Spraying device of MOCVD (Metal Organic Chemical Vapor Deposition) equipment

Abstract

The utility model discloses a spraying device of MOCVD (Metal Organic Chemical Vapor Deposition) equipment, which comprises a reaction chamber and a spraying device, the spraying device comprises a spraying device body, the spraying device body is arranged in the reaction chamber, a partition plate is integrally formed on the inner side wall of the spraying device body, and the partition plate is arranged on the inner side wall of the spraying device body. A partition plate is arranged in the spraying device body and divides the spraying device body into a first flow equalizing chamber and a second flow equalizing chamber, a flow equalizing plate is rotationally connected between the first flow equalizing chamber and the second flow equalizing chamber, and the outer side wall of the flow equalizing plate abuts against the inner side wall of the spraying device body. The reaction gas is primarily shunted through the shunting device, then the flow equalizing plate further mixes and equalizes the flow in a rotating manner, and finally the reaction gas is sprayed out after being mixed and equalized through the flow equalizing holes in the bottom of the spraying device, and meanwhile, the reaction gas is more uniformly released in the reaction chamber through the rotating manner of the spraying device; therefore, the utilization rate of the air source is improved, and the product quality is further improved.

Description

Technical Field

[0001] The utility model belongs to the technical field of MOCVD equipment, and in particular relates to a spray device of MOCVD equipment. Background Art

[0002] The reaction chamber showerhead is a crucial component of MOCVD equipment, primarily used to spray reactive gases into the reaction chamber to enable semiconductor material growth. MOCVD is a vapor-phase growth technique that introduces metal-organic compounds, gaseous elements, and a carrier gas into the reaction chamber, generating a chemical reaction that causes the semiconductor material to grow on the substrate surface. The design of the showerhead directly influences the distribution and diffusion rate of the compounds in the reaction chamber, and thus the quality and performance of the material.

[0003] Existing MOCVD reaction chambers mostly use a vertical air intake showerhead structure, but the existing showerhead structure has poor gas mixing uniformity, uneven flow field and low gas source utilization, which affects product quality.

[0004] The information disclosed in this background technology section is only intended to increase the understanding of the overall background of the present invention, and should not be regarded as an admission or any form of suggestion that the information constitutes the prior art already known to those skilled in the art. Utility Model Content

[0005] The purpose of the utility model is to provide a spray device for MOCVD equipment, which can solve the problem of uneven mixing of reaction gases caused by structural problems of the spray head.

[0006] In order to achieve the above-mentioned purpose, the technical solution provided by a specific embodiment of the present invention is as follows:

[0007] A spray device for MOCVD equipment, comprising:

[0008] A reaction chamber is used for performing MOCVD process.

[0009] The spray device includes a spray device body installed in the reaction chamber to supply reactant gas into the reaction chamber through the spray device body. A partition plate is integrally formed on the inner sidewall of the spray device body. The partition plate divides the spray device body into a first flow balancing chamber and a second flow balancing chamber. The first and second flow balancing chambers perform secondary homogenization on the reactant gas delivered into the spray device body, thereby evenly releasing the reactant gas into the reaction chamber. A flow equalizing plate is rotatably connected between the first flow equalizing chamber and the second flow equalizing chamber, so that the reaction gas in the first flow equalizing chamber enters the second flow equalizing chamber after being equalized by the flow equalizing plate. At the same time, the flow equalizing plate can be rotated between the first flow equalizing chamber and the second flow equalizing chamber, so that when the gas enters the second flow equalizing chamber through the flow equalizing plate, when the airflow distribution on the flow equalizing plate is uneven, the flow equalizing plate will rotate under the action of the reaction gas pressure due to the uneven airflow, so as to adjust the distribution of the airflow by rotating the flow equalizing plate, so that the airflow in the first flow equalizing chamber enters the second flow equalizing chamber evenly. The outer wall of the flow equalizing plate abuts against the inner wall of the spray device body, so that the airflow in the first flow equalizing chamber will not flow through the outer edge of the flow equalizing plate. A plurality of first flow equalizing holes are evenly opened on the flow equalizing plate, so that the airflow flows through the first flow equalizing holes on the flow equalizing plate. The bottom wall of the spray device body is uniformly provided with multiple second equalizing holes. These holes allow the reactant gas entering the second equalizing chamber to be evenly distributed again before entering the reaction chamber. This allows the reactant gas to be evenly released into the reaction chamber, resulting in uniform contact with the surface of the product within the reaction chamber, allowing the reactant gas to be evenly deposited on the product surface during the MOCVD process. A diverter device is mounted on the inner wall of the air inlet of the spray device body. This diverter diverts the reactant gas entering the spray device body, ensuring uniform distribution of the reactant gas within the spray device body.

[0010] In one or more embodiments of the present invention, the portion of the inner wall of the spray device body that contacts the outer wall of the flow equalizer plate is provided with a polished layer, so that the flow equalizer plate can rotate flexibly when used within the spray device body. A support rod is fixedly connected to the bottom wall of the spray device body, and the support rod is used to support the flow equalizer plate.

[0011] In one or more embodiments of the present invention, a rotating bearing is installed at the bottom of the flow equalizing plate, and the upper end of the support rod is sleeved in the rotating bearing. Under the action of the rotating bearing, the support of the flow equalizing plate by the support rod will not affect the rotation of the flow equalizing plate.

[0012] In one or more embodiments of the present invention, a plurality of first diversion holes are evenly opened on the side wall of the diversion device, and a plurality of second diversion holes are evenly opened on the bottom wall plate of the diversion device, so that the reaction gas entering the diversion device is distributed in the spray device body after being diverted through the first diversion holes and the second diversion holes, thereby making the reaction gas entering the spray device body evenly distributed through the diversion device.

[0013] In one or more embodiments of the present invention, the plurality of first diversion holes and the plurality of second diversion holes are all inclined, and the first diversion holes and the second diversion holes are both inclined in a direction away from the center of the diversion device, so that the first diversion holes and the second diversion holes divert the reaction gas in the diversion device to the surrounding areas, so as to improve the effect of diverting the reaction gas.

[0014] In one or more embodiments of the present invention, multiple groups of the second diversion holes are arranged in a ring-shaped manner, and the inclinations of the second diversion holes on different rings are arranged in a manner that gradually increases from the center of the diversion device to both sides, so that the second diversion holes divert the reaction gas to the surroundings, increasing the distribution area of the reaction gas after diversion, thereby improving the diversion effect.

[0015] In one or more embodiments of the present invention, an air intake pipe is fixedly connected to the air inlet of the spray device body, a first sealing bearing is installed on the upper end wall plate of the reaction chamber, and the upper end of the air intake pipe passes through the first sealing bearing and is placed on the outside of the reaction chamber. Under the action of the first sealing bearing, the air intake pipe can rotate, and the rotation of the air intake pipe can drive the spray device body to rotate, so that the mixing efficiency of the reaction gas in the spray device body is improved through the rotation of the spray device body, so that the reaction gas is released more evenly from the spray device body into the reaction chamber.

[0016] In one or more embodiments of the present invention, a rotating motor is mounted on the sidewall of the air inlet pipe located outside the reaction chamber. The rotating motor drives the air inlet pipe to rotate, thereby driving the spray device body to rotate. A gas delivery pipe is mounted on one end of the air inlet pipe located outside the reaction chamber. A second sealed bearing is mounted on the outer wall of the gas delivery pipe. The gas delivery pipe is used to deliver reactant gas to the air inlet pipe. Since the air inlet pipe needs to rotate during use, a second sealed bearing is disposed between the air inlet pipe and the gas delivery pipe to prevent rotation of the air inlet pipe from affecting the delivery of reactant gas by the gas delivery pipe. This ensures that the gas delivery pipe can normally supply reactant gas when the air inlet pipe rotates.

[0017] In one or more embodiments of the present invention, a mounting block is fixedly connected to the inner side wall of the upper end wall plate of the reaction chamber, and a sliding groove is provided in the mounting block.

[0018] In one or more embodiments of the present invention, a pair of sliders are slidably connected within the sliding groove, allowing the sliders to slide within the mounting block through the sliding groove. The bottoms of the sliders are fixedly connected to the top wall of the spray device body. When the spray device body rotates, the sliders are driven to rotate, thereby stabilizing the spray device body during rotation.

[0019] Compared with the prior art, the utility model performs preliminary diversion of the reaction gas through a diversion device, and then the equalizing plate further mixes and equalizes the flow by rotating, and finally sprays it out through the equalizing hole at the bottom of the spray device. At the same time, the spray device releases the reaction gas more evenly in the reaction chamber through rotation, thereby improving the utilization rate of the gas source and thus improving the quality of the product. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments recorded in the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0021] Figure 1 This is a front view of a spray device of an MOCVD device in one embodiment of the present invention;

[0022] Figure 2 A cross-sectional view of a spray device of an MOCVD device in one embodiment of the present invention Figure 1 ;

[0023] Figure 3 A cross-sectional view of a spray device of an MOCVD device in one embodiment of the present invention Figure 2 ;

[0024] Figure 4 This is a cross-sectional view of a spray device of an MOCVD device in one embodiment of the present invention;

[0025] Figure 5 In one embodiment of the present utility model Figure 3 Enlarged view of point A in the middle;

[0026] Figure 6 In one embodiment of the present utility model Figure 4 Enlarged view of point B in the middle;

[0027] Figure 7 This is an exploded view of the spray device and the mounting block in one embodiment of the present invention.

[0028] Description of main reference numerals:

[0029] 1-reaction chamber, 2-spraying device, 21-spraying device body, 22-partitioning plate, 23-first flow equalizing chamber, 24-second flow equalizing chamber, 25-flow equalizing plate, 26-first flow equalizing hole, 27-second flow equalizing hole, 28-support rod, 29-rotating bearing, 210-diverter device, 211-first diverter hole, 212-second diverter hole, 213-inlet pipe, 214-first sealed bearing, 215-rotating motor, 216-air delivery pipe, 217-second sealed bearing, 218-mounting block, 219-sliding groove, 220-slider. DETAILED DESCRIPTION

[0030] In order to enable those skilled in the art to better understand the technical solutions of the present invention, the following will be combined with the drawings of the embodiments of the present invention to clearly and completely describe the technical solutions of the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts should fall within the scope of protection of the present invention.

[0031] like Figures 1 to 4 As shown, a spray device of an MOCVD device in one embodiment of the present invention includes a reaction chamber 1 and a spray device 2.

[0032] Specifically, the MOCVD process is performed in the reaction chamber 1 .

[0033] like Figures 2 to 5As shown, the spray device 2 includes a spray device body 21, which is installed in the reaction chamber 1 so as to supply reaction gas into the reaction chamber 1 through the spray device body 21. A partition plate 22 is integrally formed on the inner side wall of the spray device body 21. The partition plate 22 divides the spray device body 21 into a first flow balancing chamber 23 and a second flow balancing chamber 24. The reaction gas delivered to the spray device body 21 is mixed and homogenized multiple times through the first flow balancing chamber 23 and the second flow balancing chamber 24, so that the reaction gas can be evenly released into the reaction chamber 1. A flow equalizing plate 25 is rotatably connected between the first flow equalizing chamber 23 and the second flow equalizing chamber 24, so that the reaction gas in the first flow equalizing chamber 23 enters the second flow equalizing chamber 24 after being equalized through the flow equalizing plate 25. At the same time, the flow equalizing plate 25 can rotate between the first flow equalizing chamber 23 and the second flow equalizing chamber 24, so that when the gas enters the second flow equalizing chamber 24 through the flow equalizing plate 25, when the airflow distribution on the flow equalizing plate 25 is uneven, the flow equalizing plate 25 will rotate under the action of the reaction gas pressure due to the uneven airflow, so as to adjust the distribution of the airflow through the rotation of the flow equalizing plate 25, so that the airflow in the first flow equalizing chamber 23 enters the second flow equalizing chamber 24 evenly. The outer wall of the flow equalizing plate 25 abuts against the inner wall of the spray device body 21, so that the airflow in the first flow equalizing chamber 23 does not flow through the outer edge of the flow equalizing plate 25.

[0034] Further, such as Figure 4 and Figure 5 As shown, a plurality of first equalizing holes 26 are evenly provided on the equalizing plate 25, so that the airflow flows through the first equalizing holes 26 on the equalizing plate 25. A plurality of second equalizing holes 27 are evenly provided on the bottom wall of the spray device body 21, so that the reaction gas entering the second equalizing chamber 24 is evenly flowed again through the second equalizing holes 27 and then enters the reaction chamber 1, so that the reaction gas is evenly released into the reaction chamber 1, and the reaction gas will evenly contact the surface of the product in the reaction chamber 1, so that the reaction gas is evenly set on the surface of the product through the MOCVD process. A diverter device 210 is installed on the inner side wall of the air inlet of the spray device body 21, and the reaction gas entering the spray device body 21 is diverted by the diverter device 210, so that the reaction gas is evenly distributed in the spray device body 21.

[0035] like Figure 4 As shown, the portion of the inner wall of the spray device body 21 that contacts the outer wall of the flow equalizing plate 25 is provided with a polished layer, allowing the flow equalizing plate 25 to rotate flexibly when used in the spray device body 21. A support rod 28 is fixedly connected to the bottom wall of the spray device body 21 to support the flow equalizing plate 25.

[0036] like Figure 4 and Figure 6 As shown, a rotating bearing 29 is installed at the bottom of the equalizing plate 25, and the upper end of the support rod 28 is sleeved in the rotating bearing 29. Under the action of the rotating bearing 29, the support of the equalizing plate 25 by the support rod 28 will not affect the rotation of the equalizing plate 25.

[0037] like Figure 5 and Figure 6 As shown, a plurality of first diversion holes 211 are evenly opened on the side wall of the diversion device 210, and a plurality of second diversion holes 212 are evenly opened on the bottom wall plate of the diversion device 210, so that the reaction gas entering the diversion device 210 is diverted through the first diversion holes 211 and the second diversion holes 212 and then distributed in the spray device body 21, so that the reaction gas entering the spray device body 21 is evenly distributed through the diversion device 210.

[0038] like Figure 6 As shown, multiple first diversion holes 211 and multiple second diversion holes 212 are all arranged at an angle, and the first diversion holes 211 and the second diversion holes 212 are both arranged at an angle in a direction away from the center of the diversion device 210, so that the first diversion holes 211 and the second diversion holes 212 divert the reaction gas in the diversion device 210 to the surrounding areas, so as to improve the effect of diverting the reaction gas.

[0039] like Figure 6 As shown, multiple groups of second diversion holes 212 are arranged in a ring-shaped manner, and the inclinations of the second diversion holes 212 on different rings are arranged in a manner that becomes larger from the center of the diversion device 210 to both sides, so that the second diversion holes 212 divert the reaction gas to the surroundings, increasing the distribution area of the reaction gas after diversion, thereby improving the diversion effect.

[0040] like Figure 4 and Figure 5 As shown, an air inlet pipe 213 is fixedly connected to the air inlet of the spray device body 21, and a first sealing bearing 214 is installed on the upper end wall plate of the reaction chamber 1. The upper end of the air inlet pipe 213 passes through the first sealing bearing 214 and is placed on the outside of the reaction chamber 1. Under the action of the first sealing bearing 214, the air inlet pipe 213 can be rotated, so that the rotation of the air inlet pipe 213 can drive the spray device body 21 to rotate, so that the mixing efficiency of the reaction gas in the spray device body 21 is improved through the rotation of the spray device body 21, so that the reaction gas is more evenly released from the spray device body 21 to the reaction chamber 1.

[0041] like Figure 4 and Figure 5As shown, an air inlet pipe 213 is mounted on a sidewall outside the reaction chamber 1 and has a rotating motor 215 installed thereon. Rotating the motor 215 drives the air inlet pipe 213 to rotate, thereby driving the spray device body 21 to rotate. An air delivery pipe 216 is mounted on one end of the air inlet pipe 213, which is located outside the reaction chamber 1. A second sealed bearing 217 is mounted on the outer wall of the air delivery pipe 216. The air delivery pipe 216 is used to deliver reactant gases to the air inlet pipe 213. Since the air inlet pipe 213 needs to rotate during use, a second sealed bearing 217 is installed between the air inlet pipe 213 and the air delivery pipe 216 to prevent the rotation of the air inlet pipe 213 from affecting the delivery of reactant gases by the air delivery pipe 216. This ensures that the air delivery pipe 216 can normally supply reactant gases when the air inlet pipe 213 rotates.

[0042] As shown Figure 7 As shown, a mounting block 218 is fixedly connected to the inner side wall of the upper end wall plate of the reaction chamber 1 , and a sliding groove 219 is defined in the mounting block 218 .

[0043] like Figure 4 、 Figure 5 and Figure 7 As shown, a pair of sliders 220 are slidably connected within the sliding groove 219, so that the sliders 220 can slide within the mounting block 218 through the sliding groove 219. The bottoms of the sliders 220 are fixedly connected to the top wall panel of the spray device body 21. When the spray device body 21 rotates, the sliders 220 can be driven to rotate, so that the sliders 220 can stabilize the spray device body 21 during rotation.

[0044] When in use, the gas delivery pipe 216 delivers the reaction gas to the air inlet pipe 213, and the reaction gas is delivered to the spray device body 21 through the air inlet pipe 213. When the reaction gas enters the spray device body 21, it will first enter the diversion device 210, and the reaction gas will be diverted to the spray device body 21 through the first diversion hole 211 and the second diversion hole 212, so that the reaction gas flows in the first equalizing chamber 23, and the reaction gas will flow through the first equalizing hole 26 on the equalizing plate 25. When the airflow formed by the reaction gas is unevenly distributed on the equalizing plate 25, the pressure of the reaction gas will make the equalizer The flow plate 25 adjusts the airflow by rotating so that the airflow of the flow plate 25 is evenly distributed. After the reaction gas enters the second flow equalizing chamber 24, the reaction gas will flow out from the bottom of the spray device body 21 through the second flow equalizing hole 27, so that the reaction gas in the spray device body 21 is evenly mixed after multiple times; at the same time, the rotating motor 215 will drive the air inlet pipe 213 to rotate, and the air inlet pipe 213 will drive the spray device body 21 to rotate, thereby further making the spray device body 21 mix the reaction gas and distribute it in the reaction chamber 1, so that the reaction gas product is evenly contacted, thereby improving the quality of the product.

[0045] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above and that the present invention can be implemented in other specific forms without departing from the spirit or essential characteristics of the present invention. Therefore, the embodiments should be considered in all respects as illustrative and non-restrictive, and the scope of the present invention is defined by the appended claims, not the foregoing description, and all variations within the meaning and range of equivalents of the claims are intended to be encompassed within the present invention. Any reference sign in a claim should not be construed as limiting the claim to which it relates.

[0046] In addition, it should be understood that although this specification is described in terms of implementation methods, not every implementation method contains only one independent technical solution. This narrative method of the specification is only for the sake of clarity. Those skilled in the art should regard the specification as a whole. The technical solutions in each embodiment can also be appropriately combined to form other implementation methods that can be understood by those skilled in the art.

Claims

1. A spray device for MOCVD equipment, characterized in that: include: reaction chamber; The spray device includes a spray device body, which is installed in the reaction chamber. A partition plate is integrally formed on the inner wall of the spray device body. The partition plate divides the spray device body into a first flow equalizing chamber and a second flow equalizing chamber. A flow equalizing plate is rotatably connected between the first flow equalizing chamber and the second flow equalizing chamber. The outer wall of the flow equalizing plate abuts the inner wall of the spray device body. A plurality of first flow equalizing holes are evenly opened on the flow equalizing plate, and a plurality of second flow equalizing holes are evenly opened on the bottom wall plate of the spray device body. A diversion device is installed on the inner wall of the air inlet of the spray device body.

2. The spraying device of the MOCVD equipment according to claim 1, characterized in that: The portion where the inner wall of the spray device body contacts the outer wall of the flow equalizing plate is provided with a polishing layer, and a support rod is fixedly connected to the bottom wall plate of the spray device body.

3. The spray device of the MOCVD equipment according to claim 2, characterized in that: A rotating bearing is installed at the bottom of the flow equalizing plate, and the upper end of the support rod is sleeved in the rotating bearing.

4. The spraying device of the MOCVD equipment according to claim 1, characterized in that: A plurality of first diversion holes are evenly formed on the side wall of the diversion device, and a plurality of second diversion holes are evenly formed on the bottom wall plate of the diversion device.

5. The spraying device of the MOCVD equipment according to claim 4, characterized in that: The plurality of first diverter holes and the plurality of second diverter holes are all arranged at an inclination, and the first diverter holes and the second diverter holes are all arranged at an inclination in a direction away from the center of the diverter device.

6. The spray device of the MOCVD equipment according to claim 5, characterized in that: The second diverter holes are arranged in a plurality of groups in a ring-shaped manner, and the inclinations of the second diverter holes on different rings are arranged in a manner that increases gradually from the center of the diverter device to both sides.

7. The spray device of the MOCVD equipment according to claim 1, characterized in that: An air inlet pipe is fixedly connected to the air inlet of the spray device body, a first sealed bearing is installed on the upper end wall plate of the reaction chamber, and the upper end of the air inlet pipe passes through the first sealed bearing and is placed outside the reaction chamber.

8. The spray device of the MOCVD equipment according to claim 7, characterized in that: The air inlet pipe is placed on the side wall outside the reaction chamber and is equipped with a rotating motor. An air delivery pipe is installed at one end of the air inlet pipe placed outside the reaction chamber. A second sealed bearing is installed on the outer side wall of the air delivery pipe.

9. The spray device of the MOCVD equipment according to claim 1, characterized in that: A mounting block is fixedly connected to the inner side wall of the upper end wall plate of the reaction chamber, and a sliding groove is provided in the mounting block.

10. The spraying device of the MOCVD equipment according to claim 9, characterized in that: A pair of sliding blocks are slidably connected in the sliding groove, and the bottoms of the pair of sliding blocks are fixedly connected to the top wall plate of the spray device body.

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