Quartz wafer ultrasonic cleaning device

Abstract

The utility model relates to the technical field of quartz wafer cleaning devices, and discloses a quartz wafer ultrasonic cleaning device which comprises a base, a cleaning mechanism is arranged on the base, a motor is fixedly connected in the base, a rotating block is rotationally connected in the base, and a connecting arm is fixedly connected to the outer circle face of the rotating block. The screen frame gradually moves downwards along the inclined face of the groove, the sliding block is promoted to slide downwards in the sliding groove, after the screen frame moves to the ultrasonic generator, the ultrasonic generator can conduct ultrasonic cleaning on the quartz wafer, and after ultrasonic cleaning of the quartz wafer in cleaning liquid is completed, the screen frame gradually moves upwards along the inclined face, so that ultrasonic cleaning of the quartz wafer in the cleaning liquid is completed. According to the ultrasonic cleaning device for the quartz wafers, the other screen frames drive the quartz wafers to be cleaned to move towards the grooves, so that the cleaning and drying can be synchronously carried out during feeding and discharging, the device does not need to stop working in the process, the consumed time is greatly shortened, and the cleaning efficiency of the ultrasonic cleaning device for the quartz wafers is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of quartz wafer cleaning devices, in particular to a quartz wafer ultrasonic cleaning device. Background Art

[0002] Quartz wafers are composed of silicon and oxygen and are mainly derived from artificial quartz crystals because the impurity content and morphology of natural quartz crystals are not uniform. Quartz wafers have a piezoelectric effect, that is, they will produce mechanical deformation under the action of an electric field, and conversely, they will generate an electric field under the action of mechanical force. The piezoelectric effect of quartz wafers can be used to make electronic components such as quartz crystal resonators, oscillators and filters, which are widely used in communications, home appliances, automobiles and other fields. In summary, quartz wafers, as an important component of electronic components, play an important role in modern electronic technology.

[0003] The existing quartz wafer ultrasonic cleaning device needs to be taken out and replaced each time it is cleaned, and the device will stop working during this process, so that a single cleaning takes a long time, thereby reducing the cleaning efficiency of the quartz wafer ultrasonic cleaning device. Utility Model Content

[0004] To achieve the above-mentioned purpose, the utility model provides a quartz wafer ultrasonic cleaning device.

[0005] The technical solution of the present utility model is achieved as follows: a quartz wafer ultrasonic cleaning device comprises a base, a cleaning mechanism is provided on the base, a motor is fixedly connected inside the base, a rotating block is rotatably connected inside the base, a connecting arm is fixedly connected to the outer circular surface of the rotating block, one end of the connecting arm is fixedly connected to the fixed block, a slider is slidably connected inside the fixed block, a slide groove is provided on one side of the fixed block, a screen frame is fixedly connected to one side of the slider, a universal wheel is fixedly connected to the bottom of the screen frame, a groove is provided on the top of the base, and an ultrasonic generator is fixedly connected to the bottom of the groove on the base.

[0006] Preferably, the motor is fixedly connected to the rotating block.

[0007] Preferably, the sliding groove on the fixed block is slidably connected to the slider, and the slider is T-shaped.

[0008] Preferably, both sides of the groove on the base are inclined surfaces.

[0009] Preferably, a connecting shell is fixedly connected to the top of the base, a drying mechanism is provided on the connecting shell, a conveying box is fixedly connected to the inside of the connecting shell, a nozzle is fixedly connected to the bottom of the conveying box, a connecting pipe is fixedly connected to one side of the conveying box, a hot air blower is fixedly connected to one side of the connecting pipe, and a placement opening is opened on the outer circular surface of the connecting shell.

[0010] Preferably, a valve and a water inlet pipe are fixedly connected to the inner wall of the groove on the base.

[0011] Preferably, the water inlet pipe is connected to an external water pump.

[0012] The utility model has the following beneficial effects:

[0013] The ultrasonic cleaning device for quartz wafers drives the rotating block to rotate by a motor, and the rotating block drives the connecting arm and the fixed block to rotate together. The fixed block drives the screen frame to move toward the groove through the slider, and the screen frame gradually moves downward along the inclined surface of the groove, prompting the slider to slide downward in the slide groove. When the screen frame moves to the ultrasonic generator, the ultrasonic generator can ultrasonically clean the quartz wafer immersed in the cleaning liquid. At the same time, the other screen frames move to the placement port, and the staff takes out the cleaned and dried quartz wafers, and then places the quartz wafers to be cleaned therein. Then, after the quartz wafers in the cleaning liquid complete ultrasonic cleaning, the screen frame will gradually move upward along the inclined surface, and the other screen frames will move toward the groove with the quartz wafers to be cleaned. In this way, the cleaning and drying can be carried out simultaneously during loading and unloading, so that the device does not need to stop working during the process, which will greatly shorten the time consumed, thereby improving the cleaning efficiency of the quartz wafer ultrasonic cleaning device. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 This is a schematic diagram of the overall structure of the utility model;

[0015] Figure 2 This is a schematic diagram of the relevant positions of the screen frame of the utility model;

[0016] Figure 3 This is a schematic diagram of the relevant positions of the ultrasonic generator of the utility model;

[0017] Figure 4 This is a schematic diagram of the relevant positions of the chute of the utility model;

[0018] Figure 5 This is a schematic diagram of the relevant positions of the slider of the utility model;

[0019] Figure 6 This is a schematic diagram of the relevant positions of the nozzle of the utility model.

[0020] Among them, the reference numerals in the figures are:

[0021] 1. Base; 2. Connecting shell; 3. Cleaning mechanism; 301. Screen frame; 302. Motor; 303. Rotating block; 304. Connecting arm; 305. Fixed block; 306. Slide groove; 307. Slider; 308. Universal wheel; 4. Drying mechanism; 401. Hot air blower; 402. Connecting pipe; 403. Conveying box; 404. Nozzle; 5. Groove; 6. Valve; 7. Water inlet pipe; 8. Ultrasonic generator; 9. Placement port. DETAILED DESCRIPTION

[0022] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0023] like Figure 1-6 As shown, the quartz wafer ultrasonic cleaning device provided in this embodiment includes a base 1, a cleaning mechanism 3 is provided on the base 1, a motor 302 is fixedly connected to the inside of the base 1, a rotating block 303 is rotatably connected to the inside of the base 1, a connecting arm 304 is fixedly connected to the outer peripheral surface of the rotating block 303, a fixed block 305 is fixedly connected to one end of the connecting arm 304, a slider 307 is slidably connected to the inside of the fixed block 305, a slide groove 306 is provided on one side of the fixed block 305, a screen frame 301 is fixedly connected to one side of the slider 307, a universal wheel 308 is fixedly connected to the bottom of the screen frame 301, a groove 5 is provided on the top of the base 1, and an ultrasonic generator 8 is fixedly connected to the bottom of the groove 5 on the base 1.

[0024] The motor 302 is fixedly connected to the rotating block 303. The motor 302 drives the rotating block 303 to rotate, thereby prompting the rotation of the screen frame 301.

[0025] The slide groove 306 on the fixed block 305 is slidably connected to the slider 307, and the slider 307 is T-shaped. By adopting the above technical solution, the slider 307 is T-shaped, so that the slider 307 can move smoothly in the slide groove 306 on the fixed block 305.

[0026] The groove 5 on the base 1 has inclined surfaces on both sides. By adopting the above technical solution, the groove 5 on the base 1 has inclined surfaces on both sides, which makes it easy for the screen frame 301 to move into the groove 5 on the base 1 and also to move out of the groove 5 on the base 1.

[0027] The top of the base 1 is fixedly connected to a connecting shell 2, which is provided with a drying mechanism 4. A conveying box 403 is fixedly connected to the interior of the connecting shell 2, and a nozzle 404 is fixedly connected to the bottom of the conveying box 403. A connecting pipe 402 is fixedly connected to one side of the conveying box 403, and a hot air blower 401 is fixedly connected to one side of the connecting pipe 402. The outer surface of the connecting shell 2 is provided with a placement opening 9. When the hot air blower 401 is activated, the hot air ejected by the hot air blower 401 is transported to the conveying box 403 through the connecting pipe 402, and then ejected from the nozzle 404 on the conveying box 403. After being cleaned, the quartz wafers in the screen frame 301 pass through this point, thereby drying the quartz wafers in the screen frame 301.

[0028] Furthermore, a valve 6 and a water inlet pipe 7 are fixedly connected to the inner wall of the groove 5 on the base 1 .

[0029] Furthermore, the water inlet pipe 7 is externally connected to a water pump. The cleaning liquid used for a long time in the groove 5 on the base 1 is discharged through the valve 6, and then new cleaning liquid is transported into the groove 5 on the base 1 by the water pump connected to the water inlet pipe 7.

[0030] Working principle: The staff places the quartz wafer in the screen frame 301 at the placement port 9 on the connecting shell 2, and then starts the motor 302 in the base 1. The motor 302 will drive the rotating block 303 to rotate, and the rotating block 303 will drive the connecting arm 304 and the fixed block 305 to rotate together. The fixed block 305 will drive the screen frame 301 to rotate through the slider 307, so that the screen frame 301 moves toward the groove 5 on the base 1. The universal wheel 308 on the screen frame 301 makes the screen frame 301 move more smoothly, and the screen frame 301 will follow the slope of the groove 5 on the base 1. The screen frame 301 gradually moves downward. At the same time, the screen frame 301 will drive the slider 307 to move downward, so that the slider 307 slides downward in the slide groove 306 on the fixed block 305. When the screen frame 301 moves to the ultrasonic generator 8, the quartz wafer in the screen frame 301 will be completely immersed in the cleaning liquid. At this time, the motor 302 is paused, and the ultrasonic generator 8 is started to perform ultrasonic cleaning on the quartz wafer immersed in the cleaning liquid. At the same time, the other screen frames 301 move to the placement port 9 on the connecting shell 2. The staff will take out the cleaned and dried quartz wafers and then put them into the The quartz wafer is placed in it, and then, after the quartz wafer in the cleaning liquid completes ultrasonic cleaning, the motor 302 continues to rotate, and the screen frame 301 will gradually move upward along the inclined surface of the groove 5 on the base 1. At the same time, the screen frame 301 will drive the slider 307 to move upward, so that the slider 307 slides upward in the slide groove 306 on the fixed block 305, so that the screen frame 301 gradually moves out of the groove 5 on the base 1. Then, the screen frame 301 drives the cleaned quartz wafer to rotate to the drying mechanism 4. Since other screen frames 301 move to the ultrasonic generator in the groove 5 on the base 1, the screen frame 301 will gradually move out of the groove 5 on the base 1. At the generator 8, the motor 302 pauses, and the screen frame 301 drives the cleaned quartz wafer to stop under the conveyor box 403. The nozzle 404 on the conveyor box 403 sprays hot air to the cleaned quartz wafer, thereby continuously drying the cleaned quartz wafer. After the quartz wafers in other screen frames 301 complete ultrasonic cleaning, the motor 302 continues to rotate. Thereafter, the screen frame 301 drives the cleaned and dried quartz wafer to move to the placement port 9 on the connecting shell 2, where the staff takes it out and puts in the quartz wafer to be cleaned, so that cleaning can be carried out uninterruptedly.

[0031] Although the embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and variations may be made to these embodiments without departing from the principles and spirit of the present invention, and the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A quartz wafer ultrasonic cleaning device, comprising a base (1), characterized in that: A cleaning mechanism (3) is provided on the base (1). A motor (302) is fixedly connected inside the base (1). A rotating block (303) is rotatably connected inside the base (1). A connecting arm (304) is fixedly connected to the outer circumference of the rotating block (303). One end of the connecting arm (304) is fixedly connected to a fixed block (305). A slider (307) is slidably connected inside the fixed block (305). A sliding groove (306) is provided on one side of the fixed block (305). A screen frame (301) is fixedly connected to one side of the slider (307). A universal wheel (308) is fixedly connected to the bottom of the screen frame (301). A groove (5) is provided on the top of the base (1). An ultrasonic generator (8) is fixedly connected to the bottom of the groove (5) on the base (1).

2. A quartz wafer ultrasonic cleaning device according to claim 1, characterized in that: The motor (302) is fixedly connected to the rotating block (303).

3. The quartz wafer ultrasonic cleaning device according to claim 1, wherein: The sliding groove (306) on the fixed block (305) is slidably connected to the slider (307), and the slider (307) is "T-shaped".

4. The quartz wafer ultrasonic cleaning device according to claim 1, wherein: Both sides of the groove (5) on the base (1) are inclined surfaces.

5. The quartz wafer ultrasonic cleaning device according to claim 1, characterized in that: The top of the base (1) is fixedly connected to a connecting shell (2), a drying mechanism (4) is provided on the connecting shell (2), a conveying box (403) is fixedly connected inside the connecting shell (2), a nozzle (404) is fixedly connected to the bottom of the conveying box (403), a connecting pipe (402) is fixedly connected to one side of the conveying box (403), a hot air blower (401) is fixedly connected to one side of the connecting pipe (402), and a placement opening (9) is opened on the outer circumferential surface of the connecting shell (2).

6. The quartz wafer ultrasonic cleaning device according to claim 1, characterized in that: A valve (6) and a water inlet pipe (7) are fixedly connected to the inner wall of the groove (5) on the base (1).

7. The quartz wafer ultrasonic cleaning device according to claim 6, characterized in that: The water inlet pipe (7) is externally connected to a water pump.

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