Cleaning device and kiln equipment

Abstract

The utility model discloses a cleaning device and kiln equipment. The cleaning device is used for cleaning a cooling part of the glass kiln. The cleaning device comprises a cleaning part, an operation part and a positioning part. And the cleaning part can extend into the glass kiln. And one end of the operating part is connected with the cleaning part. The positioning part is arranged on the operating part, and the positioning part is configured to be capable of serving as a fulcrum of the operating part when the cleaning part is driven by the operating part. The operation part is connected with the cleaning part, so that the cleaning part is operated to go deep into the glass kiln, the glass kiln is cleaned, and the quality of glass production is improved. Meanwhile, the positioning part is used as a fulcrum of the operation part, so that the operation of operating the cleaning part to clean the glass kiln by the operation part is more accurate, the risk that the cleaning part is in contact with the interior of the glass kiln is reduced, and the safety of cleaning the glass kiln is improved.

Description

Technical Field

[0001] The present application relates to the technical field of glass production, and in particular to a cleaning device and kiln equipment. Background Art

[0002] Electronic glass requires high-quality glass. The kiln is built of refractory materials. In an environment of high temperature and alkaline vapor, the materials melt and form into glass.

[0003] However, the refractory materials that form the furnace are prone to erosion and spalling, and incompletely melted material may be present during the glass production process. As the process progresses, the spalled refractory material and unmelted material enter the cooling section, forming scum. This scum contains bubbles and stones made of materials different from glass, which can affect the quality of the electronic glass. Furthermore, due to the uneven composition of the electronic glass, intermittent streaks may appear during the forming and stretching process, affecting the quality of the electronic glass. Alternatively, scum may enter subsequent processes, potentially causing the electronic glass to break or explode during the annealing process.

[0004] CN216191874U discloses a kiln feed inlet cleaning device, including a cleaning tool and a bracket, wherein a cooling medium circulates inside the cleaning tool, and the cleaning tool is mounted on the bracket. The kiln feed inlet cleaning device of the utility model cools down the cleaning tool by circulating a cooling medium inside the cleaning tool to take away its heat, thereby reducing the risk of the cleaning tool melting due to high temperature. Moreover, the cleaning tool is mounted on the bracket, and the large-mass cleaning tool is fixed by the bracket, which makes it easier to operate the cleaning tool. The efficiency of operating the cleaning tool to clean the feed inlet from compaction is improved, and a certain degree of safety is also guaranteed. However, the cleaning device has the risk of touching the inner wall of the kiln and damaging the kiln. Therefore, how to safely clean a glass kiln is one of the problems that urgently need to be solved. Utility Model Content

[0005] The present application aims to solve at least one of the technical problems existing in the prior art. To this end, the present application proposes a cleaning device and a kiln equipment, which can improve the safety of cleaning a glass kiln.

[0006] According to an embodiment of the first aspect of the present application, a cleaning device is used to clean the cooling section of a glass furnace. The cleaning device includes a cleaning section, an operating section, and a positioning section. The cleaning section is capable of extending into the interior of the glass furnace. One end of the operating section is connected to the cleaning section. The positioning section is disposed on the operating section and is configured to serve as a fulcrum for the operating section when the cleaning section is driven by the operating section.

[0007] The cleaning device according to the embodiment of the present application has at least the following beneficial effects: the operating portion is connected to the cleaning portion, allowing the cleaning portion to be operated to penetrate the interior of the glass furnace, thereby cleaning the glass furnace and improving the quality of glass production. Furthermore, the positioning portion serves as a fulcrum for the operating portion, making the operating portion more accurate when operating the cleaning portion to clean the glass furnace, reducing the risk of the cleaning portion contacting the interior of the glass furnace and improving the safety of cleaning the glass furnace.

[0008] In some embodiments, the cleaning device further includes an adjusting member connected to the positioning portion for adjusting the height of the positioning portion.

[0009] In some embodiments, the cleaning device further comprises an endoscope, one end of which can be extended into the interior of the glass furnace.

[0010] In some embodiments, a first cooling channel and a second cooling channel are further provided inside the cleaning device, the first cooling channel extends from an end of the operating part away from the cleaning part to the cleaning part, and the second cooling channel extends from the cleaning part to an end of the operating part away from the cleaning part, and the first cooling channel and the second cooling channel are connected to the cleaning part.

[0011] In some embodiments, the cleaning device further includes a booster pump, and the booster pump is disposed in the first cooling channel.

[0012] In some embodiments, the cleaning device further includes a pressure sensor, and the pressure sensor is disposed in the first cooling channel; or, the pressure sensor is disposed in the second cooling channel.

[0013] In some embodiments, a groove is provided at one end of the operating portion close to the cleaning portion, and a protrusion is provided at one end of the cleaning portion close to the operating portion, and the protrusion is disposed in the groove.

[0014] In some embodiments, the cleaning device further includes a counterweight portion, and the counterweight portion is disposed at an end of the operating portion away from the cleaning portion.

[0015] In some embodiments, the cleaning part includes a conical shovel, a hook-shaped shovel, and a flat shovel, and any one of the conical shovel, the hook-shaped shovel, and the flat shovel is connected to the operating part.

[0016] According to an embodiment of the second aspect of the present application, a kiln device is provided for glass manufacturing. The kiln device includes a cooling unit and a cleaning device according to any of the above embodiments. The cooling unit is provided with a first channel and a second channel. The cleaning device includes an endoscope, wherein an end of the operating unit proximal to the cleaning unit is disposed through the first channel, and at least a portion of the endoscope is disposed through the second channel.

[0017] Additional aspects and advantages of the present application will be given in part in the description below, and in part will become obvious from the description below, or will be learned through practice of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The present application is further described below with reference to the accompanying drawings and embodiments, wherein:

[0019] Figure 1 A schematic diagram of a kiln device according to an embodiment of the present application;

[0020] Figure 2 A simple schematic diagram of the connection between the cleaning part and the operating part;

[0021] Figure 3 is a schematic diagram of a tapered shovel;

[0022] Figure 4 It is a schematic diagram of a hook shovel;

[0023] Figure 5 Schematic diagram of a flat shovel;

[0024] Figure 6 is a schematic diagram of the cooling unit;

[0025] Figure 7 For experimental data.

[0026] Figure numerals: kiln equipment 1, cleaning device 10, cleaning part 11, protrusion 111, conical shovel 112, hook-shaped shovel 113, flat shovel 114, operating part 12, groove 121, positioning part 13, adjustment part 14, endoscope 15, display 16, first cooling channel 17, second cooling channel 171, booster pump 172, pressure sensor 173, counterweight part 18, cooling part 20, first channel 21, second channel 22. DETAILED DESCRIPTION

[0027] The following describes in detail embodiments of the present application. Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present application and are not to be construed as limiting the present application.

[0028] In the description of this application, it should be understood that descriptions involving orientations, such as up, down, front, back, left, right, etc., indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, they cannot be understood as limitations on this application.

[0029] In the description of this application, "several" means more than one, "plurality" means more than two, "greater than," "less than," and "exceed" are understood to exclude the number itself, while "above," "below," and "within" are understood to include the number itself. The use of "first" and "second" in the description is solely for the purpose of distinguishing technical features and should not be construed as indicating or implying relative importance, implicitly specifying the number of the indicated technical features, or implicitly specifying the order of the indicated technical features.

[0030] In the description of this application, unless otherwise clearly defined, terms such as setting, installing, and connecting should be understood in a broad sense, and technicians in the relevant technical field can reasonably determine the specific meanings of the above terms in this application based on the specific content of the technical solution.

[0031] In the description of this application, reference to the terms "one embodiment," "some embodiments," "illustrative embodiments," "examples," "specific examples," or "some examples" means that the specific features, structures, materials, or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of this application. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described can be combined in any appropriate manner in any one or more embodiments or examples.

[0032] Please refer to Figure 1 , Figure 1 Schematic diagram of a kiln equipment according to an embodiment of the present application. The embodiment of the present application provides a cleaning device 10 for cleaning the cooling portion 20 of a glass kiln. The cleaning device 10 includes a cleaning portion 11, an operating portion 12, and a positioning portion 13. The cleaning portion 11 can extend into the interior of the glass kiln. One end of the operating portion 12 is connected to the cleaning portion 11. The positioning portion 13 is provided on the operating portion 12, and the positioning portion 13 is configured to serve as a fulcrum for the operating portion 12 when the cleaning portion 11 is driven by the operating portion 12.

[0033] In some embodiments, the operating portion 12 may be a rod, and the cleaning portion 11 may be a shovel. The operating portion 12 and the cleaning portion 11 may be connected by welding, integral molding, threaded connection, quick connector connection, etc.

[0034] In some embodiments, the positioning portion 13 may be an annular ring. The positioning portion 13 is sleeved onto the operating portion 12. When the operating portion 12 is in use, the positioning portion 13 may be fixedly connected to the operating portion 12, with the bottom of the positioning portion 13 placed on the ground, or the positioning portion 13 may be secured in some other manner. Similar to the principle of a lever, the operating portion 12 uses the positioning portion 13 as a fulcrum, thereby facilitating the operation of the cleaning portion 11 and reducing the risk of the cleaning portion 11 contacting the interior of the glass furnace and damaging the furnace.

[0035] In some embodiments, the positioning portion 13 can also serve as a distance measurement mark. The outer surface of the operating portion 12 can be provided with scale lines. The operating portion 12 can be moved relative to the positioning portion 13. The operating portion 12 moves in a direction close to the kiln and extends into the kiln. With the positioning portion 13 as a reference, the distance the cleaning portion 11 extends into the kiln can be determined by observing the changes in the scale lines, thereby reducing the risk of the cleaning portion 11 contacting the interior of the glass kiln and damaging the kiln.

[0036] In some embodiments, the positioning portion 13 can be fixedly connected to the operating portion 12. The distance between the positioning portion 13 and the outer wall of the kiln is pre-set based on the size of the kiln. As the operating portion 12 moves toward the kiln and extends into the kiln, the positioning portion 13 moves accordingly. When the positioning portion 13 contacts the outer wall of the kiln, the cleaning portion 11 reaches the maximum distance from the kiln interior, thereby reducing the risk of the cleaning portion 11 contacting the interior of the glass kiln and damaging the kiln.

[0037] In some embodiments, the operating portion 12 may be heavy, and the positioning portion 13 may serve as a load-bearing member of the operating portion 12 , thereby saving effort for the operator.

[0038] In some embodiments, the glass furnace can be used to produce electronic glass, microcrystalline glass, ordinary glass, etc.

[0039] The cleaning device 10 according to the embodiment of the present application has at least the following beneficial effects: the operating portion 12 is connected to the cleaning portion 11, allowing the cleaning portion 11 to be operated to penetrate the interior of the glass furnace, thereby cleaning the glass furnace and improving the quality of glass production. Furthermore, the positioning portion 13 serves as a fulcrum for the operating portion 12, making the operation of the cleaning portion 11 more accurate when the operating portion 12 operates the cleaning portion 11 to clean the glass furnace, reducing the risk of the cleaning portion 11 contacting the interior of the glass furnace and improving the safety of cleaning the glass furnace.

[0040] Please refer to Figure 1 In some embodiments, the cleaning device 10 further includes an adjusting member 14 , which is connected to the positioning portion 13 and is used to adjust the height of the positioning portion 13 .

[0041] In some embodiments, the adjusting member 14 may be a hand chain hoist to facilitate adjustment of the height, position, etc. of the positioning portion 13 .

[0042] In some embodiments, the adjustment of the operating portion 12 is achieved through the adjustment member 14 and the positioning portion 13. Compared with an operating table, a rack, etc., the operation is quick, space is saved, and it is easy to move and transport.

[0043] In some embodiments, the cleaning device 10 further includes an endoscope 15 , one end of which can be extended into the interior of the glass furnace.

[0044] In some embodiments, the cleaning device 10 may further include a display 16 electrically connected to the endoscope 15, so that the image captured by the endoscope 15 is transmitted to the display 16, allowing the operator to observe the conditions inside the kiln, thereby facilitating and increasing the accuracy of the operation. This improves the cleaning effect while reducing the risk of damage to the kiln due to contact with the inner wall of the kiln.

[0045] Please refer to Figure 1 In some embodiments, a first cooling channel 17 and a second cooling channel 171 are further provided inside the cleaning device 10. The first cooling channel 17 extends from an end of the operating part 12 away from the cleaning part 11 to the cleaning part 11, and the second cooling channel 171 extends from the cleaning part 11 to an end of the operating part 12 away from the cleaning part 11. The first cooling channel and the second cooling channel are connected to the cleaning part 11.

[0046] In some embodiments, the first cooling channel 17 is used to input the cooling medium, and the second cooling channel 171 is used to output the cooling medium, so that the cooling medium can circulate, which facilitates continuous cooling of the cleaning device 10 and reduces the risk of the cleaning device 10 being damaged by high temperature.

[0047] In some embodiments, the cooling medium may be liquid or gas.

[0048] In some embodiments, the cleaning device 10 further includes a booster pump 172 , which is disposed in the first cooling channel.

[0049] In some embodiments, the cooling medium may be a liquid. Conventional water pressure is 0.30 MPa, which poses a risk of insufficient water pressure affecting heat exchange and thus damaging the cleaning device 10. By increasing the pressure with the booster pump 172, the water pressure is increased to greater than 0.8 MPa and less than 1.2 MPa, thereby improving heat exchange while reducing the risk of excessive water pressure damaging the cleaning device 10 or affecting its operation.

[0050] In some embodiments, the cleaning device 10 further includes a pressure sensor 173 , and the pressure sensor 173 is disposed in the first cooling channel 17 ; or, the pressure sensor 173 is disposed in the second cooling channel 171 .

[0051] By providing a pressure sensor 173 in the first cooling channel 17 or providing a pressure sensor 173 in the second cooling channel 171 , the pressure of the cooling medium can be obtained, so as to better control the boost pump 172 to change the pressure of the cooling medium.

[0052] In some embodiments, when the cooling medium is liquid, the pressure sensor 173 may be a hydraulic pressure sensor. When the cooling medium is gas, the pressure sensor 173 may be a gas pressure sensor.

[0053] In some embodiments, the cleaning device 10 may further include a temperature sensor. The temperature sensor is disposed in the second cooling channel 171 to detect the temperature of the cooling medium.

[0054] In some embodiments, the temperature sensor may be a water temperature gauge.

[0055] In some embodiments, when the temperature of the cooling medium in the second cooling channel 171 is 60° C., the cleaning portion 11 can be withdrawn from the kiln to cool down, thereby reducing the risk of damage to the cleaning device 10 .

[0056] In some embodiments, a groove 121 is provided at one end of the operating portion 12 close to the cleaning portion 11 , and a protrusion 111 is provided at one end of the cleaning portion 11 close to the operating portion 12 . The protrusion 111 is disposed in the groove 121 .

[0057] Please refer to Figure 2 , Figure 2 The figure is a simple schematic diagram of the connection between the cleaning part and the operating part. In some embodiments, the operating part 12 and the cleaning part 11 can be detachably connected. After the operating part 12 and the cleaning part 11 are connected, they jointly define a first cooling channel 17 and a second cooling channel 171, that is, there are some channels in the operating part 12 and some channels in the cleaning part 11. In order to prevent the respective channels of the operating part 12 and the cleaning part 11 from being misaligned when they are connected, thereby causing the first cooling channel 17 and the second cooling channel 171 to be unable to communicate, thereby causing the cooling medium to be unable to flow back, thereby affecting the heat dissipation effect and causing damage to the cleaning device 10. A groove 121 is provided at one end of the operating part 12 close to the cleaning part 11, and a protrusion 111 is provided at one end of the cleaning part 11 close to the operating part 12. The protrusion 111 and the groove 121 have a fool-proof effect to ensure that when the cleaning part 11 and the operating part 12 are connected, the first cooling channel 17 and the second cooling channel 171 are connected, thereby reducing the risk of the heat dissipation effect being affected and causing damage to the cleaning device 10.

[0058] In some embodiments, the cleaning device 10 further includes a counterweight portion 18 , which is disposed at an end of the operating portion 12 away from the cleaning portion 11 .

[0059] In some embodiments, during the cleaning process, a counterweight portion 18 is provided at the end of the operating portion 12 away from the cleaning portion 11 to reduce the risk of the cleaning portion 11 contacting the inner wall of the kiln due to an unstable center of gravity and thus damaging the kiln.

[0060] In some embodiments, the counterweight portion 18 may be a counterweight block. When the cleaning device 10 is stationary, both the operating portion 12 and the cleaning portion 11 may be suspended.

[0061] Please refer to Figures 3 to 5 , Figure 3is a schematic diagram of a tapered shovel; Figure 4 It is a schematic diagram of a hook shovel; Figure 5 Schematic diagram of a flat shovel; Figure 6 In some embodiments, the cleaning unit 11 includes a conical shovel 112 , a hook-shaped shovel 113 , and a flat shovel 114 , and any one of the conical shovel 112 , the hook-shaped shovel 113 , and the flat shovel 114 is connected to the operating unit 12 .

[0062] In some embodiments, the cleaning portion 11 may be a conical shovel 112 , that is, the shape is conical.

[0063] In some embodiments, the cleaning portion 11 may be a hook-shaped shovel 113 , that is, the shape is hook-shaped.

[0064] In some embodiments, the cleaning portion 11 may be a flat shovel 114 .

[0065] In some embodiments, scum may be clumped, making it difficult to clean. First, use the conical shovel 112 to separate the clumped scum into several pieces. Then remove the conical shovel 112. Remove the conical shovel 112 from the operating unit 12 and replace it with the flat shovel 114 to scoop out the separated scum. After cleaning is complete, replace the conical shovel 112 again to separate the clumped scum into several pieces. Repeat these steps until cleaning is complete.

[0066] By selecting cleaning parts 11 of different shapes, the practicality and applicability of the cleaning device 10 are improved.

[0067] Please refer to Figure 1 and Figure 6 The present application also provides a kiln device 1 for glass manufacturing. The kiln device 1 includes a cooling unit 20 and a cleaning device 10 according to any of the above-described embodiments. The cooling unit 20 is provided with a first channel 21 and a second channel 22. The cleaning device 10 includes an endoscope 15. The end of the operating unit 12 proximal to the cleaning unit 11 is disposed through the first channel 21, and at least a portion of the endoscope 15 is disposed through the second channel 22.

[0068] In some embodiments, the first channel 21 is used for the cleaning device 10 to extend into and clean the scum. The first channel 21 can be provided in the breast wall portion of the cooling unit 20, especially the portion with the bridge bricks.

[0069] In some embodiments, a liquid level meter for checking the liquid level is originally present in the cooling portion 20. The liquid level meter can be removed and the hole position of the original liquid level meter can be used as the first channel 21.

[0070] Please refer to Figure 7 , Figure 7 For experimental data. Figure 7Attached are data from three sets of control experiments, which compare the quality of glass after the kiln is cleaned by the cleaning device 10 of the embodiment of the present application with the inspection data of the quality of glass before the kiln is cleaned. It is concluded that the cleaning device 10 can improve the quality of glass produced by the kiln equipment 1.

[0071] The embodiments of the present application have been described in detail above with reference to the accompanying drawings. However, the present application is not limited to the above embodiments. Various modifications can be made within the scope of knowledge possessed by ordinary technicians in the relevant technical field without departing from the purpose of the present application. In addition, the embodiments of the present application and the features of the embodiments can be combined with each other unless there is a conflict.

Claims

1. A cleaning device for cleaning the cooling part of a glass furnace, characterized in that: The cleaning device comprises: a cleaning portion, the cleaning portion being capable of extending into the interior of the glass furnace; an operating portion, one end of which is connected to the cleaning portion; a positioning portion, the positioning portion being provided on the operating portion and being configured to serve as a fulcrum of the operating portion when the cleaning portion is driven by the operating portion; an endoscope, one end of which can be inserted into the interior of the glass furnace; A display is electrically connected to the endoscope.

2. The cleaning device according to claim 1, characterized in that The cleaning device further includes an adjusting member connected to the positioning portion and used for adjusting the height of the positioning portion.

3. The cleaning device according to claim 1, characterized in that The interior of the cleaning device is also provided with a first cooling channel and a second cooling channel. The first cooling channel extends from an end of the operating part away from the cleaning part to the cleaning part, and the second cooling channel extends from the cleaning part to an end of the operating part away from the cleaning part. The first cooling channel and the second cooling channel are connected to the cleaning part.

4. The cleaning device according to claim 3, characterized in that The cleaning device further includes a booster pump, which is disposed in the first cooling channel.

5. The cleaning device according to claim 4, characterized in that The cleaning device further includes a pressure sensor, and the pressure sensor is disposed in the first cooling channel; or the pressure sensor is disposed in the second cooling channel.

6. The cleaning device according to claim 4, characterized in that One end of the operating portion close to the cleaning portion is provided with a groove, and one end of the cleaning portion close to the operating portion is provided with a protrusion, and the protrusion is arranged in the groove.

7. The cleaning device according to claim 1, characterized in that The cleaning device further includes a counterweight portion, which is arranged at an end of the operating portion away from the cleaning portion.

8. The cleaning device according to claim 1, characterized in that The cleaning part includes a conical shovel, a hook-shaped shovel, and a flat shovel, and any one of the conical shovel, the hook-shaped shovel, and the flat shovel is connected to the operating part.

9. A kiln equipment for manufacturing glass, characterized in that: include: A cooling portion, wherein the cooling portion is provided with a first hole and a second hole; The cleaning device according to any one of claims 1 to 8, wherein the cleaning device includes an endoscope, an end of the operating portion close to the cleaning portion is passed through the first channel, and at least a portion of the endoscope is passed through the second channel.

Images