Large-diameter monocrystalline silicon resistivity detection equipment

Abstract

The utility model provides resistivity detection equipment for large-diameter monocrystalline silicon. The resistivity detection equipment comprises a positioning platform, a supporting platform, a movable bracket and a probe, wherein the positioning platform is used for bearing monocrystalline silicon; the supporting platform is rotationally connected below the positioning platform and is provided with a rotary limiting mechanism; the movable bracket is movably arranged on the supporting platform; and the probe is connected to the movable bracket, and realizes transverse movement, longitudinal movement and lifting through the action of the movable bracket. According to the utility model, the steering of the monocrystalline silicon is realized by arranging the rotatable positioning platform, and the measurement of detection points on two diameters of the monocrystalline silicon can be completed by moving the probe along a single direction, so that the operation of moving and positioning the probe is simplified, and the detection efficiency is greatly improved. By arranging a positioning concave table and a positioning mark, the accuracy of a detection result is improved; the method can be used for resistivity detection of monocrystalline silicon of various specifications; the positioning platform rotates stably, the rotation angle can be accurately controlled, and operation is easy and convenient.

Description

Technical Field

[0001] The utility model belongs to the technical field of single crystal silicon resistivity detection, in particular to a large-diameter single crystal silicon resistivity detection device. Background Art

[0002] In the semiconductor industry, in the 8-12 inch semiconductor sector, a four-probe tester is commonly used to measure the cross-sectional resistivity of single crystal ingots after truncation and the resistivity of silicon wafers after slicing. While the technology for measuring silicon wafer resistivity has matured, as quality control of silicon single crystal production improves, measuring single crystal cross-sectional resistivity is becoming increasingly important. To ensure the accuracy of test results, multiple test points must be selected on two diameters of the single crystal cross section that intersect at 90 degrees. Currently, the device for testing the resistivity of single crystal silicon ingots primarily involves securing the single crystal on a support table and moving four probes to the test points for testing. This method requires multiple movements and positioning of the four probes, resulting in cumbersome operations and low efficiency. This is particularly true when testing the resistivity of large-diameter single crystal silicon ingots of varying specifications, as the probe movement and positioning require increased time, significantly impacting test efficiency. Furthermore, existing techniques primarily rely on manual probe positioning, making it difficult to accurately position the four probes and, consequently, measurement accuracy.

[0003] Based on the needs of the above defects, the utility model provides a large-diameter single crystal silicon resistivity detection device, which does not require a large amount of movement and positioning operations and can effectively improve the measurement efficiency and accuracy. Utility Model Content

[0004] In order to solve the above technical problems, the utility model provides a large-diameter single crystal silicon resistivity detection device, which improves the detection efficiency and makes the positioning of the probe more convenient and accurate.

[0005] The technical solution adopted by the utility model is: a large-diameter single crystal silicon resistivity detection equipment, including a positioning platform, a supporting platform, a movable bracket and a probe; wherein the positioning platform is rotatably connected to the upper part of the supporting platform for supporting the single crystal silicon; the supporting platform is provided with a rotation limiting mechanism for limiting the rotation of the positioning platform; the movable bracket is movably arranged on the supporting platform; the probe is connected to the movable bracket, and realizes lateral movement, longitudinal movement and lifting through the action of the movable bracket.

[0006] Furthermore, the rotation limiting mechanism is arranged at a set angle circumferential interval outside the positioning platform.

[0007] Furthermore, a slide rail is provided at the edge of the support platform; the movable bracket includes a column, a beam and a lifting mechanism; the column is slidably connected to the slide rail; the beam is fixed to the column and is perpendicular to the slide rail; the lifting mechanism is slidably connected to the beam; and the probe is connected to the lifting mechanism.

[0008] Furthermore, the slide rail is provided with a center positioning piece for positioning the probe.

[0009] Furthermore, a positioning recess is provided on the top of the positioning platform for positioning and supporting the single crystal silicon; and a positioning mark is provided on the crossbeam to facilitate accurate movement of the probe to the detection point.

[0010] Furthermore, the positioning recesses and the positioning marks are provided in multiple groups for adapting to the single crystal silicon of different specifications.

[0011] Furthermore, the plurality of positioning recesses are arranged in a concentric ring shape, and the positioning recesses on the outer side are higher than the positioning recesses on the inner side.

[0012] Furthermore, a rotating assembly is provided between the supporting platform and the positioning platform, and the center of the rotating assembly coincides with the center of the positioning platform.

[0013] Furthermore, the rotating assembly includes a rotating shaft, and both ends of the rotating shaft are respectively connected to the supporting platform and the positioning platform, so that the positioning platform can rotate around the rotating shaft.

[0014] Furthermore, the rotating assembly further includes a rolling element and an annular track, the annular track is arranged at the bottom of the positioning platform or the top of the supporting platform, and the rolling element is arranged in the annular track.

[0015] The advantages and positive effects of the utility model are:

[0016] (1) In the present invention, the single crystal silicon is turned by rotating the positioning platform to a certain angle, and then the measurement of the detection points on the two diameters of the single crystal silicon can be completed by moving the probe in one direction, which simplifies the operation of probe movement and positioning and greatly improves the detection efficiency.

[0017] (2) By setting up the positioning concave platform and positioning mark, the probe can be accurately positioned, so that it can be moved to the detection point quickly and accurately, ensuring the accuracy of the detection results.

[0018] (3) By setting up a number of positioning recesses and positioning marks, the equipment can be used for resistivity testing of single crystal silicon of various specifications, thereby improving the applicability of the equipment.

[0019] (4) By setting up a rotating assembly and a rotating limit mechanism, the stable rotation of the positioning platform and the precise control of the rotation angle are achieved, and the operation is simple. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 It is a structural schematic diagram of a specific embodiment of the utility model;

[0021] Figure 2 It is a left side view of a specific embodiment of the utility model;

[0022] Figure 3 It is a schematic diagram of detection points of a specific embodiment of the utility model.

[0023] Figure 4 This is a schematic structural diagram of a support platform and a positioning platform in a specific embodiment of the utility model;

[0024] Figure 5 This is a schematic structural diagram of a positioning platform according to a specific embodiment of the present invention;

[0025] Figure 6 It is a schematic diagram of the support platform structure of a specific embodiment of the utility model.

[0026] In the picture:

[0027] 10. Support platform 11. Rotation limit mechanism 12. Slide rail

[0028] 121. Center positioning piece 122. Center mark

[0029] 20. Positioning platform 21. Positioning concave platform 22. V-shaped groove

[0030] 30. Rotating assembly 31. Rotating shaft 32. Rolling element

[0031] 33. Circular Track

[0032] 40, mobile bracket 41, column 42, beam

[0033] 421, positioning mark 422, fastener 43, lifting mechanism

[0034] 431, extension plate 432, lifting drive assembly 4321, lifting knob

[0035] 50. Probe

[0036] 60. Monocrystalline silicon DETAILED DESCRIPTION

[0037] The embodiments of the present invention are described below with reference to the accompanying drawings.

[0038] like Figure 1 、 Figure 2 As shown, the utility model proposes a resistivity detection device for large-diameter single crystal silicon 60, including a positioning platform 20, a supporting platform 10, a movable bracket 40 and a probe 50; wherein the positioning platform 20 is rotatably connected to the upper part of the supporting platform 10, for supporting the single crystal silicon 60; the supporting platform 10 is provided with a rotation limiting mechanism 11 for limiting the rotation of the positioning platform 20; the movable bracket 40 is movably arranged on the supporting platform 10; the probe 50 is connected to the movable bracket 40, and realizes lateral movement, longitudinal movement and lifting through the action of the movable bracket 40.

[0039] In a specific embodiment, the probe 50 is a four-probe probe 50 used to test the resistivity of a single crystal silicon 60. After the single crystal silicon 60 is placed on the positioning platform 20, the probe 50 can be moved to any position on the upper end surface of the single crystal silicon 60 for testing by moving the bracket 40. Typically, to ensure accurate test data, it is necessary to select several test points on two different diameters of the single crystal silicon 60 for sequential testing; therefore, in the prior art, the probe 50 needs to be moved horizontally and vertically multiple times to align it with the measurement points.

[0040] In this application, the positioning platform 20 is provided so that the positioning platform 20 can rotate relative to the supporting platform 10, thereby driving the single crystal silicon 60 on the positioning platform 20 to turn, so that the detection can be completed by only moving the probe 50 in one direction. Figure 3 As shown, in a specific embodiment, when in use, the probe 50 is first aligned with a diameter of the single crystal silicon 60 by the mobile bracket 40, and the probe 50 is moved laterally by the action of the mobile bracket 40 to detect the detection points on the diameter in turn, and then the positioning platform 20 is rotated to a set angle, and the mobile bracket 40 is moved to move the probe 50 laterally again, so that the detection points on another diameter of the single crystal silicon 60 can be detected, thereby realizing the detection of detection points on two different diameters of the single crystal silicon 60 by unidirectionally moving the probe 50, simplifying the movement and positioning operation of the probe 50 and improving the detection efficiency.

[0041] Furthermore, the positioning platform 20 is circular, and the rotation limiting mechanism 11 is arranged on the outside of the positioning platform 20 at a set angle circumferential interval, and can contact and limit the positioning platform 20 to achieve the limitation of the positioning platform 20; by setting the rotation limiting mechanism 11, on the one hand, the rotation angle of the positioning platform 20 can be controlled by designing its position; on the other hand, it can prevent the positioning platform 20 from rotating during the detection process, thereby improving the safety and accuracy of the detection.

[0042] In the present application, the above-mentioned set angle is the rotation angle of the positioning platform 20 during the detection process. The rotation angle and number of rotations of the positioning platform 20 can be set as needed. The preferred rotation angle is 90 degrees. Through one rotation, the detection points on two diameters of the single crystal silicon 60 that intersect at 90 degrees can be measured, thereby improving the accuracy of the detection.

[0043] In a specific embodiment, Figure 4 As shown, the rotation limit mechanism 11 is arranged at 90 degrees in the circumferential direction on the outside of the positioning platform 20. The rotation limit mechanism 11 includes a support and a limit member. The limit member is hingedly arranged on the support and extends along the radial direction of the positioning platform 20. The edge of the positioning platform 20 is provided with a V-shaped groove 22, and the V-shaped groove 22 is also arranged at 90 degrees in the circumferential direction of the positioning platform 20. When in use, the positioning platform 20 is rotated to align the V-shaped groove 22 with the limit member, and then the limit member is rotated in the direction of the positioning platform 20 so that the limit member enters the V-shaped groove 22 to achieve the positioning of the positioning platform 20. Limit; operate the movable bracket 40 to move the probe 50 laterally to complete the measurement of the detection point on one diameter of the single crystal silicon, and then rotate the square limiter away from the positioning platform 20 to release the limit; then rotate the positioning platform 20 so that its other adjacent V-shaped groove 22 is aligned with the limiter. At this time, the positioning platform 20 has been rotated 90 degrees, and the limiter is rotated to enter the V-shaped groove 22 to achieve re-limitation of the positioning platform 20, and then operate the movable bracket 40 again to move the probe 50 laterally to complete the measurement of the detection point on the other diameter.

[0044] In this embodiment, there is at least one rotation limiting mechanism 11 and at least two V-shaped grooves 22; multiple rotation limiting mechanisms 11 and multiple V-shaped grooves 22 can also be set separately, and the rotation limiting of the positioning platform 20 can be better achieved through the cooperation of multiple rotation limiting mechanisms 11 and multiple V-shaped grooves 22.

[0045] In another specific implementation, the rotation limiting mechanism 11 adopts a cylinder telescopic mechanism, and the limiting member is arranged at the movable end of the cylinder telescopic mechanism and extends radially along the positioning platform 20; the edge of the positioning platform 20 is provided with a V-shaped groove 22, and the V-shaped groove 22 and the rotation limiting mechanism 11 are both arranged at set angles along the circumferential interval of the positioning platform 20; the rotation limiting mechanism 11 and the V-shaped groove 22 are respectively provided with matching sensors and induction plates, and the rotation limiting mechanism 11, the sensor and the induction plate are respectively electrically connected to the controller, and the controller receives signals from the sensor and the induction plate and issues instructions, and the rotation limiting mechanism 11 is extended and retracted in response to the instructions of the controller so as to automatically limit the positioning platform 20 and rotate the positioning platform 20 to the set angle.

[0046] Furthermore, a slide rail 12 is provided at the edge of the support platform 10; the movable bracket 40 includes a column 41, a beam 42 and a lifting mechanism 43; the column 41 is slidably connected to the slide rail 12; the beam 42 is fixed to the column 41 and is perpendicular to the slide rail 12; the lifting mechanism 43 is slidably connected to the beam 42; and the probe 50 is connected to the lifting mechanism 43.

[0047] Specifically, the lifting mechanism 43 includes an extension plate 431 and a lifting drive assembly 432. One end of the extension plate 431 is slidably connected to the beam 42, and the other end extends horizontally toward one side of the beam 42. Preferably, the extension plate 431 is perpendicular to the beam 42, and the other end of the extension plate 431 is connected to the lifting drive assembly 432. The probe 50 is connected to the movable end of the lifting drive assembly 432. Through the action of the lifting drive assembly 432, the probe 50 can move up and down in the vertical direction to adjust the height of the probe 50 to adapt it to the height of the single crystal silicon 60. The lifting drive component 432 can be driven by a cylinder, a guide rod or other driving forms. In this embodiment, the lifting drive component 432 is driven by a guide rod. The fixed end of the lifting drive component 432 is connected to the extension plate 431 and is provided with a lifting knob 4321; the guide rod is passed through the fixed end, and the movable end of the guide rod is connected to the probe 50. By loosening the lifting knob 4321, the guide rod can be moved up and down in the vertical direction, thereby driving the probe 50 to move in the vertical direction; by tightening the lifting knob 4321, the guide rod is fixed at the required position of the fixed end.

[0048] Specifically, the crossbeam 42 is disposed at the top of the column 41 and is perpendicular to the column 41; one end of the lifting mechanism 43 is slidably connected to the crossbeam 42 and slides along the length of the crossbeam 42. By adjusting the position of the lifting mechanism 43 on the crossbeam 42, the position of the probe 50 can be adjusted to better measure the resistivity of the single crystal silicon 60. Specifically, the connecting end of the lifting mechanism 43 and the crossbeam 42 can be sleeved on the crossbeam 42, and the connecting end is provided with a fastener 422, preferably a nut. When the lifting mechanism 43 moves to the desired position, the nut is tightened to fix the lifting mechanism 43 on the crossbeam 42; alternatively, one end of the lifting mechanism 43 is a slider, and the crossbeam 42 is provided with a slide groove that cooperates with the slider. The slider can slide back and forth in the slide groove so that the lifting mechanism 43 can be moved to the desired position. The slider is provided with a fastener 422. By tightening the fastener 422, the slider can be fixed in the slide groove, so that the lifting mechanism 43 is fixed to the desired position of the crossbeam 42.

[0049] Specifically, the bottom end of the column 41 is slidably connected to the slide rail 12 and can slide on the slide rail 12 to adjust the position of the column 41 on the slide rail 12, and then adjust the position of the beam 42, the lifting mechanism 43 and the probe 50 to more conveniently detect the resistivity of the single crystal silicon 60; specifically, the slide rail 12 is protruded from the support platform 10, and the bottom end of the column 41 is provided with a slide groove that cooperates with the slide rail 12, and a fastener 422 is provided on one side of the slide groove. When the column 41 moves to the required position, the fastener 422 is tightened to fix the column 41 at this position before proceeding to the next operation.

[0050] Preferably, the support platform 10 is rectangular, the positioning platform 20 is arranged in the middle of the support platform 10, and the slide rail 12 is arranged on one side or both sides of the positioning platform 20. Preferably, the slide rail 12 is arranged on both sides of the positioning platform 20, and the distance between the two slide rails 12 is greater than the diameter of the positioning platform 20. There are two columns 41, which are respectively slidably connected to the two slide rails 12; the two ends of the beam 42 are respectively connected to the top of the column 41 to make the mobile bracket 40 more stable as a whole.

[0051] Furthermore, the slide rail 12 is provided with a center positioning member 121 for positioning the probe 50 to ensure that the moving path of the probe 50 when sliding along the beam 42 coincides with a diameter of the single crystal silicon 60 .

[0052] During use, when the single crystal silicon 60 is placed on the positioning platform 20, its center coincides with the center of the positioning platform 20; the position of the center positioning piece 121 is a fixed position, and when the column 41 moves to contact the center positioning piece 121, the probe 50 is located on the diameter parallel to the positioning platform 20 and the beam 42, so that when the probe 50 moves laterally along the beam 42, its moving path coincides with the diameter of the single crystal silicon 60 parallel to the direction of the beam 42.

[0053] Furthermore, if Figure 1 、 Figure 4 and Figure 6 As shown, the guide rail is provided with a center mark 122, and the line connecting the center mark 122 and the center of the positioning platform 20 is parallel to the beam 42. When in use, it is necessary to first check the relative position between the center mark 122 and the probe 50. If the line between the two is parallel to the beam 42, it means that the probe 50 is accurately positioned.

[0054] Furthermore, if Figure 3 、 Figure 4As shown, a positioning recess 21 is provided on the top of the positioning platform 20 for positioning and supporting the single crystal silicon 60 so that when the single crystal silicon 60 is placed on the positioning platform 20, its center coincides with the center of the positioning platform 20; the crossbeam 42 is provided with a positioning mark 421 for assisting the probe 50 to accurately move to the detection point. Preferably, the center of the positioning recess 21 coincides with the center of the positioning platform 20, and the outer diameter of the positioning recess 21 is the same as the diameter of the single crystal silicon 60. When the single crystal silicon 60 is placed on the positioning recess 21, the center of the single crystal silicon 60 coincides with the center of the positioning recess 21; when the probe 50 moves along the crossbeam 42 driven by the lifting mechanism 43, the moving path of the probe 50 coincides with a diameter of the single crystal silicon 60; specifically, the positioning mark 421 is set according to the detection requirements, and the position of the positioning mark 421 corresponds to the detection point on the diameter. When the lifting mechanism 43 moves to a certain When the position mark 421 is located, the probe 50 is aligned with the corresponding detection point to detect the detection point. In a specific embodiment, the lifting mechanism 43 moves one by one from the positioning mark 421 at one end of the beam 42 to the positioning mark 421 at the other end of the beam 42, completing the detection of each detection point on the diameter. Subsequently, by rotating the positioning platform 20, the other diameter of the single crystal silicon 60 is turned to align with the probe 50, and the probe 50 is then moved from the positioning mark to the positioning mark at the other end of the beam 42 to complete the detection of the detection point on the other diameter. By providing the positioning recess 21 and the positioning mark 421, the probe 50 is precisely positioned, allowing it to move quickly and accurately to the detection point, ensuring the accuracy of the detection results.

[0055] The number of positioning marks is set according to the requirements; in a specific embodiment, Figure 3 As shown, there are 9 positioning marks 421, corresponding to the center of the single crystal silicon 60 on a diameter, 15 mm on both sides of the center, half the radius on both sides of the center, three quarters of the radius on both sides of the center and 6 mm on the opposite edge.

[0056] Furthermore, if Figure 2 、 Figure 4 and Figure 5 As shown, multiple sets of positioning recesses 21 and positioning marks 421 are provided to accommodate single crystal silicon 60 of different specifications. Specifically, positioning recesses 21 and positioning marks 421 of different sizes are provided according to the different specifications of the single crystal silicon 60, so that the device can be applied to resistivity testing of single crystal silicon 60 of multiple different specifications.

[0057] Preferably, the plurality of positioning recesses 21 are arranged in a concentric ring shape, with the outer positioning recesses 21 being higher than the inner positioning recesses 21. The positioning recesses 21 have upper surfaces and sidewalls, with the upper surfaces being arranged horizontally and the sidewalls being arranged vertically. It is understood that the inner positioning recesses 21 can accommodate smaller-sized single crystal silicon 60 than the outer positioning recesses 21. When the single crystal silicon 60 is placed in a corresponding positioning recess 21, the outer edge of its bottom contacts the upper surface of the positioning recess 21, and the outer wall of its bottom contacts the sidewalls of the positioning recess 21, thereby firmly securing the single crystal silicon 60 in the corresponding positioning recess 21 and preventing it from tilting or moving.

[0058] In the present application, the number of the positioning recesses 21 is not limited and can be set according to the specifications and types of the single crystal silicon 60 to be tested.

[0059] In a specific embodiment, the number of positioning recesses 21 is 5, which is applicable to 4-inch, 5-inch, 6-inch, 8-inch and 12-inch single crystal silicon 60. At the same time, the positioning marks 421 are correspondingly set to 5 groups, each marked with a different color.

[0060] Furthermore, a rotating assembly 30 is provided between the support platform 10 and the positioning platform 20, and the center of the rotating assembly 30 coincides with the center of the positioning platform 20. The movement of the rotating assembly 30 allows the positioning platform 20 to rotate relative to the support platform 10, thereby achieving the steering of the single crystal silicon 60.

[0061] The rotating assembly 30 includes a rotating shaft 31, with its ends connected to the support platform 10 and the positioning platform 20, respectively, enabling the positioning platform 20 to rotate about the rotating shaft 31. Preferably, the rotating shaft 31 utilizes a bearing. The rotating assembly 30 also includes a rolling element 32 and an annular track 33. The annular track 33 is disposed at the bottom of the positioning platform 20 or the top of the support platform 10, and the rolling element 32 is disposed within the annular track 33.

[0062] In a specific embodiment, the annular track 33 is arranged at the top of the supporting platform 10, and its center coincides with the center of the rotating shaft 31. The rolling element 32 is a plurality of balls, which are arranged in the annular track 33, and its top contacts the positioning platform 20, realizing a rolling connection with the supporting platform 10 and the positioning platform 20, thereby forming a stable support for the positioning platform 20.

[0063] In another specific embodiment, Figure 6 As shown, the rolling element 32 is a roller, and the axle of the roller is arranged in the annular track 33 along the radial direction of the positioning platform 20, so that the roller can rotate in the annular track 33 to support the positioning platform 20 to rotate relative to the supporting platform 10.

[0064] In this embodiment, the positioning platform 20 is pushed by an operator to rotate slowly. Alternatively, a driver may be used to drive the rotating shaft 31 to rotate, thereby driving the positioning platform 20 to rotate.

[0065] In the present invention, the single crystal silicon is turned by rotating the positioning platform by a certain angle, thereby achieving the measurement of the detection points on the two diameters of the single crystal silicon by moving the probe in a single direction, simplifying the operation of probe movement and positioning and greatly improving the detection efficiency. By providing a positioning recess and positioning mark, the probe is accurately positioned, enabling it to be quickly and accurately moved to the detection point, ensuring the accuracy of the test results. By providing a number of positioning recesses and positioning marks, the equipment can be used for resistivity testing of single crystal silicon of various specifications, thereby increasing the scope of application of the equipment. By providing a rotating assembly and a rotating limit mechanism, the stable rotation of the positioning platform and the precise control of the rotation angle are achieved, and the operation is simple.

[0066] The above embodiments of the present invention are described in detail. However, the above contents are only preferred embodiments of the present invention and should not be considered to limit the scope of implementation of the present invention. All equivalent changes and improvements made within the scope of the present invention should still fall within the scope of the patent coverage of the present invention.

Claims

1. A large diameter single crystal silicon resistivity detection device, characterized in that: It includes a positioning platform, a supporting platform, a movable bracket and a probe; wherein the positioning platform is rotatably connected to the upper part of the supporting platform for supporting single crystal silicon; the supporting platform is provided with a rotation limiting mechanism for limiting the rotation of the positioning platform; the movable bracket is movably arranged on the supporting platform; the probe is connected to the movable bracket and realizes lateral movement, longitudinal movement and lifting through the movement of the movable bracket.

2. The large-diameter single crystal silicon resistivity detection device according to claim 1, characterized in that: The rotation limiting mechanism is arranged at a set angle circumferential interval outside the positioning platform.

3. The large-diameter single crystal silicon resistivity detection device according to claim 1 or 2, characterized in that: The edge of the support platform is provided with a slide rail; the mobile bracket includes a column, a beam and a lifting mechanism; the column is slidably connected to the slide rail; the beam is fixed to the column and is perpendicular to the slide rail; the lifting mechanism is slidably connected to the beam; the probe is connected to the lifting mechanism.

4. The large-diameter single crystal silicon resistivity detection device according to claim 3, characterized in that: The slide rail is provided with a center positioning piece for positioning the probe.

5. The large-diameter single crystal silicon resistivity detection device according to claim 3, characterized in that: A positioning recess is provided on the top of the positioning platform for positioning and supporting the single crystal silicon; a positioning mark is provided on the crossbeam to facilitate accurate movement of the probe to the detection point.

6. The large-diameter single crystal silicon resistivity detection device according to claim 5, characterized in that: The positioning recesses and the positioning marks are provided in multiple groups for adapting to the single crystal silicon of different specifications.

7. The large-diameter single crystal silicon resistivity detection device according to claim 6, characterized in that: The plurality of positioning recesses are arranged in a concentric ring shape, and the positioning recesses on the outer side are higher than the positioning recesses on the inner side.

8. The large-diameter single crystal silicon resistivity detection device according to any one of claims 1, 2, and 4-7, characterized in that: A rotating assembly is provided between the supporting platform and the positioning platform, and the center of the rotating assembly coincides with the center of the positioning platform.

9. The large-diameter single crystal silicon resistivity detection device according to claim 8, characterized in that: The rotating assembly includes a rotating shaft, and both ends of the rotating shaft are respectively connected to the supporting platform and the positioning platform, so that the positioning platform can rotate around the rotating shaft.

10. The large-diameter single crystal silicon resistivity detection device according to claim 9, characterized in that: The rotating assembly further includes a rolling element and an annular track. The annular track is arranged at the bottom of the positioning platform or the top of the supporting platform, and the rolling element is arranged in the annular track.

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