Integrated current limiting control device

Abstract

The utility model provides an integrated current limiting control device, and belongs to the technical field of vacuum. The control device comprises at least one flow limiting pipeline used for conveying a medium in the medium supply system to the vacuum pump system; the vacuum pump system comprises at least one flow limiting pipeline, each flow limiting structure is arranged on the corresponding flow limiting pipeline, each flow limiting structure is provided with a flow limiting hole capable of enabling a medium to circulate, and the hole diameter of each flow limiting hole is matched with the medium flow needed by the vacuum pump system. By improving the structure, nitrogen supply and flow limiting control are integrally designed, control links are reduced, electric control and fixed throttling can be combined to achieve complex control, the overall working efficiency is improved, the complexity and maintenance cost of the system are reduced, and the equipment utilization rate is increased.

Description

Technical Field

[0001] The present disclosure belongs to the field of vacuum technology, and particularly relates to a control device with integrated current limiting. Background Art

[0002] In traditional vacuum pump applications, to meet specific process requirements, such as preventing oxidation, increasing vacuum levels, or performing specific chemical reactions, dry vacuum pumps utilize compressed air to remove gases and create a vacuum environment. Their simple structure consists of a connected upper and lower pumps, which extract gas from the vacuum chamber through the air inlet and compress the air before discharging it through the air outlet. During this process, flammable gases such as H₂ and toxic gases such as SiO₂ may remain in the chamber. In these cases, inert gas must be introduced to dilute the gas within the vacuum pump, thereby reducing the explosive gas level. To ensure stable and long-term operation, the pump must continuously be flushed with N₂ to purge the equipment and prevent the accumulation of process products. This requires a device that steadily controls the flow of nitrogen into the pump, ensuring that the volume is neither too high, which would affect the vacuum level of the vacuum pump itself, nor too low, which would prevent the required dilution effect. Furthermore, to ensure stable operation, a cooling medium is required to cool the vacuum pump system to prevent overheating and extend the equipment's service life.

[0003] However, most existing practices are to connect the nitrogen source or cooling medium to the vacuum pump through a pipe and add a solenoid valve control. This requires the coordination of electronic control, electrical appliances, and mechanical structures to achieve control in order to achieve precise control of the medium flow. In the actual control process, the medium flow is controlled by controlling the on and off of the solenoid valve. For example, after the solenoid valve is opened to allow the medium to flow for a period of time, it is necessary to close the solenoid valve for a period of time to achieve control of the medium flow. This method not only increases the complexity and cost of the system, but may also lead to problems such as decreased nitrogen purity, system leakage, poor cooling effect, and inconvenient operation.

[0004] Therefore, there is an urgent need to develop a control device that can efficiently integrate current limiting. Utility Model Content

[0005] The present disclosure aims to solve at least one of the technical problems existing in the prior art and provide a control device with integrated current limiting.

[0006] The present disclosure provides a control device with integrated current limiting, the control device comprising:

[0007] at least one flow-restricting pipeline for conveying the medium in the medium supply system to the vacuum pump system;

[0008] At least one flow limiting structure, each of the flow limiting structures is arranged in one of the flow limiting pipelines, the flow limiting structure has a flow limiting hole that allows the medium to flow, and the aperture of the flow limiting hole matches the medium flow required by the vacuum pump system.

[0009] Optionally, the current limiting structure includes a current limiting portion and a connecting portion; wherein,

[0010] The flow limiting hole is provided in the flow limiting portion;

[0011] The connecting portion is used for detachable connection with the flow limiting pipeline.

[0012] Optionally, the connecting portion is connected to the inlet of the flow limiting pipeline, the flow limiting portion is located on a side of the connecting portion away from the flow limiting pipeline, and the flow limiting portion is connected to the medium supply system.

[0013] Optionally, the control device further comprises a medium inlet pipe, wherein the medium inlet pipe comprises a medium inlet, a medium channel and at least one medium outlet which are sequentially connected along a medium flow direction;

[0014] The medium inlet is connected to the medium supply system, and each medium outlet is connected to a flow limiting pipeline via a flow limiting structure.

[0015] Optionally, the flow limiting structure is embedded in the medium inlet pipe; wherein,

[0016] The flow limiting portion is connected to the medium outlet, and the connecting portion is connected to the inlet of the flow limiting pipeline.

[0017] Optionally, the medium inlet pipe is provided with a sensor.

[0018] Optionally, the control device further includes at least one sensor, and each of the flow-limiting pipelines is provided with one such sensor.

[0019] Optionally, the pore size of the flow limiting hole is 0.15-0.55 mm; and / or,

[0020] The length of the flow limiting hole is 1-5 mm.

[0021] Optionally, the number of the flow-limiting pipelines is three or six.

[0022] Optionally, when the medium is a purge gas, the at least one flow limiting pipeline is connected to the interior of a pump body of the vacuum pump system, and the purge gas purges the interior of the pump body; or

[0023] When the medium is a cooling medium, the at least one flow limiting pipeline is connected to the outside of the pump body of the vacuum pump system, and the cooling medium cools the outside of the pump body.

[0024] The present disclosure proposes an integrated flow-limiting control device, comprising: at least one flow-limiting pipeline for conveying medium from a medium supply system to a vacuum pump system; and at least one flow-limiting structure, each of the flow-limiting structures being disposed within one of the flow-limiting pipelines, the flow-limiting structure having a flow-limiting orifice through which the medium can flow, the orifice having a diameter that matches the medium flow rate required by the vacuum pump system. By improving the structure, the present disclosure integrates nitrogen supply and flow-limiting control, reducing control links and enabling complex control through a combination of electronic control and fixed throttling. This improves overall operating efficiency, reduces system complexity and maintenance costs, and increases equipment utilization. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 This is a schematic diagram of the application principle of an integrated current limiting control device according to an embodiment of the present disclosure;

[0026] Figure 2 This is a schematic structural diagram of an integrated current limiting control device according to another embodiment of the present disclosure;

[0027] Figure 3 This is a structural schematic diagram of a medium inlet pipe and a flow limiting structure according to another embodiment of the present disclosure. DETAILED DESCRIPTION

[0028] To enable those skilled in the art to better understand the technical solutions of the present disclosure, the present disclosure is further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only used to illustrate the present disclosure and are part of the embodiments of the present disclosure, rather than all of the embodiments. Based on the embodiments of the present disclosure, all other embodiments obtained by those of ordinary skill in the art without creative work are within the scope of protection of the present disclosure.

[0029] In some descriptions of the present disclosure, the terms "include" or "comprises" and the like neither limit the mentioned shapes, numbers, steps, actions, operations and / or groups thereof, nor exclude the appearance or addition of one or more other different shapes, numbers, steps, actions, operations and / or groups thereof.

[0030] In some descriptions of the present disclosure, terms such as "install", "connect", "connected" or "fixed" and similar words are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect through an intermediate medium, and may be internal connections between two elements or mutual interactions between two elements.

[0031] In some descriptions of the present disclosure, the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings and are only used to indicate relative positional relationships. When the absolute position of the object being described changes, the relative positional relationship may also change accordingly.

[0032] like Figures 1 to 3 As shown, the present disclosure proposes an integrated flow-limiting control device 100, comprising: at least one flow-limiting pipeline 110 and at least one flow-limiting structure 120, wherein at least one flow-limiting pipeline 110 is used to transport the medium in the medium supply system 200 to the vacuum pump system 300; each flow-limiting pipeline 110 is provided with a flow-limiting structure 120, and the flow-limiting structure 120 has a flow-limiting hole that enables the medium to flow, and the aperture of the flow-limiting hole matches the medium flow required by the vacuum pump system 300.

[0033] In this embodiment, by optimizing the size of the flow limiting hole of the flow limiting structure to match the medium flow required by the vacuum pump system, the medium supply and flow limiting control are integrated into a design. That is to say, it not only realizes the long-term and uninterrupted supply of medium to the vacuum pump system, but also realizes automatic control of the medium flow, so that a stable flow of medium is delivered to the vacuum pump system to prevent the medium flow from being too large or too small. There is no need to add additional structures such as solenoid valves, which reduces the control links, facilitates operation, and improves overall work efficiency.

[0034] It should be noted that this embodiment does not specifically limit the number of flow-limiting pipelines and flow-limiting structures, which can be determined based on the amount of medium required by the vacuum pump system. For example, three flow-limiting pipelines and three flow-limiting structures can be preferably set. For another example, six flow-limiting pipelines and six flow-limiting structures can also be preferably set.

[0035] It should be further explained that this embodiment does not specifically limit the size of the flow-limiting holes. The medium flow rate should be determined by the amount of medium required by the vacuum pump system and the pressure value of the flow-limiting pipeline, and then the aperture size of each flow-limiting hole should be determined. It should be noted that the amount of medium required by the vacuum pump system should also be related to the introduced medium. For example, when the introduced medium is a purge gas (for example, nitrogen), it is necessary to determine the intake amount of nitrogen required in the vacuum pump body; for another example, when the introduced medium is a cooling medium (for example, water), it is necessary to determine the heat generated by the vacuum pump body during operation, and then determine the flow rate of cooling water.

[0036] In some preferred embodiments, the aperture of the flow limiting hole is preferably 0.15-0.55 mm, for example, 0.15 mm, 0.25 mm, 0.35 mm, 0.45 mm, 0.55 mm, etc., and the length of the flow limiting hole is 1-5 mm, for example, 1 mm, 2 mm, 3 mm, 4 mm, 5 mm, etc. Of course, other aperture sizes and lengths can be set according to the amount of medium required by the vacuum pump system and the number of flow limiting structures, and there is no specific limitation on this.

[0037] It should be noted that this embodiment does not make any specific restrictions on the location of the flow limiting structure. For example, the flow limiting structure is set inside the flow limiting pipeline, or the flow limiting structure is set at the inlet or outlet of the flow limiting pipeline, etc. There is no specific restriction on this, as long as the medium flow can be restricted.

[0038] It should be noted that the present embodiment does not impose any specific restrictions on the connection method between the flow limiting structure and the flow limiting pipeline. For example, in some embodiments, the flow limiting structure is fixedly arranged inside the flow limiting pipeline, at the inlet end or the outlet end, and the flow limiting structure and the flow limiting pipeline form an integrated structure; of course, in other embodiments, the flow limiting structure is detachably arranged inside the flow limiting pipeline, at the inlet end or the outlet end, and the flow limiting structure and the flow limiting pipeline form two separate structures, which are convenient for disassembly and assembly, and flow limiting structures of different apertures can be replaced according to actual needs.

[0039] Specifically, if Figure 1 and Figure 2 As shown, the flow limiting structure 120 includes a flow limiting portion 121 and a connecting portion 122 ; wherein a flow limiting hole is provided inside the flow limiting portion 121 for limiting the flow of the medium; and the connecting portion 122 is used for detachably connecting to the flow limiting pipeline 110 .

[0040] It should be understood that the present embodiment does not specifically limit the relative positional relationship between the flow limiting portion and the connecting portion. For example, when the flow limiting structure is fixedly arranged in the flow limiting pipeline, the connecting portion can be located on the outside of the flow limiting portion, and the two form an internal-external connection relationship. In this way, by providing an external thread on the outer surface of the connecting portion, a flow limiting hole is provided on the inner side of the flow limiting portion. For another example, when the flow limiting structure is located at the inlet or outlet of the flow limiting pipeline, the connecting portion can also be located on one side of the flow limiting portion along its length direction, that is, the two form an upper-lower connection relationship. The outer surface of the connecting portion can also be provided with an external thread, and the inner surface of the inlet end or outlet end of the flow limiting pipeline can be provided with an internal thread. The connecting portion and the flow limiting pipeline are connected by threads. The flow limiting portion is located on the side of the connecting portion away from the flow limiting pipeline. The outer surface of the flow limiting portion can also be provided with an external thread, or it can be connected to the medium supply system and the vacuum pump system through other connecting components, and a flow limiting hole is provided on the inner side of the flow limiting portion.

[0041] In some preferred embodiments, Figure 1 and Figure 2As shown, the connection portion 122 is connected to the inlet of the flow limiting pipeline 110 , the flow limiting portion 121 is located on a side of the connection portion 122 away from the flow limiting pipeline 110 , and the flow limiting portion 121 is connected to the medium supply system 200 .

[0042] It should also be understood that when the medium introduced is nitrogen, in order to obtain the pressure of the flow limiting pipeline, a sensor should be installed on each flow limiting pipeline to monitor the nitrogen pressure in real time and accurately control the supply of nitrogen to ensure the stability of the gas source and prevent the gas supply from being too high or too low, thereby preventing the medium supply system from affecting the gas supply of the vacuum pump system.

[0043] Further, if Figure 1 and Figure 2 As shown, the control device 100 of this embodiment further includes a medium inlet pipe 130, which has a medium inlet, a medium channel, and at least one medium outlet that are sequentially connected along the medium flow direction; the medium inlet is located at the starting end of the medium inlet pipe and is connected to the medium supply system 200, and the medium outlet is located at the top, bottom, front side or rear side of the medium inlet pipe. The medium outlet can be directly connected to the flow limiting pipeline or connected to the flow limiting pipeline through a flow limiting structure.

[0044] In some preferred embodiments, the medium outlet of the medium inlet pipe is directly connected to the flow limiting pipeline. In this case, the flow limiting structure is arranged inside the flow limiting pipeline.

[0045] In other preferred embodiments, Figure 1 and Figure 2 As shown, the medium outlet of the medium inlet pipe 130 is connected to the flow limiting pipeline 110 through the flow limiting structure 120, and each medium outlet is connected to a flow limiting pipeline 110 through a flow limiting structure 120. At this time, the flow limiting structure 120 is arranged on the side of the flow limiting pipeline 110 facing the medium inlet pipe 130, that is, the flow limiting structure 120 is located at the inlet end of the flow limiting pipeline 110.

[0046] It should be noted that when connecting the flow limiting structure to the inlet end of the flow limiting pipeline, there should be the following different technical solutions. For example, the flow limiting structure is embedded in the medium inlet pipe and serves as an integral ventilation structure with the medium inlet pipe to form a two-stage connection structure; for another example, the flow limiting structure is separately connected between the medium inlet pipe and the flow limiting pipeline to form a three-stage connection structure.

[0047] For example, Figures 1 to 3 As shown, the flow-limiting structure 120 is embedded in the medium inlet pipe 130; wherein the flow-limiting portion 121 is connected to the medium outlet, and the connecting portion 122 is connected to the inlet of the flow-limiting pipeline 110. In other words, the flow-limiting structure 120 and the medium inlet pipe 130 are integrally formed. Of course, the flow-limiting structure can also be detachably installed in the medium inlet pipe. This connection method is easy to disassemble and has good airtightness.

[0048] As a further preferred solution, when multiple flow limiting structures are included, the multiple flow limiting structures are spaced apart at the top of the medium inlet pipe, or multiple flow limiting structures are spaced apart at the top of the medium inlet pipe, and the remaining multiple flow limiting structures are spaced apart at other positions such as the bottom of the medium inlet pipe.

[0049] Exemplarily, the flow limiting structure is arranged between the medium inlet pipe and the flow limiting pipeline, the flow limiting portion is connected to the medium outlet of the medium inlet pipe, and the connecting portion is connected to the inlet of the flow limiting pipeline. It should be understood that in this case, the flow limiting portion should be provided with a connecting structure connected to the medium outlet, for example, a connecting component is added to connect the flow limiting portion and the outlet of the medium inlet pipe, or an external thread is provided on the outer surface of the flow limiting portion, and an internal thread is provided at the medium outlet, and the external thread is threadedly connected to the internal thread. This connection method facilitates the disassembly and assembly of the flow limiting structure, and is conducive to replacing the flow limiting structure according to the required medium flow rate. Flow limiting channels of different apertures can meet different medium flow requirements. For example, when the vacuum pump system requires a small medium flow rate, a flow limiting structure with a small aperture is selected; when the vacuum pump system requires a moderate medium flow rate, a flow limiting structure with an intermediate aperture is selected; when the vacuum pump system requires a large medium flow rate, a flow limiting structure with a large aperture is selected.

[0050] It should also be understood that when at least one flow-limiting pipeline is connected to a medium inlet pipe, it is preferred to provide a sensor on the medium inlet pipe to detect the gas pressure in all flow-limiting pipelines, reduce the number of connection ports, simplify the device structure, and reduce the risk of leakage.

[0051] In some preferred embodiments, Figure 1 As shown, a sensor 140 is provided at the end of the medium inlet pipe 130. Of course, the sensor can also be provided at other positions of the medium inlet pipe, which is not specifically limited.

[0052] Of course, in other preferred embodiments, Figure 1 and Figure 2 As shown, in order to facilitate the disassembly of the medium inlet pipe, a connector 150 is provided at the medium inlet of the medium inlet pipe 130 , and the medium inlet pipe 130 is connected to the medium supply system 200 through the connector 150 .

[0053] Furthermore, the control device proposed in this embodiment can be used to transport nitrogen and cooling water. The specific selection can be made based on actual needs. When transporting different media, the connection position of the flow-limiting pipe to the vacuum pump system is different. For example, when the input medium is nitrogen, the flow-limiting pipe should be connected to the inside of the pump body to allow nitrogen to flow into the pump body and dilute the gas inside the pump body. For another example, when the input medium is cooling water, the flow-limiting pipe should be connected to the outside of the pump body to allow cooling water to flow into the pump body and cool the pump body.

[0054] For example, taking the chip packaging process in semiconductor manufacturing as an example, a high-purity nitrogen environment is required during the packaging process to prevent chip oxidation, and the gas generated during the packaging process is removed by a vacuum pump. That is, when the medium is a purge gas (nitrogen), at least one flow limiting pipeline is connected to the inside of the pump body of the vacuum pump system, and the purge gas purges the inside of the pump body to remove the gas generated during the packaging process in the vacuum pump, thereby achieving uninterrupted and stable gas supply to the pump body and ensuring the seal to maintain the vacuum degree, which significantly improves the packaging quality and production efficiency, while also reducing the installation space and manufacturing costs.

[0055] Exemplarily, when the medium is a cooling medium (water), at least one flow-limiting pipeline is connected to the outside of the pump body of the vacuum pump system, and the cooling medium cools the outside of the pump body.

[0056] This embodiment proposes an integrated current limiting control device through integrated design, which closely combines the medium supply system with the vacuum pump system, realizes the dual functions of medium supply and medium current limiting, reduces the complexity and maintenance cost of the system, improves the equipment utilization rate, effectively improves the purity of the vacuum treatment process, and realizes quantitative long-term flow within a controllable range; at the same time, the device has a compact structure, eliminates electronic control, electrical control and other structures, is simple to operate, and is widely used in semiconductor manufacturing, photovoltaic industry, precision instrument manufacturing and laboratory scientific research and other fields, achieving the goals of economy, energy saving, high efficiency and space saving.

[0057] The integrated current limiting control device will be further described below with reference to specific embodiments:

[0058] Example 1

[0059] like Figures 1 to 3 As shown, the control device 100 of this example includes: three flow limiting pipelines 110, three flow limiting structures 120, a medium inlet pipe 130 and a sensor 140, wherein the flow limiting pipeline 110 is used to transport the nitrogen in the medium supply system 200 to the vacuum pump system 300, and the outlets of the three flow limiting pipelines 110 are all connected to the vacuum pump system, each flow limiting structure 120 is arranged at the inlet of a flow limiting pipeline 110, and is embedded in the medium inlet pipe 130, the medium inlet of the medium inlet pipe 130 is connected to the medium supply system 200 through a connecting piece 150, the medium outlet of the medium inlet pipe 130 is connected to the flow limiting part 121 in the flow limiting structure 120, and a sensor 140 is provided on the medium inlet pipe 130.

[0060] Please continue to refer to Figures 1 to 3 The flow limiting portion 121 in the flow limiting structure 120 has a flow limiting hole that allows the medium to flow, and the aperture of the flow limiting hole matches the amount of medium required by the vacuum pump system 300. The connecting portion 122 in the flow limiting structure 120 is connected to the flow limiting pipeline 110.

[0061] Please continue to refer to Figures 1 to 3 The three flow limiting pipelines 110 are respectively connected to the upper pump body, the lower pump body and the connecting ports between the upper pump body and the lower pump body. In this way, the vacuum pump system can achieve stable nitrogen supply at the outlet under the throttling mode preset by the control device and a stable gas source at the air inlet.

[0062] Example 2

[0063] The control device of this example includes: six flow limiting pipelines, six flow limiting structures, a medium inlet pipe and a sensor, wherein the flow limiting pipeline is used to transport nitrogen in the medium supply system to the vacuum pump system, and the outlets of the six flow limiting pipelines are all connected to the vacuum pump system. Each flow limiting structure is arranged at the inlet of a flow limiting pipeline and is embedded in the medium inlet pipe. The medium inlet of the medium inlet pipe is connected to the medium supply system through a connecting piece, and the medium outlet of the medium inlet pipe is connected to the flow limiting part in the flow limiting structure. A sensor is provided on the medium inlet pipe.

[0064] Furthermore, the flow limiting portion in the flow limiting structure has a flow limiting hole that allows the medium to flow, and the aperture of the flow limiting hole matches the amount of medium required by the vacuum pump system. The connecting portion in the flow limiting structure is connected to the flow limiting pipeline.

[0065] Furthermore, one flow limiting pipeline is connected to the upper pump body, and five flow limiting pipelines are connected to the lower pump body. At the same time, one of the five flow limiting pipelines is connected to a branch pipeline, and the branch pipeline is connected to the upper pump body. Another flow limiting pipeline among the five flow limiting pipelines is used to provide nitrogen to the connecting port between the upper pump body and the lower pump body, and the other flow limiting pipelines are mainly used to provide nitrogen to the lower pump body. In this way, the vacuum pump system can achieve stable nitrogen supply at the outlet under the throttling mode preset by the control device and a stable gas source at the air inlet.

[0066] The present disclosure proposes a control device with integrated current limiting, which has the following beneficial effects compared with the prior art:

[0067] First, the present disclosure optimizes the flow-limiting structure so that the aperture of the flow-limiting hole matches the medium flow required by the vacuum pump system, thereby achieving the dual functions of medium supply and medium flow limiting. The system has the advantages of compact structure, simple operation, high nitrogen utilization rate, and good system stability, which significantly improves the vacuum treatment process and product stability.

[0068] Second, the flow-limiting structure of the present invention is detachably connected to the flow-limiting pipeline, and by replacing the flow-limiting structure with one having a different aperture, the requirements of the vacuum pump system for different medium quantities can be met.

[0069] Third, the present disclosure monitors gas pressure by adding sensors to form a device that integrates air intake, air outlet, throttling, and pressure monitoring. The medium with stable pressure (for example, nitrogen) is provided by the medium supply system. After passing through the control device, a constant flow of stable medium can be delivered, and the outlet leads to a specific position of the vacuum pump system. The operation is simple, the risk of leakage is reduced, and the efficiency is effectively improved.

[0070] It is understood that the above embodiments are merely exemplary embodiments for illustrating the principles of the present disclosure, and the present disclosure is not limited thereto. Those skilled in the art may make various modifications and improvements without departing from the spirit and substance of the present disclosure, and such modifications and improvements are also considered to be within the scope of protection of the present disclosure.

Claims

1. A control device with integrated current limiting, characterized in that: The control device comprises: at least one flow-restricting pipeline for conveying the medium in the medium supply system to the vacuum pump system; At least one flow limiting structure, each of the flow limiting structures is arranged in one of the flow limiting pipelines, the flow limiting structure has a flow limiting hole that allows the medium to flow, and the aperture of the flow limiting hole matches the medium flow required by the vacuum pump system.

2. The integrated current limiting control device according to claim 1, characterized in that: The current limiting structure includes a current limiting portion and a connecting portion; wherein, The flow limiting hole is provided in the flow limiting portion; The connecting portion is used for detachable connection with the flow limiting pipeline.

3. The integrated current limiting control device according to claim 2, characterized in that: The connecting portion is connected to the inlet of the flow-limiting pipeline. The flow-limiting portion is located on a side of the connecting portion away from the flow-limiting pipeline. The flow-limiting portion is connected to the medium supply system.

4. The integrated current limiting control device according to claim 3, characterized in that: The control device further includes a medium inlet pipe having a medium inlet, a medium channel and at least one medium outlet sequentially connected along a medium flow direction; The medium inlet is connected to the medium supply system, and each medium outlet is connected to a flow limiting pipeline via a flow limiting structure.

5. The integrated current limiting control device according to claim 4, characterized in that: The flow limiting structure is embedded in the medium inlet pipe; wherein, The flow limiting portion is connected to the medium outlet, and the connecting portion is connected to the inlet of the flow limiting pipeline.

6. The integrated current limiting control device according to claim 4, characterized in that: The medium inlet pipe is provided with a sensor.

7. The integrated current limiting control device according to any one of claims 1 to 5, characterized in that: The control device further includes at least one sensor, and each of the flow-limiting pipelines is provided with one sensor.

8. The integrated current limiting control device according to any one of claims 1 to 6, characterized in that: The aperture of the flow limiting hole is 0.15-0.55 mm; and / or, The length of the flow limiting hole is 1-5 mm.

9. The integrated current limiting control device according to any one of claims 1 to 6, characterized in that: The number of the flow-limiting pipelines is three or six.

10. The integrated current limiting control device according to any one of claims 1 to 6, characterized in that: When the medium is a purge gas, the at least one flow limiting pipeline is connected to the interior of the pump body of the vacuum pump system, and the purge gas purges the interior of the pump body; or When the medium is a cooling medium, the at least one flow limiting pipeline is connected to the outside of the pump body of the vacuum pump system, and the cooling medium cools the outside of the pump body.

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