Bearing device for wafer detection

By using rubber ring inclined carrier and lifting adjuster in the wafer detection device, the problems of damage and low efficiency during wafer detection are solved, and efficient damage-free detection and adaptive detection are achieved.

CN223273261UActive Publication Date: 2025-08-26CHONGQING YUANSHI INTELLIGENT EQUIP CO LTD
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Patent Information

Application Number
CN202422071062.3
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-08-26
Publication Date
2025-08-26
Estimated Expiration
2034-08-26

AI Technical Summary

Technical Problem

The existing wafer detection devices are prone to damage the edge of the wafer during clamping and have low detection efficiency, especially when replacing wafers of different sizes, the turntable is inconvenient to disassemble and assemble.

Method used

The rubber ring is used as the carrier member to be arranged inclined on the carrier block, and the wafer is fixed by friction to avoid clamping, and the height is adjusted with the lifting and lowering adjustment member to adapt to wafers of different specifications and improve detection efficiency.

Benefits of technology

It realizes damage-free detection, improves wafer detection efficiency and adaptability, and is suitable for the detection of wafers of different specifications.

✦ Generated by Eureka AI based on patent content.

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    Figure CN223273261U_ABST
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Abstract

The utility model discloses a bearing device for wafer detection. The bearing device comprises a supporting base, a rotating motor, a turntable and a plurality of bearing mechanisms arranged on the turntable, the rotating motor is arranged on the supporting base, an output shaft of the rotating motor is vertically upward, and the rotating disc is arranged above the rotating motor and connected with the output shaft of the rotating motor. All the bearing mechanisms are uniformly distributed along the circumference of the turntable, and each bearing mechanism extends out of the turntable along the radial direction of the turntable and is used for bearing a wafer; the bearing mechanism comprises a horizontally-arranged supporting beam and a mounting base used for being connected with the rotary disc, one end of the supporting beam is fixed to the mounting base, the upper surface of the supporting beam is flush with or higher than the upper surface of the mounting base, a bearing block is arranged on the upper surface of the other end of the supporting beam, the bearing block is horizontally arranged, and a bearing piece is arranged on the upper surface of the outer end of the bearing block. The bearing part is a rubber ring and is obliquely arranged with the bottom inside and the high outside. According to the utility model, the edge of the wafer cannot be damaged, and the wafer detection efficiency can be effectively improved.
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Description

Technical Field

[0001] The utility model belongs to the technical field of semiconductor detection, relates to wafer detection, and particularly relates to a carrying device for wafer detection. Background Art

[0002] Silicon wafers, also known as silicon wafers, are a key material for the production of integrated circuits. Through photolithography and ion implantation, integrated circuits and various semiconductor devices can be made from silicon wafers. Silicon wafers are sheet-like objects made of silicon, with diameters ranging from 6 inches, 8 inches, 12 inches, and 18 inches. Semiconductor silicon wafers are the most widely used and important semiconductor material in the world. They serve as the basic substrate for chip manufacturing and are the only semiconductor material used throughout all front-end chip manufacturing processes. Currently, over 90% of chips and sensors in the global semiconductor market are made from silicon, making it the largest component of wafer manufacturing materials.

[0003] During the production process of wafers, the outer edge needs to be inspected for appearance to ensure the quality of the wafers. The carrying device of the prior art usually uses a rotating mechanism to carry and drive the wafer to rotate, so as to ensure that the detection equipment can effectively detect the entire outer edge of the wafer. The rotating mechanism includes a turntable and a carrying fixture arranged on the turntable, and the carrying fixture is used to carry and clamp the wafer. The current carrying device usually clamps the wafer by claws. In order to prevent the wafer from rotating and effectively protect the wafer, the clamping force of the claws to clamp the wafer is large, which can easily cause damage to the edge of the wafer during the clamping process. In addition, during the detection process, it is necessary to change hands so that the clamping part is exposed to the outside for detection of the clamping part. At the same time, when clamping large-sized wafers, it is necessary to replace the turntable with a larger outer diameter, and the disassembly and assembly of the turntable is very inconvenient, which affects the wafer detection efficiency. Therefore, providing a wafer detection carrying device that does not cause damage to the edge of the wafer and is also conducive to improving the wafer detection efficiency is a technical problem that those skilled in the art hope to solve. Summary of the Invention

[0004] In view of the above-mentioned deficiencies in the prior art, the purpose of the present invention is to provide a wafer detection carrying device, which will not cause damage to the edge of the wafer and can effectively improve the wafer detection efficiency.

[0005] The technical solution of the present utility model is achieved as follows:

[0006] A carrying device for wafer inspection includes a supporting base, a rotating motor, a turntable and several carrying mechanisms arranged on the turntable; the rotating motor is arranged on the supporting base and the output shaft of the rotating motor is vertically upward, the turntable is arranged above the rotating motor and connected to the output shaft of the rotating motor, so that the turntable can be driven to rotate by the rotating motor; all carrying mechanisms are evenly distributed along the circumference of the turntable and each carrying mechanism extends radially to the outside of the turntable, for carrying wafers.

[0007] The bearing mechanism includes a horizontally arranged support beam and a mounting seat for connecting to the turntable, one end of the support beam is fixed to the mounting seat and the upper surface of the support beam is flush with or higher than the upper surface of the mounting seat, and a bearing block is provided on the upper surface of the other end of the support beam, the bearing block is horizontally arranged and a bearing member is provided on the upper surface of the outer end of the bearing block, the bearing member is a rubber ring, and the inner bottom and outer height of the bearing member are inclined.

[0008] Furthermore, an inclined sinking platform with an inner bottom and an outer height is provided on the upper surface of the outer end of the supporting block. The inclination angle of the sinking platform corresponds to the inclination angle of the supporting member. The supporting member is arranged on the sinking platform, and the upper part of the supporting member protrudes a certain height from the supporting block.

[0009] Furthermore, the lower surface of the inner end of the bearing block protrudes below the bearing block to form a bulge, and the supporting beam is provided with a groove corresponding to the bulge, and the bulge of the bearing block is embedded in the groove of the supporting beam. At the same time, a plurality of first threaded holes are provided on the lower surface of the bearing block, and a second threaded hole is provided on the supporting beam that passes through the upper and lower surfaces of the supporting beam. The first threaded hole and the second threaded hole are arranged in one-to-one correspondence, and the first bolt passes through the second threaded hole from bottom to top and is inserted into the first threaded hole, thereby realizing the connection between the bearing block and the supporting beam.

[0010] Furthermore, the bearing member is detachably arranged on the bearing block, and a third threaded hole corresponding to the center hole of the bearing member is provided on the bearing block. The second bolt passes through the center hole of the bearing member from top to bottom and is inserted into the third threaded hole. The size of the upper end of the second bolt is smaller than the bearing member, thereby pressing the bearing member to be fixed on the bearing block.

[0011] Furthermore, the supporting member has an inclination angle of 7 to 9 degrees.

[0012] Furthermore, a lifting adjustment member is provided between the mounting seat and the support beam, the lifting adjustment member is fixed on the mounting seat, and the support beam can be raised and lowered on the lifting adjustment member, so that the support beam can be raised and lowered by adjusting the lifting adjustment member, thereby adjusting the height of the support beam.

[0013] Furthermore, the mounting seat includes a horizontally arranged horizontal plate and a vertically arranged vertical plate. The vertical plate is arranged on one side edge of the horizontal plate and is located above the horizontal plate, thereby forming an L-shaped structure. The horizontal plate is provided with a plurality of mounting holes, and the turntable is provided with fixing holes corresponding to the mounting holes of the horizontal plate, so that the mounting seat can be fixed to the turntable through fixing parts. The vertical plate is provided with a plurality of connecting holes for connecting with the lifting and adjusting parts.

[0014] Furthermore, there are two rubber rings, which are arranged to overlap each other.

[0015] Furthermore, the support base includes a support plate for supporting the rotating motor, and the carrying device also includes a motor protection mechanism arranged on the outside of the rotating motor. The motor protection mechanism includes an annular beam arranged above the support plate and several vertical rods arranged between the annular beam and the support plate. All vertical rods are evenly distributed along the circumference of the annular beam, and the turntable is located above the annular beam.

[0016] Compared with the prior art, the present invention has the following beneficial effects:

[0017] 1. The carrying mechanism of the present invention adopts a rubber ring as a carrying part and is tiltedly arranged on the carrying block. When in use, the wafer is directly placed on the rubber rings of all the carrying mechanisms on the turntable, and the lower surface of the wafer contacts the rubber ring, so that the friction force of the rubber ring on the wafer is used to fix the wafer, so that the wafer has good stability during rotation, and there is no need to set a clamping part to clamp the wafer. Therefore, while achieving wafer fixation, it can effectively avoid damage to the edge of the wafer. At the same time, during the wafer inspection process, the entire circumferential edge of the wafer can be inspected without changing hands, effectively improving the wafer inspection efficiency.

[0018] 2. The carrying mechanism described in the present invention has good universality and can be used to carry wafers of different sizes. When wafers of different sizes need to be inspected, there is no need to replace the turntable or adjust the carrying mechanism, thereby further improving the wafer inspection efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 -Schematic diagram of the structure of the utility model.

[0020] Figure 2 -Schematic diagram of the structure of the carrying mechanism.

[0021] Figure 3 - Front view of the carrier mechanism.

[0022] Figure 4 -Schematic diagram of a wafer carrier.

[0023] Among them: 100-carrying mechanism; 101-mounting seat; 102-lifting adjustment member; 103-support beam; 104-carrying block; 105-carrying member; 200-turntable; 300-motor protection mechanism; 400-rotating motor; 500-support base; 600-wafer. DETAILED DESCRIPTION

[0024] The present invention will be described in further detail below with reference to the accompanying drawings and specific implementation methods.

[0025] See also Figures 1 to 4 A wafer inspection carrying device includes a support base 500, a rotating motor 400, a turntable 200, and several carrying mechanisms 100 arranged on the turntable 200; the rotating motor 400 is arranged on the support base 500 and the output shaft of the rotating motor 400 is vertically upward, the turntable 200 is arranged above the rotating motor 400 and connected to the output shaft of the rotating motor 400, the turntable 200 and the rotating motor 400 are coaxially arranged, and the turntable 200 is driven to rotate by the rotating motor 400; all the carrying mechanisms 100 are evenly distributed along the circumference of the turntable 200 and each carrying mechanism 100 extends along the radial direction of the turntable 200 to the outside of the turntable 200 for carrying wafers 600.

[0026] The supporting mechanism 100 includes a horizontally arranged support beam 103 and a mounting seat 101 for connecting to the turntable 200. One end of the support beam 103 is fixed to the mounting seat 101 and the upper surface of the support beam 103 is flush with or higher than the upper surface of the mounting seat 101. A supporting block 104 is provided on the upper surface of the other end of the support beam 103. The supporting block 104 is horizontally arranged and a supporting member 105 is provided on the upper surface of the outer end of the supporting block 104. The supporting member 105 is a rubber ring, and the inner bottom and outer height of the supporting member 105 are inclined.

[0027] When using this carrying device, the wafer is directly placed on the carrying parts of all the carrying mechanisms, and the lower surface of the wafer is in contact with the rubber ring. During the inspection process, the rotating motor rotates to drive the turntable to rotate, thereby driving the wafer on the carrying part to rotate. The rotation speed of the rotating motor is relatively slow, so the friction of the rubber ring on the wafer can be used to fix the wafer, so that the wafer has good stability during the rotation process, and thus can effectively avoid damage to the edge of the wafer while achieving wafer fixation. At the same time, during the wafer inspection process, the entire circumferential edge of the wafer can be inspected without changing hands, effectively improving the wafer inspection efficiency. At the same time, the carrying mechanism here has good universality and can be used to carry wafers of different sizes. When wafers of different sizes need to be inspected, there is no need to replace the turntable or adjust the carrying mechanism, thereby further improving the wafer inspection efficiency.

[0028] In a specific implementation, the outer upper surface of the supporting block 104 is provided with an inclined platform with an inner bottom and an outer height. The inclination angle of the platform corresponds to the inclination angle of the supporting member 105. The supporting member 105 is arranged on the platform, and the upper portion of the supporting member 105 protrudes a certain height from the supporting block 104. The inclination angle a between the supporting member 105 and the platform is 7-9 degrees.

[0029] Through practice, it is found that when the tilt angle of the carrier is 7~9°, the contact area between the wafer and the carrier is smaller after being placed on the carrier, which can effectively reduce the contamination of the wafer and effectively fix the wafer.

[0030] During specific implementation, the lower surface of the inner end of the supporting block 104 protrudes below the supporting block 104 to form a protrusion, and a groove corresponding to the protrusion is provided on the support beam 103. The protrusion of the supporting block 104 is embedded in the groove of the support beam 103. At the same time, a plurality of first threaded holes are provided on the lower surface of the supporting block 104, and a second threaded hole is provided on the support beam 103 that passes through the upper and lower surfaces of the support beam 104. The first threaded hole and the second threaded hole are arranged in a one-to-one correspondence, and the first bolt passes through the second threaded hole from bottom to top and is inserted into the first threaded hole, thereby realizing the connection between the supporting block 104 and the support beam 103.

[0031] In this embodiment, there are two first threaded holes and two second threaded holes respectively, which are respectively arranged along the length direction of the bearing block and the support beam.

[0032] During specific implementation, the supporting member 105 is detachably arranged on the supporting block 104, and a third threaded hole corresponding to the center hole of the supporting member 105 is provided on the supporting block 104. The second bolt passes through the center hole of the supporting member 105 from top to bottom and is inserted into the third threaded hole. The size of the upper end of the second bolt is smaller than the supporting member 105, thereby pressing the supporting member 105 to be fixed on the supporting block 104.

[0033] In this way, after the second bolt presses the carrier (rubber ring) onto the carrier block, the inner ring of the rubber ring is concave, and the outer ring protrudes from the second bolt, supporting the wafer. The rubber ring can be made of a high-hardness rubber ring to help reduce the contact area between the wafer and the rubber ring.

[0034] During specific implementation, a lifting adjustment member 102 is provided between the mounting seat 101 and the support beam 103. The lifting adjustment member 102 is fixed on the mounting seat 101, and the support beam 103 can be raised and lowered on the lifting adjustment member 103, so that the support beam 103 can be raised and lowered by adjusting the lifting adjustment member 103, thereby adjusting the height of the support beam 103.

[0035] Here, the lifting and adjusting member is used to raise and lower the support beam to fine-tune the height of the supporting components of the supporting mechanism, ensuring that all supporting components on the turntable are at the same height. This assists the camera and laser in the specific adjustment process to improve adjustment accuracy. In this embodiment, the support beam is folded downward at one end near the mounting seat to form a connecting portion, which is connected to the lifting and adjusting member through the connecting portion.

[0036] In specific implementation, the mounting seat 101 includes a horizontally arranged horizontal plate and a vertically arranged vertical plate. The vertical plate is arranged on one edge of the horizontal plate and is located above the horizontal plate, thereby forming an L-shaped structure. The horizontal plate is provided with a plurality of mounting holes, and the turntable 200 is provided with fixing holes corresponding to the mounting holes of the horizontal plate, so that the mounting seat 104 can be fixed to the turntable 200 through the fixing parts, thereby fixing the supporting mechanism 100 to the turntable 200. The vertical plate is provided with a plurality of connecting holes for connecting with the lifting and adjusting member 103.

[0037] In this embodiment, the vertical plate and the horizontal plate are integrally formed.

[0038] In a specific implementation, there are two rubber rings, which are arranged to overlap each other, thereby effectively increasing the cushioning effect.

[0039] In a specific implementation, the support base 500 includes a support plate for supporting the rotating motor 400, and the supporting device also includes a motor protection mechanism 300 arranged on the outside of the rotating motor 400. The motor protection mechanism 300 includes an annular beam arranged above the support plate and several vertical rods arranged between the annular beam and the support plate. All vertical rods are evenly distributed along the circumference of the annular beam, and the turntable 200 is located above the annular beam.

[0040] Finally, it should be noted that the above embodiments of the present invention are merely examples for illustrating the present invention and are not intended to limit the implementation methods of the present invention. Those skilled in the art will appreciate that other variations and modifications based on the above description are possible. It is not possible to enumerate all implementation methods here. Any obvious variations or modifications arising from the technical solution of the present invention remain within the scope of protection of the present invention.

Claims

1. A wafer testing carrying device, characterized in that: The invention comprises a support base, a rotary motor, a turntable, and several supporting mechanisms arranged on the turntable; the rotary motor is arranged on the support base with the output shaft of the rotary motor pointing vertically upward; the turntable is arranged above the rotary motor and connected to the output shaft of the rotary motor, so that the turntable is driven to rotate by the rotary motor; all supporting mechanisms are evenly distributed along the circumference of the turntable, and each supporting mechanism extends radially to the outside of the turntable, for supporting wafers; The bearing mechanism includes a horizontally arranged support beam and a mounting seat for connecting to the turntable, one end of the support beam is fixed to the mounting seat and the upper surface of the support beam is flush with or higher than the upper surface of the mounting seat, and a bearing block is provided on the upper surface of the other end of the support beam, the bearing block is horizontally arranged and a bearing member is provided on the upper surface of the outer end of the bearing block, the bearing member is a rubber ring, and the inner bottom and outer height of the bearing member are inclined.

2. The wafer detection carrying device according to claim 1, characterized in that: The upper surface of the outer end of the bearing block is provided with an inclined sinking platform with an inner bottom and an outer height. The inclination angle of the sinking platform corresponds to the inclination angle of the bearing member. The bearing member is arranged on the sinking platform, and the upper part of the bearing member protrudes a certain height from the bearing block.

3. The wafer detection carrying device according to claim 2, characterized in that: The lower surface of the inner end of the bearing block protrudes below the bearing block to form a bulge, and a groove corresponding to the bulge is provided on the support beam. The bulge of the bearing block is embedded in the groove of the support beam. At the same time, a plurality of first threaded holes are provided on the lower surface of the bearing block, and a second threaded hole is provided on the support beam that passes through the upper and lower surfaces of the support beam. The first threaded hole and the second threaded hole are arranged in one-to-one correspondence, and the first bolt passes through the second threaded hole from bottom to top and is inserted into the first threaded hole, thereby realizing the connection between the bearing block and the support beam.

4. The wafer detection carrying device according to claim 2, characterized in that: The bearing member is detachably arranged on the bearing block, and a third threaded hole corresponding to the center hole of the bearing member is provided on the bearing block. The second bolt passes through the center hole of the bearing member from top to bottom and is inserted into the third threaded hole. The size of the upper end of the second bolt is smaller than the bearing member, thereby pressing the bearing member to be fixed on the bearing block.

5. A wafer detection carrying device according to claim 1, 2 or 3, characterized in that: The inclination angle of the bearing is 7~9°.

6. The wafer detection carrying device according to claim 1, characterized in that: A lifting adjustment member is provided between the mounting seat and the support beam, and the lifting adjustment member is fixed on the mounting seat. The support beam can be lifted and lowered on the lifting adjustment member, so that the support beam can be lifted and lowered by adjusting the lifting adjustment member, thereby adjusting the height of the support beam.

7. The wafer detection carrying device according to claim 6, characterized in that: The mounting seat includes a horizontally arranged horizontal plate and a vertically arranged vertical plate. The vertical plate is arranged on one side edge of the horizontal plate and is located above the horizontal plate, thereby forming an L-shaped structure. The horizontal plate is provided with a plurality of mounting holes, and the turntable is provided with fixing holes corresponding to the mounting holes of the horizontal plate one by one, so that the mounting seat can be fixed to the turntable through fixing parts. The vertical plate is provided with a plurality of connecting holes for connecting with the lifting and adjusting parts.

8. The wafer detection carrying device according to claim 1, characterized in that: There are two rubber rings, which are arranged to overlap each other.

9. The wafer detection carrying device according to claim 1, characterized in that: The support base includes a support plate for supporting the rotating motor, and the carrying device also includes a motor protection mechanism arranged on the outside of the rotating motor. The motor protection mechanism includes an annular beam arranged above the support plate and a plurality of vertical rods arranged between the annular beam and the support plate. All vertical rods are evenly distributed along the circumference of the annular beam, and the turntable is located above the annular beam.