Battery silicon wafer cleaning tank capable of prolonging service life of liquid medicine

Abstract

The utility model discloses a battery silicon wafer rinse tank capable of prolonging the service life of liquid medicine, which comprises a main tank and an auxiliary tank, a flow uniformizing plate is arranged in the main tank, an overflow pipe, a water supplementing pipe and a liquid supplementing pipe are arranged in the main tank in the area above the flow uniformizing plate, and the bottom of the overflow pipe penetrates through the main tank and is communicated with the auxiliary tank. A circulating pipe and a nitrogen bubbling pipe are mounted in the main tank in the area below the flow uniformizing plate, a deposition area of a conical structure is arranged at the bottom of the main tank, a liquid outlet is formed in the bottom of the deposition area, and a pneumatic valve is mounted at the liquid outlet; and a pump body is arranged in the auxiliary tank and is used for communicating the circulating pipe to circulate liquid in the main tank and the auxiliary tank. Liquid medicine circulation is achieved, the problem of turbulent flow in the cleaning process is avoided, and silicate can be effectively cleaned and discharged.

Description

Technical Field

[0001] The utility model belongs to battery cleaning technology, in particular to a battery silicon wafer cleaning tank capable of increasing the life of a chemical solution. Background Art

[0002] During the preparation of solar photovoltaic cells, as the reaction time goes by during the silicon wafer surface cleaning process, silicate by-products generated inside the tank settle due to gravity and accumulate at the bottom of the tank. As the concentration gradually increases, the viscosity of the solution increases, the surface tension increases, and the reaction rate of the silicon wafer in the solution decreases, resulting in a shortened life of the tank solution.

[0003] First, the current method is to set a certain inclination angle on the bottom plane of the tank to make the silicate deposit to one side. However, due to the large deposition path, the life of a single batch can be up to 180 batches, and the tank liquid needs to be replaced when it expires.

[0004] Secondly, the basket brings water into the tank each time it cleans the silicon wafers, and also removes the chemical solution after cleaning, causing the concentration of the chemical solution inside to fluctuate. Each time the chemical solution or water is added, the concentration inside the tank can become excessive in certain areas, adversely affecting the silicon wafer cleaning operation. Utility Model Content

[0005] In order to solve the above technical problems, the inventors have come up with the technical solution of the present invention through practice and summary. The present invention adopts the following technical solution:

[0006] A battery silicon wafer cleaning tank for improving the life of a chemical solution, comprising:

[0007] The main tank and the auxiliary tank are provided with a flow equalizer plate in the main tank. An overflow pipe, a water supply pipe, and a liquid supply pipe are installed in the main tank above the flow equalizer plate. The bottom of the overflow pipe passes through the main tank and is connected to the auxiliary tank. A circulation pipe and a nitrogen bubbling pipe are installed in the main tank below the flow equalizer plate. A conical sedimentation area is provided at the bottom of the main tank, and a drain port is provided at the bottom of the sedimentation area. A pneumatic valve is installed at the drain port.

[0008] A pump body is installed in the auxiliary tank to connect the circulation pipe to circulate the liquid in the main tank and the auxiliary tank.

[0009] Preferably, the top of the deposition area is 150-350 mm away from the flow plate.

[0010] Preferably, the deposition area includes a conical deposition portion located at the top and an effective deposition portion located at the bottom.

[0011] Preferably, notches are installed on both sides of the conical deposition portion, and rubber cleaning belts are sealed and installed at the notches. The rubber cleaning belts are attached to the notches. Conveying rollers and drive motors are installed on the outside of the main groove. Conveying rollers are installed on the output end of the drive motor through a coupling. Multiple conveying rollers are installed along the length direction of the notch, and the rubber cleaning belts are wrapped around the outside of the multiple conveying rollers.

[0012] Preferably, a scraper plate is provided at the bottom of the notch.

[0013] Preferably, a limiting guide block is installed on the side of the rubber cleaning belt, and two guide plates are installed on the main groove. The two guide plates are respectively installed at both ends in the width direction of the notch, and the limiting guide block is slidably fitted in the guide plate.

[0014] Preferably, a horizontally movable partition plate is provided on the top of the conical deposition portion, a cylinder is installed on the outside of the main tank, and the piston end of the cylinder is connected to the partition plate to drive the partition plate to block the top of the conical deposition portion.

[0015] Preferably, a servo motor is installed on the main groove outside the effective deposition part, the output end of the servo motor extends to the inner side of the effective deposition part and is connected to a rotary rod via a bevel gear set, and a scraper is installed on the rotary rod for cleaning the side wall of the conical deposition part;

[0016] A transverse plate is installed on the inner side of the effective deposition part for rotatably installing the rotary rod.

[0017] Compared with the prior art, the present invention has the following beneficial effects:

[0018] The utility model realizes internal liquid circulation by adopting the main and auxiliary tanks through the overflow pipe, pump body and circulation pipe, and reduces bubbles and circulation disturbances through the uniform flow plate. The main tank is slowly replenished with liquid through the water replenishment pipe and the liquid replenishment pipe according to the control program to maintain the concentration and retention of the liquid. During cleaning, the overflow is always kept 0-5mm above the overflow surface, so that the bubbles containing the by-product silicate and hydrogen are discharged from the main tank through the overflow port and enter the auxiliary tank, and then circulate to the main tank through the auxiliary tank, realizing the circulation of the liquid. The spacing between the deposition area and the uniform flow plate is strictly controlled to achieve effective sedimentation of the silicate product. The deposited silicate product can be directed downward by using a circulating (alkali-resistant) rubber cleaning belt, and almost no disturbance is caused to the internal liquid during the (slow) transportation. The scraper plate at the notch is used to clean the silicate on the surface, so that it falls into the inside of the effective deposition part for centralized cleaning, preventing it from sticking to the conical deposition part and affecting the concentration of the internal liquid. It is also possible to use a direct isolation of the deposition area to directly and quickly remove the silicate from the deposition area. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 It is a main cross-sectional view of the overall structure of the utility model.

[0020] Figure 2 It is a side sectional view of the overall structure of the utility model.

[0021] Figure 3 This is a schematic diagram of the structure of the utility model using a rubber cleaning belt to clean silicate.

[0022] Figure 4 for Figure 3 Schematic diagram of the structure without the conveyor roller and rubber cleaning belt installed.

[0023] Figure 5 This is a schematic diagram of the structure of the utility model using a rotary method to clean silicates. DETAILED DESCRIPTION

[0024] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments.

[0025] In the description of the present invention, it should be understood that the terms "upper", "lower", "front", "back", "left", "right", "top", "bottom", "inside", "outside", etc., indicating directions or positional relationships, are based on the directions or positional relationships shown in the accompanying drawings. They are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific direction, be constructed and operated in a specific direction. Therefore, they cannot be understood as limitations on the present invention.

[0026] Examples, such as Figure 1 As shown, a battery silicon wafer cleaning tank for improving the life of the chemical solution includes: a main tank 10 and a sub-tank 20, a flow equalizer 30 is provided in the main tank 10, an overflow pipe 40, a water replenishment pipe 50, and a liquid replenishment pipe 60 are installed in the main tank 10 above the flow equalizer 30, the bottom of the overflow pipe 40 passes through the main tank 10 and is connected to the sub-tank 20, a circulation pipe 80 and a nitrogen bubbling tube 70 are installed in the main tank 10 located below the flow equalizer 30, a conical deposition area 90 is provided at the bottom of the main tank 10, and a drain port is provided at the bottom of the deposition area 90, and a pneumatic valve 100 is installed at the drain port.

[0027] A pump body 110 is installed in the auxiliary tank 20 for connecting with the circulation pipe 80 to circulate the liquid in the main tank 10 and the auxiliary tank 20 .

[0028] The main tank 10 is replenished with liquid in a regular and quantitative manner through the liquid replenishment pipe 60 and the water replenishment pipe 50 according to the set program. The replenishment amount is determined by the estimated amount of water brought into the flower basket each time and the amount of liquid medicine taken away by the flower basket when it is removed. The replenishment time is determined by the number of times the flower basket enters and exits.

[0029] During use, a basket containing solar cell silicon wafers enters the main tank 10 to initiate the reaction. During the reaction, pump 110 activates, circulating the chemical solution in and out of the main tank 10. The silicate and hydrogen mixture flows through overflow pipe 40 into the secondary tank 20, and then through pump 110 into the main tank 10. A flow plate 30 is used to reduce bubbles and minimize turbulence in the internal chemical solution. After the reaction, silicate is deposited in the sedimentation area. This is periodically drained and cleared through the pneumatic valve 100 at the drain port to maintain the internal chemical solution concentration and reduce its viscosity.

[0030] Based on the above embodiment, the top of the deposition area 90 is 150-350 mm away from the bottom of the flow plate 30 , which is conducive to the deposition of silicate products.

[0031] On the basis of the above embodiment, the deposition area 90 includes a conical deposition portion 91 at the top and an effective deposition portion 92 at the bottom, which shortens the deposition path and prevents excessive viscosity in the deposition area.

[0032] Based on the above embodiments, Figure 2 As shown, a horizontally movable partition plate 93 is provided at the top of the conical deposition section 91. A cylinder 94 is installed on the outside of the main tank 10. The piston end of the cylinder 94 is connected to the partition plate 93, which is used to drive the partition plate 93 to block the top of the conical deposition section 91. The partition plate 93 is sealed at the top of the conical deposition section 91 by the action of the cylinder 94, separating the upper layer of chemical solution from the lower deposition product. At this time, the silicate at the bottom is discharged, which can reduce the loss of chemical solution.

[0033] A way to clean up, such as Figure 3 and Figure 4 As shown, notches 911 are installed on both sides of the conical deposition portion 91, and rubber cleaning belts 914 are sealed and installed at the notches 911. The rubber cleaning belts 914 are attached to the notches 911. Conveying rollers 912 and a drive motor 913 are installed on the outside of the main trough 10. The output end of the drive motor 913 is installed with a conveying roller 912 through a coupling. Multiple conveying rollers 912 are installed along the length of the notch 911, and the rubber cleaning belts 914 are wound around the outside of the multiple conveying rollers 912. The drive motor 913 drives the conveying rollers 912 to continuously convey the silicate on the surface downward at a conveying speed of 0.05-0.3m / min. The conveying process does not cause internal turbulence of the liquid medicine, and does not affect the cleaning and deposition effects. The silicate product is continuously conveyed downward, which is not conducive to the silicate sticking to the surface of the lower bus conveyor belt 914, thereby facilitating cleaning.

[0034] A scraper 915 is provided at the bottom of the notch 911 for cleaning silicate products on the surface of the rubber cleaning belt 914 .

[0035] To ensure the fit between the rubber cleaning belt 914 between the conveyor rollers 912 and the notch 911, position-limiting guide blocks 916 are installed on both sides of the rubber cleaning belt 914. Two guide plates 917 are installed on the main groove 10, one at each end of the width direction of the notch 911. The position-limiting guide blocks 916 slide in the guide plates 917. The position-limiting guide blocks 916 slide in the guide plates 917 to hold the rubber cleaning belt 914 tightly, preventing it from becoming loose and causing leakage.

[0036] Another cleaning method is to clean in a rotary manner, such as Figure 5 As shown, a servo motor 95 is mounted on the main tank 10 outside the effective deposition section 92. The output end of the servo motor 95 extends inside the effective deposition section 92 and is connected to a rotating rod 96 via a bevel gear set. A scraper 97 is mounted on the rotating rod 96 to clean the sidewalls of the conical deposition section 91. A horizontal plate 98 is mounted inside the effective deposition section 92 to rotate the rotating rod 96. A shield is mounted on the horizontal plate 98 to prevent silicate from sticking to the internal bevel gear set. The servo motor 95 drives the rotating rod 96 to rotate, and the scraper 97 cleans the sidewalls, effectively removing silicate adhering to the sidewalls.

[0037] The above description is merely a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. The replacements described may be partial structures, devices, or method steps, or they may be complete technical solutions. Any equivalent replacements or modifications based on the technical solution and the concept of the present invention shall be covered by the scope of protection of the present invention.

Claims

1. A battery silicon wafer cleaning tank for improving the life of the chemical solution, characterized in that: include: A main tank (10) and a secondary tank (20), wherein a flow-distributing plate (30) is provided in the main tank (10), an overflow pipe (40), a water supply pipe (50), and a liquid supply pipe (60) are installed in the main tank (10) above the flow-distributing plate (30), the bottom of the overflow pipe (40) passes through the main tank (10) and is in communication with the secondary tank (20), a circulation pipe (80) and a nitrogen bubbling pipe (70) are installed in the main tank (10) below the flow-distributing plate (30), a conical sedimentation area (90) is provided at the bottom of the main tank (10), and a liquid discharge port is provided at the bottom of the sedimentation area (90), and a pneumatic valve (100) is installed at the liquid discharge port; A pump body (110) is installed in the auxiliary tank (20) for communicating with the circulation pipe (80) to circulate the liquid in the main tank (10) and the auxiliary tank (20).

2. A battery silicon wafer cleaning tank for improving the life of the chemical solution according to claim 1, characterized in that: The top of the deposition area (90) is 150-350 mm away from the flow equalizer (30).

3. A battery silicon wafer cleaning tank for improving the life of the chemical solution according to claim 1, characterized in that: The deposition area (90) includes a conical deposition portion (91) located at the top and an effective deposition portion (92) located at the bottom.

4. A battery silicon wafer cleaning tank for improving the life of the chemical solution according to claim 3, characterized in that: A horizontally movable partition plate (93) is provided at the top of the conical deposition portion (91), and a cylinder (94) is installed on the outside of the main tank (10). The piston end of the cylinder (94) and the partition plate (93) are connected to drive the partition plate (93) to block the top of the conical deposition portion (91).

5. A battery silicon wafer cleaning tank for improving the life of the chemical solution according to claim 3 or 4, characterized in that: Both sides of the conical deposition portion (91) are provided with notches (911), and rubber cleaning belts (914) are sealed and installed at the notches (911). The rubber cleaning belts (914) are attached to the notches (911). A conveying roller (912) and a driving motor (913) are installed on the outside of the main groove (10). The output end of the driving motor (913) is provided with a conveying roller (912) via a coupling. A plurality of conveying rollers (912) are installed along the length direction of the notch (911), and the rubber cleaning belts (914) are wound around the outside of the plurality of conveying rollers (912).

6. A battery silicon wafer cleaning tank for improving the life of the chemical solution according to claim 5, characterized in that: A scraper plate (915) is provided at the bottom of the notch (911).

7. The battery silicon wafer cleaning tank for improving the life of the chemical solution according to claim 5, characterized in that: A limiting guide block (916) is installed on the side of the rubber cleaning belt (914), and two guide plates (917) are installed on the main groove (10). The two guide plates (917) are respectively installed at both ends of the notch (911) in the width direction, and the limiting guide block (916) is slidably fitted in the guide plates (917).

8. A battery silicon wafer cleaning tank for improving the life of the chemical solution according to claim 3 or 4, characterized in that: A servo motor (95) is installed on the main groove (10) outside the effective deposition portion (92), and the output end of the servo motor (95) extends to the inside of the effective deposition portion (92) and is connected to a rotating rod (96) via a bevel gear set. A scraper (97) is installed on the rotating rod (96) for cleaning the side wall of the conical deposition portion (91); A transverse plate (98) is installed on the inner side of the effective deposition portion (92) for rotatably mounting the rotary rod (96).

Images