Proximity exposure machine

Abstract

The utility model discloses a proximity exposure machine which comprises a rotating mechanism arranged between a first projection lens and a second projection lens, a rotating plate fixedly connected to the rotating mechanism and used for bearing two masks, and two dust removal mechanisms arranged between a first feeding assembly and a second feeding assembly, the two sets of dust removal mechanisms are symmetrically arranged with the rotating mechanism as the center, and the two sets of dust removal mechanisms, the first projection lens and the second projection lens are arranged in a cross shape. In the process of clockwise rotation, dust removal and anticlockwise rotation of the mask, the next group of products to be exposed are conveyed to the exposure position for exposure through the first feeding assembly and the second feeding assembly, so that the function of quickly cleaning impurities on the surface of the mask in the exposure process is realized, and the exposure efficiency is improved.

Description

Technical Field

[0001] The present invention relates to the technical field of exposure equipment, in particular to a proximity exposure machine. Background Art

[0002] Due to the high production capacity requirements of the photovoltaic industry, during the product exposure process, traditional proximity exposure solutions, due to the volatility of photolithography ink, will cause the mask surface to be contaminated by volatile ink. In the actual production process, if products are to be produced in batches, the mask needs to be replaced and maintained daily, which increases production and operating costs. In addition, the mask cannot be cleaned during the exposure process, resulting in a decrease in product yield.

[0003] Therefore, how to quickly clean the mask during the exposure process is a technical problem that needs to be solved urgently. Summary of the Invention

[0004] To achieve the above object, the present invention provides the following technical solutions:

[0005] A proximity exposure machine comprises: a base, a gantry fixedly connected to the top of the base, two groups of first and second projection lenses arranged on both sides of the top of the gantry, a first feeding assembly and a second feeding assembly arranged on the top of the base and respectively located below the first and second projection lenses, and also comprises: a rotating mechanism arranged at a position between the first and second projection lenses, a rotating plate fixedly connected to the rotating structure for carrying two mask plates, and two groups of dust removal mechanisms arranged between the first and second feeding assemblies, the two groups of dust removal mechanisms being symmetrically arranged with the rotating mechanism as the center, and arranged in a cross shape with respect to the first and second projection lenses.

[0006] As a further solution of the present invention: the rotating mechanism includes a DD motor, the DD motor is fixedly installed at the bottom of the gantry, and the bottom of the DD motor is connected to the middle position of the top of the rotating plate.

[0007] As a further solution of the present invention: the dust removal mechanism includes a support seat fixedly connected to the top of the base, the top of the support seat is fixedly connected with a lower dust removal component, and the bottom of the gantry is fixedly connected with an upper dust removal component for removing dust from the mask relative to the upper side of the lower dust removal component.

[0008] As a further solution of the present invention: the upper dust removal component includes two mounting plates fixedly connected to the bottom of the gantry, at least one group of air connecting pipes fixedly connected between the two mounting plates, an air inlet valve is provided at one end of the air connecting pipe, an air guide pipe connected to the air connecting pipe is fixedly connected to the outer wall of the air connecting pipe, and a number of equally spaced injection holes are provided below the air guide pipe. The lower dust removal component and the upper dust removal component have the same structure, but the injection directions are opposite.

[0009] As a further solution of the present invention: the outer wall of the gantry is provided with light-transmitting openings below the first projection lens and the second projection lens, and the two masks are symmetrically arranged at both ends of the outer wall of the rotating plate and below the first projection lens and the second projection lens.

[0010] As a further solution of the present invention, after the rotating plate is horizontally rotated 90 degrees below the first projection lens and the second projection lens, the masks at both ends of the rotating plate are respectively located between the two groups of lower dust removal members and upper dust removal members.

[0011] As a further solution of the present invention: the first feeding assembly includes a mounting block fixedly connected to the top of the base, two groups of slide rails and a linear motor respectively fixedly connected to the two side walls of the mounting block, the outer wall of the slide rail is slidably connected to a slide plate, the outer wall of the slide plate is connected to the linear motor, the side of the slide plate away from the linear motor is fixedly installed with a Z-axis driving component, the lifting end of the Z-axis driving component is fixedly connected to a bending plate, and the top of the bending plate is fixedly connected to a discharge plate carrying the parts to be exposed.

[0012] As a further solution of the present invention: the mounting block is located directly below the first projection lens, and the second feeding assembly has the same structure as the first feeding assembly.

[0013] Compared with the prior art, the beneficial effects of the present invention are as follows: the light sources of the first projection lens and the second projection lens pass through the light-transmitting port and the mask to expose the product, and then unload the product; then the DD motor is controlled to drive the rotating plate to rotate clockwise ninety degrees, and the two mask plates on the rotating plate are transferred to between the upper dust removal part and the lower dust removal part for dust removal. After the dust removal is completed, the DD motor rotates counterclockwise ninety degrees, and the two mask plates on the rotating plate return to the exposure position. During the process of the mask plate rotating clockwise, dust removal, and counterclockwise rotation, the next group of products to be exposed are transported to the exposure position through the first feeding assembly and the second feeding assembly for exposure, thereby realizing the function of quickly cleaning impurities on the surface of the mask plate during the exposure process, thereby improving the exposure efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 This is a structural diagram of a proximity exposure machine.

[0015] Figure 2 This is a schematic diagram of the three-dimensional structure of a proximity exposure machine.

[0016] Figure 3 This is a schematic diagram of the structure of the DD motor and rotating plate in a proximity exposure machine.

[0017] Figure 4 This is a schematic diagram of the structure of the upper dust removal component in a proximity exposure machine.

[0018] Figure 5 This is a schematic diagram of the structure of the air duct and air injection hole in a proximity exposure machine.

[0019] Figure 6 This is a schematic structural diagram of the first feeding assembly in a proximity exposure machine.

[0020] In the figure: 1. Base; 2. Gantry; 3. First projection lens; 4. Second projection lens; 5. DD motor; 6. Rotating plate; 7. Mask; 8. First feeding assembly; 9. Second feeding assembly; 10. Support seat; 11. Lower dust removal component; 12. Upper dust removal component; 13. Mounting plate; 14. Inlet valve; 15. Air guide pipe; 16. Air connecting pipe; 17. Mounting block; 18. Slide rail; 19. Slide plate; 20. Linear motor; 21. Z-axis drive component; 22. Bending plate; 23. Unloading plate; 24. Part to be exposed; 25. Light-transmitting port; 26. Jet hole. DETAILED DESCRIPTION

[0021] The present invention is further described in detail below with reference to the accompanying drawings and specific embodiments. Example

[0022] like Figure 1-Figure 5 As shown,

[0023] A proximity exposure machine includes: a base 1, a gantry 2 fixedly connected to the top of the base 1, two groups of first projection lenses 3 and second projection lenses 4 arranged on both sides of the top of the gantry 2, a first feeding assembly 8 and a second feeding assembly 9 arranged on the top of the base 1 and respectively located below the first projection lens 3 and the second projection lens 4, and also includes: a rotating mechanism arranged in a middle position between the first projection lens 3 and the second projection lens 4, a rotating plate 6 fixedly connected to the rotating structure for carrying two mask plates 7, and two groups of dust removal mechanisms arranged between the first feeding assembly 8 and the second feeding assembly 9, the two groups of dust removal mechanisms being symmetrically arranged with the rotating mechanism as the center, and arranged in a cross shape with the first projection lens 3 and the second projection lens 4.

[0024] The rotating mechanism includes a DD motor 5 , which is fixedly mounted on the bottom of the gantry 2 , and the bottom of the DD motor 5 is connected to the middle position of the top of the rotating plate 6 .

[0025] The dust removal mechanism includes a support base 10 fixedly connected to the top of the base 1, the top of the support base 10 is fixedly connected to a lower dust removal component 11, and the bottom of the gantry 2 is fixedly connected to an upper dust removal component 12 for removing dust from the mask 7 above the lower dust removal component 11.

[0026] The outer wall of the gantry 2 is provided with light-transmitting openings 25 below the first and second projection lenses 3 and 4 . Two masks 7 are symmetrically arranged at both ends of the outer wall of the rotating plate 6 and below the first and second projection lenses 3 and 4 .

[0027] In the initial state, the two masks 7 on the rotating plate 6 are respectively located directly below the first projection lens 3 and the second projection lens 4. The first feeding assembly 8 and the second feeding assembly 9 are provided for synchronous feeding and exposure, thereby improving production efficiency. After the product is loaded, it is conveyed to the bottom of the first projection lens 3 and the second projection lens 4 through the first feeding assembly 8 and the second feeding assembly 9. The light source of the first projection lens 3 and the second projection lens 4 passes through the light transmission port 25 and the mask 7 to expose the product, and then unloading is performed; then the DD motor 5 is controlled to drive The rotating plate 6 rotates ninety degrees clockwise, and the two masks 7 on the rotating plate 6 are transferred to between the upper dust removal component 12 and the lower dust removal component 11 for dust removal. After the dust removal is completed, the DD motor 5 rotates ninety degrees counterclockwise, and the two masks 7 on the rotating plate 6 return to the exposure position. During the process of the mask 7 rotating clockwise, removing dust, and rotating counterclockwise, the next group of products to be exposed are conveyed to the exposure position for exposure through the first feeding component 8 and the second feeding component 9, thereby realizing the function of quickly cleaning impurities on the surface of the mask 7 during the exposure process, thereby improving the exposure efficiency.

[0028] Specifically, the upper dust removal component 12 includes two mounting plates 13 fixedly connected to the bottom of the gantry 2, at least one group of air connecting pipes 16 fixedly connected between the two mounting plates 13, an air inlet valve 14 is provided at one end of the air connecting pipe 16, and an air guide pipe 15 connected to the air connecting pipe 16 is fixedly connected to the outer wall of the air connecting pipe 16. A number of equally spaced injection holes 26 are provided below the air guide pipe 15. The lower dust removal component 11 and the upper dust removal component 12 have the same structure, but the injection directions are opposite.

[0029] The two groups of lower dust removal parts 11 and the first feeding assembly 8 and the second feeding assembly 9 are arranged in a cross shape. After the rotating plate 6 is horizontally rotated ninety degrees below the first projection lens 3 and the second projection lens 4, the mask plates 7 at both ends are respectively located between the two groups of lower dust removal parts 11 and the upper dust removal parts 12.

[0030] Clean air is introduced into the air connecting pipe 16 through the air inlet valve 14, and the gas enters the air guide pipe 15 and is ejected through a number of equally distributed air jet holes 26 to perform air jet dust removal on the upper surface of the mask plate 7. Similarly, the lower dust removal component 11 performs air jet dust removal on the lower surface of the mask plate 7, thereby realizing the function of quickly cleaning the mask plate 7 during the product exposure process. Example

[0031] like Figure 6As shown, the first feeding assembly 8 includes a mounting block 17 fixedly connected to the top of the base 1, two groups of slide rails 18 and a linear motor 20 respectively fixedly connected to the two side walls of the mounting block 17, the outer wall of the slide rail 18 is slidably connected to a slide plate 19, the outer wall of the slide plate 19 is connected to the linear motor 20, and a Z-axis driving component 21 is fixedly installed on the side of the slide plate 19 away from the linear motor 20, the lifting end of the Z-axis driving component 21 is fixedly connected to a bending plate 22, and the top of the bending plate 22 is fixedly connected to a discharge plate 23 carrying the workpiece 24 to be exposed.

[0032] The mounting block 17 is located directly below the first projection lens 3 , and the second feeding assembly 9 has the same structure as the first feeding assembly 8 .

[0033] At the loading position, the workpiece 24 to be exposed is placed above the discharge plate 23, and the linear motor 20 is started. The linear motor 20 drives the slide 19 to move to the exposure position, and then drives the bending plate 22 and the discharge plate 23 to move to directly below the first projection lens 3. The bending plate 22 and the discharge plate 23 are driven to rise by the Z-axis drive component 21, so that the workpiece 24 to be exposed moves to the focal plane position of the first projection lens 3. The light source of the first projection lens 3 passes through the light-transmitting port 25 and the mask 7 to expose the workpiece 24 to be exposed. Then the linear motor 20 drives the workpiece 24 to be exposed to the unloading position for unloading. The first feeding component 8 and the second feeding component 9 perform synchronous loading, exposure and unloading, thereby improving production efficiency.

[0034] The above description is only a preferred specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any technician familiar with the technical field, within the technical scope disclosed by the present invention, who makes equivalent replacements or changes based on the technical solution and inventive concept of the present invention, should be covered by the scope of protection of the present invention.

Claims

1. A proximity exposure machine, comprising: A base, a gantry fixedly connected to the top of the base, two groups of first and second projection lenses arranged on both sides of the top of the gantry, a first feeding assembly and a second feeding assembly arranged on the top of the base and respectively below the first and second projection lenses, characterized in that it also includes: a rotating mechanism arranged in the middle position of the first and second projection lenses, a rotating plate fixedly connected to the rotating mechanism for carrying two mask plates, and two groups of dust removal mechanisms arranged between the first and second feeding assemblies, the two groups of dust removal mechanisms being symmetrically arranged with the rotating mechanism as the center, and arranged in a cross shape with the first and second projection lenses.

2. A proximity exposure machine according to claim 1, characterized in that: The rotating mechanism includes a DD motor, which is fixedly installed at the bottom of the gantry, and the bottom of the DD motor is connected to the middle position of the top of the rotating plate.

3. A proximity exposure machine according to claim 1, characterized in that: The dust removal mechanism includes a support seat fixedly connected to the top of the base, a lower dust removal piece fixedly connected to the top of the support seat, and an upper dust removal piece for removing dust from the mask fixedly connected to the bottom of the gantry relative to the upper side of the lower dust removal piece.

4. A proximity exposure machine according to claim 3, characterized in that: The upper dust removal component includes two mounting plates fixedly connected to the bottom of the gantry, at least one group of air connecting pipes fixedly connected between the two mounting plates, an air inlet valve is provided at one end of the air connecting pipe, an air guide pipe connected to the air connecting pipe is fixedly connected to the outer wall of the air connecting pipe, and a plurality of equidistantly distributed air injection holes are provided below the air guide pipe. The lower dust removal component and the upper dust removal component have the same structure, but the air injection directions are opposite.

5. The proximity exposure machine according to claim 1, characterized in that: The outer wall of the gantry is provided with light-transmitting openings below the first projection lens and the second projection lens. The two masks are symmetrically arranged at both ends of the outer wall of the rotating plate and below the first projection lens and the second projection lens.

6. The proximity exposure machine according to claim 3, characterized in that: After the rotating plate is horizontally rotated ninety degrees below the first projection lens and the second projection lens, the masks at both ends of the rotating plate are respectively located between the two groups of lower dust removal components and upper dust removal components.

7. The proximity exposure machine according to claim 1, characterized in that: The first feeding assembly includes a mounting block fixedly connected to the top of the base, two sets of slide rails and a linear motor respectively fixedly connected to the two side walls of the mounting block, the outer wall of the slide rail is slidably connected to a slide plate, the outer wall of the slide plate is connected to the linear motor, the side of the slide plate away from the linear motor is fixedly installed with a Z-axis driving component, the lifting end of the Z-axis driving component is fixedly connected to a bending plate, and the top of the bending plate is fixedly connected to a discharge plate carrying the workpiece to be exposed.

8. The proximity exposure machine according to claim 7, characterized in that: The mounting block is located directly below the first projection lens, and the second feeding assembly has the same structure as the first feeding assembly.

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