The invention discloses a high-temperature
phosphoric acid liquid supply method in the field of
semiconductor cleaning, the method is applied to a
system comprising a main liquid supply tank, a
backup liquid supply tank, a buffer liquid supplement tank and a
recovery tank, during normal liquid supply, the main liquid supply tank supplies liquid to a main
machine table, and the buffer liquid supplement tank and the
recovery tank execute
cascade supply based on liquid level gradient; when the liquid
medicine reaches the
discharge condition, the
system cuts off a
recovery path and discharges old liquid in sequence, when the liquid level of the main liquid supply tank touches the bottom, the
backup liquid supply tank which is maintained at the process temperature in real time seamlessly replaces the liquid supply task, and meanwhile, the
system injects new acid into the main liquid supply tank and the buffer liquid supply tank which execute treatment and independently and circularly heats the main liquid supply tank and the buffer liquid supply tank; therefore, liquid
medicine updating is completed. By utilizing a role rotation mechanism of multi-tank linkage and
parallel processing, the problem of shutdown caused by long temperature rise period of high-temperature
liquid change is solved, and the continuity of the production process and the high stability of liquid supply parameters are realized.