Wafer transportation vacuum cavity sealing flange

By introducing a filtering component and a monitoring system into the sealing flange of the wafer transport vacuum chamber, the problem that the existing flange cannot filter gas impurities is solved, and the protection of the wafer and the stability of use are achieved.

CN223306501UActive Publication Date: 2025-09-05NINGBO HAIMIAO MASCH CO LTD
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Patent Information

Application Number
CN202422814531.6
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-11-19
Publication Date
2025-09-05
Estimated Expiration
2034-11-19

AI Technical Summary

Technical Problem

Existing flanges do not have filtering functions and are unable to remove impurities and particles in the gas, causing contamination of chips or other sensitive components.

Method used

A wafer transport vacuum chamber sealing flange is designed, which includes a filter component and a monitoring system. The filter component includes a filter cartridge and a support frame. The filter cartridge filters gas impurities. The monitoring component monitors through a pressure flow sensor and a PLC control panel and uses an alarm to remind cleaning.

Benefits of technology

It protects the chip or other sensitive components, prevents pollution, and promptly reminds you to clean the filter cartridge to avoid blockage and affect use.

✦ Generated by Eureka AI based on patent content.

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  • Figure CN223306501U_ABST
    Figure CN223306501U_ABST
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Abstract

The utility model provides a wafer transportation vacuum cavity sealing flange, and relates to the technical field of vacuum cavity sealing flanges, the wafer transportation vacuum cavity sealing flange comprises a flange main body, the front surface of the flange main body is connected with an air inlet pipe, the air inlet pipe is internally provided with a filter assembly, the filter assembly comprises a filter cartridge, the upper end and the lower end of the filter cartridge are both connected with sliding blocks, and the sliding blocks are connected with the air inlet pipe. Inserting grooves are formed in the outer surfaces of the two sides of the filter cartridge, sliding grooves are formed in the inner walls of the upper end and the lower end of the air inlet pipe, a supporting frame is connected to the bottom of the air inlet pipe, a two-way screw rod is inserted into the supporting frame, one end of the two-way screw rod is connected with a bearing, and the other end of the two-way screw rod is connected with a handle; and two groups of moving blocks are symmetrically connected to the surface of the two-way screw rod. According to the utility model, when gas enters the flange main body, impurities and particles in the gas can be filtered through the filter cartridge, so that a wafer or other sensitive elements can be protected and prevented from being polluted.
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Description

Technical Field

[0001] The utility model relates to the technical field of vacuum cavity sealing flanges, in particular to a wafer transport vacuum cavity sealing flange. Background Art

[0002] The sealing flange of the wafer transport vacuum chamber is a crucial component in vacuum technology, which ensures the stability and safety of the wafer during transportation.

[0003] For example, according to publication number CN212361146U, a high-sealing flange for a vacuum chamber includes a first flange, a second flange, a first fixing member, a second fixing member, and a sealing member. The first fixing member and the second fixing member are located between the first and second flanges and arranged radially along the second flange. The first fixing member is located inboard of the second fixing member, and the sealing member is installed between the first and second fixing members in a radial plane direction. This flange is easy to manufacture, requires low machining tools, and has low processing costs. The thickness and flange design of the specialized sealing member enable it to expand and contract more when the first and second flanges are pressed toward each other, resulting in close contact with the periphery, and has the advantages of large compression and strong sealing performance.

[0004] This patent can increase the expansion and contraction when the first flange and the second flange are pressed toward the middle, and are in close contact with the periphery, with the advantages of large compression and strong sealing performance. However, the existing flange does not have a filtering function and cannot remove impurities and particles in the gas, and thus cannot protect the wafer or other sensitive components from contamination. Therefore, we have proposed a new type of wafer transport vacuum chamber sealing flange. Utility Model Content

[0005] The purpose of the utility model is to solve the problem in the prior art that the existing flange has no filtering function, cannot remove impurities and particles in the gas, and thus cannot protect chips or other sensitive components from contamination.

[0006] In order to achieve the above-mentioned purpose, the utility model adopts the following technical solutions: a wafer transport vacuum chamber sealing flange, comprising a flange body, the front surface of the flange body is connected to an air inlet pipe, a filter assembly is arranged inside the air inlet pipe, the filter assembly includes a filter cartridge, the upper and lower ends of the filter cartridge are connected to sliders, slots are provided on the outer surfaces of both sides of the filter cartridge, and slide grooves are provided on the inner walls of the upper and lower ends of the air inlet pipe, the bottom of the air inlet pipe is connected to a support frame, a bidirectional screw is inserted into the interior of the support frame, one end of the bidirectional screw is connected to a bearing, and the other end of the bidirectional screw is connected to a handle, and two groups of moving blocks are symmetrically connected to the surface of the bidirectional screw, and the inner walls of the two groups of moving blocks are connected to plug blocks.

[0007] Furthermore, the bidirectional screw and the bearing form a rotational connection, and the bidirectional screw and the handle form a fixed connection.

[0008] Furthermore, the bidirectional screw is threadedly connected to the moving block through the threaded hole.

[0009] Furthermore, the position and size of the plug-in block match the position and size of the slot, and a plug-in connection is formed between the slot and the plug-in block.

[0010] Furthermore, the outer surface of the slider fits into the inner wall of the slide groove, and a sliding connection is formed between the slider and the slide groove.

[0011] Furthermore, outer surfaces of the bottom of both sides of the moving block are in contact with inner walls of both sides of the support frame.

[0012] Furthermore, a monitoring component is provided on the top of the air inlet pipe near the flange body, and the monitoring component includes a monitoring meter.

[0013] Furthermore, a pressure flow sensor is connected to the bottom of the monitoring meter, and a PLC control panel is connected to the front surface of the flange body.

[0014] Furthermore, an alarm is connected to the flange body at the lower end of the PLC control panel, and the PLC control panel is electrically connected to an external power supply through a control switch.

[0015] Furthermore, the PLC control panel is electrically connected to the pressure flow sensor and the alarm.

[0016] Compared with the prior art, the advantages and positive effects of the present invention are:

[0017] 1. In the present invention, when the gas enters the flange body, the impurities and particles in the gas can be filtered through the filter cartridge, thereby protecting the wafer or other sensitive components from contamination.

[0018] 2. In the present invention, when there are too many impurities in the filter cartridge, the PLC control panel will activate the alarm to sound, reminding the operator to clean the impurities in the filter cartridge in time to ensure that there is no blockage that affects normal use. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 The utility model provides a schematic diagram of the three-dimensional structure of a sealing flange of a wafer transport vacuum chamber;

[0020] Figure 2 This is a schematic diagram of the three-dimensional structure of a wafer transport vacuum chamber sealing flange from another angle proposed by the present invention;

[0021] Figure 3 The utility model provides a schematic diagram of the partial explosion structure of a wafer transport vacuum chamber sealing flange;

[0022] Figure 4 This is a schematic diagram of the exploded structure of a partial cross-section of a support frame for a sealing flange of a wafer transport vacuum chamber proposed in the utility model;

[0023] Figure 5 The utility model provides a schematic diagram of the exploded structure of the air intake pipe cross section of the sealing flange of the wafer transportation vacuum chamber.

[0024] Legend: 1. Flange body; 2. Air inlet pipe; 3. Filter assembly; 301. Filter cartridge; 302. Slider; 303. Slot; 304. Slide; 305. Support frame; 306. Bidirectional screw; 307. Bearing; 308. Handle; 309. Moving block; 310. Threaded hole; 311. Insert block; 4. Monitoring assembly; 401. Monitoring meter; 402. Pressure flow sensor; 403. PLC control panel; 404. Alarm. DETAILED DESCRIPTION

[0025] In order to more clearly understand the above-mentioned purpose, features and advantages of the present invention, the present invention is further described below with reference to the accompanying drawings and embodiments. It should be noted that the embodiments of the present application and the features therein can be combined with each other without conflict.

[0026] In the following description, many specific details are set forth to facilitate a full understanding of the present invention. However, the present invention may also be implemented in other ways than those described herein. Therefore, the present invention is not limited to the specific embodiments disclosed in the following specification.

[0027] Example 1, as Figure 1 - Figure 4As shown, the utility model provides a wafer transport vacuum chamber sealing flange, including a flange body 1, the front surface of the flange body 1 is connected to an air inlet pipe 2, a filter assembly 3 is arranged inside the air inlet pipe 2, the filter assembly 3 includes a filter cartridge 301, the upper and lower ends of the filter cartridge 301 are connected to sliders 302, the outer surfaces of both sides of the filter cartridge 301 are provided with slots 303, the upper and lower ends of the air inlet pipe 2 are provided with slide grooves 304 on the inner walls, the bottom of the air inlet pipe 2 is connected to a support frame 305, a bidirectional screw 306 is inserted into the interior of the support frame 305, one end of the bidirectional screw 306 is connected to a bearing 307, the other end of the bidirectional screw 306 is connected to a handle 308, the surface of the bidirectional screw 306 Two groups of moving blocks 309 are connected symmetrically on the surface, and the inner walls of the two groups of moving blocks 309 are connected with plug blocks 311. The bidirectional screw 306 and the bearing 307 form a rotational connection, and the bidirectional screw 306 and the handle 308 form a fixed connection. The bidirectional screw 306 is threadedly connected to the moving block 309 through the threaded hole 310. The position and size of the plug block 311 match the position and size of the slot 303. The slot 303 and the plug block 311 form a plug-in connection. The outer surface of the slider 302 fits with the inner wall of the slide groove 304, and the slider 302 and the slide groove 304 form a sliding connection. The outer surfaces of the bottom of both sides of the moving block 309 fit with the inner walls of both sides of the support frame 305.

[0028] The effect achieved by the entire embodiment 1 is that when the gas enters the flange body 1 through the air inlet pipe 2, it will first be filtered by the filter cartridge 301 to filter out impurities and particles in the gas. When the impurities inside the filter cartridge 301 are large and need to be cleaned after long-term use, the handle 308 can be rotated in the opposite direction to drive the bidirectional screw 306 to rotate in the opposite direction. While the bidirectional screw 306 rotates in the opposite direction, it will also rotate in the opposite direction with the two sets of moving blocks 309 through the threaded hole 310 at the same time, so that the two sets of moving blocks 309 can move to both sides at the same time through the reverse thread rotation, and while moving, , which will also drive the plug block 311 to be pulled out from the slot 303. After that, the filter cartridge 301 can be directly taken out from the air inlet pipe 2 and cleaned. After cleaning, the slider 302 of the filter cartridge 301 can be aligned with the slide groove 304 and pushed into the air inlet pipe 2. Then, the handle 308 is rotated forward to drive the bidirectional screw 306 to rotate forward, so that the two sets of moving blocks 309 simultaneously push the plug block 311 into the slot 303 for fixing. In this way, impurities and particles in the gas can be filtered through the filter cartridge 301, thereby protecting the chip or other sensitive components from contamination.

[0029] Example 2, as Figure 1 and Figure 5As shown, a monitoring component 4 is provided near the top of the flange body 1 of the air intake pipe 2, and the monitoring component 4 includes a monitoring meter 401. The bottom of the monitoring meter 401 is connected to a pressure flow sensor 402, and the front surface of the flange body 1 is connected to a PLC control panel 403. The flange body 1 is connected to an alarm 404 at the lower end of the PLC control panel 403. The PLC control panel 403 is electrically connected to an external power supply through a control switch, and the PLC control panel 403 is electrically connected to the pressure flow sensor 402 and the alarm 404.

[0030] The effect achieved by the entire embodiment 2 is that when there are too many impurities in the filter cartridge 301, the pressure flow sensor 402 will be sensed and send a group A electrical signal to the PLC control panel 403, and after receiving the signal, the PLC control panel 403 will activate the alarm 404 to emit a group A alarm sound, thereby improving the operator to clean the filter cartridge 301 in time; when there is more water in the filter cartridge 301, the pressure flow sensor 402 will send a group B electrical signal to the PLC control panel 403, and the PLC control panel 403 will activate the alarm 404 to emit a group B alarm sound, thereby reminding the operator to conduct relevant inspections to ensure that there will be no blockage or other failures that affect normal use, thereby improving stability during use.

[0031] Working principle: When the gas enters the flange body 1, the impurities and particles in the gas can be filtered through the filter cartridge 301, thereby protecting the chip or other sensitive components from pollution. When there are too many impurities in the filter cartridge 301, the PLC control panel 403 will activate the alarm 404 to sound, reminding the operator to clean the impurities in the filter cartridge 301 in time to ensure that there will be no blockage that affects normal use.

[0032] The above are merely preferred embodiments of the present invention and do not limit the present invention in any other form. Any technician familiar with the profession may use the technical content disclosed above to change or modify it into an equivalent embodiment with equivalent changes and apply it to other fields. However, any simple modification, equivalent change and modification made to the above embodiment based on the technical essence of the present invention without departing from the content of the technical solution of the present invention shall still fall within the scope of protection of the technical solution of the present invention.

Claims

1. A wafer transport vacuum chamber sealing flange, comprising a flange body (1), characterized in that: The front surface of the flange body (1) is connected to an air intake pipe (2), and a filter assembly (3) is provided inside the air intake pipe (2); The filter assembly (3) comprises a filter cartridge (301), wherein the upper and lower ends of the filter cartridge (301) are both connected to sliders (302), the outer surfaces of both sides of the filter cartridge (301) are both provided with slots (303), the inner walls of the upper and lower ends of the air inlet pipe (2) are both provided with slide grooves (304), the bottom of the air inlet pipe (2) is connected to a support frame (305), a bidirectional screw (306) is inserted into the interior of the support frame (305), one end of the bidirectional screw (306) is connected to a bearing (307), the other end of the bidirectional screw (306) is connected to a handle (308), two groups of moving blocks (309) are symmetrically connected to the surface of the bidirectional screw (306), and the inner walls of the two groups of moving blocks (309) are both connected to plug blocks (311).

2. The wafer transport vacuum chamber sealing flange according to claim 1, characterized in that: The bidirectional screw (306) and the bearing (307) form a rotational connection, and the bidirectional screw (306) and the handle (308) form a fixed connection.

3. The wafer transport vacuum chamber sealing flange according to claim 2, characterized in that: The bidirectional screw (306) is threadedly connected to the moving block (309) via the threaded hole (310).

4. The wafer transport vacuum chamber sealing flange according to claim 3, characterized in that: The position and size of the insert block (311) match the position and size of the slot (303), and a plug-in connection is formed between the slot (303) and the insert block (311).

5. The wafer transport vacuum chamber sealing flange according to claim 4, characterized in that: The outer surface of the slider (302) fits into the inner wall of the slide groove (304), and a sliding connection is formed between the slider (302) and the slide groove (304).

6. The wafer transport vacuum chamber sealing flange according to claim 5, characterized in that: The outer surfaces of the bottom of both sides of the moving block (309) are in contact with the inner walls of both sides of the support frame (305).

7. The wafer transport vacuum chamber sealing flange according to claim 1, wherein: A monitoring component (4) is provided on the top of the air inlet pipe (2) close to the flange body (1), and the monitoring component (4) includes a monitoring meter (401).

8. The wafer transport vacuum chamber sealing flange according to claim 7, characterized in that: The bottom of the monitoring meter (401) is connected to a pressure flow sensor (402), and the front surface of the flange body (1) is connected to a PLC control panel (403).

9. The wafer transport vacuum chamber sealing flange according to claim 8, characterized in that: The flange body (1) is connected to an alarm (404) at the lower end of the PLC control panel (403), and the PLC control panel (403) is electrically connected to an external power supply via a control switch.

10. The wafer transport vacuum chamber sealing flange according to claim 9, characterized in that: The PLC control panel (403) is electrically connected to the pressure flow sensor (402) and the alarm (404).

Citation Information

Patent Citations

  • High-sealing-performance flange for vacuum cavity

    CN212361146U