing plate 101, and the annular convex portion 1012 is located on the outside of the outer ring fixing plate 1021. A plurality of locking screws B3 are circumferentially provided on the entire body composed of the annular convex portion 1012 of the lower fixing plate 101 and the outer ring fixing plate 1021. The axial center line of each locking screw B3 is perpendicular to the central axis of the lower fixing plate 101. When the locking screw B3 is tightened, one end of each locking screw B3 respectively abuts against the inner ring plate 1023 located at the outermost layer, which can further ensure the pressing effect of the outer ring fixing plate 1021 on the step surface C 10232 of the inner ring plate 1023 located at the outermost layer. To adjust the degree to which diffuser ports B 1020 obstruct corresponding diffuser ports A 1010, first loosen the locking screws A 2 and B 3, then rotate the central circular plate 1022 and each inner ring plate 1023 to adjust their angular positions. This allows for regional adjustment of the output gas density distribution as needed, improving applicability. After adjustment, re-tighten the locking screws A 2 and B 3 to maintain the different positions of the central circular plate 1022 and each inner ring plate 1023.

Claims

1. A gas diffusion chamber structure, comprising a diffusion chamber body (001), wherein a gas passage cavity is formed on the inner side of the diffusion chamber body (001), the diffusion chamber body (001) having an air inlet port (0011) and an air outlet port (0012), the air inlet port (0011) and the air outlet port (0012) of the diffusion chamber body (001) being respectively connected to the gas passage cavity of the diffusion chamber body (001), characterized in that: It also includes a layered diffuser plate assembly (1), wherein the layered diffuser plate assembly (1) includes a lower fixed plate (101) and an upper adjustment plate (102); The lower fixed plate (101) is installed at the gas outlet port (0012) of the diffusion chamber body (001), and a plurality of diffusion ports A (1010) are provided on the lower fixed plate (101); The upper adjustment plate (102) is arranged on the lower fixed plate (101), and diffusion ports B (1020) are respectively provided at locations corresponding to the diffusion ports A (1010) provided on the upper adjustment plate (102) and the lower fixed plate (101); By adjusting the upper adjustment plate (102) and changing the relative position of the upper adjustment plate (102) and the lower fixed plate (101), each diffusion port B (1020) of the upper adjustment plate (102) completely blocks, partially blocks or completely clears the corresponding each diffusion port A (1010) on the lower fixed plate (101), thereby achieving a specified density distribution in the process chamber after the gas in the cavity exits from each diffusion port B (1020) and the diffusion port A (1010).

2. A gas diffusion chamber structure according to claim 1, characterized in that: The lower fixing plate (101) is fixedly connected to the diffusion chamber body (001) by screws.

3. The gas diffusion chamber structure according to claim 1, wherein: The central axis of the lower fixed plate (101) and the central axis of the upper adjustment plate (102) are collinear.

4. The gas diffusion chamber structure according to claim 1, wherein: The upper adjustment plate (102) is located inside the space enclosed by the lower fixed plate (101) and the diffusion chamber body (001).

5. The gas diffusion chamber structure according to claim 1, wherein: The lower fixed plate (101) is an integral structure, and multiple layers of concentrically arranged annular diffuser groups A are sequentially opened on the lower fixed plate (101) from the center to the periphery, each layer of the annular diffuser group A includes a plurality of diffuser ports A (1010), and each diffuser port A (1010) of each layer of the annular diffuser group A is located on the same circle; The upper adjustment plate (102) comprises a concentrically arranged outer ring fixed plate (1021), a central circular plate (1022) and a plurality of layers of inner ring plates (1023); the central circular plate (1022) is located at the center of the upper adjustment plate (102); the outer side of the central circular plate (1022) is sequentially provided with layers of the inner ring plates (1023) from the outside to the inside; the outer ring fixed plate (1021) is provided on the outer side of the inner ring plate (1023) located at the outermost layer and is fixedly connected to the lower fixed plate (101); the central circular plate (1022) and the layers of the inner ring plates (1023) are all provided with the diffusion ports B (1020) at positions corresponding to the diffusion ports A (1010) on the lower fixed plate (101).

6. A gas diffusion chamber structure according to claim 5, characterized in that: The central circular plate (1022) and each inner ring plate (1023) are each provided with only one layer of annular diffuser group B, each layer of the annular diffuser group B comprising a plurality of diffusers B (1020), and the arrangement positions of the diffusers B (1020) of each layer of the annular diffuser group B correspond one-to-one to the diffusers A (1010) of the corresponding layer of the annular diffuser group A.

7. The gas diffusion chamber structure according to claim 5, characterized in that: A positioning protrusion (10221) is provided on the bottom of the central circular plate (1022), and a positioning groove (1011) is provided on the lower fixed plate (101) to fit with the positioning protrusion (10221).

8. The gas diffusion chamber structure according to claim 5, characterized in that: The outer circumference of the central circular plate (1022) forms a step surface A (10222), the inner circumference of each inner ring plate (1023) forms a step surface B (10231), the outer circumference of each inner ring plate (1023) forms a step surface C (10232), and the inner circumference of the outer ring fixed plate (1021) forms a step surface D (10211); the step surface B (10231) of the inner ring plate (1023) located in the innermost layer is used to press the step surface A (10222) of the central circular plate (1022) and press the central circular plate (1022) onto the lower fixed plate (1021). 1), the step surface B (10231) of each of the inner ring plates (1023) except the inner ring plate (1023) located in the innermost layer is used to press the step surface C (10232) of an adjacent inner ring plate (1023) located further inward, and press the inner ring plate (1023) located further inward onto the lower fixed plate (101), and the step surface D (10211) of the outer ring fixed plate (1021) is used to press the step surface C (10232) of the inner ring plate (1023) located in the outermost layer, and press the inner ring plate (1023) located in the outermost layer onto the lower fixed plate (101).

9. The gas diffusion chamber structure according to claim 8, characterized in that: The outer ring fixing plate (1021) is fixedly connected to the lower fixing plate (101) via a plurality of locking screws A (2), and the axial center line of each locking screw A (2) is parallel to the central axis of the lower fixing plate (101).

10. The gas diffusion chamber structure according to claim 5, characterized in that: An annular convex portion (1012) is provided at the outer peripheral edge of the lower fixed plate (101), and the annular convex portion (1012) is located outside the outer ring fixed plate (1021). The annular convex portion (1012) of the lower fixed plate (101) and the outer ring fixed plate (1021) are integrally provided with a plurality of locking screws B (3) along the circumferential direction, and the axial center line of each locking screw B (3) is perpendicular to the central axis of the lower fixed plate (101). When the locking screw B (3) is tightened, one end of each locking screw B (3) respectively abuts against the inner ring plate (1023) located at the outermost layer.

Images