Pressurizing device

Abstract

The utility model discloses a pressurizing device which comprises a pressurizing tank, a liquid inlet assembly, a liquid outlet assembly, an air inlet pipeline, a first pneumatic control valve, an air outlet pipeline and a second pneumatic control valve, a liquid inlet of the pressurizing tank is communicated with the liquid inlet assembly, and a liquid outlet of the pressurizing tank is communicated with the liquid outlet assembly. A gas inlet of the pressurizing tank is communicated with the gas inlet pipeline so as to introduce gas to pressurize liquid in the pressurizing tank, the gas inlet pipeline is provided with the first pneumatic control valve, a gas outlet of the pressurizing tank is communicated with the gas outlet pipeline, and the gas outlet pipeline is provided with the second pneumatic control valve. Liquid is fed into the pressurizing tank through the liquid inlet assembly, a proper amount of compressed gas is introduced into the pressurizing tank through the gas inlet pipeline and the first pneumatic control valve, the pressure of the liquid in the tank is increased, and the pressurized liquid is conveyed to the cleaning machine at stable pressure and flow through the liquid outlet assembly. And the problem of unstable flow and pressure caused by a shared pipeline is solved.

Description

Technical Field

[0001] The utility model relates to the technical field of wafer cleaning pipelines, in particular to a pressurizing device. Background Art

[0002] In the semiconductor manufacturing process, wafer cleaning is a critical step in ensuring product quality and stability. This process involves meticulously cleaning the wafers using a combination of chemicals and ultrapure water to remove surface particles, organic matter, and other impurities. These chemicals and ultrapure water are sprayed onto the wafer surface via a precision cleaning machine, where the high-speed rotation of the spindle effectively cleans the wafer.

[0003] Currently, the supply of chemical solutions and ultrapure water used in wafer cleaning machines typically relies on shared piping within the factory's utility system. When multiple devices are operating simultaneously across multiple workshops, or within the same workshop, this can cause fluctuations in flow and pressure. This reduced flow and pressure can lead to incomplete cleaning of residual contaminants from wafers, resulting in reduced wafer quality. Utility Model Content

[0004] The technical problem to be solved by the present invention is that the supply of chemical liquid and ultrapure water used in the wafer cleaning machine usually relies on the common pipeline of the factory system. When multiple workshops or multiple devices in the same workshop are running at the same time, it will cause fluctuations in flow and pressure. As a result, the wafer cannot be thoroughly cleaned of residual contaminants due to the reduction in flow and pressure, resulting in a decline in quality.

[0005] In order to solve the above technical problems, the utility model provides a pressurizing device, including a pressurizing tank, a liquid inlet assembly, a liquid outlet assembly, an air inlet pipe, a first air-controlled valve, an air outlet pipe and a second air-controlled valve. The liquid inlet of the pressurizing tank is connected to the liquid inlet assembly, the liquid outlet of the pressurizing tank is connected to the liquid outlet assembly, the air inlet of the pressurizing tank is connected to the air inlet pipe, so that gas is introduced to pressurize the liquid in the pressurizing tank. The air inlet pipe is provided with the first air-controlled valve, the air outlet of the pressurizing tank is connected to the air outlet pipe, and the air outlet pipe is provided with the second air-controlled valve.

[0006] Furthermore, the liquid inlet assembly includes a third air-controlled valve and a liquid inlet pipe, the liquid inlet pipe is connected to the liquid inlet of the pressurized tank, the third air-controlled valve is arranged on the liquid inlet pipe, and the liquid inlet pipe is connected to an external liquid source at one end away from the pressurized tank.

[0007] Furthermore, the liquid inlet assembly further includes a first buffer tank, which is arranged between the third air-controlled valve and the pressurized tank.

[0008] Furthermore, the liquid outlet assembly includes a fourth air-controlled valve and a liquid outlet pipe, the liquid outlet pipe is connected to the liquid outlet of the pressurized tank, and the fourth air-controlled valve is arranged on the liquid outlet pipe.

[0009] Furthermore, a second buffer tank is included, which is arranged in the air intake pipe and between the first air control valve and the pressurizing tank.

[0010] Furthermore, it also includes a connecting pipe, a first liquid level sensor and a second liquid level sensor. The pressurized tank also has a connecting port, which is located at the top of the pressurized tank. One end of the connecting pipe is connected to the connecting port, and the other end of the connecting pipe is connected to the bottom of the pressurized tank. The first liquid level sensor is arranged at one end of the connecting pipe close to the connecting port, and the second liquid level sensor is arranged at one end of the connecting pipe close to the bottom of the pressurized tank.

[0011] Furthermore, the pressurized tank includes a tank body and a tank cover, the tank body is connected to the tank cover, and the tank cover and the tank body are sealed together, the tank cover has the liquid inlet, air outlet, air inlet and connecting port, and the liquid outlet is provided at one end of the tank body away from the tank cover.

[0012] Furthermore, the width of the tank body gradually decreases from the tank mouth toward the tank bottom of the tank body.

[0013] Furthermore, the tank body extends outward to form a first connecting portion, and two ends of the first connecting portion are penetrated to form a liquid outlet.

[0014] Furthermore, the tank cover extends outward to form a second connecting part, a third connecting part, a fourth connecting part and a fifth connecting part, the two ends of the second connecting part are penetrated to form a liquid inlet, the two ends of the third connecting part are penetrated to form an air outlet, the two ends of the fourth connecting part are penetrated to form an air inlet, and the two ends of the fifth connecting part are penetrated to form a connection port.

[0015] Compared with the prior art, the pressurizing device of the present invention has the following advantages:

[0016] When the wafer cleaning machine needs liquid medicine, the utility model sends the liquid into the pressurized tank through the liquid inlet component, utilizes the air inlet pipe and the first air control valve to introduce an appropriate amount of compressed gas into the pressurized tank to increase the pressure of the liquid in the tank, and transmits the pressurized liquid to the cleaning machine at a stable pressure and flow rate through the liquid outlet component. The second air control valve releases the gas in time according to the change of the pressure in the tank to ensure the stability of the pressure and avoid the occurrence of overpressure or underpressure. It ensures that even when multiple devices are used at the same time, each device can still obtain stable pressure and flow, thereby improving the quality and efficiency of wafer cleaning and solving the problem of unstable flow and pressure caused by shared pipelines. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a structural schematic diagram of a pressurizing device provided in an embodiment of the present utility model;

[0018] In the figure, 1. pressurized tank; 101. tank body; 1011. first connecting part; 102. tank cover; 1021. second connecting part; 1022. third connecting part; 1023. fourth connecting part; 1024. fifth connecting part; 2. liquid inlet assembly; 201. third air-controlled valve; 202. liquid inlet pipe; 203. first buffer tank; 3. liquid outlet assembly; 301. fourth air-controlled valve; 302. liquid outlet pipe; 4. air inlet pipe; 5. first air-controlled valve; 6. air outlet pipe; 7. second air-controlled valve; 8. second buffer tank; 9. connecting pipe; 10. first liquid level sensor; 11. second liquid level sensor. DETAILED DESCRIPTION

[0019] The following embodiments are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

[0020] like Figure 1As shown, the utility model provides a pressurizing device, a system for increasing the pressure of a liquid (such as a liquid medicine), which includes a pressurizing tank 1, a liquid inlet component 2, a liquid outlet component 3, an air inlet pipe 4, a first air control valve 5, an air outlet pipe 6 and a second air control valve 7. The pressurizing tank 1 stores the liquid to be pressurized, such as liquid medicine, and the liquid inlet of the pressurizing tank 1 is connected to the liquid inlet component 2 to introduce the liquid from an external liquid supply source into the pressurizing tank 1. The liquid outlet of the pressurizing tank 1 is connected to the liquid outlet component 3 to output the pressurized liquid to downstream equipment, such as wafer cleaning. Machine, the air inlet of the pressurized tank 1 is connected with the air inlet pipe 4, so as to pass gas to pressurize the liquid in the pressurized tank 1, and the air inlet pipe 4 is provided with a first air control valve 5 to control the flow of gas entering the pressurized tank 1, thereby accurately adjusting the pressure level in the pressurized tank 1, and the air outlet of the pressurized tank 1 is connected with the air outlet pipe 6 to release excess gas in the tank, maintain pressure stability or adjust pressure, and the air outlet pipe 6 is provided with a second air control valve 7 to control the discharge of gas, and cooperate with the first air control valve 5 to realize precise regulation of the gas pressure in the pressurized tank 1.

[0021] Based on the above structure, when the wafer cleaning machine needs liquid medicine, the liquid is sent into the pressurized tank 1 through the liquid inlet component 2, and an appropriate amount of compressed gas is introduced into the pressurized tank 1 using the air inlet pipe 4 and the first air control valve 5 to increase the pressure of the liquid in the tank, and the pressurized liquid is delivered to the cleaning machine at a stable pressure and flow rate through the liquid outlet component 3. The second air control valve 7 releases gas in time according to the change of the pressure in the tank to ensure the stability of the pressure and avoid the occurrence of overpressure or underpressure. It ensures that even when multiple devices are used at the same time, each device can still obtain stable pressure and flow, thereby improving the quality and efficiency of wafer cleaning and solving the flow and pressure instability problems caused by shared pipelines.

[0022] It should be noted that the gas in this embodiment is nitrogen. By utilizing the compressibility of nitrogen and the incompressibility of liquid, the pressure of the nitrogen can be controlled to increase and stabilize the pressure of the chemical solution, thereby improving the yield of wafer cleaning.

[0023] Furthermore, the liquid inlet assembly 2 includes a third air-controlled valve 201 and a liquid inlet pipe 202. The liquid inlet pipe 202 is connected to the liquid inlet of the pressurized tank 1. The third air-controlled valve 201 is disposed in the liquid inlet pipe 202 to control the flow of liquid, ensuring that liquid is allowed to flow into the pressurized tank 1 only when needed. For example, during the wafer cleaning preparation stage, the third air-controlled valve 201 is opened, allowing liquid to flow from the liquid source through the liquid inlet pipe 202 into the pressurized tank 1. Alternatively, after the cleaning process is completed or when further liquid supply is no longer needed, the third air-controlled valve 201 is closed, preventing liquid flow and preventing unnecessary waste or overfilling. By controlling the opening and closing state of the third air-controlled valve 201, this embodiment can precisely control the amount of liquid entering the pressurized tank 1, ensuring that the appropriate amount of liquid is supplied for each cleaning operation and avoiding excessive or insufficient liquid. The liquid inlet pipe 202 is connected to an external liquid source at one end away from the pressurized tank 1. Liquid is introduced from the external liquid source into the pressurized tank 1 through the liquid inlet pipe 202.

[0024] Furthermore, the liquid inlet assembly 2 further includes a first buffer tank 203 , which is disposed between the third air control valve 201 and the pressurized tank 1 .

[0025] The first buffer tank 203 of this embodiment can temporarily store a certain amount of liquid medicine. When the pressure tank 1 or downstream equipment (such as a wafer cleaning machine) suddenly increases the demand for liquid medicine, the buffer tank can quickly replenish this part of the demand, avoiding cleaning interruptions or decreased efficiency due to the momentary shortage of liquid medicine supply. This instant replenishment mechanism ensures the continuous supply of liquid medicine and remains stable even during peak demand. In addition, when the flow of liquid medicine suddenly stops or changes direction, due to the inertia of the liquid, pressure waves will be generated in the pipeline, which may cause vibration, noise or even damage to the pipeline. Using the first buffer tank 203 to absorb and slow down the sudden changes in the flow of liquid medicine can reduce the water hammer effect, protect the pipeline system and the pressurizing device from damage, extend the life of the equipment, and reduce maintenance costs.

[0026] Furthermore, the liquid outlet assembly 3 includes a fourth air-controlled valve 301 and a liquid outlet pipe 302. The liquid outlet pipe 302 is connected to the liquid outlet of the pressurized tank 1 and is used to transport pressurized liquid. After being pressurized by the gas in the pressurized tank 1, the liquid flows through the liquid outlet pipe 302 to the wafer cleaning machine. The fourth air-controlled valve 301 is disposed on the liquid outlet pipe 302 to control the timing and flow rate of liquid flowing out of the pressurized tank 1, ensuring stable liquid output according to preset requirements. For example, when the wafer cleaning machine needs liquid, the fourth air-controlled valve 301 opens, allowing the pressurized liquid to flow through the liquid outlet pipe 302 to the cleaning machine. Alternatively, after the cleaning process is completed or when further liquid supply is no longer needed, the fourth air-controlled valve 301 closes to prevent liquid outflow, thereby preventing resource waste and possible overflow.

[0027] This embodiment controls the output of pressurized liquid through the fourth air-controlled valve 301 to ensure that the wafer cleaning machine or other downstream equipment can obtain stable flow and pressure when needed. In addition, in the non-working state, the fourth air-controlled valve 301 is closed to prevent unpressurized or uncontrolled liquid from accidentally flowing out, protecting downstream equipment from potential damage.

[0028] Furthermore, a second buffer tank 8 is included. The second buffer tank 8 is arranged in the air intake pipe 4 , and the second buffer tank 8 is arranged between the first air control valve 5 and the pressurized tank 1 .

[0029] Based on the above structure, when gas rapidly enters pressurized tank 1, second buffer tank 8 provides a buffer zone, absorbing and mitigating pressure waves generated during gas transportation and reducing the impact of water hammer. As gas enters the pipeline, the space within the buffer tank temporarily accommodates this gas, smoothing its flow and reducing the formation of pressure waves. This further balances the pressure and ensures a more stable pressure for the gas entering pressurized tank 1, thereby improving the accuracy and efficiency of the pressurization process.

[0030] Furthermore, it also includes a connecting pipe 9, a first liquid level sensor 10 and a second liquid level sensor 11. The pressurized tank 1 also has a connecting port, which is located at the top of the pressurized tank 1. One end of the connecting pipe 9 is connected to the connecting port, and the other end of the connecting pipe 9 is connected to the bottom of the pressurized tank 1. The first liquid level sensor 10 is arranged at one end of the connecting pipe 9 near the connecting port, and is used to detect the highest safe liquid level. When the liquid level reaches or approaches this sensor, it will trigger an alarm or automatic control system to stop further input of liquid, prevent the pressurized tank 1 from overfilling, and avoid liquid overflow or safety hazards during the pressurization process. The second liquid level sensor 11 is arranged at one end of the connecting pipe 9 near the bottom of the pressurized tank 1, and is used to monitor the lowest safe liquid level. When the liquid level is lower than this sensor, it will send a signal to prompt the system to add liquid to maintain the minimum operating liquid level in the pressurized tank 1, ensure the normal progress of the pressurization process, and avoid the risk of pressure out of control caused by pressurization of an empty tank.

[0031] In this embodiment, the first liquid level sensor 10 and the second liquid level sensor 11 monitor the liquid level change in the connecting pipe 9, which indirectly reflects the liquid level status in the pressurized tank 1 and can provide real-time feedback of the liquid level information.

[0032] Furthermore, the pressurized tank 1 includes a tank body 101 and a tank cover 102. The tank body 101 is used to store liquid and is connected to the tank cover 102. The tank cover 102 is sealed to the tank body 101 to ensure the airtightness of the pressurized tank 1. The tank cover 102 has multiple interfaces for the entry and exit of liquid and gas, etc., such as the liquid inlet is used for the input of liquid, which is connected to the liquid inlet component 2 (such as the liquid inlet pipe 202 and the third air control valve 201) so as to introduce liquid such as medicine from the external liquid supply system into the pressurized tank 1. The air outlet is used to discharge the gas in the tank and is usually connected to the air outlet pipe 6 and the second air control valve 7. During the pressurization process, excess gas can be discharged through the air outlet to maintain the stability of the pressure in the tank; the air inlet is used for the input of gas (such as nitrogen or compressed air), and is connected to the air inlet pipe 4 and the first air control valve 5, and is used to inject gas into the tank to increase the pressure of the liquid. The connecting port is located at the top of the tank cover 102 and is connected to the connecting pipe 9, which is used to install a liquid level sensor (such as the first liquid level sensor 10 and the second liquid level sensor 11) to monitor the liquid level in the tank and ensure that the liquid filling amount is within a safe range. A liquid outlet is provided at one end of the tank body 101 away from the tank cover 102, which is connected to the liquid outlet component 3 (such as the liquid outlet pipe 302 and the fourth air control valve 301), and is used to output the pressurized liquid to downstream equipment, such as a wafer cleaning machine.

[0033] Furthermore, the width of the tank body 101 gradually decreases from the tank mouth of the tank body 101 toward the tank bottom of the tank body 101. When the bottom of the tank body 101 gradually narrows, any liquid remaining at the bottom of the tank will naturally gather at the narrowest part, that is, the lowest point of the tank bottom, and flow out from the liquid outlet.

[0034] Furthermore, the tank body 101 extends outward to form a first connecting portion 1011, and both ends of the first connecting portion 1011 are penetrated to form a liquid outlet, which is directly connected to the interior of the tank body 101, so that the pressurized liquid can be output from the tank body 101 through the liquid outlet to downstream equipment, such as a wafer cleaning machine.

[0035] Furthermore, the tank cover 102 extends outward to form a second connecting portion 1021, a third connecting portion 1022, a fourth connecting portion 1023 and a fifth connecting portion 1024. The two ends of the second connecting portion 1021 are penetrated to form a liquid inlet, the two ends of the third connecting portion 1022 are penetrated to form an air outlet, the two ends of the fourth connecting portion 1023 are penetrated to form an air inlet, and the two ends of the fifth connecting portion 1024 are penetrated to form a connection port.

[0036] Based on the above structure, this embodiment forms a second connection part 1021, a third connection part 1022, a fourth connection part 1023 and a fifth connection part 1024 by extending outward, so that the connection parts with the liquid inlet pipe 202, the air inlet pipe 4, the air outlet pipe 6 and the connecting pipe 9 can extend to the outside of the tank cover 102, which facilitates connection while reducing operational errors caused by interface confusion and improving production efficiency and safety.

[0037] The specific working process is as follows: the medicine flows into the first pressurized tank 1 through the third air-controlled valve 201; when the medicine is needed, the fourth air-controlled valve 301 is opened, the third air-controlled valve 201 is closed, and at the same time the first air-controlled valve 5 is opened and the second air-controlled valve 7 is closed, and nitrogen flows into the pressurized tank 1 through the first air-controlled valve 5 to pressurize the medicine; when the medicine is used up, the liquid level triggers the second liquid level sensor 11, the fourth air-controlled valve 301 / first air-controlled valve 5 is closed, and at the same time the second air-controlled valve 7 is opened to relieve the pressure inside the pressurized tank 1, and then the valve is closed, the third air-controlled valve 201 is opened, and the medicine is replenished into the pressurized tank 1; when the liquid level in the pressurized tank 1 triggers the first liquid level sensor 10, the medicine stops being replenished, the third air-controlled valve 201 is closed, and the next command for the machine to use the medicine is waited for.

[0038] To sum up, the embodiment of the present invention provides a pressurizing device. When the wafer cleaning machine needs liquid medicine, the liquid is sent into the pressurized tank 1 through the liquid inlet component 2, and an appropriate amount of compressed gas is introduced into the pressurized tank 1 by using the air inlet pipe 4 and the first air control valve 5 to increase the pressure of the liquid in the tank, and the pressurized liquid is delivered to the cleaning machine at a stable pressure and flow rate through the liquid outlet component 3. The second air control valve 7 releases gas in time according to the change of the pressure in the tank to ensure the stability of the pressure and avoid the occurrence of overpressure or underpressure. It ensures that even when multiple devices are used at the same time, each device can still obtain stable pressure and flow, thereby improving the quality and efficiency of wafer cleaning and solving the flow and pressure instability problems caused by shared pipelines.

[0039] The above is only a preferred embodiment of the present invention. It should be pointed out that for ordinary technicians in this technical field, several improvements and replacements can be made without departing from the technical principles of the present invention. These improvements and replacements should also be regarded as the scope of protection of the present invention.

Claims

1. A pressurizing device, characterized in that: It includes a pressurized tank, a liquid inlet component, a liquid outlet component, an air inlet pipe, a first air-controlled valve, an air outlet pipe and a second air-controlled valve. The liquid inlet of the pressurized tank is connected to the liquid inlet component, the liquid outlet of the pressurized tank is connected to the liquid outlet component, the air inlet of the pressurized tank is connected to the air inlet pipe, so that gas is introduced to pressurize the liquid in the pressurized tank. The air inlet pipe is provided with the first air-controlled valve, the air outlet of the pressurized tank is connected to the air outlet pipe, and the air outlet pipe is provided with the second air-controlled valve.

2. The pressurizing device according to claim 1, characterized in that The liquid inlet assembly includes a third air-controlled valve and a liquid inlet pipe, the liquid inlet pipe is connected to the liquid inlet of the pressurized tank, the third air-controlled valve is arranged on the liquid inlet pipe, and the liquid inlet pipe is connected to an external liquid source at one end away from the pressurized tank.

3. The pressurizing device according to claim 2, characterized in that The liquid inlet assembly further includes a first buffer tank, which is disposed between the third air control valve and the pressurizing tank.

4. The pressurizing device according to claim 1, characterized in that The liquid outlet assembly includes a fourth air-controlled valve and a liquid outlet pipe. The liquid outlet pipe is connected to the liquid outlet of the pressurized tank. The fourth air-controlled valve is arranged on the liquid outlet pipe.

5. The pressurizing device according to claim 1, characterized in that It also includes a second buffer tank, which is arranged in the air intake pipe and between the first air control valve and the pressurizing tank.

6. The pressurizing device according to claim 1, characterized in that It also includes a connecting pipe, a first liquid level sensor and a second liquid level sensor. The pressurized tank also has a connecting port, which is located at the top of the pressurized tank. One end of the connecting pipe is connected to the connecting port, and the other end of the connecting pipe is connected to the bottom of the pressurized tank. The first liquid level sensor is arranged at one end of the connecting pipe close to the connecting port, and the second liquid level sensor is arranged at one end of the connecting pipe close to the bottom of the pressurized tank.

7. The pressurizing device according to claim 1, characterized in that The pressurized tank includes a tank body and a tank cover, the tank body is connected to the tank cover, and the tank cover and the tank body are sealed together, the tank cover has the liquid inlet, the air outlet, the air inlet and the connecting port, and the liquid outlet is provided at one end of the tank body away from the tank cover.

8. The pressurizing device according to claim 7, characterized in that The width of the tank body gradually decreases from the tank mouth toward the tank bottom of the tank body.

9. The pressurizing device according to claim 7, characterized in that: The tank body extends outward to form a first connecting portion, and two ends of the first connecting portion are penetrated to form a liquid outlet.

10. The pressurizing device according to claim 7, characterized in that The tank cover extends outward to form a second connecting part, a third connecting part, a fourth connecting part and a fifth connecting part. The two ends of the second connecting part are penetrated to form a liquid inlet, the two ends of the third connecting part are penetrated to form an air outlet, the two ends of the fourth connecting part are penetrated to form an air inlet, and the two ends of the fifth connecting part are penetrated to form a connection port.

Images